CN203503242U - Micro lens anti-counterfeiting mark with single-layer embossed pattern - Google Patents
Micro lens anti-counterfeiting mark with single-layer embossed pattern Download PDFInfo
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- CN203503242U CN203503242U CN201320649826.1U CN201320649826U CN203503242U CN 203503242 U CN203503242 U CN 203503242U CN 201320649826 U CN201320649826 U CN 201320649826U CN 203503242 U CN203503242 U CN 203503242U
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- counterfeiting mark
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Abstract
The utility model relates to a micro lens anti-counterfeiting mark which is formed by overlapping the micro lens array pattern with the micro image-text array pattern and provided with a single-layer embossed pattern structure. The micro lens anti-counterfeiting mark with the single-layer embossed pattern structure does not display images under ordinary lamp illumination or natural light illumination, and counterfeiting resistance and concealing performance are achieved; the micro lens anti-counterfeiting mark can display the special micro image-text amplifying phenomenon and the dynamic effect under the point light source illumination. The micro lens anti-counterfeiting mark is novel and unique in structure, diversified in product form and very wide in application range, and production can be conducted by directly using an existing laser holographic die pressing device and technology.
Description
Technical field
The utility model relates to a kind of Microlens anti-counterfeiting mark, relates in particular to a kind of microlens array and micro-picture and text array to be overlaped the Microlens anti-counterfeiting mark of the individual layer relief pattern structure of composition.
Background technology
At present on the banknote of existing a plurality of countries, adopted the anti-fake safety line with dynamic effect, as 1000 Kronas of Sweden's versions in 2006,50000 won of banknotes of Korea S's distribution in 2010.Some companies in recent years, as hewlette-packard has also adopted the anti-counterfeiting mark with dynamic effect on its product.In these anti-fake safety lines and anti-counterfeiting mark, enlarged image can produce continuous dislocation according to the variation of people's observation visual angle.Their essential structure is all to add by miniature convex lens array layer and miniature picture and text array stack the double-decker forming, and the distance between two layers is determined by the focal length parameter of lens.Its weak point is the thickness that the face type of miniature convex lens surface projection has increased anti-fake safety line and anti-counterfeiting mark.
The Microlens anti-counterfeiting mark that adopts miniature binary phase lens (also claiming Fresnel zone lens) array to replace miniature convex lens array to make is disclosed in Chinese patent 201020143542.1,201220325232.0.Because binary phase lenticule belongs to the planar lenses with relief surface structure, so can relatively reduce the thickness of anti-counterfeiting mark.And the micro-picture and text amplification effect obtaining and Dynamic Recognition feature are identical with the anti-fake safety line or the anti-counterfeiting mark that adopt miniature convex lens array to make.The anti-counterfeiting mark consisting of binary phase microlens array remains the double-decker that the stack of microlens array layer and micro-picture and text array layer forms, and the distance between two layers is also determined by the focal length parameter of lens.
Summary of the invention
The double-decker that the microlens array layer that the utility model adopts for existing Microlens anti-counterfeiting mark and the stack of micro-picture and text array layer form, provides a kind of Microlens anti-counterfeiting mark with individual layer relief pattern structure.This Microlens anti-counterfeiting mark capable of appearing picture not under ordinary lamp and lantern illumination or natural light, amplifies phenomenon and dynamic effect and can show micro-picture and text under pointolite irradiates.
The utility model solves the technical scheme that its technical matters adopts: first on computers the microlens array figure of design and micro-picture and text array pattern are overlaped, recycling microelectronics platemaking equipment on photoetching hectograph, is made the photoresist mother matrix with relief surface structure by the overlapping graph exposure of microlens array and micro-picture and text array after development.Then utilize photoresist mother matrix, the manufacture craft through existing laser holographic anti counterfeiting label, completes production of the present utility model.
Microlens array in the utility model adopts binary phase microlens array, also claims Fresnel zone microlens array.The arrangement mode of microlens array has two kinds.A kind of is the microlens array of arranging according to square mode providing in patent 201020143542.1.Another kind is the microlens array of arranging according to equilateral triangle mode providing in patent 201220325232.0.The actual microlens array arrangement mode of selecting is determined when microlens array designs.
The arrangement mode of the micro-picture and text array in the utility model is consistent with the arrangement mode of the microlens array of selecting.The unit size of micro-picture and text array can equate with the unit size of microlens array, also can be unequal but be close.
When the microlens array figure in the utility model and micro-picture and text array pattern are overlapping, the angle of the horizontal direction of two figures (or vertical direction) will be selected a suitable angle within the scope of 0 degree to 45 degree, to make micro-picture and text obtain suitable amplification.This suitable angle needs prior process calculative determination or is determined by experiment.
On micro-picture and text, fill random spot, can increase the contrast of the micro-picture and text that are exaggerated.
Architectural feature of the present utility model is to only have the figure of one deck relief surface structure, and the concavo-convex fluctuating of relief pattern is very little, generally in 1 micron.Therefore the general thickness of anti-counterfeiting mark can be accomplished very littlely, for example, comprise that the general thickness of basement membrane and Information Level is accomplished 10 microns of left and right, has ultra-thin characteristic.Graphic element in the utility model can be done greatlyr, as 100 to 200 microns, and micro-picture and text pattern that so just can comparison complexity, such as numeral, character, Chinese character, logo etc.The utility model can also be made into blocking film sign.These all double-deck Microlens anti-counterfeiting mark be difficult to accomplish.
Product of the present utility model has following observation recognition feature:
1, capable of appearing picture not under ordinary lamp and lantern illumination or natural light, has false proof disguise;
2, under pointolite (as single led light source) irradiates, can show the micro-picture and text array image being exaggerated, and the micro-picture and text array image being exaggerated along with the translation of pointolite continuous moving, present behavioral characteristics;
3, when pointolite near or away from sign process in, micro-picture and text pattern has the phenomenon of continuously zooming.
More than observing recognition feature, is that the utility model is different from other anti-fake safety lines and the exclusive feature of anti-counterfeiting mark.
The beneficial effects of the utility model are, the Microlens anti-counterfeiting mark of individual layer relief pattern structure only has the figure of one deck relief surface structure, has ultra-thin characteristic, micro-picture and text pattern that can comparison complexity.And possesses exclusive observation recognition feature, i.e. disguise under ordinary light source and the behavioral characteristics under pointolite and continuously zooming phenomenon.The Microlens anti-counterfeiting mark of individual layer relief pattern structure is that a kind of security is very high, identifies very convenient and characteristic anti-counterfeiting mark.
The utility model novel structure is unique, product form has the sign of stickup, hot-stamping mark, Anti-fake packaging film, false proof tie rod, anti-fake safety line etc., the scope of application is very wide, be specially adapted to the false proof of paper money coin safety line, certificate, bank card, admission ticket etc., and all kinds of high-grade goods and special article is false proof.
Accompanying drawing explanation
Below in conjunction with drawings and Examples, the utility model is further illustrated.
Fig. 1 is partial cross section's enlarged diagram of essential structure of the present utility model.
Fig. 2 is microlens array and the overlapping schematic diagram of micro-picture and text array of the utility model embodiment.
Embodiment
As shown in Figure 1,1 is transparent plastic basement membrane, and 2 is the Information Level applying on the surface of transparent plastic basement membrane 1,3 microlens arrays with relief surface structure for making on Information Level 2 and the overlapping figure of micro-picture and text array.
Embodiment: Fig. 2 is a kind of binary phase microlens array of the utility model embodiment employing and the local enlarged diagram that micro-picture and text array (array of micro text " good fortune ") overlaps.200 microns of focal length of micro-lens arrays, 150 microns of microlens array unit sizes.145 microns of micro-picture and text " good fortune " array element sizes, single " good fortune " word word is high 80 microns.Microlens array and micro-picture and text array adopt square mode to arrange, and the angle of the horizontal direction (or vertical direction) of overlapping rear microlens array and micro-picture and text array is 5 degree.The overlapping figure of this microlens array and micro-picture and text array is made to photoresist mother matrix, then through existing laser holographic anti counterfeiting label manufacture craft, produce aluminium film label adhering of the present utility model.
Claims (8)
1. individual layer relief pattern Microlens anti-counterfeiting mark, is characterized in that: microlens array figure and micro-picture and text array pattern are overlaped, form the Microlens anti-counterfeiting mark that only has one deck relief pattern structure.
2. individual layer relief pattern Microlens anti-counterfeiting mark according to claim 1, is characterized in that: microlens array adopts binary phase microlens array.
3. individual layer relief pattern Microlens anti-counterfeiting mark according to claim 1, is characterized in that: the arrangement mode of microlens array and micro-picture and text array is to arrange according to square mode.
4. individual layer relief pattern Microlens anti-counterfeiting mark according to claim 1, is characterized in that: the arrangement mode of microlens array and micro-picture and text array is to arrange according to equilateral triangle mode.
5. individual layer relief pattern Microlens anti-counterfeiting mark according to claim 1, is characterized in that: the unit size of micro-picture and text array equates with the unit size of microlens array.
6. individual layer relief pattern Microlens anti-counterfeiting mark according to claim 1, is characterized in that: the unit size of micro-picture and text array and the unit size of microlens array are unequal but be close.
7. individual layer relief pattern Microlens anti-counterfeiting mark according to claim 1, is characterized in that: when microlens array figure and micro-picture and text array pattern are overlapping, the horizontal direction of two figures or the angle of vertical direction are within the scope of 0 degree to 45 degree.
8. individual layer relief pattern Microlens anti-counterfeiting mark according to claim 1, is characterized in that: on micro-picture and text, be filled with random spot.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320649826.1U CN203503242U (en) | 2013-10-22 | 2013-10-22 | Micro lens anti-counterfeiting mark with single-layer embossed pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320649826.1U CN203503242U (en) | 2013-10-22 | 2013-10-22 | Micro lens anti-counterfeiting mark with single-layer embossed pattern |
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| CN203503242U true CN203503242U (en) | 2014-03-26 |
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| CN201320649826.1U Withdrawn - After Issue CN203503242U (en) | 2013-10-22 | 2013-10-22 | Micro lens anti-counterfeiting mark with single-layer embossed pattern |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103978803A (en) * | 2014-05-28 | 2014-08-13 | 上海茂璞实业发展有限公司 | Optics anti-fake unit |
| CN104575251A (en) * | 2013-10-22 | 2015-04-29 | 成都得迈科贸有限公司 | Monolayer embossed pattern micro-lens anti-counterfeit label |
| CN104978896A (en) * | 2014-04-09 | 2015-10-14 | 成都得迈科贸有限公司 | Monolayer embossing pattern microstructural anti-counterfeiting mark |
| CN105303959A (en) * | 2014-07-04 | 2016-02-03 | 成都得迈科贸有限公司 | Anti-counterfeiting QR (quick response) code |
| CN105894953A (en) * | 2016-04-29 | 2016-08-24 | 珠海市瑞明科技有限公司 | Lenticule stereoscopic graphics and texts and making method thereof |
-
2013
- 2013-10-22 CN CN201320649826.1U patent/CN203503242U/en not_active Withdrawn - After Issue
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104575251A (en) * | 2013-10-22 | 2015-04-29 | 成都得迈科贸有限公司 | Monolayer embossed pattern micro-lens anti-counterfeit label |
| CN104575251B (en) * | 2013-10-22 | 2018-12-04 | 成都得迈科贸有限公司 | Single layer relief pattern Microlens anti-counterfeiting mark |
| CN104978896A (en) * | 2014-04-09 | 2015-10-14 | 成都得迈科贸有限公司 | Monolayer embossing pattern microstructural anti-counterfeiting mark |
| CN103978803A (en) * | 2014-05-28 | 2014-08-13 | 上海茂璞实业发展有限公司 | Optics anti-fake unit |
| CN103978803B (en) * | 2014-05-28 | 2016-04-06 | 上海茂璞实业发展有限公司 | A kind of optical anti-counterfeiting unit |
| CN105303959A (en) * | 2014-07-04 | 2016-02-03 | 成都得迈科贸有限公司 | Anti-counterfeiting QR (quick response) code |
| CN105894953A (en) * | 2016-04-29 | 2016-08-24 | 珠海市瑞明科技有限公司 | Lenticule stereoscopic graphics and texts and making method thereof |
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| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20140326 Effective date of abandoning: 20181204 |
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| AV01 | Patent right actively abandoned |
Granted publication date: 20140326 Effective date of abandoning: 20181204 |