CN104540778B - 生产石墨烯的方法 - Google Patents

生产石墨烯的方法 Download PDF

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Publication number
CN104540778B
CN104540778B CN201380029133.5A CN201380029133A CN104540778B CN 104540778 B CN104540778 B CN 104540778B CN 201380029133 A CN201380029133 A CN 201380029133A CN 104540778 B CN104540778 B CN 104540778B
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coal
electrolyzed
graphene
electrolyzed coal
substrate
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Chinese (zh)
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CN104540778A (zh
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杰拉尔丁·G·博特
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Ohio University
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Ohio University
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/182—Graphene
    • C01B32/184—Preparation
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/182—Graphene
    • C01B32/184—Preparation
    • C01B32/186—Preparation by chemical vapour deposition [CVD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C23C16/463—Cooling of the substrate

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • Carbon And Carbon Compounds (AREA)
CN201380029133.5A 2012-04-09 2013-04-08 生产石墨烯的方法 Active CN104540778B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261621625P 2012-04-09 2012-04-09
US61/621,625 2012-04-09
PCT/US2013/035627 WO2013154997A1 (en) 2012-04-09 2013-04-08 Method of producing graphene

Publications (2)

Publication Number Publication Date
CN104540778A CN104540778A (zh) 2015-04-22
CN104540778B true CN104540778B (zh) 2016-10-26

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CN201380029133.5A Active CN104540778B (zh) 2012-04-09 2013-04-08 生产石墨烯的方法

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US (1) US10544503B2 (enExample)
EP (1) EP2836460B1 (enExample)
JP (1) JP6193973B2 (enExample)
CN (1) CN104540778B (enExample)
DK (1) DK2836460T3 (enExample)
PL (1) PL2836460T3 (enExample)
WO (1) WO2013154997A1 (enExample)

Families Citing this family (14)

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Publication number Priority date Publication date Assignee Title
WO2015108596A2 (en) 2013-10-25 2015-07-23 Ohio University Electrochemical cell containing a graphene coated electrode
GB2523154B (en) 2014-02-14 2016-04-27 Cambridge Entpr Ltd Method of producing graphene
US9505624B2 (en) * 2014-02-18 2016-11-29 Corning Incorporated Metal-free CVD coating of graphene on glass and other dielectric substrates
CN104386675A (zh) * 2014-11-03 2015-03-04 黄德欢 一种用固态碳源制备石墨烯的方法
CN107848805B (zh) * 2015-05-19 2020-11-24 新奥石墨烯技术有限公司 以煤炭为原料制备石墨烯的方法
CA3038523A1 (en) * 2016-09-27 2018-04-05 Ohio University Ultra-conductive metal composite forms and the synthesis thereof
US10861444B2 (en) 2018-09-24 2020-12-08 Rovi Guides, Inc. Systems and methods for determining whether to trigger a voice capable device based on speaking cadence
US11535518B1 (en) * 2019-03-29 2022-12-27 Energy, United States Department Of Production of graphene-structured products from coal using thermal molten salt process
CN111847431B (zh) * 2020-06-15 2022-07-12 浙江大学 一种低能耗的石墨烯薄膜的制备方法
US12077437B2 (en) * 2020-08-28 2024-09-03 Energy And Environmental Research Center Foundation Graphene films from carbon sources
US12359322B2 (en) 2021-03-26 2025-07-15 Carbon Holdings Intellectual Properties, Llc Methods and apparatus for production of electrochemical graphite
JP2024511471A (ja) * 2021-03-26 2024-03-13 カーボン ホールディングス インテレクチュアル プロパティズ， エルエルシー 電気化学的グラファイトの生成のための方法及び装置
EP4477618A1 (de) 2023-06-14 2024-12-18 voestalpine Stahl GmbH Beschichtetes metallblech zur herstellung von graphen
WO2025014854A1 (en) * 2023-07-10 2025-01-16 Carbon Holdings Intellectual Properties, Llc Methods and apparatus for production of electrochemical graphite

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102438937A (zh) * 2009-03-27 2012-05-02 俄亥俄州立大学 合成碳纳米管的预处理方法及源自煤和碳煤焦的碳纳米结构

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JP3973662B2 (ja) * 2003-03-31 2007-09-12 富士通株式会社 カーボンナノチューブ製造方法
US7378011B2 (en) 2003-07-28 2008-05-27 Phelps Dodge Corporation Method and apparatus for electrowinning copper using the ferrous/ferric anode reaction
JP2011201735A (ja) * 2010-03-26 2011-10-13 Fujitsu Ltd グラフェン膜の製造方法及び半導体装置の製造方法
PL213291B1 (pl) * 2010-06-07 2013-02-28 Inst Tech Material Elekt Sposób wytwarzania grafenu
US20120058352A1 (en) * 2010-09-02 2012-03-08 Applied Nanostructured Solutions, Llc Metal substrates having carbon nanotubes grown thereon and methods for production thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102438937A (zh) * 2009-03-27 2012-05-02 俄亥俄州立大学 合成碳纳米管的预处理方法及源自煤和碳煤焦的碳纳米结构

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Understanding the kinetics of coal electrolysis at intermediate temperatures;Xin Jin et al.;《Journal of Powder Sources》;20100801;第195卷(第15期);第4935-4942页 *
Versatile Catalytic System for the Large-Scale and Controlled Synthesis偶发Single-Wall,Double-Wall,Multi-Wall,and Graphene Carbon Nanostructures;Enkeleda Dervish et al.;《CHEMISTRY OF MATERIALS》;20091020;第21卷(第22期);第5491-5498页 *

Also Published As

Publication number Publication date
WO2013154997A1 (en) 2013-10-17
EP2836460A1 (en) 2015-02-18
JP2015512858A (ja) 2015-04-30
CN104540778A (zh) 2015-04-22
US10544503B2 (en) 2020-01-28
AU2013246213B2 (en) 2016-01-07
PL2836460T3 (pl) 2022-12-27
JP6193973B2 (ja) 2017-09-06
EP2836460B1 (en) 2022-08-31
DK2836460T3 (da) 2022-10-10
US20150125604A1 (en) 2015-05-07
AU2013246213A1 (en) 2014-10-30

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