CN104512063A - Laminated body and touch panel sensor - Google Patents
Laminated body and touch panel sensor Download PDFInfo
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- CN104512063A CN104512063A CN201410510043.4A CN201410510043A CN104512063A CN 104512063 A CN104512063 A CN 104512063A CN 201410510043 A CN201410510043 A CN 201410510043A CN 104512063 A CN104512063 A CN 104512063A
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/10—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material
- B32B3/14—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material characterised by a face layer formed of separate pieces of material which are juxtaposed side-by-side
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Ceramic Engineering (AREA)
- Human Computer Interaction (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Laminated Bodies (AREA)
- Position Input By Displaying (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention provides a laminated body and a touch panel sensor that can enable the shape of a transparent electric conduction layer to be invisible. The laminated body (10) is provided according to a mode of the invention, the laminated body is provided with a middle base material film (11) and a first transparent electric conduction layer (12) which is laminated on the middle base material film (11), and the first transparent electric conduction layer (12) is patterned; the middle base material film (11) is provided with a transparent base material (13), a first transparent layer (14) arranged on a surface (13A) of the transparent base material (13), a first high refraction index layer (15) laminated on the first transparent layer (14), and a first low refraction index layer (16) laminated on the first high refraction index layer (15); the first high refraction index layer (15) is higher than the first transparent layer (14) in terms of refraction index, the first low refraction index layer (16) is lower than the first high refraction index layer (15) in terms of refraction index, the first transparent electric conduction layer (12) is formed on part of the surface of the first low refraction index layer (16), and therefore the wave length of light of which the reflectivity difference between the reflectivity measured on a first transparent electric conduction layer (12) side of a transparent electric conduction layer existing area (10A) and the reflectivity measured on a first low refraction index layer (16) side of a transparent electric conduction layer non-existing area (10B) is 1.5% ranges between 300 nm and 450 nm.
Description
[technical field]
The present invention relates to duplexer and contact panel sensor.
[background technology]
All the time, the contact panel that can input information by finger touch is well-known.Contact panel has various forms, and one of them is the contact panel of capacitance-type.The contact panel of capacitance-type detects position by the change such as catching the static capacity on the position of the contacts such as finger.
In the contact panel sensor of the contact panel for capacitance-type, some sensor are for transparent base, the lamination hyaline layer on transparent base, the lamination transparency conducting layer played a role as top electrode layer or lower electrode layer on hyaline layer.
Transparency conducting layer utilizes photolithography and patterning, has predetermined shape.Therefore, contact panel sensor has the transparency conducting layer domain of the existence as the region that there is transparency conducting layer and the non-domain of the existence of transparency conducting layer as the region that there is not transparency conducting layer.
But, if the light reflectance difference of transparency conducting layer domain of the existence and the non-domain of the existence of transparency conducting layer is large, then may find out the shape (pattern form) (the visible phenomenon of so-called etching line) of transparency conducting layer.In prior art, in order to make the shape of transparency conducting layer invisible, low-index layer and high refractive index layer are set between hyaline layer and transparency conducting layer, by transparency conducting layer domain of the existence and the non-domain of the existence of transparency conducting layer, the light reflectance difference to wavelength 450 ~ 700nm reduces (such as, see Japanese Unexamined Patent Application Publication 2013-513136 publication).
[summary of the invention]
[inventing problem to be solved]
But present situation is, even if the light reflectance difference to wavelength 450 ~ 700nm reduces by transparency conducting layer domain of the existence and the non-domain of the existence of transparency conducting layer, the shape of transparency conducting layer also cannot be made invisible.
For this point, present inventor has performed deep research, thus find, in transparency conducting layer domain of the existence, the reflectivity that the wavelength be not considered so far is less than the visible ray short wavelength region of 450nm is high compared with the light reflectance of wavelength 450 ~ 700nm, and, in the non-domain of the existence of transparency conducting layer, the reflectivity in visible ray short wavelength region is extremely low compared with the light reflectance of wavelength 450 ~ 700nm, therefore, the reflection differences in the visible ray short wavelength region in transparency conducting layer domain of the existence and the non-domain of the existence of transparency conducting layer becomes large, the blueness of transparency conducting layer domain of the existence is caused to become outstanding due to the reflection differences in this visible ray short wavelength region, thus the shape of transparency conducting layer can be found out.
On the other hand, now from the viewpoint of the large area of seeking contact panel, the low resistance of transparency conducting layer is advanced, tend to the thickness thickening transparency conducting layer.If the thickness of transparency conducting layer is thickening, the light reflectance being not only transparency conducting layer domain of the existence medium wavelength 450 ~ 700nm, the visible ray short wavelength region reflectivity being less than 450nm also can rise.Therefore, if the low resistance of transparency conducting layer is advanced, then transparency conducting layer domain of the existence and the reflectivity missionary society of the non-domain of the existence of transparency conducting layer to visible ray short wavelength region become larger, there are the problems referred to above and become significant worry.
The present invention proposes to solve above-mentioned problem.That is, the object of the present invention is to provide and can make the sightless duplexer of the shape of transparency conducting layer and contact panel sensor.
[solving the means of problem]
According to a mode of the present invention, a kind of duplexer is provided, it possesses middle base material film and lamination on described middle base material film and patterned transparency conducting layer, wherein, described middle base material film possesses: transparent base, be located at the hyaline layer on a face of described transparent base, lamination is on described hyaline layer and have the high refractive index layer of the refractive index of the refractive index higher than described hyaline layer, on described high refractive index layer there is the low-index layer of the refractive index lower than described high refractive index layer with lamination, described transparency conducting layer is formed at the part surface of described low-index layer, the region making wavelength that the light reflectance that measured by the transparency conducting layer side of transparency conducting layer domain of the existence and the reflection differences of the light reflectance measured by the low-index layer side of the non-domain of the existence of transparency conducting layer are 1.5% be present in more than 300nm to be less than 450nm, described transparency conducting layer domain of the existence is the region having described transparency conducting layer, for there is not described transparency conducting layer in the non-domain of the existence of described transparency conducting layer, expose the region of described low-index layer.
According to other modes of the present invention, a kind of contact panel sensor is provided, it possess top electrode layer and with the described top electrode layer lower electrode layer configured at predetermined spaced intervals, wherein, described contact panel sensor is for above-mentioned duplexer, and the described transparency conducting layer of described duplexer plays a role as described top electrode layer or described lower electrode layer.
[effect of invention]
According to the duplexer of a mode of the present invention and the contact panel sensor of other mode, the wavelength that the light reflectance measured by the transparency conducting layer side of transparency conducting layer domain of the existence and the reflection differences of the light reflectance measured by the low-index layer side of the non-domain of the existence of transparency conducting layer are 1.5% is present in the region that more than 300nm is less than 450nm, thus transparency conducting layer can be made invisible.
[accompanying drawing explanation]
Fig. 1 is the schematic pie graph of the duplexer of embodiment.
Fig. 2 is the top view of a part for the duplexer of embodiment.
Fig. 3 is the schematic pie graph of other duplexer of embodiment.
Fig. 4 is the top view of a part for other duplexer of embodiment.
Fig. 5 is the schematic pie graph of the contact panel sensor of embodiment.
Fig. 6 is the schematic pie graph of other contact panel sensor of embodiment.
Fig. 7 is the curve map of the display ITO layer domain of the existence of embodiment 1 and the reflectance spectrum of the non-domain of the existence of ITO layer.
Fig. 8 is the curve map of the display ITO layer domain of the existence of embodiment 2 and the reflectance spectrum of the non-domain of the existence of ITO layer.
Fig. 9 is the curve map of the display ITO layer domain of the existence of embodiment 3 and the reflectance spectrum of the non-domain of the existence of ITO layer.
Figure 10 is the curve map of the display ITO layer domain of the existence of comparative example and the reflectance spectrum of the non-domain of the existence of ITO layer.
[detailed description of the invention]
Be described referring to the duplexer of accompanying drawing to embodiments of the present invention.In this description, " duplexer " also comprise and be referred to as the parts such as " laminated film ", " laminated sheet ".Further, in this description, " weight average molecular weight " is dissolved in the value utilizing existing known gel permeation chromatography (GPC) method to obtain based on polystyrene conversion after in oxolane (THF) equal solvent.Fig. 1 is the schematic pie graph of the duplexer of present embodiment, and Fig. 2 is the top view of a part for the duplexer of present embodiment.Fig. 3 is the schematic pie graph of other duplexer of present embodiment, and Fig. 4 is the top view of a part for other duplexer of present embodiment.
[duplexer and middle base material film]
Duplexer 10 shown in Fig. 1 possesses middle base material film 11 and 1st transparency conducting layer 12 of lamination on middle base material film 11.Such as when being installed on contact panel etc. and using, so-called " middle base material film " means the base material film of the base material film for the inside of contact panel etc. but not the outmost surface for contact panel etc.
Middle base material film 11 is for supporting the 1st transparency conducting layer 12.Middle base material film 11 possesses: the 1st low-index layer 16 on the 1st high refractive index layer 15 of transparent base 13, lamination the 1st hyaline layer 14 on a face 13A of transparent base 13,1st high refractive index layer 15 of lamination on the 1st hyaline layer 14, lamination and 2nd hyaline layer 17 of lamination on another face 13B of transparent base 13.
Middle base material film can not have the 2nd hyaline layer.Further, middle base material film can possess the 2nd high refractive index layer, the 2nd low-index layer on the 2nd hyaline layer.Specifically, as middle base material film, except the middle base material film 11 shown in Fig. 1, can be any one in following middle base material film: on a face of transparent base, be provided with the 1st hyaline layer, the 1st high refractive index layer and the 1st low-index layer by narrative order and another face of transparent base be not provided with the middle base material film of the 2nd hyaline layer; A face of transparent base is provided with the 1st hyaline layer, the 1st high refractive index layer and the 1st low-index layer by narrative order and on another face of transparent base, is provided with the middle base material film of the 2nd hyaline layer and the 2nd high refractive index layer by narrative order; With on a face of transparent base, be provided with the 1st hyaline layer, the 1st high refractive index layer and the 1st low-index layer by narrative order and on another face of transparent base, be provided with the middle base material film of the 2nd hyaline layer, the 2nd high refractive index layer and the 2nd low-index layer by narrative order.
Because the 1st transparency conducting layer 12 is patterned, be therefore formed at the part surface of the 1st low-index layer 16.That is, exist in duplexer 10: as the region of existence the 1st transparency conducting layer 12 transparency conducting layer domain of the existence 10A and expose the non-domain of the existence 10B of transparency conducting layer in the region of the 1st low-index layer 16 as there is not the 1st transparency conducting layer 12.It should be noted that, the shape of the 1st transparency conducting layer is not particularly limited, such as, can enumerates square shape and striated.As shown in Figure 2, the shape of the 1st transparency conducting layer 12 is square shape, and the 1st transparency conducting layer 12 arranges in the horizontal.
In duplexer 10, the region making wavelength that the light reflectance that measured by the 1st transparency conducting layer 12 side of transparency conducting layer domain of the existence 10A and the difference (reflection differences) of the light reflectance to be measured by the 1st low-index layer 16 side of the non-domain of the existence 10B of transparency conducting layer are 1.5% be present in more than 300nm to be less than 450nm.Reflectivity is by by light source irradiation incident angle being the light of 5 ° and utilizing the reverberation in detector reception normal reflection direction to measure.In this description, so-called " light that incident angle is 5 ° " mean and set the normal direction in duplexer face as tilting the light of 5 ° when 0 ° relative to described normal direction.Further, " reflection differences " is the absolute value that the light reflectance of transparency conducting layer domain of the existence deducts the value after the light reflectance of the non-domain of the existence of transparency conducting layer.Above-mentioned reflection differences be 1.5% wavelength can obtain as follows: the known spectrophotometer of UV3100PC utilizing such as Shimadzu Seisakusho Ltd. to manufacture and so on measures transparency conducting layer domain of the existence and the non-domain of the existence of transparency conducting layer spectral reflectance separately, obtains by obtained spectral reflectance the wavelength that reflection differences is 1.5%.Utilize the spectral reflectance high frequency components meeting of spectrophotometric determination overlapping, the spectral reflectance therefore preferably eliminating radio-frequency component according to the smoothing processing by make use of differential transformation approach obtains the wavelength that above-mentioned reflection differences is 1.5%.
The light reflectance measured by the 1st transparency conducting layer side of transparency conducting layer domain of the existence can obtain by irradiating light to the 1st patterned transparency conducting layer and directly measure the light reflectance in this region, but when the pattern form of the 1st transparency conducting layer is too small, also can irradiates light reflectivity is measured by the 1st transparency conducting layer of the state to the solid membrane before patterning and obtain.And, similarly, the light reflectance measured by the 1st low-index layer side of the non-domain of the existence of transparency conducting layer can be irradiated light by the 1st low-index layer exposed to there is not the 1st transparency conducting layer and directly be measured the light reflectance in this region and be obtained, but before also can being that intermediate coat base material forms the 1st transparency conducting layer, the 1st low-index layer to middle base material film irradiates light and measures reflectivity and obtains.
According to the present embodiment, the wavelength that the light reflectance measured by the 1st transparency conducting layer 12 side of transparency conducting layer domain of the existence 10A and the difference (reflection differences) of the light reflectance measured by the 1st low-index layer 16 side of the non-domain of the existence 10B of transparency conducting layer are 1.5% is present in the region that more than 300nm is less than 450nm, and the reflection differences therefore in visible ray short wavelength region also diminishes.The phenomenon that the blueness of transparency conducting layer domain of the existence 10A is outstanding compared to the non-domain of the existence 10B of transparency conducting layer can be suppressed thus, thus the shape of the 1st transparency conducting layer 12 can be made invisible.
Above-mentioned reflection differences be 1.5% wavelength be present in duplexer that more than 300nm is less than the region of 450nm mainly through obtaining the refractive index of the 1st low-index layer and/or the 1st high refractive index layer and/or thickness adjustment.
In duplexer 10, at the wavelength being 1.5% be preferably that the above-mentioned reflection differences in the region of 780nm is less than 1.5% from above-mentioned reflection differences to wavelength.Due at the wavelength from above-mentioned reflection differences being 1.5% to wavelength be 780nm region in above-mentioned reflection differences be less than 1.5%, therefore in transparency conducting layer domain of the existence 10A, not only can suppress for blueness, and can suppress for the outstanding phenomenon of significantly other colors.
If the refractive index that the 1st transparency conducting layer 12 is the light of the wavelength of 1.5% to above-mentioned reflection differences is n
1(λ
1.5%), the 1st low-index layer 16 is the refractive index of the light of the wavelength of 1.5% to above-mentioned reflection differences is n
2(λ
1.5%), the refractive index of the light of the 1st transparency conducting layer 12 couples of wavelength 589nm is n
1(589), the refractive index of the light of the 1st low-index layer 16 couples of wavelength 589nm is n
2(589), time, preferred duplexer 10 meets the relation of following formula (1).
│n
1(λ
1.5％)/n
1(589)-n
2(λ
1.5％)/n
2(589)│<0.1…(1)
N
1(λ
1.5%)/n
1and n (589)
2(λ
1.5%)/n
2(589) value respectively more than 1.0 less than 1.1 scope in.N
1(λ
1.5%)/n
1and n (589)
2(λ
1.5%)/n
2(589) within the scope of this, n
1(λ
1.5%)≤n
1, and n (589)
2(λ
1.5%)≤n
2(589), therefore the 1st transparency conducting layer 12 and the 1st low-index layer 16 demonstrate positive wavelength dispersibility.
N
1(λ
1.5%), n
2(λ
1.5%), n
1and n (589)
2(589) such as Abbe index meter (manufacture of Atago Zhu Shi society), ellipsometer (the ellipsometer UVISEL that Horiba Ltd manufactures) etc. can be utilized to measure.Specifically, ellipsometer is utilized to measure n
1(λ
1.5%) and n
1(589) when, first, the material identical with the 1st transparency conducting layer is used to form transparency conducting layer on a glass, the refractive index under utilizing ellipsometer to measure each wavelength under the state of the glass plate with transparency conducting layer.Then n is obtained according to the refractive index of this each wavelength
1(λ
1.5%) and n
1(589).Similarly, ellipsometer is utilized to measure n
2(λ
1.5%) and n
2(589) when, first, the material identical with the 1st low-index layer is used to form low-index layer on a glass, the refractive index under utilizing ellipsometer to measure each wavelength under the state of the glass plate with low-index layer.Then n is obtained according to the refractive index of this each wavelength
2(λ
1.5%) and n
2(589).
1st low-index layer can be formed for multilayer, in this case, and the refractive index n of the 1st low-index layer
2(λ
1.5%) and n
2(589) mean that the 1st low-index layer entirety is the refractive index of the refractive index of the light of the wavelength of 1.5% and the light to wavelength 589nm to above-mentioned reflection differences.
The refractive index of material changes with wavelength, and therefore, the refractive index forming the layer of duplexer designs based on the refractive index of the light of wavelength 589nm usually.In 1st transparency conducting layer 12 and the 1st low-index layer 16, similarly, refractive index changes along with the wavelength of light, when meeting the relation of above-mentioned formula (1), the refractive index that the refractive index of the light of the 1st transparency conducting layer 12 and the 1st low-index layer 16 couples of wavelength 589nm and the 1st transparency conducting layer 12 and the 1st low-index layer 16 pairs of wavelength are less than the light in the visible ray short wavelength region of 450nm all diminishes.Therefore, even if utilize the refractive index of the light of wavelength 589nm to carry out the optical design for making sightless 1st transparency conducting layer 12 of the shape of the 1st transparency conducting layer 12 and the 1st low-index layer 16, can be also that more than 300nm is less than in the region of 450nm and makes above-mentioned reflection differences be less than 1.5% at wavelength.
By the L of the reverberation of the 1st transparency conducting layer 12 side in transparency conducting layer domain of the existence 10A
*a
*b
*the brightness L of colorimeter system
*, chromaticity coordinates a
*, and chromaticity coordinates b
*be set to brightness L respectively
* 1, chromaticity coordinates a
* 1, and chromaticity coordinates b
* 1, by the brightness L of the reverberation of the 1st low-index layer 16 side in non-for transparency conducting layer domain of the existence 10B
*, chromaticity coordinates a
*, and chromaticity coordinates b
*be set to brightness L respectively
* 2, chromaticity coordinates a
* 2, and chromaticity coordinates b
* 2time, preferred duplexer 10 meets following formula (2) ~ (4)." L
*a
*b
*colorimeter system ", " L
*", " a
*" and " b
*" be based on JIS Z8729.
0≦│L
* 1-L
* 2│≦1.5…(2)
0≦│a
* 1-a
* 2│≦2.5…(3)
0≦│b
* 1-b
* 2│≦6.0…(4)
By making duplexer 10 meet above-mentioned formula (2) ~ (4), particularly above-mentioned formula (4), the shape of the 1st transparency conducting layer 12 can be made further invisible.
According to the above-mentioned L of above-mentioned reverberation
* 1, L
* 2, a
* 1, a
* 2, b
* 1, and b
* 2the aberration Δ E of the reverberation of the 1st low-index layer 16 side in the reverberation of the 1st transparency conducting layer 12 side in calculated transparency conducting layer domain of the existence 10A and the non-domain of the existence 10B of transparency conducting layer
*ab is preferably less than 5.0." Δ E
*ab " be based on JIS Z8730.By the aberration Δ E of the reverberation of the non-domain of the existence 10B of reverberation and transparency conducting layer that makes transparency conducting layer domain of the existence 10A
*ab is less than 5.0, and the shape of the 1st transparency conducting layer 12 can be made further invisible.
Through the L of the light (through light) of transparency conducting layer domain of the existence 10A when will irradiate the light of incident angle 0 ° by transparent base 13 side (the 2nd hyaline layer 17 side) to transparency conducting layer domain of the existence 10A
*a
*b
*the brightness L of colorimeter system
*, chromaticity coordinates a
*, and chromaticity coordinates b
*be set to brightness L respectively
* 3, chromaticity coordinates a
* 3, and chromaticity coordinates b
* 3, through the brightness L of the light (through light) of transparency conducting layer domain of the existence 10A when will irradiate the light of incident angle 0 ° by transparent base 13 side (the 2nd hyaline layer 17 side) to the non-domain of the existence 10B of transparency conducting layer
*, chromaticity coordinates a
*, and chromaticity coordinates b
*be set to brightness L respectively
* 4, chromaticity coordinates a
* 4, and chromaticity coordinates b
* 4, now preferably duplexer 10 meets following formula (5) ~ (7).
0≦│L
* 3-L
* 4│≦0.5…(5)
0≦│a
* 3-a
* 4│≦0.5…(6)
0≦│b
* 3-b
* 4│≦1.0…(7)
According to the above-mentioned above-mentioned L through light
* 3, L
* 4, a
* 3, a
* 4, b
* 3, and b
* 4the aberration Δ E through light through light and the non-domain of the existence 10B of transparency conducting layer of calculated transparency conducting layer domain of the existence 10A
*ab is preferably less than 1.0.By making the aberration Δ E through light through light and the non-domain of the existence 10B of transparency conducting layer of transparency conducting layer domain of the existence 10A
*ab is less than 1.0, the shape of the 1st transparency conducting layer 12 can be made invisible when using contact panel.
Be that the duplexer 10 that use the 1st transparency conducting layer 12 arranges in the horizontal is described in above-mentioned, but as duplexer, also can be the duplexer 30 shown in Fig. 3 and Fig. 4 that such as the 1st transparency conducting layer 18 arranges in the vertical.
Duplexer 10 and duplexer 30 are only different in the configuration of the 1st transparency conducting layer 12 and the 1st transparency conducting layer 18.Therefore, also exist in the same manner as duplexer 10 in duplexer 30: as the region of existence the 1st transparency conducting layer 18 transparency conducting layer domain of the existence 30A and expose the non-domain of the existence 30B of transparency conducting layer in the region of the 1st low-index layer 16 as there is not the 1st transparency conducting layer 18.
In duplexer 30, in the same manner as duplexer 10, the region making wavelength that the light reflectance that measured by the 1st hyaline layer 12 side of transparency conducting layer domain of the existence 30A and the reflection differences of the light reflectance to be measured by the 1st low-index layer 16 side of the non-domain of the existence 30B of transparency conducting layer are 1.5% be present in more than 300nm to be less than 450nm.Therefore, in duplexer 30, the shape of the 1st hyaline layer 18 also can be made invisible.It should be noted that, other aspects are also identical with duplexer 10, and therefore the description thereof will be omitted herein.
< transparent base >
As transparent base 13, as long as there is light transmission be just not particularly limited, such as polyolefin substrate, polycarbonate substrate, polyacrylate base material, polyester base material, aromatic polyether ketone base material, polyether sulfone substrate, polyamide substrate or glass baseplate can be enumerated.
As polyolefin substrate, can enumerate such as using at least one such as polyethylene, polypropylene, cyclic polyolefin hydrocarbon base materials as the base material of constituent.As cyclic polyolefin hydrocarbon base material, the material such as with ENB skeleton can be enumerated.
As polycarbonate substrate, the fatty poly-ester carbonate such as aromatic copolycarbonate base material, the diethylene glycol bis-allyl carbonate base material etc. such as based on bisphenols (bisphenol-A etc.) can be enumerated.
As polyacrylate base material, such as poly-(methyl) methyl acrylate base material, poly-(methyl) ethyl acrylate base material, (methyl) methyl acrylate-(methyl) butyl acrylate copolymer base material etc. can be enumerated.
As polyester base material, can enumerate is such as the base material of constituent with at least one of PETG (PET), PTT, polybutylene terephthalate (PBT), PEN (PEN).
As aromatic polyether ketone base material, such as polyether-ether-ketone (PEEK) base material etc. can be enumerated.
Being not particularly limited the thickness of transparent base 13, can be more than 5 μm less than 300 μm, and from aspects such as treatability, the lower limit of the thickness of transparent base 13 is preferably more than 10 μm, is more preferably more than 50 μm.From the aspect of filming, the upper limit of the thickness of transparent base 13 is preferably below 200m.
In order to improve cementability, except carrying out except the physical treatment such as Corona discharge Treatment, oxidation processes to the surface of transparent base 13, also can utilize and being referred to as anchoring agent, the coating of subbing is coated with in advance.As anchoring agent, subbing agent, can use in the thermosetting resin such as polymer and epoxy resin etc. of such as polyurethane resin, mylar, polyvinyl chloride resin, polyvinyl acetate system resin, ethlyene dichloride-vinyl acetate copolymer, acrylic resin, polyvinyl alcohol resin, polyvinyl acetal resin, the copolymer of ethene and vinyl acetate or acrylic acid etc., the thermoplastic resin such as copolymer, olefin resin of ethene and styrene and/or butadiene etc. and/or its modified resin, photopolymerizable compound at least any one.
< the 1st hyaline layer >
As long as the 1st hyaline layer 14 has the transparency, preferably there is painting property firmly.When 1st hyaline layer 14 has hard painting property, there is in the pencil hardness test (4.9N load) that the surface of the 1st hyaline layer 14 specifies at JIS K5600-5-4 (1999) hardness of more than " H ".By making pencil hardness be more than " H ", the hardness of the 1st hyaline layer 14 can be made to be reflected into the surface of the 1st low-index layer 16 fully, can durability to be improved.It should be noted that, from the adaptation of the 1st high refractive index layer 15 be formed on the 1st hyaline layer 14, toughness and the aspect preventing warpage, the upper limit of the pencil hardness on the surface of the 1st hyaline layer 14 is preferably the degree of 4H.Contact panel sensor can be extruded repeatedly, require adaptation and the toughness with height, therefore, be set to 4H by the upper limit of the pencil hardness by the 1st hyaline layer 14, significant effect can have been given play to being arranged at when contact panel sensor uses by middle base material film 11.
The thickness of the 1st hyaline layer 14 is preferably more than 1 μm less than 10 μm.The thickness of the 1st hyaline layer 14, when this scope, can obtain desired hardness, can seek the filming of the 1st hyaline layer simultaneously.And, if heat transparent base 13 when formation the 1st transparency conducting layer 12, then this heating can cause separating out oligomer by transparent base 13 and showing gonorrhoea, by forming the 1st hyaline layer 14 with above-mentioned scope thickness, can suppress the precipitation of this oligomer.The thickness of the 1st hyaline layer can obtain as follows: take by utilizing such as scanning electron microscope (SEM), transmission electron microscope (TEM) or scanning transmission electron microscope (STEM), by the thickness of the cross section portrait mensuration 20 photographed, calculate the mean value of the value at 20 places, calculated the thickness of the 1st hyaline layer by this mean value.When the thickness of the 1st hyaline layer is more than 1 μm less than 10 μm, preferably use SEM.When SEM, preferred accelerating potential is 30kV, multiplying power is 1000 ~ 7000 times.
For the lower limit of the thickness of the 1st hyaline layer 14, from the viewpoint of breaking of suppression the 1st hyaline layer, be more preferably less than 5 μm.Further, from the viewpoint of suppressing warpage to produce while the filming of seeking the 1st hyaline layer, more preferably the thickness of the 1st hyaline layer 14 is more than 0.5 μm less than 5.0 μm.Wherein, when forming the 1st hyaline layer 14 on a face 13A of transparent base 13 and form the 2nd hyaline layer 17 as middle base material film 11 on the 13B of another face, can suppress to occur warpage on the 1st hyaline layer 14 and the 2nd hyaline layer 17, therefore the thickness of the 1st hyaline layer 14 also can more than 5 μm.
The refractive index of the 1st hyaline layer 14 can be less than more than 1.45 1.60.The lower limit of the refractive index of the 1st hyaline layer 14 can be the upper limit of the refractive index of the more than 1.50,1st hyaline layer 14 can be less than 1.58.For the refringence of transparent base 13 and the 1st hyaline layer 14, from the viewpoint of what suppress the visible phenomenon of interference fringe, be preferably within 0.10, be more preferably within 0.06.Herein, the surface of transparent base 13 is coated with anchoring agent and/or subbing agent, the refringence of transparent base 13 and the 1st hyaline layer 14 is the refringence of anchoring agent and/or subbing agent and the 1st hyaline layer.
The refractive index of the 1st hyaline layer 14 can measure by utilizing after forming independent layer Abbe index meter (Atago society manufactures NAR-4T) or ellipsometer.
1st hyaline layer 14 at least can be made up of resin.It should be noted that, except resin, also can contain particulate.
< resin >
Resin contains the polymer (cross-linking agent) of photopolymerizable compound.In resin, except the polymer (cross-linking agent) of photopolymerizable compound, also solvent-dry type resin, thermosetting resin can be contained.Photopolymerizable compound at least has an optical polymerism functional group." optical polymerism functional group " in this description is the functional group of penetrating polymerization reaction take place by illumination.The ethylenic double bonds such as (methyl) acryloyl group, vinyl, pi-allyl can be enumerated such as optical polymerism functional group.It should be noted that, the implication of " (methyl) acryloyl group " comprises both " acryloyl group " and " methacryl ".Further, as the light irradiated when being polymerized by photopolymerizable compound, the ionizing ray of luminous ray and ultraviolet, X-ray, electron ray, alpha ray, β ray and gamma-rays and so on can be enumerated.
As photopolymerizable compound, photopolymerization monomer, optical polymerism oligomer or optical polymerism polymer can be enumerated, use after suitable adjustment can being carried out to these.As photopolymerizable compound, the combination of preferred light polymerizable monomer and optical polymerism oligomer or photopolymerization monomer and optical polymerism polymer.
(photopolymerization monomer)
The weight average molecular weight of photopolymerization monomer is less than 1000.As photopolymerization monomer, preferably there is the polyfunctional monomer of the optical polymerism functional group of more than 2 (i.e. 2 officials' energy).
Can above monomer as 2 officials, such as trimethylolpropane tris (methyl) acrylate can be enumerated, tripropylene glycol two (methyl) acrylate, diethylene glycol (DEG) two (methyl) acrylate, dipropylene glycol two (methyl) acrylate, pentaerythrite three (methyl) acrylate, pentaerythrite four (methyl) acrylate, dipentaerythritol six (methyl) acrylate, 1,6-hexylene glycol two (methyl) acrylate, neopentyl glycol two (methyl) acrylate, trimethylolpropane tris (methyl) acrylate, double trimethylolpropane four (methyl) acrylate, dipentaerythritol five (methyl) acrylate, tripentaerythritol eight (methyl) acrylate, tetrapentaerythritol ten (methyl) acrylate, isocyanuric acid three (methyl) acrylate, isocyanuric acid two (methyl) acrylate, polyester three (methyl) acrylate, polyester two (methyl) acrylate, bis-phenol two (methyl) acrylate, diglycerol four (methyl) acrylate, adamantyl two (methyl) acrylate, isobornyl two (methyl) acrylate, bicyclopentane two (methyl) acrylate, tristane two (methyl) acrylate, double trimethylolpropane four (methyl) acrylate, or they are through the modified material such as PO, EO.
Among these, from the viewpoint of obtaining the 1st high hyaline layer of hardness, preferred pentaerythritol triacrylate (PETA), dipentaerythritol acrylate (DPHA), tetramethylol methane tetraacrylate (PETTA), Dipentaerythritol Pentaacrylate (DPPA) etc.
(optical polymerism oligomer)
The weight average molecular weight of optical polymerism oligomer is more than 1000 be less than 10000.
As optical polymerism oligomer, preferably 2 officials can above multifunctional oligomer.As multifunctional oligomer, polyester (methyl) acrylate, carbamate (methyl) acrylate, polyester-urethane (methyl) acrylate, polyethers (methyl) acrylate, polyalcohol (methyl) acrylate, melamine (methyl) acrylate, isocyanuric acid ester (methyl) acrylate, epoxy (methyl) acrylate etc. can be enumerated.
(optical polymerism polymer)
The weight average molecular weight of optical polymerism polymer is more than 10000, and weight average molecular weight is preferably less than more than 10,000 80000, is more preferably less than more than 10,000 40000.When weight average molecular weight is more than 80000, cause coating adaptive to reduce because viscosity is high, the outward appearance of the optical laminate obtained may worsen.As above-mentioned multifunctional polymer, carbamate (methyl) acrylate, isocyanuric acid ester (methyl) acrylate, polyester-urethane (methyl) acrylate, epoxy (methyl) acrylate etc. can be enumerated.
Solvent-dry type resin refers to that thermoplastic resin etc. carries out the dry resin just forming overlay film by means of only to the solvent added in order to solid constituent when adjusting coating.When adding solvent-dry type resin, when forming the 1st hyaline layer, effectively can prevent the overlay film defect of the coated face of masking liquid.
Solvent-dry type resin is not particularly limited, generally can uses thermoplastic resin.
As thermoplastic resin, such as phenylethylene resin series, (methyl) acrylic resin, vinyl acetate system resin, vinyl ethers system resin, halogen-containing resin, ester ring type olefin-based resin, polycarbonate-based resin, polyester based resin, polyamide series resin, cellulose derivative, silicon-type resin and rubber or elastomer etc. can be enumerated.
Thermoplastic resin is preferably amorphism and dissolves in organic solvent (particularly can dissolve the polymer of more than 2 and the general solvent of curability compound).Particularly from the viewpoint of transparent and weatherability, optimization styrene system resin, (methyl) acrylic resin, ester ring type olefin-based resin, polyester based resin, cellulose derivative (cellulose esters etc.) etc.
Thermosetting resin is not particularly limited, such as phenol resin, carbamide resin, diallyl phthalate resin, melmac, guanamine resin, unsaturated polyester resin, polyurethane resin, epoxy resin, amino-alkyd resin, melamine-urea aldehyde cocondensation resin, silicones, polyorganosiloxane resin etc. can be enumerated.
< particulate >
Particulate can be any one of inorganic particles or organic fine particles, and among these, preference is as silica (SiO
2) particulate, alumina particulate, titanium dioxide fine particles, tin oxide particles, antimony-doped tin oxide (be called for short; ATO) inorganic oxide particle such as particulate, zinc oxide fine particles.
As organic fine particles, such as plastic bead can be enumerated.As plastic bead, concrete example can enumerate polystyrene bead, melmac pearl, acrylic pearl, acrylic compounds-styrene pearl, organic silica bead, benzoguanamine pearl, benzoguanamine formaldehyde condensation pearl, Merlon pearl, polyethylene beads etc.
In order to form the 1st hyaline layer 14, first at the 1st hyaline layer composition of the surface of transparent base 13 coating at least containing photopolymerizable compound.Next, be sent to the region through heating in order to the 1st hyaline layer composition dries making painting membranaceous, utilize various known method to make the 1st hyaline layer composition dries evaporating solvent.Thereafter, to being coated with the light such as the 1st membranaceous hyaline layer composition irradiation ultraviolet radiation, making photopolymerizable compound be polymerized (being cross-linked), making the 1st hyaline layer composition solidify thus, forming the 1st hyaline layer 14.
As the method for coating the 1st hyaline layer composition, the known coating processes such as spin coating, infusion process, spray-on process, slip rubbing method, stick coating method, rolling method, gravure, mould Tu Fa can be enumerated.
Light when solidifying as making the 1st hyaline layer composition, under using ultraviolet situation, can utilize the ultraviolet etc. that ultrahigh pressure mercury lamp, high-pressure sodium lamp, low pressure mercury lamp, carbon arc, xenon arc, metal halide lamp etc. send.Further, as ultraviolet wavelength, the wave band of 190 ~ 380nm can be used.As the concrete example of electronic radial source, the various electron ray accelerators such as croft-Wa Erdun (Cockcroft-Walton) type of examining, model De Graff type, resonance transformer type, insulating core transformer type or linear pattern, Dynamitron type, high-frequency type can be enumerated.
Above-mentioned particulate, above-mentioned thermoplastic resin, above-mentioned thermosetting resin, solvent, polymerization initiator can be added as required in the 1st hyaline layer composition.And, in the 1st hyaline layer composition, existing known dispersant, surfactant, antistatic additive, silane coupler, thickener, anti-coloring agent, colouring agent (pigment, dyestuff), defoamer, levelling agent, fire retardant, ultra-violet absorber, bonding imparting agent, polymerization inhibitor, antioxidant, surface modifier, lubricant etc. can be added according to objects such as the hardness of raising the 1st hyaline layer, suppression cure shrinkage, control refractive indexes.
< solvent >
As solvent, such as alcohol (such as methyl alcohol can be enumerated, ethanol, propyl alcohol, isopropyl alcohol, n-butanol, sec-butyl alcohol, the tert-butyl alcohol, phenmethylol, PGME, ethylene glycol), ketone (acetone, methyl ethyl ketone (MEK), cyclohexanone, methyl iso-butyl ketone (MIBK), DAA, cycloheptanone, metacetone etc.), ethers (Isosorbide-5-Nitrae-dioxane, dioxolanes, diisopropyl ether dioxane, oxolane etc.), aliphatic hydrocarbon (hexane etc.), ester ring type hydro carbons (cyclohexane etc.), aromatic hydrocarbon based (toluene, dimethylbenzene etc.), halohydrocarbon class (carrene, dichloroethanes etc.), ester class (methyl formate, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, ethyl lactate etc.), cellosolve class (methyl cellosolve, ethyl cellosolve, butyl cellosolve etc.), cellosolve acetate class, sulfoxide type (dimethyl sulfoxide (DMSO) etc.), amide-type (dimethyl formamide, dimethylacetylamide etc.) etc., also can be these mixture.
< polymerization initiator >
Polymerization initiator is subject to illumination penetrate and decompose generation free radical thus cause the polymerization (being cross-linked) of photopolymerizable compound or make photopolymerizable compound carry out being polymerized the composition of (being cross-linked).
Polymerization initiator is not particularly limited, as long as be subject to discharging the material causing radical polymerization after illumination is penetrated.Polymerization initiator is not particularly limited; known polymerization initiator can be used, such as acetophenones, benzophenone, Michaelis benzoylbenzoic acid ester, α-pentoxime ester (amyloxim ester), thioxanthene ketone, phenylpropyl alcohol ketone, benzoin class, benzoin class, acylphosphine oxide class can be enumerated as concrete example.And preferably mixing sensitising agent uses, as its concrete example, such as n-butylamine, triethylamine, poly-normal-butyl phosphine etc. can be enumerated.
As above-mentioned polymerization initiator, when above-mentioned adhesive resin is the resin system with free-radical polymerised unsaturated group, preferably acetophenones, benzophenone, thioxanthene ketone, benzoin, benzoin methylether etc. to be used alone or used in combination.
For the content of polymerization initiator in the 1st hyaline layer composition, be preferably below more than 0.5 mass parts 10.0 mass parts relative to photopolymerizable compound 100 mass parts.By making the content of polymerization initiator within the scope of this, can fully keep firmly being coated with performance, and can suppress to solidify obstacle.
Being not particularly limited containing proportional (solid constituent) the 1st hyaline layer composition Raw, is usually preferably below more than 5 quality % 70 quality %, is more preferably below more than 25 quality % 60 quality %.
< the 1st high refractive index layer >
1st high refractive index layer 15 is layers of the refractive index of the refractive index had higher than the 1st hyaline layer 14.Specifically, the refractive index of the 1st high refractive index layer 15 can be less than more than 1.50 2.00.The lower limit of the refractive index of the 1st high refractive index layer 15 can be the upper limit of the refractive index of the more than 1.60,1st high refractive index layer 15 can be less than 1.75.The refractive index of the 1st high refractive index layer 15 can utilize the method identical with the refractive index of above-mentioned 1st hyaline layer 14 to measure.The refringence of the 1st hyaline layer 14 and the 1st high refractive index layer 15 can be less than more than 0.05 0.25.
The thickness of the 1st high refractive index layer 15 is preferably below 200nm.The thickness of the 1st high refractive index layer is the nm order of magnitude, therefore can obtain as follows: take by utilizing such as transmission electron microscope (TEM) or scanning transmission electron microscope (STEM), measured the thickness of 20 by the portrait in the cross section photographed, calculate the mean value of the value at 20 places.As the condition determination of TEM or STEM, preferred accelerating potential is 30kV, multiplying power is 50,000 ~ 300,000 times.The lower limit of the thickness of the 1st high refractive index layer 15 is preferably more than 10nm, is more preferably more than 30nm.The upper limit of the thickness of the 1st high refractive index layer 15 is preferably below 100nm, is more preferably below 70nm.
Be not particularly limited the 1st high refractive index layer 15, as long as have the layer of the refractive index of the refractive index higher than the 1st hyaline layer 14, the 1st high refractive index layer 15 can be made up of such as high-refractive index particulate and adhesive resin.
As the high-refractive index particulate of formation the 1st high refractive index layer 15, metal oxide microparticle can be enumerated.As metal oxide microparticle, such as titanium dioxide (TiO can be enumerated particularly
2, refractive index: 2.3 ~ 2.7), niobium oxide (Nb
2o
5, refractive index: 2.33), zirconia (ZrO
2, refractive index: 2.10), antimony oxide (Sb
2o
5, refractive index: 2.04), tin oxide (SnO
2, refractive index: 2.00), tin-doped indium oxide (ITO, refractive index: 1.95 ~ 2.00), cerium oxide (CeO
2, refractive index: 1.95), aluminium-doped zinc oxide (AZO, refractive index: 1.90 ~ 2.00), Ga-doped zinc oxide (GZO, refractive index: 1.90 ~ 2.00), zinc antimonates (ZnSb
2o
6, refractive index: 1.90 ~ 2.00), zinc oxide (ZnO, refractive index: 1.90), yittrium oxide (Y
2o
3, refractive index: 1.87), antimony-doped tin oxide (ATO, refractive index: 1.75 ~ 1.85), phosphorus doping tin oxide (PTO, refractive index: 1.75 ~ 1.85) etc.Among these, from the aspect preferential oxidation zirconium of refractive index.
The adhesive resin of formation the 1st high refractive index layer 15 is not particularly limited, thermoplastic resin can be used, but from the viewpoint of improving the polymer (cross-linking agent) being preferably thermosetting resin or photopolymerizable compound etc. of case hardness, be wherein more preferably the polymer of photopolymerizable compound.
As thermosetting resin, the resins etc. such as acrylic resin, carbamate resins, phenol resin, urea melmac, epoxy resin, unsaturated polyester resin, organic siliconresin can be enumerated.When making thermosetting resin cured, curing agent can be used.
Photopolymerizable compound is not particularly limited, photopolymerization monomer, oligomer, polymer can be used.As the photopolymerization monomer of 1 official's energy, (methyl) ethyl acrylate, (methyl) EHA, styrene, methyl styrene, NVP etc. can be enumerated.And, can above photopolymerization monomer as 2 officials, such as many hydroxymethyl-propane three (methyl) acrylate can be enumerated, hexylene glycol (methyl) acrylate, tripropylene glycol two (methyl) acrylate, diethylene glycol (DEG) two (methyl) acrylate, pentaerythrite three (methyl) acrylate, pentaerythrite four (methyl) acrylate, dipentaerythritol five (methyl) acrylate, dipentaerythritol six (methyl) acrylate, 1, 6-hexylene glycol two (methyl) acrylate, neopentyl glycol two (methyl) acrylate, the compound etc. that these compound ethane via epoxyethane, PEOs etc. are modified.
Further, these compounds also can be by importing aromatic rings, the halogen atom, sulphur, nitrogen, phosphorus atoms etc. beyond fluorine and the compound after refractive index being heightened.In addition, except above-claimed cpd, also can use mylar, polyether resin, acrylic resin, epoxy resin, carbamate resins, alkyd resins, spiral shell acetal resin, polybutadiene, polythiol-polyenoid resin etc. that the molecular weight with unsaturated double-bond is lower.When making photopolymerizable compound be polymerized (being cross-linked), the polymerization initiator illustrated in the item of the 1st hyaline layer can be used in.
1st high refractive index layer 15 can be formed by such as identical with the formation method of the 1st hyaline layer 14 method.Specifically, the 1st high refractive index layer composition of high-refractive index particulate and photopolymerizable compound is first at least contained in the coating of the surface of the 1st hyaline layer 14.Next, be sent to the region through heating in order to the 1st high refractive index layer composition dries making painting membranaceous, utilize various known method to make the 1st high refractive index layer composition dries evaporating solvent.Thereafter, to being coated with the light such as the 1st membranaceous high refractive index layer composition irradiation ultraviolet radiation, making photopolymerizable compound be polymerized (being cross-linked), the 1st high refracting layer composition can be made thus to solidify, forming the 1st high refractive index layer 15.
< the 1st low-index layer >
1st low-index layer 16 is layers of the refractive index of the refractive index had lower than the 1st high refractive index layer 15.Specifically, the refractive index of the 1st low-index layer 16 can be less than more than 1.35 1.55.The lower limit of the refractive index of the 1st low-index layer 16 can be the upper limit of the refractive index of the more than 1.40,1st low-index layer 16 can be less than 1.50.The refractive index of the 1st low-index layer 16 can utilize the method identical with the refractive index of above-mentioned 1st hyaline layer 14 to measure.The refringence of the 1st high refractive index layer 15 and the 1st low-index layer 16 can be less than more than 0.10 0.25.
The thickness of the 1st low-index layer 16 is preferably below 200nm.The thickness of the 1st low-index layer is the nm order of magnitude, the thickness of the 1st low-index layer can obtain as follows: take by utilizing such as transmission electron microscope (TEM) or scanning transmission electron microscope (STEM), measured the thickness of 20 by the portrait in the cross section photographed, calculate the mean value of the value at 20 places.As the condition determination of TEM or STEM, preferred accelerating potential is 30kV, multiplying power is 50,000 ~ 300,000 times.The lower limit of the thickness of the 1st low-index layer 16 is preferably more than 10nm, is more preferably more than 15nm.The upper limit of the thickness of the 1st low-index layer 16 is preferably below 100nm, is more preferably below 50nm.
Be not particularly limited the 1st low-index layer 16, as long as have the layer of the refractive index of the refractive index lower than the 1st high refractive index layer 15, the 1st low-index layer 16 can be formed by such as low-refraction particulate and adhesive resin or is made up of low refractive index resin.
As low-refraction particulate, the full particle or hollow particle etc. that are such as made up of silica or magnesium fluoride can be enumerated.Among these, preferred hollow silica particle, such hollow silica particle can be made by the manufacture method recorded in the embodiment of such as Japanese Unexamined Patent Publication 2005-099778 publication.
As low-refraction particulate, be preferably used in the reactive silicon dioxide particulate that silica surface has reactive functional groups.As reactive functional groups, preferred light polymerizable functional group.Such reactive silicon dioxide particulate can carry out surface treatment to make to silicon dioxide microparticle by utilizing silane coupler etc.As the method that the surface utilizing silane coupler to silicon dioxide microparticle processes, can enumerate to the dry process of silicon dioxide microparticle spraying silane coupler, disperse in a solvent interpolation silane coupler afterwards to carry out the damp process etc. reacted silicon dioxide microparticle.
As the adhesive resin of formation the 1st low-index layer 16, the adhesive resin same with the adhesive resin forming the 1st high refractive index layer 15 can be enumerated.Wherein, the material that the refractive index such as resin, organopolysiloxane that is imported with fluorine atom is low also can be mixed in adhesive resin.
As low refractive index resin, the resin that the refractive index such as resin, organopolysiloxane that is imported with fluorine atom is low can be enumerated.
1st low-index layer 16 can be formed by such as identical with the formation method of the 1st hyaline layer 14 method.Specifically, the 1st low-index layer composition of low-refraction particulate and photopolymerizable compound is first at least contained in the coating of the surface of the 1st high refractive index layer 15.Next, be sent to the region through heating in order to the 1st low-index layer composition dries making painting membranaceous, utilize various known method to make the 1st low-index layer composition dries evaporating solvent.Thereafter, to being coated with the light such as the 1st membranaceous high refractive index layer composition irradiation ultraviolet radiation, making photopolymerizable compound be polymerized (being cross-linked), the 1st forming low-refractive-index layer composition can be made thus to solidify, forming the 1st low-index layer 16.
Also index layer (not shown) in can arranging between the 1st high refractive index layer 15 and the 1st low-index layer 16, described middle index layer has the refractive index of the refractive index lower than the 1st high refractive index layer 15 and the refractive index higher than the 1st low-index layer 16.
< the 2nd hyaline layer >
2nd hyaline layer 17 preferably has painting property firmly.When 2nd hyaline layer 17 has hard painting property, there is in the pencil hardness test (4.9N load) that the surface of the 2nd hyaline layer 17 specifies at JIS K5600-5-4 (1999) hardness of more than " H ".It should be noted that, for the reason same with the reason recorded in the 1st hyaline layer 14, the upper limit of the pencil hardness on the surface of the 2nd hyaline layer 17 is preferably the degree of 4H.
The thickness of the 2nd hyaline layer 17 can be less than 5 μm, another face 13B of transparent base 13 is provided with the 2nd hyaline layer 17, due to the 1st hyaline layer 14 must be provided with on a face 13A of transparent base 13, therefore also can more than 5 μm for above-mentioned reason.When the thickness of the 1st hyaline layer 13 is more than 0.5 μm less than 5.0 μm, the thickness of the 2nd hyaline layer 17 is preferably more than 0.5 μm less than 5.0 μm.
For the refractive index of the 2nd hyaline layer 17, for the reason identical with the reason illustrated in the item of the 1st hyaline layer 14, it can be less than more than 1.45 1.60.The lower limit of the refractive index of the 2nd hyaline layer 17 can be the upper limit of the refractive index of the more than 1.50,2nd hyaline layer 17 can be less than 1.58.For the refringence of transparent base 13 and the 2nd hyaline layer 17, from the viewpoint of what suppress the visible phenomenon of interference fringe, within being preferably 0.10, be more preferably within 0.06.The refractive index of the 2nd hyaline layer 17 can be measured by the method identical with the refractive index of above-mentioned 1st hyaline layer 14.
2nd hyaline layer can utilize and be formed with the materials and methods recorded in the item of the 1st hyaline layer.
< the 1st transparency conducting layer >
1st transparency conducting layer 12,18 is connected with portion of terminal (not shown) by taking-up pattern (not shown).
1st transparency conducting layer 12,18 is made up of transparent conductive material.As transparent conductive material, tin-doped indium oxide (ITO), antimony-doped tin oxide (ATO), zinc oxide, indium oxide (In can be enumerated
2o
3), aluminium-doped zinc oxide (AZO), Ga-doped zinc oxide (GZO), tin oxide, zinc oxide-Sn system, indium oxide-tin oxide system, the metal oxide etc. such as zinc oxide-indium oxide-magnesia system.
The thickness of the 1st transparency conducting layer 12,18 can carry out suitable setting according to the specification etc. of resistance, is preferably such as more than 10nm below 50nm.
The formation method of the 1st transparency conducting layer 12,18 is not particularly limited, sputtering method, vacuum vapour deposition, ion plating method, CVD, rubbing method, print process etc. can be used.As the method for the 1st transparency conducting layer 12,18 being carried out to patterning, such as photolithography can be enumerated.
It should be noted that, when the 2nd hyaline layer 17 possessing the 2nd high refractive index layer and the 2nd low-index layer, can the 2nd patterned transparency conducting layer be set on the 2nd low-index layer.2nd transparency conducting layer is preferably the formation (thickness, configuration etc.) same with the 1st transparency conducting layer 12.Further, the 2nd transparency conducting layer 51 can be made up of the material same with the 1st transparency conducting layer 12.
(contact panel sensor)
Duplexer 10,30 can be installed in such as contact panel sensor and use.Fig. 5 is the schematic pie graph of the contact panel sensor of the duplexer being provided with present embodiment, and Fig. 6 is the schematic pie graph of other contact panel sensor of the duplexer being provided with present embodiment.
Contact panel sensor 40 shown in Fig. 5 has the structure of duplexer 10 and duplexer 30 lamination.Be provided with transparent adhesion coating 41 between duplexer 10 and duplexer 30, and duplexer 10 is provided with transparent adhesion coating 42.That is, duplexer 10 and duplexer 30 are fitted by transparent adhesion coating 41, and contact panel sensor 40 can be fitted with miscellaneous part by transparent adhesion coating 42.
1st transparency conducting layer 12 of duplexer 10 plays a role as the top electrode layer of contact panel sensor 40, and the 1st transparency conducting layer 18 of duplexer 30 plays a role as the lower electrode layer of contact panel sensor 40.
Duplexer 30 also can be installed on the contact panel sensor of other modes.Contact panel sensor 50 shown in Fig. 6 possesses: duplexer 30, be located at duplexer 30 the 1st transparency conducting layer 18 on and patterned the 2nd transparency conducting layer 51, transparent adhesion coating 52 for fit the 1st transparency conducting layer 18 and the 2nd transparency conducting layer 51.2nd transparency conducting layer 51 is formed on a face of glass plate 53, and the 2nd transparency conducting layer 51 is integrated with glass plate 53.
1st transparency conducting layer 18 plays a role as the lower electrode layer of contact panel sensor 50, and the 2nd transparency conducting layer 51 plays a role as the top electrode layer of contact panel sensor 50.
< the 2nd transparency conducting layer >
2nd transparency conducting layer 51 is preferably the formation (thickness, configuration etc.) same with the 1st transparency conducting layer 12.Further, the 2nd transparency conducting layer 51 can be made up of the material same with the 1st transparency conducting layer 12.
The transparent adhesion coating > of <
As transparent adhesion coating 41,42,52, known pressure-sensitive adhesive layer and adhesive sheet can be enumerated.
[embodiment]
In order to explain the present invention, below enumerating embodiment and being described, but the invention is not restricted to these records.
The preparation > of < hyaline layer composition
First, by each composition of composition mixture as follows, hyaline layer composition is obtained.
(hyaline layer composition)
Pentaerythritol triacrylate (PETA) (Japanese chemical drug society manufactures, ProductName " KAYARAD-PET-30 "): 50 mass parts
Photoepolymerizationinitiater initiater (BASF society manufactures, ProductName " Irgacure 184 "): 2 mass parts
Silicone-based levelling agent (the industrial society that refines large day manufactures, ProductName " SEIKA-BEAM 10-28 ", solid constituent 10%): 0.1 mass parts
Methyl iso-butyl ketone (MIBK) (MIBK): 60 mass parts
Cyclohexanone: 15 mass parts
The preparation > of < high refractive index layer composition
By each composition of composition mixture as follows, obtain high refractive index layer composition.
(high refractive index layer composition 1)
Pentaerythritol triacrylate (PETA) (Japanese chemical drug society manufactures, ProductName " KAYARAD-PET-30 "): 13 mass parts
Zirconia particles (high refractive index particle, Osaka, Sumitomo cement society manufacture, ProductName " MZ-230X ", solid constituent 32.5%, average grain diameter 25nm): 70 mass parts
Silica dioxide granule (lubricant, CIK Nano Tek society manufacture, ProductName " SIRMIBK-H84 ", solid constituent 30%): 0.5 mass parts
Photoepolymerizationinitiater initiater (BASF society manufactures, ProductName " Irgacure 127 "): 1 mass parts
Silicone-based levelling agent (the industrial society that refines large day manufactures, ProductName " SEIKA-BEAM 10-28 ", solid constituent 10%): 0.4 mass parts
Methyl iso-butyl ketone (MIBK) (MIBK): 450 mass parts
Cyclohexanone: 250 mass parts
Methyl ethyl ketone: (MEK): 450 mass parts
(high refractive index layer composition 2)
Pentaerythritol triacrylate (PETA) (Japanese chemical drug society manufactures, ProductName " KAYARAD-PET-30 "): 16 mass parts
Zirconia particles (high refractive index particle, Osaka, Sumitomo cement society manufacture, ProductName " MZ-230X ", solid constituent 32.5%, average grain diameter 25nm): 62 mass parts
Silica dioxide granule (lubricant, CIK Nano Tek society manufacture, ProductName " SIRMIBK-H84 ", solid constituent 30%): 0.5 mass parts
Photoepolymerizationinitiater initiater (BASF society manufactures, ProductName " Irgacure 127 "): 1 mass parts
Silicone-based levelling agent (the industrial society that refines large day manufactures, ProductName " SEIKA-BEAM 10-28 ", solid constituent 10%): 0.4 mass parts
Methyl iso-butyl ketone (MIBK) (MIBK): 450 mass parts
Cyclohexanone: 250 mass parts
Methyl ethyl ketone: (MEK): 450 mass parts
(high refractive index layer composition 3)
Pentaerythritol triacrylate (PETA) (Japanese chemical drug society manufactures, ProductName " KAYARAD-PET-30 "): 11 mass parts
Zirconia particles (high refractive index particle, Osaka, Sumitomo cement society manufacture, ProductName " MZ-230X ", solid constituent 32.5%, average grain diameter 25nm): 78 mass parts
Silica dioxide granule (lubricant, CIK Nano Tek society manufacture, ProductName " SIRMIBK-H84 ", solid constituent 30%): 0.5 mass parts
Photoepolymerizationinitiater initiater (BASF society manufactures, ProductName " Irgacure 127 "): 0.8 mass parts
Silicone-based levelling agent (the industrial society that refines large day manufactures, ProductName " SEIKA-BEAM 10-28 ", solid constituent 10%): 0.4 mass parts
Methyl iso-butyl ketone (MIBK) (MIBK): 450 mass parts
Cyclohexanone: 250 mass parts
Methyl ethyl ketone: (MEK): 450 mass parts
The preparation > of < low-index layer composition
By each composition of composition mixture as follows, obtain low-index layer composition.
(low-index layer composition)
Pentaerythritol triacrylate (PETA) (Japanese chemical drug society manufactures, ProductName " KAYARAD-PET-30 "): 5 mass parts
Silica sol granule (low-refraction particle, Nissan Chemical Industries society manufacture, MIBK-ST, solid constituent 30%, average grain diameter 10 ~ 15nm): 15 mass parts
Photoepolymerizationinitiater initiater (BASF society manufactures, ProductName " Irgacure 127 "): 0.7 mass parts
Silicone-based levelling agent (the industrial society that refines large day manufactures, ProductName " SEIKA-BEAM 10-28 ", solid constituent 10%): 0.2 mass parts
Methyl iso-butyl ketone (MIBK) (MIBK): 1000 mass parts
Cyclohexanone: 250 mass parts
< embodiment 1>
Prepare the PETG base material (ProductName " A4300 ", spinning society of Japan manufacture) as the thickness 100 μm of transparent base, at the one side coating hyaline layer composition of PETG base material, form film.Next, face toward formed film with the dry air of the flow rate 70 DEG C of 0.2m/s after 15 seconds, further with the dry air 30 seconds of the flow rate 70 DEG C of 10m/s, make it dry, make the solvent in film evaporate thus, be 300mJ/cm with accumulated light under nitrogen atmosphere (below oxygen concentration 200ppm)
2mode irradiation ultraviolet radiation, make curing of coating, forming thickness is thus the 2nd hyaline layer of 4 μm.Next, upset PETG base material, another face of PETG base material is coated with hyaline layer composition similar to the above, forms film.Next, face toward formed film with the dry air of the flow rate 70 DEG C of 0.2m/s after 15 seconds, further with the dry air 30 seconds of the flow rate 70 DEG C of 10m/s, make it dry, make the solvent in film evaporate thus, be 100mJ/cm with accumulated light under nitrogen atmosphere (below oxygen concentration 200ppm)
2mode irradiation ultraviolet radiation, make curing of coating, forming thickness is thus the 1st hyaline layer of 4 μm, thus forms hyaline layer on the two sides of PETG base material.Next, the 1st hyaline layer on another face being formed at PETG base material is coated with high refractive index layer composition, forms film.Then, by formed film 40 DEG C of dryings after 1 minute, with 100mJ/cm under nitrogen atmosphere (below oxygen concentration 200ppm)
2accumulated light carry out Ultraviolet radiation, make it solidification, formed thickness be the high refractive index layer of 45nm.Next, high refractive index layer is coated with low-index layer composition, forms film.Then, by formed film 40 DEG C of dryings after 1 minute, with 100mJ/cm under nitrogen atmosphere (below oxygen concentration 200ppm)
2accumulated light carry out Ultraviolet radiation, make it solidification, formed thickness be the low-index layer of 20nm.Produce middle base material film thus.
After producing middle base material film, it is the ITO layer of 26nm that the surface of low-index layer forms thickness by sputtering method.After forming tin-doped indium oxide (ITO) layer, photolithographic techniques is utilized to carry out patterning to ITO layer.Produce the ITO layer domain of the existence that has and there is ITO layer thus and there is not ITO layer and expose the duplexer of the embodiment 1 of the non-domain of the existence of ITO layer of low-index layer.Ellipsometer (manufacture of ellipsometer UVISEL Horiba Ltd) is utilized to measure the refractive index at the wavelength 589nm place of the 1st hyaline layer of embodiment 1, the 2nd hyaline layer, high refractive index layer, low-index layer, ITO layer respectively, the refractive index of the 1st hyaline layer and the 2nd hyaline layer is 1.52 as a result, the refractive index of high refractive index layer is 1.67, the refractive index of low-index layer is 1.49, and the refractive index of ITO layer is 2.0.
< embodiment 2>
In embodiment 2, except using high refractive index layer composition 2 to replace, except high refractive index layer composition 1, operating similarly to Example 1, produce middle base material film.Utilize ellipsometer (manufacture of ellipsometer UVISEL Horiba Ltd) to measure the refractive index at the wavelength 589nm place of the high refractive index layer of embodiment 2, result refractive index is 1.63.
< embodiment 3>
In embodiment 3, except using high refractive index layer composition 3 replace high refractive index layer composition 1 and make the thickness of high refractive index layer be except 30nm, operating similarly to Example 1, producing middle base material film.Utilize ellipsometer (manufacture of ellipsometer UVISEL Horiba Ltd) to measure the refractive index at the wavelength 589nm place of the high refractive index layer of embodiment 3, result refractive index is 1.70.
< comparative example >
In comparative example, except using high refractive index layer composition 2 replace high refractive index layer composition 1 and make the thickness of high refractive index layer be except 50nm, operating similarly to Example 1, producing middle base material film.Utilize ellipsometer (manufacture of ellipsometer UVISEL Horiba Ltd) to measure the refractive index at the wavelength 589nm place of the high refractive index layer of comparative example, result refractive index is 1.63.
The spectral reflectance > of the ITO layer domain of the existence in < duplexer and the non-domain of the existence of ITO layer
In the duplexer that embodiment and comparative example obtain, as follows the spectral reflectance of ITO layer domain of the existence and the spectral reflectance of the non-domain of the existence of ITO layer are measured.First, the 2nd hyaline layer with the face of the face opposite side of PETG substrate side on paste black belt (YAMATO adhesive tape No200-38-21 38mm is wide), then irradiate light by ITO layer side respectively to the ITO layer domain of the existence of each duplexer and the non-domain of the existence of ITO layer with the incident angle of 5 °, measure ITO layer domain of the existence and the non-domain of the existence of ITO layer spectral reflectance separately according to the reverberation in respective normal reflection direction.Specifically, spectral reflectance uses spectrophotometer (manufacture of society of UV3100PC Shimadzu Seisakusho Ltd.) to measure.For obtained spectral reflectance, use UVProbe software, carry out data conversion by data calculation, utilize differential conversion method by carrying out 2 process to the Δ λ 40.000 of smoothing, thus smoothingization.Calculating send as an envoy to ITO layer domain of the existence and the non-domain of the existence of ITO layer to light reflectance difference by this spectral reflectance through smoothing is the wavelength of 1.5%.
The observability of <ITO layer evaluates >
Under the duplexer obtained in embodiment and comparative example is placed in 3 wavelength fluorescent lamps in ITO layer side mode upward, by ITO layer side by the visual observability evaluation carrying out ITO layer.Metewand is as follows.
Zero: the shape of ITO layer is invisible or roughly invisible.
×: the shape of ITO layer is visible.
The brightness L of < reverberation
*, chromaticity coordinates a
*, chromaticity coordinates b
*, and aberration Δ E
*ab>
In the duplexer that embodiment and comparative example obtain, obtain L respectively by the reverberation of ITO layer domain of the existence and the reverberation of the non-domain of the existence of ITO layer as follows
*a
*b
*the brightness L of colorimeter system
*, chromaticity coordinates a
*, chromaticity coordinates b
*, obtain the aberration Δ E of the reverberation of ITO layer domain of the existence and the reverberation of the non-domain of the existence of ITO layer simultaneously
*ab.First, the 2nd hyaline layer with the face of the face opposite side of PETG substrate side on paste black belt (YAMATO adhesive tape No200-38-21 38mm is wide), then irradiated light with the incident angle of 5 ° by the ITO layer domain of the existence of each duplexer of ITO layer side direction, irradiated light by the non-domain of the existence of the ITO layer of each duplexer of low-index layer side direction, obtain L respectively by the reverberation in respective normal reflection direction
*a
*b
*the brightness L of colorimeter system
*, chromaticity coordinates a
*, chromaticity coordinates b
*.Further, by calculated brightness L
*, chromaticity coordinates a
*, chromaticity coordinates b
*obtain Δ E
*ab.Brightness L
*, chromaticity coordinates a
*, chromaticity coordinates b
*, and aberration Δ E
*ab utilizes spectrophotometer (manufacture of society of UV3100PC Shimadzu Seisakusho Ltd.) to calculate.
< is through the brightness L of light
*, chromaticity coordinates a
*, chromaticity coordinates b
*, and aberration Δ E
*ab>
In the duplexer that embodiment and comparative example obtain, respectively obtain L through light and the non-domain of the existence of ITO layer through light as follows by ITO layer domain of the existence
*a
*b
*the brightness L of colorimeter system
*, chromaticity coordinates a
*, chromaticity coordinates b
*, obtain the aberration Δ E through light through light and the non-domain of the existence of ITO layer of ITO layer domain of the existence simultaneously
*ab.Irradiate light with the incident angle of 0 ° respectively by the ITO layer domain of the existence of each duplexer of the 2nd hyaline layer side direction and the non-domain of the existence of ITO layer, obtain L by respective respectively through light
*a
*b
*the brightness L of colorimeter system
*, chromaticity coordinates a
*, chromaticity coordinates b
*.Further, by calculated brightness L
*, chromaticity coordinates a
*, chromaticity coordinates b
*obtain Δ E
*ab.Brightness L
*, chromaticity coordinates a
*, chromaticity coordinates b
*, and aberration Δ E
*ab uses spectrophotometer (manufacture of society of UV3100PC Shimadzu Seisakusho Ltd.) to calculate.
< wavelength dispersion characteristics >
The relation whether meeting above-mentioned formula (1) for the ITO layer of embodiment 1 ~ 3 and low-index layer is investigated.First, use the ITO identical with embodiment 1 on a glass, and utilize the method identical with embodiment 1 to form the ITO layer of thickness 50nm, obtain sample A.Further, other glass plate uses the low-index layer composition identical with embodiment 1, and utilize the method identical with embodiment 1 to form the low-index layer of thickness 50nm, prepare out sample B.It should be noted that, embodiment 2 is identical with low-index layer with the ITO layer of embodiment 1 with low-index layer with the ITO layer of 3, and therefore the ITO layer of embodiment 2 and 3 and low-index layer also can utilize sample A and sample B to evaluate.Then, use sample A, ellipsometer (manufacture of ellipsometer UVISEL Horiba Ltd) is utilized to measure the refractive index of each wavelength in the wavelength 300 ~ 800nm of ITO layer, according to the refractive index of this each wavelength, calculating the above-mentioned light reflectance of ITO layer domain of the existence light and the ITO layer non-domain of the existence difference that makes of trying to achieve is refractive index n under the wavelength of 1.5%
1(λ
1.5refractive index n %) and under wavelength 589nm
1(589).Similarly, use sample B, ellipsometer (manufacture of ellipsometer UVISEL Horiba Ltd) is utilized to measure the refractive index of each wavelength in the wavelength 300 ~ 800nm of low-index layer, according to the refractive index of this each wavelength, calculating the above-mentioned light reflectance of ITO layer domain of the existence light and the ITO layer non-domain of the existence difference that makes of trying to achieve is refractive index n under the wavelength of 1.5%
2(λ
1.5refractive index n %) and under wavelength 589nm
2(589).Then, n is obtained by these values
1(λ
1.5%)/n
1and n (589)
2(λ
1.5%)/n
2(589) its difference, is calculated.
Below table 1 ~ table 3 will be the results are shown in.
[table 1]
[table 2]
[table 3]
Fig. 7 ~ 9 are display ITO layer domain of the existences of duplexer of embodiment 1 ~ 3 and the curve map of the respective reflectance spectrum of the non-domain of the existence of ITO, and Figure 10 is the curve map of the ITO layer domain of the existence of duplexer in display comparative example and the reflectance spectrum of the non-domain of the existence of ITO.As shown in table 1 and Figure 10, in comparative example, the light reflectance difference of ITO layer domain of the existence and the non-domain of the existence of ITO layer be 1.5% wavelength be present in more than 450nm, therefore the shape of ITO layer is visible.On the other hand, as shown in table 1 and Fig. 7 ~ 9, in embodiment 1 ~ 3, the light reflectance difference of ITO layer domain of the existence and the non-domain of the existence of ITO layer be 1.5% wavelength be present in more than 300nm and be less than in the region of 450nm, therefore the shape of ITO layer is roughly invisible.
In the ITO layer of embodiment 1, the refractive index n when light reflectance difference of ITO layer domain of the existence and the non-domain of the existence of ITO layer is the wavelength 439nm of 1.5%
1(λ
1.5be %) 2.08549, refractive index n during wavelength 589nm
1(589) be 2.00451, therefore n
1(λ
1.5%)/n
1(589) be 1.040399.On the other hand, in the low-index layer of embodiment 1, refractive index n during wavelength 439nm
2(λ
1.5be %) 1.503236, refractive index n during wavelength 589nm
2(589) be 1.490336, therefore n
2(λ
1.5%)/n
2(589) be 1.00865585.Therefore, n
1(λ
1.5%)/n
1and n (589)
2(λ
1.5%)/n
2(589) difference is 0.031743, confirms the relation that the ITO layer of embodiment 1 and low-index layer meet above-mentioned formula (1).
In the ITO layer of embodiment 2, the refractive index n when light reflectance difference of ITO layer domain of the existence and the non-domain of the existence of ITO layer is the wavelength 446nm of 1.5%
1(λ
1.5be %) 2.084547, therefore n
1(λ
1.5%)/n
1(589) be 1.039928.On the other hand, in the low-index layer of embodiment 2, refractive index n during wavelength 446nm
2(λ
1.5be %) 1.503101, therefore n
2(λ
1.5%)/n
2(589) be 1.00856514.Therefore, n
1(λ
1.5%)/n
1and n (589)
2(λ
1.5%)/n
2(589) difference is 0.031363, confirms the relation that the ITO layer of embodiment 2 and low-index layer meet above-mentioned formula (1).It should be noted that, the ITO layer of embodiment 2 and low-index layer are to the refractive index n of wavelength 589nm
1and n (589)
2(589) with the ITO layer of embodiment 1 and low-index layer to the refractive index n of wavelength 589nm
1and n (589)
2(589) be identical value.
In the ITO layer of embodiment 3, the refractive index n when light reflectance difference of ITO layer domain of the existence and the non-domain of the existence of ITO layer is the wavelength 442nm of 1.5%
1(λ
1.5be %) 2.083618, therefore n
1(λ
1.5%)/n
1(589) be 1.039465.On the other hand, in the low-index layer of embodiment 3, refractive index n during wavelength 442nm
2(λ
1.5be %) 1.502966, therefore n
2(λ
1.5%)/n
2(589) be 1.00847499.Therefore, n
1(λ
1.5%)/n
1and n (589)
2(λ
1.5%)/n
2(589) difference is 0.03099, confirms the relation that the ITO layer of embodiment 3 and low-index layer meet above-mentioned formula (1).It should be noted that, the ITO layer of embodiment 3 and low-index layer are to the refractive index n of wavelength 589nm
1and n (589)
2(589) with the ITO layer of embodiment 1 and low-index layer to the refractive index n of wavelength 589nm
1and n (589)
2(589) be identical value.
[symbol description]
10,30 ... duplexer
11 ... middle base material film
12,18 ... 1st transparency conducting layer
13 ... transparent base
14 ... 1st hyaline layer
15 ... 1st high refractive index layer
16 ... 1st low-index layer
17 ... 2nd hyaline layer
40,50 ... contact panel sensor
Claims (6)
1. a duplexer, it possesses:
Middle base material film and
Lamination on described middle base material film and patterned transparency conducting layer,
Wherein,
Described middle base material film possesses:
Transparent base,
Be located at the hyaline layer on a face of described transparent base,
Lamination on described hyaline layer and have the refractive index of the refractive index higher than described hyaline layer high refractive index layer and
Lamination is on described high refractive index layer and have the low-index layer of the refractive index lower than described high refractive index layer,
Described transparency conducting layer is formed at the part surface of described low-index layer,
The region making wavelength that the light reflectance that measured by the transparency conducting layer side of transparency conducting layer domain of the existence and the reflection differences of the light reflectance measured by the low-index layer side of the non-domain of the existence of transparency conducting layer are 1.5% be present in more than 300nm to be less than 450nm, described transparency conducting layer domain of the existence is the region having described transparency conducting layer, and the non-domain of the existence of described transparency conducting layer is the region that there is not described transparency conducting layer, expose described low-index layer.
2. duplexer as claimed in claim 1, wherein,
If the refractive index that described transparency conducting layer is the light of the wavelength of 1.5% to described reflection differences is n
1(λ
1.5%), described low-index layer be the refractive index of the light of the wavelength of 1.5% to described reflection differences is n
2(λ
1.5%), described transparency conducting layer is n to the refractive index of the light of wavelength 589nm
1(589), described low-index layer is n to the refractive index of the light of wavelength 589nm
2(589), time, the relation of following formula is met:
│n
1(λ
1.5％)/n
1(589)-n
2(λ
1.5％)/n
2(589)│<0.1。
3. duplexer as claimed in claim 1, wherein,
At the wavelength being 1.5% be that in the region of 780nm, described reflection differences is less than 1.5% from described reflection differences to wavelength.
4. duplexer as claimed in claim 1, wherein,
The L of the reverberation of the low-index layer side in the reverberation of the transparency conducting layer side in described transparency conducting layer domain of the existence and the non-domain of the existence of described transparency conducting layer
*a
*b
*the aberration Δ E of colorimeter system
*ab is less than 5.0.
5. duplexer as claimed in claim 1, wherein,
When irradiating light by transparency conducting layer domain of the existence described in transparent base side direction through described transparency conducting layer domain of the existence through light, with the L through light through described transparency conducting layer domain of the existence when irradiating light by the non-domain of the existence of transparency conducting layer described in transparent base side direction
*a
*b
*the aberration Δ E of colorimeter system
*ab is less than 1.0.
6. a contact panel sensor, it possesses:
Top electrode layer and
With the described top electrode layer lower electrode layer configured at predetermined spaced intervals,
Wherein, described contact panel sensor is for duplexer according to claim 1, and the described transparency conducting layer of described duplexer plays a role as described top electrode layer or described lower electrode layer.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013211232A JP5574253B1 (en) | 2013-10-08 | 2013-10-08 | Laminated body and touch panel sensor |
| JP2013-211232 | 2013-10-08 |
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| Publication Number | Publication Date |
|---|---|
| CN104512063A true CN104512063A (en) | 2015-04-15 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410510043.4A Pending CN104512063A (en) | 2013-10-08 | 2014-09-28 | Laminated body and touch panel sensor |
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| Country | Link |
|---|---|
| JP (1) | JP5574253B1 (en) |
| CN (1) | CN104512063A (en) |
Cited By (1)
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| CN107082901A (en) * | 2016-02-12 | 2017-08-22 | 株式会社凸版巴川光学薄膜 | The manufacture method of transparent laminated film, the nesa coating with the transparent laminated film and touch panel and transparent laminated film |
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| JP5767744B1 (en) * | 2014-03-31 | 2015-08-19 | 積水ナノコートテクノロジー株式会社 | Light transmissive conductive film and touch panel having the same |
| JP5907218B2 (en) * | 2014-08-19 | 2016-04-26 | 大日本印刷株式会社 | Intermediate base film, conductive film and touch panel sensor |
| JP6803655B2 (en) * | 2015-07-17 | 2020-12-23 | 株式会社トッパンＴｏｍｏｅｇａｗａオプティカルフィルム | Transparent laminated film, transparent conductive film, touch panel and display device |
| JP6953170B2 (en) * | 2017-04-19 | 2021-10-27 | 日東電工株式会社 | Conductive film and touch panel |
| US10145241B1 (en) | 2018-02-15 | 2018-12-04 | Electricwaze LLC | Roadway conduit systems and methods |
| US10913178B2 (en) | 2018-02-15 | 2021-02-09 | Electricwaze LLC | Conduit segment casting mold and method of forming a conduit segment |
| KR20200035350A (en) * | 2018-09-26 | 2020-04-03 | 아라까와 가가꾸 고교 가부시끼가이샤 | Active energy ray-curable resin composition, cured product and laminate |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP5574253B1 (en) | 2014-08-20 |
| JP2015075886A (en) | 2015-04-20 |
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