CN104496197A - High-stability ITO glass etching system - Google Patents
High-stability ITO glass etching system Download PDFInfo
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- CN104496197A CN104496197A CN201410829636.7A CN201410829636A CN104496197A CN 104496197 A CN104496197 A CN 104496197A CN 201410829636 A CN201410829636 A CN 201410829636A CN 104496197 A CN104496197 A CN 104496197A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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Abstract
The invention relates to a high-stability ITO glass etching system, which comprises an etching component and a washing component which are connected and are provided with a plurality of separate transmission components, wherein each separate transmission component comprises a first magnetic wheel arranged outside the etching component or the washing component, a second magnetic wheel which corresponds to the first magnetic wheel and is arranged inside the etching component or the washing component, a rolling shaft of which the end part is connected with the second magnetic wheel, roller wheels which are arranged on the rolling shaft at intervals, and a transmission mechanism for driving the first magnetic wheel to rotate. The first magnetic wheel is arranged inside the system and the second magnetic wheel is arranged outside the system, so that particulate matter generated by wear and tear is avoided, and the pollution of the particulate matter on the environment in a process tank is fundamentally eliminated; and the operation stability of the overall system is favorably improved, the service life is prolonged, and the production efficiency is improved.
Description
Technical field
The present invention relates to a kind of etching system, relate to a kind of high stability ito glass etching system particularly.
Background technology
At present, in flat pannel display industry large generation line body, more than 3.5 generation lines, ito glass can through over etching, high-low pressure spray, the processing procedure such as liquid is cut, wind is cut in cleaning processing procedure.In these processing procedures, the stability of advancing to keep substrate, must use compressing tablet roller to push down glass substrate within the scope of the top surface edge 5mm of substrate, and this pressure must be even, stable.In all cleaning equipments known today, all devices manufacturers all adopts fixed compressing tablet pair of rollers substrate to compress.This roller must recall suitable gap according to the thickness of substrate before use, and the adjustment of each gap is all extremely consuming time, and after adjustment, by mechanical vibration, the factor impacts such as material creep, long-time use still has card, fragment, skidding equivalent risk.And existing ito glass etching system all adopts the etching mode of spray-type, namely arrange many groups in surface and wave jet pipe, this kind of mode is respond well when using conventional etch liquid, and when using active stronger new-type etching liquid (as HCl), often produce serious etching uneven phenomenon (reason).Therefore be necessary to develop on this basis the ito glass etching system with more high-performance and more high stability.
Summary of the invention
The present invention seeks to provide a kind of high stability ito glass etching system to overcome the deficiencies in the prior art.
For achieving the above object, the technical solution adopted in the present invention is: a kind of high stability ito glass etching system, it comprises the etching assembly and washing component that are connected, described etching assembly and described washing component are provided with multiple discrete transmission assembly, described discrete transmission assembly comprises the first magnetic wheel be arranged on outside described etching assembly or described washing component, be arranged on the second magnetic wheel in described etching assembly or described washing component and corresponding with described first magnetic wheel, the roller bearing that end is connected with described second magnetic wheel and being arranged on described roller bearing and spaced roller and the transmission rig for driving described first magnetic wheel to rotate.
Optimally, described washing component is arranged at the below of described etching assembly, and described etching assembly is connected with described washing component by the lifting assembly being arranged on its end.
Further, be provided with the multiple gaps self-adaptation compressing tablet roller being arranged on and matching above described discrete transmission assembly and with it in described etching assembly and described washing component, described gap self-adaptation compressing tablet roller comprises:
Roller outer sleeve, described roller outer sleeve inner ring arranges spaced multiple projection;
Cutting ferrule, described cutting ferrule is provided with the multiple latches matched with described projection, and it is sticked in the side of described roller outer sleeve by described latch;
Strut member, described strut member comprises the first cylinder of being arranged at described roller outer sleeve opposite side and is connected with described first column side face and inserts the second cylinder of described roller outer sleeve and described cutting ferrule, and the diameter of described first cylinder is greater than the described protruding inner round diameter formed;
Elastic component, described elastic component is placed between the described projection that surrounded by described strut member and described cutting ferrule, and described elastic component extends to the direction of described roller outer sleeve central shaft.
Further, described etching assembly comprises the pretreatment unit be connected successively, etching unit and washing unit, described pretreatment unit comprises the first ionic pump being installed on its both ends respectively, be arranged on the ultraviolet lamp between described first ionic pump and the oxygen valve for importing oxygen in it, described etching unit comprises and is arranged at multiple first showers of its inside for spraying up and down ito glass, be arranged at its inner and be arranged in described first shower upstream the first liquid cutter and be arranged at its inner and be positioned at described first shower downstream one group of first air knife and for collecting etching liquid and the cycling mechanism of described first shower and described first liquid cutter being imported again, described washing unit comprises and is arranged at multiple second showers of its inside for spraying up and down ito glass, be arranged at it inner and be positioned at the second liquid cutter of described second shower upstream and be arranged at that it is inner and be positioned at the first super liquid cutter in described second shower downstream.
Further, described first liquid cutter is identical with the structure of described second liquid cutter, they include corresponding closing lid two pieces of liquid knife plates, be formed at the first cavity between two pieces of described liquid knife plates, be formed at the fluid bar of two pieces of described liquid knife plate bottoms seam, the second cavity be connected with described first cavity is also formed between two pieces of described liquid knife plates, described second cavity stitches with described fluid bar and is connected, and the cross section of described second cavity is circular or oval.
Further, described etching assembly also comprises the first buffer cell be connected between described pretreatment unit and described etching unit and the second buffer cell be connected between described etching unit and described washing unit, the two ends of described first buffer cell are separately installed with one group of second air knife, be provided with one group of the 3rd air knife in described second buffer cell, described first buffer cell is provided with crystallization-preventive mechanism at the junction of itself and described etching unit and described second buffer cell in the junction of itself and described etching unit.
Further, described crystallization-preventive mechanism comprise shelter from described etching unit opening for feed and the baffle plate of discharging for correspondence, be connected with described baffle plate for drive it to rotate handle, for holding infiltrate thus soaking described baffle plate and the immersion slot of described handle, the under meter be connected with described immersion slot and valve.
Further, described washing component comprises the multiple large discharge washing unit and air dried cell that are connected successively.
Further, described large discharge washing unit comprises and is arranged at its inside for multiple 3rd shower of spraying up and down ito glass and the second super liquid cutter being arranged at described 3rd shower downstream; Described air dried cell is arranged at its inside for carrying out an air-dry antagonism negative pressure wind cutter and the second ionic pump being arranged at described anti-negative pressure air knife downstream to ito glass.
Further, described anti-negative pressure air knife comprises the first air knife plate and the second air knife plate of corresponding closing lid, be formed at the cavity between described first air knife plate and described second air knife plate, be formed at the blast inlet be connected between described first air knife plate and described second air knife plate and with described cavity, be formed at the air outlet between described first air knife plate and described second air knife plate, described first air knife plate lower surface and described second air knife plate lower surface are in same plane, described first air knife plate lower surface with form acute angle through ito glass upper surface herein, described air outlet and described ito glass perpendicular.
Because technique scheme is used, the present invention compared with prior art has following advantages: high stability ito glass etching system of the present invention, by arranging discrete transmission assembly, this discrete transmission assembly first magnetic wheel, the second magnetic wheel, roller bearing and the transmission rig for driving described first magnetic wheel to rotate, thus the first magnetic wheel can be arranged on internal system and the second magnetic wheel is arranged on its exterior, avoid wearing and tearing and produce particulate matter, fundamentally having stopped the pollution of particulate matter to technology groove environment; And be conducive to the stability improving whole system operation, improve production efficiency in work-ing life.
Accompanying drawing explanation
Accompanying drawing 1 is the structural representation of high stability ito glass etching system of the present invention;
Accompanying drawing 2 is structural representations of high stability ito glass etching system of the present invention etching assembly;
Accompanying drawing 3 is structural representations of high stability ito glass etching system washing component of the present invention;
Accompanying drawing 4 is structural representations of high stability ito glass etching system discrete transmission assembly of the present invention;
Accompanying drawing 5 is explosive views of high stability ito glass etching system gap of the present invention self-adaptation compressing tablet roller;
Accompanying drawing 6 is assembly drawings of high stability ito glass etching system gap of the present invention self-adaptation compressing tablet roller;
Accompanying drawing 7 is structural representations of high stability ito glass etching system liquid cutter of the present invention;
Accompanying drawing 8 is structural representations of high stability ito glass etching system crystallization-preventive mechanism of the present invention;
Accompanying drawing 9 is structural representations of the anti-negative pressure air knife of high stability ito glass etching system of the present invention;
Wherein, 1, etching assembly; 11, pretreatment unit; 111, ultraviolet lamp; 112, oxygen valve; 113, the first ionic pump; 12, unit is etched; 121, the first shower; 122, the first liquid cutter; 123, the first air knife; 124, cycling mechanism; 13, unit is washed; 131, the second shower; 132, the second liquid cutter; 133, the first super liquid cutter; 134, liquid knife plate; 135, the first cavity; 136, screw; 137, the second cavity; 138, fluid bar seam; 14, the first buffer cell; 141, the second air knife; 142, crystallization-preventive mechanism; 143, baffle plate; 144, handle; 145, under meter; 146, valve; 147, immersion slot; 15, the second buffer cell; 151, the 3rd air knife; 2, washing component; 21, large discharge washing unit; 211, the 3rd shower; 212, the second super liquid cutter; 22, air dried cell; 221, anti-negative pressure air knife; 222, the second ionic pump; 223, the first air knife plate; 224, the second air knife plate; 225, cavity; 226, air outlet; 227, blast inlet; 3, lifting assembly; 4, discrete transmission assembly; 41, transmission rig; 411, the first twisted spur gear; 412, transmitting gear; 413, the second twisted spur gear; 421, the first magnetic wheel; 422, the second magnetic wheel; 43, roller bearing; 44, roller; 5, gap self-adaptation compressing tablet roller; 51, roller outer sleeve; 511, protruding; 52, cutting ferrule; 521, latch; 522, jack; 53, elastic component; 54, strut member; 541, the first cylinder; 542, the 3rd cylinder; 543, the second cylinder; 55, the collar is supported; 56, nut; 57, stop screw.
Embodiment
Below in conjunction with accompanying drawing, the preferred embodiment of the invention is described in detail.
High stability ito glass etching system as shown in Figures 1 to 9, mainly comprises the etching assembly 1 and washing component 2 that are connected, and etching assembly 1 and washing component 2 are provided with multiple discrete transmission assembly 4.
Wherein, discrete transmission assembly 4 mainly comprises transmission rig 41, first magnetic wheel 421, second magnetic wheel 422, roller bearing 43 and roller 44.First magnetic wheel 421 is connected with transmission rig 41, and they are arranged on the outside of etching assembly 1 or washing component 2, synchronously drive the first magnetic wheel 421 to rotate when transmission rig 41 rotates.Second magnetic wheel 422 and the corresponding setting of the first magnetic wheel 421, synchronously drive the second magnetic wheel 422 to rotate when the first magnetic wheel 421 rotates; The end of roller bearing 43 is connected with the second magnetic wheel 422, and it is arranged between two the second magnetic wheels 422, and it above multiple spaced roller 44 is installed, synchronously drive roller bearing 43 to rotate when the second magnetic wheel 422 rotates; Second magnetic wheel 422, roller bearing 43 and roller 44 are arranged in etching assembly 1 or washing component 2.This avoid conventional gears and belt in the application because wearing and tearing produce particulate matter, fundamentally stop the pollution of particulate matter to technology groove environment; And be conducive to the stability improving whole system operation, improve production efficiency in work-ing life.In the present embodiment, because roller bearing 43 needs to be horizontally disposed with, the second twisted spur gear 413 that transmission rig 41 comprises the first twisted spur gear 411 be connected with the first magnetic wheel 421, the transmitting gear 412 matched with the first twisted spur gear 411 and matches with transmitting gear 412, utilizes the cooperation between the first twisted spur gear 411, transmitting gear 412 and the second twisted spur gear 413 can realize the rotation rotation in horizontal direction be converted in vertical direction like this.
Can etching assembly 1 and washing component 2 be arranged in same level, and washing component 2 is arranged on the downstream (judgement of upstream and downstream carries out defining according to the direction of ito glass transmission in this system, and ito glass is transmitted by upstream toward downstream) of etching assembly 1.In the present embodiment, washing component 2 is arranged at the below of etching assembly 1, etching assembly 1 is connected with washing component 2 by the lifting assembly 3 being arranged on its end, the charging of ito glass and discharging can be arranged on same one end like this, thus less with a mechanical manipulator, thus cost can have effectively been saved in automatic production process.
In the present embodiment, etching assembly 1 and washing component 2 in be provided be arranged on discrete transmission assembly 4) side and the multiple gaps self-adaptation compressing tablet roller 5 matched with it, this gap self-adaptation compressing tablet roller 5 can be applicable to the ito glass pushing down different thickness, no longer needs like this to regulate its height to adapt to different thickness when producing and line etching the ito glass of different thickness.It comprises and mainly comprises roller outer sleeve 51, cutting ferrule 52, strut member 54 and elastic component 53; Wherein, the inner ring of roller outer sleeve 51 is arranged at intervals with multiple protruding 511, and these projections 511 extend along the direction of roller outer sleeve 51 axial line, and form recess between adjacent two projections 511.Cutting ferrule 52 is arranged on the side of roller outer sleeve 51, and it is by it being arranged and engaging with roller outer sleeve 51 with the protruding 511 multiple latches 521 matched.Strut member 54 is hollow, for being plugged in stationary shaft or rotating shaft, comprises the first cylinder 541 and the second cylinder 543; First cylinder 541 is arranged on the opposite side of roller outer sleeve 51, second cylinder 543 is connected with the side of the first cylinder 541, and insert in roller outer sleeve 51 and cutting ferrule 52, it should be noted that the diameter of the first cylinder 541 is greater than the protruding 511 inner round diameters formed; This makes it possible between the second cylinder 543 and the projection 511 of roller outer sleeve 51, surround an accommodation space with the first cylinder 541 and cutting ferrule 52.Be spring in elastic component 53(the present embodiment) be just placed in this accommodation space, namely elastic component 53 is placed between the projection 511 that surrounded by strut member 54 and cutting ferrule 52, its bearing of trend points to the central axis direction of roller outer sleeve 51, namely one end of elastic component 53 props up the second cylinder 543, the other end props up the inwall of roller outer sleeve 51, like this when the thickness of glass changes, squeezing roller overcoat 51 thus make the elastic component 53 of corresponding position can automatically be regulated roller outer sleeve 51 by compressing, can also significantly enhance productivity while avoiding crushing glass.Strut member 54 also comprises outside the 3rd cylinder the 542, three cylinder 542 that is connected with the first cylinder 541 another side and is socketed with nut 56, is provided with and supports the collar 55 between nut 56 and the 3rd cylinder 542, thus convenient with rotating shaft or the connection of stationary shaft.Roller outer sleeve 51 and the support collar 55 are polytetrafluoroethylmaterial material and make, and mainly can play the effect of buffering, prevent itself material really up to the mark and cause cushion effect deficiency to crush glass.The number of elastic component 53 is also extremely important, is preferably 6 ~ 15, and number too much or all easily cause the breakage rate of glass to rise very little.Latch 521 is arranged on the side of cutting ferrule 52, thus facilitates the engaging of cutting ferrule 52 and roller outer sleeve 51.This gap self-adaptation compressing tablet roller also comprises stop screw 57, and the periphery of cutting ferrule 52 arranges multiple jack 522 for inserting this stop screw 57, thus realizes rapid-assembling and the dismounting of gap self-adaptation compressing tablet roller.
Etching assembly 1 comprises the pretreatment unit 11, etching unit 12 and the washing unit 13 that are connected successively, pretreatment unit 11 comprises the first ionic pump 113 being installed on its both ends respectively, for importing deionization wind in it, thus guarantee the high level of cleanliness of pretreatment unit 11, prevent the introducing of the impurity such as external dust; Ultraviolet lamp 111 is arranged between two the first ionic pumps 113, and need by oxygen valve 112 to its in import oxygen, the ultraviolet wavelength that ultraviolet lamp 111 sends is 172nm, the oxygen fraction of importing can be converted into oxyradical and ozone like this, thus the organic pollutant on ito glass surface can be removed, can guarantee that ito glass makes water drops surface tension force angle be reduced to less than 5 ° after by spray water.
Etching unit 12 comprise be arranged at its inside for ito glass is sprayed up and down multiple first showers 121, be arranged at its inner and be arranged in the first shower 121 upstream the first liquid cutter 122 and be arranged at its inner and be positioned at the first shower 121 downstream one group of first air knife 123 and for collecting etching liquid and the cycling mechanism 124 of described first shower 121 and described first liquid cutter 122 being imported again; Washing unit 13 comprise be arranged at its inside for ito glass is sprayed up and down multiple second showers 131, be arranged at that it is inner and be positioned at the second liquid cutter 132 of the second shower 131 upstream and be arranged at that it is inner and be positioned at the first super liquid cutter 133 in the second shower 131 downstream.In the present embodiment, first liquid cutter 122 is identical with the structure of the second liquid cutter 132, they are high uniformity liquid cutter, comprise corresponding closing lid two pieces of liquid knife plate 134(they fixed by screw 136), be formed at the first cavity 135 between two pieces of liquid knife plates 134, be formed at the fluid bar seam 138 of two pieces of liquid knife plate 134 bottoms, the second cavity 137 be connected with the first cavity 135 is also formed between two pieces of described liquid knife plates 134, second cavity 137 and fluid bar stitch 138 and are connected, the cross section of the second cavity 137 is circular or oval, thus etching liquid or deionized water can be sprayed to the surface uniform of ito glass.First air knife 123 plays the effect intercepting gas, spreads in downstream components for preventing the acid gas etched in unit 12.Cycling mechanism 124 is for the etching liquid collected in etching unit 12 and it sprayed via the first shower 121 and the first liquid cutter 122, thus guarantees the stable of etching liquid concentration; And cycling mechanism 124 can be arranged to be in parallel and be interconnected two (a preparation and a use) as required, and give the function of its heating, thus can heat etching liquid, thus etching efficiency and etching quality can be improved.
Etching assembly 1 also comprises the first buffer cell 14 be connected between pretreatment unit 11 and etching unit 12 and the second buffer cell 15 be connected between etching unit 12 and washing unit 13, the two ends of the first buffer cell 14 are separately installed with one group of second air knife 141, one group of the 3rd air knife 151 is provided with in second buffer cell 15, these two buffer cells can play the effect of buffering like this, to further avoid in etching unit 12 acid gas to the diffusion of other unit.And the first buffer cell 14 is provided with crystallization-preventive mechanism 142 at itself and the junction and the second buffer cell 15 that etch unit 12 at itself and the junction of etching unit 12, this crystallization-preventive mechanism 142 comprises the baffle plate 143 sheltering from etching unit 12 opening for feed and discharge port (in fact each component units of ito glass etching system all has opening for feed for introducing and draw ito glass and discharge port) for correspondence, be connected with baffle plate 143 for the handle 144 driving it to rotate, for holding infiltrate thus the immersion slot 147 of immersion baffle plate 143 and handle 144, the under meter 145 be connected with immersion slot 147 and valve 146, can effectively avoid accumulating of crystallisate like this.
Washing component 2 comprises the multiple large discharge washing unit 21 and air dried cell 22 that are connected successively.Large discharge washing unit 21 comprises and is arranged at its inside for multiple 3rd shower 211 of spraying up and down ito glass and the second super liquid cutter 212 being arranged at the 3rd shower 211 downstream, 3rd shower 211 for carrying out injection deionized water to ito glass, to remove the etching liquid of its remained on surface; Second super liquid cutter 212 ionized water that then injection flow is comparatively large, jet power is larger, thoroughly to clean ito glass surface.It should be noted that the large discharge be connected with air dried cell 22 is washed in unit 21, containing carbonic acid gas in the water of ejection in the second super liquid cutter 212 installed in it, play the effect of removing ito glass surface electrostatic.Air dried cell 22 comprises and is arranged at its inside for carrying out an air-dry antagonism negative pressure wind cutter 221 to ito glass and being arranged at second ionic pump 222 in anti-negative pressure air knife 221 downstream.Anti-negative pressure air knife 221 comprises the first air knife plate 223 and the second air knife plate 224 of corresponding closing lid, be formed at the cavity 225 between the first air knife plate 223 and the second air knife plate 224, to be formed between the first air knife plate 223 and the second air knife plate 224 and the blast inlet 227 be connected with cavity 225, be formed at the air outlet 226 between the first air knife plate 223 and the second air knife plate 224, first air knife plate 223 lower surface and the second air knife plate 224 lower surface are in same plane, first air knife plate 223 lower surface with form acute angle through ito glass upper surface herein, air outlet 226 is perpendicular with ito glass.Such air-flow vertically sprays, and sections transverse air-flow prevents the formation of negative pressuren zone, thus avoids the generation of underbalance effect, the anti-negative pressure air knife 221 of this structure is due to the stability of its air-flow, airflow fluctuation is less, not easily produces gas backstreaming, solves the phenomenon that portioned product cannot thoroughly dry up.
Above-described embodiment, only for technical conceive of the present invention and feature are described, its object is to person skilled in the art can be understood content of the present invention and implement according to this, can not limit the scope of the invention with this.All equivalences done according to spirit of the present invention change or modify, and all should be encompassed within protection scope of the present invention.
Claims (10)
1. a high stability ito glass etching system, it comprises the etching assembly (1) and washing component (2) that are connected, it is characterized in that: described etching assembly (1) and described washing component (2) are provided with multiple discrete transmission assembly (4), described discrete transmission assembly (4) comprises and is arranged on described etching assembly (1) or described washing component (2) the first magnetic wheel (421) outward, be arranged on the second magnetic wheel (422) in described etching assembly (1) or described washing component (2) and corresponding with described first magnetic wheel (421), the roller bearing (43) that end is connected with described second magnetic wheel (422) and be arranged on described roller bearing (43) upper and spaced roller (44) and the transmission rig (41) for driving described first magnetic wheel (421) to rotate.
2. high stability ito glass etching system according to claim 1, it is characterized in that: described washing component (2) is arranged at the below of described etching assembly (1), described etching assembly (1) is connected with described washing component (2) by the lifting assembly (3) being arranged on its end.
3. high stability ito glass etching system according to claim 1 or 2, it is characterized in that: be provided with in described etching assembly (1) and described washing component (2) and be arranged on described discrete transmission assembly (4) top and multiple gaps self-adaptation compressing tablet roller (5) matched with it, described gap self-adaptation compressing tablet roller (5) comprising:
Roller outer sleeve (51), described roller outer sleeve (51) inner ring arranges spaced multiple projection (511);
Cutting ferrule (52), described cutting ferrule (52) is provided with the multiple latches (521) matched with described projection (511), and it is sticked in the side of described roller outer sleeve (51) by described latch (521);
Strut member (54), described strut member (54) comprises the first cylinder (541) of being arranged at described roller outer sleeve (51) opposite side and is connected with described first cylinder (541) side and inserts second cylinder (543) of described roller outer sleeve (51) and described cutting ferrule (52), and the diameter of described first cylinder (541) is greater than the round diameter that described projection (511) the inner is formed;
Elastic component (53), described elastic component (53) is placed between the described projection (511) that surrounded by described strut member (54) and described cutting ferrule (52), and described elastic component (53) extends to the direction of described roller outer sleeve (51) central shaft.
4. high stability ito glass etching system according to claim 1 or 2, it is characterized in that: described etching assembly (1) comprises the pretreatment unit (11) be connected successively, etching unit (12) and washing unit (13), described pretreatment unit (11) comprises the first ionic pump (113) being installed on its both ends respectively, be arranged on the ultraviolet lamp (111) between described first ionic pump (113) and the oxygen valve (112) for importing oxygen in it, described etching unit (12) comprises and is arranged at multiple first showers (121) of its inside for spraying up and down ito glass, be arranged at its inside and be arranged in the first liquid cutter (122) of described first shower (121) upstream and be arranged at its inside and be positioned at one group of first air knife (123) in described first shower (121) downstream and also will import the cycling mechanism (124) of described first shower (121) and described first liquid cutter (122) for collecting etching liquid again, described washing unit (13) comprises and is arranged at multiple second showers (131) of its inside for spraying up and down ito glass, be arranged at it inner and be positioned at the second liquid cutter (132) of described second shower (131) upstream and be arranged at that it is inner and be positioned at the first super liquid cutter (133) in described second shower (131) downstream.
5. high stability ito glass etching system according to claim 4, it is characterized in that: described first liquid cutter (122) is identical with the structure of described second liquid cutter (132), they include two pieces of liquid knife plates (134) of corresponding closing lid, be formed at the first cavity (135) between two pieces of described liquid knife plates (134), be formed at fluid bar seam (138) of two pieces of described liquid knife plate (134) bottoms, the second cavity (137) be connected with described first cavity (135) is also formed between two pieces of described liquid knife plates (134), described second cavity (137) is stitched (138) with described fluid bar and is connected, the cross section of described second cavity (137) is circular or oval.
6. high stability ito glass etching system according to claim 4, it is characterized in that: described etching assembly (1) also comprises the first buffer cell (14) be connected between described pretreatment unit (11) and described etching unit (12) and the second buffer cell (15) be connected between described etching unit (12) and described washing unit (13), the two ends of described first buffer cell (14) are separately installed with one group of second air knife (141), one group of the 3rd air knife (151) is provided with in described second buffer cell (15), described first buffer cell (14) is provided with crystallization-preventive mechanism (142) at the junction of itself and described etching unit (12) and described second buffer cell (15) in the junction of itself and described etching unit (12).
7. high stability ito glass etching system according to claim 6, is characterized in that: described crystallization-preventive mechanism (142) comprise shelter from described etching unit (12) opening for feed and the baffle plate (143) of discharging for correspondence, be connected with described baffle plate (143) for drive it to rotate handle (144), for holding infiltrate thus soaking described baffle plate (143) and the immersion slot (147) of described handle (144), the under meter (145) be connected with described immersion slot (147) and valve (146).
8. high stability ito glass etching system according to claim 1 or 2, is characterized in that: described washing component (2) comprises multiple large discharge washing unit (21) and air dried cell (22) that are connected successively.
9. high stability ito glass etching system according to claim 8, is characterized in that: described large discharge washing unit (21) comprises and is arranged at its inside for multiple 3rd shower (211) of spraying up and down ito glass and the second super liquid cutter (212) being arranged at described 3rd shower (211) downstream; Described air dried cell (22) comprises and is arranged at its inside for carrying out air-dry antagonism negative pressure wind cutter (221) to ito glass and being arranged at second ionic pump (222) in described anti-negative pressure air knife (221) downstream.
10. high stability ito glass etching system according to claim 9, it is characterized in that: described anti-negative pressure air knife (221) comprises the first air knife plate (223) and the second air knife plate (224) of corresponding closing lid, be formed at the cavity (225) between described first air knife plate (223) and described second air knife plate (224), be formed at the blast inlet (227) be connected between described first air knife plate (223) and described second air knife plate (224) and with described cavity (225), be formed at the air outlet (226) between described first air knife plate (223) and described second air knife plate (224), described first air knife plate (223) lower surface and described second air knife plate (224) lower surface are in same plane, described first air knife plate (223) lower surface with form acute angle through ito glass upper surface herein, described air outlet (226) is perpendicular with described ito glass.
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| CN201410829636.7A CN104496197B (en) | 2014-12-26 | 2014-12-26 | High-stability ITO glass etching system |
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| CN201410829636.7A CN104496197B (en) | 2014-12-26 | 2014-12-26 | High-stability ITO glass etching system |
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| CN104496197B CN104496197B (en) | 2017-02-22 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2020143452A1 (en) * | 2019-01-08 | 2020-07-16 | 京东方科技集团股份有限公司 | Film surface treatment method and film surface treatment device |
| CN113860752A (en) * | 2021-09-17 | 2021-12-31 | 江西沃格光电股份有限公司 | Gradual change anti-dazzle glass and preparation method and application thereof |
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| JP2006332481A (en) * | 2005-05-30 | 2006-12-07 | Sony Corp | Etching processing method and etching apparatus |
| WO2012108452A1 (en) * | 2011-02-10 | 2012-08-16 | 株式会社Ｎｓｃ | Method and apparatus for manufacturing glass substrate |
| CN204281588U (en) * | 2014-12-26 | 2015-04-22 | 苏州晶洲装备科技有限公司 | High stability ito glass etching system |
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| WO2020143452A1 (en) * | 2019-01-08 | 2020-07-16 | 京东方科技集团股份有限公司 | Film surface treatment method and film surface treatment device |
| CN113860752A (en) * | 2021-09-17 | 2021-12-31 | 江西沃格光电股份有限公司 | Gradual change anti-dazzle glass and preparation method and application thereof |
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