CN104474885B - The device of electrodeless quasi-molecule lamp photocatalytic degradation waste gas - Google Patents
The device of electrodeless quasi-molecule lamp photocatalytic degradation waste gas Download PDFInfo
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- CN104474885B CN104474885B CN201410666103.1A CN201410666103A CN104474885B CN 104474885 B CN104474885 B CN 104474885B CN 201410666103 A CN201410666103 A CN 201410666103A CN 104474885 B CN104474885 B CN 104474885B
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- 239000002912 waste gas Substances 0.000 title claims abstract description 79
- 238000013033 photocatalytic degradation reaction Methods 0.000 title claims abstract description 32
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- 239000007789 gas Substances 0.000 claims abstract description 173
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 89
- 238000006243 chemical reaction Methods 0.000 claims abstract description 69
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- 238000000034 method Methods 0.000 description 27
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Abstract
The present invention discloses the device of a kind of electrodeless quasi-molecule lamp photocatalytic degradation waste gas, reactor used comprises three layers of quartz medium layer, interior electrode, outer electrode and high-voltage power supply. First silica tube that described three layers of quartz medium layer comprise coaxial line, that arrange successively from inside to outside, the 2nd silica tube and the 3rd silica tube; The internal cavities of the first silica tube is III reaction zone, district; Form airtight annular cavity between 2nd silica tube and the first silica tube, fill IIth district as gas; I reaction zone, district is formed between 3rd silica tube and the 2nd silica tube. During photocatalytic degradation waste gas, the gas that gas fills IIth district is excited and produces Excimer UV light, to the direction radiation of I reaction zone, district and III reaction zone, district, waste gas to be degraded, all through I reaction zone, district or all enter I reaction zone, district and III reaction zone, district through III reaction zone, district or shunting, is degraded under Excimer UV radiation effect.
Description
The application is application number is 201310089087.X, and the applying date is on March 20th, 2013, and invention and created name is point case application of the application for a patent for invention of " device of electrodeless quasi-molecule lamp photocatalytic degradation waste gas and method ".
Technical field
The present invention relates to exhaust gas decomposition field, it is specifically related to the device of a kind of electrodeless quasi-molecule lamp photocatalytic degradation waste gas.
Background technology
Ultraviolet source has been widely used in the fields such as microelectronics, medicine, chemical industry, health and environmental protection, becomes a basic and key technology. Above-mentioned all application all require that light source has narrower radiation spectrum and certain yield of radiation. For traditional middle and high pressure mercury lamp, its radiation spectrum wavelength region width (from ultraviolet region to visible region), the UV-light light effect of required wavelength is low; Low pressure mercury lamp and rare gas element lamp can radiate narrow-band ultraviolet light spectrum, but its light intensity is relatively weak, has influence on corresponding photochemical reaction speed; Although LASER Light Source can radiate high strength, narrow spectrum, but beam spot size is little and expensive. And electrodeless quasi-molecule ultraviolet source is owing to having advantages such as severe radiation, narrow radiation spectrum, photoelectric transformation efficiency height, plasticity-are strong, relative low price and become the efficient incoherence light source of a kind of novelty.
Traditional light source generally all has electrode, due to the existence of electrode in lamp, result in a series of problems: the life-span is short, burning time and steady time length, electrode materials and luminophore range of choice is little, change in shape is few, optical radiation utilization ratio is low and additional circuit is complicated etc.
With traditional have EUV light source compared with, electrodeless quasi-molecule ultraviolet lamp is not owing to having electrode in fluorescent tube, luminophore range of choice is widened greatly, can obtain the ultraviolet wavelength that traditional UV lamps can not obtain. Can filling different materials in lamp according to demand, send the radiation of vacuum ultraviolet (VUV) to long wave ultraviolet range, radiation power is strong, and light effect is higher, is the new ultra-violet light source adapting to specific wavelength, high strength needed for photochemical reaction.
From the eighties in 20th century, the research of electrodeless quasi-molecule lamp in photochemistry field increases gradually. Ultraviolet (Ultraviolet, the UV) radiation of electrodeless lamp all has broad application prospects in material surface modifying, dry etching, film deposition, the synthesis of organism, photoxidation Pollution abatement etc. Owing to such light source does not have electrode, the blackout phenomenon caused as other charging sources can not be produced due to anodizing, loss and sealing-in sealing problem, and seldom it is subject to operating voltage (to be no longer only 220V, and free voltage can be used), operating frequency, (waveform is also not only sine to working current, can be square wave, pulse wave) restriction, many qualities such as light effect, photochromic, life-span, shape, packing material all achieve significant progress.
Quasi-molecule is that (life-span is 10 to the high-energy state with constraint-6～10-7S) with the ground state molecule (life-span 10 repelling (weak beam is tied up)-13S) general designation, is also referred to as the radiationless compound of three-body collision or atomic collision state. Quasi-molecule could can only produce when some special geseous discharge, such as conditions such as dielectric barrier discharge (DielectricBarrierDischarge, DBD), high-power electron beam, alpha-particle, synchrotron radiation, high frequency discharge, microwave discharge, impulsive discharges. During electric discharge, atom is excited to high electronic level, these excited atoms and ground state atom or molecular impact produce a molecule and make it from the slow Henan of high vibration excited state to low vibration excited state by third party transfer part energy, become relatively stable molecule, send the uv-radiation of respective wavelength simultaneously.
Mainly dielectric barrier discharge electrodeless quasi-molecule ultraviolet lamp and the microwave discharge electrodeless lamp being applied to Environmental capacity at present, and the degraded major part that electrodeless quasi-molecule ultraviolet lamp is applied to pollutent also stops at aqueous phase pollutent.
Such as Chinese patent literature CN2592631Y(number of patent application: ZL02264075.4) disclose a kind of quasi-molecule ultraviolet source, it comprises the geseous discharge wave duct of water coolant wave duct and its outer sleeve being provided with the electrode being electrically connected with high-frequency and high-voltage power supply, this kind of light source can extensively be disinfected or photochemical reaction in circulation for water, as filling Xe and Cl2The UV-light that wavelength is 308nm can be radiated out during mixed gas. Chinese patent literature CN101857283B(number of patent application: ZL201010203436.2) disclose the gas distributing system of device and the lamp of a kind of micro-wave nonpolar Excimer lamp process waste water, the device processing waste water comprises microwave power supply, microwave generator, electrodeless quasi-molecule lamp, purification tank for liquid waste, microwave generator comprise shell, magnetron resonant cavity housing. Above-mentioned two parts of patents are all that electrodeless quasi-molecule ultraviolet lamp is applied to aqueous phase pollutent.
About the technical scheme that electrodeless quasi-molecule ultraviolet lamp is applied to vapor phase contaminants, Chinese patent literature CN1319600C(number of patent application: ZL200510030278.4) disclose treatment unit and the method for the big air quantity foul gas of a kind of lower concentration, device is by filtering net, photolysis device, cellular activated carbon bed and blower fan connect to form successively, wherein photolysis device adopts 172nm Excimer UV lamp, this lamp is by outer quartz socket tube, outer electrode, interior quartz socket tube and interior electrode form from outside to inside successively, outer electrode is outside between quartz socket tube and interior quartz socket tube, interior electrode is inside interior quartz socket tube. gas to be degraded enters reaction zone from the space between outer quartz socket tube and reactor wall, enters cellular activated carbon bed through the reacted air-flow of photolysis device and continues to react.The principle of this device is placed in the middle of reactor by electrodeless quasi-molecule lamp, degrades under light illumination when gas flows through from electrodeless lamp side.
Chinese patent literature CN1216680C(number of patent application: 01814678.3) disclose a kind of Excimer uv photo reactor, branched Excimer lamp and illuminated body are oppositely disposed into and column-shaped, from these Excimer UV lamps towards illuminated body irradiating ultraviolet light in reactant gas ambiance, thus make illuminated surface that photochemical reaction occur. The structure comparison of this device is complicated, and floor space is big, and the later stage is run needs the equipment safeguarded also more.
Summary of the invention
Technical problem to be solved by this invention is to provide a kind of device and the method for electrodeless quasi-molecule lamp photocatalytic degradation waste gas.
The technical scheme realizing the object of the invention is the device of a kind of electrodeless quasi-molecule lamp photocatalytic degradation waste gas, comprises gas skirt, adapter sleeve, air inlet divider, reactor, give vent to anger divider and induced draft fan; Gas skirt comprises lower gas skirt and upper gas skirt, lower gas skirt, adapter sleeve, reactor, gives vent to anger divider and upper gas skirt is arranged from bottom to top successively; The air inlet port of induced draft fan is connected with the air outlet of upper gas skirt.
The inlet mouth of lower gas skirt is connected with the waste gas producer air outlet or gas-holder for the treatment of degraded gas, and the air outlet of lower gas skirt is connected with the inlet mouth of adapter sleeve by flange; The air outlet of adapter sleeve communicates with the air inlet end of air inlet divider.
Reactor is arranged on air inlet divider and gives vent to anger between divider; Reactor comprises three layers of quartz medium layer, interior electrode, outer electrode and high-voltage power supply; First silica tube that described three layers of quartz medium layer comprise coaxial line, that arrange successively from inside to outside, the 2nd silica tube and the 3rd silica tube; Interior electrode is arranged on the inside of the first silica tube, and outer electrode is arranged on the outer side of the 2nd silica tube.
The open at both ends of the first silica tube, the internal cavities of the first silica tube is III reaction zone, district; 2nd quartz pipe sleeve is contained in outside the first silica tube, and the upper/lower terminal port sintering of the 2nd silica tube is at the outer side of the first silica tube, thus forms airtight annular cavity between the 2nd silica tube and the first silica tube, fills IIth district as gas; The open at both ends of the 3rd silica tube, forms I reaction zone, district between the 3rd silica tube and the 2nd silica tube.
Described air inlet divider comprises main body, through hole, ring groove, through hole stopper and I district's air inlet through hole; Through hole is arranged on the central authorities of main body, and ring groove is arranged on the periphery of through hole and is coaxially set with through hole, and the axis of I district's air inlet through hole and the axis being parallel of main body also run through main body completely, and the air outlet of I district's air inlet through hole is positioned at ring groove.
Through hole stopper is arranged in through hole, and through hole stopper is porous plug or blind hole plug; The main body of described porous plug is a right cylinder, comprises blind hole and III district's air inlet through hole, and blind hole is arranged on the center upper portion of porous plug, and III district's air inlet through hole is arranged on below blind hole and the air outlet of III district's air inlet through hole communicates with blind hole; The main body of described blind hole plug is a right cylinder, and the center upper portion of blind hole plug arranges blind hole.
Ith district of I district's air inlet through hole of air inlet divider, I reaction zone, district and divider of giving vent to anger goes out vent hole and is connected; When through hole stopper is porous plug, IIIth district of III district's air inlet through hole of air inlet divider, III reaction zone, district and divider of giving vent to anger goes out vent hole and is connected.
As preferably, device also comprises gas mixer, gas mixer is arranged on the inside of adapter sleeve, and the inlet mouth of gas mixer communicates with the internal cavities of adapter sleeve, and the air outlet of gas mixer communicates with the air inlet end of air inlet divider.
Further, air inlet divider also comprises porous sieve plate, and porous sieve plate is arranged on above I district's air inlet through hole.
Further, air inlet divider also comprises piston channel, and piston channel is arranged in main body along the radial direction of main body, and each I district's air inlet through hole correspondence arranges a piston channel, and piston channel is connected with I district's air inlet through hole; Being provided with piston in piston channel, inside the motion arrival of piston ecto-entad, Shi Jiang I district's air inlet through hole is blocked.
The interior electrode of described reactor is tinsel, and dispatch from foreign news agency is wire netting very; Or the interior electrode of reactor is wire netting, and dispatch from foreign news agency is tinsel very; Or the interior electrode of reactor is wire netting, and dispatch from foreign news agency is wire netting very.
Use the method for electrodeless quasi-molecule lamp photocatalytic degradation waste gas of said apparatus, reactor used comprise three layers of quartz medium layer, interior electrode, outer electrode and high-voltage power supply.
First silica tube that described three layers of quartz medium layer comprise coaxial line, that arrange successively from inside to outside, the 2nd silica tube and the 3rd silica tube; Interior electrode is arranged on the inside of the first silica tube, and outer electrode is arranged on the outer side of the 2nd silica tube.
The open at both ends of the first silica tube, the internal cavities of the first silica tube is III reaction zone, district; 2nd quartz pipe sleeve is contained in outside the first silica tube, and the upper/lower terminal port sintering of the 2nd silica tube is at the outer side of the first silica tube, thus forms airtight annular cavity between the 2nd silica tube and the first silica tube, fills IIth district as gas; The open at both ends of the 3rd silica tube, forms I reaction zone, district between the 3rd silica tube and the 2nd silica tube.
During photocatalytic degradation waste gas, gas is filled after IIth district vacuumizes, and fills IIth district to gas and is filled with rare gas or rare gas halogen mixed gas; Connecting after high-voltage power supply, the gas that gas fills IIth district is excited and produces Excimer UV light, to the direction radiation of I reaction zone, district and III reaction zone, district.
Waste gas to be degraded all through I reaction zone, district, is degraded under Excimer UV radiation effect; Or waste gas to be degraded all through III reaction zone, district, is degraded under Excimer UV radiation effect; Or waste gas shunting to be degraded enters I reaction zone, district and III reaction zone, district, is degraded under Excimer UV radiation effect; Gas extracts discharge out by induced draft fan after flowing out from I reaction zone, district or III reaction zone, district.
As preferably, entering in reactor after the waste gas degraded and water vapour and dry clean air mixed and degrade.
As preferably, the waste gas to be degraded flowed out from waste gas producer or waste gas gas-holder tentatively mixes through gas mixer, then enters I reaction zone, district or III reaction zone, district after air inlet divider porous is shunted and degrade.
During degraded, it is Xe that gas fills the rare gas that IIth district is filled with2; The rare gas being filled with-halogen mixed gas is Ar/F2、Kr/Cl2、Kr/Br2、Kr/I2、Xe/I2、Xe/C2、Kr/F2; Wavelength X=108～the 345nm of the quasi-molecule light of reactor radiation.
High-voltage power supply used is medium-frequency pulse square wave power, and sparking voltage is adjustable within the scope of 0kV～15kV.
The present invention has positive effect:
(1) high-voltage power supply that the electrodeless quasi-molecule lamp employing dielectric barrier discharge excitation luminescence of the present invention, employing sparking voltage and power input are adjustable excites the subatmospheric mixed gas between two-layered medium (rare gas, rare gas-halogen) electric discharge to produce Excimer UV radiation. When carrying out exhaust gas decomposition, first vacuumize in IIth district, then filling the gas (rare gas, rare gas-halogen) of certain pressure, connect high-voltage power supply, the mixed gas in IIth district is excited the direction radiation producing Excimer UV Guang Xiang I district and III reaction zone, district and makes exhaust gas decomposition.
The gas filled by changing IIth district can obtain the UV-light (vacuum ultraviolet (VUV) VUV and UV) of different wave length, different gas of degrading targetedly, and capacity usage ratio height, off gas treatment are effective; And the wavelength region width (λ=108-345nm) of Excimer lamp, applied range, can be used for the improvement of multiple waste gas. In addition, by changing the proportioning of blanketing gas in IIth district and total pressure, it is possible to change luminous intensity and the luminous efficiency of Excimer lamp, therefore can according to the proportioning of the particular case adjustment gas of waste gas and total pressure.
(2) apparatus structure of the present invention is simply compact, floor space is few; And owing to there is no electrode in quasi-molecule fluorescent tube used, it is possible to avoiding the problem that in lamp, gas contacts and make electrode aging with metal electrode, the repair and replacement number of times of fluorescent tube is few, the life-span is long; In addition Excimer lamp manufacture is simple, and the shape and size of lamp are any.
(3) electrodeless quasi-molecule lamp of the device of the present invention has three kinds of structure patterns, it is electrode metal net in electrode metal net and outer electrode wire netting in electrode metal sheet in outer electrode wire netting, outer electrode tinsel respectively, corresponds respectively to the degraded of outer district, the degraded of interior district and inside and outside district degraded form. Above-mentioned three kinds of structure patterns require different gas inlet modes, are realized by gas distributor. When that is Ith district degrades in employing outer district, gas distributor adopts the structure pattern shown in Fig. 6, and interior electrode adopts tinsel, and outer electrode adopts wire netting; Piston is opened, and waste gas all enters Ith district by gas distributor and carries out uv-radiation degraded; When that is IIIth district degrades in district in adopting, gas distributor adopts the structure pattern shown in Fig. 7, and interior electrode adopts wire netting, and outer electrode adopts tinsel; Piston is closed, and waste gas all enters IIIth district by the porous plug of gas distributor and carries out uv-radiation degraded. When adopting I and III district to degrade simultaneously, gas distributor adopts the structure pattern shown in Fig. 1, and internal and external electrode all adopts wire netting; Piston is opened, and waste gas enters Ith district and IIIth district respectively by gas distributor and carries out uv-radiation degraded.
(4) the present invention is in order to improve exhaust gas decomposition effect, on the basis of Excimer lamp photodissociation, also improved by two kinds of modes: one is add catalyzer composition photocatalytic degradation system in reaction zone, and Excimer UV light combines photocatalytic degradation waste gas with catalyzer; Two is offer bypass in adapter sleeve side, lead to into external adding water steam and dry clean air in adapter sleeve, waste gas of waiting to degrade is formed containing the waste gas of certain water vapor body fraction by dilution mixture, through gas mixer and gas distributor mix even after together with enter into photodissociation in reactor; Adscititious gases decomposes under the action of uv light and produces O and OH free radical, and degraded emission molecule collides and reacts O and OH free radical with treating, it is to increase the dissociation yield of target molecule, thus improves photodissociation effect.
(5), when the present invention processes waste gas, after being collected from the gas of waste gas producer by lower gas skirt, shunting or the stable and uniform air inlet do not shunted is realized by gas mixer and the mixing of air inlet divider two-stage, guarantee process effect stability.
Accompanying drawing explanation
Fig. 1 is the structural representation of the device of the electrodeless quasi-molecule lamp photocatalytic degradation waste gas of the present invention;
Fig. 2 is the schematic diagram of gas mixer in Fig. 1;
Fig. 3 is the A-A sectional view of Fig. 2;
Fig. 4 is the schematic diagram of the gas distributor in Fig. 1;
Fig. 5 is the schematic diagram of the porous sieve plate in Fig. 1;
The device that Fig. 6 is the present invention only leads to the principle of work figure when degraded gas in I reaction zone, district;
The device that Fig. 7 is the present invention only leads to the principle of work figure when degraded gas in III reaction zone, district;
Fig. 8 is the schematic diagram of the gas distributor in Fig. 6;
Fig. 9 be the device shown in Fig. 1 reaction zone in the schematic diagram of catalyzer is set;
Mark in above-mentioned accompanying drawing is as follows:
Gas skirt 1, lower gas skirt 11, upper gas skirt 12;
Adapter sleeve 2, the first cylinder body 21, flange 21-1, the 2nd cylinder body 22, inlet mouth 22-1, the 3rd cylinder body 23, pressure ring 24;
Gas mixer 3, mixing unit 31, groove 31-1, installation portion 32;
Air inlet divider 4, main body 41, through hole 42, upper hole section 42-1, lower opening section 42-2, install platform 42-3, ring groove 43, annular boss 44, I district's air inlet through hole 45, piston channel 46, piston 46-1, porous plug 47, blind hole 47-1, III district's air inlet through hole 47-2, blind hole plug 48, blind hole 48-1, porous sieve plate 49, ventilating pit 49-1;
Reactor 5, the first silica tube the 51, two silica tube the 52, three silica tube 53, gas fill area 54, bracing frame 55;
Give vent to anger divider 6, main body 61, Ith district goes out vent hole 62, and IIIth district goes out vent hole 63;
Interior electrode 71, outer electrode 72, high-voltage power supply 73.
Embodiment
(device of embodiment 1, electrodeless quasi-molecule lamp photocatalytic degradation waste gas)
Seeing Fig. 1, the device of the electrodeless quasi-molecule lamp photocatalytic degradation waste gas of the present embodiment comprises gas skirt 1, adapter sleeve 2, gas mixer 3, air inlet divider 4, reactor 5, give vent to anger divider 6 and induced draft fan. Gas skirt 1 comprises lower gas skirt 11 and upper gas skirt 12. Lower gas skirt 11, gas mixer 3, reactor 5, give vent to anger divider 6 and upper gas skirt 12 is arranged from bottom to top successively.
The inlet mouth of lower gas skirt 11 is connected with the waste gas producer air outlet or gas-holder for the treatment of degraded gas, and the air outlet of lower gas skirt 11 is connected by the inlet mouth of flange with adapter sleeve 2. Gas mixer 3 is arranged on the inside of adapter sleeve 2, and the inlet mouth of gas mixer 3 communicates with the internal cavities of adapter sleeve 2, and the air outlet of gas mixer 3 communicates with the air inlet end of air inlet divider 4.
Described adapter sleeve 2 comprise from diminish successively to the first cylinder body 21 of lower coaxial line, the 2nd cylinder body 22 and the 3rd cylinder body 23, first cylinder body 21, the 2nd cylinder body 22 and the 3rd cylinder body 23 external diameter. The periphery of the first cylinder body 21 arranges a circle flange 21-1, and the upper surface of flange 21-1 and the upper surface of the first cylinder body 21 are in same plane. From the upper surface of the first cylinder body 21, a circle annular concave platform is set downwards. First cylinder body 21 is connected by annular connecting plate with the 2nd cylinder body 22, forms an installation platform between the first cylinder body 21 and the 2nd cylinder body 22. The lower side of the 2nd cylinder body 22 offers inlet mouth 22-1, and inlet mouth 22-1 is connected with inlet pipe, and inlet pipe is provided with valve. It is connected by annular connecting plate between 2nd cylinder body 22 with the 3rd cylinder body 23.
Seeing Fig. 2 and Fig. 3, described gas mixer 3 comprises mixing unit 31 and installation portion 32. Mixing unit 31 is the round shape of lower end closed, and the cylindrical lateral portion of mixing unit 31 is slotted 31-1, and groove 31-1 becomes 45 with the axis of mixing unit 310Oblique angle, gas fully mixes after the sidepiece of mixing unit 31 enters the process rotating rising.
Gas mixer 3 be arranged between the first cylinder body 21 of adapter sleeve 2 and the 2nd cylinder body 22 by installation portion 32 formed installation platform on.
Between the upper surface of gas mixer 3 and the lower surface of air inlet divider 4, pressure ring 24 is set.Pressure ring 24 is round shape, and the lower surface of pressure ring 24 contacts with the upper surface in the installation portion 32 of gas mixer 3, and the upper surface of pressure ring 24 contacts with the lower surface of air inlet divider 4.
Seeing Fig. 4, air inlet divider 4 comprises main body 41, through hole 42, ring groove 43, I district's air inlet through hole 45, piston channel 46, through hole stopper and porous sieve plate 49.
Main body 41 is cylindrical, and the central authorities of main body 41 are provided with through hole 42; Through hole 42 and main body 41 coaxial line. Through hole 42 is made up of upper hole section 42-1 and lower opening section 42-2, and the aperture of upper hole section 42-1 is greater than the aperture of lower opening section 42-2, thus is formed between upper hole section 42-1 and lower opening section 42-2 and install platform 42-3.
From the upper surface of main body 41 to having ring groove 43, ring groove 43 is arranged on the periphery of through hole 42 and is coaxially set with through hole 42. The bottom of ring groove 43 arranges annular boss 44, and the outer side of annular boss 44 and the inwall of ring groove 43 fit. Annular boss 44 becomes the installation platform in ring groove 43.
I district's air inlet through hole 45 is arranged on the periphery of through hole 42 and is positioned at the inner side of the annular boss 44 of ring groove 43. The axis of I district's air inlet through hole 45 and the axis being parallel of main body 41 also run through main body 41 completely; The air outlet of I district's air inlet through hole 45 is positioned at ring groove 43.
Piston channel 46 is radially arranged in main body 41, and each I district's air inlet through hole 45 correspondence arranges a piston channel 46, and piston channel 46 is connected with I district's air inlet through hole 45. Piston 46-1 it is provided with in piston channel 46; Time inside the motion arrival of piston 46-1 ecto-entad, I district's air inlet through hole 45 is blocked by piston 46-1; And when piston 46-1 outwards moves, I district's air inlet through hole 45 recovers unimpeded.
The top of I district's air inlet through hole 45 arranges porous sieve plate 49. Seeing Fig. 5, described porous sieve plate 49 is annular, and the circumferential direction along porous sieve plate 49 arranges a circle ventilating pit 49-1. The top of the annular boss 44 that porous sieve plate 49 is fixedly installed in ring groove 43. From the waste gas of I district's air inlet through hole 45 inflow by flowing into I reaction zone, district after the ventilating pit 49-1 of porous sieve plate 49. Waste gas is mixed further when through porous sieve plate 49.
Described through hole stopper comprises porous plug 47 and blind hole plug 48 two kinds. The top of the installation platform 42-3 that through hole stopper is placed in through hole 42. The upper hole section 42-1 wringing fit of through hole stopper and through hole 42.
Still seeing Fig. 4, the main body of described porous plug 47 is a right cylinder, comprises blind hole 47-1 and III district's air inlet through hole 47-2. Blind hole 47-1 is arranged on the center upper portion of porous plug 47. III district's air inlet through hole 47-2 is arranged on below blind hole 47-1 and the axis being parallel of the axis of III district's air inlet through hole 47-2 and blind hole 47-1, and the air outlet of III district's air inlet through hole 47-2 communicates with blind hole 47-1.
Seeing Fig. 8, the main body of described blind hole plug 48 is a right cylinder, and the center upper portion of blind hole plug 48 arranges blind hole 48-1.
Reactor 5 is arranged on air inlet divider 4 and gives vent to anger between divider 6.
Seeing Fig. 1, divider 6 of giving vent to anger comprises main body 61, blind hole, ring groove, Ith district goes out vent hole 62 and IIIth district goes out vent hole 63.
Main body 61 is cylindrical, is upwards provided with blind hole from the bottom surface of main body 61, blind hole and main body 61 coaxial line. The blind hole of main body 61 of divider 6 of giving vent to anger is identical with the diameter of the blind hole 47-1 of porous plug 47. IIIth district goes out vent hole 63 and is arranged on above the blind hole of main body 61, and IIIth district goes out the axis of vent hole 63 and the axis being parallel of blind hole. The blind hole of inlet mouth and main body 61 that III district goes out vent hole 63 communicates.
Upwards also be provided with ring groove from the bottom surface of main body 61, ring groove be positioned at blind hole periphery and with blind hole coaxial line. Ith district goes out the upside of the ring groove that vent hole 62 is arranged on main body 61, and Ith district goes out the axis of vent hole 62 and the axis being parallel of ring groove. The ring groove of inlet mouth and main body 61 that I district goes out vent hole 62 communicates.
Upper gas skirt 12 is fixed on the top of divider 6 of giving vent to anger, and the inlet mouth of upper gas skirt 12 is connected with all air outlets of divider 6 of giving vent to anger. The air inlet port of induced draft fan (not shown in FIG.) is connected with the air outlet of upper gas skirt 12.
Reactor 5 is arranged on air inlet divider 4 and gives vent to anger between divider 6, and reactor 5 is arranged on the top of porous sieve plate 49 of air inlet divider 4.
Reactor 5 comprises three layers of quartz medium layer, interior electrode 71, outer electrode 72 and high-voltage power supply 73.
First silica tube 51 that described three layers of quartz medium layer comprise coaxial line, that arrange successively from inside to outside, the 2nd silica tube 52 and the 3rd silica tube 53. The transmitance of the UV-light (near 200nm) of the first silica tube 51 and the 2nd silica tube 52 reaches more than 85%; 3rd silica tube 53 adopts domestic silica tube, and the wall thickness of transmitance < the 40%, three silica tube 53 of its UV-light (near 200nm) is 1～2mm.
The open at both ends of the first silica tube 51, the lower end of the first silica tube 51 is sleeved in the upper blind bore of through hole stopper of air inlet divider 4, the upper end of the first silica tube 51 is sleeved in the blind hole of divider 6 of giving vent to anger, using the internal cavities of the first silica tube 51 as III reaction zone, district. In III reaction zone, district, bracing frame 55(is set as required and sees Fig. 9).
2nd silica tube 52 is sleeved on outside the first silica tube 51, the upper/lower terminal port sintering of the 2nd silica tube 52 is at the outer side of the first silica tube 51, thus form airtight annular cavity and gas fill area 54 between the 2nd silica tube 52 and the first silica tube 51, this airtight annular cavity is filled IIth district as gas.
The open at both ends of the 3rd silica tube 53, the lower end of the 3rd silica tube 53 is sleeved in the ring groove 43 of air inlet divider 4, and supports by the annular boss 44 in ring groove 43. The upper end of the 3rd silica tube 53 is sleeved in the ring groove of divider 6 of giving vent to anger, and the outer side of the 3rd silica tube 53 contacts with the outside cell wall of the ring groove of divider 6 of giving vent to anger. I reaction zone, district is formed between 3rd silica tube 53 and the 2nd silica tube 52. In I reaction zone, district, bracing frame 55(is set as required and sees Fig. 9).
Three layers of quartz medium layer and the divider 6 of giving vent to anger of air inlet divider 4, reactor 5 are coaxially set.
Interior electrode 71 is arranged on the inside of the first silica tube 51, and interior electrode 71 is wire netting or tinsel, and when interior electrode 71 is wire netting, the inwall that wire netting is close to the first silica tube 51 is arranged; When interior electrode 71 is tinsel, the inwall of the first silica tube 51 is close to one layer of tinsel rolled as interior electrode 71.
Outer electrode 72 is arranged on the outer side of the 2nd silica tube 52. The outer side of the 2nd silica tube 52 reels sheet metal as outer electrode 72, or on the outer side of the 2nd silica tube 52 coated metal net as outer electrode 72. Outer electrode 72 and interior electrode 71 are coaxially set so that electric discharge evenly.
Outer electrode 72, interior electrode 71 are connected with high-voltage power supply 73. Described high-voltage power supply 73 is medium-frequency pulse square wave power, and sparking voltage is adjustable within the scope of 0～15kV. Under high-voltage power supply 73 excites, reaction zone, Excimer UV radiation direction I district and the radiation of III reaction zone, district, the waste gas or the air that flow through I reaction zone, district and III reaction zone, district dissociate under Excimer UV radiation effect.
When device adopts blind hole plug 48, pending waste gas can enter I reaction zone, district degraded. Now preferably interior electrode 71 adopts tinsel, and outer electrode 72 adopts wire netting, and the quasi-molecule light excited is all for I reaction zone, district radiation, it is to increase Energy efficiency.
When device adopts porous plug 47, pending waste gas can only enter III reaction zone, district degraded, it is also possible to shunting enters Ith district and III reaction zone, district and degrades. When waste gas only enters III reaction zone, district degraded, it is preferable that interior electrode adopts wire netting, and outer electrode adopts tinsel, the quasi-molecule light excited is all for III reaction zone, district radiation, it is to increase Energy efficiency. When waste gas shunting enters Ith district and degrade in III reaction zone, district, internal and external electrode all adopts wire netting.
In order to make apparatus structure simple in the present embodiment, it is possible to do not arrange gas mixer 3, by the inlet mouth of air inlet divider 4, directly air outlet with adapter sleeve 2 is connected. But pending waste gas is by gas mixer+gas distributor two-stage mixing, it is possible to realize even air inlet, and guarantee process effect is more stable.
When the device of electrodeless quasi-molecule lamp photocatalytic degradation waste gas uses, first the gas between the first silica tube 51 and the 2nd silica tube 52 is filled IIth district and vacuumize, be then filled with the rare gas (Xe selected according to treating degraded gas of certain pressure2), rare gas-halogen (Ar/F2、Kr/Cl2、Kr/Br2、Kr/I2、Xe/I2、Xe/C2、Kr/F2) mixed gas.
In addition, fill the proportioning of blanketing gas in IIth district by changing gas and always press, it is possible to changing high-voltage power supply 73 for exciting the energy distribution of excimer radiation, maximum degree ground improves exhaust gas decomposition effect and energy rate.
Open induced draft fan, induced draft fan will be treated in degraded waste gas suction reactor 5, wait degrade waste gas through gas mixer 3 mix after through air inlet divider 4 time, shunting enters I reaction zone, district and III reaction zone, district of reactor 5, or only enter I reaction zone, district, or only entering III reaction zone, district, after reactor 5 reacts, gas again mixes in upper gas skirt 12, then extracts discharge out by induced draft fan.
(method of embodiment 2, electrodeless quasi-molecule lamp photocatalytic degradation waste gas)
The method of the electrodeless quasi-molecule lamp photocatalytic degradation waste gas of the present embodiment adopts the device described in embodiment 1, and air inlet divider 4 through hole stopper used is blind hole plug 48. Interior electrode 71 adopts tinsel, and outer electrode 72 adopts wire netting.
The flow process of electrodeless quasi-molecule lamp photocatalytic degradation waste gas is: waste gas producer or waste gas gas-holder waste gas out tentatively mixes through gas mixer 3, again after air inlet divider 4 mixes further, enter under induced draft fan effect in reactor 5 and purify. Reactor 5 outlet distance reactor 1m place, thief hatch is set, reacted gas detects its concentration by on-line gas analysis instrument, degrade up to standard after gas discharged by vapor pipe.
Seeing Fig. 6, the present embodiment degraded flowable state simulation dimethylamine exhaust gas, starting point concentration is 3745mg/m3, the method for degraded waste gas specifically comprises the following steps:
1. gas fill IIth district vacuumize, then fill Kr:Cl wherein2=350:1, always presses 205torr.
2. opening high-voltage power supply 73, execute voltage 7.2kV outward, power 78W, the mixed gas that gas fills IIth district is excited and produces the radiation of Excimer UV Guang Xiang I district, and Excimer UV radiation wavelength is 222nm. The piston 46-1 opening air inlet divider 4 makes I district's air inlet through hole 45 unimpeded.
3. opening and the induced draft fan that upper gas skirt 12 is connected, dimethylamine exhaust gas flows out from waste gas producer air outlet, after gas mixer 3 and air inlet divider 4 mix, enters reactor I district and carries out photolysis. The flow of dimethylamine exhaust gas is 14.9m3/h。
4. when on-line gas analysis instrument detection display dimethylamine gas executes voltage 7.2kV outside, removal efficiency reaches 64.5%, and energy rate is 461.4g/ (kW.h)).
In order to improve photolysis efficiency, can lead to into water vapour and dry clean air in the inlet mouth 22-1 of adapter sleeve 22, exhaust gas dilution is mixed into the waste gas containing certain water vapor body fraction, enter into photodissociation in reactor together, aqueous vapor is under the action of uv light, resolve into O and OH free radical, it is to increase photodissociation effect.
(method of embodiment 3, electrodeless quasi-molecule lamp photocatalytic degradation waste gas)
The method of the electrodeless quasi-molecule lamp photocatalytic degradation waste gas of the present embodiment adopts the device described in embodiment 1, and air inlet divider 4 through hole stopper used is porous plug 47. Interior electrode 71 adopts wire netting, and outer electrode 72 adopts tinsel.
Seeing Fig. 7, the present embodiment degraded flowable state simulation dimethylamine exhaust gas, starting point concentration is 3745mg/m3, the method for degraded waste gas specifically comprises the following steps:
1. gas fill IIth district vacuumize, then fill Kr:Cl wherein2=350:1, always presses 205torr.
2. opening high-voltage power supply 73, execute voltage 6kV outward, power 50W, the mixed gas that gas fills IIth district is excited and produces the radiation of reaction zone, Excimer UV Guang Xiang III district, and Excimer UV radiation wavelength is 222nm. The piston 46-1 closing air inlet divider 4 makes I district's air inlet through hole 45 close, and gas can only enter III reaction zone, district by porous plug 47.
3. opening and the induced draft fan that upper gas skirt 12 is connected, dimethylamine exhaust gas flows out from waste gas producer air outlet, after gas mixer 3 and air inlet divider 4 mix, enters reaction zone, reactor III district and carries out photolysis. The flow of dimethylamine exhaust gas is 26.3m3/h。
4. when on-line gas analysis instrument detection display dimethylamine gas executes voltage 6kV outside, photolysis efficiency is 48.6%.
(method of embodiment 4, electrodeless quasi-molecule lamp photocatalytic degradation waste gas)
The through hole stopper that the air inlet divider 4 of the device that the present embodiment is used is used is porous plug 47, and interior electrode 71 adopts wire netting, and outer electrode 72 adopts wire netting.
Seeing Fig. 1, all the other are identical with embodiment 3 for the method for the electrodeless quasi-molecule lamp photocatalytic degradation waste gas of the present embodiment, and difference is:
1. gas is filled IIth district and is vacuumized by step, then fills Kr: Br wherein2=350: 1, always press 150torr.
The step mixed gas that 2. gas fills IIth district is excited and produces Excimer UV Guang Xiang I district and the radiation of III reaction zone, district, and Excimer UV radiation wavelength is 207nm. The piston 46-1 opening air inlet divider 4 makes I district's air inlet through hole 45 unimpeded, and gas distribution enters I district's reactor and III reaction zone, district is reacted.
Step when 4. on-line gas analysis instrument detection display dimethylamine gas executes voltage 6kV outside photolysis efficiency be 35.4%.
(method of embodiment 5, electrodeless quasi-molecule lamp photocatalytic degradation waste gas)
The method of the present embodiment electrodeless quasi-molecule lamp photocatalytic degradation waste gas adopts the device described in embodiment 1, and air inlet divider 4 through hole stopper used is porous plug 47. Interior electrode 71 adopts wire netting, and outer electrode 72 adopts wire netting.
Seeing Fig. 1, the present embodiment degraded flowable state simulation Monomethylamine waste gas, starting point concentration is 2010mg/m3, the method for degraded waste gas specifically comprises the following steps:
1. gas fill IIth district vacuumize, then fill Kr:I wherein2=350:1, always presses 300torr.
2. opening high-voltage power supply 73, execute voltage 7.2kV outward, power 78W, the mixed gas that gas fills IIth district is excited and produces Excimer UV Guang Xiang I district and the radiation of III reaction zone, district, and Excimer UV radiation wavelength is 206nm. The piston 46-1 opening air inlet divider 4 makes I district's air inlet through hole 45 unimpeded, and gas distribution enters I district's reactor and III reaction zone, district is reacted.
3. opening and the induced draft fan that upper gas skirt 12 is connected, Monomethylamine waste gas flows out from waste gas producer air outlet, after gas mixer 3 and air inlet divider 4 mix, enters reactor I district and III reaction zone, district and carries out photolysis. The flow of Monomethylamine waste gas is 26.3m3/h。
4. when on-line gas analysis instrument detection display dimethylamine gas executes voltage 7.2kV outside, photolysis efficiency is 89.5%.
(method of embodiment 6, electrodeless quasi-molecule lamp photocatalytic degradation waste gas)
The method of the present embodiment electrodeless quasi-molecule lamp photocatalytic degradation waste gas adopts the device described in embodiment 1, and air inlet divider 4 through hole stopper used is porous plug 47. Interior electrode 71 adopts wire netting, and outer electrode 72 adopts wire netting.
Seeing Fig. 1, the present embodiment degraded flowable state simulation toluene waste gas, starting point concentration is 1500mg/m3, the method for degraded waste gas specifically comprises the following steps:
1. gas fill IIth district vacuumize, then fill Kr:I wherein2=350:1, always presses 300torr.
2. opening high-voltage power supply 73, execute voltage 7.2kV outward, power 78W, the mixed gas that gas fills IIth district is excited and produces Excimer UV Guang Xiang I district and the radiation of III reaction zone, district, and Excimer UV radiation wavelength is 206nm. The piston 46-1 opening air inlet divider 4 makes I district's air inlet through hole 45 unimpeded, and gas distribution enters I district's reactor and III reaction zone, district is reacted.
3. opening and the induced draft fan that upper gas skirt 12 is connected, toluene waste gas flows out from waste gas producer air outlet, after gas mixer 3 and air inlet divider 4 mix, enters reactor I district and III reaction zone, district and carries out photolysis. The flow of toluene waste gas is 26.3m3/h。
4. when on-line gas analysis instrument detection display toluene gas executes voltage 7.2kV outside, photolysis efficiency is 70.5%.
(method of embodiment 7, electrodeless quasi-molecule lamp photocatalytic degradation waste gas)
Seeing Fig. 9, the method for the present embodiment electrodeless quasi-molecule lamp photocatalytic degradation waste gas adopts the device described in embodiment 1, and air inlet divider 4 through hole stopper used is porous plug 47. Interior electrode 71 adopts wire netting, and outer electrode 72 adopts wire netting. In I reaction zone, district and III reaction zone, district, bracing frame 55 is set, I reaction zone, district and III reaction zone, district catalyst filling TiO2。
The method of the present embodiment electrodeless quasi-molecule lamp photocatalytic degradation waste gas is identical with embodiment 6, and due to the existence of catalyzer, when on-line gas analysis instrument detection display toluene gas executes voltage 7.2kV outside, photolysis efficiency is 92.3.
Claims (2)
1. the device of an electrodeless quasi-molecule lamp photocatalytic degradation waste gas, it is characterised in that: comprise gas skirt (1), adapter sleeve (2), gas mixer (3), air inlet divider (4), reactor (5), divider of giving vent to anger (6) and induced draft fan; Gas skirt (1) comprises lower gas skirt (11) and upper gas skirt (12), and lower gas skirt (11), adapter sleeve (2), reactor (5), divider of giving vent to anger (6) and upper gas skirt (12) are arranged from bottom to top successively; The air inlet port of induced draft fan is connected with the air outlet of upper gas skirt (12);
The inlet mouth of lower gas skirt (11) is connected with the waste gas producer air outlet or gas-holder for the treatment of degraded gas, and the air outlet of lower gas skirt (11) is connected by the inlet mouth of flange with adapter sleeve (2); The air outlet of adapter sleeve (2) communicates with the air inlet end of air inlet divider (4);
Gas mixer (3) is arranged on the inside of adapter sleeve (2), and the inlet mouth of gas mixer (3) communicates with the internal cavities of adapter sleeve (2), and the air outlet of gas mixer (3) communicates with the air inlet end of air inlet divider (4);
Reactor (5) is arranged between air inlet divider (4) and divider of giving vent to anger (6); Reactor (5) comprises three layers of quartz medium layer, interior electrode (71), outer electrode (72) and high-voltage power supply (73); First silica tube (51) that described three layers of quartz medium layer comprise coaxial line, that arrange successively from inside to outside, the 2nd silica tube (52) and the 3rd silica tube (53); Interior electrode (71) is arranged on the inside of the first silica tube (51), and outer electrode (72) is arranged on the outer side of the 2nd silica tube (52); The interior electrode (71) of reactor (5) is tinsel, and outer electrode (72) is wire netting; Or the interior electrode (71) of reactor (5) is wire netting, and outer electrode (72) is tinsel; Or the interior electrode (71) of reactor (5) is wire netting, and outer electrode (72) is wire netting;
The open at both ends of the first silica tube (51), the internal cavities of the first silica tube (51) is III reaction zone, district; 2nd silica tube (52) is sleeved on the first silica tube (51) outward, the outer side of the upper/lower terminal port sintering of the 2nd silica tube (52) in the first silica tube (51), thus form airtight annular cavity between the 2nd silica tube (52) and the first silica tube (51), fill IIth district as gas; The open at both ends of the 3rd silica tube (53), forms I reaction zone, district between the 3rd silica tube (53) and the 2nd silica tube (52);
Described air inlet divider (4) comprises main body (41), through hole (42), ring groove (43), through hole stopper, I district's air inlet through hole (45) and porous sieve plate (49); Through hole (42) is arranged on the central authorities of main body (41), ring groove (43) is arranged on the periphery of through hole (42) and is coaxially set with through hole (42), the axis of I district's air inlet through hole (45) and the axis being parallel of main body (41) also run through main body (41) completely, the air outlet of I district's air inlet through hole (45) is positioned at ring groove (43), and porous sieve plate (49) is arranged on I district's air inlet through hole (45) top;
Through hole stopper is arranged in through hole (42), and through hole stopper is porous plug (47) or blind hole plug (48); The main body of described porous plug (47) is a right cylinder, comprise blind hole (47-1) and III district's air inlet through hole (47-2), blind hole (47-1) is arranged on the center upper portion of porous plug (47), and the air outlet that III district's air inlet through hole (47-2) is arranged on blind hole (47-1) lower section and III district's air inlet through hole (47-2) communicates with blind hole (47-1); The main body of described blind hole plug (48) is a right cylinder, and the center upper portion of blind hole plug (48) arranges blind hole (48-1);
Ith district of I district's air inlet through hole (45) of air inlet divider (4), I reaction zone, district and divider of giving vent to anger (6) goes out vent hole (62) and is connected; When through hole stopper is porous plug (47), IIIth district of III district's air inlet through hole (47-2) of air inlet divider (4), III reaction zone, district and divider of giving vent to anger (6) goes out vent hole (63) and is connected.
2. the device of electrodeless quasi-molecule lamp photocatalytic degradation waste gas according to claim 1, it is characterized in that: air inlet divider (4) also comprises piston channel (46), piston channel (46) is arranged in main body (41) along the radial direction of main body (41), each I district's air inlet through hole (45) correspondence arranges a piston channel (46), and piston channel (46) is connected with I district's air inlet through hole (45); Being provided with piston (46-1) in piston channel 46, inside the motion arrival of piston (46-1) ecto-entad, Shi Jiang I district's air inlet through hole (45) blocks.
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| DE3642472A1 (en) * | 1986-12-12 | 1988-06-23 | Bbc Brown Boveri & Cie | Process and apparatus for purifying exhaust gases |
| JP2003071243A (en) * | 2001-09-05 | 2003-03-11 | Techno Plex:Kk | Ultraviolet irradiation gas treatment apparatus |
| CN201524523U (en) * | 2009-04-28 | 2010-07-14 | 欧阳烽 | Industrial waste gas and odor treating device |
| WO2012059746A2 (en) * | 2010-11-03 | 2012-05-10 | Albagaia Limited | Fluid treatment apparatus |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3642472A1 (en) * | 1986-12-12 | 1988-06-23 | Bbc Brown Boveri & Cie | Process and apparatus for purifying exhaust gases |
| JP2003071243A (en) * | 2001-09-05 | 2003-03-11 | Techno Plex:Kk | Ultraviolet irradiation gas treatment apparatus |
| CN201524523U (en) * | 2009-04-28 | 2010-07-14 | 欧阳烽 | Industrial waste gas and odor treating device |
| WO2012059746A2 (en) * | 2010-11-03 | 2012-05-10 | Albagaia Limited | Fluid treatment apparatus |
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Effective date of registration: 20221012 Address after: Room 1701, Building 1, Xinqiao Commercial Plaza, Xinqiao Street, Xinbei District, Changzhou City, Jiangsu Province, 213000 Patentee after: JIANGSU LONGHUAN ENVIRONMENTAL TECHNOLOGY CO.,LTD. Address before: 213001, No. 1801, Wu Cheng Road, bell tower, Changzhou, Jiangsu Patentee before: JIANGSU University OF TECHNOLOGY |