CN104473779A - Non-toxic nail polish - Google Patents
Non-toxic nail polish Download PDFInfo
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- CN104473779A CN104473779A CN201410682072.9A CN201410682072A CN104473779A CN 104473779 A CN104473779 A CN 104473779A CN 201410682072 A CN201410682072 A CN 201410682072A CN 104473779 A CN104473779 A CN 104473779A
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- pigment
- toluene
- nitrocellulose
- ethyl acetate
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- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Abstract
The invention discloses nail polish. The nail polish is prepared from the following components in percentage by weight: 10-20 percent of nitrocellulose, 8-10 percent of acrylic resin, 3-8 percent of tributyl acetyl citrate, 10-20 percent of ethyl acetate, 10-15 percent of butyl caproate, 5-8 percent of butanol, 30-35 percent of methylbenzene and 3-8 percent of pigment. The nail polish does not contain toxic or harmful substances, does not have side effect on human bodies, and can be used safely.
Description
Technical field
The invention belongs to household chemicals field, relate to a kind of nial polish.
Background technology
Nial polish is also known as " nail varuish ".Its main component is the volatile solvent of 70%-80%, the nitrocellulose of about 15%, a small amount of oil-based solvent, Camphora, titanium dioxide and oily molten pigment etc.The thin film that nial polish is formed after being applied to fingernail, strong and there is the painted gloss of appropriateness, fingernail can be protected, give again fingernail a kind of aesthetic feeling.
The composition of General nail oil is generally made up of two classes, and a class is solid state component, mainly pigment, flash of light material etc.; One class is the solvent composition of liquid, and what mainly use has acetone, ethyl acetate, phthalic acid ester, formaldehyde etc.But these solvent compositions are substantially all poisonous or harmful materials, wherein the most severe, should be phthalic acid ester, be secondly formaldehyde, acetone etc.Wherein phthalic acid ester can hinder normal hormonal balance, causes serious reproduction infringement and other health problems; Formaldehyde can cause the gene mutation of mammal nuclear, chromosome damage, eight fractures, and be a kind of carcinogen, acetone is to the anesthetic action of central nervous system
Summary of the invention
Goal of the invention: the problem containing poisonous and harmful substance for nial polish of the prior art, the invention provides a kind of formula of nial polish of nonhazardous.
Technical scheme: by weight percentage, each component and content are nial polish of the present invention:
Nitrocellulose 10 ~ 20%; Acrylic resin 8 ~ 10%; Acetyltributyl citrate 3 ~ 8%; Ethyl acetate 10 ~ 20%; The sixth of the twelve Earthly Branches acid butyl ester 10 ~ 15%; Butanols 5 ~ 8%; Toluene 30 ~ 35%; Pigment 3 ~ 8%.
Preferably, nial polish of the present invention is by weight percentage: each component and content are:
Nitrocellulose 15%; Acrylic resin 9%; Acetyltributyl citrate 5%; Ethyl acetate 20%; The sixth of the twelve Earthly Branches acid butyl ester 14%; Butanols 6%; Toluene 31%; Pigment 5%.
The preparation method of nial polish of the present invention, carry out according to the following steps:
By acrylic resin, acetyltributyl citrate, ethyl acetate, the sixth of the twelve Earthly Branches acid butyl ester add in toluene, continuous stirring, then add toluene, maintains and stirs, then add nitrocellulose, finally add pigment, namely obtain this product.
Beneficial effect: nial polish of the present invention, not containing poisonous and harmful substance, is free from side effects to human body, can uses safely.
Detailed description of the invention:
Below by specific embodiment, the present invention is further described:
Embodiment 1
9g acrylic resin, 5g acetyltributyl citrate, 20g ethyl acetate, 14g acid butyl ester in the sixth of the twelve Earthly Branches are added in 31g toluene, continuous stirring, then add 6g butanols, maintain and stir, then add 15g nitrocellulose, fully stir, finally add 5g pigment, namely obtain this product.
Products obtained therefrom contains nitrocellulose 15%; Acrylic resin 9%; Acetyltributyl citrate 5%; Ethyl acetate 20%; The sixth of the twelve Earthly Branches acid butyl ester 14%; Butanols 6%; Toluene 31%; Pigment 5%.
Embodiment 2
Preparation method is identical with embodiment, changes each component proportion, and each component of products obtained therefrom and content are: nitrocellulose 10%; Acrylic resin 8%; Acetyltributyl citrate 3%; Ethyl acetate 10%; The sixth of the twelve Earthly Branches acid butyl ester 10%; Butanols 5%; Toluene 30%; Pigment 3%.
Embodiment 3
Preparation method is identical with embodiment, changes each component proportion, and each component of products obtained therefrom and content are: nitrocellulose 20%; Acrylic resin 10%; Acetyltributyl citrate 8%; Ethyl acetate 20%; The sixth of the twelve Earthly Branches acid butyl ester 15%; Butanols 8%; Toluene 35%; Pigment 8%.
Claims (3)
1. a nial polish, is characterized in that, by weight percentage, each component and content are:
Nitrocellulose 10 ~ 20%; Acrylic resin 8 ~ 10%; Acetyltributyl citrate 3 ~ 8%; Ethyl acetate 10 ~ 20%; The sixth of the twelve Earthly Branches acid butyl ester 10 ~ 15%; Butanols 5 ~ 8%; Toluene 30 ~ 35%; Pigment 3 ~ 8%.
2. nial polish as claimed in claim 1, is characterized in that, by weight percentage: each component and content are:
Nitrocellulose 15%; Acrylic resin 9%; Acetyltributyl citrate 5%; Ethyl acetate 20%; The sixth of the twelve Earthly Branches acid butyl ester 14%; Butanols 6%; Toluene 31%; Pigment 5%.
3. the preparation method of nial polish as claimed in claim 1, carry out according to the following steps:
By acrylic resin, acetyltributyl citrate, ethyl acetate, the sixth of the twelve Earthly Branches acid butyl ester add in toluene, continuous stirring, then add toluene, maintains and stirs, then add nitrocellulose, finally add pigment, namely obtain this product.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410682072.9A CN104473779A (en) | 2014-11-24 | 2014-11-24 | Non-toxic nail polish |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410682072.9A CN104473779A (en) | 2014-11-24 | 2014-11-24 | Non-toxic nail polish |
Publications (1)
Publication Number | Publication Date |
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CN104473779A true CN104473779A (en) | 2015-04-01 |
Family
ID=52748485
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201410682072.9A Withdrawn CN104473779A (en) | 2014-11-24 | 2014-11-24 | Non-toxic nail polish |
Country Status (1)
Country | Link |
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CN (1) | CN104473779A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105213260A (en) * | 2015-10-27 | 2016-01-06 | 桂林瑞丰环保微生物应用研究所 | Low stimulation nial polish of a kind of environmental protection and preparation method thereof |
CN105232380A (en) * | 2015-10-27 | 2016-01-13 | 桂林瑞丰环保微生物应用研究所 | Nail polish with fragrance and preparation method thereof |
CN105232383A (en) * | 2015-10-27 | 2016-01-13 | 桂林瑞丰环保微生物应用研究所 | Antibacterial caring nail polish and preparation method thereof |
CN105250174A (en) * | 2015-10-27 | 2016-01-20 | 桂林瑞丰环保微生物应用研究所 | Health care nursing type nail polish and preparation method thereof |
-
2014
- 2014-11-24 CN CN201410682072.9A patent/CN104473779A/en not_active Withdrawn
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105213260A (en) * | 2015-10-27 | 2016-01-06 | 桂林瑞丰环保微生物应用研究所 | Low stimulation nial polish of a kind of environmental protection and preparation method thereof |
CN105232380A (en) * | 2015-10-27 | 2016-01-13 | 桂林瑞丰环保微生物应用研究所 | Nail polish with fragrance and preparation method thereof |
CN105232383A (en) * | 2015-10-27 | 2016-01-13 | 桂林瑞丰环保微生物应用研究所 | Antibacterial caring nail polish and preparation method thereof |
CN105250174A (en) * | 2015-10-27 | 2016-01-20 | 桂林瑞丰环保微生物应用研究所 | Health care nursing type nail polish and preparation method thereof |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C04 | Withdrawal of patent application after publication (patent law 2001) | ||
WW01 | Invention patent application withdrawn after publication |
Application publication date: 20150401 |