CN104419847A - Titanium-aluminum-chromium alloy target material and preparation method thereof - Google Patents
Titanium-aluminum-chromium alloy target material and preparation method thereof Download PDFInfo
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- CN104419847A CN104419847A CN201310412855.0A CN201310412855A CN104419847A CN 104419847 A CN104419847 A CN 104419847A CN 201310412855 A CN201310412855 A CN 201310412855A CN 104419847 A CN104419847 A CN 104419847A
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Abstract
The invention provides a titanium-aluminum-chromium alloy target material and a preparation method thereof. The alloy target material is prepared from the following components in atom percentage: 5-75 percent of titanium, 10-90 percent of aluminum and 1-20 percent of chromium. The preparation method comprises the steps of preparing alloy powder, carrying out cold isostatic pressing treatment, degassing, carrying out heat isostatic pressing treatment and mechanically processing. The titanium-aluminum-chromium alloy target material has the advantages of high compactness, no pores or segregation, uniform texture, fine crystalline grain and the like, and is suitable for sputtering coatings of multiple cutters and molds.
Description
Technical field
The invention belongs to mmaterial and preparing technical field thereof, particularly a kind of titanium aluminum chromium target and preparation method.
Background technology
Since the sixties in 20th century, tool surface coating technology has become the main method promoting cutting performance.Tool surface coating, mainly through improving tool surface hardness, thermostability, reducing the methods such as frictional coefficient and promoting cutting speed, improving speed of feed, thus improving stock-removing efficiency, and significantly promoting cutter life.
The surface of metal tool die material is plated one deck TiN, TiCN, TiAl(CN) rete, improves the wear resisting property of instrument, mould.Pure titanium or titanium-aluminium alloy target material are developed at present to prepare this rete.Research shows, uses TiN, TiCN, TiAl(CN prepared by pure titanium or titanium-aluminium alloy target material) etc. rete, the surface hardness that can reach at work, die surface is 2400-2800HV, and frictional coefficient is 0.50-0.55, and maximum operation (service) temperature is 400-600 DEG C.In actual applications, varied to the performance requriements of work, mould, existing pure titanium or titanium-aluminium alloy target material, cannot meet the service requirements of work, die surface plated film rete, needs exploitation to be applicable to the multicomponent alloy target of specific service requirements.
Current production target mainly contains vacuum melting casting, hot pressing, hot isostatic pressing three kinds of techniques.Vacuum melting casting process is produced in target casting cycle and is easily produced shrinkage cavity, loose and macrosegregation, and in alloy, the homogeneity of composition and tissue is difficult to ensure simultaneously.Heat pressing process produce target produce be difficult to realize in large size, the target of hot pressing simultaneously internal density skewness, middle part and marginal density difference can reach 5%, be difficult to obtain high quality highdensity target, as the publication number powder under vacuum hot pressed sintering preparation method that is the chromium-aluminum alloy target material disclosed in the Chinese patent application of CN102363215A.Hot isostatic pressing method explained hereafter target, easily obtain even fine crystalline structure, target even density, can meet the production of large-size target, can obtain the ternary alloy sputtering target material of excellent performance.
Titanium aluminum chromium target production technology difficulty is large, and the document therefore about its research is less, and patented technology more rarely has it.
Summary of the invention
For the defect of prior art, the object of the present invention is to provide a kind of titanium aluminum chromium target, this target can have good compactness, pore-free, nothing are loosened and segregation, uniform composition, crystal grain is tiny, the feature that specification is large, coating hardness and the oxidation-resistance of its formation are high, meet the service requirements of interrupted cut and difficult-to-machine material processing aspect.
Another object of the present invention is to the preparation method that a kind of above-mentioned titanium aluminum chromium target is provided.The method can realize the preparation of high-quality ternary alloy titanium aluminium chromium target, and the target of preparation has good compactness, and pore-free, nothing are loosened and segregation, and uniform composition, crystal grain is tiny, the feature that specification is large.
To achieve these goals, present invention employs following technical scheme:
A kind of titanium aluminum chromium target, consists of the following composition by atomic percent: titanium 5-75%, aluminium 10-90%, chromium 1-20%.
Preferably, above-mentioned titanium aluminum chromium target consists of the following composition by atomic percent: titanium 25%, aluminium 60%, chromium 15%.
The relative density of above-mentioned titanium aluminum chromium target is more than 99%, and average grain size is not more than 100 μm.
The preparation method of above-mentioned titanium aluminum chromium target, comprises the following steps:
Step one, the preparation of powdered alloy;
Step 2, carries out isostatic cool pressing process to the described powdered alloy prepared;
Step 3, carries out degassed process to the material base after described isostatic cool pressing process;
Step 4, carries out hip treatment to the material base after described degassed process;
Step 5, carries out machining to the material base after described hip treatment, obtains required final alloy target after cleaning.
In above-mentioned preparation method, the method for this area routine when the preparation of described powdered alloy is not particularly illustrated, can be adopted, namely adopt this area ordinary method that raw material is made powdered alloy.As a kind of optimal way, in described step one, the preparation of described powdered alloy can be adopt powder by atomization method to prepare powdered alloy or directly satisfactory for median size raw material is carried out mixing to prepare powdered alloy in mixer.When adopt mixer be averaged the mixing of particle diameter satisfactory raw material time, be more preferably and in V-type mixer, mix 3-5h under vacuum or protection of inert gas condition.
In above-mentioned preparation method, as a kind of optimal way, in described step one, the median size of described powdered alloy is 30-150 μm, exemplarily, median size can be 30-50 μm, 60-70 μm, 120-140 μm, 80-100 μm, 50 μm, 90 μm, 145 μm.The purity preparing described powdered alloy feed metal titanium used is preferably more than 99.6%, the purity of metallic aluminium is preferably more than 99.7%, the purity of chromium metal is preferably more than 99.8%.
In above-mentioned preparation method, as a kind of optimal way, in described step 2, under 20-200MPa pressure, carry out isostatic cool pressing process, the dwell time is 10-30min.Exemplarily, pressure during described isostatic cool pressing process can be 22MPa, 30MPa, 40MPa, 50MPa, 65MPa, 100MPa, 140MPa, 155MPa, 168MPa, 180MPa, 190MPa; Dwell time can be 10min, 13min, 15min, 18min, 20min.
In above-mentioned preparation method, as a kind of optimal way, in described step 3, the temperature of described degassed process is 300-500 DEG C, and degassing time is 5-30h.Exemplarily, described temperature can be 305 DEG C, 320 DEG C, 350 DEG C, 370 DEG C, 400 DEG C, 425 DEG C, 450 DEG C, 480 DEG C, 495 DEG C; Described degassing time can be 5h, 10h, 20h, 25h, 28h.More preferably, vacuum degree control during described degassed process is 10
-1pa ~ 10
-4pa, exemplarily, vacuum tightness can be 10
-1pa, 10
-2pa, 10
-3pa, 10
-4pa.
In above-mentioned preparation method, as a kind of optimal way, in described step 4, the holding temperature of described hip treatment is 800-1300 DEG C, and soaking time is 2-5h, and pressure is 120-150MPa.Exemplarily, described holding temperature can be 805 DEG C, 850 DEG C, 920 DEG C, 1050 DEG C, 1230 DEG C, 1296 DEG C; Described soaking time can be 2h, 3h, 4.5h, 5h; Described pressure can be 123MPa, 134MPa, 138MPa, 145MPa, 148MPa, 150MPa.
Compared to prior art, the present invention has following beneficial effect:
(1) titanium aluminum chromium target of the present invention have that density is high, pore-free and segregation, homogeneous microstructure, the advantages such as crystal grain is tiny, relative density is more than 99%, and average grain size is not more than 100 μm.This target is applicable to multiple cutter, the sputtering of grinding tool coating uses.Can greatly improve coating hardness and oxidation-resistance, meet the service requirements of interrupted cut and difficult-to-machine material processing aspect.Its hardness can reach 30GPa, and oxidation resistance temperature can reach 950 DEG C.
(2) present invention achieves the preparation of high-quality ternary alloy titanium aluminium chromium target.
Accompanying drawing explanation
Fig. 1 is the micro-organization chart of the target that the embodiment of the present invention 2 obtains.
Embodiment
Further describe the present invention below by way of specific embodiment, but be not limited thereto.
Embodiment 1
The titanium aluminum chromium target that the present embodiment provides is grouped into by the one-tenth of following atomic percent: titanium 50%, aluminium 40%, chromium 10%.
The preparation method of this example titanium aluminium chromium target, comprises the following steps:
Step one, by the design requirements of above-mentioned target material composition take purity be 99.6% metal titanium 59.9 parts, purity be 99.7% metallic aluminium 27.0 parts and purity be 99.8% chromium metal 13.1 parts, adopt powder by atomization technique to obtain the powdered alloy (i.e. pre-alloyed powder) that median size is 40 μm;
Described powder by atomization technique adopts arc-melting method to carry out melting of metal, and adopt rare gas element-metal atomization milling method to prepare above-mentioned powdered alloy;
Step 2, loaded in cold isostatic compaction mould by gained powdered alloy, under the pressure of 200MPa, carry out isostatic cool pressing process, the dwell time is 30min;
Step 3, loaded by the material base after isostatic cool pressing process in the suitable stainless steel jacket of size, be placed on by jacket in degassing equipment and carry out degassed process, Heating temperature is 500 DEG C, and soaking time is 20h; During insulation, vacuum degree control is 10
-2about Pa; Described degassing equipment can be commercially available diffusion pump and well formula resistance furnace.
Step 4, sinter putting into hot isostatic apparatus after degassed complete jacket soldering and sealing, holding temperature is 1300 DEG C, and soaking time is 5h, and pressure is 120MPa;
Step 5, carries out machining to the ingot blank after described hip treatment, and obtain required final alloy target after cleaning, it is of a size of 1000*200*18mm.
The target relative density that this example obtains reaches 99%, average grain size 100 μm.
This composition target is plated in the coating obtained by YG6 carbide tool surface through vacuum sputtering, and its hardness can reach 30GPa, and oxidation resistance temperature can reach 930 DEG C.
Embodiment 2
The titanium aluminum chromium target that the present embodiment provides is grouped into by the one-tenth of following atomic percent, titanium 9%, aluminium 90%, chromium 1%.
The preparation method of this example titanium aluminium chromium target, comprises the following steps:
Step one; titanium valve 14.8 parts, aluminium powder 83.4 parts, the chromium powder 1.8 parts that median size is 80 μm, purity is 99.7% is taken by the design requirements of above-mentioned target material composition; it is mixed 3h in V-type mixer, and vacuumize in mixing process and protect, vacuum degree control is 10
-2about Pa;
Step 2, loaded in cold isostatic compaction mould by the powdered alloy mixed, under the pressure of 150MPa, carry out isostatic cool pressing process, the dwell time is 10min;
Step 3, loads the material base after isostatic cool pressing process in the suitable metal capsule of size, is placed on by jacket in degassing equipment and carries out degassed process, Heating temperature 350 DEG C, soaking time 30h; During insulation, vacuum degree control is 10
-3about Pa;
Step 4, sinter putting into hot isostatic apparatus after degassed complete jacket soldering and sealing, holding temperature is 1100 DEG C, soaking time 3h, pressure 150MPa;
Step 5, carries out machining to the ingot blank after described hip treatment, and obtain required final alloy target after cleaning, it is of a size of 1200*200*18mm.
The target relative density that this example obtains reaches 99.2%, average grain size 70 μm.As can be seen from Figure 1, the target that the present embodiment obtains has that density is high, pore-free and segregation, homogeneous microstructure, the feature that crystal grain is tiny.
This composition target is plated in the coating obtained by YG6 carbide tool surface through vacuum sputtering, and its hardness can reach 25GPa, and oxidation resistance temperature can reach 900 DEG C.
Embodiment 3
The titanium aluminum chromium target that the present embodiment provides is grouped into by the one-tenth of following atomic percent, titanium 5%, aluminium 75%, chromium 20%.
The preparation method of this example titanium aluminium chromium target, comprises the following steps:
Step one, take by the design requirements of above-mentioned target material composition median size is 150 μm, purity is 99.7% titanium valve 7.2 parts, purity is 99.9% aluminium powder 61.3 parts, purity is 99.9% chromium powder 31.5 parts, it is mixed 5h in V-type mixer, in mixing process, is filled with high-purity argon gas protection;
Step 2, loaded in cold isostatic compaction mould by the powder mixed and carry out isostatic cool pressing process, isostatic cool pressing pressure is 200MPa, and the dwell time is 20min;
Step 3, loaded by isostatic cool pressing material base in the suitable metal capsule of size, be placed on by jacket in degassing equipment and carry out degassed process, Heating temperature is 300 DEG C, and soaking time is 15h; During insulation, vacuum degree control is 10
-4about Pa;
Step 4, sinter putting into hot isostatic apparatus after degassed complete jacket soldering and sealing, holding temperature is 1250 DEG C, soaking time 4h, pressure 135MPa;
Step 5, carries out machining to the ingot blank after described hip treatment, and obtain required final alloy target after cleaning, it is of a size of 850*104*20mm.
The target relative density that this example obtains reaches 99.7%, average grain size 90 μm.
This composition target is plated in the coating obtained by YG6 carbide tool surface through vacuum sputtering, and its hardness can reach 26GPa, and oxidation resistance temperature can reach 910 DEG C.
Embodiment 4
The titanium aluminum chromium target that the present embodiment provides is grouped into by the one-tenth of following atomic percent, titanium 75%, aluminium 10%, chromium 15%.
The preparation method of this example titanium aluminium chromium target, comprises the following steps:
Step one, takes by the design requirements of above-mentioned target material composition titanium valve 77.4 parts, aluminium powder 5.8 parts, the chromium powder 16.8 parts that median size is 30 μm, purity is 99.7%, it is mixed 4h in V-type mixer, is filled with high-purity argon gas protection in mixing process;
Step 2, loaded in cold isostatic compaction mould by the powder mixed and carry out isostatic cool pressing process, isostatic cool pressing pressure is 20MPa, and the dwell time is 30min;
Step 3, loaded by isostatic cool pressing material base in the suitable stainless steel jacket of size, be placed on by jacket in degassing equipment and carry out degassed process, Heating temperature is 400 DEG C, and soaking time is 5h; During insulation, vacuum degree control is 10
-3about Pa;
Step 4, sinter putting into hot isostatic apparatus after degassed complete jacket soldering and sealing, holding temperature is 800 DEG C, and soaking time is 2h, and pressure is 140MPa;
Step 5, carries out machining to the ingot blank after described hip treatment, and obtain required final alloy target after cleaning, it is of a size of 1050*104*20mm.
The target relative density that this example obtains reaches 99.7%, average grain size 80 μm.
This composition target is plated in the coating obtained by YG6 carbide tool surface through vacuum sputtering, and its hardness can reach 28GPa, and oxidation resistance temperature can reach 950 DEG C.
Embodiment 5
The titanium aluminum chromium target that the present embodiment provides is grouped into by the one-tenth of following atomic percent, titanium 25%, aluminium 60%, chromium 15%.
The preparation method of this target is with embodiment 2, and the target size obtained is 1140*180*23mm.
The target relative density that this example obtains reaches 99.8%, average grain size 65 μm.
Use this composition target to be plated in YG6 carbide tool surface through vacuum sputtering and obtain coating, its hardness can reach 28GPa, and oxidation resistance temperature can reach 940 DEG C.
In above embodiment, the measuring method of each parameter is as follows: relative density adopts Archimedes's drainage to measure; By optical metallographic microscope, target crystalline grains size is analyzed; Micro-nano sclerometer is adopted to detect cutter coating hardness; Adopt natural thermocouple method to measure Tool in Cutting temperature, and determine coating oxidation temperature.
Should be appreciated that the purposes of these embodiments is only not intended to for illustration of the present invention limit the scope of the invention.In addition; also should understand; after having read technology contents of the present invention, those skilled in the art can make various change, amendment and/or modification to the present invention, and these all equivalent form of values fall within the protection domain that the application's appended claims limits equally.
Claims (10)
1. a titanium aluminum chromium target, is characterized in that, consists of the following composition by atomic percent: titanium 5-75%, aluminium 10-90%, chromium 1-20%.
2. titanium aluminum chromium target according to claim 1, is characterized in that, consist of the following composition by atomic percent: titanium 25%, aluminium 60%, chromium 15%.
3. titanium aluminum chromium target according to claim 1, is characterized in that, the relative density of described alloy target material is more than 99%, and average grain size is not more than 100 μm.
4. the preparation method of the arbitrary described titanium aluminum chromium target of claim 1-3, is characterized in that, comprise the following steps:
Step one, the preparation of powdered alloy;
Step 2, carries out isostatic cool pressing process to the described powdered alloy prepared;
Step 3, carries out degassed process to the material base after described isostatic cool pressing process;
Step 4, carries out hip treatment to the material base after described degassed process;
Step 5, carries out machining to the material base after described hip treatment, obtains required final alloy target after cleaning.
5. preparation method according to claim 4, is characterized in that, in described step one, described powdered alloy adopts prepared by powder by atomization method or directly carried out mixing preparing by satisfactory for median size raw material in mixer.
6. preparation method according to claim 5, is characterized in that, describedly in mixer, directly satisfactory for median size raw material is carried out mixing refer in V-type mixer, mix 3-5h under vacuum or protection of inert gas condition.
7. preparation method according to claim 4, is characterized in that, the median size of described powdered alloy is 30-150 μm.
8. preparation method according to claim 4, is characterized in that, in described step 2, under 20-200MPa pressure, carries out isostatic cool pressing process, and the dwell time is 10-30min.
9. preparation method according to claim 4, is characterized in that, in described step 3, the temperature of described degassed process is 300-500 DEG C, and degassing time is 5-30h; Preferably, vacuum degree control during described degassed process is 10
-1pa ~ 10
-4pa.
10. preparation method according to claim 4, is characterized in that, in described step 4, the holding temperature of described hip treatment is 800-1300 DEG C, and soaking time is 2-5h, and pressure is 120-150MPa.
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105886837A (en) * | 2016-04-14 | 2016-08-24 | 熊启兵 | Electrical net hanger |
| CN112517917A (en) * | 2020-11-25 | 2021-03-19 | 河南东微电子材料有限公司 | Preparation method of CrTiLa alloy powder for chromium-titanium target material |
| CN112813326A (en) * | 2020-12-29 | 2021-05-18 | 有研工程技术研究院有限公司 | Titanium-aluminum-chromium alloy target and preparation method thereof |
| CN113088900A (en) * | 2021-03-31 | 2021-07-09 | 宁波江丰电子材料股份有限公司 | Preparation method of titanium-chromium alloy sputtering target material for magnetic recording |
| CN113981388A (en) * | 2021-10-25 | 2022-01-28 | 北京安泰六九新材料科技有限公司 | Preparation method of high-density TiAl and TiAlMe target material |
| CN113996787A (en) * | 2021-10-26 | 2022-02-01 | 北京安泰六九新材料科技有限公司 | Preparation method of sputtering target material of titanium-based alloy |
| CN114318257A (en) * | 2021-12-31 | 2022-04-12 | 北京安泰六九新材料科技有限公司 | Preparation method of aluminum-based powder alloy target |
| CN116855902A (en) * | 2023-07-21 | 2023-10-10 | 苏州六九新材料科技有限公司 | Low-aluminum-content titanium-based target material and preparation method thereof |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105886837A (en) * | 2016-04-14 | 2016-08-24 | 熊启兵 | Electrical net hanger |
| CN112517917A (en) * | 2020-11-25 | 2021-03-19 | 河南东微电子材料有限公司 | Preparation method of CrTiLa alloy powder for chromium-titanium target material |
| CN112813326A (en) * | 2020-12-29 | 2021-05-18 | 有研工程技术研究院有限公司 | Titanium-aluminum-chromium alloy target and preparation method thereof |
| CN113088900A (en) * | 2021-03-31 | 2021-07-09 | 宁波江丰电子材料股份有限公司 | Preparation method of titanium-chromium alloy sputtering target material for magnetic recording |
| CN113981388A (en) * | 2021-10-25 | 2022-01-28 | 北京安泰六九新材料科技有限公司 | Preparation method of high-density TiAl and TiAlMe target material |
| CN113996787A (en) * | 2021-10-26 | 2022-02-01 | 北京安泰六九新材料科技有限公司 | Preparation method of sputtering target material of titanium-based alloy |
| CN114318257A (en) * | 2021-12-31 | 2022-04-12 | 北京安泰六九新材料科技有限公司 | Preparation method of aluminum-based powder alloy target |
| CN116855902A (en) * | 2023-07-21 | 2023-10-10 | 苏州六九新材料科技有限公司 | Low-aluminum-content titanium-based target material and preparation method thereof |
| CN116855902B (en) * | 2023-07-21 | 2024-04-16 | 苏州六九新材料科技有限公司 | Low-aluminum-content titanium-based target material and preparation method thereof |
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