CN104402001B - Polysilicon hydrogenation exhaust gas recovery system and waste gas utilization method - Google Patents
Polysilicon hydrogenation exhaust gas recovery system and waste gas utilization method Download PDFInfo
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- CN104402001B CN104402001B CN201410593306.2A CN201410593306A CN104402001B CN 104402001 B CN104402001 B CN 104402001B CN 201410593306 A CN201410593306 A CN 201410593306A CN 104402001 B CN104402001 B CN 104402001B
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Abstract
The invention discloses a kind of polysilicon hydrogenation exhaust gas recovery system and waste gas utilization method, wherein system includes: hydrogen chloride storage tank, stores low temperature chlorination hydrogen liquid；Absorption tower rich solution heat exchanger, the heat exchange in the rich solution heat exchanger of absorption tower of the silicon chloride lean solution of absorption tower rich solution and Analytic Tower；Hydrogen chloride vaporizer, its tube-side inlet is connected with absorption tower rich solution heat exchanger, and the chlorosilane lean solution after heat exchange enters the tube side of hydrogen chloride vaporizer, and the shell side of described hydrogen chloride vaporizer connects hydrogen chloride storage tank；Freon-Evaporator, connects the outlet of hydrogen chloride vaporizer tube side, and Freon-Evaporator sends into absorption tower after freezing the chlorosilane lean solution from hydrogen chloride vaporizer tube side；Remove rectification chlorosilane heat exchanger, connect hydrogen chloride vaporizer shell side, in removing rectification chlorosilane heat exchanger, be delivered to trichlorosilane synthesis with after going the chlorosilane heat exchange of rectification from the hydrogen chloride of hydrogen chloride vaporizer shell side.The present invention can reduce energy consumption, promotes the production capacity of hydrogenation.
Description
Technical field
The present invention relates to polysilicon preparing technical field, particularly relate to a kind of polysilicon hydrogenated tail gas
Recovery system and waste gas utilization method.
Background technology
Improved Siemens produces in polysilicon process, and hydrogen chloride produced by hydrogenation is cold
After solidifying separation, boosting absorb, Analytic Tower parse hydrogen chloride gas through being cooled to-40 DEG C of changes
For hydrogen chloride liquid, a part is back to Analytic Tower and maintains tower top temperature, and a part of extraction is passed through
The chlorosilane going to rectification workshop is heated to be hydrogen chloride gas and delivers to trichlorosilane synthesis.-40 DEG C of chlorinations
Hydrogen liquid is heated to be hydrogen chloride gas by the chlorosilane going to rectification workshop and delivers to trichlorosilane synthesis,
Slattern a large amount of colds wherein carried, and Analytic Tower chlorosilane lean solution and absorption tower chlorosilane
After rich solution heat exchange extremely-15 DEG C-20 DEG C, need a large amount of freon deep cooling.Wherein-40
Cold DEG C entrained by hydrogen chloride liquid fails Appropriate application.
Summary of the invention
In view of this, the embodiment of the present invention provides a kind of polysilicon hydrogenation exhaust gas recovery system and tail
Gas Application way, main purpose is to reduce energy consumption, promotes the production capacity of hydrogenation.
For reaching above-mentioned purpose, present invention generally provides following technical scheme:
On the one hand, a kind of polysilicon hydrogenation exhaust gas recovery system, bag are embodiments provided
Include:
Hydrogen chloride storage tank, storage is from rectifying column 2 top low temperature hydrogen chloride liquid；
Absorption tower rich solution heat exchanger, described absorption tower rich solution heat exchanger receives absorption tower rich solution and conciliates
The silicon chloride lean solution of analysis tower, described absorption tower rich solution and Analytic Tower silicon chloride lean solution are in described absorption
Heat exchange in tower rich solution heat exchanger；
Hydrogen chloride vaporizer, its tube-side inlet is connected, after heat exchange with absorption tower rich solution heat exchanger
Chlorosilane lean solution enters the tube side of hydrogen chloride vaporizer, the shell side inlet of described hydrogen chloride vaporizer
Connect hydrogen chloride storage tank；
Freon-Evaporator, connects the outlet of hydrogen chloride vaporizer tube side, and described freon evaporates
Device sends into absorption tower after freezing the chlorosilane lean solution from hydrogen chloride vaporizer tube side；
Remove rectification chlorosilane heat exchanger, connect hydrogen chloride vaporizer shell-side outlet, from hydrogen chloride
The hydrogen chloride of vaporizer shell side in removing rectification chlorosilane heat exchanger with go the chlorosilane heat exchange of rectification
After be delivered to trichlorosilane synthesis.
As preferably, the entrance of the tube side of described hydrogen chloride vaporizer and outlet are by the first bypass
Pipeline connects, on described first bypass duct and the pipe of the first bypass duct and hydrogen chloride vaporizer
It is respectively equipped with valve between the gateway of journey.
As preferably, between described hydrogen chloride storage tank and hydrogen chloride vaporizer, it is provided with hydrogen chloride flow
Regulation valve.
As preferably, the entrance of the shell side of described hydrogen chloride vaporizer and outlet are by the second bypass
Pipeline connects, on described second bypass duct and the shell of the second bypass duct and hydrogen chloride vaporizer
It is respectively equipped with valve between the gateway of journey.
On the other hand, embodiments provide a kind of polysilicon hydrogenation waste gas utilization method,
Comprise the steps；
Silicon chloride lean solution and absorption tower rich solution heat exchange from Analytic Tower；
Silicon chloride lean solution after heat exchange is carried out with the low temperature chlorination hydrogen liquid as coolant as heating agent
Heat exchange；
After deep cooling, it is used as absorptive tower absorbent with the silicon chloride lean solution after hydrogen chloride liquid heat exchange to inhale
The hydrogen chloride gas that contracture produces in hydrogenation；
With the hydrogen chloride after silicon chloride lean solution heat exchange as coolant with go to rectification workshop as heating agent
Chlorosilane heat exchange again after deliver to trichlorosilane synthesis.
As preferably, with the flow of the hydrogen chloride liquid of silicon chloride lean solution heat exchange according to hydrogenation
During produce chlorination hydrogen amount regulate.
As preferably, with absorption tower rich solution heat exchange after the silicon chloride lean solution and-4 of-15 DEG C～-20 DEG C
After the hydrogen chloride liquid heat exchange of 0 DEG C, temperature is down to-20 DEG C～-25 DEG C, the chlorination of-20 DEG C～-25 DEG C
Silicon lean solution deep cooling is used as in absorptive tower absorbent absorption and separation hydrogenation after-42 DEG C～-44 DEG C
The hydrogen chloride gas produced；With the hydrogen chloride temperature after silicon chloride lean solution heat exchange rise to-15 DEG C～
-20 DEG C, by-15 DEG C～-20 DEG C of hydrogen chloride gas by removing 30 DEG C～35 DEG C of chlorine silicon in rectification workshop
Alkane delivers to trichlorosilane synthesis after again heating.
Compared with prior art, the beneficial effects of the present invention is:
-40 DEG C of hydrogen chloride that the embodiment of the present invention will be resolved by Analytic Tower in hydrogenation tail gas
A large amount of colds entrained in liquid have carried out Appropriate application, decrease fluorine in Freon-Evaporator
The consumption of Leon, thus reduce the load of helical-lobe compressor, break because helical-lobe compressor is full
The hydrogenation production capacity bottleneck that load operation is brought, improves hydrogenation production capacity.
Accompanying drawing explanation
Fig. 1 is the polysilicon hydrogenation structure of exhaust gas recovery system of the embodiment of the present invention and flow process is shown
It is intended to.
Detailed description of the invention
With specific embodiment, the present invention is described in further detail below in conjunction with the accompanying drawings, but does not makees
For limitation of the invention.In the following description, different " embodiments " or " embodiment "
Refer to is not necessarily same embodiment.Additionally, special characteristic in one or more embodiment, knot
Structure or feature can be combined by any suitable form.
Fig. 1 is the polysilicon hydrogenation structure of exhaust gas recovery system of the embodiment of the present invention and flow process is shown
It is intended to.As it is shown in figure 1, polysilicon hydrogenation exhaust gas recovery system, including:
Hydrogen chloride storage tank 1, stores the low temperature chlorination hydrogen liquid from rectifying column 2 top；
Absorption tower rich solution heat exchanger 3, absorption tower rich solution heat exchanger 3 receives absorption tower 4 rich solution and conciliates
The silicon chloride lean solution of analysis tower 5, absorption tower 4 rich solution and Analytic Tower 5 silicon chloride lean solution are on absorption tower
Heat exchange in rich solution heat exchanger 3；
Hydrogen chloride vaporizer 6, its tube-side inlet is connected, after heat exchange with absorption tower rich solution heat exchanger 3
Chlorosilane lean solution enter hydrogen chloride vaporizer 6 tube side, the shell side of hydrogen chloride vaporizer 6 enters
Mouth connects hydrogen chloride storage tank 1；
Freon-Evaporator 7, connects the outlet of hydrogen chloride vaporizer 6 tube side, Freon-Evaporator
7 pairs of chlorosilane lean solutions from hydrogen chloride vaporizer 6 tube side send into absorption tower 4 after freezing；
Remove rectification chlorosilane heat exchanger 8, connect hydrogen chloride vaporizer 6 shell-side outlet, from chlorination
The hydrogen chloride of hydrogen vaporizer 6 shell side in removing rectification chlorosilane heat exchanger 8 with remove the chlorine silicon of rectification
Trichlorosilane synthesis it is delivered to after alkane heat exchange.
-40 DEG C of hydrogen chloride that the embodiment of the present invention will be resolved by Analytic Tower in hydrogenation tail gas
A large amount of colds entrained in liquid have carried out Appropriate application, decrease fluorine in Freon-Evaporator
The consumption of Leon, thus reduce the load of helical-lobe compressor, break because helical-lobe compressor is full
The hydrogenation production capacity bottleneck that load operation is brought, improves hydrogenation production capacity.
The polysilicon hydrogenation waste gas utilization method that the embodiment of the present invention provides, comprises the steps；
From Analytic Tower 5 silicon chloride lean solution with from absorption tower 4 containing HCL chlorosilane rich solution
Heat exchange；
Silicon chloride lean solution after heat exchange is carried out with the low temperature chlorination hydrogen liquid as coolant as heating agent
Heat exchange；
After deep cooling, it is used as absorptive tower absorbent with the silicon chloride lean solution after hydrogen chloride liquid heat exchange to inhale
The hydrogen chloride gas that contracture produces in hydrogenation；
With the hydrogen chloride after silicon chloride lean solution heat exchange as coolant with go to rectification workshop as heating agent
Chlorosilane heat exchange again after deliver to trichlorosilane synthesis.
Below in conjunction with Fig. 1, exhaust gas recovery system and the waste gas utilization method of this law embodiment are carried out
Explanation.
Silicon chloride lean solution from Analytic Tower 5 and the absorption tower rich solution from absorption tower 4 are (containing HCL
Chlorosilane rich solution) in absorption tower rich solution heat exchanger 3 after heat exchange, silicon chloride lean solution is to hydrogen chloride
Vaporizer 6, now the chlorosilane lean solution of-15 DEG C～-20 DEG C is that heating agent enters hydrogen chloride vaporizer 6
Tube side, in hydrogen chloride storage tank 1 ,-40 DEG C of hydrogen chloride liquid do coolant and enter hydrogen chloride vaporizer 6 shell
Journey, increases by one connecting on the hydrogen chloride storage tank 1 pipeline with hydrogen chloride heat exchanger 6 shell side inlet
Individual hydrogen chloride flow adjustable valve 9, according to the hydrogen chloride produced in hydriding process in rectifying column 2
Amount regulates hydrogen chloride and enters the flow of hydrogen chloride vaporizer 6.Changed by hydrogen chloride vaporizer 6
After heat, the chlorosilane lean solution of-15 DEG C～-20 DEG C can be cooled to-20 DEG C to about-25 DEG C, and-20
DEG C to-25 DEG C chlorosilane lean solution again through Freon-Evaporator 7 deep cooling to-42 DEG C～-44 DEG C with
Do the hydrogen chloride gas produced in the absorbent absorption and separation hydrogenation of absorption tower 4.At hydrogen chloride
Vaporizer 6 tube side gateway increases by the first bypass duct 10, and arranges respective valves, in order to
Without hydrogen chloride in the case of available the chlorosilane lean solution of-15 DEG C～-20 DEG C can get around hydrogen chloride
Vaporizer 6 is directly entered Freon-Evaporator and carries out deep cooling.
The hydrogen chloride gas temperature of hydrogen chloride vaporizer 6 shell-side outlet rises to-15 DEG C～-20 DEG C of left sides
The right side, temperature is the most relatively low, in order to not impact trichlorosilane synthesis, by-15 DEG C～-20
DEG C hydrogen chloride gas is by going 30 DEG C of 35 DEG C of chlorosilanes in rectification workshop to deliver to three after again heating
Chlorine hydrogen silicon synthesizes.Between hydrogen chloride vaporizer 6 shell side gateway, increase by the second bypass duct 11,
And respective valves is set, in order to and when hydrogen chloride vaporizer 6 occurs abnormal, can be by-40 DEG C of chlorine
After change hydrogen liquid is fed directly to the heating of rectification chlorosilane heat exchanger 8, becomes gaseous hydrogen chloride and send
Synthesize to trichlorosilane.
The effect of the present invention is described below by application example.
Example one:
-19.6℃、130M3The chlorosilane lean solution of/H enters hydrogen chloride vaporizer tube side, with-40 DEG C
Hydrogen chloride liquid enters the mutual heat exchange of shell side, and the chlorosilane lean solution of-19.6 DEG C is down to-25.2 DEG C
After deliver to Freon-Evaporator deep cooling.-40 DEG C of hydrogen chloride liquid are changed to-17.9 DEG C, 2400M3/H
Hydrogen chloride gas goes trichlorosilane to synthesize after delivering to rectification chlorosilane heat exchanger heat exchange again.
In this example, because reducing the consumption of freon in Freon-Evaporator, reduce screw rod
Compressor operating load.Under the conditions of meeting screw machine oepration at full load, hydrogenation can be increased anti-
Answer 10 tons/H of silicon tetrachloride feeding amount.
Example two:
-19.59℃、130M3The chlorosilane lean solution of/H enters hydrogen chloride vaporizer tube side, with-40
DEG C hydrogen chloride liquid enters the mutual heat exchange of shell side, can the chlorosilane lean solution of-19.56 DEG C be down to
Freon-Evaporator deep cooling is delivered to after-26.22 DEG C.-40 DEG C of hydrogen chloride liquid are changed to-19.11
℃、2600M3/ H hydrogen chloride gas removes trichlorine hydrogen after delivering to rectification chlorosilane heat exchanger heat exchange again
Silicon synthesizes.
In this example, because decreasing the consumption of freon in Freon-Evaporator, reduce screw rod
Compressor operating load.Under the conditions of meeting screw machine oepration at full load, hydrogenation can be increased anti-
Answer 15 tons/H of silicon tetrachloride feeding amount.
The above, the only detailed description of the invention of the present invention, but protection scope of the present invention is also
Being not limited to this, any those familiar with the art is at the technology model that the invention discloses
In enclosing, change can be readily occurred in or replace, all should contain within protection scope of the present invention.
Therefore, protection scope of the present invention should be as the criterion with described scope of the claims.
Claims (7)
1. polysilicon hydrogenation exhaust gas recovery system, it is characterised in that including:
Hydrogen chloride storage tank, stores the low temperature chlorination hydrogen liquid from rectifying column top；
Absorption tower rich solution heat exchanger, described absorption tower rich solution heat exchanger receives absorption tower rich solution and conciliates
The silicon chloride lean solution of analysis tower, described absorption tower rich solution and silicon chloride lean solution are at described absorption tower rich solution
Heat exchange in heat exchanger；
Hydrogen chloride vaporizer, its tube-side inlet is connected, after heat exchange with absorption tower rich solution heat exchanger
Chlorosilane lean solution enters the tube side of hydrogen chloride vaporizer, the shell side inlet of described hydrogen chloride vaporizer
Connect hydrogen chloride storage tank；
Freon-Evaporator, connects the outlet of hydrogen chloride vaporizer tube side, and described freon evaporates
Device sends into absorption tower after freezing the chlorosilane lean solution from hydrogen chloride vaporizer tube side；
Remove rectification chlorosilane heat exchanger, connect hydrogen chloride vaporizer shell-side outlet, from hydrogen chloride
The hydrogen chloride of vaporizer shell side in removing rectification chlorosilane heat exchanger with go the chlorosilane heat exchange of rectification
After be delivered to trichlorosilane synthesis.
Polysilicon the most according to claim 1 hydrogenation exhaust gas recovery system, it is characterised in that
The entrance of the tube side of described hydrogen chloride vaporizer is connected by the first bypass duct with outlet, described
On first bypass duct and the first bypass duct and hydrogen chloride vaporizer tube side gateway between
It is respectively equipped with valve.
Polysilicon the most according to claim 1 hydrogenation exhaust gas recovery system, it is characterised in that
It is provided with hydrogen chloride flow adjustable valve between described hydrogen chloride storage tank and hydrogen chloride vaporizer.
Polysilicon the most according to claim 1 hydrogenation exhaust gas recovery system, it is characterised in that
The entrance of the shell side of described hydrogen chloride vaporizer is connected by the second bypass duct with outlet, described
On second bypass duct and the second bypass duct and hydrogen chloride vaporizer shell side gateway between
It is respectively equipped with valve.
5. polysilicon hydrogenation waste gas utilization method, it is characterised in that comprise the steps；
Silicon chloride lean solution and absorption tower rich solution heat exchange from Analytic Tower；
Silicon chloride lean solution after heat exchange is carried out with the low temperature chlorination hydrogen liquid as coolant as heating agent
Heat exchange；
After deep cooling, it is used as absorptive tower absorbent with the silicon chloride lean solution after hydrogen chloride liquid heat exchange to inhale
The hydrogen chloride gas that contracture produces in hydrogenation；
With the hydrogen chloride after silicon chloride lean solution heat exchange as coolant with go to rectification workshop as heating agent
Chlorosilane heat exchange again after deliver to trichlorosilane synthesis.
Polysilicon the most according to claim 5 hydrogenation waste gas utilization method, it is characterised in that
With the flow of the hydrogen chloride liquid of silicon chloride lean solution heat exchange according to the chlorine produced in hydriding process
Change hydrogen amount to regulate.
Polysilicon the most according to claim 5 hydrogenation waste gas utilization method, it is characterised in that
Hydrogen chloride liquid with the silicon chloride lean solution of-15 DEG C～-20 DEG C after the rich solution heat exchange of absorption tower Yu-40 DEG C
After body heat exchange, temperature is down to-20 DEG C～-25 DEG C, and the silicon chloride lean solution deep cooling of-20 DEG C～-25 DEG C is extremely
The hydrogen chloride produced it is used as in absorptive tower absorbent absorption and separation hydrogenation after-42 DEG C～-44 DEG C
Gas；-15 DEG C～-20 DEG C are risen to, by-15 with the hydrogen chloride temperature after silicon chloride lean solution heat exchange
DEG C～-20 DEG C of hydrogen chloride gas again heated by 30 DEG C～35 DEG C of chlorosilanes going to rectification workshop
After deliver to trichlorosilane synthesis.
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102039082A (en) * | 2010-06-09 | 2011-05-04 | 特变电工新疆硅业有限公司 | Method and device for vaporizing hydrogen chloride in tail gas in polycrystalline silicon production |
| CN102431972A (en) * | 2011-09-01 | 2012-05-02 | 上海优华系统集成技术有限公司 | Desorption tower heat energy utilization system for recovering hydrogen chloride in polycrystalline silicon production |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS6221706A (en) * | 1985-07-22 | 1987-01-30 | Nippon Steel Corp | Recycling production of silicon or silicon compound via trichlorosilane |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102039082A (en) * | 2010-06-09 | 2011-05-04 | 特变电工新疆硅业有限公司 | Method and device for vaporizing hydrogen chloride in tail gas in polycrystalline silicon production |
| CN102431972A (en) * | 2011-09-01 | 2012-05-02 | 上海优华系统集成技术有限公司 | Desorption tower heat energy utilization system for recovering hydrogen chloride in polycrystalline silicon production |
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Address after: No. 16 Weiliu Road, New Chemical Materials Industrial Park, Shihezi Economic Development Zone, Xinjiang Uygur Autonomous Region, 832000 Patentee after: Xinjiang DAQO New Energy Co., Ltd. Address before: Weiliu Road, New Chemical Materials Industrial Park, Shihezi Economic Development Zone, Xinjiang Uygur Autonomous Region, 832000 Patentee before: Xinjiang Daqo New Energy Co.,Ltd. |
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