CN104332478A - 阵列基板及其制作方法、显示装置 - Google Patents

阵列基板及其制作方法、显示装置 Download PDF

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CN104332478A
CN104332478A CN201410653519.XA CN201410653519A CN104332478A CN 104332478 A CN104332478 A CN 104332478A CN 201410653519 A CN201410653519 A CN 201410653519A CN 104332478 A CN104332478 A CN 104332478A
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layer
layer pattern
array base
base palte
light emission
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陈江博
成军
姜春生
张保侠
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BOE Technology Group Co Ltd
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Priority to CN201410653519.XA priority Critical patent/CN104332478A/zh
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Priority to PCT/CN2015/074450 priority patent/WO2016078265A1/zh
Priority to EP15780753.8A priority patent/EP3223312A4/en
Priority to US14/785,905 priority patent/US9437663B2/en
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Abstract

本发明提供了一种阵列基板及其制作方法、显示装置，该阵列基板包括有机发光层图形、位于薄膜晶体管区域的有源层图形和位于开口区域的吸收层图形；所述吸收层图形位于所述有机发光层图形的出光方向上，由具有紫外线吸收功能的透明材料制作，且与有源层图形同层设置。一方面，位于开口区域的吸收层图形能够吸收出射光中的紫外线，降低出射光对眼睛的伤害。另一方面，吸收层图形和有源层图形同层设置，相比与在阵列基板中单独设置一层紫外线吸收层的方式，降低了阵列基板的厚度，利于显示装置的轻薄化。

Description

阵列基板及其制作方法、显示装置
技术领域
本发明涉及显示技术领域，尤其涉及一种阵列基板及其制作方法、显示装置。
背景技术
太阳光以及部分的背光源产生的光线中包含大约3％的紫外线，这些紫外线进入眼睛后会对眼睛产生伤害，进而导致视力的退化。现有技术中一般是在阵列基板上单独制作一层紫外光吸收层吸收紫外光线。如图1所示，为现有技术中的一种有机电致发光元件(Organic Light-Emitting Diode，OLED)阵列基板的结构示意图，包括玻璃基底1，以及依次形成在玻璃基底1上的栅电极图形2、栅绝缘层图形3、有源层图形4、钝化层图形5、源漏电极图形6、保护层图形7、平坦化层图形8、像素电极图形9、像素界定层图形10、有机发光层图形11；像素电极图形12；紫外光吸收层13，由于吸收层图形13位于出光方向上，因此能够吸收有机发光层图形11发生的出射光中的紫外光线。但是这样的结构会增加显示装置的整体盒厚，不利于显示装置的轻薄化。
发明内容
本发明的目的是提供一种能够吸收紫外光且具有较小厚度的显示装置。
为了达到上述目的，本发明提供了一种阵列基板，包括有机发光层图形、位于薄膜晶体管区域的有源层图形和位于开口区域的吸收层图形；所述吸收层图形位于所述有机发光层图形的出光方向上，由具有紫外线吸收功能的透明材料制作，且与有源层图形同层设置。
进一步的，所述透明材料为铟镓锌氧化物。
进一步的，所述有机发光层图形用于发射白色光线，所述阵列基板还包括位于所述有机发光层图形出光方向上的彩膜层图形。
进一步的，所述有机发光层图形用于发射彩色光线。
进一步的，所述有源层图形由与制作所述吸收层图形的材料相同的材料制作。
一种阵列基板的制作方法，包括：
同层形成位于薄膜晶体管区域的有源层图形和位于开口区域的吸收层图形，所述吸收层图形由具有紫外线吸收功能的透明材料制作；
形成有机发光层图形，所述有机发光层图形的出光方向朝向所述吸收层图形。
进一步的，所述透明材料为铟镓锌氧化物。
进一步的，所述形成有机发光层图形包括：
采用蒸镀或打印的方式形成所述有机发光层图形。
进一步的，所述有机发光层图形用于发射白色光线；所述方法还包括:形成位于所述有机发光层图形出光方向上的彩膜层图形。
进一步的，所述有机发光层图形用于发射彩色光线。
进一步的，所述同层形成位于薄膜晶体管区域的有源层图形和位于开口区域的吸收层图形，包括：
采用相同的材料并通过一次工序同层形成位于薄膜晶体管区域的有源层图形和位于开口区域的吸收层图形。
一种显示装置，包括上述任一项所述的阵列基板。
本发明提供的阵列基板，包括有机发光层图形、位于薄膜晶体管区域的有源层图形和位于开口区域的吸收层图形；所述吸收层图形位于所述有机发光层图形的出光方向上，由具有紫外线吸收功能的透明材料制作，且与有源层图形同层设置。一方面，位于开口区域的吸收层图形能够吸收出射光中的紫外线，降低出射光对眼睛的伤害。另一方面，吸收层图形和有源层图形同层设置，相比与在阵列基板中单独设置一层紫外线吸收层的方式，降低了阵列基板的厚度，利于显示装置的轻薄化。
附图说明
图1为现有技术中一种阵列基板的截面示意图；
图2为本发明实施例一提供的一种阵列基板的正向截面示意图；
图3为本发明实施例二提供的一种阵列基板的结构示意图；
图4为本发明提供的一种阵列基板制作方法的流程示意图。
具体实施方式
下面结合附图和实施例，对本发明的具体实施方式作进一步描述。以下实施例仅用于更加清楚地说明本发明的技术方案，而不能以此来限制本发明的保护范围。
实施例一
本发明实施例一提供了一种白色有机发光二极管(White OrganicOrganic Light-Emitting Diode，WOLED)阵列基板，如图2所示，包括：
玻璃基底1，以及依次形成在玻璃基底1上的栅电极图形2、栅绝缘层图形3、有源层图形4a、吸收层图形4b、钝化层图形5、源漏电极图形6、保护层图形7、彩膜层图形14、平坦化层图形8、像素电极图形9、像素界定层图形10、有机发光层图形11、像素电极图形12；有源层图形4a位于薄膜晶体管TFT区域，用于形成TFT的沟道，吸收层图形4b位于开口区域，由具有紫外线吸收功能的透明材料制作。
这里的有机发射层图形11用于发射白色光线，有源层图形4a和吸收层图形4b均位于有机发射层图形11的出光方向上。彩膜层图形14位于保护层图形7上，平坦化图形8覆盖在保护层图形7以及彩膜层图形14上。
本发明实施例一提供的阵列基板中，吸收层图形4b能够有机发射层图形11发射的白色光中的紫外线，降低出射光对眼睛的伤害。另一方面，吸收层图形4b与有源层图形4a同层设置中，相比与在阵列基板中单独设置一层紫外线吸收层的方式，降低了阵列基板的厚度，利于显示装置的轻薄化。并且，由于同层设置的吸收层图形4b与有源层图形4a可以同时形成，相比与现有技术中单独设置一层紫外线吸收层的方式，能够降低阵列基板的制作难度。另外，本发明实施例一提供的阵列基板还包括位于白色光出光方向上的彩膜层图形14，这样在相应的显示装置中，就无需在单独制作彩膜基板，进一步降低了显示基板的厚度和制作难度。
进一步的，这里吸收层图形4b可以具体有铟镓锌氧化物IGZO制作。IGZO禁带宽度在3.4eV左右，对短波长紫外光有很好的吸收作用。采用铟镓锌氧化物IGZO制作吸收层图形4b可以很好的吸收出射光中的紫外线。
需要指出的是，在实际应用中，彩膜层图形14并不必然制作在阵列基板中，在实际应用中，也可以在单独的设置一个彩膜基板。通过彩膜基板实现彩色显示。另外，本发明实施例中的彩膜层图形14和平坦化层图形8也不必然制作在保护层7和像素界定层图形10之间，只要将彩膜层图形14设置在有机发射层图形11的出光方向上，对应的技术方案都能达到相同的效果，相应的，也应该落入本发明的保护范围。
在实际应用中，有源层图形4a和吸收层图形4b可以采用相同的材料制作，这样能够采用一道工序制作，进一步降低阵列基板的制作难度。
实施例二
本发明实施例二提供了一种高分子有机发光二极管(polymerlight-emitting diode，PLED)阵列基板，如图2所示，包括：
玻璃基底1，以及依次形成在玻璃基底1上的栅电极图形2、栅绝缘层图形3、有源层图形4a、吸收层图形4b、钝化层图形5、源漏电极图形6、保护层图形7、平坦化层图形8、像素电极图形9、像素界定层图形10、有机发光层图形11、像素电极图形12；有源层图形4a位于薄膜晶体管TFT区域，用于形成TFT的沟道，吸收层图形4b位于开口区域，由具有紫外线吸收功能的透明材料制作。如图3所示，图4a和图4b均位于有机发光层图形11的出光方向上。
与实施例一提供的阵列基板不同的是，本发明实施例二提供的阵列基板中，有机发光层图形11用于发射彩色光线，且该阵列基板不包括彩膜层图形。这样能够进一步降低阵列基板的制作难度。相应的，也没有设置平坦化层图形8。
需要指出的是，在附图中，为了图示的清晰可能夸大了层和区域的尺寸。而且可以理解，当元件或层被称为在另一元件或层“上”时，它可以直接在其他元件上，或者可以存在中间的层。另外，可以理解，当元件或层被称为在另一元件或层“下”时，它可以直接在其他元件下，或者可以存在一个以上的中间的层或元件。另外，还可以理解，当层或元件被称为在两层或两个元件“之间”时，它可以为两层或两个元件之间惟一的层，或还可以存在一个以上的中间层或元件。通篇相似的参考标记指示相似的元件。
本发明还提供了一种阵列基板的制作方法，可用于制作上述任一实施例所述的阵列基板，如图4所示，该方法包括：
步骤S1，同层形成位于薄膜晶体管区域的有源层图形和位于开口区域的吸收层图形；所述吸收层图形由具有紫外线吸收功能的透明材料制作；
步骤S2，形成有机发光层图形，所述有机发光层图形的出光方向朝向所述吸收层图形。
当然在实际应用中，上述的阵列基板制作方法还应包含制作栅电极图形、栅绝缘层图形、钝化层图形、源漏电极图形、像素电极图形的过程，另外根据所需制作的阵列基板的类型不同，该方法还可能包括制作保护层图形、平坦化层图形、像素电极图形、像素界定层图形、有机发光层图形、彩膜层图形的过程，制作这些层结构的具体过程可以参考现有技术，在此不再详细说明。
进一步的，所述透明材料为铟镓锌氧化物。
进一步的，所述步骤S2包括：
采用蒸镀或打印的方式形成所述有机发光层图形。
进一步的，当用于形成如图2所示的阵列基板时，所述方法还包括:形成位于所述有机发光层图形出光方向上的彩膜层图形。
当用于形成如图3所示的阵列基板时，仅需形成用于发射彩色光线的有机发光层图形，而不需要形成位于所述有机发光层图形出光方向上的彩膜层图形。这样能够减少一道制作工序，降低制作难度。
进一步的，所述步骤S1包括：
采用相同的材料并通过一次工序同层形成位于薄膜晶体管区域的有源层图形和位于开口区域的吸收层图形。
这样，能够减少一道制作层结构的工序，降低阵列基板的制作难度。
可以理解，执行本发明所披露的制造方法的操作步骤的顺序不限于这里阐述的，除非具体地另外提及。因此，执行本发明所披露的制造方法的操作步骤的顺序可以在本发明的范围内变化，且对于本发明相关领域的普通技术人员显而易见的结果也将被认为在本发明的范围内。
本发明提供了一种显示装置，其特征在于，包括上述任一项所述的阵列基板。
这里的显示装置可以为：电子纸、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
以上所述仅是本发明的优选实施方式，应当指出，对于本技术领域的普通技术人员来说，在不脱离本发明技术原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本发明的保护范围。

Claims (12)

1.一种阵列基板，其特征在于，包括有机发光层图形、位于薄膜晶体管区域的有源层图形和位于开口区域的吸收层图形；所述吸收层图形位于所述有机发光层图形的出光方向上，由具有紫外线吸收功能的透明材料制作，且与有源层图形同层设置。
2.如权利要求1所述的阵列基板，其特征在于，所述透明材料为铟镓锌氧化物。
3.如权利要求1所述的阵列基板，其特征在于，所述有机发光层图形用于发射白色光线，所述阵列基板还包括位于所述有机发光层图形出光方向上的彩膜层图形。
4.如权利要求1所述的阵列基板，其特征在于，所述有机发光层图形用于发射彩色光线。
5.如权利要求1所述的阵列基板，其特征在于，所述有源层图形由与制作所述吸收层图形的材料相同的材料制作。
6.一种阵列基板的制作方法，其特征在于，包括：
同层形成位于薄膜晶体管区域的有源层图形和位于开口区域的吸收层图形，所述吸收层图形由具有紫外线吸收功能的透明材料制作；
形成有机发光层图形，所述有机发光层图形的出光方向朝向所述吸收层图形。
7.如权利要求6所述的方法，其特征在于，所述透明材料为铟镓锌氧化物。
8.如权利要求6所述的方法，其特征在于，所述形成有机发光层图形包括：
采用蒸镀或打印的方式形成所述有机发光层图形。
9.如权利要求6所述的方法，其特征在于，所述有机发光层图形用于发射白色光线；所述方法还包括:形成位于所述有机发光层图形出光方向上的彩膜层图形。
10.如权利要求6所述的方法，其特征在于，所述有机发光层图形用于发射彩色光线。
11.如权利要求6述的方法，其特征在于，所述同层形成位于薄膜晶体管区域的有源层图形和位于开口区域的吸收层图形，包括：
采用相同的材料并通过一次工序同层形成位于薄膜晶体管区域的有源层图形和位于开口区域的吸收层图形。
12.一种显示装置，其特征在于，包括如权利要求1-5任一项所述的阵列基板。
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