CN104326662A - Boron-free alkali-free aluminosilicate glass - Google Patents
Boron-free alkali-free aluminosilicate glass Download PDFInfo
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- CN104326662A CN104326662A CN201310749563.6A CN201310749563A CN104326662A CN 104326662 A CN104326662 A CN 104326662A CN 201310749563 A CN201310749563 A CN 201310749563A CN 104326662 A CN104326662 A CN 104326662A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
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Abstract
The invention relates to boron-free alkali-free aluminosilicate glass, and overcomes the technical problems that boron oxide causes reduction of glass strain point, large glass density, low elastic modulus and misuse of a clarifying agent in conventional alkali-free aluminosilicate glass. A technical solution lies in that alkali-free glass comprises, by molar, 68.5-72.5% of SiO2, 12.5-16% of Al2O3, 2-6% of MgO, 3.5-5.5% of CaO, 0.5-3.5% of SrO, 1-5% of BaO and 0.5-4% of ZnO. The boron-free alkali-free aluminosilicate glass has relatively high chemical stability, relatively high strain point, relatively high Young's modulus, relatively high modulus ratio, relatively high transmittance, relatively low melting temperature, relatively low liquidus temperature and relatively low density.
Description
Technical field
The invention belongs to glass manufacturing area, relate to a kind of alkaline earth aluminates glass and component thereof, alkali-free metal.The present invention is a kind of environmental type glass, has higher chemical stability and mechanical property; There is the lower coefficient of expansion and liquidus temperature; It can be widely used in the glass substrate making plane display and the glass substrate thrown light on, photovoltaic device or other photoelectric devices, the industry glass compositions such as glass.Particularly a kind of alkali-free alumina silicate glass of not boracic.
Background technology
Along with the fast development of photovoltaic industry, the demand of various display device is constantly increased, the active matrix liquid crystal display device of such as active matrix liquid crystal display, Organic Light Emitting Diode and application of cold temperature polycrystalline silicon technology, these display devices are all based on use thin film semiconductor material production thin-film transistor technologies.The silica-based TFT of main flow can be divided into non-crystalline silicon tft, multi-crystal TFT and silicon single crystal TFT, and wherein non-crystalline silicon tft is the technology that present main flow TFT-LCD applies, and the treatment temp of non-crystalline silicon tft technology in procedure for producing can complete at 300 ~ 450 DEG C of temperature.And LTPS multi-crystal TFT needs repeatedly to process at relatively high temperatures in the fabrication process, substrate can not must deform in multiple high temp treating processes, this just has higher requirement to base plate glass performance, preferred strain point is higher than 650 DEG C, more preferably higher than 670 DEG C, 700 DEG C, 720 DEG C, to make substrate have as far as possible little thermal contraction in panel processing procedure, therefore the strain point temperature of substrate is more high better.The thermal expansivity of glass substrate needs the similar thermal expansion coefficient with silicon simultaneously, and reduce stress and destruction as far as possible, therefore the preferred thermal linear expansion coefficient of base plate glass is 28 ~ 39 × 10
-7/ DEG C between.For the ease of producing, reduce production cost, the glass as display base plate should have lower temperature of fusion and liquidus temperature.
For the glass substrate of plane display, need to form nesa coating, insulating film, semiconductor film and metallic membrane by technology such as sputtering, chemical vapour depositions at underlying substrate glass surface, then various circuit and figure is formed by optical lithography, if glass contains alkalimetal oxide, in heat treatment process, alkalimetal ion diffuses into deposited semiconductor material, can damage semiconductor film characteristic, therefore, alkali-free metal oxide answered by TFT glass.Prior art, it is preferred that both with SiO
2, Al
2o
3, B
2o
3, alkaline earth metal oxide MgO, CaO, SrO etc. are the alkaline earth aluminates glass of principal constituent.
The strain point of most of silicate glass increases along with the increase of glass-former content and the minimizing of modifier content.But high temperature melting and clarification difficulty can be caused simultaneously, cause refractory corrosion to aggravate, increase energy consumption and production cost.Therefore, improved by component, also will ensure that high temperature viscosity there will not be large lifting while low temperature viscosity is increased, even reduce the best breach being only and improving strain point.
In high-aluminum alkali-free silicate glass system, add boron oxide B
2o
3good effect of fluxing can be brought, be conducive to promoting glass endurance simultaneously.But in low temperature viscosity district, B
2o
3but make strain point of glass significantly reduce, so how improve a difficult problem that the endurance of glass substrate and strain point temperature just become long-standing problem those skilled in the art simultaneously.
In the course of processing of glass substrate, base plate glass is horizontal positioned, and glass is under Gravitative Loads, and what have to a certain degree is sagging, and sagging degree is directly proportional to the density of glass, be inversely proportional to the Young's modulus of glass.Along with Substrate manufacture is towards the development in large size, slimming direction, in manufacture, the sagging of sheet glass must draw attention.Therefore should design composition, make base plate glass have alap density and Young's modulus high as far as possible.
Universal along with smart mobile phone and panel computer, opens the epoch of intelligent mobile.Mobile phone is in the past confined to communication function, but the performance comprising the smart machine of smart mobile phone and panel computer is at present close with notebook, and people rely on the accessibility of radio communication, all the time not in the commercial affairs and the recreation that perform and enjoy higher level.Under such trend, the requirement of display performance is also being improved constantly, especially the image quality of intelligent movable equipment, visual performance requriements out of doors are also promoted, simultaneously in order to alleviate the use burden of portable equipment, weight, lower thickness become inevitable megatrend.Under this trend guides, display panel is to future development that is lightening, ultra high-definition display, and panel making technology manages temperature development to higher height; Monolithic glass is through art breading simultaneously, and thickness reaches 0.25mm, 0.2mm, 0.1mm, even thinner.The current mainly chemical reduction of the mode making glass thinning, specifically, use hydrofluoric acid or buffered hydrofluoric acid solution to corrode glass substrate, its thinning principle is as follows:
Main chemical reactions: 4HF+SiO
2=SiF
4+ 2H
2o,
Secondary chemical reaction: RO+2H
+=R
2++ H
2o(R represents alkaline-earth metal etc.).
Surface quality after chemical reduction technique and thinning glass substrate and parent glass form certain relation, frequently the bad deficient point such as " pit ", " sags and crests " is there is in existing TFT-LCD base plate glass in chemical reduction process, need carry out second polishing or directly discard, add the production cost of glass substrate.The glass with high chemical stability has better surface quality after thinning, therefore the TFT-LCD base plate glass of high chemical stability is researched and developed, can reduce the production costs such as second polishing, improving product quality and good article rate, producing for large industrialized has larger benefit.
Along with the development of lightening trend, in G5 generation, G6 generation, G7 generation, G8 generation etc., more advanced lines glass substrate was produced, the glass substrate of horizontal positioned due to deadweight produce sagging, be warped into emphasis research topic.For the glass substrate producer, the multiple links such as annealed after glass board material is shaping, cutting, processing, inspection, cleaning, impact is transported in the casing of glass the ability loading, take out and separate by the sagging of sized rectangular glass substrate between processing stand.Counter plate manufacturers, similar problem exists equally.Larger sag or warpage can cause fragmentation rate to improve and CF making technology is reported to the police, and have a strong impact on product yield.If when supporting substrate both sides, two ends, the maximum sag of chain (S) of glass substrate can be expressed as follows:
K is constant, and ρ is density, and E is Young's modulus, and l is for supporting interval, and t is thickness of glass substrate.Wherein, (ρ/E) is the inverse than modulus.Referring to the ratio of elasticity modulus of materials and density than modulus, be also called " than Young's modulus " or " specific rigidity ", is that structure design is to one of important requirement of material.Lighter than material weight under the higher explanation same stiffness of modulus, or under equal in quality, rigidity is larger.From above formula, when l, t mono-timing, ρ diminishes after E strengthens can reduce sag of chain, therefore should make the density that base plate glass tool is as far as possible low and high Young's modulus of trying one's best, namely have as far as possible large ratio modulus.Due to the sharply reduction of thickness, glass after thinning occurs that physical strength reduces, be more easily out of shape.Reduce density, increase than modulus and intensity, reduction glass fragility becomes the factor that glass production person needs emphasis to consider.
Use about finings: in order to obtain still non-alkali glass, utilize fining gases, expels the gas produced during glass reaction from glass melt, in addition when homogenizing fusing, needing the fining gases again utilizing generation, increasing alveolar layer footpath, make it float, take out the small bubble of participation thus.
, the viscosity as the glass melt of glass substrate for plane display device is high, need with higher temperature melting.In the glass substrate of this kind, usually cause Vitrification at 1300 ~ 1500 DEG C, deaeration under the high temperature more than 1500 DEG C, to homogenize.Therefore, in finings, widely use and in wide temperature range, the As of fining gases namely between 1300 ~ 1700 DEG C, can be produced
2o
3.But, As
2o
3toxicity very strong, when the process of the manufacturing process of glass or cullet, likely contaminate environment and bring healthy problem, its use is restricted.In prior art, once trial antimony clarification carrys out substitute for arsenic clarification.But also there is the problem affecting environment and healthy aspect in antimony itself.Although Sb
2o
3toxicity unlike As
2o
3such height, but Sb
2o
3remain virose.And compared with arsenic, the temperature that antimony produces fining gases is lower, and the validity removing this kind of glass blister is lower.
Therefore, how to obtain a kind of have higher endurance, high strain-point, low density, high elastic coefficient base plate glass become a great problem of tired right those skilled in the art.
Summary of the invention
The present invention is that in the existing alkali-free alumina silicate glass of solution, boron oxide causes strain point of glass reduction, glass density is large, Young's modulus is not high enough and the technical problem of finings improper use, provide the alkali-free alumina silicate glass of the more perfect not boracic of a kind of environmentally friendly, performance, in this glass ingredient, even if do not add B
2o
3, glass substrate still has higher endurance, even if finings does not use As
2o
3and Sb
2o
3, there is not the formula of the glass substrate becoming surface imperfection yet.The obtained glass substrate of this formula is utilized to meet environmental requirement, not containing As
2o
3, Sb
2o
3and compound, this glass has higher chemical stability simultaneously, there is higher strain point, there is higher Young's modulus, there is higher ratio modulus, there is higher transmitance, there is lower temperature of fusion, there is lower liquidus temperature, there is lower density, meet flat pannel display industry development trend, be suitable for merging the multiple molding mode such as glass tube down-drawing, float glass process and manufacture.
The present invention realizes the technical scheme that goal of the invention adopts to be, a kind of alkali-free alumina silicate glass of not boracic, and its key is: the moiety of described non-alkali glass and comprising by mole% calculating proportioning:
SiO
268.5~72.5 %，
Al
2O
312.5~16%，
MgO 2~6 %，
CaO 3.5~5.5%，
SrO 0.5~3.5%，
BaO 1~5%，
ZnO 0.5-4%。
The invention has the beneficial effects as follows: 1, the present invention has environment friendly, not containing any hazardous and noxious substances, finings uses tin protoxide SnO, SnO holds facile material, and known nothing is harmful to character, when being used alone it as glass fining agent, there is the temperature range of higher generation fining gases, be applicable to the elimination of this kind of glass blister; 2, by control SiO
2+ Al
2o
3>83%, MgO/R ' O<0.4, ZnO/R ' O<0.4, (MgO+ZnO)/R ' O>0.3,0.8<Al
2o
3/ R ' O<1.0, can make glass have simultaneously higher chemical stability, strain point, Young's modulus, than good characteristics such as modulus and lower temperature of fusion, liquidus temperatures; 3, by means of the glass substrate that glass ingredient formula provided by the invention is produced, following technical indicator can be reached after testing: 10%HF acid solution (22 DEG C/20min) erosion amount <4.5mg/cm
2; Be 31 ~ 38 × 10 at the thermal expansivity of 50 ~ 350 degree
-7/ DEG C; Strain point is more than 740 DEG C; Density is less than 2.65g/cm
3, liquidus temperature is lower than 1140 DEG C, and in per kilogram glass substrate, the bubbles number of bubble diameter in > 0.1mm is invisible; 4, the higher SiO owing to containing in instant component
2with Al
2o
3resultant, and not containing B in component
2o
3, ensure that high strain-point, a certain proportion of MgO+ZnO that arranges in pairs or groups effectively can reduce temperature of fusion, and bring larger space to product line Yield lmproved, the production cost such as fuel, electric power is also minimized simultaneously.
Embodiment
A not alkali-free alumina silicate glass for boracic, its key is: the moiety of described non-alkali glass and comprising by mole% calculating proportioning:
SiO
268.5~72.5 %，
Al
2O
312.5~16%，
MgO 2~6 %，
CaO 3.5~5.5%，
SrO 0.5~3.5%，
BaO 1~5%，
ZnO 0.5-4%。
By mole% calculating in the moiety of described non-alkali glass: SiO
2+ Al
2o
3>83%.
By mole% calculating in the moiety of described non-alkali glass: MgO/R ' O<0.4, wherein, R ' O=MgO+CaO+SrO+BaO+ZnO.
By mole% calculating in the moiety of described non-alkali glass: ZnO/R ' O<0.4, wherein, R ' O=MgO+CaO+SrO+BaO+ZnO.
By mole% calculating in the moiety of described non-alkali glass: (MgO+ZnO)/R ' O>0.3, wherein, R ' O=MgO+CaO+SrO+BaO+ZnO.
By mole% calculating in the moiety of described non-alkali glass: 0.8< Al
2o
3/ R ' O <1.0, wherein, R ' O=MgO+CaO+SrO+BaO+ZnO.
Also containing SnO in the moiety of described non-alkali glass, with Mole percent gauge, the interpolation scope of SnO is: 0.05 ~ 0.1%.
By mole% calculating in the moiety of described non-alkali glass: Al
2o
3preferable range be 13 ~ 14.5%.
By mole% calculating in the moiety of described non-alkali glass: the preferable range of ZnO is 0.6 ~ 3%.
By mole% calculating in the moiety of described non-alkali glass: SiO
2preferable range be 69 ~ 71%.
The present invention is when implementing, after first the raw material uniform stirring including the corresponding oxide molar percent composition of above-mentioned each glass substrate being mixed, again by mixing raw material melt-processed, stir with platinum rod and discharge bubble and make glass metal homogenizing, then its temperature is reduced to shaping required glass substrate forming temperature range, pass through annealing theory, produce the thickness of the glass substrate that flat-panel screens needs, again simple cold work is carried out to shaping glass substrate, finally test is carried out to the Basic Physical Properties of glass substrate and become qualified product.
In the present invention, SiO
2molar content be 68.5 ~ 72.5%.SiO
2be glass-former, if content is too low, be unfavorable for the corrosive enhancing of endurance, the coefficient of expansion can be made too high, the easy devitrification of glass; Improve SiO
2content contributes to glass lightweight, and thermal expansivity reduces, and strain point increases, and chemical resistant properties increases, but high temperature viscosity raises, and be unfavorable for like this melting, general kiln is difficult to meet, so SiO
2content be 68.5 ~ 72.5%.
Al
2o
3molar content be 12.5 ~ 16%, in order to improve the intensity of glass structure, if content is lower than 12.5%, the easy devitrification of glass, is also easily subject to the erosion of extraneous aqueous vapor and chemical reagent.The A1 of high-content
2o
3contribute to strain point of glass, the increasing of bending strength, but easily there is crystallization in too high glass, glass can be made to be difficult to melt, therefore A1 simultaneously
2o
3content be 12.5 ~ 16%.
MgO has and significantly promotes glass Young's modulus and than modulus, reduces high temperature viscosity, makes glass be easy to the feature melted.When alkaline-earth metal resultant is less in alkali-free silicate glass, introduce the network-modifying ion Mg that strength of electric field is larger
2+, easily produce local accumulation effect in the structure, nearest neighbour distance increased.Introduce more intermediate oxide Al in this case
2o
3, with [AlO
4] state is when existing, because these polyhedrons are with negative electricity, attract subnetwork outer cationic, the degree of gathering of glass, crystallization ability are declined; When alkaline-earth metal resultant is more, network fracture is more serious, introduces MgO, the silicon-oxy tetrahedron of fracture can be made to reconnect and devitrification of glass ability is declined.Therefore the mixing ratio with other components to be noted when adding MgO.Relative to other alkaline earth metal oxides, the existence of MgO can bring the lower coefficient of expansion and density, higher chemically-resistant, strain point and Young's modulus.If MgO is greater than 6mol%, glass endurance can be deteriorated, simultaneously the easy devitrification of glass.It is unfavorable that too low content of MgO contrast modulus improves.Therefore its content is 2 ~ 6mol%.
The molar content of CaO is 3.5 ~ 5.5%, and calcium oxide is in order to promote melting and the adjustment glass ware forming of glass.If calcium oxide content is less than 3.5%, not easily reduce the viscosity of glass, content is too much, and glass easily can occur crystallization, and thermal expansivity also can amplitude variation be greatly, unfavorable to successive process greatly.So the content of CaO is 3.5 ~ 5.5%.
The molar content of SrO is 0.5 ~ 3.5%, and strontium oxide is as fusing assistant and prevent glass from occurring crystallization, if content is too much, glass density can be too high, causes the mole overweight of product.So the content of SrO is defined as 0.5 ~ 3.5%.
The content of BaO is 1 ~ 5%, and barium oxide is similar to the effect of strontium oxide, and content is too much, and the density of glass can become large, and strain point can significantly reduce.So the content of SrO is defined as 1 ~ 5%.
The molar content of ZnO is 0.5 ~ 4%, and bivalent metal oxide is different to characteristics influence according to its status in the periodic table of elements, can be divided into two classes: a class is the alkaline earth metal oxide being positioned at main group, its ion R
2+there are 8 exoelectron structures; Equations of The Second Kind is positioned at periodictable subgroup (as ZnO, CdO etc.), its ion R
2+have 18 outer electronic structures, both structural states are different from affecting glass property in glass.ZnO can reduce glass high temperature viscosity (as 1500 degree), is conducive to eliminating bubble; Below softening temperature, there is the chemical resistant properties promoting intensity, hardness, increase glass simultaneously, reduce the effect of thermal expansion coefficient of glass.In non-alkali glass system, add appropriate ZnO and contribute to suppressing crystallization, can recrystallization temperature be reduced.In theory, ZnO is in non-alkali glass, after introducing glass as network outer body, general with [ZnO under high temperature
4] form exist, comparatively [ZnO
6] glass structure is more loose, compare under being in the identical condition of high temperature with the glass not containing ZnO, the glass viscosity containing ZnO is less, atomic motion speed is larger, cannot form nucleus, need to reduce temperature further, just be conducive to the formation of nucleus, thus, reduce the crystallization ceiling temperature of glass.ZnO content too much can make the strain point of glass significantly reduce.So the content of ZnO is defined as 0.5 ~ 4 % by mole.
In the present invention, the tin protoxide SnO of 0.05 ~ 0.1mol% can also be added with in glass composition, finings when melting as glass or defrother, to improve the melting mole of glass.If content is too much, glass substrate devitrification can be caused, so its addition is no more than 0.1mol%.
Provide the specific embodiment that in formula, each component measures with molar percentage below:
Table 1:
Claims (10)
1. an alkali-free alumina silicate glass for not boracic, is characterized in that: the moiety of described non-alkali glass and comprising by mole% calculating proportioning:
SiO
268.5~72.5 %，
Al
2O
312.5~16%，
MgO 2~6 %，
CaO 3.5~5.5%，
SrO 0.5~3.5%，
BaO 1~5%，
ZnO 0.5-4%。
2. the alkali-free alumina silicate glass of a kind of not boracic according to claim 1, is characterized in that: by mole% calculating in the moiety of described non-alkali glass: SiO
2+ Al
2o
3>83%.
3. the alkali-free alumina silicate glass of a kind of not boracic according to claim 1, it is characterized in that: by mole% calculating in the moiety of described non-alkali glass: MgO/R ' O<0.4, wherein, R ' O=MgO+CaO+SrO+BaO+ZnO.
4. the alkali-free alumina silicate glass of a kind of not boracic according to claim 1, it is characterized in that: by mole% calculating in the moiety of described non-alkali glass: ZnO/R ' O<0.4, wherein, R ' O=MgO+CaO+SrO+BaO+ZnO.
5. the alkali-free alumina silicate glass of a kind of not boracic according to claim 1, it is characterized in that: by mole% calculating in the moiety of described non-alkali glass: (MgO+ZnO)/R ' O>0.3, wherein, R ' O=MgO+CaO+SrO+BaO+ZnO.
6. the alkali-free alumina silicate glass of a kind of not boracic according to claim 1, is characterized in that: by mole% calculating in the moiety of described non-alkali glass: 0.8< Al
2o
3/ R ' O <1.0, wherein, R ' O=MgO+CaO+SrO+BaO+ZnO.
7. the alkali-free alumina silicate glass of a kind of not boracic according to claim 1, is characterized in that: also containing SnO in the moiety of described non-alkali glass, with Mole percent gauge, the interpolation scope of SnO is: 0.05 ~ 0.1%.
8. the alkali-free alumina silicate glass of a kind of not boracic according to claim 1, is characterized in that: by mole% calculating in the moiety of described non-alkali glass: Al
2o
3preferable range be 13 ~ 14.5%.
9. the alkali-free alumina silicate glass of a kind of not boracic according to claim 1, is characterized in that: by mole% calculating in the moiety of described non-alkali glass: the preferable range of ZnO is 0.6 ~ 3%.
10. the alkali-free alumina silicate glass of a kind of not boracic according to claim 1, is characterized in that: by mole% calculating in the moiety of described non-alkali glass: SiO
2preferable range be 69 ~ 71%.
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| CN112174521A (en) * | 2020-10-30 | 2021-01-05 | 中南大学 | Alkali-free boroaluminosilicate glass for TFT-LCD substrate and preparation method thereof |
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| EP3613710A4 (en) * | 2017-04-18 | 2020-04-29 | Tunghsu Technology Group Co., Ltd. | Composition for glass, alkali aluminosilicate glass, and preparation method therefor and applications thereof |
| US11407674B2 (en) | 2017-04-18 | 2022-08-09 | Tunghsu Technology Group Co., Ltd. | Composition for glass, alkaline-earth aluminosilicate glass, and preparation method and application thereof |
| CN112384484A (en) * | 2018-06-19 | 2021-02-19 | 康宁公司 | High strain point and high Young's modulus glass |
| CN114174234A (en) * | 2019-06-26 | 2022-03-11 | 康宁公司 | Alkali-free glass insensitive to thermal history |
| CN112174521A (en) * | 2020-10-30 | 2021-01-05 | 中南大学 | Alkali-free boroaluminosilicate glass for TFT-LCD substrate and preparation method thereof |
| CN112811811A (en) * | 2021-03-07 | 2021-05-18 | 宜山光电科技(苏州)有限公司 | For making polarization3Glass of He gas container and manufacturing method thereof |
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