CN104316231B - Dynamic force chain observation device of flexible polishing wear particle group - Google Patents
Dynamic force chain observation device of flexible polishing wear particle group Download PDFInfo
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- CN104316231B CN104316231B CN201410588756.2A CN201410588756A CN104316231B CN 104316231 B CN104316231 B CN 104316231B CN 201410588756 A CN201410588756 A CN 201410588756A CN 104316231 B CN104316231 B CN 104316231B
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- 239000002245 particle Substances 0.000 title claims abstract description 40
- 238000005498 polishing Methods 0.000 title claims abstract description 21
- 238000012545 processing Methods 0.000 claims abstract description 8
- 239000008187 granular material Substances 0.000 claims description 29
- 238000006073 displacement reaction Methods 0.000 claims description 22
- 230000000007 visual effect Effects 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 2
- 238000003754 machining Methods 0.000 abstract description 3
- 238000004088 simulation Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 10
- 238000004458 analytical method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000011496 digital image analysis Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000013618 particulate matter Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000001066 destructive effect Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007514 turning Methods 0.000 description 1
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The invention provides a dynamic force chain observation device of a flexible polishing wear particle group. The dynamic force chain observation device comprises an image processing device and a particle control device. The image processing device comprises a light source generator, a light source collector and a data analyzer. The light source generator is located at the bottommost end of an observation region. The light source transmitted by the light source generator penetrates through a lower polarized light device and points to a particle control device in the observation region composed of the lower polarized light device and an upper polarized light device. The upper surface of the particle control device is covered with a transparent baffle. The light source collector is located over the upper polarized light device. The light source collection view of the light source collector covers the light source transmitted out by the upper polarized light device. The data input end of the data analyzer is connected with the data output end of the light source collector. The data signal output end of the data analyzer is connected with a display screen of the data analyzer. The dynamic force chain observation device has the advantages that the external applying parameters of photoelastic particles can be detected in real time, the motion state of the photoelastic particles can be adjusted through sliding blocks, and simulation of the flexible polishing machining test is achieved.
Description
Technical field
The present invention relates to a kind of flexible polishing abrasive particle group motion state riding chain observation device.
Background technology
During flexible polishing Ultra-precision Turning, the particle system that a large amount of grit particles are constituted is in Flexible Manufacture instrument
Workpiece surface quality is lifted under support, so that surface of the work is more bright and clean, there is longer use in industrial applicability
Life-span.But flexible polishing method carries flexible characteristic due to a stake tool so that grit particles system is macroscopical in process
On with machining tool be in consistent kinestate, but grit particles system inside mutually extruding on microcosmic, form fine motion, its
The Micromechanics state of intergranular also changes therewith.Flexible polishing ultraprecise processing method requires greatly to lift surface matter
Amount, many optical elements require that surface accuracy reaches Subnano-class not, in the processing request of this yardstick, in order to further carry
Machined surface quality is risen, it is inadequate only macroscopical machined parameters to be carried out studying, and need to further be studied between grit particles colony
Micromechanics characteristic.
The content of the invention
Direct analysis are difficult to for the Micromechanics characteristic of abrasive particle group in flexible polishing and existing to particulate matter riding chain
Research device is difficult to directly observe the problem of granule microcosmic riding chain, and the present invention proposes a kind of Micromechanics characteristic with abrasive particle group
To study point of penetration, the flexible polishing abrasive particle group motion state of the machined surface quality of all kinds of flexible polishing methods can be further lifted
Riding chain observation device.
Flexible polishing abrasive particle group motion state riding chain observation device of the present invention, it is characterised in that：Including image procossing dress
Put and particulate control device, described image processing apparatus include light source generator, light source collector, data analyzer, described
Light source generator be located at area of observation coverage least significant end, and light source generator transmitting light source through lower polarized light device point to be located at by
Particulate control device between the area of observation coverage of lower polarized light device and upper polarized light device composition；The upper table of described particulate control device
Face covers transparent baffle；Described light source collector is located at the surface of upper polarized light device, and the light source of light source collector is adopted
The collection visual field covers the light source transmitted by upper polarized light device；The data input pin of described data analyzer and described light source
The data signal output of connected, the described data analyzer of the data output end of harvester and the display screen of data analyzer connect
Connect；
Described particulate control device includes transparent top shoe, transparent sliding block, the appearance for accommodating photoelastic granule
Receive chamber, described sliding block is furnished with strain gauge and displacement transducer, the data output end of described strain gauge and position
The data terminal connection corresponding with described data analyzer respectively of the data output end of displacement sensor.
Described cavity includes overhead gage, lower baffle plate, left slide damper and right sliding block, and described overhead gage is fixed on
In top shoe, described lower baffle plate is fixed in sliding block, and described overhead gage is kept off respectively by left slide damper and right slip
Block is linked with described lower baffle plate, center of four baffle plates with the photoelastic granule of the formal constraint for sealing in the area of observation coverage, and is led to
The change of photoelastic granule interior mechanics information is realized in the relative displacement crossed between described overhead gage and described lower baffle plate, described
Top shoe and the relative displacement of realizing therebetween by overhead gage and lower baffle plate respectively of described sliding block.
Described overhead gage and described lower baffle plate is parallel to each other.
Described light source collector is high resolution camera.
Described data analyzer obtains photoelastic granular mechanics information using color gradient algorithm, so as to obtain corresponding power
Chain scattergram.
Described light source generator adopts AOC-193FW, and the source diameter launched is 19 inches.
The present invention operation principle be：Transparent baffle is removed first, and photoelastic particle swarm is placed in Grain size controlling module,
19 inches of light source generators of optional AOC-193FW, light source generator is emitted beam and is irradiated to by lower polarizer, the area of observation coverage
Domain, due to top shoe and sliding block all be pellucidity so that light can be irradiated on photoelastic granule, based on Maxwell with regard to
(wherein, F (x) represents the function between strain gauge stress and x-axis displacement to stress-optical theorem；X (t) represents displacement sensing
Device displacement and the function between the time；K is for the connecting spring between strain gauge and sliding block), if photoelastic granule
Do not stress, light will not be changed after photoelastic granule；If photoelastic numerical density, temporary birefrigent phenomenon will be produced,
I.e. incident polarized light will be decomposed into the orthogonal polarized light of two beams, and this two beam after decomposing along two principal directions of stress
Polarized light just produces a phase contrast when projecting model, then can carry out image to above-mentioned phenomenon using high-resolution camera and adopt
Collecting, and be sent to data analyzer carries out digital image analysises.
Further, by photoelastic particle confinement behind observation citadel, left slide damper is manually adjusted with the right gear that slides
Plate so that photoelastic granule obtains in this process different kinestates, by displacement transducer the speed of sliding block is recorded
With displacement, the speed that abrasive particle is applied in when flexible polishing is processed is simulated, by passing in top shoe and sliding block design stress
Sensor, measures in real time inside slide block to photoelastic granule pressure applied.These data are sent to into data analyzer, can conduct
Initial applying parameter to photoelastic granule.
Further, shoot the digital picture for obtaining to photoelastic experiment to process, on this basis, calculate with reference to color gradient
Method obtains photoelastic granular materialss mechanical information, obtains riding chain scattergram, checking abrasive particle efforts of everyone transmission analysis theories system, and observes
The geometric position information of particle swarm, verifies the main types of particulate matter destructive structure and forms rule, and with abrasive particle group reason
Think cutting state and obtain abrasive particle group ideal control parameter for target.
The beneficial effects of the present invention is：1st, based on Maxwell with regard to stress-optical theorem, using photoelastic granule to mill
Particle swarm carries out physical object simulating, by method of digital image analysis, with reference to color gradient algorithm photoelastic granular materialss mechanics letter is obtained
Breath, obtains riding chain scattergram.2nd, by Grain size controlling module so that the outside parameter that applies of photoelastic granule can be detected in real time,
And the adjustment of photoelastic granule kinestate can be carried out by slide block, the simulation to flexible polishing machining experiment is realized, and to grind
Particle swarm desired cut state obtains abrasive particle group ideal control parameter for target.
Description of the drawings
Fig. 1 is overall structure diagram of the present invention.
Fig. 2 is photoelastic Grain size controlling module diagram of the invention.
Fig. 3 is granule riding chain microcosmic schematic diagram of the present invention
Specific embodiment
The present invention is further illustrated below in conjunction with the accompanying drawings
Referring to the drawings：
Flexible polishing abrasive particle group motion state riding chain observation device of the present invention, including image processing apparatus 1 and granule control
Device processed 2, described image processing apparatus 1 include light source generator 13, light source collector 11, data analyzer 12, described
Light source generator 13 is located at area of observation coverage least significant end, and the light source of the transmitting of light source generator 13 points to position through lower polarized light device 14
Particulate control device 2 between the area of observation coverage being made up of lower polarized light device 14 and upper polarized light device 16；Described Grain size controlling
The upper surface of device 2 covers transparent baffle 15；Described light source collector 11 is located at the surface of upper polarized light device 16, and light
The light source collection visual field of source collector 11 covers the light source transmitted by upper polarized light device 16；Described data analyzer 12
Data input pin is connected with the data output end of described light source collector 11, the data signal of described data analyzer 12 is defeated
Go out end to be connected with the display screen of data analyzer 12；
Described particulate control device 2 includes transparent top shoe 21, transparent sliding block 28, for accommodating photoelastic granule
Accommodating chamber, described sliding block 28 is furnished with strain gauge 29 and displacement transducer 24, the number of described strain gauge 29
Connect with the described corresponding data terminal of data analyzer 12 respectively according to the data output end of outfan and displacement transducer 24.
Described cavity includes overhead gage 23, lower baffle plate 26, left slide damper 22 and right sliding block 25, described upper gear
Plate 23 is fixed in top shoe 21, and described lower baffle plate 26 is fixed in sliding block, and described overhead gage is respectively by left slip
Baffle plate and right sliding block are linked with described lower baffle plate, and four baffle plates are in the area of observation coverage with the photoelastic granule of the formal constraint for sealing
Center, and photoelastic granule inside power is realized by the relative displacement between described overhead gage 23 and described lower baffle plate 26
The change of information, described top shoe 21 and described sliding block 28 realizes the two by overhead gage 23 and lower baffle plate 26 respectively
Between relative displacement.
Described overhead gage 23 and described lower baffle plate 26 is parallel to each other.
Described light source collector 11 is high resolution camera.
Described data analyzer 12 obtains photoelastic granular mechanics information using color gradient algorithm, corresponding so as to obtain
Riding chain scattergram.
Described light source generator 13 adopts AOC-193FW, and the source diameter launched is 19 inches.
The present invention operation principle be：
Transparent baffle 15 is removed first, photoelastic particle swarm 27 is placed in Grain size controlling module 2, can select AOC-193FW
19 inches of light source generators 13, light source generator 13 emitted beam and is irradiated to by lower polarizer 14, observation area, due to upper
Slide block 21 and sliding block 28 are all pellucidity so that light can be irradiated on photoelastic granule 27, based on Maxwell with regard to answering
(wherein, F (x) represents the function between strain gauge stress and x-axis displacement to power-optical theorem；X (t) represents displacement transducer
Function between displacement and time；K is for the connecting spring between strain gauge and sliding block), if photoelastic granule 27
Do not stress, light after photoelastic granule 27 by changing；If the stress of photoelastic granule 27, temporary birefrigent will be produced and showed
As, i.e., incident polarized light will be decomposed into the orthogonal polarized light of two beams along two principal directions of stress, and this after decomposing
Two beam polarized light just produce a phase contrast when projecting model, then can carry out figure to above-mentioned phenomenon using high-resolution camera 11
Digital image analysises are carried out as gathering, and being sent to computer 12.
Further, photoelastic granule 27 is constrained in behind observation citadel, by adjusting left slide damper 22 with the right gear that slides
Plate 25 so that photoelastic granule 27 obtains in this process different kinestates, by displacement transducer 24 sliding block is recorded
28 speed and displacement, simulate the speed that abrasive particle is applied in when flexible polishing is processed, by top shoe 21 and sliding block
28 design pressure sensors 29, measure in real time inside slide block to the pressure applied of photoelastic granule 27.These data are sent to
Computer 12, can be used as the initial applying parameter to photoelastic granule 27.
Further, shoot the digital picture for obtaining to photoelastic experiment to process, on this basis, calculate with reference to color gradient
Method obtains photoelastic granular materialss mechanical information, obtains riding chain scattergram, checking abrasive particle efforts of everyone transmission analysis theories system, and observes
The geometric position information of particle swarm, verifies the main types of particulate matter destructive structure and forms rule, and with abrasive particle group reason
Think cutting state and obtain abrasive particle group ideal control parameter for target.
Content described in this specification embodiment is only enumerating to the way of realization of inventive concept, the protection of the present invention
Scope is not construed as being only limitted to the concrete form that embodiment is stated, protection scope of the present invention also includes art technology
Personnel according to present inventive concept it is conceivable that equivalent technologies mean.
Claims (5)
1. flexible polishing abrasive particle group motion state riding chain observation device, it is characterised in that：Including image processing apparatus and Grain size controlling dress
Put, described image processing apparatus include light source generator, light source collector, data analyzer, described light source generator position
In area of observation coverage least significant end, and the light source of light source generator transmitting is pointed to through lower polarized light device and is located at by lower polarized light device and upper
Particulate control device between the area of observation coverage of polarized light device composition；The upper surface of described particulate control device covers transparent gear
Plate；Described light source collector is located at the surface of upper polarized light device, and the light source collection visual field of light source collector covers logical
Cross the light source that polarized light device is transmitted；The data of the data input pin of described data analyzer and described light source collector
Outfan is connected, the described data signal output of data analyzer is connected with the display screen of data analyzer；
Described particulate control device includes transparent top shoe, transparent sliding block, the accommodating chamber for accommodating photoelastic granule,
Described sliding block is furnished with strain gauge and displacement transducer, the data output end and displacement sensing of described strain gauge
The data terminal connection corresponding with described data analyzer respectively of the data output end of device；
Described accommodating chamber includes overhead gage, lower baffle plate, left slide damper and right sliding block, and described overhead gage is fixed on
In slide block, described lower baffle plate is fixed in sliding block, and described overhead gage is respectively by left slide damper and right sliding block
Link with described lower baffle plate, center of four baffle plates with the photoelastic granule of the formal constraint for sealing in the area of observation coverage, and pass through
The change of photoelastic granule interior mechanics information is realized in relative displacement between described overhead gage and described lower baffle plate, described
The relative displacement respectively by overhead gage and lower baffle plate realization therebetween of top shoe and described sliding block.
2. flexible polishing abrasive particle group motion state riding chain observation device as claimed in claim 1, it is characterised in that：Described overhead gage
It is parallel to each other with described lower baffle plate.
3. flexible polishing abrasive particle group motion state riding chain observation device as claimed in claim 1, it is characterised in that：Described light source is adopted
Storage is high resolution camera.
4. flexible polishing abrasive particle group motion state riding chain observation device as claimed in claim 1, it is characterised in that：Described data point
Analyzer obtains photoelastic granular mechanics information using color gradient algorithm, so as to obtain corresponding riding chain scattergram.
5. flexible polishing abrasive particle group motion state riding chain observation device as claimed in claim 1, it is characterised in that：Described light source is sent out
Raw device adopts AOC-193FW, and the source diameter launched is 19 inches.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410588756.2A CN104316231B (en) | 2014-10-28 | 2014-10-28 | Dynamic force chain observation device of flexible polishing wear particle group |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410588756.2A CN104316231B (en) | 2014-10-28 | 2014-10-28 | Dynamic force chain observation device of flexible polishing wear particle group |
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| Publication Number | Publication Date |
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| CN104316231A CN104316231A (en) | 2015-01-28 |
| CN104316231B true CN104316231B (en) | 2017-05-17 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106644198B (en) * | 2016-12-02 | 2022-06-21 | 浙江工业大学 | Abrasive particle group surface layer dynamic stress testing system |
| CN106482876B (en) * | 2016-12-02 | 2022-03-18 | 浙江工业大学 | Multilayer annular array abrasive particle group internal stress acquisition device |
| CN107843378A (en) * | 2017-12-19 | 2018-03-27 | 浙江工业大学 | Pressure of surging suspension polishing Fluid pressure wireless acquisition system |
| CN108036882B (en) * | 2018-02-12 | 2022-07-08 | 中国矿业大学(北京) | Photoelastic experimental device for observing stress of top coal caving mining |
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|---|---|---|---|---|
| CN1349781A (en) * | 2001-11-29 | 2002-05-22 | 清华大学 | Sole pressure distribution detector based on total internal reflection principle |
| CN102353485A (en) * | 2011-06-13 | 2012-02-15 | 东北石油大学 | Device and method for measuring force chains of particle deposits |
| CN103630441A (en) * | 2013-11-21 | 2014-03-12 | 华南理工大学 | Visualization testing method and device for granular material mechanics experiment |
| CN204286652U (en) * | 2014-10-28 | 2015-04-22 | 浙江工业大学 | Flexible polishing abrasive particle group motion state riding chain observation device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007139740A (en) * | 2005-10-20 | 2007-06-07 | Furukawa Electric Co Ltd:The | Detection device for polarization fluctuation in optical fiber |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1349781A (en) * | 2001-11-29 | 2002-05-22 | 清华大学 | Sole pressure distribution detector based on total internal reflection principle |
| CN102353485A (en) * | 2011-06-13 | 2012-02-15 | 东北石油大学 | Device and method for measuring force chains of particle deposits |
| CN103630441A (en) * | 2013-11-21 | 2014-03-12 | 华南理工大学 | Visualization testing method and device for granular material mechanics experiment |
| CN204286652U (en) * | 2014-10-28 | 2015-04-22 | 浙江工业大学 | Flexible polishing abrasive particle group motion state riding chain observation device |
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Effective date of registration: 20201113 Address after: 11th floor, donglecheng international, Shuguang Road, Chengguan Street, Dongming County, Heze City, Shandong Province Patentee after: Heze Jianshu Intelligent Technology Co., Ltd Address before: 310014 Hangzhou city in the lower reaches of the city of Zhejiang Wang Road, No. 18 Patentee before: ZHEJIANG University OF TECHNOLOGY |