CN104297922B - Electrostatic drive MEMS two-dimensional scan micro mirror - Google Patents
Electrostatic drive MEMS two-dimensional scan micro mirror Download PDFInfo
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- CN104297922B CN104297922B CN201410599361.2A CN201410599361A CN104297922B CN 104297922 B CN104297922 B CN 104297922B CN 201410599361 A CN201410599361 A CN 201410599361A CN 104297922 B CN104297922 B CN 104297922B
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 43
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 43
- 239000010703 silicon Substances 0.000 claims abstract description 43
- 239000000203 mixture Substances 0.000 claims description 7
- 230000004888 barrier function Effects 0.000 claims description 6
- 239000012528 membrane Substances 0.000 claims description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 3
- 229920005591 polysilicon Polymers 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 3
- 238000012545 processing Methods 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 5
- 238000013461 design Methods 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 241000209094 Oryza Species 0.000 description 2
- 235000007164 Oryza sativa Nutrition 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 235000009566 rice Nutrition 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 244000126211 Hericium coralloides Species 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 210000001520 comb Anatomy 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
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Abstract
The open a kind of electrostatic drive MEMS two-dimensional scan micro mirror of the present invention, it is mainly by the low-resistance silicon base being positioned at the bottom, it is positioned at fixed fingers and the comb lead-in wire in intermediate layer, it is positioned at the movable comb of the superiors, two-dimensional scan micromirror group and support beam group, and is simultaneously in intermediate layer and top anchor position and is formed；It is used as the minute surface rotary shaft of X-direction by introducing 4 L-shaped support beams in X-direction, the lead-in wire making internal fixed fingers passes through from adjacent two L-shaped support beam space central authorities just, such design can either simplify device architecture and processing technique, reduce cost, the lead-in wire also making micromirror is more convenient, so that forming extensive micromirror array, the application tool expanding electrostatic drive MEMS two-dimensional scan micro mirror is of great significance.
Description
Technical field
The present invention relates to Micro-Opto-Electro-Mechanical Systems field, be specifically related to a kind of electrostatic drive MEMS two dimension
Scanning micro-mirror.
Background technology
In Micro-Opto-Electro-Mechanical Systems field, the two-dimensional scan MEMS micromirror of electrostatic drive, is modern
Important devices in optical communication system, can be as photoswitch, optical attenuator and optical multiplexer etc..
But, existing electrostatic drive MEMS two-dimensional scan micro mirror and array thereof are primarily present following shortcoming:
(1) mirror curvature that residual stress produces can aggravate because of variations in temperature, thus causes the change of insertion loss
Greatly；(2) device architecture and processing technique are complicated, and processing cost is high；(3) lead-in wire not side during composition array
Just etc..These shortcomings greatly limit pushing away of electrostatic drive MEMS two-dimensional scan micro mirror and array thereof
Wide application.
Summary of the invention
The technical problem to be solved is that existing electrostatic drive MEMS two-dimensional scan micro mirror is inserted
Enter the problems such as difficulty that go between when big, complex process and the extensive micromirror array of composition are lost, it is provided that a kind of
Electrostatic drive MEMS two-dimensional scan micro mirror and processing technology thereof.
For solving the problems referred to above, the present invention is achieved by the following technical solutions:
A kind of electrostatic drive MEMS two-dimensional scan micro mirror, mainly silica-based by the low-resistance being positioned at the bottom
The end, it is positioned at fixed fingers and the comb lead-in wire in intermediate layer, is positioned at the movable comb of the superiors, two-dimensional scan
Micromirror group and support beam group, and be simultaneously in intermediate layer and top anchor position and formed；
The upper surface of low-resistance silicon base is covered with insulating barrier；
Fixed fingers is fixed on the upper surface of low-resistance silicon base, and by 2 external stability comb and 2
Portion's fixed fingers is constituted；Wherein 2 external stability comb are symmetricly set on the Y-axis of low-resistance silicon base i.e.
The edge of both sides front and back, 2 internal fixed fingers are symmetricly set on an X axis i.e. left side for low-resistance silicon base
The middle part of right both sides；
Anchor position stands upright on the upper surface of low-resistance silicon base, and is extended through top anchor from intermediate layer by 4
Bar is constituted；Above-mentioned 4 anchor poles are divided into 2 groups, and are separately fixed at the relative of 2 internal fixed fingers
Outside, and these 4 anchor poles at the upper surface of low-resistance silicon base in being symmetrical arranged two-by-two, the most internally positioned solid
Determining 2 anchor poles on the left of comb symmetrical, 2 anchor poles on the right side of internally positioned fixed fingers are symmetrical,
And 2 anchor pole phases on the right side of 2 anchor poles on the left of internally positioned fixed fingers and internally positioned fixed fingers
Symmetrical；
Movable comb is hung on the top of fixed fingers, and can by 2 outer movable comb and 2 inside
Dynamic comb is constituted；2 outer movable comb lay respectively at the surface of 2 external stability comb, and outward
The projection of portion's movable comb is meshed with external stability comb；2 internal movable comb lay respectively at 2
The surface of internal fixed fingers, and the projection of internal movable comb is meshed with inside fixed fingers；
Two-dimensional scan micromirror group is by two-dimensional scan platform and the upper surface being flattened on two-dimensional scan platform
Micromirror is constituted；The X axis of two-dimensional scan platform i.e. left and right sidewall each directly with 1 internal movable comb
Being fixedly connected with, the Y-axis of two-dimensional scan platform i.e. front-rear side walls is respectively by a minute surface rotary shaft and 1 outside
Movable comb is connected；
Support beam group includes 4 L-shaped support beams, and these 4 L-shaped support beams are divided into 2 groups, and respectively
It is hung on the opposite exterior lateral sides of 2 internal movable comb, and these 4 anchor poles are at the upper surface of low-resistance silicon base
In being symmetrical arranged two-by-two, 2 L-shaped support beams on the left of the most internally positioned movable comb are symmetrical, are positioned at
2 L-shaped support beams on the right side of internal movable comb are symmetrical, and 2 on the left of internally positioned movable comb
2 L-shaped support beams on the right side of root L-shaped support beam and internally positioned movable comb are symmetrical；Every L-shaped
One end of support beam is connected with 1 anchor pole, and the other end is connected with outer movable comb；
2 comb lead-in wires are separately fixed at the opposite exterior lateral sides of 2 internal fixed fingers, are wherein positioned at left side
The comb lead-in wire 2 L-shaped support beams on the left of internally positioned movable comb gap underface
Centre is passed through, and is positioned at the comb lead-in wire 2 L-shaped support beams on the right side of internally positioned movable comb on right side
The central authorities of the underface in gap pass through.
In such scheme, being equipped with an embedded insulating layer inside every anchor pole, this embedded insulating layer is horizontal
In anchor pole, and anchor pole is divided into upper and lower two independences the part insulated, the height of its lower middle portion anchor pole
Degree is suitable with the height of fixed fingers, and the height of upper part anchor pole is suitable with the height of movable comb.
In such scheme, surface metal-plated membrane above and/or under micromirror.
In such scheme, 2 external stability comb are unidirectional comb, the teeth groove of 2 external stability comb
Opening the most i.e. towards the middle part of low-resistance silicon base, and the teeth groove court of 2 external stability comb
To the most right；Corresponding therewith, 2 outer movable comb are unidirectional comb, 2 outer movable comb
The opening of teeth groove is all outwardly directed to i.e. towards the edge of low-resistance silicon base, and the tooth of 2 outer movable comb
Groove towards back to.
In such scheme, each internal fixed fingers by 2 at Y-axis two-way comb composition side by side,
The outward opening of the teeth groove of the most each internal fixed fingers is towards i.e. towards 2 external stability comb；Therewith
Correspondence, each inside is movably by being positioned at 1 two-way comb at middle part and being positioned at 2 unidirectional combs of both sides
Tooth forms, and the outward opening of the most two-way comb is towards i.e. towards 2 external stability comb, unidirectional comb
Opening the most i.e. towards two-way comb.
In such scheme, described fixed fingers and movable comb are made up of monocrystal silicon or polysilicon.
The present invention is the most advantageously: the present invention is by introducing 4 in X-direction
Root L-shaped support beam is used as the minute surface rotary shaft of X-direction so that the lead-in wire of internal fixed fingers is lucky
Pass through from adjacent two L-shaped support beam space central authorities, such design can either simplify device architecture and
Processing technique, reducing cost, the lead-in wire also making micromirror is more convenient, in order to composition is extensive
Micromirror array, has very the application expanding electrostatic drive MEMS two-dimensional scan micro mirror
Important meaning.Additionally, the present invention is also by minute surface upper and lower surface metal-coated membrane, eliminate remaining answering
The mirror curvature that power causes, reduces the curvature mirror radius change caused because of variations in temperature and thus carries
The change of the insertion loss come.
Accompanying drawing explanation
Fig. 1 is the schematic perspective view of single electrostatic drive MEMS two-dimensional scan micro mirror.
Fig. 2 is the top view of single electrostatic drive MEMS two-dimensional scan micro mirror.
Fig. 3 is the bottom and the solid in intermediate layer of single electrostatic drive MEMS two-dimensional scan micro mirror
Schematic diagram.
Fig. 4 is the schematic perspective view of the superiors of single electrostatic drive MEMS two-dimensional scan micro mirror.
Fig. 5 is the top view of 2 × 2 electrostatic drive MEMS two-dimensional scan micro mirror arrays.
Label in figure: 1, low-resistance silicon base, 2-1, external stability comb, 2-2, internal fixing comb
Tooth, 3, comb lead-in wire, 4-1, outer movable comb, 4-2, internal movable comb, 5-1,
Two-dimensional scan platform, 5-2, micromirror, 5-3, minute surface rotary shaft, 6, support beam group, 7,
Anchor position；7-1, embedded insulating layer, 8, insulating barrier.
Detailed description of the invention
A kind of electrostatic drive MEMS two-dimensional scan micro mirror, as Figure 1-4, mainly by being positioned at
The low-resistance silicon base 1 of bottom, is positioned at the fixed fingers in intermediate layer and comb lead-in wire 3, and be positioned at the superiors can
Dynamic comb, two-dimensional scan micromirror 5-2 group and support beam group 6, and it is simultaneously in intermediate layer and the highest
The anchor position 7 of layer is formed.
The upper surface of low-resistance silicon base 1 is covered with insulating barrier 8.This insulating barrier 8 be thickness be 0.1～10 micro-
Polymer, silicon dioxide or the silicon nitride of rice.
Fixed fingers is fixed on the upper surface of low-resistance silicon base 1, and by 2 external stability comb 2-1 and
2 internal fixed fingers 2-2 are constituted.Wherein 2 external stability comb 2-1 are symmetricly set on low-resistance silicon
The Y-axis of substrate 1 be before and after the edge of both sides, 2 internal fixed fingers 2-2 are symmetricly set on low
The X axis i.e. middle part of the left and right sides of resistance silicon base 1.
Anchor position 7 stands upright on the upper surface of low-resistance silicon base 1, and is extended through top from intermediate layer by 4
Anchor pole constitute.An embedded insulating layer 7-1, this embedded insulating layer 7-1 it is equipped with inside every anchor pole
Be thickness be polymer, silicon dioxide or the silicon nitride of 0.1～10 micron.Embedded insulating layer 7-1 is horizontal
It is placed in anchor pole, and anchor pole is divided into upper and lower two independences the part insulated, its lower middle portion anchor pole
Height is suitable with the height of fixed fingers, and the height of upper part anchor pole is suitable with the height of movable comb.On
State 4 anchor poles and be divided into 2 groups, and be separately fixed at the opposite exterior lateral sides of 2 internal fixed fingers 2-2,
And these 4 anchor poles at the upper surface of low-resistance silicon base 1 in being symmetrical arranged two-by-two, the most internally positioned fixing comb
2 anchor poles on the left of tooth 2-2 are symmetrical, and 2 anchor poles on the right side of internally positioned fixed fingers 2-2 are relative
Claim, and on the right side of 2 anchor poles on the left of internally positioned fixed fingers 2-2 and internally positioned fixed fingers 2-2
2 anchor poles symmetrical.
Movable comb is hung on the top of fixed fingers, and by 2 outer movable comb 4-1 and 2
Portion's movable comb 4-2 is constituted.2 outer movable comb 4-1 lay respectively at 2 external stability comb 2-1
Surface, and the projection of outer movable comb 4-1 is meshed with external stability comb 2-1.In 2
Portion's movable comb 4-2 lays respectively at the surface of 2 internal fixed fingers 2-2, and internal movable comb
The projection of 4-2 is meshed with internal fixed fingers 2-2.
Two-dimensional scan micromirror 5-2 group is by two-dimensional scan platform 5-1 and is flattened on two-dimensional scan platform 5-1
Upper surface micromirror 5-2 constitute.The equal metal-plated membrane of upper and lower surface of micromirror 5-2, this metal
Film can be gold, copper or aluminum, and its thickness is 50～500 nanometers.The X-axis of two-dimensional scan platform 5-1
To i.e. left and right sidewall each directly with 1 inside movable comb 4-2 be fixedly connected with, two-dimensional scan platform 5-1's
Y-axis i.e. front-rear side walls is respectively connected by minute surface rotary shaft 5-3 and 1 outer movable comb 4-1.
The width of above-mentioned minute surface rotary shaft 5-3 is 2～10 microns.
Support beam group 6 includes 4 L-shaped support beams, and these 4 L-shaped support beams are divided into 2 groups, and point
It is not hung on the opposite exterior lateral sides of 2 internal movable comb 4-2, and these 4 anchor poles are in low-resistance silicon base 1
The upper surface 2 L-shaped support beams in being symmetrical arranged two-by-two, on the left of the most internally positioned movable comb 4-2
Symmetrical, 2 L-shaped support beams on the right side of internally positioned movable comb 4-2 are symmetrical and internally positioned
2 L-shaped support beams on the left of movable comb 4-2 and 2 L on the right side of internally positioned movable comb 4-2
Shape support beam is symmetrical.One end of every L-shaped support beam is connected with 1 anchor pole, and the other end and outside can
Dynamic comb 4-1 is connected.Be positioned at the same side and adjacent two L-shaped support beams spacing is 4～20 micro-
Rice.
2 comb lead-in wires 3 are separately fixed at the opposite exterior lateral sides of 2 internal fixed fingers 2-2, Qi Zhongwei
The gap of the comb lead-in wire 32 L-shaped support beams on the left of internally positioned movable comb 4-2 in left side
The central authorities of underface pass through, be positioned at the comb lead-in wire 3 on right side on the right side of internally positioned movable comb 4-2
The central authorities of underface in gap of 2 L-shaped support beams pass through.The width of L-shaped support beam is 2～12
Micron.
Described fixed fingers and movable comb are made up of monocrystal silicon or polysilicon.Movable comb and fixed fingers
Height be 20～120 microns.In order to realize external stability comb 2-1 and outer movable comb 4-1
Projection engagement, 2 external stability comb 2-1 are unidirectional comb, 2 external stability comb 2-1's
The opening of teeth groove is the most i.e. towards the middle part of low-resistance silicon base 1, and 2 external stability comb 2-1
Teeth groove towards the most right；Corresponding therewith, 2 outer movable comb 4-1 are unidirectional comb, outside 2
The opening of the teeth groove of portion's movable comb 4-1 is all outwardly directed to i.e. towards the edge of low-resistance silicon base 1, and 2
The teeth groove of individual outer movable comb 4-1 towards back to.In order to realize internal fixed fingers 2-2 with interior
The projection engagement of portion's movable comb 4-2, each internal fixed fingers 2-2 is by 2 in Y-axis side by side
Two-way comb composition, the outward opening of the teeth groove of the most each internal fixed fingers 2-2 is towards i.e. towards 2
Individual external stability comb 2-1；Corresponding therewith, each inside is movably by 1 the two-way comb being positioned at middle part
Tooth and 2 the unidirectional comb compositions being positioned at both sides, the outward opening of the most two-way comb is towards i.e. towards 2
Individual external stability comb 2-1, the opening of unidirectional comb is the most i.e. towards two-way comb.
The concrete fabrication processing of electrostatic drive MEMS two-dimensional scan micro mirror is as follows:
1. prepare soi layer thickness be 45 microns, middle silicon dioxide thickness be 1 micron, substrate thickness be
The silicon chip A of 300 microns and soi layer thickness are 80 microns, intermediate oxidation silicon thickness is 1 micron, substrate
Thickness is that the silicon chip B of 300 microns is each a piece of.
2. on the soi layer of silicon chip A, deposit the gold of 200 nanometer thickness, deep etching silicon chip B, form minimum
Fixed fingers that live width is 3 microns and lead-in wire thereof.
3. silicon chip A with B is bonded, and in the titanium dioxide of one layer of 200 nanometer thickness of two-layer intermediate formation
Silicon insulating barrier 8.
4. the basal layer of silicon chip A is removed.
5. etching silicon wafer A, forms mirror surface structure；Finally, Lift off technique is used to deposit 200 on surface
The gold of nanometer thickness.
Time actually used, this electrostatic drive MEMS two-dimensional scan micro mirror scans around X-axis to realization,
As long as the positive and negative of DC source will be coupled with at outside fixed fingers 2-1 and L-shaped support beam outer end points
Pole, so that it may form an electric potential difference between outside fixed fingers 2-1 and outer movable comb 4-1, from
And drive minute surface to rotate around X-axis.To realize around Y axis scanning, as long as by comb lead-in wire 3 and wherein appointing
The upper surface of what anchor position 7 is coupled with the positive and negative electrode of DC source, so that it may in internal fixed fingers
Form electric potential difference between 2-2 and internal movable comb 4-2, thus drive minute surface to turn about the X axis.
It is above the situation of single electrostatic drive MEMS two-dimensional scan micro mirror, 2 × 2 electrostatic drives
MEMS two-dimensional scan micro mirror array structure schematic diagram, as it is shown in figure 5, actually used time, as long as
Corresponding comb can be realized two-dimensional scan by going between to be connected with power positive cathode.In view of lead-in wire side
Just, enough distances are left between adjacent cells.
Claims (6)
1. electrostatic drive MEMS two-dimensional scan micro mirror, it is characterised in that: main by being positioned at
The low-resistance silicon base (1) of bottom, is positioned at fixed fingers and comb lead-in wire (3) in intermediate layer, is positioned at
The movable comb on upper strata, two-dimensional scan micromirror (5-2) group and support beam group (6), and simultaneously
It is in intermediate layer and top anchor position (7) are formed；
The upper surface of low-resistance silicon base (1) is covered with insulating barrier (8)；
Fixed fingers is fixed on the upper surface of low-resistance silicon base (1), and by 2 external stability comb
(2-1) He 2 internal fixed fingers (2-2) are constituted；Wherein 2 external stability comb (2-1)
Being symmetricly set on the edge of both sides before and after the Y-axis of low-resistance silicon base (1) is, 2 inside are fixed
Comb (2-2) is symmetricly set on the X axis i.e. middle part of the left and right sides of low-resistance silicon base (1)；
Anchor position (7) stands upright on the upper surface of low-resistance silicon base (1), and is run through from intermediate layer by 4
Constitute to top anchor pole；Above-mentioned 4 anchor poles are divided into 2 groups, and are separately fixed at 2 inside
The opposite exterior lateral sides of fixed fingers (2-2), and this 4 anchor poles upper surface in low-resistance silicon base (1)
In being symmetrical arranged two-by-two, 2 anchor poles in the most internally positioned fixed fingers (2-2) left side are symmetrical,
2 anchor poles on internally positioned fixed fingers (2-2) right side are symmetrical, and internally positioned fixed fingers
(2-2) 2 anchor poles in left side are relative with 2 anchor poles on internally positioned fixed fingers (2-2) right side
Claim；
Movable comb is hung on the top of fixed fingers, and by 2 outer movable comb (4-1) and 2
Individual internal movable comb (4-2) is constituted；2 outer movable comb (4-1) lay respectively at outside 2
The surface of portion's fixed fingers (2-1), and the projection of outer movable comb (4-1) and external stability
Comb (2-1) is meshed；2 internal movable comb (4-2) lay respectively at the fixing comb in 2 inside
The surface of tooth (2-2), and the projection of internal movable comb (4-2) and internal fixed fingers (2-2)
It is meshed；
Two-dimensional scan micromirror (5-2) group is by two-dimensional scan platform (5-1) and is flattened on two dimension and sweeps
The micromirror (5-2) of the upper surface retouching platform (5-1) is constituted；The X of two-dimensional scan platform (5-1)
The most i.e. left and right sidewall is each is directly fixedly connected with 1 internal movable comb (4-2), and two-dimensional scan is put down
The Y-axis i.e. front-rear side walls of platform (5-1) respectively can by a minute surface rotary shaft (5-3) and 1 outside
Dynamic comb (4-1) is connected；
Support beam group (6) includes 4 L-shaped support beams, and these 4 L-shaped support beams are divided into 2 groups,
And the opposite exterior lateral sides of movable comb (4-2) inside being hung on 2 respectively, and these 4 anchor poles are low
The upper surface of resistance silicon base (1) is in being symmetrical arranged two-by-two, and the most internally positioned movable comb (4-2) is left
2 L-shaped support beams of side are symmetrical, 2 L-shaped on internally positioned movable comb (4-2) right side
Support beam is symmetrical, and internally positioned movable comb (4-2) left side 2 L-shaped support beams and position
2 L-shaped support beams in internal movable comb (4-2) right side are symmetrical；Every L-shaped support beam
One end be connected with 1 anchor pole, the other end is connected with outer movable comb (4-1)；
2 comb lead-in wire (3) are separately fixed at the opposite exterior lateral sides of 2 internal fixed fingers (2-2),
Comb lead-in wire (3) on the left of being wherein positioned at 2 L from internally positioned movable comb (4-2) left side
The central authorities of the underface in the gap of shape support beam pass through, and are positioned at comb lead-in wire (3) on right side from being positioned at
The central authorities of the underface in the gap of 2 L-shaped support beams on internal movable comb (4-2) right side pass through.
Electrostatic drive MEMS two-dimensional scan micro mirror the most according to claim 1, it is special
Levy and be: inside every anchor pole, be equipped with an embedded insulating layer (7-1), this embedded insulating layer (7-1)
It is horizontally placed in anchor pole, and anchor pole is divided into upper and lower two independences the part insulated, its lower middle portion anchor
The height of bar and the height of fixed fingers are suitable, the height phase of the height of upper part anchor pole and movable comb
When.
Electrostatic drive MEMS two-dimensional scan micro mirror the most according to claim 1, it is special
Levy and be: surface metal-plated membrane above and/or under micromirror (5-2).
Electrostatic drive MEMS two-dimensional scan micro mirror the most according to claim 1, it is special
Levy and be: 2 external stability comb (2-1) are unidirectional comb, 2 external stability comb (2-1)
The opening of teeth groove the most i.e. towards the middle part of low-resistance silicon base (1), and 2 outsides are solid
Determine the teeth groove of comb (2-1) towards the most right；Corresponding therewith, 2 outer movable comb (4-1) are equal
For unidirectional comb, the opening of the teeth groove of 2 outer movable comb (4-1) be all outwardly directed to i.e. towards
The edge of low-resistance silicon base (1), and the teeth groove of 2 outer movable comb (4-1) towards back to.
Electrostatic drive MEMS two-dimensional scan micro mirror the most according to claim 1, it is special
Levy and be: each internal fixed fingers (2-2) by 2 in Y-axis two-way comb group side by side
Becoming, the outward opening of the teeth groove of the most each internal fixed fingers (2-2) is towards i.e. towards 2 outsides
Fixed fingers (2-1)；Corresponding therewith, each internal movable comb (4-2) is by being positioned at the 1 of middle part
Individual two-way comb and 2 the unidirectional comb compositions being positioned at both sides, the outward opening court of the most two-way comb
To i.e. towards 2 external stability comb (2-1), the opening of unidirectional comb is the most i.e. towards two-way
Comb.
6. according to the electrostatic drive MEMS two-dimensional scan micro mirror described in claim 4 or 5,
It is characterized in that: described fixed fingers and movable comb are made up of monocrystal silicon or polysilicon.
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| CN201410599361.2A CN104297922B (en) | 2014-10-30 | 2014-10-30 | Electrostatic drive MEMS two-dimensional scan micro mirror |
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| CN107966810A (en) * | 2017-12-19 | 2018-04-27 | 无锡英菲感知技术有限公司 | A kind of two-dimensional scanning micro mirror |
| CN110389444A (en) * | 2018-04-19 | 2019-10-29 | 中国科学院苏州纳米技术与纳米仿生研究所 | Vertical comb teeth electrostatic drive micro-mirror structure, manufacturing method and driving micro mirror |
| CN113031247B (en) * | 2019-12-09 | 2023-03-31 | 觉芯电子(无锡)有限公司 | Micro mirror with mirror surface amplitude amplification function |
| CN111538154B (en) * | 2020-04-28 | 2022-06-03 | 安徽中科米微电子技术有限公司 | Electrostatic driven MEMS micro-mirror array and preparation method thereof |
| CN111552072B (en) * | 2020-04-28 | 2022-07-12 | 安徽中科米微电子技术有限公司 | Large-size MEMS vertical comb micro-mirror and preparation method thereof |
| CN113671689B (en) * | 2020-05-13 | 2024-06-18 | 安徽中科米微电子技术有限公司 | MEMS rotating mirror structure with large mirror surface |
| CN111487763A (en) * | 2020-05-28 | 2020-08-04 | 西南大学 | Electromagnetic integrated MEMS scanning micro-mirror |
| CN112902892B (en) * | 2021-01-21 | 2022-06-28 | 清华大学深圳国际研究生院 | Static comb drive type in-plane two-dimensional positioning platform with low crosstalk motion |
| CN114594594B (en) * | 2022-05-11 | 2022-08-02 | 西安知象光电科技有限公司 | Electrostatic driving MEMS comb tooth structure, micro mirror adopting structure and preparation method of micro mirror |
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| JP3987382B2 (en) * | 2002-06-11 | 2007-10-10 | 富士通株式会社 | Micromirror device and manufacturing method thereof |
| CN100350294C (en) * | 2002-10-10 | 2007-11-21 | 富士通株式会社 | Micro moving element comprising torsion bar |
| US6769616B2 (en) * | 2002-11-22 | 2004-08-03 | Advanced Nano Systems | Bidirectional MEMS scanning mirror with tunable natural frequency |
| JP2010107628A (en) * | 2008-10-29 | 2010-05-13 | Topcon Corp | Mems scanning type mirror and method of manufacturing the same |
| JP5104776B2 (en) * | 2009-02-18 | 2012-12-19 | 株式会社デンソー | Scanning device, two-dimensional scanning device, and two-dimensional optical scanning device |
| CN204116713U (en) * | 2014-10-30 | 2015-01-21 | 桂林市光隆光电科技有限公司 | Electrostatic drives MEMS (micro electro mechanical system) two-dimensional scan micro mirror |
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