CN104249064A - Silicon wafer flushing device - Google Patents
Silicon wafer flushing device Download PDFInfo
- Publication number
- CN104249064A CN104249064A CN201310268431.1A CN201310268431A CN104249064A CN 104249064 A CN104249064 A CN 104249064A CN 201310268431 A CN201310268431 A CN 201310268431A CN 104249064 A CN104249064 A CN 104249064A
- Authority
- CN
- China
- Prior art keywords
- silicon wafer
- rinse bath
- water
- rotation platform
- conveying device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention relates to a silicon wafer flushing device for flushing a silicon wafer in the silicon wafer producing process. The silicon wafer flushing device comprises a cleaning groove, a water storage tank, a conveying device and a rotating device, wherein the conveying device is used for conveying water in the water storage tank, the rotating device is positioned above the cleaning groove and comprises a support frame, a driving motor, a rotating shaft and a rotating platform, the driving motor is fixedly arranged on the support frame, the rotating shaft is fixedly connected onto an output shaft of the driving motor, the rotating platform is fixedly connected with the lower end of the rotating shaft and is positioned in the cleaning groove, and the output end of the conveying device is positioned above the rotating platform. The silicon wafer flushing device has the advantages that the structure is simple, the frequent water replacement is not needed, the silicon wafer can be thoroughly cleaned, meanwhile, the manual operation is not needed, and the cleaning efficiency is improved.
Description
Technical field
The present invention relates to silicon chip production technical field of auxiliary equipment, be specifically related in a kind of silicon chip production process, to the silicon wafer washing device that silicon chip cleans.
Background technology
In monocrystalline silicon production process, need to clean silicon chip, existing cleaning equipment, just employing rinse bath, to be placed on silicon chip in rinse bath and to add rinse water, by manually cleaning silicon chip, water in rinse bath can not flow, need to change water frequently, can not clean thoroughly silicon chip, adopt its efficiency of manual cleaning lower simultaneously.
Summary of the invention
For above-mentioned technical problem, the invention provides a kind of silicon wafer washing device, it is relatively simple for structure, does not need frequently to change water, thoroughly can clean silicon chip, can improve cleaning efficiency simultaneously.
Realize technical scheme of the present invention as follows:
A kind of silicon wafer washing device, comprise rinse bath, the conveying device of also comprise water tank, the water in water tank being carried, and the whirligig be positioned at above rinse bath, whirligig comprises support, the drive motors be fixedly installed on support, the rotating shaft be fixedly connected on drive motors output shaft, and being fixedly connected on the rotation platform of rotating shaft lower end, described rotation platform is positioned at rinse bath, and the output of conveying device is positioned at the top of rotation platform.
The liquid level sensor that the water level in rinse bath is detected is provided with in described rinse bath, liquid level sensor is connected with the controller controlling conveying device work, the cell wall of described rinse bath is provided with drainpipe, drainpipe is connected with in rinse bath, described drainpipe is provided with magnetic valve, and described magnetic valve is connected with controller.When liquid level sensor detects that the rinse water in rinse bath reaches the value of setting, will to controller sending action signal, controller Controlling solenoid valve is opened, thus is discharged by the water in rinse bath.
Described conveying device comprises the suction pump that water inlet end is communicated with water tank inside, and the water side of suction pump is connected with outlet pipe, and the water side of its outlet pipe is positioned at above rotation platform.
The water side of described outlet pipe is connected with shower nozzle.
Described rotation platform upper surface periphery is provided with rib, prevents silicon chip on rotation platform in rotary course, landing from rotation platform.
Have employed such scheme, be placed on rotation platform by needing the silicon chip of cleaning, the drive motors work started on support drives rotation platform to rotate, then has controller to control suction pump work, is extracted out by the water in water tank and the top being transported to rotation platform is cleaned silicon chip.Structure of the present invention is simple, does not need frequently to change water, thoroughly can clean silicon chip, simultaneously without the need to manual operation, improve cleaning efficiency.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention;
In figure, 1 is rinse bath, and 2 is water tank, and 3 is support, and 4 is drive motors, and 5 is rotating shaft, and 6 is rotation platform, and 7 is rib, and 8 is liquid level sensor, and 9 is controller, and 10 is drainpipe, and 11 is magnetic valve, and 12 is suction pump, and 13 is outlet pipe, and 14 is shower nozzle.
Detailed description of the invention
Below in conjunction with the drawings and specific embodiments, the present invention is further described.
See Fig. 1, a kind of silicon wafer washing device, comprise rinse bath 1, water tank 2, conveying device that the water in water tank is carried, and the whirligig be positioned at above rinse bath, whirligig comprises support 3, the drive motors 4 be fixedly installed on support, the rotating shaft 5 be fixedly connected on drive motors output shaft, and be fixedly connected on the rotation platform 6 of rotating shaft lower end, rotation platform is positioned at rinse bath 1, the output of conveying device is positioned at the top of rotation platform 6, and in rotation platform upper surface, periphery is provided with rib 7.
Wherein, the liquid level sensor 8 that the water level in rinse bath is detected is provided with in rinse bath, liquid level sensor 8 is connected with the controller 9 controlling conveying device work, the cell wall of rinse bath is provided with drainpipe 10, drainpipe is connected with in rinse bath, described drainpipe is provided with magnetic valve 11, and described magnetic valve 11 is connected with controller 9.
Wherein, conveying device comprises the suction pump 12 that water inlet end is communicated with water tank 2 inside, and the water side of suction pump 12 is connected with outlet pipe 13, and the water side of its outlet pipe 13 is positioned at above rotation platform 6.The water side of outlet pipe is connected with shower nozzle 14.
Claims (5)
1. a silicon wafer washing device, comprise rinse bath, it is characterized in that: the conveying device of also comprise water tank, the water in water tank being carried, and the whirligig be positioned at above rinse bath, whirligig comprises support, the drive motors be fixedly installed on support, the rotating shaft be fixedly connected on drive motors output shaft, and being fixedly connected on the rotation platform of rotating shaft lower end, described rotation platform is positioned at rinse bath, and the output of conveying device is positioned at the top of rotation platform.
2. a kind of silicon wafer washing device according to claim 1, it is characterized in that: in described rinse bath, be provided with the liquid level sensor that the water level in rinse bath is detected, liquid level sensor is connected with the controller controlling conveying device work, the cell wall of described rinse bath is provided with drainpipe, drainpipe is connected with in rinse bath, described drainpipe is provided with magnetic valve, and described magnetic valve is connected with controller.
3. a kind of silicon wafer washing device according to claim 1, is characterized in that: described conveying device comprises the suction pump that water inlet end is communicated with water tank inside, and the water side of suction pump is connected with outlet pipe, and the water side of its outlet pipe is positioned at above rotation platform.
4. a kind of silicon wafer washing device according to claim 3, is characterized in that: the water side of described outlet pipe is connected with shower nozzle.
5. a kind of silicon wafer washing device according to any one of claim 1-4, is characterized in that: described rotation platform upper surface periphery is provided with rib.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310268431.1A CN104249064A (en) | 2013-06-30 | 2013-06-30 | Silicon wafer flushing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310268431.1A CN104249064A (en) | 2013-06-30 | 2013-06-30 | Silicon wafer flushing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104249064A true CN104249064A (en) | 2014-12-31 |
Family
ID=52184521
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310268431.1A Pending CN104249064A (en) | 2013-06-30 | 2013-06-30 | Silicon wafer flushing device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104249064A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105234143A (en) * | 2015-10-27 | 2016-01-13 | 昆山洺九机电有限公司 | Keyboard cover cleaning device |
-
2013
- 2013-06-30 CN CN201310268431.1A patent/CN104249064A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105234143A (en) * | 2015-10-27 | 2016-01-13 | 昆山洺九机电有限公司 | Keyboard cover cleaning device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20141231 |