CN104233187A - mask for depositing a thin film - Google Patents

mask for depositing a thin film Download PDF

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Publication number
CN104233187A
CN104233187A CN201410119858.XA CN201410119858A CN104233187A CN 104233187 A CN104233187 A CN 104233187A CN 201410119858 A CN201410119858 A CN 201410119858A CN 104233187 A CN104233187 A CN 104233187A
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CN
China
Prior art keywords
pattern
pattern bar
mask
bar
actuator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201410119858.XA
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Chinese (zh)
Other versions
CN104233187B (en
Inventor
金雄植
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Display Co Ltd
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Samsung Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Display Co Ltd filed Critical Samsung Display Co Ltd
Publication of CN104233187A publication Critical patent/CN104233187A/en
Application granted granted Critical
Publication of CN104233187B publication Critical patent/CN104233187B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/16—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
    • B05B12/20—Masking elements, i.e. elements defining uncoated areas on an object to be coated
    • B05B12/29—Masking elements, i.e. elements defining uncoated areas on an object to be coated with adjustable size
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/32—Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Abstract

A mask for depositing a thin film and a thin film deposition method using the same are disclosed. The mask includes pattern bars disposed on a frame. The pattern bars are moveable and are position to form a deposition pattern. The mask includes a pattern modification mechanism configured to move the pattern pars to a plurality of positions to modify the deposition pattern.

Description

Deposition mas
This application claims the right of priority of the 10-2013-0068637 korean patent application submitted in Korean Intellectual Property Office on June 14th, 2013, the disclosure of this korean patent application is all contained in this by reference.
Technical field
The present invention relates to a kind of mask for deposit film and a kind of membrane deposition method utilizing this mask, more particularly, relate to and a kind ofly can revise the mask of deposited picture and a kind of membrane deposition method utilizing this mask.
Background technology
Oganic light-emitting display device has such as wide visual angle, high contrast gradient and time of response fast.
Oganic light-emitting display device by carrying out utilizing emitted light from anode and negative electrode injected electrons and hole-recombination in luminescent layer.Oganic light-emitting display device has setting emission layer between the anode and cathode.But, utilize this structure may not realize high luminous efficiency.Therefore, can each electrode in electrode (such as, anode and negative electrode) and optionally add between emission layer and insert the middle layer comprising electron injecting layer, electron transfer layer, hole transmission layer and hole injection layer.
Electrode and middle layer (comprising emission layer) can utilize various method to be formed.Wherein a kind of method is deposition method.In order to utilize deposition method to manufacture oganic light-emitting display device, can will have the mask registration of the pattern identical with the pattern of the film that will be formed in substrate, then the starting material of deposit film can form the film with desired pattern.
Owing to developing the oganic light-emitting display device with various standard, used for the mask of each standard.But existing mask can be fixed to definite shape, therefore only can corresponding a kind of pattern.Therefore, if product standard changes, then mask can have to be replaced by the mask corresponding with the product standard changed.
Therefore, the productivity relevant to the manufacture of organic light-emitting device may be reduced and may manufacturing cost be increased.
Summary of the invention
Exemplary embodiment of the present invention provides the mask and a kind of membrane deposition method utilizing this mask that a kind of and various pattern is corresponding.
Exemplary embodiment of the present invention provides a kind of mask for deposit film.Mask comprises framework.Mask comprises and being arranged on framework to form the pattern bar of deposited picture.Mask comprises the pattern amendment mechanism making pattern bar move to revise deposited picture.
Pattern amendment mechanism can comprise rotary supporting part.Rotary supporting part can be arranged in framework.Rotary supporting part can be incorporated into pattern bar.Pattern amendment mechanism can comprise actuator.Actuator can make each pattern bar being attached to rotary supporting part rotate to special angle.
Actuator can comprise MEMS (micro electro mechanical system) (MEMS).
Pattern bar can comprise the first pattern bar be arranged on along first direction on framework.Pattern bar can comprise the second pattern bar be arranged on along second direction on framework.Second direction can be vertical with first direction.
For the formation of deposited picture pattern bar between part can have square shape.
Pattern amendment mechanism can comprise sliding support parts.Sliding support parts can be arranged in framework.Sliding support parts can be incorporated into pattern bar.Pattern amendment mechanism can comprise actuator, and actuator makes each pattern bar being attached to sliding support parts slide into specific position.
Actuator can comprise MEMS (micro electro mechanical system) (MEMS).
Pattern bar can comprise the first pattern bar be arranged on along first direction on framework.Pattern bar can comprise the second pattern bar be arranged on along second direction on framework.Second direction can be vertical with first direction.Actuator can drive at least one in the first pattern bar and the second pattern bar.
According to exemplary embodiment of the present invention, provide a kind of method of deposit film.The method comprises preparation mask, and in the mask, the pattern bar for the formation of deposited picture is arranged in the frame.The method comprises mobile pattern bar to revise deposited picture, and utilizes the deposited picture revised of mask to perform depositing operation.
Pattern bar can rotate to multiple angle to revise deposited picture.
Pattern bar may slide into multiple position to revise deposited picture.
Accompanying drawing explanation
By referring to the following description in detail carried out when considering by reference to the accompanying drawings, more complete understanding of the present disclosure and many adjoint aspects of the present disclosure will easily obtain, and become better understood equally, in the accompanying drawings:
Fig. 1 is the skeleton view of the mask according to exemplary embodiment of the present invention;
Fig. 2 is the orthographic plan of the exemplary embodiment of the mask that Fig. 1 is shown;
Fig. 3 A and Fig. 3 B is the view of the technique of the deposited picture of the mask of the amendment Fig. 1 illustrated according to exemplary embodiment of the present invention;
Fig. 4 is the skeleton view of mask according to an embodiment of the invention; And
Fig. 5 A and Fig. 5 B is the view of the technique of the deposited picture of the mask of the amendment Fig. 4 illustrated according to exemplary embodiment of the present invention.
Embodiment
Below with reference to accompanying drawings exemplary embodiment of the present invention is described in more detail.But the present invention can revise in a variety of ways and should not be construed as limited to the embodiment disclosed herein.
Fig. 1 is the skeleton view of the mask 100 for deposit film according to exemplary embodiment of the present invention, and Fig. 2 is the orthographic plan of mask 100.
See figures.1.and.2, mask 100 comprises framework 120 and multiple pattern bar 110.The often end of pattern bar 110 can be fixed to framework 120.
Framework 120 can limit the external frame of mask 100.Framework 120 can have square or the rectangular shape that the heart is wherein limited with opening.The two ends of each pattern bar 110 are by the side supports faced by framework 120.Framework 120 and pattern bar 110 form the deposited picture of mask 100.Pattern bar 110 comprises the first pattern bar 111 arranged along first direction and the second pattern bar 112 arranged along second direction.Second direction can be vertical with first direction.First pattern bar 111 and the second pattern bar 112 deposited picture with formation with mesh shape intersected with each other.
The pattern bar 110 comprising the first pattern bar 111 and the second pattern bar 112 is not fixed to framework 120.Such as, pattern bar 110 can be revised mechanism 130(by pattern and will describe below) rotate with the angle of multiple expectation.
In other words, every bar pattern bar 110 is rotatably supported by framework 120 by the rotary supporting part 131 of such as bearing.In addition, every bar pattern bar 110 is connected to actuator 132.Pattern bar 110 can be rotated the angle to expecting by actuator 132.Actuator 132 can be such as MEMS (micro electro mechanical system) (MEMS).In addition, the various drive sources of rotating pattern bar 110 actuator 132 can be used as.
When pattern bar 110 rotates, can change by pattern bar 110 limit opening between distance (such as, spacing) to revise deposited picture.By this way, multiple deposited picture can be formed.
Multiple pattern bar 110 can be regulated simultaneously.Mechanism 130 can be revised by pattern and regulate pattern bar 110 simultaneously.
Pattern bar 110 can be regulated separately.Mechanism 130 can be revised by pattern and regulate pattern bar 110 separately.
Fig. 3 A and Fig. 3 B illustrates the technique of the deposited picture of the amendment of the rotation by pattern bar 110 mask 100 according to exemplary embodiment of the present invention.At first, the opening between pattern bar 100 can have square shape.When rotating pattern bar 110, the distance (such as, spacing) between adjacent pattern bar 110 can change gradually.
Such as, Fig. 3 A shows pattern bar 110 not by the state rotated.Here, pattern bar 110 can maintain spacing d1.Such as, if perform depositing operation in this case, then film 11 can be formed as with the spacing that has of mask 100 is on the substrate 10 that the deposited picture of d1 is corresponding.
Under the state shown in Fig. 3 B, pattern amendment mechanism 130 is operating as rotating pattern bar 110 slightly.Such as, the spacing of pattern bar 110 is changed into spacing d2 by from spacing d1, as shown in FIG 3 B.Then, such as, if perform depositing operation under the state being maintained at spacing d2 at pattern bar 110, then film 12 can be formed as corresponding with the deposited picture with spacing d2 of mask 100 on the substrate 10.
To the thin film deposition processes utilizing and have the mask 100 of said structure be described below.With reference to Fig. 3 A, film 11 can be formed on the substrate 10 by utilizing the deposited picture with spacing d1.Mask 100 is arranged in sediment chamber.The pattern bar 110 of mask 100 maintains spacing d1.Deposition source 400 can deposit film 11 on the substrate 10.Film 11 according to the deposited picture deposition with spacing d1 of mask 100 on the substrate 10.The film 11 with spacing d1 can deposit constantly.
About Fig. 3 B, film 12 can be formed on the substrate 10 by utilizing the deposited picture with spacing d2.Pattern amendment mechanism 130 can rotating pattern bar 110 spacing of pattern bar 110 is changed to spacing d2 from spacing d1.Deposition source 400 can deposit film 12 on the substrate 10.Film 12 can according to having the deposited picture deposition of spacing d2 on the substrate 10.The film 12 with spacing d2 can deposit constantly.Film 12 can be formed on film 11.When performing depositing operation while changing deposited picture as above, can deposit by utilizing single mask (such as, mask 100) film meeting various standard.Therefore, mask 100 can be raised the efficiency.In addition, mask 100 is used to boost productivity.
Fig. 4 is the skeleton view of the mask 200 according to exemplary embodiment of the present invention.Mask 200 can comprise pattern bar 210.Pattern bar 210 can comprise the first pattern bar 211 and the second pattern bar 212.First pattern bar 211 and the second pattern bar 212 can intersect to form opening perpendicular to each other.Pattern bar 210 can linear slide to change the size of opening, thus change deposited picture.In order to realize this object, mask 200 can comprise pattern amendment mechanism 230.Pattern amendment mechanism 230 can comprise sliding support parts 231 and actuator 232.Pattern bar 210 can be supported to the framework 220 of mask 200 by sliding support parts 231, and sliding support parts 231 can be wide enough so that pattern bar can slide wherein.Sliding support parts 231 and actuator 232 can be arranged in framework 220.Actuator 232 can make the every bar pattern bar 210 supported by sliding support parts 231 slide into multiple position.Such as, actuator 232 can be MEMS (micro electro mechanical system) (MEMS).In addition, the various drive sources that can move pattern bar 210 can be used as actuator 232.
When pattern bar 210 slides mobile, distance (such as, spacing) between the opening that limited by pattern bar 210 can be changed to revise deposited picture.
Fig. 5 A and Fig. 5 B shows the technique of the deposited picture of the mobile amendment mask 200 by pattern bar 210 of the embodiment according to the present invention's design.
Fig. 5 A shows the technique moving the first pattern bar 211 while pattern amendment mechanism 230 operates.According to the technique of Fig. 5 A, while the spacing between the first pattern bar 211 changes, film can be formed as corresponding with the deposited picture revised.
In addition, Fig. 5 B shows the technique moving the second pattern bar 212 while pattern amendment mechanism 230 operates.According to the technique of Fig. 5 B, while the spacing between the second pattern bar 212 changes, film can be formed as corresponding with the deposited picture revised.
Selectively, the first pattern bar 211 and the second pattern bar 212 can slide to revise pattern simultaneously.
Multiple pattern bar 210 can be regulated simultaneously.Mechanism 230 can be revised by pattern and regulate pattern bar 210 simultaneously.
Pattern bar 210 can be regulated separately.Mechanism 230 can be revised by pattern and regulate pattern bar 210 separately.
To the thin film deposition processes utilizing and have the mask 200 of said structure be described below.
For example, referring to Fig. 5 A, the mask 200 with the first adjusted pattern bar 211 of spacing can be placed in sediment chamber.In this state, can depositing operation be performed and the film corresponding with the deposited picture of mask 200 can be deposited.
With reference to Fig. 5 B, the mask 200 with the second adjusted pattern bar 212 of spacing can be placed in sediment chamber.Can depositing operation be performed and the film corresponding with the deposited picture of mask 200 can be deposited.Film can be formed on film.Therefore, when performing depositing operation while change deposited picture as described in reference Fig. 5 A and Fig. 5 B, single mask 200 can be utilized to deposit the film meeting various standard.Therefore, mask 200 can be raised the efficiency.In addition, mask 200 is used to boost productivity.
According to exemplary embodiment of the present invention, except the Patternized technique being used to organic luminous layer, mask 100 and 200 can also be used to deposit various film.
According to exemplary embodiment of the present invention, provide for deposit film mask and utilize the method for this masked-deposition film.Utilizing in mask and method, single mask can be utilized to form various pattern, therefore, a mask can utilized to produce the product with various characteristic.Therefore, the workload in the manufacture of mask, management and replacement can be reduced, thus boost productivity.
Although illustrate and describe the present invention with reference to exemplary embodiment of the present invention, but it is evident that for those of ordinary skills, when not departing from the spirit and scope of the present invention be defined by the claims, the various changes of form and details aspect can be carried out to the present invention.

Claims (9)

1. a deposition mas, described deposition mas comprises:
Framework;
Pattern bar, is arranged on framework, and pattern bar is configured to form deposited picture; And
Pattern amendment mechanism, is constructed to mobile pattern bar to revise deposited picture.
2. deposition mas according to claim 1, wherein, pattern amendment mechanism comprises:
Rotary supporting part, is constructed to support pattern bar in the frame; And
Actuator, is constructed to each pattern bar in rotating pattern bar.
3. deposition mas according to claim 2, wherein, actuator comprises MEMS (micro electro mechanical system).
4. deposition mas according to claim 2, wherein, pattern bar comprises:
First pattern bar, is arranged along first direction; And
Second pattern bar, is arranged along the second direction of intersecting with first direction.
5. deposition mas according to claim 2, wherein, the space between pattern bar is square.
6. deposition mas according to claim 1, wherein, pattern amendment mechanism comprises:
Sliding support parts, are constructed to allow pattern bar to slide; And
Actuator, is constructed to pattern bar is slided.
7. deposition mas according to claim 6, wherein, actuator comprises MEMS (micro electro mechanical system).
8. deposition mas according to claim 6, wherein, pattern bar comprises:
First pattern bar, is arranged along first direction; And
Second pattern bar, is arranged along the second direction of intersecting with first direction.
9. deposition mas according to claim 8, wherein, actuator makes at least one slip in the first pattern bar and the second pattern bar.
CN201410119858.XA 2013-06-14 2014-03-27 Deposition mas Active CN104233187B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020130068637A KR102096052B1 (en) 2013-06-14 2013-06-14 Mask for thin film deposition and the thin film deposition method using the same
KR10-2013-0068637 2013-06-14

Publications (2)

Publication Number Publication Date
CN104233187A true CN104233187A (en) 2014-12-24
CN104233187B CN104233187B (en) 2018-10-23

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Application Number Title Priority Date Filing Date
CN201410119858.XA Active CN104233187B (en) 2013-06-14 2014-03-27 Deposition mas

Country Status (4)

Country Link
US (2) US9375752B2 (en)
KR (1) KR102096052B1 (en)
CN (1) CN104233187B (en)
TW (1) TWI617679B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108950475A (en) * 2018-07-25 2018-12-07 京东方科技集团股份有限公司 It throws the net structure, throw the net device and method of throwing the net
CN110172666A (en) * 2019-06-13 2019-08-27 京东方科技集团股份有限公司 Mask plate component and preparation method thereof, pixel generation method
CN110735108A (en) * 2019-11-27 2020-01-31 京东方科技集团股份有限公司 Mask plate

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102096052B1 (en) 2013-06-14 2020-04-02 삼성디스플레이 주식회사 Mask for thin film deposition and the thin film deposition method using the same
US10745796B2 (en) * 2014-10-17 2020-08-18 Advantech Global, Ltd Multi-mask alignment system and method
KR102430444B1 (en) 2015-12-18 2022-08-09 삼성디스플레이 주식회사 A mask assembly, apparatus and method for manufacturing a display apparatus using the same
CN106480404B (en) * 2016-12-28 2019-05-03 京东方科技集团股份有限公司 A kind of exposure mask integrated framework and evaporation coating device
KR102653341B1 (en) 2018-11-16 2024-04-02 삼성전자주식회사 Micro led transfer device comprising mask and micro led transferring method using the same
KR102373000B1 (en) * 2019-09-06 2022-03-11 (주)아이씨디 Reel Type Rolling Mask Module

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3323490A (en) * 1966-02-21 1967-06-06 Trw Inc Adjustable mask
DE3008325C2 (en) * 1980-03-05 1987-05-27 Leybold-Heraeus Gmbh, 5000 Koeln, De
JPH05166236A (en) * 1991-12-11 1993-07-02 Ricoh Co Ltd Apparatus for producing magneto-optical recording medium
US5742422A (en) * 1995-09-19 1998-04-21 Inspex, Inc. Adjustable fourier mask
CN100473755C (en) * 2001-11-02 2009-04-01 爱发科股份有限公司 Film forming equipment and method
US20130112139A1 (en) * 2011-11-04 2013-05-09 Hon Hai Precision Industry Co., Ltd. Mask for use in evaporation coating process

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100330967B1 (en) 1999-12-31 2002-04-01 황인길 Blind system using in a fabricating process of a semiconductor device
KR20100095191A (en) 2009-02-20 2010-08-30 주식회사 신우 엠에스티 Apparatus for performing multiple photolithography processes using one mask, and method for performing multiple photolithography processes using the same
KR101186926B1 (en) 2010-07-09 2012-09-28 주식회사 피케이엘 Photolithography apparatus containing size adjustabele aperture for fabricating mask and method for fabricting phase shift mask using thereof
KR101700249B1 (en) 2010-10-07 2017-02-14 삼성디스플레이 주식회사 Exposure apparatus, exposure method, and blind for exposure apparatus
KR102096052B1 (en) 2013-06-14 2020-04-02 삼성디스플레이 주식회사 Mask for thin film deposition and the thin film deposition method using the same

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3323490A (en) * 1966-02-21 1967-06-06 Trw Inc Adjustable mask
DE3008325C2 (en) * 1980-03-05 1987-05-27 Leybold-Heraeus Gmbh, 5000 Koeln, De
JPH05166236A (en) * 1991-12-11 1993-07-02 Ricoh Co Ltd Apparatus for producing magneto-optical recording medium
US5742422A (en) * 1995-09-19 1998-04-21 Inspex, Inc. Adjustable fourier mask
CN100473755C (en) * 2001-11-02 2009-04-01 爱发科股份有限公司 Film forming equipment and method
US20130112139A1 (en) * 2011-11-04 2013-05-09 Hon Hai Precision Industry Co., Ltd. Mask for use in evaporation coating process
TW201319281A (en) * 2011-11-04 2013-05-16 Hon Hai Prec Ind Co Ltd Coating calibration board and method for assembling same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108950475A (en) * 2018-07-25 2018-12-07 京东方科技集团股份有限公司 It throws the net structure, throw the net device and method of throwing the net
CN108950475B (en) * 2018-07-25 2020-11-10 京东方科技集团股份有限公司 Net tensioning structure, net tensioning device and net tensioning method
CN110172666A (en) * 2019-06-13 2019-08-27 京东方科技集团股份有限公司 Mask plate component and preparation method thereof, pixel generation method
CN110735108A (en) * 2019-11-27 2020-01-31 京东方科技集团股份有限公司 Mask plate

Also Published As

Publication number Publication date
US20140370196A1 (en) 2014-12-18
KR102096052B1 (en) 2020-04-02
US9931661B2 (en) 2018-04-03
KR20140145886A (en) 2014-12-24
US9375752B2 (en) 2016-06-28
TWI617679B (en) 2018-03-11
US20160236222A1 (en) 2016-08-18
TW201446985A (en) 2014-12-16
CN104233187B (en) 2018-10-23

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