CN1042043C - Electronic beam evaporator - Google Patents
Electronic beam evaporator Download PDFInfo
- Publication number
- CN1042043C CN1042043C CN 94114030 CN94114030A CN1042043C CN 1042043 C CN1042043 C CN 1042043C CN 94114030 CN94114030 CN 94114030 CN 94114030 A CN94114030 A CN 94114030A CN 1042043 C CN1042043 C CN 1042043C
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- CN
- China
- Prior art keywords
- bar
- rotation
- shaped target
- electron
- beam evaporator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000010894 electron beam technology Methods 0.000 claims abstract description 32
- 238000007747 plating Methods 0.000 claims abstract description 27
- 239000000463 material Substances 0.000 claims abstract description 24
- 230000007246 mechanism Effects 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 238000009413 insulation Methods 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 abstract description 22
- 230000008020 evaporation Effects 0.000 abstract description 21
- 230000008901 benefit Effects 0.000 abstract description 3
- 230000002349 favourable effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 238000009834 vaporization Methods 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- 230000002459 sustained effect Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
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Abstract
The present invention relates to an electron beam evaporator which is characterized in that a rod-shaped body made of plating adding materials is arranged at the axis of the original crucible 7, and the rod-like target B is driven to rotate and move up and down through a rotary lifting mechanism 8. Compared with the prior art, the electron beam evaporator has the advantages that the continuous evaporation plating time can be enhanced by more than 150 times; the electron beam evaporator is especially suitable for remaking the powdered plating adding materials into rod materials for long time continuous evaporation plating; the evaporation direction can be arbitrarily chosen; and the electron beam evaporator is favorable to realize the industrialization of evaporation plating.
Description
The present invention relates to a kind of is the electron-beam evaporator of feature with the electron-bombardment method.
Electron-beam evaporator is commonly referred to as electron beam gun, is the core component of vacuum plating unit, is widely used in field evaporation electricity film, blooming, deielectric-coating and functional films such as electronic industry, opticinstrument instrument industry.
Electron-beam evaporator commonly used, form by supporting plate, cathode assembly, intensifying ring, electromagnetic deflection mechanism, crucible and water cooler, wherein cathode assembly is made of negative electrode pole, cathod filament, the focusing electrode of tape insulation, electromagnetic deflection mechanism is made of magnet coil and pole shoe, the electron beam that is formed by cathode assembly, intensifying ring bombards the plating material after the deflection of electromagnetic deflection mechanism, double as is that the anodic crucible is cooled off by water cooler, place the plating material in the crucible to be subjected to beam bombardment, produce the vaporization evaporation, be deposited on workpiece surface and form film.
The outstanding advantage of this electron-beam evaporator is can make various dystectic plating materials vaporizations and evaporate, as for SiO
2Powder is through fritting and evaporating, so this electron-beam evaporator dominate still in forming optical thin film technology so far.But there is following defective.
1. because the crucible finite capacity, place the plating material evaporation in several minutes to ten minute in the crucible to make a gift of to the greatest extent, can't realize long consecutive evaporation.
2. the plating material is to be placed in the crucible by action of gravity, and its evaporation direction can only be from bottom to top, can not realize other direction evaporations.
3. during the deposit multilayer film, the plating material require of replacing comes flyback to carry out fritting through electron beam once more, and this fritting time is often very long, can't satisfy the requirement of long-time continuous evaporation.
The object of the present invention is to provide the long especially electron-beam evaporator of a kind of evaporation time, be provided with bar-shaped target of making by the plating material and the rotation and lifting mechanism that bar-shaped target is rotated and upgraded, electron beam is done the scanning bombardment to bar-shaped target upper surface, makes target vaporization hydatogenesis at workpiece surface.
Realize that the object of the invention has adopted following technical measures:
1. the plating material is made bar-shaped target, be arranged on the double as anodic crucible axis,, on crucible and supporting plate, respectively open a through hole coaxially in order to arrange bar-shaped target.
2. evenly evaporation and the non-stop run of target surface in order to make bar-shaped target is provided with a rotation and lifting mechanism, makes bar-shaped target constantly rotation and lifting lentamente, keeps target surface to be in sustained height all the time, exhausts until target.
3. for target surface is evenly evaporated, triangle wave voltage of stack makes electron beam make radially shuttle-scanning on target surface on the field voltage of magnet coil.
Below in conjunction with accompanying drawing, be described in detail particular content of the present invention.
As shown in Figure 1, a kind of electron-beam evaporator, comprise supporting plate 3, cathode assembly 4, intensifying ring 5, electromagnetic deflection mechanism 6, crucible 7 and water jacket H, wherein cathode assembly 4 is by the negative electrode pole 41 of tape insulation, cathod filament 42, focusing electrode 43 is formed, electromagnetic deflection mechanism 6 is made of magnet coil 61 and pole shoe 62, cathode assembly 4, the electron beam that intensifying ring 5 forms bombards the plating material after 62 deflections of pole shoe, plating material vapor deposition is at workpiece surface, it is characterized in that the plating material makes rhoptry, the axis place that is arranged in former crucible 7 constitutes the bar-shaped target B that accepts beam bombardment, and this bar-shaped target B is driven by a rotation and lifting mechanism 8 and does rotation and up-and-down movement.
Electron-beam evaporator of the present invention is provided with chassis 1, supporting bar 2 and rotation and lifting mechanism 8, rotation and lifting mechanism 8 is by clamper 81, elastic lining 82, gear 83, lifting slider 84, screw rod 85, guide rod 86 and splined shaft 87 are formed, wherein screw rod 85, the two ends of guide rod 86 and splined shaft 87 are installed in respectively on chassis 1 and the supporting plate 3, have a counterbore that is used to arrange bar-shaped target B and elastic lining 82 on the clamper 81, lifting slider 84 is provided with a screw that matches with screw rod 85, a through hole that cooperates with guide rod 86, a counterbore that is used to arrange gear 83 and bearing thereof, bar-shaped target B, clamper 81, elastic lining 82, gear 83 and coaxial bearing thereof are arranged, and be connected as a single entity by screw and lifting slider 84, gear 83 and splined shaft 87 engagements, the splined shaft 87 of rotation and screw rod 85 drive bar-shaped target B respectively and do rotation and up-and-down movement.
The a plurality of rotation and lifting of configuration mechanism 8 in same electron-beam evaporator loads onto the bar-shaped target B of differing materials, switches successively, and then this vaporizer can be used for forming multilayer film.The plating material is pulverous, but the applied powder metallurgy method manufactures rhoptry with it and uses for this electron-beam evaporator.
Triangle wave voltage of stack in the field voltage of magnet coil 61, electron beam is just made radially shuttle-scanning on target surface.During bar-shaped target B work, owing to rotate and slowly rise, add that electron beam makes radially shuttle-scanning, make target surface be in sustained height all the time.
Bar-shaped target B of the present invention and the rotation and lifting mechanism 8 that makes bar-shaped target B rotate and upgrade motion are applicable to deflectional electron-beam evaporator, straight formula electron gun evaporation device and other forms of electron-beam evaporator simultaneously.
With prior art relatively, the present invention has following outstanding advantage.
1. the plating material is made rhoptry, and its stream time can reach 100 hours to hundreds of hours, helps to realize the evaporation process industrialization.And can only consecutive evaporation tens of minutes with crucible charge evaporation.
2. to powdery plating material, can add an amount of paraffin wax, make bar, can realize reaching hundreds of hours continuous evaporating-plating equally with powder metallurgic method as ceramic powder.
3. because the plating material is made bar, do not need vessels crucible, the direction of its evaporation can be selected arbitrarily, and existing electron-beam evaporator can only be the mode evaporation with from bottom to top.
4. rotation and lifting mechanism can be provided with a plurality ofly, switches these mechanisms successively, can realize the long-time continuous evaporation.
5. because constantly rotation and slowly rising of bar, its upper surface is bombarded by the electron beam shuttle-scanning, and bar is heated evenly, and the material that can avoid occurring in the prior art splashes or bursts.
6. can be applicable to existing ordinary electronic rifle is undergone technological transformation, only need on former crucible, to open one and arrange claval through hole and a rotation and lifting mechanism is set that miscellaneous part then need not to change.
Embodiment:
The rotatable electron-beam evaporator of a kind of magnetic biasing adopts structure as shown in Figure 1, is installed on the tinuous production, at large-area flat-plate continuous plating SiO on glass
2Film, SiO
2Target adopts quartz pushrod to make, and this Φ 30 * 450mm of its size is under the 1KW condition at beam power, consecutive evaporation 200 hours, SiO
2Target just exhausts.SiO
2During target work, the target speed of rotation is that per minute 20 changes, and lift velocity is per minute 0.0375mm.
Claims (3)
1. electron-beam evaporator, comprise supporting plate [3], cathode assembly [4], intensifying ring [5], electromagnetic deflection mechanism [6], crucible [7] and water jacket [H], wherein cathode assembly [4] is by the negative electrode pole [41] of tape insulation, cathod filament [42], focusing electrode [43] is formed, electromagnetic deflection mechanism [6] is made of magnet coil [61] and pole shoe [62], cathode assembly [4], the electron beam that intensifying ring [5] forms bombards the plating material after deflection between pole shoe [62], plating material vapor deposition is at workpiece surface, it is characterized in that: be provided with chassis [1], supporting bar [2], bar-shaped target [B] and rotation and lifting mechanism [8]; The plating material is made rhoptry, and the axis place that is arranged in former crucible [7] constitutes the bar-shaped target [B] of accepting beam bombardment, and this bar-shaped target [B] is driven by rotation and lifting mechanism [8] and does rotation and up-and-down movement.
2. according to the electron-beam evaporator of claim 1, it is characterized in that: described rotation and lifting mechanism [8] is by clamper [81], elastic lining [82], gear [83], lifting slider [84], screw rod [85], guide rod [86] and splined shaft [87] are formed, screw rod [85] wherein, guide rod [86], the two ends of splined shaft [87] are installed in respectively on chassis [1] and the supporting plate [3], have a counterbore that is used to arrange bar-shaped target [B] and elastic lining [82] on the clamper [81], lifting slider [84] is provided with a screw that matches with screw rod [85], a through hole that cooperates with guide rod [86], a counterbore that is used to arrange gear [83] and bearing thereof, bar-shaped target [B], clamper [81], elastic lining [82], gear [83] and coaxial bearing thereof are arranged, and be connected as a single entity by screw and lifting slider [84], gear [83] and splined shaft [87] engagement, splined shaft of rotation [87] and screw rod [85] drive bar-shaped target [B] respectively and do rotation and up-and-down movement.
3. according to the electron-beam evaporator of claim 1, it is characterized in that: the available powdered plating of described bar-shaped target [B] material is made rhoptry through powder metallurgic method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 94114030 CN1042043C (en) | 1994-12-08 | 1994-12-08 | Electronic beam evaporator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 94114030 CN1042043C (en) | 1994-12-08 | 1994-12-08 | Electronic beam evaporator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1109108A CN1109108A (en) | 1995-09-27 |
| CN1042043C true CN1042043C (en) | 1999-02-10 |
Family
ID=5036985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 94114030 Expired - Fee Related CN1042043C (en) | 1994-12-08 | 1994-12-08 | Electronic beam evaporator |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1042043C (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10256038A1 (en) * | 2002-11-30 | 2004-06-17 | Applied Films Gmbh & Co. Kg | A steamer |
| CN102808155A (en) * | 2012-08-01 | 2012-12-05 | 东莞宏威数码机械有限公司 | Electron bombardment type evaporation source system |
| CN102994957B (en) * | 2012-11-06 | 2014-09-03 | 上海宏昊企业发展有限公司 | No-diffusion-pump type coating machine for composite films |
| CN109500640A (en) * | 2018-04-28 | 2019-03-22 | 惠州市澳科磁材科技有限公司 | A kind of four axial brake devices of inside diameter slicer |
-
1994
- 1994-12-08 CN CN 94114030 patent/CN1042043C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1109108A (en) | 1995-09-27 |
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| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C06 | Publication | ||
| PB01 | Publication | ||
| AR01 | Abandonment of patent right to avoid double patenting |
According to article 9 of the patent law and article 12 of the detailed rules for the implementation of the patent law: 94114030.X patent for invention in the current issue of the notice of authorization, and at the same time corresponding to the 94239819.1 utility model patent to be given up, and in the 14 Volume 17 utility model on the publication of the patent right to abandon the announcement. |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |