CN114277336B - Based on Al 3 Al-based alloy film with vertically arranged Ti nanoneedles and preparation method thereof - Google Patents
Based on Al 3 Al-based alloy film with vertically arranged Ti nanoneedles and preparation method thereof Download PDFInfo
- Publication number
- CN114277336B CN114277336B CN202011036564.2A CN202011036564A CN114277336B CN 114277336 B CN114277336 B CN 114277336B CN 202011036564 A CN202011036564 A CN 202011036564A CN 114277336 B CN114277336 B CN 114277336B
- Authority
- CN
- China
- Prior art keywords
- film
- vertically arranged
- nanoneedles
- alloy
- alloy film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Based on Al 3 An Al-base alloy film with vertically arranged Ti nanoneedles is prepared through reaction deposition based on physical vapor deposition coating technique, selecting Al-Ti alloy system, controlling the specific ratio of Al to Ti components, especially the temp of substrate near Al smelting point, and using Al and Al 3 Immiscible separation growth of Ti phases at high temperature and Al vs. high melting point Al 3 Preparing acicular Al by the wetting effect of Ti columnar crystals 3 Ti nano columnar crystal is vertically arranged in the alloy film with the structure in the Al matrix. As a surface coating material for metals, the present invention provides a coating material formed by vertically arranged high-hardness Al 3 The bearing capacity of the Ti nano-scale to external load enables the film to obtain high hardness, and the deformation capacity of the continuous Al matrix enables the film to keep higher toughness and wear resistance.
Description
Technical Field
The invention relates to a material and a technology in the field of metal material films, in particular to a film based on Al 3 An Al-based alloy film with vertically arranged Ti nanoneedles and a preparation method thereof.
Background
The Al-based film deposited by vapor phase has the advantages of corrosion resistance and simultaneous deformation with a base material, the hardness of the film can be improved by adopting a two-phase structure that a high-hardness intermetallic compound reinforcement is obtained in the Al alloy film in a self-growing mode and is matched with an Al matrix, and the high deformation capability and toughness of the film can be kept and the wear resistance of the film can be improved due to the low content of alloy elements in the Al matrix. However, the size, shape, content and distribution of the intermetallic compound reinforcements in the thin film formed by self-growth are very important, and when the compound is randomly distributed in the form of particles in the Al matrix, although the hardness of the thin film can be improved, the improvement of wear resistance is still limited because the compound particles that are removed during wear will become abrasive grains of the worn thin film.
Disclosure of Invention
The invention provides an Al-based Al alloy thin film, which aims at the defects that the prior art is lack of a method for obtaining needle-shaped reinforcements of intermetallic compounds with nanometer scales, materials for vertically arranging the needle-shaped reinforcements in the thin film and a preparation method thereof, and the high-wear-resistance Al alloy thin film is difficult to obtain 3 Al-base alloy film with vertically arranged Ti nanoneedles and its preparing process, high-hardness Al 3 The bearing capacity of the Ti nano-scale film against external load enables the film to obtain high hardness, and the deformation capacity of the continuous Al matrix enables the film to keep higher toughness and wear resistance.
The invention is realized by the following technical scheme:
the invention relates to a catalyst based on Al 3 A process for preparing Al-base alloy film with vertically arranged Ti nanoneedles features that the Al-Ti alloy system is chosen and the particular ratio of Al to Ti components, especially the temp of substrate near Al smelting point, is controlled by physical vapor deposition 3 Immiscible separation growth of Ti phases at high temperature and Al vs. high melting point Al 3 Preparing acicular Al by the wetting effect of Ti columnar crystal 3 Ti nano columnar crystal is vertically arranged in the alloy film with the structure in the Al matrix.
The physical vapor deposition coating technology comprises the following steps: the metal is gasified by a physical method such as vacuum evaporation coating, sputtering coating and the like and then deposited on the surface of the solid to form a film.
The codeposition method comprises the following steps: a plurality of single metal evaporation sources or sputtering targets or alloy evaporation sources or alloy sputtering targets or mosaic targets consisting of a plurality of metals are adopted, and the metals are vaporized and simultaneously deposited on the surface of a base material to form a film.
The specific ratio of the two components is as follows: the atomic percent of Ti in the Al-Ti alloy is 6-12at.% Ti.
The substrate, i.e., the metal material supporting the thin film, is made of steel, ni, ti, or the like.
The temperature of the base material is as follows: maintained at 600-650 c close to the melting point of Al throughout the reaction deposition.
The invention relates to an alloy film prepared by the method, which consists of an Al matrix and acicular Al vertically arranged therein 3 Ti intermetallic compound composition and Al 3 The Ti nano needles are separated and filled by an Al matrix.
The acicular Al 3 The average diameter of the Ti intermetallic compound is 10-30nm.
The invention relates to the use of alloy films for coating material surfaces in order to increase the corrosion and/or wear resistance.
Technical effects
The invention solves the defects that the wear resistance is difficult to improve due to low hardness when the content of alloy elements is low and low toughness when the content of the alloy elements is high of the existing Al-based alloy film and the wear resistance is reduced due to easy generation of abrasive particles in the wear process of the particle reinforced Al-based composite film, and utilizes high-hardness Al 3 The great melting point temperature difference between 1360 ℃ of Ti reinforcement and 660 ℃ of high-toughness Al, in particular to the blank that the Al-based film is deposited by adopting the prior art at the temperature close to the melting point of Al 3 Ti and Al are not mutually solid-dissolved and grow respectively and Al is opposite to Al 3 Good wettability of Ti to obtain Al 3 The Ti nano columnar crystals are vertically arranged and grown and are separated by the Al composite film.
Compared with the prior art, the Al provided by the invention 3 The alloy film with Ti nanoneedles vertically arranged in the Al matrix and the preparation method thereof obviously improve the hardness and the bearing capacity of the film, and the continuous Al matrix filled in the alloy film and kept enables the film to keep enough deformation capacity and toughness, so that the film obtains high wear resistance and has wide application value as a surface coating material in modern industry. The invention realizes the acquisition of the nanometer needle-shaped Al by selecting and controlling the specific alloy system and the components of the film, particularly adopting the technical measures that the temperature of the base material is close to the melting point of the Al during deposition and the like 3 Ti compound is vertically arranged in the Al matrix, so that the wear resistance of the Al-based film is obviously improved.
Drawings
FIG. 1 shows Al 3 The Ti nanoneedles are vertically arranged in the structural schematic diagram of the alloy film in the Al matrix;
in the figure: 1Al 3 Ti nanoneedles, a 2Al matrix and 3 base materials;
FIG. 2 is a view showing the observation result of a transmission electron microscope of the composite film structure from the direction of the film surface;
in the figure: dark granular area is Al 3 The cross section of the Ti nano columnar crystal is provided with an Al matrix in a light color area.
Detailed Description
Example 1
This example employs a multi-target magnetron sputtering apparatus in which a pure Al target and a pure Ti target are controlled by two separate cathodes. By setting the gas pressure of the vacuum chamber to less than 10 -3 Filling Ar gas after Pa, and keeping the pressure of the Ar gas at 6 multiplied by 10 -1 Pa, the substrate placed in the vacuum chamber was heated and maintained at 600 ℃, and the Ti content of the Al — Ti alloy thin film was made 6.0at.% by controlling the sputtering power of the Al target and the Ti target, to obtain Al having an average diameter of 10nm as shown in fig. 1 and 2 3 The Ti nanoneedles are vertically arranged in an alloy film in an Al matrix, and the thickness of the film is 5 mu m.
Example 2
This example employs a multi-target magnetron sputtering apparatus in which a pure Al target and a pure Ti target are separately formed by two independent targetsThe cathode control of (2). By setting the pressure of the vacuum chamber to less than 10 -3 Introducing Ar gas after Pa, and keeping the pressure of the Ar gas at 6 multiplied by 10 -1 Pa, heating the substrate in the vacuum chamber at 625 deg.C, and controlling the sputtering power of the Al target and Ti target to make the Ti content of the Al-Ti alloy film at 9.0at.% to obtain Al with average diameter of 20nm 3 The Ti nanoneedles are vertically arranged in an alloy film in an Al matrix, and the thickness of the film is 5 mu m.
Example 3
This example employs a multi-target magnetron sputtering apparatus in which a pure Al target and a pure Ti target are controlled by two independent cathodes, respectively. By setting the pressure of the vacuum chamber to less than 10 -3 Introducing Ar gas after Pa, and keeping the pressure of the Ar gas at 6 multiplied by 10 -1 Pa, the substrate placed in the vacuum chamber was heated and maintained at 650 ℃ to obtain an Al-Ti alloy thin film having a Ti content of 12.0at.% and an average diameter of 30nm by controlling the sputtering power of the Al target and the Ti target 3 The Ti nanoneedles are vertically arranged in an alloy film in an Al matrix, and the thickness of the film is 5 mu m.
In conclusion, the invention adopts the mode that Al which has huge melting point temperature difference and is not mutually dissolved in solid solution 3 The combination of two-phase materials of Ti and Al with specific proportion particularly utilizes the blank of the prior art that the substrate temperature is deposited at the temperature close to the melting point of Al, thereby realizing the method of two-phase separation growth.
The foregoing embodiments may be modified in many different ways by those skilled in the art without departing from the spirit and scope of the invention, which is defined by the appended claims and all changes that come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein.
Claims (7)
1. Based on Al 3 The preparation method of the Al-based alloy film with the vertically arranged Ti nanoneedles is characterized in that a codeposition method of a physical vapor deposition coating technology is adopted, an Al-Ti alloy system is selected, the atomic percentage of Ti in the Al-Ti alloy is controlled to be 6,9, 12at.%, and the temperature of a base material is kept to be close to the Al melting point in the whole reaction deposition process, the temperature is kept to be 600-650 ℃, and the Al-based alloy film with the vertically arranged Ti nanoneedles is prepared by utilizingAl and Al formed 3 Immiscible separation growth of Ti phases at high temperature and Al vs. high melting point Al 3 Preparing acicular Al by the wetting effect of Ti columnar crystal 3 Ti nano columnar crystal is vertically arranged in the alloy film with the structure in the Al matrix.
2. Al-based according to claim 1 3 The preparation method of the Al-based alloy film with the vertically arranged Ti nanoneedles is characterized in that the physical vapor deposition coating technology comprises the following steps: vacuum evaporation coating and sputtering coating are the technology of forming a film by depositing a gasified metal on the surface of a solid through a physical method.
3. Al-based according to claim 1 3 The preparation method of the Al-based alloy film with the vertically arranged Ti nanoneedles is characterized in that the codeposition method comprises the following steps: two sputtering targets of single metal Al and Ti are adopted to ensure that the metal is simultaneously deposited on the surface of the base material after being gasified to form a film.
4. Al-based according to claim 1 3 The preparation method of the Al-based alloy film with the vertically arranged Ti nanoneedles is characterized in that the substrate, namely the metal material for supporting the film, is made of steel, ni or Ti.
5. An alloy thin film produced by the method according to any one of the preceding claims, characterized by comprising an Al matrix and acicular Al vertically arranged therein 3 Ti intermetallic compound composition and Al 3 The Ti nanoneedles are separated and filled by an Al matrix.
6. The alloy thin film according to claim 5, wherein said acicular Al 3 The average diameter of the Ti intermetallic compound is 10-30nm.
7. Use of an alloy film according to any of the preceding claims for coating a material surface to improve corrosion and/or wear resistance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011036564.2A CN114277336B (en) | 2020-09-28 | 2020-09-28 | Based on Al 3 Al-based alloy film with vertically arranged Ti nanoneedles and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011036564.2A CN114277336B (en) | 2020-09-28 | 2020-09-28 | Based on Al 3 Al-based alloy film with vertically arranged Ti nanoneedles and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114277336A CN114277336A (en) | 2022-04-05 |
| CN114277336B true CN114277336B (en) | 2022-10-14 |
Family
ID=80868024
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011036564.2A Active CN114277336B (en) | 2020-09-28 | 2020-09-28 | Based on Al 3 Al-based alloy film with vertically arranged Ti nanoneedles and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114277336B (en) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6154119A (en) * | 1998-06-29 | 2000-11-28 | The Regents Of The University Of California | TI--CR--AL--O thin film resistors |
| CN102644000B (en) * | 2012-02-20 | 2013-09-25 | 上海交通大学 | Preparation method of high-toughness metal-based nanometer composite material |
| JP5886473B2 (en) * | 2013-03-19 | 2016-03-16 | Ｊｘ金属株式会社 | Ti-Al alloy sputtering target |
| EP3625377A1 (en) * | 2017-09-05 | 2020-03-25 | Oerlikon Surface Solutions AG, Pfäffikon | Al-rich aitin-based films |
| CN109943803B (en) * | 2019-04-09 | 2020-06-05 | 长沙理工大学 | Anti-corrosion composite coating of molten aluminum-silicon alloy and preparation method and application thereof |
| CN110408890A (en) * | 2019-08-21 | 2019-11-05 | 上海电机学院 | A kind of Al-TiC laminated film and its preparation process |
-
2020
- 2020-09-28 CN CN202011036564.2A patent/CN114277336B/en active Active
Non-Patent Citations (1)
| Title |
|---|
| 原位Al_3Ti/Al复合材料的冷喷涂制备及组织性能;王洪涛等;《材料热处理学报》;20170725(第07期);全文 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114277336A (en) | 2022-04-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN110536974B (en) | Sputtering target and method for producing a sputtering target | |
| Movchan | Inorganic materials and coatings produced by EBPVD | |
| KR20110055399A (en) | Sputtering target mother material of multi-component alloy system and method for manufacturing complex-coating thin film of multi-function | |
| CN1240889A (en) | Bush and its making method | |
| Wang et al. | Titanium-modified graphite reinforced Cu-Ni composite by multi-arc ion plating technology | |
| CN107815645B (en) | A kind of low-friction coefficient MoS2Base Metal composite solid lubricant film | |
| CN111471957B (en) | Preparation method of multilayer heterostructure high-entropy alloy | |
| Subramanian et al. | Processing of continuously reinforced Ti-alloy metal matrix composites (MMC) by magnetron sputtering | |
| CN111441026A (en) | Preparation method of high-entropy alloy with dual-phase structure | |
| JP4216518B2 (en) | Cathode discharge type arc ion plating target and method of manufacturing the same | |
| CN114277336B (en) | Based on Al 3 Al-based alloy film with vertically arranged Ti nanoneedles and preparation method thereof | |
| Kim et al. | Cathodic arc plasma deposited TiAlSiN thin films using an Al-15 at.% Si cathode | |
| Bejarano et al. | Deposition of B4C/BCN/c-BN multilayered thin films by rf magnetron sputtering | |
| Zhong et al. | Deposition of NiAl thin films from NiAl compound target fabricated via combustion synthesis | |
| CN114277333B (en) | Al-based thin film with enhanced AlN nanoneedles in vertical arrangement and preparation method thereof | |
| Zhong et al. | Deposition and characterization of NiAl and Ni–Al–N thin films from a NiAl compound target | |
| CN108149198B (en) | A kind of WC hard alloy film and its gradient layer technology room temperature preparation method | |
| CN109898056B (en) | PVD (physical vapor deposition) technology-based bulk metal/metal ceramic nanometer gradient material as well as preparation method and application thereof | |
| CN106756833A (en) | A kind of high rigidity TiCrN/TiSiN nano-multilayered structures coatings and preparation method thereof | |
| US20240011144A1 (en) | Doped dlc for tribological applications | |
| CN102660732A (en) | Process for preparing (Ti,Al)BN ceramic amorphous-nanocrystalline wear-resistant anti-corrosion composite coating | |
| Tsai et al. | Effects of sputtering power on microstructure and mechanical properties of TiVCr films | |
| CN109576662B (en) | PVD (physical vapor deposition) technology-based bulk cermet/metal/cermet bidirectional nano gradient material and preparation method thereof | |
| CN1789480A (en) | Method for preparing aluminium-copper-ferrum quasi-crystal coating by vacuum evaporation | |
| DE102009053636A1 (en) | X-ray rotary anode plate for use in x-ray tube, has binding-and diffusion barrier layer provided for preventing solid diffusion of carbon, and non-surface processing x-ray active layer applied according to physical vapor deposition-method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |