CN104194652A - Non-corrosive polishing solution for mechanical equipment - Google Patents
Non-corrosive polishing solution for mechanical equipment Download PDFInfo
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- CN104194652A CN104194652A CN201410372486.1A CN201410372486A CN104194652A CN 104194652 A CN104194652 A CN 104194652A CN 201410372486 A CN201410372486 A CN 201410372486A CN 104194652 A CN104194652 A CN 104194652A
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- parts
- polishing solution
- corrosive
- mechanical equipment
- paraffin
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- ing And Chemical Polishing (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
The invention discloses a non-corrosive polishing solution for mechanical equipment. The non-corrosive polishing solution is characterized by comprising the following materials in parts by weight: 15 to 23 parts of nitrobenzene, 31 to 47 parts of hydrogen peroxide, 7 to 11 parts of chlorinated paraffin, 10 to 17 parts of kieselguhr, 1 to 7 parts of molecular sieve, 10 to 21 parts of paraffin, 35 to 56 parts of dimethyl siloxane, 13 to 24 parts of petroleum calcium sulfonate, 45 to 72 parts of sulfuric acid, 11 to 17 parts of nonylphenol polyoxyethylene ether, 15 to 37 parts of acetic acid and 45 to 75 parts of water. The chemical-mechanical polishing solution can be used for inhibiting the polishing rate of a low-dielectric material but slightly affecting the removal rate of copper and silicon dioxide, and simultaneously can be used for reducing contaminants on the surface of a polished material.
Description
Technical field
The present invention relates to a kind of free from corrosion polishing fluid for mechanical means.
Background technology
Tradition dielectric layer material is owing to having higher specific inductivity, can cause electric capacity between conducting stratum to increase, thereby affect the speed of unicircuit, make Efficiency Decreasing, along with the complicated of unicircuit and becoming more meticulous, this base material can not meet all the more the more technical requirements of advanced process, and in substrate, introducing dielectric materials is the inexorable trend of integrated circuit technique development, has produced many polishing slurries for dielectric materials thereupon.But the low-dielectric material lapping liquid in currently available technology does not all reach the perfect adaptation of manufacturing cost and technology performance.
Summary of the invention
Technical problem to be solved by this invention is to provide a kind of free from corrosion polishing fluid for mechanical means.
For solving the problems of the technologies described above, the technical solution used in the present invention is:
A free from corrosion polishing fluid for mechanical means, is characterized in that, comprises the material of following parts by weight: oil of mirbane 15-23 part, hydrogen peroxide 31-47 part, clorafin 7-11 part, diatomite 10-17 part, molecular sieve 1-7 part, paraffin 10-21 part, dimethyl siloxane 35-56 part, calcium mahogany sulfonate 13-24 part, sulfuric acid 45-72 part, polyoxyethylene nonylphenol ether 11-17 part, acetic acid 15-37 part, 75 parts of water 45-.
The invention has the beneficial effects as follows: chemical mechanical polishing liquid of the present invention can suppress the polishing speed of dielectric materials, and little on the removal speed impact of copper and silicon-dioxide, the while can reduce the surface contaminant of polished material.
Embodiment
Embodiment 1
For a free from corrosion polishing fluid for mechanical means, comprise the material of following parts by weight: 23 parts, oil of mirbane, 47 parts, hydrogen peroxide, 11 parts of clorafins, 17 parts, diatomite, 7 parts, molecular sieve, 21 parts, paraffin, 56 parts of dimethyl siloxanes, 24 parts of calcium mahogany sulfonates, 72 parts, sulfuric acid, 17 parts of polyoxyethylene nonylphenol ethers, 37 parts of acetic acid, 75 parts, water.
Embodiment 2
For a free from corrosion polishing fluid for mechanical means, comprise the material of following parts by weight: 15 parts, oil of mirbane, 31 parts, hydrogen peroxide, 7 parts of clorafins, 10 parts, diatomite, 1 part, molecular sieve, 10 parts, paraffin, 36 parts of dimethyl siloxanes, 14 parts of calcium mahogany sulfonates, 45 parts, sulfuric acid, 11 parts of polyoxyethylene nonylphenol ethers, 15 parts of acetic acid, 45 parts, water.
Claims (1)
1. for a free from corrosion polishing fluid for mechanical means, it is characterized in that, comprise the material of following parts by weight: oil of mirbane 15-23 part, hydrogen peroxide 31-47 part, clorafin 7-11 part, diatomite 10-17 part, molecular sieve 1-7 part, paraffin 10-21 part, dimethyl siloxane 35-56 part, calcium mahogany sulfonate 13-24 part, sulfuric acid 45-72 part, polyoxyethylene nonylphenol ether 11-17 part, acetic acid 15-37 part, 75 parts of water 45-.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410372486.1A CN104194652A (en) | 2014-07-31 | 2014-07-31 | Non-corrosive polishing solution for mechanical equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410372486.1A CN104194652A (en) | 2014-07-31 | 2014-07-31 | Non-corrosive polishing solution for mechanical equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104194652A true CN104194652A (en) | 2014-12-10 |
Family
ID=52080030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410372486.1A Pending CN104194652A (en) | 2014-07-31 | 2014-07-31 | Non-corrosive polishing solution for mechanical equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104194652A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106519988A (en) * | 2016-10-28 | 2017-03-22 | 昆山聚贝机械设计有限公司 | Environment-friendly rust-proof polishing solution for mechanical equipment |
| CN108587476A (en) * | 2018-05-25 | 2018-09-28 | 张剑 | A kind of preparation method of steel polishing agent |
-
2014
- 2014-07-31 CN CN201410372486.1A patent/CN104194652A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106519988A (en) * | 2016-10-28 | 2017-03-22 | 昆山聚贝机械设计有限公司 | Environment-friendly rust-proof polishing solution for mechanical equipment |
| CN108587476A (en) * | 2018-05-25 | 2018-09-28 | 张剑 | A kind of preparation method of steel polishing agent |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20141210 |