CN104166313A - Detection method of exposure path of exposure machine and exposure method using same - Google Patents

Abstract

A detection method for the exposure path of an exposure machine and an exposure method using the same can improve the accuracy of exposure of the exposure machine. The present invention mainly utilizes a processing unit, a linear movement distance measurement unit, an image capture unit and a standard substrate. The standard substrate is provided with a marking group having a plurality of marks, and these marks are arranged at intervals along a linear direction. The image capture unit and the standard substrate move relative to each other along the linear direction, so that the processing unit generates a measurement position group of these marks, and then the photosensitive circuit board and the exposure device move relative to each other along the linear direction, and the exposure device exposes the photosensitive circuit board according to these measurement position groups. Therefore, the present invention can improve the accuracy of exposure of the exposure machine and thus improve the manufacturing qualification rate of the circuit board.

Description

Detection method of exposure path of exposure machine and exposure method using same

technical field

The invention relates to a detection method of an exposure path of an exposure machine and an exposure method using the same, especially a detection method using a standard substrate detection and an exposure method using the same.

Background technique

At present, the industry generally needs to use exposure machines when manufacturing circuit boards, and scanning exposure machines are one of them. Scanning exposure machines mainly place photosensitive circuit boards on the carrier table of scanning The stage moves linearly relative to the exposure device of the scanning exposure machine, or the exposure device moves linearly relative to the carrying table, so that the exposure device exposes the photosensitive circuit board. However, the stage or the exposure device of the scanning exposure machine usually drives the stage or the exposure device to move linearly by the driving mechanism. When the stage moves linearly relative to the exposure device, or the exposure device moves linearly relative to the stage, the stage or The exposure device may deviate from left to right due to defects in the driving mechanism, which will directly cause exposure misalignment of the exposure device, and further make the currently exposed photosensitive circuit board scrapped.

Therefore, how to invent a method for detecting the exposure path of an exposure machine and an exposure method using the same, so that it can improve the accuracy of the exposure of the exposure machine and thus improve the manufacturing pass rate of the circuit board, will be actively disclosed by the present invention. place.

Contents of the invention

In view of the shortcomings of the above-mentioned prior art, the inventor felt that it was not yet perfect, so he exhausted his mind to study and overcome it. Based on his accumulated experience in this industry for many years, he developed a detection method for the exposure path of an exposure machine. And the exposure method using it, in order to achieve the purpose of improving the accuracy of the exposure machine exposure and then achieve the purpose of improving the manufacturing pass rate of the circuit board.

In order to achieve the above purpose, the first embodiment of the present invention provides a method for detecting the exposure path of an exposure machine, which includes the following steps:

A. Provide a processing unit, a linear movement distance measuring unit, and at least one image capture unit in the exposure machine, and provide a standard substrate on which at least one mark group is arranged, and the mark group has a plurality of marks along the Arranged at intervals in the straight line direction;

B. Place the standard substrate on the carrier table of the exposure machine;

C. relatively moving the image capture unit and the standard substrate along the linear direction; and

D. Make the linear movement distance measurement unit transmit the linear movement distance of the stage or at least one exposure device of the exposure machine to the processing unit, and make the image capture unit transmit the images of these marks to the processing unit, so that the The processing unit generates these marked sets of measurement locations.

In the above method for detecting the exposure path of an exposure machine, the step C is that the stage moves along the linear direction, and the image capture unit is stationary, so that the image capture unit and the standard substrate move relatively along the linear direction, or, In the step C, the image capture unit moves along the linear direction, and the carrying platform is stationary, so that the image capture unit and the standard substrate move relatively along the linear direction.

In the detection method of the exposure path of the exposure machine, the linear movement distance measurement unit is an optical scale.

In the detection method of the exposure path of the exposure machine, the image capture unit is a Charge-Coupled Device (CCD).

In the above detection method of the exposure path of the exposure machine, these marks are respectively circular or other geometric shapes.

In the above detection method of the exposure path of the exposure machine, the marks are arranged at equal intervals along the linear direction.

The second embodiment of the present invention provides an exposure method of an exposure machine, which uses the detection method of the exposure path of the exposure machine as described above, and the exposure method of the exposure machine also includes the following steps:

E remove the standard substrate, and place the photosensitive circuit board on the carrier table of the exposure machine; and

F making the photosensitive circuit board and at least one exposure device of the exposure machine relatively move along the linear direction, and make the exposure device expose the photosensitive circuit board according to the measurement position groups.

In the above-mentioned exposure method of the exposure machine, the step F is that the carrying table moves along the linear direction, and the exposure device is stationary, so that the photosensitive circuit board and the exposure device move relatively along the linear direction, or, the step F is the The exposure device moves along the straight line, and the carrying platform is stationary, so that the photosensitive circuit board and the exposure device move relatively along the straight line.

Therefore, the detection method of the exposure path of the exposure machine and the exposure method using the same of the present invention can improve the accuracy of the exposure of the exposure machine and thus improve the manufacturing yield of the circuit board.

Description of drawings

FIG. 1 is a first schematic diagram of the first embodiment of the present invention.

Fig. 2 is a second schematic diagram of the first embodiment of the present invention.

Fig. 3 is a schematic diagram of a second embodiment of the present invention.

Main component reference signs:

1 processing unit

2 Linear moving distance measuring unit

3 Image capture unit

4 Standard substrate

41 tag group

411 flag

42 Straight line direction

5 photosensitive circuit board

9 exposure machine

91 carrying platform

911 L-shaped fixed frame

92 Exposure device

Detailed ways

For fully understanding purpose of the present invention, feature and technical effect, hereby by following specific embodiment, in conjunction with accompanying drawing, the present invention is described in detail, as follows:

Figure 1 and Figure 2 are schematic diagrams 1 and 2 of the first embodiment of the present invention, respectively. As shown in the figures, the first embodiment of the present invention is a method for detecting the exposure path of an exposure machine, which includes the following steps:

A. As shown in Figure 1, a processing unit 1, a linear movement distance measurement unit 2 and at least one image capture unit 3 are provided in the exposure machine 9, and a standard substrate 4 is provided; at least one marking group is arranged on the standard substrate 4 41, the mark group 41 has a plurality of marks 411 (the more the number of marks 411, the more accurate the detection), these marks 411 are arranged at intervals along the linear direction 42, the number of the mark group 41 can be compared with the exposure device 92 of the exposure machine 9 The same number, so that each exposure device 92 can detect the correct exposure position, the number of examples of the mark group 41 and the exposure device 92 in the figure is three, when the number of the mark group 41 is multiple, these marks The groups 41 are arranged parallel to each other on the standard substrate 4; the processing unit 1 can be integrated in the control system (not shown) of the exposure machine 9 or set independently, and the processing unit 1 can have a central processing unit electrically connected to each other (not shown in the figure), processing circuit (not shown in the figure) and memory (not shown in the figure), etc.; The carrying platform 91 can move in the positive y direction for exposure, and if these exposure devices 92 are arranged on the lower left, the carrying platform 91 can move in the negative y direction for exposure), the linear movement distance measurement unit 2 is electrically connected to the processing Unit 1 and can be arranged on the carrying platform 91 of this exposure machine 9 to measure the linear movement distance of this carrying platform 91; In Fig. 3, the exposure device 92 can move to the negative y direction for exposure, and if these exposure devices 92 are arranged on the lower left, the exposure device 92 can move to the positive y direction for exposure), the linear movement distance measurement unit 2. It is electrically connected to the processing unit 1 and can be installed on the exposure device 92 of the exposure machine 9 to measure the linear movement distance of the exposure device 92; During exposure, the image capture unit 3 is electrically connected to the processing unit 1 and can be installed on the exposure device 92 of the exposure machine 9 or independently installed to capture the images of the marks 411 on the standard substrate 4, and if the When the model of the exposure machine 9 is exposed by the movement of its exposure device 92, the image capture unit 3 is electrically connected to the processing unit 1 and can be arranged on the exposure device 92 of the exposure machine 9 to capture For the images of these marks 411 on the standard substrate 4, the number of the image capture units 3 can be the same as the number of the exposure devices 92 of the exposure machine 9, so that each exposure device 92 can detect the correct exposure position, as shown in the figure The example number of the image capture unit 3 and the exposure device 92 is three;

B. As shown in Figure 2, place the standard substrate 4 on the carrier table 91 of the exposure machine 9, the standard substrate 4 can be fixed on the carrier table 91 by the L-shaped fixing frame 911 of the carrier table 91, The L-shaped fixing frame 911 is only an example of fixing, and the standard substrate 4 can also be fixed on the carrier platform 91 of the exposure machine 9 by other fixing components;

C. Make the image capture unit 3 and the standard substrate 4 move relatively along the linear direction 42, and make the image capture unit 3 capture the images of these marks 411; for example: if the model of the exposure machine 9 is When the exposure is performed by the movement of the carrier 91, the carrier 91 moves along the linear direction 42 during detection (for the moving method, please refer to the moving method of the carrier 91 above), and the image capture unit 3 is stationary, so that Make the image capture unit 3 and the standard substrate 4 move relatively along the linear direction 42, so that the image capture unit 3 captures the images of these marks 411; When the exposure device 92 moves to expose, the image capture unit 3 moves along the linear direction 42 during detection (for the moving method, please refer to the above-mentioned moving method of the exposure device 92), and the carrying table 91 is stationary, so that The image capture unit 3 and the standard substrate 4 move relatively along the linear direction 42, so that the image capture unit 3 captures images of the marks 411; and

D. If the model of the exposure machine 9 is to expose by the movement of the carrier table 91, make the linear movement distance measuring unit 2 transmit the linear movement distance of the carrier table 91 to the processing unit 1 (such as the carrier table 91 on the y-axis linear movement distance), if the model of the exposure machine 9 is exposed by the movement of the exposure device 92, the linear movement distance measuring unit 2 is transmitted to the linear movement distance of the exposure device 92 To the processing unit 1 (such as the linear movement distance of the exposure device 92 on the y-axis), in addition, the image capture unit 3 transmits the images of these marks 411 to the processing unit 1, so that the processing unit 1 generates these marks 411 measurement position group, for example, when the carrying platform 91 (or the exposure device 92) is at a specific y-axis distance, the measurement position of the captured image mark 411 is (x, y), and the carrying platform 91 (or The specific y-axis distance of the exposure device 92) and the measurement position (x, y) of the mark 411 of the captured image constitute the measurement position group of the mark 411. The specific y-axis distance can be along the linear direction 42, The distance from the edge of the standard substrate 4 to the first mark 411, the distance from the edge of the standard substrate 4 to the second mark 411... and so on, the processing unit 1 can measure the centroid of the mark 411 (or end angle) as the measurement position of the mark 411 , and these measurement position groups can be stored in the memory of the processing unit 1 .

The measurement position groups of the marks 411 can be detected when the carrier table 91 or the exposure device 92 moves linearly by the above method, and the combination of the measurement position groups of the marks 411 forms the actual exposure path of the exposure machine 9 .

In the detection method of the exposure path of the exposure machine, the linear movement distance measurement unit 2 can be an optical scale to improve measurement accuracy, and the linear movement distance measurement unit 2 can also be other measurement devices.

In the above method for detecting the exposure path of an exposure machine, the image capture unit 3 can be a charge-coupled device with high resolution, and the image capture unit 3 can also be other image capture devices.

In the detection method of the exposure path of the exposure machine, the marks 411 are circular or other geometric shapes, so that the image capture unit 3 can capture the centroid or end angle of the marks 411 .

In the detection method of the exposure path of the above-mentioned exposure machine, these marks 411 are arranged at the same interval along the linear direction 42 so as to calculate the linear movement distance of these marks 411. If the number of the mark group 41 is multiple, these marks 411 can be arranged as Matrix type.

Fig. 3 is a schematic diagram of the second embodiment of the present invention, please refer to Fig. 2 at the same time, as shown in the figure, the second embodiment of the present invention is an exposure method of an exposure machine, which applies the exposure path of the exposure machine as described above The detection method, the exposure method of the exposure machine also includes the following steps:

E. Remove the standard substrate 4, and place the photosensitive circuit board 5 on the carrier platform 91 of the exposure machine 9. For the method of fixing the photosensitive circuit board 5 on the carrier platform 91, please refer to the above-mentioned standard substrate 4 fixed on the carrier platform. 91 ways; and

F. Make the photosensitive circuit board 5 and the exposure device 92 of the exposure machine 9 move relatively along the linear direction 42, and make the exposure device 92 expose the photosensitive circuit board 5 according to these measurement position groups; for example: if the exposure When the model of machine 9 is to perform exposure by the movement of the carrying platform 91 (please refer to the moving method of the above-mentioned carrying platform 91 for the moving method), the carrying platform 91 moves along the linear direction 42, and the exposure device 92 is stationary , so that the photosensitive circuit board 5 and the exposure device 92 move relatively along the linear direction 42, so that the exposure image (not shown) in the exposure device 9 is exposed to the photosensitive circuit board 5 according to these measurement position groups; If the model of the exposure machine 9 is to expose by the movement of the exposure device 92 (for the moving method, please refer to the above-mentioned movement method of the exposure device 92), the exposure device 92 moves along the linear direction 42, and the carrying table 91 is stationary, so that the photosensitive circuit board 5 and the exposure device 92 move relatively along the linear direction 42, and then make the exposure image (not shown) in the exposure device 92 correspond to the photosensitive circuit board 5 according to these measurement position groups. exposure.

By means of the above method, the accuracy of the exposure of the exposure machine can be improved, thereby improving the manufacturing pass rate of the circuit board.

The present invention has been disclosed above with preferred embodiments, but those skilled in the art should understand that the embodiments are only for describing the present invention, and should not be construed as limiting the scope of the present invention. It should be noted that all changes and substitutions equivalent to this embodiment should be considered within the scope of the present invention. Therefore, the protection scope of the present invention should be determined by the contents defined in the claims.

Claims (8)

1. the detection method in exposure machine exposure path, is characterized in that, comprises the following step:

A. provide processing unit, traveling priority distance measuring unit and at least one image acquisition unit in this exposure machine, and provide standard substrate, on this standard substrate, be laid with at least one mark group, this mark group has a plurality of marks, and these marks are spaced along rectilinear direction;

B. place this standard substrate on the plummer of this exposure machine;

C. make this image acquisition unit and this standard substrate relatively move along this rectilinear direction; And

D. make the traveling priority distance of at least one exposure device that this traveling priority distance measuring unit transmits this plummer or this exposure machine to this processing unit, make image that this image acquisition unit transmits these marks to this processing unit, so that this processing unit produces the measuring position group of these marks.

2. the detection method in exposure machine as claimed in claim 1 exposure path, it is characterized in that, this step C moves along this rectilinear direction for this plummer, this image acquisition unit is static, so that this image acquisition unit and this standard substrate relatively move along this rectilinear direction, or this step C moves along this rectilinear direction for this image acquisition unit, this plummer is static, so that this image acquisition unit and this standard substrate relatively move along this rectilinear direction.

3. the detection method in exposure machine exposure as claimed in claim 1 path, is characterized in that, this traveling priority distance measuring unit is optical ruler.

4. the detection method in exposure machine exposure as claimed in claim 1 path, is characterized in that, this image acquisition unit is Charged Coupled Device.

5. the detection method in exposure machine exposure as claimed in claim 1 path, is characterized in that, these marks are respectively circular or other geometric configuratioies.

6. the detection method in exposure machine exposure as claimed in claim 1 path, is characterized in that, these marks are arranged along this rectilinear direction same intervals.

7. an exposure method for exposure machine, is characterized in that, the detection method in the exposure machine exposure path of application as described in claim 1 to 6 any one, and the exposure method of this exposure machine also comprises the following step:

E removes this standard substrate, and places photosensitive circuit plate on the plummer of this exposure machine; And

F makes at least one exposure device of this photosensitive circuit plate and this exposure machine relatively move along this rectilinear direction, and this exposure device is exposed to this photosensitive circuit plate according to these measuring position groups.

8. the exposure method of exposure machine as claimed in claim 7, it is characterized in that, this step F moves along this rectilinear direction for this plummer, this exposure device is static, so that this photosensitive circuit plate and this exposure device relatively move along this rectilinear direction, or this step F moves along this rectilinear direction for this exposure device, this plummer is static, so that this photosensitive circuit plate and this exposure device relatively move along this rectilinear direction.