CN104159985B - Transparency electrode formation conductive ink composition - Google Patents
Transparency electrode formation conductive ink composition Download PDFInfo
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- CN104159985B CN104159985B CN201380013342.0A CN201380013342A CN104159985B CN 104159985 B CN104159985 B CN 104159985B CN 201380013342 A CN201380013342 A CN 201380013342A CN 104159985 B CN104159985 B CN 104159985B
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/52—Electrically conductive inks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
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Abstract
The present invention relates to a kind of transparency electrode formation conductive ink composition.Specifically; transparency electrode formation conductive ink composition according to the present invention; conductive network is formed with metal nanometer line; and make up the broken string of network with metal-sol and fill empty space; thus there is excellent electric conductivity and transmission of visible light; owing to metal-sol works as the protective layer of the corrosion and oxidation that prevent metal nanometer line, thus without other antioxidant or protective layer, and it is able to ensure that the environment resistant of manufactured transparency electrode.
Description
Technical field
The present invention relates to transparency electrode formation conductive ink (ink) compositions.
Background technology
Transparency electrode refers to physico-chemical process on transparent glass substrate or relatively thin polymeric substrate
Condense atom, molecule or ion to form, and transparent visible region (wavelength is 380-780nm), and
The electrode that electrical conductivity is bigger.More particularly, transparency electrode refer to light transmission substantially more than 80% and
Sheet resistance is the thin film of 500 Ω/below.
For the material as transparency electrode, need the material that electricity, optical characteristics and etching characteristic are excellent.
As the material developed at present, the indium tin oxide with the most excellent physical property is being widely used
(Indium tin oxide, ITO), but, owing to ITO is using expensive rare metal i.e. indium as mainly
Composition, it is therefore desirable to the transparent electrode material of this ITO can be replaced.
To this end, once had sputtering the metal such as gold, silver, copper and make relatively thin thin film and as transparency electrode
Use trial, although and this electrode electrical conductivity is excellent, but exist visible region light transmission reduce
And with the bonding force of lower basal plate bad problem.
And, zinc oxide (ZnO) is although thin film is cheap material, but electrical conductivity is less than ITO, at SnO2
With the addition of the antimony tin oxide (ATO) of a small amount of Sb to exist and be not etched by and problem that baking temperature is higher.
And, also there is the method utilizing sol-gel (Sol-Gel) synthesis and prepare oxide-film, but exist
Electrical conductivity is the most relatively low and the problem that needs the baking temperature high-temperature technology more than 350 DEG C.
And, also have and the oxides such as ZnO, ITO, IZO (indium-zinc oxide) are made the micro-of nanosized
Grain also utilizes it to prepare ink or slurry and the method that manufactures transparency electrode, but exists and be difficult to prepare nanosized
Oxide and need the problem of technique of higher temperature of more than 250 DEG C.
To this end, recently in the trial carrying out suitable metal nano wire on the transparent electrodes.
In transparency electrode conductive ink, metal nanometer line forms network when transparency electrode is formed and rises
The effect guaranteeing electric conductivity.Metal nanometer line network is the densest, and the electrical conductivity of transparency electrode more improves,
But there is the problem that transmission of visible light reduces and needs too much expense.And, even if linear with metal nano
Become conductive network, the most necessarily occur the empty space between network outage, and network as not having
The non-conductor region residual of electric conductivity.And, metal nanometer line is nanometer tectosome, the existing thing of its specific activity
Matter is strong, thus oxidation and corrosion tendency are stronger in the case of being exposed in air with there is no protective layer.Especially,
Nano silver wire has high conductance property and transparent in visible region, but known in an atmosphere because of oxidation and corrosion
And make resistance improve substantially 15%-20%, exist to prevent this situation from must use other antioxidant
Or the problem of multiple protective layer.
Summary of the invention
Technical problem
In order to solve problem as above, the present invention its object is to provide a kind of transparency electrode electric conductivity
Ink composite, this transparency electrode conductive ink composition has excellent electric conductivity and visible transmission
Rate, and without preventing the corrosion of metal nanometer line and the antioxidant of the other of oxidation or protective layer, and can
Guarantee the environment resistant of manufactured transparency electrode.
And, the present invention its object is to provide the forming method of a kind of transparency electrode utilizing above-mentioned composition
With by the transparency electrode manufactured by said method.
Problem-solving approach
In order to achieve the above object, the present invention provides a kind of transparency electrode formation conductive ink composition,
This transparency electrode formation conductive ink composition, it is characterised in that comprise:
A) metal-sol, it contains a) metal precursor and b) solvent；And,
B) metal wire.
And, the present invention provides: the manufacture method of conductive clear electrode, it is characterised in that by above-mentioned transparent
Electrode formation conductive ink composition is coated on matrix material and is dried and toasts；And, utilize
Conductive clear electrode manufactured by said method.
Favourable effect
The transparency electrode formation electric conductivity oil of above-mentioned metal-sol and metallic sodium rice noodle is comprised according to the present invention
Ink composition, forms conductive network with metal nanometer line, and makes up the broken string of network with metal-sol and fill out
Fill empty space, thus there is excellent electric conductivity and transmission of visible light.It is additionally, since metal-sol
Protective layer as the corrosion and oxidation that prevent metal nanometer line works, thus without other antioxidant
Or protective layer, and it is able to ensure that the environment resistant of manufactured transparency electrode.
Accompanying drawing explanation
Fig. 1 is the concept map of the embodiment representing the transparency electrode according to present invention formation.
Fig. 2 is the scanning electron microscope enlarged drawing of the transparency electrode formed according to the present invention.
Fig. 3 is the visible transmission figure of the transparency electrode formed according to the present invention.
Detailed description of the invention
The transparency electrode formation conductive ink composition of the present invention, it is characterised in that comprise:
A) metal-sol, it contains a) metal precursor and b) solvent；And,
B) metal wire.
Metal-sol according to the present invention can be prepared under room temperature, condition of normal pressure, and can be at metal precursor
The tenor of regulation metal-sol in solubility range, thus metal concentration can not only be regulated, but also
Viscosity adjustment and baking temperature regulation can be carried out.And, prepare mixing with metal nanometer line
Strong acid or highly basic is not used, because receiving without damage metal during transparency electrode formation conductive ink composition
Rice noodle.
The metal-sol that can use in the present invention will not damage metal nanometer line, makes up the broken string of network, and
Fill the empty space between network with conductive metal film, thus play the conductance improving whole film
The effect of rate.And, play a part to prevent the oxidation of metal nanometer line, prevent the protective layer of abrasion.Especially
It, not only prevent such as dampness, oxygen, sulfur etc. from likely corroding the penetration of metal nanometer line, but also carry
High metal nanometer line and the bonding force of lower basal plate.
At the metal of a) metal precursor that above-mentioned metal-sol can use, though being not particularly limited, but preferably
Use I race of choosing free gold, silver, copper, aluminum, nickel, stannum, palladium, platinum, zinc, ferrum, indium, magnesium etc., II
More than one metal in the group of A race, III A race, IV A race and VIII B race metal composition, more manages
Think is more than one in the group using and selecting free zinc, aluminum, stannum, ferrum, copper and silver composition.
Above-mentioned metal precursor can be choosing free nitrate, acetate, acetylacetonate, silicate, phosphoric acid
More than one inorganic salts in the group of salt and their mixture composition, are preferably used acetate, acetyl
Acetone salt or silicate.
Time on the basis of metal-sol gross weight, the range of above-mentioned metal precursor is preferably 3 to 20 weights
Amount %.When the above-mentioned metal precursor used is less than 3 weight %, it is impossible to form fine and close metal deposit,
Thus do not play the protective layer effect of metal nanometer line, and metal nanometer line network not can overcome the disadvantages that broken string the most not
Empty space can be filled.And, when above-mentioned content is more than 20 weight %, the stability of metal-sol
Reduce thus metal precursor precipitation, or need the baking temperature of 300 DEG C of high temperature above and baking time also to need
Want more than 30 minutes, thus result in metal nanometer line oxidation.
In the present invention, as dissolve above-mentioned metal precursor b) solvent can use select Free water, methanol,
Ethanol, propanol, isopropanol, isopropyl acetate, butanol, 2-butanol, capryl alcohol, 2-Ethylhexyl Alcohol, amylalcohol,
Benzylalcohol, hexanol, 2-hexanol, Hexalin, terpineol, nonyl alcohol, methylene glycol, ethylene glycol, diethylene glycol,
2,2'-ethylenedioxybis(ethanol)., tetraethylene glycol (TEG), glycol monoethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diglycol monotertiary first
Ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, triethylene glycol monomethyl ether, 2,2'-ethylenedioxybis(ethanol). list ether, 2,2'-ethylenedioxybis(ethanol). list
Butyl ether, 2-acetone, diacetyl, acetylacetone,2,4-pentanedione, 1,2-diacetyl ethane, dimethyl carbonate, carbonic acid two
Ethyl ester, propylene glycol methyl ether acetate, 2-methoxyethyl acetate, propylene glycol monomethyl ether, N-methyl-2-
More than one solvent in the group of ketopyrrolidine, N-methylacetamide and their mixture composition,
It is preferably, it is possible to be used alone acetylacetone,2,4-pentanedione or use the mixed solvent containing acetylacetone,2,4-pentanedione, it may be desirable to consider
For the dissolving power of metal precursor, the viscosity adjustment of ink, being formed smoothly and metal nanometer line of thin film
Combination etc. select, and more preferably, in the metal-sol of the present invention, the content of solvent is 80-97
Weight %.
And, when mixing two or more solvents and using, the mixing ratio of solvent is preferably with main solvent 1 weight portion
On the basis of secondary solvent is mixed with the ratio of 0.2 to 0.8 weight portion.Above-mentioned main solvent can select above-mentioned
The cited one in solvent and used, except as more than one in addition to the solvent of main solvent
Solvent can serve as secondary solvent.Solvent mixing ratio within the above range in the case of, be can easily be accommodated
Viscosity, improve the dissolubility of metal precursor, the effect such as baking temperature of regulation conductive ink.
Such as, terpineol or nonyl alcohol are owing to viscosity is high and boiling point is high, thus there is the baking temperature of conductive ink
The problem that degree raises.Now, if methanol, ethanol etc. are used within the above range as secondary solvent, then
Reduce viscosity and reduce boiling point such that it is able to the baking temperature of regulation conductive ink.But, if methanol,
The content of ethanol escapes above-mentioned scope and not enough, then it could not be expected that reduction viscosity and the effect of baking temperature, with
This is contrary, if adding excess, is unable to maintain that the suitable viscosity of conductive ink, or because of very fast during coating
Volatilization and likely on film produce defect.And, diacetyl, acetylacetone,2,4-pentanedione, dimethyl carbonate,
Or ethylene glycol is for from the point of view of metal precursor being the preferable solvent of dissolubility, if this is added methanol, ethanol, different
Propanol etc. and as secondary solvent, then there is the effect improving rapidly the dissolubility to metal precursor, thus suitable
Close preparation high concentration metal-sol, if but escape above-mentioned scope, then its effect reduces.
Above-mentioned metal-sol according to the present invention, it is possible to by molten for above-mentioned metal precursor under room temperature, condition of normal pressure
The above-mentioned solvent of Xie Yu prepares.
More particularly, for the preparation method of above-mentioned metal-sol, by the inorganic salt of metal, preferably will
The acetate of metal, acetylacetonate or silicate are used as metal precursor, and by acetylacetone,2,4-pentanedione or comprise second
The mixed solvent of acyl acetone is used as solvent, just can prepare metal-sol under normal temperature and pressure conditions, and suitably
Solvent in dissolve metal precursor simply and can prepare metal-sol, thus preparation method is simple.And,
The tenor of scalable metal-sol in metal precursor solubility range, thus can not only prepare low dense
Degree metal-sol, also can prepare high concentration metal-sol, therefore, can not only form the metal deposit of densification,
Viscosity and the baking temperature of metal-sol can also be regulated.And, do not use strong acid or highly basic, because of without
Damage metal nanometer line.
And, the B used in the present invention) metal of metal nanometer line, though being not particularly limited, but preferably
Use I race of choosing free gold, silver, copper, aluminum, nickel, stannum, palladium, platinum, zinc, ferrum, indium, magnesium etc., II
More than one metal in the group of A race, III A race, IV A race and VIII B race metal composition, more manages
Think is to use more than one the metal in the group selecting free zinc, aluminum, stannum, copper, silver and gold composition.
And, the most a diameter of 20 to the 120nm of above-mentioned metal nanometer line and a length of 5 to 60 μm.
Above-mentioned metal nanometer line, preferably with metal precursor 1 weight portion that is contained in above-mentioned metal-sol as base
Standard comprises 0.25 to 4 part by weight of metal nano wire.If the metal nanometer line used is less than 0.25 weight portion,
The most above-mentioned metal nanometer line is difficult to form complete network and can not have electric conductivity, if above-mentioned content is more than 4
Weight portion, the most above-mentioned metal nanometer line forms transition fine and close network and substrate is obscured, and this causes visible ray
The reduction of absorbance, thus unsatisfactory.
Above-mentioned metal nanometer line, is preferably usually dispersed in dispersion liquid use, can make as above-mentioned dispersion liquid
With the solvent used when preparing above-mentioned metal-sol.As an example, by metal precursor and solvent mixing
When preparing metal-sol, a part for solvent is used as the disperse medium of metal nanometer line, and will be scattered in point
Disperse medium-metal nanometer line in dispersion media mixes with above-mentioned metal-sol, and finally can prepare transparent
Electrode formation conductive ink composition, in final transparency electrode formation conductive ink composition,
The content of each composition can regulate to above-mentioned described scope.
Transparency electrode formation conductive ink composition according to the present invention, except above-mentioned metal-sol, gold
Belong to beyond nano wire, the normally used additive in this area can be comprised as required.
Transparency electrode formation conductive ink composition according to the present invention, pH preferably ranges from 6 to 9.
In the case of pH is less than 6, metal nanometer line is likely the most oxidized because of acid environment, and,
Even if being likely in the case of pH is more than 9 to occur that metal nanometer line is oxidized, showing of disconnecting or dissolve
As.
And, the present invention provides: the manufacture method of conductive clear electrode, it is characterised in that by above-mentioned transparent
Electrode formation conductive ink composition is coated on matrix material and toasts；And, utilize above-mentioned side
Conductive clear electrode manufactured by method.
Transparency electrode formation conductive ink composition according to the present invention, it is possible to use led in this area
Various typographies such as intaglio offset (Gravure off-set) printing, the intaglio plate that often use are direct
(Gravure direct) printing, silk screen (Screen) are printed, spin coating (spin coating) is printed,
Slit coating (slit coating) printing, channel mould coating (slot die coating) printing or
Stamped method etc., and can be at commonly used transparency carrier such as glass substrate, polyimides (PI) base
Print on plate, polyethylene terephthalate (PET) substrate etc., and thickness is fitted preferably based on purposes
Local regulation.
Electrode manufactured as above, it is possible to toast according to normally used baking method in this area, on
State baking condition suitably to regulate according to the characteristic of substrate and compositions, and can be in the temperature less than 300 DEG C
Under toast, thus be applicable to include on the Organic substance matrix material of thin film, preferably at 80 DEG C to 250 DEG C
Under toast.
Above-mentioned transparency electrode according to the present invention can be effectively adapted to liquid crystal indicator, plasma display
Showing device, touch screen, el light emitting device, thin-film solar cells, DSSC, nothing
On the electrode of machine thing crystal silicon solar energy battery etc..
Hereinafter, in order to contribute to understanding that the present invention points out preferred embodiment, but following embodiment simply illustrates
The present invention, the scope of the present invention is not limited to following embodiment.
Embodiment 1 to 14: the preparation of transparency electrode conductive ink
According to composition described in table 1 below and content under normal temperature and pressure conditions hybrid metal precursor with molten
Agent and after preparing metal-sol, mixing nanowire dispersion and be prepared for transparency electrode conductive ink.
Now, the nano silver wire dispersion liquid that nano silver wire is scattered in isopropanol with 0.8 weight % concentration is used as gold
Belong to nanowire dispersion.
Table 1
In above-mentioned table 1, Zn AcAc represents that zinc acetylacetonate, Cu AcAc represent acetylacetone copper, Sn AcAc
Representing acetylacetone,2,4-pentanedione stannum, Al AcAc represents that aluminium acetylacetonate, Fe AcAc represent ferric acetyl acetonade, Zn Ac
Representing zinc acetate, Ag Ac represents that silver acetate, Ag AcAc represent acetylacetone,2,4-pentanedione silver, and IPA represents isopropanol.
Test example 1
Visible ray is determined for transparency electrode conductive ink prepared in above-described embodiment 1 to 14
Absorbance and electric conductivity, and implement environment resistant evaluation.
Specifically, after having cleaned glass substrate for foreign bodies such as organics removal, on the glass substrate
It is respectively coated the transparency electrode conductive ink of above-described embodiment 1 to 14.It is coated with complete, at 200 DEG C
Under carried out 10 minutes heat treatments.
Utilize the ultraviolet-visible spectrophotometer (Cary 4000 of Agilent (Agilent) company
UV-Visible Spectrophotometer) determine visible ray in the wavelength region of 400nm to 800nm
Absorbance, and utilize electric conductivity four point (4-point) analyzer to determine sheet resistance and determine conduction
Property, and determine humidity and be 85 DEG C and humidity is to evaluate the constant time of the sheet resistance under the conditions of 85%
Environment resistant.The results are shown in table 2 and Fig. 3.
Table 2
As shown in above-mentioned table 2 and Fig. 3, it is known that utilize and comprise metal nanometer line and metal-sol according to the present invention
Ink composite and the transparency electrode prepared, light transmission is the most excellent is more than 93%, sheet resistance
It is 500 Ω/below, thus electric conductivity is the most excellent.
And, metal-sol plays the protective layer effect of metal nanometer line, thus has excellent environment resistant,
It is therefore not necessary to other antioxidant or protective layer.
Industrial utilizability
The transparency electrode formation electric conductivity oil of above-mentioned metal-sol and metal nanometer line is comprised according to the present invention
Ink composition, forms conductive network with metal nanometer line, and makes up the broken string of network with metal-sol and fill out
Fill empty space, thus there is excellent electric conductivity and transmission of visible light.It is additionally, since metal-sol
Protective layer as the corrosion and oxidation that prevent metal nanometer line works, thus without other antioxidant
Or protective layer, and it is able to ensure that the environment resistant of manufactured transparency electrode.
Claims (11)
1. a transparency electrode formation conductive ink composition, it is characterised in that comprise:
A) metal-sol, it contains the metal precursor and b) 80 of a) 3 to 20 weight %
Solvent to 97 weight %；And,
B) metal nanometer line, it is relative to the metal precursor 1 being included in above-mentioned metal-sol
Weight portion is 0.25 to 4 weight portion.
Transparency electrode formation conductive ink composition the most according to claim 1,
It is characterized in that,
The metal of above-mentioned metal precursor is choosing freely I race, II A race, III A race, IV A race,
And VIII B race metal composition group in more than one metal.
Transparency electrode formation conductive ink composition the most according to claim 2,
It is characterized in that,
Above-mentioned metal is in the group selecting free zinc, aluminum, stannum, ferrum, copper and silver composition
Plant above metal.
Transparency electrode formation conductive ink composition the most according to claim 1,
It is characterized in that,
Above-mentioned metal precursor be select free nitrate, acetate, acetylacetonate, silicate,
Phosphate and their mixture composition group in more than one.
Transparency electrode formation conductive ink composition the most according to claim 4,
It is characterized in that,
Above-mentioned metal precursor is acetate, acetylacetonate or silicate.
Transparency electrode formation conductive ink composition the most according to claim 1,
It is characterized in that,
Above-mentioned solvent be select Free water, methanol, ethanol, propanol, isopropanol, isopropyl acetate,
Butanol, 2-butanol, capryl alcohol, 2-Ethylhexyl Alcohol, amylalcohol, benzylalcohol, hexanol, 2-hexanol, ring
Hexanol, terpineol, nonyl alcohol, methylene glycol, ethylene glycol, diethylene glycol, 2,2'-ethylenedioxybis(ethanol)., four sweet
Alcohol, glycol monoethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether,
Diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, triethylene glycol monomethyl ether, 2,2'-ethylenedioxybis(ethanol). list ether, three sweet
Alcohol monobutyl ether, 2-acetone, diacetyl, acetylacetone,2,4-pentanedione, 1,2-diacetyl ethane, carbonic acid two
Methyl ester, diethyl carbonate, propylene glycol methyl ether acetate, 2-methoxyethyl acetate, the third two
Alcohol monomethyl ether, METHYLPYRROLIDONE, N-methylacetamide and their mixture
More than one solvent in the group of composition.
Transparency electrode formation conductive ink composition the most according to claim 6,
It is characterized in that,
Above-mentioned solvent is the mixed solvent being mixed with two or more solvent, with main solvent 1 weight portion
On the basis of, it is mixed with the secondary solvent of 0.2 to 0.8 weight portion.
Transparency electrode formation conductive ink composition the most according to claim 1,
It is characterized in that,
PH is 6 to 9.
9. the manufacture method of a conductive clear electrode, it is characterised in that by claim
Transparency electrode formation conductive ink composition according to any one of 1 to 8 is at matrix material
Upper coating is also dried and toasts.
The manufacture method of conductive clear electrode the most according to claim 9, its feature
It is,
Above-mentioned baking is to carry out at 80 to 250 DEG C.
11. utilize a kind of conductive clear electricity that the manufacture method described in claim 9 manufactures
Pole.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020120023772A KR101991676B1 (en) | 2012-03-08 | 2012-03-08 | Conductive ink composition for forming transparent electrode |
| KR10-2012-0023772 | 2012-03-08 | ||
| PCT/KR2013/001848 WO2013133644A1 (en) | 2012-03-08 | 2013-03-07 | Conductive ink composition for forming transparent electrodes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104159985A CN104159985A (en) | 2014-11-19 |
| CN104159985B true CN104159985B (en) | 2016-11-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380013342.0A Expired - Fee Related CN104159985B (en) | 2012-03-08 | 2013-03-07 | Transparency electrode formation conductive ink composition |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR101991676B1 (en) |
| CN (1) | CN104159985B (en) |
| TW (1) | TWI607063B (en) |
| WO (1) | WO2013133644A1 (en) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9920207B2 (en) | 2012-06-22 | 2018-03-20 | C3Nano Inc. | Metal nanostructured networks and transparent conductive material |
| US10029916B2 (en) | 2012-06-22 | 2018-07-24 | C3Nano Inc. | Metal nanowire networks and transparent conductive material |
| US11274223B2 (en) | 2013-11-22 | 2022-03-15 | C3 Nano, Inc. | Transparent conductive coatings based on metal nanowires and polymer binders, solution processing thereof, and patterning approaches |
| KR102237001B1 (en) * | 2013-12-31 | 2021-04-07 | 삼성에스디아이 주식회사 | Metal ink for transparent electrodes and method of manufacturing the same |
| WO2015143383A1 (en) * | 2014-03-20 | 2015-09-24 | Cambrios Technologies Corporation | Improved light stability of nanowire-based transparent conductors |
| US11343911B1 (en) | 2014-04-11 | 2022-05-24 | C3 Nano, Inc. | Formable transparent conductive films with metal nanowires |
| CN103996456B (en) * | 2014-04-30 | 2017-11-14 | 天津宝兴威科技股份有限公司 | A kind of manufacture method of high abrasion nano metal nesa coating |
| US9183968B1 (en) | 2014-07-31 | 2015-11-10 | C3Nano Inc. | Metal nanowire inks for the formation of transparent conductive films with fused networks |
| KR102243747B1 (en) * | 2014-08-13 | 2021-04-23 | 주식회사 동진쎄미켐 | Manufacturing method of transparent electrod and transparent electrod laminate |
| WO2016165202A1 (en) * | 2015-04-17 | 2016-10-20 | 北京天恒盛通科技发展有限公司 | Bendable transparent conductive electrode and preparation method therefor |
| KR101583445B1 (en) * | 2015-05-07 | 2016-01-07 | 동의대학교 산학협력단 | Composition for conductive coating and conductive thin films using the same |
| CN106297966A (en) * | 2016-08-22 | 2017-01-04 | 广东纳路纳米科技有限公司 | Nesa coating that a kind of metal nanometer line oxidation-resistant material is compound and preparation thereof |
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| CN102015921A (en) * | 2008-02-26 | 2011-04-13 | 凯博瑞奥斯技术公司 | Method and composition for screen printing of conductive features |
| TW201200467A (en) * | 2010-02-24 | 2012-01-01 | Cambrios Technologies Corp | Nanowire-based transparent conductors and methods of patterning same |
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| CA2618794A1 (en) * | 2005-08-12 | 2007-02-22 | Cambrios Technologies Corporation | Nanowires-based transparent conductors |
| WO2008127313A2 (en) * | 2006-11-17 | 2008-10-23 | The Regents Of The University Of California | Electrically conducting and optically transparent nanowire networks |
| KR20090103250A (en) * | 2008-03-28 | 2009-10-01 | 전자부품연구원 | Ink composition for transparent electrode and method of manufacturing transparent electrode using the ink composition |
| US20100000762A1 (en) * | 2008-07-02 | 2010-01-07 | Applied Nanotech Holdings, Inc. | Metallic pastes and inks |
| JP2010165900A (en) * | 2009-01-16 | 2010-07-29 | Dic Corp | Method of manufacturing transparent electrode, transparent electrode, and conductive ink and liquid-repellent transparent insulating ink used therefor |
| KR101207363B1 (en) * | 2009-03-04 | 2012-12-04 | 엘에스전선 주식회사 | Composition for Conductive Paste Containing Nanometer-Thick Metal Microplates |
| KR101795419B1 (en) * | 2011-01-26 | 2017-11-13 | 주식회사 잉크테크 | Method for manufacturing transparent conductive layer and transparent conductive layer manufactured by the method |
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2012
- 2012-03-08 KR KR1020120023772A patent/KR101991676B1/en active IP Right Grant
-
2013
- 2013-03-07 TW TW102108016A patent/TWI607063B/en not_active IP Right Cessation
- 2013-03-07 CN CN201380013342.0A patent/CN104159985B/en not_active Expired - Fee Related
- 2013-03-07 WO PCT/KR2013/001848 patent/WO2013133644A1/en active Application Filing
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102015921A (en) * | 2008-02-26 | 2011-04-13 | 凯博瑞奥斯技术公司 | Method and composition for screen printing of conductive features |
| TW201200467A (en) * | 2010-02-24 | 2012-01-01 | Cambrios Technologies Corp | Nanowire-based transparent conductors and methods of patterning same |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101991676B1 (en) | 2019-06-21 |
| KR20130102723A (en) | 2013-09-23 |
| TW201343808A (en) | 2013-11-01 |
| WO2013133644A1 (en) | 2013-09-12 |
| CN104159985A (en) | 2014-11-19 |
| TWI607063B (en) | 2017-12-01 |
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