CN104093524A - Method for producing glass product and method for producing magnetic disk - Google Patents
Method for producing glass product and method for producing magnetic disk Download PDFInfo
- Publication number
- CN104093524A CN104093524A CN201380008201.XA CN201380008201A CN104093524A CN 104093524 A CN104093524 A CN 104093524A CN 201380008201 A CN201380008201 A CN 201380008201A CN 104093524 A CN104093524 A CN 104093524A
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- Prior art keywords
- glass
- manufacture method
- grinding agent
- glassware
- cerium base
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Life Sciences & Earth Sciences (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
Abstract
The present invention provides a method for producing a glass product, which produces a glass product through a polishing step wherein glass is polished using a cerium-based polishing agent and a cleaning step wherein the glass is cleaned with use of a heated cleaning liquid that contains sulfuric acid and hydrogen peroxide water, and which is capable of preventing surface roughening of the glass. The present invention relates to a method for producing a glass product, which comprises a polishing step wherein glass is polished using a cerium-based polishing agent and a cleaning step wherein the glass is cleaned with use of a heated cleaning liquid that contains sulfuric acid and hydrogen peroxide water after the polishing step, and wherein the cerium-based polishing agent does not contain LaOF crystals.
Description
Technical field
The present invention relates to the manufacture method of glassware.
Background technology
Require in the manufacture method of glassware of high-precision flatness at glass substrate for disc or photomask base plate etc., the removing of foreign matter remaining on glassware becomes important technical problem.As the foreign matter remaining on glassware, known due to reasons such as grinding rate height, to be suitable for the cerium base grinding agent (grinding agent taking the rare-earth oxide that contains cerium oxide as main component) of glass grinding easily residual with the form of foreign matter.
For example, in the manufacturing process of glass substrate for disc, the first type surface of the slurry that use contains cerium base grinding agent to the glass plectane cutting from glass plate and end face grind, utilize the slurry that contains colloidal silica abrasive particle to carry out smooth grinding (finally grinding) in order further to make major surface flat.Now, even if remain cerium base grinding agent on first type surface, also can remove by smooth grinding.But think that the cerium base grinding agent that is attached to end face is not removed and residual, in the matting after smooth grinding, can adhere again on first type surface, thereby remain on glass substrate for disc with the form of foreign matter.
In addition, for photomask base plate, also there is the problem same with glass substrate for disc.For photomask base plate, as grinding step, in most cases also use the slurry that contains cerium base grinding agent to grind, then, use colloidal silica to grind in order to make the further planarization of first type surface.In the situation that cerium base grinding agent is attached to end face, likely adhere again on surface.The in the situation that of photomask base plate, require that short wavelength's ultraviolet ray is had to high-transmission rate, mostly can become problem because being attached to the scattering that lip-deep foreign matter causes.
Based on such background, be desirably in the stage that uses the grinding of cerium base grinding agent all to finish cerium base grinding agent is removed completely.
In order to tackle such requirement, the cleaning fluid (for example, referring to Patent Document 1 and 2) that contains inorganic acid and ascorbic acid is proposed.This cleaning fluid is removed the fusing of cerium base grinding agent by the effect of inorganic acid and ascorbic acid.
In addition, also proposed to use the scheme (for example referring to Patent Document 3) of the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating in the cleaning of final operation.
Prior art document
Patent documentation
Patent documentation 1: TOHKEMY 2006-99847 communique (claims)
Patent documentation 2: TOHKEMY 2004-59419 communique (claims)
Patent documentation 3: TOHKEMY 2008-90898 communique (claims)
Summary of the invention
Invent problem to be solved
But, the inventor verifies above-mentioned cleaning technique, and results verification, in the cleaning that the cleaning fluid that contains ascorbic acid and inorganic acid in utilization carries out, although can reduce the cerium base grinding agent of the end that remains in glass plectane, sometimes can not remove completely.Also confirm in addition, the pH of this cleaning fluid is low to moderate 1～2, therefore, in the time being applied to the glass plectane that comprises alkaline alumina silicate glass, causes sometimes serious rough surface.
Confirm on the other hand, in cleaning after final grinding step, use the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating, can almost entirely remove the cerium base grinding agent of the end that remains in glass substrate, but the chip of glass can be attached on glass surface, if this attachment is removed, produce depression and cause serious rough surface at glass surface sometimes.
The present invention completes in view of the above problems, its object is to provide a kind of manufacture method of glassware, its matting that is the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after grinding step and the utilization heating through glass being ground with cerium base grinding agent cleans glass is manufactured the method for glassware, and the method can prevent the rough surface of glass.
For the means of dealing with problems
The inventor finds, in the grinding step of glass, use the not cerium base grinding agent containing LaOF crystal to grind glass, utilize afterwards the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean glass, can suppress thus the rough surface of glass as above, thereby complete the present invention.
, the present invention is as described below.
1. a manufacture method for glassware, comprises the grinding step that use cerium base grinding agent grinds glass and the matting that uses the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean glass afterwards, in described manufacture method,
This cerium base grinding agent is the cerium base grinding agent that does not contain LaOF crystal.
2. the manufacture method of the glassware as described in above-mentioned the 1st, wherein, above-mentioned cerium grinding agent contains lanthanum.
3. the manufacture method of the glassware as described in above-mentioned the 2nd, wherein, above-mentioned cerium base grinding agent is with La
2o
3the lanthanum that meter contains 20～40 quality %.
4. the manufacture method of the glassware as described in any one in above-mentioned 1st～3, wherein, above-mentioned cerium base grinding agent contains fluorine.
5. the manufacture method of the glassware as described in above-mentioned the 4th, wherein, the content of the fluorine in above-mentioned cerium base grinding agent is greater than 1 quality %.
6. the manufacture method of the glassware as described in any one in above-mentioned 1st～5, wherein, the Ce that above-mentioned cerium base grinding agent contains fluorite type structure
xla
1-xo
yf
2-y(x is more than 0.5 and is less than 1, y is 1.7～2).
7. the manufacture method of the glassware as described in any one in above-mentioned 1st～6, wherein, the average grain diameter of above-mentioned cerium base grinding agent is below 0.5 μ m.
8. the manufacture method of the glassware as described in any one in above-mentioned 1st～7, wherein, the content of the sulfuric acid in above-mentioned cleaning fluid is 55～80 quality %, and the content of hydrogen peroxide is 1～10 quality %, and the temperature of above-mentioned cleaning fluid is 70～100 DEG C.
9. the manufacture method of the glassware as described in any one in above-mentioned 1st～8, wherein, comprising: the smooth grinding operation that uses the slurry that contains colloidal silica abrasive particle to grind glass after above-mentioned matting.
10. the manufacture method of the glassware as described in above-mentioned the 9th, wherein, the average grain diameter of colloidal silica abrasive particle is 10～50nm.
The manufacture method of 11. glasswares as described in above-mentioned the 9th or the 10th, wherein, the pH of the above-mentioned slurry that contains colloidal silica abrasive particle is 1～6.
The manufacture method of 12. glasswares as described in any one in above-mentioned 1st～11, wherein, glassware is glass substrate.
The manufacture method of 13. glasswares as described in above-mentioned the 12nd, wherein, glass substrate is glass substrate for information recording medium.
The manufacture method of 14. 1 kinds of disks, is characterized in that, manufactures glass substrate for disc, and form magnetic recording layer by the manufacture method of the glassware described in any one in above-mentioned 1st～13 on the first type surface of this glass substrate for disc.
Invention effect
According to the manufacture method of glassware of the present invention, after utilization is not ground glass containing the cerium base grinding agent of LaOF crystal, use the cleaning agent that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean glass, can effectively suppress thus cerium base grinding agent on glass adhering to, and can prevent the rough surface of glass, thereby obtain the good glassware of flatness.
In addition, in the manufacture method of glassware in the past, after the operation that uses cerium base grinding agent to grind glass, by the prerinse operation of utilizing pure water etc., cerium base grinding agent is removed from glass, then, use the cleaning agent that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean glass.
At this, according to the manufacture method of glassware of the present invention, after the grinding step that uses cerium base grinding agent to grind glass, without the prerinse operation of utilizing pure water etc., and then this grinding step uses the cleaning agent that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean glass, also can prevent the rough surface of glass in this case and obtain flatness, be also good from the viewpoint of production efficiency.
In addition, according to the manufacture method of glassware of the present invention, the rough surface of the first type surface that the damage not having or almost do not cause because of acid causes, flatness is also good, can obtain fully tackling the glass substrate for disc of desired high recording capacity from now on.
Brief description of the drawings
Fig. 1 represents the crystalline phase of the cerium base grinding agent obtaining by X-ray diffraction method analysis.
Fig. 2 (a) utilizes the cleaning agent that contains sulfuric acid and aqueous hydrogen peroxide solution after heating glass to be cleaned and the figure that describes in the shaggy mechanism of generation on glass after the cerium base grinding agent by containing LaOF crystal in use is ground glass.
Fig. 2 (b) is to utilizing the cleaning agent that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean and make glass not produce the figure that shaggy situation describes glass after glass not being ground containing the cerium base grinding agent of LaOF crystal in use.
The crystalline phase of the cerium base grinding agent using in the embodiment 1 that Fig. 3 represents to obtain by X-ray diffraction method analysis.
The crystalline phase of the cerium base grinding agent using in the embodiment 2 that Fig. 4 represents to obtain by X-ray diffraction method analysis.
The crystalline phase of the cerium base grinding agent using in the embodiment 3 that Fig. 5 represents to obtain by X-ray diffraction method analysis.
The crystalline phase of the cerium base grinding agent using in the comparative example 1 that Fig. 6 represents to obtain by X-ray diffraction method analysis.
The crystalline phase of the cerium base grinding agent using in the comparative example 2 that Fig. 7 represents to obtain by X-ray diffraction method analysis.
The crystalline phase of the cerium base grinding agent using in the comparative example 3 that Fig. 8 represents to obtain by X-ray diffraction method analysis.
Fig. 9 represents to utilize White Light Interferometer to observe and the shaggy figure (embodiment 1～3, comparative example 1～3) of the glass substrate that obtains.
Detailed description of the invention
The inventor makes glass produce serious shaggy phenomenon to investigate when using the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating in the cleaning after the final grinding step of glass, found that, if carry out this cleaning be attached with cerium base grinding agent on glass surface time, result can produce local rough surface on glass surface.Herein, use the cleaning of the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to refer to that utilization is heated to the cleaning that 45 DEG C of above cleaning fluids that contain sulfuric acid and aqueous hydrogen peroxide solution carry out, its temperature is generally more than 60 DEG C, typically is more than 70 DEG C.
In order to study above-mentioned shaggy reason, in various cerium base grinding agents, flood after glass, it is dried and does not wash, utilize the attachment of the cleaning fluid effects on surface that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean, then, the Optiflat that uses ADE Co. to manufacture, by the depression defect of method of optically measuring sight glass.For the cerium base grinding agent that produces depression defect, by X-ray diffraction method, crystalline phase to be investigated, result, as shown in Figure 1, for observing the cerium base grinding agent of depression defect, confirms the crystal (Ce of fluorite type structure
xla
1-xo
yf
2-y) (x is more than 0.5 and is less than 1, y is 1.7～2) crystal peak and the crystal peak of the oxyfluoride (LaOF) of lanthanum, on the other hand, for not observing the cerium base grinding agent of depression defect, the crystal peak to oxyfluoride unconfirmed and only confirm the crystal peak of the crystal of fluorite type structure.
Hence one can see that, and the LaOF crystal containing in cerium oxide base grinding agent becomes the reason of depression defect.Expected by this result, by use the not cerium oxide base grinding agent containing LaOF crystal in the grinding of glass, even if utilize afterwards the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean glass, also can suppress the generation of depression defect, thereby complete the present invention.That is, found out following design: if used not containing the cerium oxide base grinding agent of La or F, can not produce depression defect, in addition, even if contain La or F in cerium oxide abrasive, but if for example by CeO
2a part of Ce for La displacement cerium oxide base grinding agent, by CeO
2o a part with the cerium oxide abrasive of F displacement or La and F respectively with the part displacement of Ce and O after cerium oxide base grinding agent, can not produce depression defect yet.
Thinking that the oxyfluoride (LaOF) of the lanthanum that contains in cerium base grinding agent becomes with mechanism as described below makes glass produce shaggy reason.As shown in Fig. 2 (a), LaOF is dissolved in the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating, the H in the fluorine ion (F-) containing in LaOF and cleaning fluid
+or H
2o reacts and plays a role with the form of hydrogen fluoride (HF), as shown in following formula (1), glass etched and produce H
2siF
6.
SiO
2+6HF→H
2SiF
6 (1)
H
2siF
6in water, be solubility, but in the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating, amount of moisture is few, therefore, by following formula (2) and a small amount of H
2o reacts and forms H
2siO
3.H
2siO
3in acid cleaning fluid, be insoluble, therefore, on glass surface, become gelatinous attachment, by scouring or smooth grinding etc. after utilizing, glass is ground, will be attached to H on glass
2siO
3remove, meanwhile, glass produces depression, thereby produces the rough surface of glass.
H
2SiF
6+H
2O→H
2SiO
3+6HF (2)
On the other hand, as shown in Fig. 2 (b), in the situation that cerium base grinding agent does not contain LaOF, can not produce fluorine ion, therefore, even the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after utilization heating after using cerium base grinding agent to grind glass cleans glass, glass can be not etched yet, is difficult for producing the rough surface of glass.
(glass)
Glassware in the present invention is not particularly limited, typically is the glass substrate such as glass substrate for disc or photomask base plate.Below, describe as an example of glass substrate for disc example, but the invention is not restricted to this example.
In the time manufacturing glass substrate for disc, from for example comprising the SiO that contains in mol% 55～75%
2, 5～17% Al
2o
3, 4～27% Li
2o+Na
2o+K
2on the glass plate that adds up to more than 90% glass of the content of O, 0～20% MgO+CaO+SrO+BaO and these compositions, cut glass plectane.
In above-mentioned glass, SiO
2for forming the composition of glass skeleton, be essential.By making SiO
2content be more than 55%, prevent proportion increase and be difficult for making glass produce scar, prevent devitrification temperature rise and make stabilization, or make acid resistance improve.SiO
2content be preferably more than 60%, more preferably more than 61%, be particularly preferably more than 62%, most preferably be more than 63%, typically be more than 64%.In addition, by making SiO
2content be below 75%, prevent that Young's modulus from reducing, improve than elastic modelling quantity, prevent that thermal coefficient of expansion from reducing, or viscosity can be not too high and glass is easily melted.SiO
2content be preferably below 71%, more preferably, below 70%, most preferably be below 68%.In addition, by making SiO
2content be more than 63 % by mole, acid resistance be difficult for reduce.
Al
2o
3be form glass skeleton, improve Young's modulus, than the composition of elastic modelling quantity, fracture toughness, be essential.By making Al
2o
3content be more than 5%, can prevent Young's modulus, reduce than elastic modelling quantity or fracture toughness.Al
2o
3content be preferably more than 6%, more preferably more than 7%, typically be more than 8%.In addition, by making Al
2o
3content be below 17%, prevent that thermal coefficient of expansion from reducing, viscosity can be not too high and glass is easily melted, or prevent that acid resistance from reducing.Al
2o
3content be preferably below 15%, more preferably below 14%.For acid resistance, by making Al
2o
3content be below 12.5%, acid resistance be difficult for reduce.
As mentioned above, SiO
2many, Al
2o
3the acid resistance of few glass is difficult for reducing.Therefore, if (SiO
2-Al
2o
3) increase, the acid resistance of glass improves.On the other hand, Al
2o
3multipair in improving Young's modulus, being effectively than the mechanical property such as elastic modelling quantity or fracture toughness, but there is the tendency that acid resistance is low in the good glass of mechanical property.Typically, (SiO
2-Al
2o
3) be 48～62%.
Li
2o, Na
2o and K
2o is the melting of improving glass, the composition that improves thermal coefficient of expansion, must contain any one above composition.By making the total R of content of these three kinds of compositions
2o is more than 4%, and this effect increases.The total R of the content of three kinds of compositions
2o is preferably more than 13%, more preferably more than 15%, is particularly preferably more than 16%, most preferably is more than 17%, typically is more than 18%.In addition, by making the total R of content of three kinds of compositions
2o is below 27%, Young's modulus, improves than elastic modelling quantity or fracture toughness, or by making alkali be difficult for stripping with reacting of moisture, therefore preferred.The total R of the content of three kinds of compositions
2o is preferably below 25%, more preferably, below 24%, is particularly preferably below 22%.R
2o typically is 16～24%.
In addition, in above-mentioned alkali metal oxide, Li
2o improves Young's modulus, higher than the effect of elastic modelling quantity, fracture toughness, therefore, preferably contains more than 5%.More preferably more than 7%, most preferably be more than 8%.
MgO, CaO, SrO and BaO are all optional, but are the melting of improving glass, the composition that improves thermal coefficient of expansion, can contain taking the total R ' O of the content of these four kinds of compositions as the scope below 20% this four kinds of compositions.Total R ' the O of the content by making these four kinds of compositions is below 20%, prevents that proportion from increasing, or is difficult for making glass to produce scar.Total R ' the O of these four kinds of component contents is preferably below 10%, more preferably, below 8%, most preferably is below 6%, typically is below 4%.
In addition, in order to improve Young's modulus, than mechanical properties such as elastic modelling quantity, proportion, thermal coefficient of expansion, traumatic resistance, fracture toughnesses, preferably make SiO
2+ Al
2o
3+ R
2o+R ' O is more than 90%.By making SiO
2+ Al
2o
3+ R
2o+R ' O is more than 90%, and this effect increases.SiO
2+ Al
2o
3+ R
2o+R ' O is preferably more than 93%, more preferably more than 95%, most preferably is more than 97%.
This illustrative glass is made up of mentioned component in essence, but also can contain other composition in the scope of not damaging the object of the invention.
For example, as other composition, TiO
2, ZrO
2, Y
2o
3, Nb
2o
5, Ta
2o
5and La
2o
3have improve Young's modulus, than the effect of elastic modelling quantity or fracture toughness.Contain any one in them when above, the content of total is preferably below 7%.By being set as below 7%, prevent that proportion from increasing, or be difficult for making glass to produce scar.The total content of these compositions is more preferably less than 5%, is particularly preferably less than 4%, is most preferably less than 3%.
B
2o
3have improve glass melting, reduce proportion and be difficult for making glass to produce the effect of scar.Contain B
2o
3time, be preferably below 3%.By being set as below 3%, can prevent Young's modulus or reduce than elastic modelling quantity, or can prevent from reducing because volatilization makes glass quality.B
2o
3content more preferably below 2%, be particularly preferably below 1%, most preferably be below 0.5%.
SO
3, Cl, As
2o
3, Sb
2o
3, SnO
2and CeO
2there is the effect that makes glass clarifying.While containing any one in them, preferably add up to below 2%.
In addition, in the time manufacturing photomask base plate, typically, use synthetic quartz glass.Synthetic quartz glass is called as the porous plastid that comprises silica of cigarette ash (ス ー ト) and carries out the glass that in fact only comprises silica that sintering obtains for for example making silicon source react in gas phase with oxygen source to grow.Below, again describe as an example of glass substrate for disc example.
The proportion of glass plate is preferably below 2.60.Be below 2.60 by making the proportion of glass plate, suppress power consumption thereby apply induction-motor load can prevent disc driver rotation time, or can make driver spin stabilization.The proportion of glass is preferably below 2.55, more preferably, below 2.53, most preferably is below 2.52.
In addition, the thermal coefficient of expansion (average coefficient of linear expansion) in the scope of-50～+ 70 of glass plate DEG C is preferably 60 × 10
-7/ DEG C more than.By being set as 60 × 10
-7/ DEG C more than, the difference of the thermal coefficient of expansion of other members such as glass plate and metal driver processed diminishes, and is difficult for producing stress during because of temperature change and causes substrate breakage etc.Thermal coefficient of expansion (average coefficient of linear expansion) in the scope of-50～+ 70 DEG C of glass plate is preferably 62 × 10
-7/ DEG C more than, more preferably 65 × 10
-7/ DEG C more than, most preferably be 70 × 10
-7/ DEG C more than.
In addition, the Young's modulus of preferred glass plate is more than 80GPa, is more than 32MNm/kg than elastic modelling quantity.Young's modulus is that 80GPa is above or be 32MNm/kg when above than elastic modelling quantity, in driver rotation, is difficult for generation warpage or deflection, easily obtains the information recording carrier of high record density.More preferably the Young's modulus of glass plate is more than 81GPa and is more than 32.5MNm/kg than elastic modelling quantity.
The glass plate that comprises above-mentioned illustrative glass easily becomes Young's modulus, than the glass plate of each characteristic goods such as elastic modelling quantity, proportion, thermal coefficient of expansion, traumatic resistance or fracture toughness.
In addition, the manufacture method of glass plate is not particularly limited, can variety of methods.For example, the raw material of normally used each composition is allocated in the mode that reaches target composition, by its heating and melting in glass melter.By bubbling, stirring or interpolation fining agent etc., glass is homogenized, be configured as the glass sheet of specific thickness by methods such as known float glass process, pressurization, fusion method or glass tube down-drawings, after annealing, grind as required cut, the processing such as grinding, then make the glass substrate of given size and shape.As manufacturing process, be particularly preferably suitable for mass-produced float glass process.In addition, be also preferably float glass process progressive forming method in addition, for example fusion method or glass tube down-drawing.
Then, open circular hole in the central authorities of glass plectane, carry out successively chamfering, first type surface grinding and end face mirror ultrafinish.In addition, first type surface grinding process is divided into thick grinding process and fine ginding operation, shape manufacturing procedure (perforate, chamfering, the end surface grindings of circular glass plate central authorities) can be set between these two operations.
In addition; in end face mirror ultrafinish; can be by stacked glass plectane; internal all end faces use the brush grinding of cerium base grinding agent; and carry out etch processes; also can replace the brush grinding of interior all end faces, on the interior all end faces after this etch processes, for example contain the liquid of polysilazane compounds by coatings such as spraying processes, and calcine and form overlay film (protection overlay film) at interior all end face.First type surface grinding is carried out with alumina abrasive grain or aluminum oxide abrasive particle that average grain diameter is 6～8 μ m conventionally.First type surface after grinding is preferably polished 30～40 μ m conventionally.
In these processing, in the situation that being manufactured on central authorities and not having round-meshed glass substrate, certainly do not need the perforate of glass plectane central authorities and the mirror ultrafinish of interior all end faces.
(grinding step)
The manufacture method of glassware of the present invention comprises the grinding step that uses cerium base grinding agent to grind the first type surface of glass plectane.This cerium base grinding agent is the grinding agent that does not contain LaOF crystal.In addition, this cerium base grinding agent can be also the grinding agent not containing the crystal after a part of the La of LaOF crystal Ce displacement.
For the cerium base grinding agent using in manufacture method of the present invention, in the time that it contains La, preferably contain the Ce of fluorite type structure
xla
1-xo
yf
2-y.Herein, typically, x is more than 0.5 and is less than 1, y is 1.7～2.In addition, in the time that cerium base grinding agent contains fluorine, y is less than 2.
After the cerium base grinding agent that contains La and F in use with the form of the crystal of fluorite type structure instead of contain La and F with oxyfluoride (LaOF crystal) form grinds glass, can use the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating fully to clean glass.
From the viewpoint grade reducing costs, the cerium base grinding agent using in cerium base grinding agent, the especially glass substrate for disc using in glass grinding or the manufacture of photomask glass substrate contains the Ce of fluorite type structure conventionally
xla
1-xo
yf
2-y(x is more than 0.5 and is less than 1, y is 1.7～2) and LaOF crystal.But, in the manufacture method of the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after use heating, LaOF is dissolved in the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating, the fluorine containing in LaOF crystal plays a role with the form of hydrofluoric acid, thereby makes the etched generation of glass rough surface.Therefore, in the present invention, use the not cerium base grinding agent containing LaOF crystal.
The cerium base grinding agent using in the present invention can be dispersed in the decentralized media such as water and use with the form of slurry.More than the content of the cerium base grinding agent in slurry is preferably 1 quality % and below 20 quality %, more preferably more than 3 quality % and below 15 quality %.
Be more than 1 quality % by making the content of the cerium base grinding agent in slurry, can obtain sufficient grinding rate.In addition, by being set as below 20 quality %, the impact that can suppress because being blended into the glass ingredient in slurry in grinding is risen slurry viscosity, thereby improves grinding rate.
As can, for the decentralized medium of slurry, enumerating for example water.
In slurry, can contain surfactant as dispersant or lubricant.As the surfactant as dispersant, can enumerate such as anionic surfactant, cationic surface active agent, nonionic surface active agent and zwitterionic surfactant etc. or their combination.
In addition, can enumerate the salt of the monomers such as sulfonate such as the carboxylate such as salt, natrium citricum and sodium lignin sulfonate and sodium naphthalene sulfonate of the such as phosphoric acid such as diphosphate sodium and Alendronate class or their combination.
The content of the dispersant in cerium base grinding agent is preferably 0.5～2 quality % with respect to abrasive particle.In addition, as the surfactant as lubricant, can enumerate for example bulb-less surface activity agent taking aklylene glycol as representative.The content of the surfactant in cerium base grinding agent is preferably 0.01～1 quality %.
If consider, the scavenging period of the glass in the manufacturing process of glassware is generally 5～20 minutes, and it is above and below 0.5 μ m that the average grain diameter of cerium base grinding agent is preferably 0.1 μ m.The average grain diameter of cerium base grinding agent is used laser light scattering to measure.When this mensuration, in order to measure with the state of the slurry that fully disperses, preferably to mix any one in the above-mentioned dispersant of approximately 1 quality % with respect to grinding agent and measure.
Be more than 0.1 μ m by making the average grain diameter of cerium base grinding agent, can obtain sufficient grinding rate.In addition, be below 0.5 μ m by making the average grain diameter of cerium base grinding agent, little with the area of glass contact, top layer is only slightly dissolved and just can easily be peeled off from glass, and therefore, the stripping quantity of cerium base grinding agent in cleaning fluid becomes fully, can improve cleaning.
Even if the cerium base grinding agent using in the present invention contains fluorine, also can be due to not containing LaOF crystal and using the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating while cleaning, the fluorine containing in LaOF crystal can not play a role with the form of hydrofluoric acid, can prevent glass etched and produce rough surface.
Even in the situation that the cerium base grinding agent using in the present invention contains fluorine, the content of fluorine is also preferably below 4 quality %, more preferably, below 3 quality %, is particularly preferably below 0.1 quality %.In addition, from the viewpoint of following effect, the content of fluorine is preferably greater than 1 quality %.Think at fluorine and CeO
2when displacement occurs the surperficial oxygen of crystal, there is the effect of the valence mumber that reduces cerium, there is the effect that improves chemical grinding power.But, only by displacement CeO
2surperficial a part of oxygen of crystal just can obtain such effect, thereby the content of the fluorine in cerium base grinding agent is preferably below 4 quality %.In addition, by making the content of the fluorine in cerium base grinding agent be greater than 1 quality %, the valence mumber of the cerium on abrasive particle surface is easily the state of 3 valencys, and the Si-O key of glass surface is weakened and is easy to grind.
As the cerium base grinding agent using in the present invention, can enumerate the cerium base grinding agent that contains lanthanum.The lanthanum containing in cerium base grinding agent is preferably Ce
xla
1-Xo
yf
2-Y(x is more than 0.5 and is less than 1, y is 1.7～2).Cerium base grinding agent is preferably with La
2o
3the lanthanum that meter contains 20～40 quality %, more preferably with La
2o
3the lanthanum that meter contains 30～40 quality %.By making the La in cerium base grinding agent
2o
3content be this scope, can obtain high grinding rate.
Ginding process in the present invention is not particularly limited, for example, preferably make glass contact with abrasive cloth, in supplying with cerium base grinding agent, abrasive cloth and glass is relatively moved, and glass grinding is become to mirror-like.As abrasive cloth, can use for example polyurethane grinding pad processed.
In grinding step, particularly, for example, preferably for example, so that use the fluctuating (Wa) measured under the condition that three-dimensional surface structural analysis device [Opti-flat (trade name) that ADE Co. manufactures] is λ≤5mm in wavelength region to grind for the mode below 1nm.The reduction (amount of grinding) of the thickness of slab producing by grinding in addition, is typically preferably 5～15 μ m.
Grinding step can once grind, and also can use the cerium base grinding agent that average grain diameter is different to implement more than twice.It should be noted that, carrying out twice above in the situation that, except final cerium grinds, cerium base grinding agent can be the known cerium base grinding agent that contains LaOF crystal.
In addition, grinding step in the present invention comprises removing the cerium oxide first type surface grinding step that the scar that produces in grinding process is object, but be not limited to this, if utilize cerium oxide to carry out end face mirror ultrafinish, also comprise this end face mirror ultrafinish after grinding process.
(prerinse)
Can carry out prerinse to the glass plectane after grinding.In prerinse, for example, utilize successively the dipping of pure water to clean, utilize alkaline cleaner Ultrasonic Cleaning, utilize the flushing of pure water.Clean or utilize in the flushing of pure water at the dipping that utilizes pure water, can be used together Ultrasonic Cleaning or use flowing water or shower water.
In addition, according to the present invention, by using the not cerium base grinding agent containing LaOF crystal, utilize in the case of the glass plectane after grinding not being carried out to prerinse the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating cleans, also can suppress depression defect and produce, can obtain the glassware that rough surface is reduced.
(drying process)
Can be dried the glass plectane after grinding.Be dried and undertaken by for example Rotary drying.
(matting)
The manufacture method of glassware of the present invention comprises that to clean the operation of the cerium base grinding agent that is attached to glass with the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating (following, by this cleaning also referred to as the cleaning in the present invention, by this cleaning fluid also referred to as the cleaning fluid using in the present invention).
The content of the sulfuric acid in the cleaning fluid using in the present invention is preferably 55～80 quality %, more preferably more than 60 quality %, more preferably more than 65 quality %.Be more than 55 quality % by making the content of sulfuric acid, the cerium base grinding agent that can prevent from being attached to glass plectane is not dissolved and residual.In addition, be below 80 quality % by making the content of sulfuric acid, can prevent from, because leaching causes rough surface, easily obtaining target flatness, can prevent that in cleaning device, widely used resin fixture is oxidized, decomposes.
The content of the hydrogen peroxide in the cleaning fluid using in the present invention is preferably 1～10 quality %, more preferably more than 2 quality %, more preferably more than 4 quality %.Be more than 1 quality % by making the content of hydrogen peroxide, the cerium base grinding agent that can prevent from being attached to glass plectane is not dissolved and residual.In addition, be below 10 quality % by making the content of hydrogen peroxide, can prevent from, because leaching causes rough surface, easily obtaining target flatness, can prevent that in cleaning device, widely used resin fixture is oxidized, decomposes.
The temperature of the cleaning fluid using in the present invention is preferably 70～100 DEG C.In addition, more preferably 75 DEG C～90 DEG C.Be more than 70 DEG C by making the temperature of cleaning fluid, cerium base grinding agent is difficult for remaining on glass.In addition, be below 100 DEG C by making the temperature of cleaning fluid, can suppress the decomposition of hydrogen peroxide, prevent that cleaning fluid composition from changing.
Other composition in the cleaning fluid using in the present invention is preferably water conventionally.That is, the cleaning fluid using in the present invention is preferably the aqueous solution conventionally, even in this case, also can contain water composition in addition in the scope of not damaging the object of the invention.As water, can enumerate such as deionized water, ultra-pure water, charge ion water, hydrogen water and Ozone Water etc.
In addition, in the present invention, the time of matting is typically preferably more than 5 minutes or 5 minutes, is generally 30 minutes when following, can reach cleaning object.
For the capillary object that reduces liquid, in the cleaning fluid using in the present invention, can contain surfactant.As surfactant, can enumerate the sulfonic acid such as carboxylate and alkylsulfonate such as such as polyacrylate, poly salt and poly-itaconate etc.The content of the surfactant in cleaning fluid is not particularly limited, and is preferably below 1 quality %.
In matting, preferably make above-mentioned cleaning fluid and glass directly contact to clean.As the method that cleaning fluid is directly contacted with glass, for example can enumerate: in rinse bath, be full of cleaning fluid and by glass put into that impregnated wherein cleans, the scouring of the sponge of method from from nozzle to glass jet cleaning liquid and the polyvinyl alcohol system of use etc.
The cleaning fluid using in the present invention is suitable for any one method in said method, but from carrying out the viewpoint of more effective cleaning, preferably impregnated cleans.The in the situation that of impregnated, the time of flooding glass in cleaning fluid is preferably more than 2 minutes.In addition, more preferably in contact and use Ultrasonic Cleaning.
(smooth grinding operation)
In smooth grinding operation, conventionally use the slurry that contains colloidal silica abrasive particle finally to grind.In smooth grinding operation, conventionally use that to contain average grain diameter be that the slurry of the colloidal silica abrasive particle of 10～50nm grinds, contain the slurry that average grain diameter is greater than 50nm and the colloidal silica abrasive particle below 100nm and carry out pre-grinding but also can use before this.Before or after the grinding of the slurry that in addition, can contain colloidal silica abrasive particle in utilization, carry out chemical enhanced.
In the grinding of the slurry that contains colloidal silica abrasive particle in utilization, for the colloidal silica taking waterglass as raw material, in general, easily in neutral range, carry out gelation, therefore, preferably under pH is 1～6 or 2～6 condition, grind.
As pH adjusting agent, acid, can be used inorganic acid or organic acid if.As inorganic acid, can enumerate such as hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, polyphosphoric acids and sulfamic acid etc.In addition, as organic acid, can enumerate such as carboxylic acid, organic phosphoric acid, amino acid etc.As carboxylic acid, can enumerate the tricarboxylic acids such as dicarboxylic acids and citric acid such as monocarboxylic acid, oxalic acid and tartaric acid such as such as acetic acid, glycolic and ascorbic acid.
Particularly preferably making pH is 1～3, now preferably uses inorganic acid.In addition, be greater than at 3 o'clock at pH, if use carboxylic acid, can suppress the gelation of colloidal silica abrasive particle, therefore preferred.And then, also can in slurry, add anion surfactant or non-ionic surface active agent.
Milling tool is preferably chamois leather pad.This chamois leather pad preferably has foamed resin layer, and its Xiao A hardness is that 20 ° above and below 60 °, density is 0.2～0.8g/cm
3.
By smooth grinding operation, preferably to make it have, the r.m.s. roughness (Rms) of first type surface is preferably below 0.15nm, more preferably the mode of the flatness below 0.13nm is ground glass plectane.The reduction (amount of grinding) of the thickness of slab in this grinding typically is 0.5～2 μ m.
After smooth grinding operation, clean in order to remove colloidal silica abrasive particle.In this matting, preferably utilizing at least one times pH is the cleaning of more than 10 alkaline cleaners.For cleaning method, can flood glass plectane and apply ultrasonic vibration, also can use scouring.In addition, also can combine both.And then, preferably clean front and back utilize pure water dipping process, rinse operation.
After final flushing operation, glass plectane is dried, as drying means, for example can uses: use drying means, Rotary drying or the vacuum drying etc. of methanol vapor.
By above-mentioned a series of operation, can obtain the cerium base grinding agent of noresidue on first type surface or glassware that do not have problems because of residual cerium base grinding agent, after high planarization.
In glassware by manufacture method manufacturing of the present invention, size for more than 1mm × 1mm depression defect be preferably 0/below 1.The observation of depression defect is undertaken by the method illustrating in an embodiment below.
As the glassware of manufacturing by manufacture method of the present invention, for example can enumerate: the glass substrates such as glass substrate for disc, photomask base plate and display base plate; And towards blue filter glass and the cover glass etc. of CCD.By form magnetic recording layer on the first type surface of glass substrate for disc that utilizes manufacture method manufacture of the present invention, can manufacture disk.The disk that is formed with magnetic recording layer on the first type surface of the glass substrate of utilization after the high planarization obtaining by manufacture method of the present invention, can carry out high density recording.
Embodiment
Below, embodiments of the invention are specifically described, but the invention is not restricted to this.
Be roughly SiO from composition in mol%
2: 62%, Al
2o
3: 13%, MgO:3%, TiO
2: 1%, ZrO
2: 1%, Li
2o:11%, Na
2o:7%, K
250 of the ring-type glass plectanes that to cut external diameter on the glass plate of O:3% and be 65mm, internal diameter and be 20mm, thickness of slab be 0.635mm, use ciamond grinder to grind and cut processing inner peripheral surface and outer peripheral face, use alumina abrasive grain to carry out grinding to upper and lower major surfaces.
Then, internally the end face of periphery width is set is that 0.15mm, angle are the chamfer machining of the chamfered section of 45 °.After chamfer machining, for the end face of interior periphery, use the slurry that contains cerium base grinding agent as grinding-material, use brush as milling tool, carry out mirror finish by brush grinding.Amount of grinding is counted 30 μ m with the amount of removing of radial direction.
After mirror finish, the slurry that contains cerium base grinding agent shown in use table 1 or table 2, as grinding-material, uses urethane pad as milling tool, utilizes double-side polishing apparatus to carry out the attrition process of upper and lower major surfaces.Amount of grinding amounts to 5 μ m on the thickness direction of upper and lower major surfaces.It should be noted that, in embodiment 2, use using the grinding agent after common goods purifying as cerium base grinding agent.
In addition, the RINT2500 that utilizes electric corporation of science to manufacture is observed the x-ray structure of used cerium base grinding agent and obtain the results are shown in Fig. 3～8.In addition, in table 1 and table 2, the MT3300EXII that grinds the particle diameter utilization day machine dress manufacture of abrasive particle measures.
In table 1 and table 2, for the structure being obtained by X-ray diffraction, " single-phase " represents, at the powder diffraction data being provided taking joint committee (International Centre for Diffraction Data) (registration mark) [ICDD (registration mark)] when basis is verified, or whole peaks consistent with the peak position of the cerium oxide particles of fluorite type structure all fall into the scope of peak position ± 0.5 ° of the cerium oxide particles of fluorite type structure, " more than two-phase " represents, at the powder diffraction data being provided taking joint committee (registration mark) [ICDD (registration mark)] when basis is verified, except the peak consistent with the peak position of the cerium oxide particles of fluorite type structure and the peak position of the cerium oxide particles of fluorite type structure ± also there is peak peak in 5 °.
After the first type surface of glass plectane is ground, dry 2 hours, at 70 DEG C, heat after 1 hour, flood and clean for 5 minutes at the aqueous hydrogen peroxide solution of the sulfuric acid that contains 74 quality % and 11.4 quality % and in being heated to the cleaning fluid of 80 DEG C.
For the glass plectane obtaining like this, before the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after utilization heating cleans and after cleaning, utilize the Optiflat that ADE Co. manufactures to measure surface configuration.The results are shown in Fig. 9.In Fig. 9, A face represents the face of a side of glass plectane, and B face represents the face of opposite side.
In addition, the Opti-flat that uses ADE Co. to manufacture observes the surface configuration on glass plectane two sides by White Light Interferometer, will have the big or small glass plectane for depression more than 1mm × 1mm as having produced shaggy glass plate.The results are shown in table 2.
Table 1
As shown in table 1 and Fig. 3～5 and 9, the glass plate that the embodiment 1～3 glass being ground for the slurry that to contain not containing LaOF crystal and crystal structure be single-phase cerium base grinding agent by use obtains, does not produce rough surface because utilizing the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean.
On the other hand, as shown in table 1 and Fig. 3～5 and 9, contain for comprising by use the glass plate that comparative example 1～3 that LaOF crystal and crystal structure grind glass for the slurry of cerium base grinding agent more than two-phase obtains, produced rough surface owing to utilizing the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean.
Table 2
As shown in table 2, the glass plate that the embodiment 4～6 glass being ground for the slurry that to contain not containing LaOF crystal and crystal structure be single-phase cerium base grinding agent by use obtains, does not produce depression defect because utilizing the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean.
On the other hand, as shown in table 2, contain for comprising by utilization the glass plate that comparative example 4～6 that LaOF crystal and crystal structure grind glass for the slurry of cerium base grinding agent more than two-phase obtains, produced depression defect owing to utilizing the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean.
From these results, due to utilize cerium base grinding agent to grind glass and after use the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating glass to be cleaned to produce shaggy reason be the LaOF crystal containing in cerium base grinding agent, by using the not cerium base grinding agent containing LaOF crystal glass to be ground and use afterwards the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean glass, can prevent the generation of depression defect, effectively suppress rough surface, can obtain the good glass of flatness.
In addition, manufacturing method according to the invention, even directly utilize the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean glass without prerinse operation after grinding step, also can suppress shaggy generation.
Use specific mode to have been described in detail the present invention, but can carry out various changes and distortion in the situation that not departing from the intent and scope of the present invention, this is apparent to those skilled in the art.It should be noted that, the Japanese patent application (Japanese Patent Application 2012-022751) that the application proposed based on February 6th, 2012, its entirety is quoted by reference in this description.
Claims (14)
1. a manufacture method for glassware, comprises the grinding step that use cerium base grinding agent grinds glass and the matting that uses the cleaning fluid that contains sulfuric acid and aqueous hydrogen peroxide solution after heating to clean glass afterwards, in described manufacture method,
This cerium base grinding agent is the cerium base grinding agent that does not contain LaOF crystal.
2. the manufacture method of glassware as claimed in claim 1, wherein, described cerium base grinding agent contains lanthanum.
3. the manufacture method of glassware as claimed in claim 2, wherein, described cerium base grinding agent is with La
2o
3the lanthanum that meter contains 20～40 quality %.
4. the manufacture method of the glassware as described in any one in claim 1～3, wherein, described cerium base grinding agent contains fluorine.
5. the manufacture method of glassware as claimed in claim 4, wherein, the content of the fluorine in described cerium base grinding agent is greater than 1 quality %.
6. the manufacture method of the glassware as described in any one in claim 1～5, wherein, the Ce that described cerium base grinding agent contains fluorite type structure
xla
1-xo
yf
2-y(x is more than 0.5 and is less than 1, y is 1.7～2).
7. the manufacture method of the glassware as described in any one in claim 1～6, wherein, the average grain diameter of described cerium base grinding agent is below 0.5 μ m.
8. the manufacture method of the glassware as described in any one in claim 1～7, wherein, the content of the sulfuric acid in described cleaning fluid is 55～80 quality %, and the content of hydrogen peroxide is 1～10 quality %, and the temperature of described cleaning fluid is 70～100 DEG C.
9. the manufacture method of the glassware as described in any one in claim 1～8, wherein, comprising: the smooth grinding operation that uses the slurry that contains colloidal silica abrasive particle to grind glass after described matting.
10. the manufacture method of glassware as claimed in claim 9, wherein, the average grain diameter of colloidal silica abrasive particle is 10～50nm.
The manufacture method of 11. glasswares as described in claim 9 or 10, wherein, described in contain colloidal silica abrasive particle the pH of slurry be 1～6.
The manufacture method of 12. glasswares as described in any one in claim 1～11, wherein, described glassware is glass substrate.
The manufacture method of 13. glasswares as claimed in claim 12, wherein, described glass substrate is glass substrate for information recording medium.
The manufacture method of 14. 1 kinds of disks, is characterized in that, manufactures glass substrate for disc by the manufacture method of the glassware described in any one in claim 1～13, and forms magnetic recording layer on the first type surface of this glass substrate for disc.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012-022751 | 2012-02-06 | ||
| JP2012022751 | 2012-02-06 | ||
| PCT/JP2013/052337 WO2013118648A1 (en) | 2012-02-06 | 2013-02-01 | Method for producing glass product and method for producing magnetic disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104093524A true CN104093524A (en) | 2014-10-08 |
Family
ID=48947412
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380008201.XA Pending CN104093524A (en) | 2012-02-06 | 2013-02-01 | Method for producing glass product and method for producing magnetic disk |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2013118648A1 (en) |
| CN (1) | CN104093524A (en) |
| WO (1) | WO2013118648A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107615380A (en) * | 2015-05-20 | 2018-01-19 | Hoya株式会社 | The Ginding process of glass substrate, lapping liquid, the manufacture method of glass substrate, the manufacture method of the manufacture method of glass substrate for disc and disk |
| CN114423842A (en) * | 2019-09-17 | 2022-04-29 | Ａｇｃ株式会社 | Polishing agent, method for polishing glass, and method for producing glass |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105764650A (en) * | 2013-11-20 | 2016-07-13 | 旭硝子株式会社 | Glass plate manufacturing method |
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| CN101813692A (en) * | 2004-05-20 | 2010-08-25 | 清美化学股份有限公司 | Glass grinding method and glass grinding are with grinding the material constituent |
| CN101950565A (en) * | 2009-07-09 | 2011-01-19 | 旭硝子株式会社 | Information recording carrier glass substrate and manufacture method and magnetic recording media |
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| JP3665731B2 (en) * | 2000-09-28 | 2005-06-29 | Ｈｏｙａ株式会社 | Manufacturing method of glass substrate for magnetic disk and manufacturing method of magnetic disk |
| JP4041110B2 (en) * | 2004-09-29 | 2008-01-30 | Ｈｏｙａ株式会社 | Manufacturing method of glass substrate for magnetic disk and manufacturing method of magnetic disk |
| JP4954338B1 (en) * | 2011-04-14 | 2012-06-13 | 旭硝子株式会社 | Manufacturing method of glass products |
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2013
- 2013-02-01 JP JP2013557489A patent/JPWO2013118648A1/en not_active Ceased
- 2013-02-01 WO PCT/JP2013/052337 patent/WO2013118648A1/en active Application Filing
- 2013-02-01 CN CN201380008201.XA patent/CN104093524A/en active Pending
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| CN1186099A (en) * | 1996-12-25 | 1998-07-01 | 清美化学股份有限公司 | Manufacture of cerium group polishing materials |
| JP2003212601A (en) * | 2002-01-23 | 2003-07-30 | Nippon Electric Glass Co Ltd | Glass raw material |
| CN101813692A (en) * | 2004-05-20 | 2010-08-25 | 清美化学股份有限公司 | Glass grinding method and glass grinding are with grinding the material constituent |
| CN101950565A (en) * | 2009-07-09 | 2011-01-19 | 旭硝子株式会社 | Information recording carrier glass substrate and manufacture method and magnetic recording media |
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| CN107615380A (en) * | 2015-05-20 | 2018-01-19 | Hoya株式会社 | The Ginding process of glass substrate, lapping liquid, the manufacture method of glass substrate, the manufacture method of the manufacture method of glass substrate for disc and disk |
| CN107615380B (en) * | 2015-05-20 | 2020-09-11 | Hoya株式会社 | Method for polishing glass substrate, polishing liquid, method for producing glass substrate for magnetic disk, and method for producing magnetic disk |
| CN114423842A (en) * | 2019-09-17 | 2022-04-29 | Ａｇｃ株式会社 | Polishing agent, method for polishing glass, and method for producing glass |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2013118648A1 (en) | 2015-05-11 |
| WO2013118648A1 (en) | 2013-08-15 |
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