CN104048573B - A kind of method with micron micrometer measurer to main equipment installation level centering - Google Patents

A kind of method with micron micrometer measurer to main equipment installation level centering Download PDF

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Publication number
CN104048573B
CN104048573B CN201410310174.8A CN201410310174A CN104048573B CN 104048573 B CN104048573 B CN 104048573B CN 201410310174 A CN201410310174 A CN 201410310174A CN 104048573 B CN104048573 B CN 104048573B
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micrometer
measurer
micron
centering
sopwith staff
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CN104048573A (en
Inventor
房新刚
白金元
王永成
张�杰
刁治国
崔亚辉
许强
尹凤伟
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MCC Tiangong Group Tianjin Corp Ltd
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MCC Tiangong Group Tianjin Corp Ltd
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Abstract

The invention discloses a kind of method with micron micrometer measurer to main equipment installation level centering, the micron micrometer measurer in the method and ordinary level are with the use of having well measurement, centering effect.Described micron micrometer measurer includes that the special Sopwith staff with millimeter scale and front have the micrometer head of window;Being set to down scale chi at the window in described micrometer head front, the upper and lower end that described micrometer head is symmetrical in its radial center both sides is respectively provided with a pair location screw, is provided with fixing screw between two location screws of the first side of described micrometer;The radial center lateral symmetry of described special Sopwith staff is provided with its width and positions, on described micrometer head, the sliding channel that the diameter of screw agrees with mutually.The invention have the advantage that simple to operate, it is simple to carry, measurement effect is reliable, coordinates without precision level expensive, that operation is complicated and indium steel ruler, thus reduces operating expenses, saved construction cost during measurement.

Description

A kind of method with micron micrometer measurer to main equipment installation level centering
Technical field
The present invention relates to a kind of aligning method, more particularly, it relates to one is with micron micrometer The measurer method to main equipment installation level centering.
Background technology
At present, the aligning method of large-scale precision equipment is two kinds: one is to utilize level gauge and Sopwith staff to set Standby absolute altitude controls, and its error manual control is within ± 0.3mm, and centering precision is the highest, it is difficult to meet essence The installation requirement of close equipment;Another kind is that the cooperation of supporting precision level and indium steel ruler controls, its centering essence Degree is up to 0.01mm, it is possible to meet the installation requirement of precision equipment.
Above first method, although be difficult to meet the centering requirement of precision equipment, but coordinate light water Quasi-instrument can carry out the precision of specific installation and adjust;And second method, although disclosure satisfy that precision equipment Centering require and continue to use always, but due to expensive, the operation of described precision level and indium steel ruler The restriction of the factor such as complicated, inconvenient to carry, but makes it installing, has inconvenience in measurement more.
Summary of the invention
The purpose of the present invention is exactly the deficiency overcoming prior art, and provides a kind of with micron micrometer for this The measurer method to main equipment installation level centering.
The technical scheme is that
A kind of method with micron micrometer measurer to main equipment installation level centering, including as follows Step:
(1) micron micrometer measurer is made: described micron micrometer measurer, including special Sopwith staff and thousand Divide chi head;Described special Sopwith staff is the hollow cylinder with millimeter scale;Described micrometer head is Front has the hollow cylinder of window;It is set to down scale chi at the window in described micrometer head front, The upper and lower end that described micrometer head is symmetrical in its radial center both sides is respectively provided with a pair location screw, institute State and be provided with fixing screw between two location screws of the first side of micrometer;The radial direction of described special Sopwith staff Center lateral symmetry is provided with its width and positions, on described micrometer head, the slip that the diameter of screw agrees with mutually The mating reaction by described location screw Yu sliding channel of groove, described micrometer head and special Sopwith staff Constitute sliding motion secondary.
(2) adjust the ordinary level described in ordinary level utilization and coordinate on micron micrometer measurer special Millimeter scale value with Sopwith staff measures the height value of ordinary level.
(3) ordinary level is utilized to coordinate the millimeter scale value of special Sopwith staff on micron micrometer measurer to measure Go out the height being measured point by least four in centering equipment.
(4) basic point as actual elevation in point is measured using at least four, precision thousand of harmonizing Divide the dead-center position of micrometer head in dipstick metering tool so that it is with the horizontal stroke of reference cross line in described ordinary level Align to line, make described micron micrometer measurer be perpendicular to, by centering equipment, record the first measurement simultaneously The absolute altitude put the measurement data recording this point.
(5) measure other measurement point absolute altitude successively by the method as (4), and record survey respectively Amount data.
(6) data being recorded measurement are analyzed, calculate the actual mark after being installed by centering equipment The high difference with designed elevation.
(7) by the accurate measurement of described micron micrometer measurer, by the base mat by centering equipment The adjustment of ferrum and jackscrew carries out centering to its installed height mark and levelness so that it is actual elevation is with levelness by mistake Difference meets design standard and the code requirement of equipment installation.
In above method:
The a length of 1500mm of measurement of described special Sopwith staff.
On described micrometer head, the scale of down scale chi is 0.99mm.
Compared with prior art, it provides the benefit that the present invention:
(1) easy to operate, practical;
(2) micron micrometer measurer compact, it is simple to carry, can recycle;
(3) measurement effect is reliable, and degree of accuracy is high, it is simple to improve efficiency of construction;
(4) ordinary level is coordinated to use, it is not necessary to the precision level expensive, operation is complicated And indium steel ruler, thus reduce operating expenses, save construction cost.
Accompanying drawing explanation
Fig. 1 is the aligning method schematic diagram of the present invention;
Fig. 2 is the enlarged drawing of micron micrometer measurer at A in Fig. 1;
Fig. 3 is the structural representation of micrometer head in Fig. 2;
Fig. 4 is the B-B generalized section of Fig. 3;
Fig. 5 is the structural representation of special Sopwith staff in Fig. 2;
Fig. 6 is the C-C generalized section of Fig. 5.
Labelling in figure: 1 by centering equipment;2 ordinary levels;3 micron micrometer measurers; 31 micrometer heads;311 windows;312 down scale chis;313 location screws;314 fix screw; 32 special Sopwith staffs;321 sliding channels.
Detailed description of the invention
It is understood to make technical scheme be easier to, below in conjunction with drawings and Examples pair It is described in detail.
Fig. 1 illustrates the aligning method of the present invention.
With reference to Fig. 1, before by centering equipment 1 installation, first with ordinary level 2 at Qi Shui Select four or more measurement point on Pingdu installed surface, then utilize the micron micrometer of the present invention Each actual elevation measuring point measured by measurer 3, and calculates actual elevation and design after equipment is installed The difference of absolute altitude, and ensure that this difference is within the code requirement that design standard and equipment are installed.
Fig. 2 illustrates the structure of micron micrometer measurer 3 in the present invention in the way of amplification at A in Fig. 1.
With reference to Fig. 2, the micron micrometer measurer 3 in the present invention, its component parts includes with millimeter scale Special Sopwith staff 32 and be arranged on described special Sopwith staff 32 and constitute sliding with described special Sopwith staff 32 The micrometer head 31 that shifting movement is secondary.
Fig. 3, Fig. 4 illustrate the structure of described micrometer head 31 respectively in the way of front elevation and top view Shape.
With reference to Fig. 3, Fig. 4, described micrometer head 31 has the hollow cylinder of window 311, institute for front The down scale chi 312 that scale value is 0.99mm, described micrometer head 31 it is set at the window 311 stated The upper and lower end being symmetrical in its radial center both sides is respectively provided with a pair location screw 313, described location spiral shell Do not produce when nail 313 is for ensureing that described micrometer head 31 is upper and lower relative to described special Sopwith staff 32 and sliding Raw inclination and rotation, and make its accurate positioning, upper and lower two location spiral shells of described micrometer head 31 side Equipped with fixing screw 314 between nail 313, by described thousand points when described fixing screw 314 is used for measuring Chi head 31 is fixed on described special Sopwith staff 32 is easy to reading.
Fig. 5, Fig. 6 illustrate the structure of described special Sopwith staff 32 respectively in the way of front elevation and top view Shape.
With reference to Fig. 5, Fig. 6, described special Sopwith staff 32 is the hollow cylinder being provided with millimeter scale, institute The radial center lateral symmetry stating hollow cylinder is machined with sliding channel 321, described sliding channel 321 Width agrees with mutually with the diameter of location screw 313 on described micrometer head 31, so that described micrometer head 31 by the mating reaction of described location screw 313 and described sliding channel 321 and described special Sopwith staff 32 constitute sliding motion pair, and it is real on described special Sopwith staff 32 to pass through described fixing screw 314 Existing position is fixed.
For the ease of installed height mark and the levelness centering of main equipment, the present invention arranges described special Sopwith staff The a length of 1500mm of measurement of 32.
The micron micrometer measurer of the present invention is based on the private volumn that the operation principle of slide gauge is carried out Tool exploitation, the vernier that the down scale chi 312 on described micrometer head 31 is similar on slide gauge, its On be provided with n evenly divided, on the total length of n evenly divided and described special Sopwith staff 32 (n-1) The total length of individual evenly divided is equal, if a length of x of minimum scale on down scale chi 312, special Sopwith staff The a length of y of minimum scale on 32
Then there is nx=(n-1) y
So x=y-y/n
So, the minimum scale of the minimum scale of described special Sopwith staff 32 and described down scale chi 312 it Difference is:
Δ x=y-x=y/n
Y/n in this formula is the precision of measurer, and it determines the figure place of reading result.
By formula it can be seen that the certainty of measurement improving measurer is to increase the quarter of described down scale chi 312 The number of degrees or reduce the minimum scale value of described special Sopwith staff 32.Therefore, the present invention is at micron micrometer measurer Design in, the minimum scale y on described special Sopwith staff 32 is taken 1mm, n and takes 100mm, determine it Accuracy value is 0.01mm, thus becomes a kind of high-accuracy miking instrument, for large-scale essence Absolute altitude and levelness centering that close equipment is installed have that using method is simple, measuring speed is fast and degree of accuracy is high Feature.
With reference to Fig. 1 and combine Fig. 2, the present invention with micron micrometer measurer to main equipment installation level The method of centering, comprises the steps:
(1) micron micrometer measurer 3 is made.
(2) before by centering equipment 1 installation, first adjusting ordinary level 2 can be normal Use, and the ordinary level 2 described in utilization coordinates special Sopwith staff 32 on described micron micrometer measurer 3 Millimeter scale value measure the height value of ordinary level 2.
(3) ordinary level 2 described in utilization coordinates special Sopwith staff 32 on micron micrometer measurer 3 Millimeter scale value measures the height being measured point by least four in centering equipment 1.
(4) basic point as actual elevation measured in point using at least four measures, and measures Time adjustment micron micrometer measurer 3 in the dead-center position of micrometer head 31 so that it is with described common level In instrument 2 reference cross line x wire alignment, make simultaneously described micron micrometer measurer 3 be perpendicular to by Centering equipment 1, records the absolute altitude of the first measurement point and records the measurement data of this point.
(5) measure other measurement point absolute altitude successively by the method as (4), and record survey respectively Amount data.
(6) data being recorded measurement are analyzed, calculate the reality after being installed by centering equipment 1 Absolute altitude and the difference of designed elevation.
(7) by the accurate measurement of described micron micrometer measurer 3, by adjusting by centering equipment 1 Ram pack carries out initial adjustment to its levelness, then by jackscrew being adjusted the absolute altitude that it is installed and level Degree carries out accurate adjustment centering so that it is actual elevation and horizontal gradient error meet design standard and the rule of equipment installation Model requirement.
Measurement result illustrates:
In the embodiment shown in fig. 1, if the first measurement point is A, the second measurement point is B, is measuring A During point, with x wire and the micrometer head in described micron micrometer measurer 3 of ordinary level 2 inner cross line The zero point of 31 is directed at and makes both concordant, and the absolute altitude recording A point is to fix screw 314 place center line in Fig. 2 Position (reading of this position is 1035.53mm) after aligning, more in kind measure B point absolute altitude and A point absolute altitude carries out Data Comparison.
Assume that the levelness precision that demand of technical standard equipment is installed is 0.03/1000mm, and set by centering On standby 1, the first span measured between some A and second measurement point B is 2000mm, then second measure point The data permissible value of B is A ± (0.03/1000*2), it may be assumed that if the data of A point absolute altitude are 1035.53mm, then the interval of acceptance of B point elevation data is " 1035.47mm 1035.59mm ".
Above by reference to drawings and Examples, being schematically described the present invention, this description does not limit Property.Those skilled in the art will be understood that in actual applications, the inventive method and side of the present invention In method, the set-up mode of micron micrometer measurer is all it may happen that some changes, and other staff are under it enlightens It is likely to make similar Design.Special needs to be pointed out is: without departing from the design aim of the present invention, institute There is obvious change or similar Design, within being all contained in protection scope of the present invention.

Claims (3)

1., with the micron micrometer measurer method to main equipment installation level centering, it is characterized in that: the method comprises the steps:
(1) micron micrometer measurer is made: described micron micrometer measurer includes special Sopwith staff and micrometer head;Described special Sopwith staff is the hollow cylinder with millimeter scale;Described micrometer head is the hollow cylinder that front has window;Being set to down scale chi at the window in described micrometer head front, the upper and lower end that described micrometer head is symmetrical in its radial center both sides is respectively provided with a pair location screw, is provided with fixing screw between two location screws of the first side of described micrometer;The radial center lateral symmetry of described special Sopwith staff is provided with its width and positions the sliding channel that the diameter of screw agrees with mutually, described micrometer head and the special Sopwith staff mating reaction composition sliding motion pair by described location screw with sliding channel on described micrometer head;
(2) adjusting the ordinary level described in ordinary level utilization coordinates the millimeter scale value of special Sopwith staff on micron micrometer measurer to measure the height value of ordinary level;
(3) ordinary level is utilized to coordinate the millimeter scale value of special Sopwith staff on micron micrometer measurer to measure the height being measured point by least four in centering equipment;
(4) basic point as actual elevation in point is measured using at least four, the dead-center position of micrometer head in adjustment micron micrometer measurer, it is made to align with the x wire of reference cross line in described ordinary level, make described micron micrometer measurer be perpendicular to, by centering equipment, record the absolute altitude of the first measurement point and record the measurement data of this point simultaneously;
(5) measure other measurement point absolute altitude successively by the method as step (4), and record measurement data respectively;
(6) data being recorded measurement are analyzed, calculate the difference of the actual elevation after being installed by centering equipment and designed elevation;
(7) by the accurate measurement of described micron micrometer measurer, by its installed height mark and levelness being carried out centering to by the ram pack of centering equipment and the adjustment of jackscrew so that it is actual elevation and horizontal gradient error meet design standard and the code requirement of equipment installation.
Method with micron micrometer measurer to main equipment installation level centering the most according to claim 1, is characterized in that: a length of 1500mm of measurement of described special Sopwith staff.
Method with micron micrometer measurer to main equipment installation level centering the most according to claim 1, is characterized in that: on described micrometer head, the scale of down scale chi is 0.99mm.
CN201410310174.8A 2014-06-30 2014-06-30 A kind of method with micron micrometer measurer to main equipment installation level centering Active CN104048573B (en)

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CN107030911A (en) * 2017-05-15 2017-08-11 天津市环欧半导体材料技术有限公司 The level measurement method and frock of a kind of use multi-line cutting machine secondary cut silicon chip
CN112304282B (en) * 2020-10-14 2022-04-26 新兴铸管股份有限公司 Method for mounting and measuring rails of centrifugal machine
CN112484706A (en) * 2020-11-17 2021-03-12 中国水电建设集团十五工程局有限公司 Large-scale equipment high-precision flange surface levelness adjusting method

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EP0054835A1 (en) * 1980-12-19 1982-06-30 MORA Fabrik für Messgeräte H. Freund Height measuring and marking device
CN101038146A (en) * 2006-03-15 2007-09-19 哈尔滨汽轮机厂有限责任公司 Luminous inside micrometer used for steam turbine three cylinders jointing and internal sleeve finding
CN103115610A (en) * 2013-02-08 2013-05-22 刘雁春 Leveling method suitable for compound level gauge
CN103175694A (en) * 2013-01-16 2013-06-26 吉林大学 Level height difference correction system for four-wheel aligner lifting frame of standard-type automobile
CN203083492U (en) * 2012-12-27 2013-07-24 沈阳远大铝业工程有限公司 Circular arc radius measuring device
CN203964797U (en) * 2014-06-30 2014-11-26 天津二十冶建设有限公司 A kind of micron micrometer measurer for large-scale precision equipment centering

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JPH0526665A (en) * 1991-07-24 1993-02-02 Oomu Denki Kk Water level measuring device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0054835A1 (en) * 1980-12-19 1982-06-30 MORA Fabrik für Messgeräte H. Freund Height measuring and marking device
CN101038146A (en) * 2006-03-15 2007-09-19 哈尔滨汽轮机厂有限责任公司 Luminous inside micrometer used for steam turbine three cylinders jointing and internal sleeve finding
CN203083492U (en) * 2012-12-27 2013-07-24 沈阳远大铝业工程有限公司 Circular arc radius measuring device
CN103175694A (en) * 2013-01-16 2013-06-26 吉林大学 Level height difference correction system for four-wheel aligner lifting frame of standard-type automobile
CN103115610A (en) * 2013-02-08 2013-05-22 刘雁春 Leveling method suitable for compound level gauge
CN203964797U (en) * 2014-06-30 2014-11-26 天津二十冶建设有限公司 A kind of micron micrometer measurer for large-scale precision equipment centering

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