CN104035289A - Photoetching projection objective environment collection control system and control method thereof - Google Patents

Abstract

The invention relates to a photoetching projection objective environment collection control system and a control method thereof, belonging to the field of photoetching projection objective control. The photoetching projection objective environment collection control system comprises a control machine box, a collection driving machine box, an analog-to-digital conversion machine box, multiple actuators and multiple sensors, wherein an optical fiber communication board card is connected with an environmental control algorithm board card through an optical fiber transmission link; an environment collection driving board card is connected with an analog-to-digital conversion board card or an interface conversion card through a digital signal transmission link, and the environment collection driving board card is connected with the multiple actuators through a driving signal transmission link; the analog-to-digital conversion board card is connected with the multiple sensors through a low-voltage analog signal transmission link; the multiple actuators are arranged in a photoetching machine environment cabinet; the multiple sensors are arranged on a photoetching projection objective. According to the photoetching projection objective environment collection control system disclosed by the invention, the regulation time of every regulation is shortened, the accuracy of environmental parameter regulation is ensured, the response time is shortened and the integral property of the photoetching projection objective and a photoetching machine can be ensured.

Description

A lithography projection objective lens environment acquisition control system and control method thereof

technical field

The invention belongs to the field of lithography projection objective lens control, and in particular relates to a lithography projection objective lens environment acquisition control system and a control method thereof.

Background technique

The lithography projection objective lens is an ultra-precision optical system, which is the core component of the lithography machine, and it is the key to the lithography resolution and line width. With the improvement of lithography precision, the requirements for the environment, such as the requirements for ambient temperature, air pressure, and cleanliness, are becoming more and more stringent. There are a lot of heat sources inside the objective lens, including various motors and excimer lasers, etc. Changes in temperature will cause changes in the focal plane position of the objective lens and affect the imaging quality of the objective lens. At the same time, the inside of the objective lens needs a sealed environment and high-purity, clean nitrogen to prevent air from entering the projection The inside of the objective lens pollutes the optical lens, and at the same time, it is necessary to ensure that the nitrogen has a constant pressure and flow rate to reduce the impact on the shape of the optical surface.

The environmental acquisition and control system is to ensure the stability of environmental parameters such as temperature, pressure, and cleanliness under normal working conditions of the projection objective lens. The lithography projection objective lens environmental acquisition control system can be divided into a water cooling cycle temperature control module and a high-purity nitrogen gas cycle control module. Among them, the water-cooling cycle temperature control module can use the internal circulation constant temperature water tank and solenoid valve and other actuators to provide the objective lens water jacket temperature, constant flow, adjustable circulating water, and use multiple temperature sensors arranged in different positions as feedback, through closed-loop control Algorithm implementation. However, actuators such as internal circulation constant temperature water tanks and solenoid valves will generate a large amount of heat, and the thermal power generated will affect the imaging quality of the projection objective lens; The device adjusts the external nitrogen gas, and uses pressure sensors, flow sensors, etc. as feedback, and provides nitrogen recycling inside the objective lens through a closed-loop control algorithm. However, pneumatic components also generate a lot of heat and vibration, which will affect the imaging quality of the projection objective. Inside the lithography machine, the wiring distance between the lithography projection objective lens environmental acquisition control system and the lithography projection objective lens is about 10-15 meters. Analog signals such as temperature sensors, pressure sensors, and flow sensors need to be converted into digital signals for remote control. distance transmission. At the same time, the water cooling temperature control needs to meet the ultra-high precision (±0.01°C) requirements of the long-time thermal response constant projection objective lens, and the high-purity nitrogen circulation control module needs to meet ultra-high purity (nitrogen content 99.999999%), particle size (maximum 3nm), Flow (12NL/H), pressure (100±10pa). Therefore, a lithography projection objective lens environment acquisition control system structure is needed.

Contents of the invention

In order to solve the technical problems in the prior art that the thermal power of the control box affects the imaging quality, the long-distance signal attenuation of the sensor analog signal, and the temperature, pressure, cleanliness response time and ultra-high precision requirements in the lithography system, the present invention proposes an optical The invention discloses an engraved projection objective lens environment acquisition control system and a control method thereof.

The technical solution adopted by the present invention to solve the technical problems is as follows:

A lithographic projection objective lens environmental acquisition control system includes a control cabinet, an acquisition drive cabinet, an analog-to-digital conversion cabinet, various actuators, and multiple sensors; the control cabinet includes a standard VME backplane, a main control board, and an optical fiber communication The board, the main control board and the optical fiber communication board are inserted on the standard VME backboard, and the collection driver chassis includes a non-standard VME backboard, an environment control algorithm board and an environment collection driver board. The environmental control algorithm board and the environmental acquisition driver board are inserted on the non-standard VME backboard, and the analog-to-digital conversion chassis includes an analog-to-digital conversion board and an interface conversion card; the optical fiber communication board is transmitted through an optical fiber The link is connected with the environmental control algorithm board, the environmental acquisition driver board is connected with the analog-to-digital conversion board or interface conversion card through the digital signal transmission link, the environmental acquisition driver board transmission link is connected with various actuators, the modulus The conversion board or the interface conversion card is connected to various sensors through a low-voltage analog signal transmission link, the various sensors are arranged on the lithography projection objective lens, and the various actuators are arranged in the environmental control cabinet of the whole machine; The environment acquisition driver board is connected to the non-standard VME backplane through a self-defined digital signal front connector and a power supply signal connector, and the non-standard VME backplane is connected to the environment through a self-defined digital signal rear connector. Control algorithm board connection;

The control cabinet, the collection drive cabinet and the analog-to-digital conversion cabinet are placed in the control cabinet of the lithography machine, and the range of the distance D between the control cabinet, the collection drive cabinet and the lithography projection objective lens is: 10m≤ D≤15m, the value range of the distance d between the analog-to-digital conversion chassis and the lithography projection objective lens is: 2m≤d≤3m.

The analog-to-digital conversion chassis has a self-defined pumping and exhausting method, and the generated heat is pumped away through the cooling system of the lithography machine, and the generated thermal power will not affect the projection objective lens.

The size of the fiber optic communication board conforms to the single-height template size in the VME bus system specification, and has the slave module function of the VME bus system specification. The connector on the fiber optic communication board adopts the P1 connector in the VME bus system specification.

The environmental control algorithm board is provided with an optical fiber connector, the optical fiber communication board is connected to the optical fiber connector through an optical fiber transmission link, and the environmental acquisition drive board is provided with a sensor digital signal connector and a variety of execution sensor drive signal connector, the sensor digital signal connector is connected to the analog-to-digital conversion board or interface conversion card through a digital signal transmission link, and the drive signal connector is connected to various actuators through a drive signal transmission link connect.

The size of the connector on the non-standard VME backplane conforms to the size of the J1 connector and J2 connector in the VME bus system specification, the size of the environmental control algorithm board conforms to the size of the back card template in the VME bus system specification, and the environmental drive acquisition The size of the board conforms to the double-height template size in the VME bus system specification, and does not have the master-slave module function of the VME bus system specification.

The P1 connector of the drive acquisition board transmits a custom digital signal, and the P2 connector transmits a custom power supply signal.

In the lithography projection objective lens environment acquisition control system of the present invention, the acquisition drive cabinet is placed in the complete machine control cabinet 10-15 meters away from the lithography projection objective lens. The heat is taken out of the lithography machine by the exhaust system of the control cabinet of the whole machine, which will not affect the imaging quality of the lithography projection objective lens. Place an analog-to-digital conversion chassis near the lithography projection objective lens to convert the analog capacitive signals collected by sensors such as temperature and pressure into digital signals, and transmit them to the acquisition drive chassis over a long distance, so as to realize the long-distance transmission of signals collected by various sensors, and The analog-to-digital conversion chassis takes the heat out of the lithography machine through the exhaust system of the whole machine through a custom exhaust method, which will not affect the imaging quality of the projection objective lens. The control chassis and the acquisition drive chassis are placed together in the complete machine cabinet, and are connected and communicated through optical fiber transmission links. The control commands for each environmental parameter adjustment are sent by the optical fiber communication board in the control chassis to the environment control inside the acquisition drive chassis. Algorithm board, the environmental control algorithm board is connected to the environmental acquisition driver board through a high-speed custom signal interface, the environmental acquisition driver board can directly operate and drive various actuator signals, and process digital position signals collected by sensors such as temperature and pressure , the different control algorithms in the environmental control algorithm board independently complete the single adjustment of temperature control, flow control, and pressure control, without repeatedly receiving the adjustment instructions of the control chassis, and place the transmission link of the control command in the servo cycle of the control algorithm In addition, to shorten the time of each environmental control.

The beneficial effects of the present invention are: the present invention can ensure the wiring length and heat dissipation requirements of various actuators and various sensors, and place the control command transmission link outside the servo cycle of the environmental control algorithm from the hardware, in order to improve The implementation efficiency of the control algorithm provides the necessary hardware platform, thereby shortening the adjustment time of each adjustment, ensuring the accuracy of environmental parameter adjustment, reducing the response time, and ensuring the overall performance of the lithography projection objective lens and lithography machine.

Description of drawings

Fig. 1 is the structural representation of lithography projection objective lens environment acquisition control system of the present invention;

Fig. 2 is a schematic diagram of the internal structure of the acquisition drive chassis in the present invention;

Among them: 1. Control chassis, 2. Optical fiber communication board, 3. Optical fiber transmission link, 4. Acquisition drive chassis, 5. Environmental acquisition drive board, 6. Digital signal transmission link, 7. Actuator signal transmission chain 8. A variety of actuators, 9. Photolithographic projection objective lens, 10. Standard VME backplane, 11. Main control board, 12. Non-standard VME backplane, 13. Environmental control algorithm board, 14. Modulus Conversion board or interface conversion card, 15. Analog-to-digital conversion chassis, 16. Low-voltage analog signal transmission link, 17. Various sensors, 18. Optical fiber connector, 19. Custom digital signal rear connector, 20. Custom Digital signal front connector, 21, sensor digital signal connector, 22, custom power supply signal connector, 23, drive signal connector.

Detailed ways

Embodiments of the present invention will be further described below in conjunction with the accompanying drawings.

As shown in FIG. 1 , the lithography projection objective environment acquisition control system of the present invention includes a control cabinet 1 , an acquisition drive cabinet 4 , an analog-to-digital conversion cabinet 15 , various actuators 8 and various sensors 17 . Various actuators 8 include solenoid valves, pressure reducing valves, etc., and various sensors 17 include 4 temperature sensors, 3-4 pressure sensors, 2-3 flow sensors, and the like.

The control cabinet 1 includes a standard VME backplane 10, a main control board 11 and an optical fiber communication board 2, and the main control board 11 and the optical fiber communication board 2 are inserted on the standard VME backplane 10, so The collection drive chassis 4 includes a non-standard VME backplane 12, an environment control algorithm board 13 and an environment collection drive board 5, and the environment control algorithm board 13 and the environment collection drive board 5 are inserted into the non-standard VME On the backplane 12 , the analog-to-digital conversion chassis 15 includes an analog-to-digital conversion board or an interface conversion card 14 .

The optical fiber communication board 2 is connected with the environmental control algorithm board 13 through the optical fiber transmission link 3, and the environment collection driver board 5 is connected with the analog-to-digital conversion board or the interface conversion card 14 through the digital signal transmission link 6, and the environment collection The drive board 5 is connected to various actuators 8 through the drive signal transmission link 7, and the analog-to-digital conversion board or interface conversion card 14 is connected to various sensors 17 such as temperature and pressure through the low-voltage analog signal transmission link 16. Various actuators 8 are arranged in the environmental control cabinet of the lithography machine. Various sensors 17 such as temperature and pressure are arranged on the lithography projection objective lens 9 .

As shown in Figure 2, the environmental acquisition drive board 5 is connected to the non-standard VME backplane 12 through a self-defined digital signal front connector 20 and a power supply signal connector 22, and the non-standard VME backplane 12 is connected to the non-standard VME backplane 12 through a self-defined The digital signal rear connector 19 is connected with the environmental control algorithm board 13 .

The control cabinet 1, the collection drive cabinet 4 and the analog-to-digital conversion cabinet 15 are all placed in the control cabinet of the lithography machine, and the distance D between the control cabinet 1, the collection drive cabinet 4 and the lithography projection objective lens 9 The value range is: 10m≤D≤15m, and the value range of the distance d between the analog-to-digital conversion chassis 15 and the lithography projection objective lens 9 is: 2m≤d≤3m.

The size of the optical fiber communication board 2 conforms to the single-height template size in the VME bus system specification, and has the slave module function of the VME bus system specification. The connector on the optical fiber communication board 2 adopts the P1 connector in the VME bus system specification.

The environmental control algorithm board 13 is provided with an optical fiber connector 18, the optical fiber communication board 2 is connected to the optical fiber connector 18 through an optical fiber transmission link 3, and the environmental acquisition driving board 5 is provided with a sensor digital signal Connector 21 and actuator drive signal connector 23, the sensor digital signal connector 21 is connected with the analog-to-digital conversion board or interface conversion card 14 through the digital signal transmission link 6, and the drive signal connector 23 is connected through The drive signal transmission link 7 is connected to various actuators 8 .

The size of the connector on the non-standard VME backplane 12 conforms to the size of the J1 connector and the J2 connector in the VME bus system specification, and the size of the environmental control algorithm board 13 conforms to the size of the rear card template in the VME bus system specification. The size of the acquisition driver board 5 conforms to the double-height template size in the VME bus system specification, and does not have the master-slave module function of the VME bus system specification. The sensor digital signal connector 21 and the actuator drive signal connector 23 respectively adopt VME P1 connector and P2 connector in the bus system specification.

The P1 connector of the environment acquisition driver board 5 transmits a custom digital signal, and the P2 connector transmits a custom power supply signal.

The control method of the present invention based on the lithography projection objective lens environment acquisition control system comprises the following steps:

Step 1: Control the main control board 11 in the chassis 1 to receive the control command of the environmental parameters from the environment control system of the whole machine, and send the command to the optical fiber communication board 2 through the standard VME backplane 10, and the optical fiber communication board 2 will After the control command is encapsulated, it is transmitted to the environmental control algorithm board 13 in the acquisition drive chassis 4 through the optical fiber transmission link 3 and the optical fiber connector 18;

Step 2: The environmental control algorithm board 13 analyzes the control command and starts the servo control. First, the driving signal is sent to the environment through the custom digital signal rear connector 19 and the custom digital signal front connector 20 on the non-standard VME backplane 12 The acquisition driver board 5, the environment acquisition driver board 5 obtains the power supply from the power supply signal connector 22, and realizes the long-distance driving of various actuators 8 through the drive signal connector 23 and the drive signal transmission link 7. Environmental parameters such as temperature and pressure of the engraved projection objective lens 9 are collected by various sensors 17 such as temperature and pressure, and are transmitted to the analog-to-digital conversion board or interface conversion card of the analog-to-digital conversion chassis 15 through the low-voltage analog signal transmission link 16 In 14, the analog-to-digital conversion board 14 performs analog-to-digital conversion on the collected environmental parameters such as temperature and pressure, and transmits the digital displacement signal to the environment acquisition driver board through the digital signal transmission link 6 and the digital sensor signal connector 21 In 5, after the environmental acquisition driver board 5 analyzes the digital signal, the environmental parameter signal is fed back to the environmental control algorithm through the self-defined digital signal rear connector 19 and the self-defined digital signal front connector 20 on the non-standard VME backplane 12 The board 13 has completed an operation of controlling the servo cycle so far;

Step 3: The environmental control algorithm board 13 corrects the control algorithm parameters through the environmental parameter signal obtained by feedback, and repeats step 2 until the servo adjustment is completed;

Step 4: After completing an environmental parameter adjustment, the environmental control algorithm board 13 transmits the adjustment result to the optical fiber communication board 2 through the optical fiber connector 18 and the optical fiber transmission link 3, and the optical fiber communication board 2 analyzes the adjustment result and passes the standard The VME backplane 10 notifies the main control board 11 through an interrupt, and the main control board 11 sends a control command that the environment parameter adjustment is completed to the control system of the whole machine.

The above are specific embodiments of the present invention, but are by no means limiting the present invention.

Claims (7)

1. a photoetching projection objective lens environment acquisition control system, it is characterized in that, this system comprises controls cabinet (1), collection driving cabinet (4), analog to digital conversion cabinet (15), multiple actuator (8) and multiple sensors (17);

In described control cabinet (1), comprise standard VME backboard (10), master control board card (11) and optical fiber communication board (2), described master control board card (11) and optical fiber communication board (2) are inserted on described standard VME backboard (10), described collection drives in cabinet (4) and comprises nonstandard VME backboard (12), environment control algolithm board (13) and environment gather Driver Card (5), described environment control algolithm board (13) and environment gather Driver Card (5) and are inserted on described nonstandard VME backboard (12), in described analog to digital conversion cabinet (15), comprise analog to digital conversion board or interface conversion card (14),

Described optical fiber communication board (2) is connected with environment control algolithm board (13) by fiber transmission link (3), environment gathers Driver Card (5) and is connected with analog to digital conversion board or interface conversion card (14) by digital data transmission link (6), environment gathers Driver Card (5) by driving signal transmission link (7) to be connected with multiple actuator (8), analog to digital conversion board (14) is connected with multiple sensors (17) by low-voltage analog signal transmission link (16), described multiple sensors (17) is arranged on described photoetching projection objective lens (9), described multiple actuator (8) is arranged in litho machine environment rack,

Described environment gathers Driver Card (5) and is connected with described nonstandard VME backboard (12) with power supply signal connector (22) by self-defined digital signal front connector (20) respectively, described nonstandard VME backboard (12) by self-defined digital signal after connector (19) be connected with described environment control algolithm board (13).

2. a kind of photoetching projection objective lens environment acquisition control system according to claim 1, it is characterized in that, described control cabinet (1), collection drive cabinet (4) and analog to digital conversion cabinet (15) to be placed in litho machine complete machine control rack, described control cabinet (1) and collection drive the span of the distance B between cabinet (4) and photoetching projection objective lens (9) to be: 10m≤D≤15m, the span of the distance d between described analog to digital conversion cabinet (15) and photoetching projection objective lens (9) is: 2m≤d≤3m.

3. a kind of photoetching projection objective lens environment acquisition control system according to claim 1, it is characterized in that, the high template size of list in the size conforms VME bus system specification of optical fiber communication board (2), have VME bus system specification from functions of modules, connector on optical fiber communication board (2) adopts the P1 connector in VME bus system specification.

4. a kind of photoetching projection objective lens environment acquisition control system according to claim 1, it is characterized in that, on described environment control algolithm board (13), be provided with the joints of optical fibre (18), described optical fiber communication board (2) is connected with the joints of optical fibre (18) by fiber transmission link (3), on described environment collection Driver Card (5), be provided with sensor digital signal connector (21) and drive signal connector (23), described sensor digital signal connector (21) is connected with described analog to digital conversion board or interface conversion card (14) by digital data transmission link (6), described driving signal connector (23) is by driving signal transmission link (7) to be connected with multiple actuator (8).

5. a kind of photoetching projection objective lens environment acquisition control system according to claim 1, it is characterized in that, J1 connector and J2 connector size in connector size conforms VME bus system specification on described nonstandard VME backboard (12), rear strap form size in the size conforms VME bus system specification of environment control algolithm board (13), two high template size in the size conforms VME bus system specification of environment collection Driver Card (5), do not there is principal and subordinate's functions of modules of VME bus system specification, described sensor digital signal connector (21) and driving signal connector (23) adopt respectively P1 connector and the P2 connector in VME bus system specification.

6. a kind of photoetching projection objective lens environment acquisition control system according to claim 1, is characterized in that, the P1 connector that described environment gathers Driver Card (5) transmits self-defined digital signal, and P2 connector transmits self-defined power supply signal.

7. the control of the photoetching projection objective lens environment acquisition control system based on described in above-mentioned any one claim, is characterized in that, the method comprises the steps:

Step 1: the master control board card (11) in control cabinet (1) is from the control command of complete machine environmental control system reception environment parameter, and this order is sent to optical fiber communication board (2) by standard VME backboard (10), optical fiber communication board (2) is transmitted it to and is gathered in the environment control algolithm board (13) driving in cabinet (4) by fiber transmission link (3) and the joints of optical fibre (18) after control command is encapsulated;

Step 2: environment control algolithm board (13) is resolved control command, start servocontrol, first by connector (19) after the self-defined digital signal on nonstandard VME backboard (12) and self-defined digital signal front connector (20), driving signal is sent to environment and gathers Driver Card (5), environment gathers Driver Card (5) and obtains power supply by power supply signal connector (22), and by driving signal connector (23) and driving signal transmission link (7) to realize the remote driving to multiple actuator (8), the temperature of the interior environment of photoetching projection objective lens (9), the environmental parameters such as pressure are gathered by multiple sensors (17), and transfer to by low-voltage analog signal transmission link (16) in the analog to digital conversion board or interface conversion card (14) of analog to digital conversion cabinet (15), analog to digital conversion board (14) is to the temperature collecting, the environmental parameters such as pressure are carried out analog to digital conversion, and digital displacement signal is transferred in environment collection Driver Card (5) by digital data transmission link (6) and digital sensor signal connector (21), environment gathers Driver Card (5) and resolves after this digital signal, by connector (19) after the self-defined digital signal on nonstandard VME backboard (12) and self-defined digital signal front connector (20), environmental parameter signals is fed back to environment control algolithm board (13), so far complete an operation of controlling servo period,

Step 3: the environmental parameter signals Correction and Control algorithm parameter that environment control algolithm board (13) obtains by feedback, repeating step two, until complete servo adjusting;

Step 4: complete after an environmental parameter adjusting, environment control algolithm board (13) transfers to optical fiber communication board (2) by the joints of optical fibre (18) and fiber transmission link (3) by adjusting result, optical fiber communication board (2) is notified master control board card (11) by standard VME backboard (10) by the mode of interrupting by warp after regulating result to resolve, and master control board card (11) sends to complete machine control system the control command that environmental parameter has regulated.