CN104019892A - Ultraviolet imager out-of-band spectrum stray light depth cut-off method - Google Patents
Ultraviolet imager out-of-band spectrum stray light depth cut-off method Download PDFInfo
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- CN104019892A CN104019892A CN201410120302.2A CN201410120302A CN104019892A CN 104019892 A CN104019892 A CN 104019892A CN 201410120302 A CN201410120302 A CN 201410120302A CN 104019892 A CN104019892 A CN 104019892A
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Abstract
The invention relates to an ultraviolet imager out-of-band spectrum stray light depth cut-off method which comprises the following steps: reflecting atmospheric radiation into an ultraviolet imager through a reflection optical element; carrying out transmission through a plurality of transmission optical elements; and carrying out filtration through a narrow band optical filter, wherein each transmission optical element is plated with an ultraviolet antireflection film, of which the transmissivity is 96% and the above within a working wave band and the reflection rate reduces 5-10 times beyond the working wave band; the reflection optical element is plated with an ultraviolet high-reflective film, of which the transmissivity is 98% and the above within the working wave band and the transmissivity reduces 5-10 times beyond the working wave band; and the cut-off rate of the narrow band optical filter beyond the ultraviolet working wave band is at least 4OD. According to the ultraviolet imager out-of-band spectrum stray light depth cut-off method, the narrow band optical filter technology which is mainly depended by the out-of-band stray light controlling in the past is dispersed to the reflection, transmission and optical filter elements, so that with the application of the three elements, signals in the system ultraviolet working wave band are guaranteed, and meanwhile, the influence of out-of-band stray light is greatly reduced.
Description
Technical field
The invention belongs to space optical remote technical field, it relates to a kind of method of rejection zone external spectrum veiling glare, relates in particular to a kind of method of ultraviolet imager degree of depth rejection zone external spectrum veiling glare.
Background technology
The strong absorption of the trace gas such as Ozone in Atmosphere to UV radiation and scattering make 0km～40km low latitude UV radiation 2～4 magnitudes a little less than visible/infrared radiation relatively, ultraviolet band scope is more than visible/infrared band narrow range simultaneously, and therefore in ultraviolet remote sensing instrument development, veiling glare level is a very important index.In order to ensure the invertibility of ultraviolet band detectable signal, analog computation knows that facing limit ultraviolet remote sensing instrument band external spectrum veiling glare must be controlled at 10
-6more than magnitude, total veiling glare signal must be better than 1%.Ultraviolet imagery instrument mainly relies on the impact of the outer veiling glare of optical filter check strap at present, optical filter cutoff rate requires very high, more than generally directly requiring 6OD, just not saying Adover company all thinks that this technology is difficult to realize in the world, allow to realize, its cutoff rate is higher also means that optical filter is thicker and price is more expensive, the variation that simultaneously can bring the technical indicator such as useful signal and veiling glare in instrument size, weight, band due to optical filter thickening.
Summary of the invention
The object of the invention is to solve the problems such as optical filter technology is depended in spectrum veiling glare control in current ultraviolet imager development unduly and the development cost that brings is thus higher, propose a kind of method of ultraviolet imager degree of depth rejection zone external spectrum veiling glare.
In order to solve the problems of the technologies described above, technical scheme of the present invention is specific as follows:
A method for ultraviolet imager degree of depth rejection zone external spectrum veiling glare, comprises the following steps:
First, atmosphere radiation is reflected into ultraviolet imager inside by catoptrics original paper;
Then, the transmission of the multiple transmission optical components of process;
Again then, filter through narrow band pass filter;
Wherein, on each described transmission optical component, be coated with 96% above transmissivity in service band, the ultraviolet anti-reflection film that the decline of service band external reflection rate is 5～10 times; It is interior more than 98% that described catoptrics original paper is coated with service band, the ultraviolet high-reflecting film of 5～10 times of reflectivity of the outer transmissivity decline of service band; The outer cutoff rate of described narrow band pass filter ultraviolet service band is at least 4OD.
In technique scheme, described multiple transmission optical components are 7 lens.
The present invention has following beneficial effect:
The method of ultraviolet imager degree of depth rejection zone external spectrum veiling glare of the present invention, be distributed in reflection, transmission and filter elements control the narrow band pass filter technology of being with outer veiling glare mainly to rely in the past, three applies jointly, ensureing in system ultraviolet service band in signal, greatly reduce the outer veiling glare impact of band, system rejection zone external spectrum veiling glare can reach 10
-6above, the outer veiling glare impact of total band is less than 0.5%, and for space ultraviolet atmosphere imaging detection provides higher signal to noise ratio (S/N ratio), meanwhile, whole system is simple in structure, is distributed to three kinds of coating techniques on optical element and also easily realizes, and cost is lower.
Brief description of the drawings
Below in conjunction with the drawings and specific embodiments, the present invention is described in further detail.
Fig. 1 is the relatively strong and weak schematic diagram that changes of ultraviolet imager spectral radiance of the present invention;
Fig. 2 is that reflective optical devices of the present invention is accompanied plating sheet spectral reflectivity schematic diagram;
Fig. 3 is that transmission optical component of the present invention is accompanied plating sheet spectral-transmission favtor schematic diagram;
Fig. 4 is narrow band pass filter transmitance schematic diagram of the present invention;
Fig. 5 is narrow band pass filter 10 of the present invention
4magnitude cutoff rate schematic diagram;
Embodiment
Invention thought of the present invention is:
The method of ultraviolet imager degree of depth rejection zone external spectrum veiling glare of the present invention is according to optical design, in conjunction with coating technique, outer the band that in the past mainly relied on optical filter to realize veiling glare control is distributed to each optical element, develop respectively the unit such as reflective optical devices, transmission optical component and narrow band pass filter, a few person's actings in conjunction.Described reflective optical devices need plate the ultraviolet high-reflecting film of 5～10 times of 98% above reflectivity in service band, the decline of service band external reflection rate; In described narrow band pass filter ultraviolet service band, transmitance is high as far as possible, the outer cutoff rate 4OD of service band; Sequencing is not fixed in described each optical unit acting in conjunction, and general according to best sequence of optical design optimization and position, each optical unit role does not change; Signal is after reflective optical devices, and the useful signal in ultraviolet service band is decayed hardly, and signal outside service band can be decayed 5～10 times; In like manner, signal also can produce same effect after transmission optical component, and every decay that all can equal proportion through a transmission; Signal is after narrow band pass filter, and the signal outside service band also has one 10
4falling sharply doubly, the signal that now arrives detector will be that in service band, signal occupies absolute predominance, veiling glare effect of signals is very little.
Below in conjunction with drawings and the specific embodiments, the present invention is described further.
Referring to accompanying drawing 1, suppose that ultraviolet imager detectable signal ultraviolet service band is than visible/low 4 magnitudes of infrared band, the relative spectral transfer efficiency that the method for a kind of ultraviolet imager degree of depth rejection zone external spectrum veiling glare of the present invention is passed through reflective optical devices 1, transmission optical component 2 and narrow band pass filter 3 successively, while arriving detector 4, in service band, signal is only decayed less than 3 times, and band external spectrum veiling glare signal has decayed to 10
-6below, thus realize atmosphere ultraviolet band acquisition of signal.
Embodiment
The present invention application to as if the ultraviolet developed of Changchun ray machine face limit imager 300nm passage, instrument will face the reflection of limit 0km～80km height atmosphere radiation by its preposition plane mirror and enter instrument internal, through a lens system being formed by 7 lens, through ultraviolet narrow band pass filter filtering overwhelming majority band stray light, finally converge and be imaged on focal plane again.
Accompanying drawing 1 can be used to represent that actual signal faces each element front and back UV radiation of limit imager by ultraviolet and changes with the relative intensity of visible/infrared radiation, can find out that 0km～40km low latitude maximum differs the ultraviolet of 4 magnitudes, visible/infrared spectral radiant after ultraviolet is faced limit imager, ultraviolet service band is only decayed less than 3 times, and visible/infrared spectroscopy signals at least decays to 10
-6below;
Accompanying drawing 2 faces the preposition plane mirror evaporation of limit imager high-reflecting film for Lambda950 actual measurement ultraviolet and accompanies plating sheet reflectivity result;
Accompanying drawing 3 faces the limit two-sided anti-reflection film of imager lens combination monolithic eyeglass evaporation for Lambda950 actual measurement ultraviolet and accompanies plating sheet transmissivity result;
Accompanying drawing 4 and accompanying drawing 5 face limit imager 300nm narrow band pass filter transmissivity and cutoff rate result for Lambda950 surveys ultraviolet.
Obviously, above-described embodiment is only for example is clearly described, and the not restriction to embodiment.For those of ordinary skill in the field, can also make other changes in different forms on the basis of the above description.Here without also giving exhaustive to all embodiments.And the apparent variation of being extended out thus or variation are still among the protection domain in the invention.
Claims (2)
1. a method for ultraviolet imager degree of depth rejection zone external spectrum veiling glare, is characterized in that, comprises the following steps:
First, atmosphere radiation is reflected into ultraviolet imager inside by catoptrics original paper;
Then, the transmission of the multiple transmission optical components of process;
Again then, filter through narrow band pass filter;
Wherein, on each described transmission optical component, be coated with 96% above transmissivity in service band, the ultraviolet anti-reflection film that the decline of service band external reflection rate is 5～10 times; It is interior more than 98% that described catoptrics original paper is coated with service band, the ultraviolet high-reflecting film of 5～10 times of reflectivity of the outer transmissivity decline of service band; The outer cutoff rate of described narrow band pass filter ultraviolet service band is at least 4OD.
2. method according to claim 1, is characterized in that, described multiple transmission optical components are 7 lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410120302.2A CN104019892A (en) | 2014-03-27 | 2014-03-27 | Ultraviolet imager out-of-band spectrum stray light depth cut-off method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410120302.2A CN104019892A (en) | 2014-03-27 | 2014-03-27 | Ultraviolet imager out-of-band spectrum stray light depth cut-off method |
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| CN104019892A true CN104019892A (en) | 2014-09-03 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410120302.2A Pending CN104019892A (en) | 2014-03-27 | 2014-03-27 | Ultraviolet imager out-of-band spectrum stray light depth cut-off method |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000065318A1 (en) * | 1999-04-27 | 2000-11-02 | Euv Limited Liability Corporation | Dual-domain point diffraction interferometer |
| CN101236297A (en) * | 2008-01-31 | 2008-08-06 | 北京控制工程研究所 | Ultraviolet moon sensor optical system |
-
2014
- 2014-03-27 CN CN201410120302.2A patent/CN104019892A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000065318A1 (en) * | 1999-04-27 | 2000-11-02 | Euv Limited Liability Corporation | Dual-domain point diffraction interferometer |
| CN101236297A (en) * | 2008-01-31 | 2008-08-06 | 北京控制工程研究所 | Ultraviolet moon sensor optical system |
Non-Patent Citations (2)
| Title |
|---|
| 王正凤等: "日盲紫外告警系统中成像滤光片的研制", 《中国激光》 * |
| 薛庆生: "用于大气临边探测的紫外全景成像仪光学设计", 《光学学报》 * |
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Application publication date: 20140903 |