CN103984204A - Preparation method of lubricating film - Google Patents
Preparation method of lubricating film Download PDFInfo
- Publication number
- CN103984204A CN103984204A CN201410218285.6A CN201410218285A CN103984204A CN 103984204 A CN103984204 A CN 103984204A CN 201410218285 A CN201410218285 A CN 201410218285A CN 103984204 A CN103984204 A CN 103984204A
- Authority
- CN
- China
- Prior art keywords
- ultraviolet light
- middle layer
- light curing
- etching
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Micromachines (AREA)
- Drying Of Semiconductors (AREA)
Abstract
The invention discloses a preparation method of a lubricating film. The preparation method comprises the steps of pretreating a film layer on the surface of a substrate; carrying out spin coating on a photoresist, heating, and then carrying out ultraviolet-curing to form a middle layer; forming an ultraviolet-cured nano embossing rubber layer; pressing a soft embossing template in the ultraviolet-cured nano embossing rubber layer, exposing under an ultraviolet lamp; etching to remove ultraviolet-cured nano embossing rubber left on an unexposed place, exposing the middle layer; etching the middle layer by taking the ultraviolet-cured nano embossing rubber layer as a mask layer, and exposing a thin film layer, etching the film layer by using the ultraviolet-cured nano embossing rubber layer and the middle layer as mask layers so as to form a micro-nano structure on the film layer; and removing the ultraviolet-cured nano embossing rubber layer and the middle layer to obtain the required lubricating thin film. According to the preparation method, by using a soft embossing and nano embossing compounding technology, the required pattern is effectively transferred on the film, and the lubricating film with the micro-nano structure can be prepared on an irregular non-plane. The preparation method has the characteristics of high efficiency, low cost and high resolution.
Description
Technical field
The present invention relates to a kind of preparation method of film, be specifically related to the preparation method that a kind of surface has the composite lubricating film of micro-nano structure.
Background technology
Research shows, in friction system, friction force is also not exclusively directly proportional to surfaceness.For example, in mechanical drive pair, when slide unit surfaceness reaches micro/nano level or atom level, friction force increases on the contrary greatly.And prepare at material surface the tribological property that bionical microstructure can effectively be improved (comprising surface micro-pit, surperficial microprotrusion, Surface Texture, non-smooth surface) slidingsurface.For example, within 1991, Ranjan adopts laser technology to process by 20 microns of diameters in the starting stop zone of hard disc of computer disc, and the dot matrix that the pit of dark 10 nanometer left and right forms, has successfully reduced the friction of disc and magnetic head, has extended serviceable life; Within 2000, Honda Company adopts small Ceramic Balls high velocity jet method to process the rubbing surface of piston, forms the pit of stochastic distribution, 200 microns of diameters, and dark several microns, present obvious friction reducing effect, reduce the whole mechanical loss of engine and reach 2.2%.Because thereby the key that reduces friction, reduces the mission life of wearing and tearing prolongation moving component and improve its operational reliability is at the moved lubricant that acts on surface of friction pair, therefore, at surface of friction pair, composite lubricating film is set significant for improving performance.
In prior art, material surface structure adopts the method for conventional lithography and Laser Processing to obtain conventionally.For example, Sweden researchist U. Pettersson and S. Jacobson adopts standard photolithography techniques in silicon base, to make micrometer structure pattern, and depositing diamond-like film (DLC film) then, to improve toughness, frictional behaviour and the lubricity of film.The people such as France researchist C. Chouquet adopt Laser lithography directly on DLC film, to prepare microstructure, to improve frictional behaviour.
Adopt prior art on film, to prepare micro-nano structure, need expensive optical system equipment, its cost of manufacture is high; Due to the diffraction phenomena in photolithographic exposure, resolution can not be settled properly.Therefore how can guarantee film toughness, frictional behaviour and lubricity, simultaneously again can be low-cost, high resolving power and the structure of making simply and effectively film surface, be to need at present the problem that solves.
Summary of the invention
Goal of the invention of the present invention is to provide a kind of preparation method of composite lubricating film, to realize low cost, the making of high-resolution composite lubricating film, and can on curved surface and irregular on-plane surface, prepare high-resolution nanostructured, thereby improve toughness, frictional behaviour and the greasy property of film.
To achieve the above object of the invention, the technical solution used in the present invention is: a kind of preparation method of composite lubricating film, comprises the steps:
(1) thin layer on substrate surface is carried out to pre-service, to remove surface dirt;
(2) spin coating SU-8 photoresist on thin layer, ultra-violet curing after heating, forms middle layer;
(3) spin coating ultraviolet light curing nano impression glue on middle layer, forms ultraviolet light curing nano impression glue-line;
(4) soft impression block is pressed into ultraviolet light curing nano impression glue-line, under uviol lamp, exposes, after end exposure, remove soft impression block, on the lower surface of described soft impression block, establish micro-nano structure pattern;
(5) ultraviolet light curing nano residual when etching is removed impression impresses glue, exposes middle layer;
(6) using ultraviolet light curing nano impression glue-line as mask layer, the SU-8 photoresist in etching middle layer, exposes thin layer;
(7) using ultraviolet light curing nano impression glue-line and middle layer as mask, etched film layer forms micro-nano structure on thin layer;
(8) remove ultraviolet light curing nano impression glue-line and middle layer, obtain required composite lubricating film.
Above, the surface of described substrate can be plane or curved surface.SU-8 photoresist is the negative photoresist of a kind of epoxy type, black light, and it is based on epoxy SU-8 resin (deriving from rubber industry).Owing to containing 8 epoxy radicals in an average molecule, gain the name.SU-8 photoresist absorptivity in near-ultraviolet range is low, and this makes it on whole photoresist thickness, have good exposition uniformity, thereby is particularly suitable for needing the application of high-aspect-ratio on thick bottom.
In technique scheme, in step (1), described pre-service is nitrogen blowing, and purge time is 30～120 seconds.Nitrogen adopts 99.999% high pure nitrogen.
Preferred technical scheme, the thickness in middle layer is 300～1000 nanometers, the thickness of ultraviolet light curing nano impression glue-line is 100～300 nanometers.
In technique scheme, adopt gas etching method, the etching gas of described ultraviolet light curing nano impression glue-line is the mixed gas of oxygen and fluoroform, and the volume ratio of oxygen and fluoroform is 4: 1; The etching gas in described middle layer is oxygen.
Preferred technical scheme, described film is Diamond-like Carbon film, and in step (7), the etching of film adopts gas etching method, and etching gas is the mixed gas of oxygen and fluoroform, and the volume ratio of oxygen and fluoroform is 1: 1.
Design based on identical, realizes object of the present invention and also can adopt elder generation in substrate, to prepare micro-nano structure, then the method for deposit film.Concrete scheme is:
A preparation method for composite lubricating film, comprises the steps:
(1) substrate surface is carried out to pre-service, to remove surface dirt;
(2) spin coating SU-8 photoresist in substrate, ultra-violet curing after heating, forms middle layer;
(3) spin coating ultraviolet light curing nano impression glue on middle layer, forms ultraviolet light curing nano impression glue-line;
(4) soft impression block is pressed into ultraviolet light curing nano impression glue-line, under uviol lamp, exposes, after end exposure, remove soft impression block, on the lower surface of described soft impression block, establish micro-nano structure pattern;
(5) ultraviolet light curing nano residual when etching is removed impression impresses glue, exposes middle layer;
(6) using ultraviolet light curing nano impression glue-line as mask layer, the SU-8 photoresist in etching middle layer, exposes thin layer;
(7) using ultraviolet light curing nano impression glue-line and middle layer as mask, etching substrate forms micro-nano structure in substrate;
(8) remove ultraviolet light curing nano impression glue-line and middle layer;
(9) there is the substrate surface deposit thin film layers of micro-nano structure, obtaining having the composite lubricating film of micro-nano structure.
In technique scheme, in step (1), described pre-service is nitrogen blowing, and purge time is 30～120 seconds.
The thickness in middle layer is 300～1000 nanometers, and the thickness of ultraviolet light curing nano impression glue-line is 100～300 nanometers.
In step (5) and step (6), adopt gas etching method, the etching gas of described ultraviolet light curing nano impression glue-line is the mixed gas of oxygen and fluoroform, and the volume ratio of oxygen and fluoroform is 4: 1; The etching gas in described middle layer is oxygen.
In step (9), the thin layer of deposition is diamond like carbon film.
Because technique scheme is used, the present invention compared with prior art has following advantages:
1, the present invention utilizes soft impression composite Nano stamping technique, effectively by required design transfer to film, can on irregular on-plane surface, prepare the composite lubricating film of micro-nano structure.
2, the present invention is provided with middle layer in preparation process, and 1. the substrate surface of composite lubricating film is generally irregular, and middle layer can change irregular substrate surface, thereby makes impression obtain good effect; 2. the degree of adhesion that impresses glue and film substrate is lower, by middle layer, can guarantee that glued membrane is attached to substrate surface well; 3. in the soft impression of composite Nano, because the degree of depth of soft template is less, so the depth of pattern being replicated on imprint lithography glue-line can be very not dark yet, if there is no middle layer, the height of mask layer just depends on the height of soft template pattern, by middle layer is set, can determine selectively mask layer height.
3, the present invention has efficiently, low cost, high-resolution feature.
4, the present invention is applicable to the structure fabrication of curved surface, can meet the design transfer of non-planar substrate.
Accompanying drawing explanation
Fig. 1 is the process schematic diagram of embodiment midplane composite Nano impression;
Fig. 2 is the SEM figure of the film of preparation in embodiment mono-;
Wherein: 1, thin layer; 2, middle layer; 3, ultraviolet light curing nano impression glue-line; 4, soft impression lamina membranacea.
Embodiment
Below in conjunction with drawings and Examples, the invention will be further described:
Embodiment mono-: a kind of preparation method of composite lubricating film, adopt UV-cured imprint lithography techniques (UV-NIL), and on silicon substrate, the diamond like carbon film of dopant deposition element silicon is prepared nano-pattern.
Referring to accompanying drawing 1, first thin layer 1 surface is processed, with high pure nitrogen, blow down surperficial dust and foreign matter, the time is about 1 minute; Then SU-8 photoresist is spin-coated on to thin layer surface, thickness is 500nm left and right, and the sample of spin coating SU-8 photoresist is exposed 1 minute under 1000W uviol lamp, then 110 ℃ of heating of the sample after exposure is solidified for 5 minutes, forms middle layer 2; Then by spin coating UV ultra-violet curing glue on the sample after solidifying, thickness is 200nm, forms ultraviolet light curing nano impression glue-line 3; Then use the soft impression lamina membranacea 4 with structure to cover whole sample, will cover completely sample and under 1000W uviol lamp, expose and solidify for 1 minute, the soft impression lamina membranacea after curing is removed, wait for the etching of remaining glue-line.
Sample after impression is removed the UV ultra-violet curing glue of remnant layer with reactive ion etching machine, and etching is gases used is O
2and CHF
3mixed gas, blending ratio is 4:1; Then with UV ultra-violet curing glue-line, do mask layer figure is transferred to SU-8 photoresist layer, etching gas is O
2.Then use UV ultra-violet curing glue and SU-8 photoresist cured layer as mask layer etching diamond like carbon film, etching gas is O
2and CHF
3mixed gas, blending ratio is 1:1.Finally with resist remover, the mask glue-line of film surface is removed, it is O that resist remover is selected gas
2.
Shown in accompanying drawing 2, in figure, left side A is partly the film SEM planimetric map with nano-pattern; Right side B is partly the film SEM sectional view with nano-pattern.As seen from the figure, the micro-nano structure on the film that the method for employing the present embodiment obtains has high-resolution feature.
Embodiment bis-: a kind of preparation method of composite lubricating film, adopt UV-cured imprint lithography techniques (UV-NIL), and there iing the diamond like carbon film of the Sapphire Substrate surface deposition doped silicon element of warpage rate to prepare nano-pattern.
First curved substrate surface is processed, with high pure nitrogen, blow down surperficial dust and foreign matter, the time is about 1 minute; Then SU-8 photoresist is spin-coated on to thin layer surface, thickness is 400nm left and right, and the sample of spin coating SU-8 photoresist is exposed 1 minute under 1000W uviol lamp, then 110 ℃ of heating of the sample after exposure is solidified for 5 minutes, forms middle layer; Then by spin coating UV ultra-violet curing glue on the sample after solidifying, thickness is 150nm, forms ultraviolet light curing nano impression glue-line; Then use the soft impression lamina membranacea with structure to cover whole sample, will cover completely sample and under 1000W uviol lamp, expose and solidify for 1 minute, the soft impression lamina membranacea after solidifying is removed, wait for the etching of remaining glue-line.
Sample after impression is removed the UV ultra-violet curing glue of remnant layer with reactive ion etching machine, and etching is gases used is O
2and CHF
3mixed gas, blending ratio is 4:1; Then with UV ultra-violet curing glue-line, do mask layer figure is transferred to SU-8 photoresist layer, etching gas is O
2.Then with UV ultra-violet curing glue and SU-8 photoresist cured layer as mask layer etching Sapphire Substrate, can be wet etching, with the acid mixture of sulfuric acid and phosphoric acid, etching temperature is 90 ℃ or is less than 90 ℃, etch rate is 1 ~ 2 nm/minute; Also can be Cl
2reactive ion etching process dry etching.Finally with resist remover, the mask glue-line of film surface is removed, it is O that resist remover is selected gas
2.
There is the Sapphire Substrate surface deposition Diamond-like Carbon thin layer of micro-nano structure, obtaining having the composite lubricating film of micro-nano structure.
Claims (10)
1. a preparation method for composite lubricating film, is characterized in that, comprises the steps:
(1) thin layer on substrate surface is carried out to pre-service, to remove surface dirt;
(2) spin coating SU-8 photoresist on thin layer, ultra-violet curing after heating, forms middle layer;
(3) spin coating ultraviolet light curing nano impression glue on middle layer, forms ultraviolet light curing nano impression glue-line;
(4) soft impression block is pressed into ultraviolet light curing nano impression glue-line, under uviol lamp, exposes, after end exposure, remove soft impression block, on the lower surface of described soft impression block, establish micro-nano structure pattern;
(5) ultraviolet light curing nano residual when etching is removed impression impresses glue, exposes middle layer;
(6) using ultraviolet light curing nano impression glue-line as mask layer, the SU-8 photoresist in etching middle layer, exposes thin layer;
(7) using ultraviolet light curing nano impression glue-line and middle layer as mask, etched film layer forms micro-nano structure on thin layer;
(8) remove ultraviolet light curing nano impression glue-line and middle layer, obtain required composite lubricating film.
2. the preparation method of composite lubricating film according to claim 1, is characterized in that: in step (1), described pre-service is nitrogen blowing, and purge time is 30～120 seconds.
3. the preparation method of composite lubricating film according to claim 1, is characterized in that: the thickness in middle layer is 300～1000 nanometers, and the thickness of ultraviolet light curing nano impression glue-line is 100～300 nanometers.
4. the preparation method of composite lubricating film according to claim 1, it is characterized in that: adopt gas etching method, the etching gas of described ultraviolet light curing nano impression glue-line is the mixed gas of oxygen and fluoroform, and the volume ratio of oxygen and fluoroform is 4: 1; The etching gas in described middle layer is oxygen.
5. the preparation method of composite lubricating film according to claim 1, it is characterized in that: described film is Diamond-like Carbon film, in step (7), the etching of film adopts gas etching method, etching gas is the mixed gas of oxygen and fluoroform, and the volume ratio of oxygen and fluoroform is 1: 1.
6. a preparation method for composite lubricating film, is characterized in that, comprises the steps:
(1) substrate surface is carried out to pre-service, to remove surface dirt;
(2) spin coating SU-8 photoresist in substrate, ultra-violet curing after heating, forms middle layer;
(3) spin coating ultraviolet light curing nano impression glue on middle layer, forms ultraviolet light curing nano impression glue-line;
(4) soft impression block is pressed into ultraviolet light curing nano impression glue-line, under uviol lamp, exposes, after end exposure, remove soft impression block, on the lower surface of described soft impression block, establish micro-nano structure pattern;
(5) ultraviolet light curing nano residual when etching is removed impression impresses glue, exposes middle layer;
(6) using ultraviolet light curing nano impression glue-line as mask layer, the SU-8 photoresist in etching middle layer, exposes thin layer;
(7) using ultraviolet light curing nano impression glue-line and middle layer as mask, etching substrate forms micro-nano structure in substrate;
(8) remove ultraviolet light curing nano impression glue-line and middle layer;
(9) there is the substrate surface deposit thin film layers of micro-nano structure, obtaining having the composite lubricating film of micro-nano structure.
7. the preparation method of composite lubricating film according to claim 6, is characterized in that: in step (1), described pre-service is nitrogen blowing, and purge time is 30～120 seconds.
8. the preparation method of composite lubricating film according to claim 6, is characterized in that: the thickness in middle layer is 300～1000 nanometers, and the thickness of ultraviolet light curing nano impression glue-line is 100～300 nanometers.
9. the preparation method of composite lubricating film according to claim 6, it is characterized in that: adopt gas etching method, the etching gas of described ultraviolet light curing nano impression glue-line is the mixed gas of oxygen and fluoroform, and the volume ratio of oxygen and fluoroform is 4: 1; The etching gas in described middle layer is oxygen.
10. the preparation method of composite lubricating film according to claim 6, is characterized in that: in step (9), the thin layer of deposition is diamond like carbon film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410218285.6A CN103984204A (en) | 2014-05-22 | 2014-05-22 | Preparation method of lubricating film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410218285.6A CN103984204A (en) | 2014-05-22 | 2014-05-22 | Preparation method of lubricating film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103984204A true CN103984204A (en) | 2014-08-13 |
Family
ID=51276227
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410218285.6A Pending CN103984204A (en) | 2014-05-22 | 2014-05-22 | Preparation method of lubricating film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103984204A (en) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106159117A (en) * | 2016-09-14 | 2016-11-23 | Tcl集团股份有限公司 | A kind of method for packing improving QLED device stability and encapsulating structure |
| CN107085353A (en) * | 2017-05-18 | 2017-08-22 | 苏州光越微纳科技有限公司 | A kind of method for stamping of three wieners micrographics |
| CN110561745A (en) * | 2019-10-15 | 2019-12-13 | 广州捷和电子科技有限公司 | Super lubricating film of gas permeability |
| CN111606300A (en) * | 2020-05-26 | 2020-09-01 | 杭州欧光芯科技有限公司 | Method for manufacturing high aspect ratio nano grating |
| CN112109258A (en) * | 2020-09-04 | 2020-12-22 | 杭州俊为科技有限责任公司 | Film and preparation technology thereof |
| CN112951707A (en) * | 2019-12-11 | 2021-06-11 | 株洲中车时代电气股份有限公司 | Film and preparation method and application thereof |
| CN113060939A (en) * | 2021-03-15 | 2021-07-02 | 蓝思科技股份有限公司 | Method for forming frosting by dry etching substrate, frosting substrate and application |
| CN113097343A (en) * | 2021-03-31 | 2021-07-09 | 杭州欧光芯科技有限公司 | Large-area processing technology for preparing titanium dioxide super lens |
| CN113307223A (en) * | 2021-04-20 | 2021-08-27 | 杭州欧光芯科技有限公司 | Method for modifying local hydrophilicity and hydrophobicity of nanopore |
| CN113752716A (en) * | 2021-08-12 | 2021-12-07 | 江苏大学 | Preparation of patterned super-hydrophilic-hydrophobic water transfer printing film and water transfer printing method thereof |
| CN114415468A (en) * | 2021-12-31 | 2022-04-29 | 美盛隆制罐（惠州）有限公司 | Preparation method of anti-counterfeiting micro-nano structure pattern based on nanoimprint technology |
| CN115367698A (en) * | 2022-06-01 | 2022-11-22 | 华南理工大学 | Novel InP nanowire array and preparation method thereof |
| CN115542660A (en) * | 2022-09-27 | 2022-12-30 | 苏州光舵微纳科技股份有限公司 | Correction method of nano-imprint micro-pore mask based on dry etching process |
| WO2023000224A1 (en) * | 2021-07-21 | 2023-01-26 | 深圳清华大学研究院 | Super-smooth skeleton having buried electrodes and production method therefor |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101140420A (en) * | 2006-09-08 | 2008-03-12 | 台湾积体电路制造股份有限公司 | Photoresist composition and method of forming a resist pattern |
| US20080105649A1 (en) * | 2006-11-02 | 2008-05-08 | Chandrachood Madhavi R | Etching of nano-imprint templates using an etch reactor |
| CN101181836A (en) * | 2007-12-13 | 2008-05-21 | 复旦大学 | Method for copying nano imprint template |
| CN102279517A (en) * | 2010-06-14 | 2011-12-14 | 清华大学 | Nano-imprinting method |
| CN102910579A (en) * | 2012-09-26 | 2013-02-06 | 华中科技大学 | Nanoimprinting method capable of improving depth-to-width ratio of graph and product thereof |
-
2014
- 2014-05-22 CN CN201410218285.6A patent/CN103984204A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101140420A (en) * | 2006-09-08 | 2008-03-12 | 台湾积体电路制造股份有限公司 | Photoresist composition and method of forming a resist pattern |
| US20080105649A1 (en) * | 2006-11-02 | 2008-05-08 | Chandrachood Madhavi R | Etching of nano-imprint templates using an etch reactor |
| CN101181836A (en) * | 2007-12-13 | 2008-05-21 | 复旦大学 | Method for copying nano imprint template |
| CN102279517A (en) * | 2010-06-14 | 2011-12-14 | 清华大学 | Nano-imprinting method |
| CN102910579A (en) * | 2012-09-26 | 2013-02-06 | 华中科技大学 | Nanoimprinting method capable of improving depth-to-width ratio of graph and product thereof |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106159117A (en) * | 2016-09-14 | 2016-11-23 | Tcl集团股份有限公司 | A kind of method for packing improving QLED device stability and encapsulating structure |
| CN107085353A (en) * | 2017-05-18 | 2017-08-22 | 苏州光越微纳科技有限公司 | A kind of method for stamping of three wieners micrographics |
| CN110561745A (en) * | 2019-10-15 | 2019-12-13 | 广州捷和电子科技有限公司 | Super lubricating film of gas permeability |
| CN112951707A (en) * | 2019-12-11 | 2021-06-11 | 株洲中车时代电气股份有限公司 | Film and preparation method and application thereof |
| CN111606300A (en) * | 2020-05-26 | 2020-09-01 | 杭州欧光芯科技有限公司 | Method for manufacturing high aspect ratio nano grating |
| CN112109258A (en) * | 2020-09-04 | 2020-12-22 | 杭州俊为科技有限责任公司 | Film and preparation technology thereof |
| CN113060939A (en) * | 2021-03-15 | 2021-07-02 | 蓝思科技股份有限公司 | Method for forming frosting by dry etching substrate, frosting substrate and application |
| CN113097343A (en) * | 2021-03-31 | 2021-07-09 | 杭州欧光芯科技有限公司 | Large-area processing technology for preparing titanium dioxide super lens |
| CN113307223A (en) * | 2021-04-20 | 2021-08-27 | 杭州欧光芯科技有限公司 | Method for modifying local hydrophilicity and hydrophobicity of nanopore |
| WO2023000224A1 (en) * | 2021-07-21 | 2023-01-26 | 深圳清华大学研究院 | Super-smooth skeleton having buried electrodes and production method therefor |
| CN113752716A (en) * | 2021-08-12 | 2021-12-07 | 江苏大学 | Preparation of patterned super-hydrophilic-hydrophobic water transfer printing film and water transfer printing method thereof |
| CN114415468A (en) * | 2021-12-31 | 2022-04-29 | 美盛隆制罐（惠州）有限公司 | Preparation method of anti-counterfeiting micro-nano structure pattern based on nanoimprint technology |
| CN115367698A (en) * | 2022-06-01 | 2022-11-22 | 华南理工大学 | Novel InP nanowire array and preparation method thereof |
| CN115367698B (en) * | 2022-06-01 | 2023-09-26 | 华南理工大学 | Novel InP nanowire array and preparation method thereof |
| CN115542660A (en) * | 2022-09-27 | 2022-12-30 | 苏州光舵微纳科技股份有限公司 | Correction method of nano-imprint micro-pore mask based on dry etching process |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103984204A (en) | Preparation method of lubricating film | |
| US8616873B2 (en) | Micro-conformal templates for nanoimprint lithography | |
| US8241535B2 (en) | Method for transcribing patterns on resin body, method for manufacturing planar waveguide, and method for manufacturing micro-lens | |
| CN101823690B (en) | Manufacturing method of SU-8 nano fluid system | |
| CN101692151B (en) | Method for manufacturing silicon nano-wire based on soft template nano-imprinting technique | |
| US7939131B2 (en) | Method to provide a layer with uniform etch characteristics | |
| US7122079B2 (en) | Composition for an etching mask comprising a silicon-containing material | |
| CN111606300A (en) | Method for manufacturing high aspect ratio nano grating | |
| Lan | Soft UV nanoimprint lithography and its applications | |
| JP2007266384A (en) | Mold for imprinting and manufacturing method thereof | |
| US7282550B2 (en) | Composition to provide a layer with uniform etch characteristics | |
| CN111308597A (en) | Preparation method of submicron structure grating | |
| Kim et al. | Fabrication of inverse micro/nano pyramid structures using soft UV-NIL and wet chemical methods for residual layer removal and Si-etching | |
| Sun et al. | Fabrication of the similar porous alumina silicon template for soft UV nanoimprint lithography | |
| WO2006023297A1 (en) | Method and composition to provide a layer with uniform etch characteristics | |
| KR101575879B1 (en) | Patterning method using reversal imprint process | |
| Handte et al. | Manufacturing of nanostructures with high aspect ratios using soft UV-nanoimprint lithography with bi-and trilayer resist systems | |
| KR101369736B1 (en) | Manufacturing method of mold for nanolens array and manufacturing method of nanolens array using mold manufactured by the same | |
| JP4889316B2 (en) | A manufacturing method of a three-dimensional structure, a three-dimensional structure, an optical element, a stencil mask, a manufacturing method of a finely processed product, and a manufacturing method of a fine pattern molded product. | |
| EP1614004B1 (en) | Positive tone bi-layer imprint lithography method and compositions therefor | |
| Zhu et al. | Non-fully gold nanohole array fabricated by nanoimprint lithography | |
| Kojima et al. | UV-Nanoimprint Lithography with Film Mold for LED-PSS Fabrication Process | |
| Kang et al. | Rational Design and Fabrication Method for Bioinspired Directional Droplet Sliding Surfaces | |
| CN103529505B (en) | A kind of method of assisting casting process making moire grating based on capillary force | |
| Kreindl et al. | Soft UV-NIL at the 12.5 nm Scale |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20170104 Address after: 215126 Suzhou Industrial Park, Jiangpu Road, No. 39, No. Applicant after: Suzhou Jin Fu Materials Co., Ltd. Address before: Suzhou City, Jiangsu province 215121 Jinji Lake Avenue, Suzhou Industrial Park, No. 99 Applicant before: Suzhou Jinyuan Nano Science & Technology Co., Ltd. Applicant before: Nanjing Fengqiang Nano Technology Co., Ltd. |
|
| CB02 | Change of applicant information |
Address after: 215126 No. 39, Jiangpu Road, Suzhou Industrial Park, Jiangsu Province Applicant after: Suzhou Jin Fu technology Limited by Share Ltd Address before: 215126 Suzhou Industrial Park, Jiangpu Road, No. 39, No. Applicant before: Suzhou Jinfu New Material Co., Ltd. |
|
| CB02 | Change of applicant information | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20140813 |
|
| RJ01 | Rejection of invention patent application after publication |