CN103969843A - Method for enhancing excitation intensity of surface plasma light field - Google Patents
Method for enhancing excitation intensity of surface plasma light field Download PDFInfo
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- CN103969843A CN103969843A CN201410174953.XA CN201410174953A CN103969843A CN 103969843 A CN103969843 A CN 103969843A CN 201410174953 A CN201410174953 A CN 201410174953A CN 103969843 A CN103969843 A CN 103969843A
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- surface plasma
- light field
- plasma light
- excitation intensity
- multilayer film
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Abstract
The invention discloses a method for enhancing the excitation intensity of a surface plasma light field. An adopted device comprises a transparent substrate, a nano-structure layer, a metal/medium multilayer film and an excitation enhancing layer. The method comprises the steps that the nano-structure layer on the transparent substrate diffracts a lighting plane wave into all levels of secondary plane waves; by the utilization of the optical characteristic of super diffraction spectrum control of the metal/medium multilayer film, all the levels of plane waves produce a specific single level of surface plasma light field after being transmitted through the metal/medium multilayer film; the excitation intensity of the surface plasma light field produced through filtering of the metal/medium multilayer film can be greatly enhanced through the excitation enhancing layer; finally, the evanescent surface plasma light field can be formed on the upper surface of the excitation enhancing layer within the range of 5 nm-50 nm in the longitudinal direction. According to the method, the surface plasma light field which has a highly evanescent local area, high excitation efficiency and a high signal-to-noise ratio can be obtained. The method is expected to be used in structured illumination of super resolution microscopy, interference lithography of the surface plasma, surface microscopy, surface plasma bio-sensing and other fields.
Description
Technical field
The invention belongs to micro-imaging field, relate to a kind of method that strengthens surface plasma light field excitation intensity, be specially adapted to the enhancing that excites of structured illumination in super-resolution imaging and surface plasma interference lithography.
Background technology
Optical microphotograph imaging technique is widely used in the research fields such as biology, cytology, materialogy.For the micro-imaging of sample top layer pattern, the light field illumination sample top layer that suddenly dies that conventionally adopts prism total internal reflection to produce, avoids sample interior scattered light to disturb imaging effect.The along track resolution of total internal reflection micro-imaging technique determines by the skin depth of evanescent wave conventionally, and longitudinal decay of the light field that suddenly dies is faster, and along track resolution is higher.Yet prism excites the Local Characteristic of the produce light field that suddenly dies limited, the along track resolution of total internal reflection micro-imaging technique is 100nm～200nm.For the surface layer information that can clearly observe longitudinal 50nm, even thinner sample, need to excite the light field that suddenly dies that skin depth is less as lighting source.
In recent years, surface plasma (Surface Plasmons, SP) excites the surperficial electromagnetic mode of generation as electromagnetic wave coupling free electron, excite the horizontal wave vector of SP ripple of generation much larger than illumination light wave vector; This means that the light field that suddenly dies that the longitudinal local energy force rate prism total internal reflection of SP ripple produces is stronger.Meanwhile, the super-diffraction of medium/metal multilayer film optical material is learned characteristic provide may for spatial frequency spectrum and transmission amplitude are controlled.Utilize the frequency spectrum cutting of height Local Characteristic and medium/metal multi-layer film material longitudinally of SP ripple, the SP ripple that can realize specific single spatial frequency spectrum is completely as for sample top layer microscope light source.Yet, for medium/metal multilayer film, spatial frequency spectrum to be controlled, the imaginary part of film material absorbs spatial frequency spectrum scope and the impact of transmission amplitude very large.Conventionally medium/metal multilayer film spectral filtering excites the surface plasma light field excitation intensity of generation very low, has greatly reduced the capacity usage ratio of illumination light; The requirement of the minimum detected intensity of detector simultaneously while also having limited the practical application of surface plasma light field.
Summary of the invention
The technical problem to be solved in the present invention is: for medium/metal multilayer film, excite and produce the low problem of surface plasma distribution of light intensity, propose a kind of method that strengthens surface plasma light field excitation intensity.The surface plasma light field that this method for designing can realize the specific single frequency spectrum that suddenly dies excites, and excitation intensity greatly improves.This method for designing can be used for the structured illumination of the aspects such as super-resolution imaging and surface plasma interference lithography.
The present invention solves the technical scheme that its technology adopts: strengthen the device of surface plasma light field excitation intensity, it is characterized in that, described device comprises:
Transparent substrates;
For illumination light diffraction being gone out to the nanostructured layers of secondary flat ripples at different levels;
For being gone out to secondary flat ripples at different levels, illumination light diffraction carries out spatial frequency spectrum scope and the amplitude-modulated medium/metal multilayer film of transmission;
For strengthening the filtering of medium/metal multilayer film, produce the enhancement layer that excites of surface plasma light field excitation intensity.
Wherein, the material of described transparent substrates can be selected quartz or sapphire.
Wherein, described nanostructured layers comprises diffraction structure layer and Wave guide resonance layer two parts; First diffraction structure layer goes out illumination light diffraction secondary flat ripples at different levels; Wave guide resonance layer is for the planarization to diffraction structure layer, and enhancing diffraction goes out the inferior launching efficiency of a specific order in secondary flat ripples at different levels;
Described diffraction structure layer can be lighttight metallic diaphragm material, can be also the media coating material of printing opacity, and the planform of diffraction structure layer can be prepared as regular solid or irregular arbitrary face type; Structure distribution on described diffraction structure layer can be uniform or heterogeneous, can be one dimension or two-dimensional structure; Thickness selects to be generally 20nm～100nm;
The media coating material that described Wave guide resonance layer is printing opacity; Film material can be selected high refractive index medium material oxidation titanium, silicon nitride or silit; Thickness selects to be generally 20nm～200nm.
Wherein, described medium/metal multilayer film is for replacing metal and media coating, and the logarithm scope of medium/metal multilayer film is 2～12; Metallic diaphragm material in medium/metal multilayer film can be selected noble metal gold, silver or aluminium, or selects doping metals; The thickness range of metallic diaphragm is 10nm～40nm, and each metallic diaphragm thickness of preparation can equate, also can gradient thickness; Media coating material can be selected silicon dioxide, alundum (Al2O3) or magnesium fluoride, and the thickness range of media coating is 10nm～80nm, and each media coating thickness of preparation can equate, also can gradient thickness.
Wherein, the thickness range that excites enhancement layer described in is 10nm～50nm; Excite the material of enhancement layer can select noble metal gold, silver or aluminium, or select doping metals.
The present invention provides a kind of method that strengthens surface plasma light field excitation intensity in addition, it is characterized in that: illumination light is from the transparent substrates bottom incident of above-mentioned device, through nanostructured layers, the diffraction of illumination light and medium/metal multilayer film are gone out to spatial frequency spectrum scope and the transmission Modulation and Amplitude Modulation of secondary flat ripples at different levels to diffraction, finally at the upper surface that excites enhancement layer, form the surface plasma light field suddenly dying within the scope of longitudinal 5nm～50nm; The excitation intensity of surface plasma light field greatly improves.
Wherein, illumination light can be ultraviolet light, visible ray, infrared band even.
Wherein, nanostructured layers is diffracted to secondary flat ripples at different levels by illumination light; The structure distribution that changes the diffraction structure layer of nanostructured layers regulates the spatial frequency spectrum of secondary flat ripples at different levels; The resonance excitation layer thickness that changes nanostructured layers regulates the excitation intensity of secondary flats at different levels.
Wherein, the super diffraction spectrum of medium/metal multilayer film is controlled the transmission that optical characteristics realizes single level secondary flat ripple; The logical scope of band of the geometric parameter implementation space frequency spectrum of material parameter, metal and the media coating material of metal and media coating and the adjusting of transmission amplitude in change medium/metal multilayer film.
Wherein, excite enhancement layer design can greatly strengthen the excitation intensity of surface plasma light field.
The present invention compared with prior art has the following advantages: the method that strengthens surface plasma light field excitation intensity in the present invention can provide the high efficiency illumination in top layer in sample 50nm and the thinner degree of depth, in addition, medium/metal multilayer film is in conjunction with exciting enhancement layer can improve approximately 35 times of the excitation intensities of surface plasma light field.This design proposal is provided as structured illumination more degree of freedom is provided, and range of application is wider.The method of enhancing surface plasma light field excitation intensity provided by the invention, can be used for the fields such as the micro-structured illumination of super-resolution, surface plasma interference lithography, top layer are micro-, surface plasma bio-sensing.
Accompanying drawing explanation
Fig. 1 is the designed a kind of three-dimensional structure schematic diagram that strengthens the method for surface plasma light field excitation intensity of the embodiment of the present invention;
Fig. 2 is the designed a kind of two-dimensional section figure that strengthens the method for surface plasma light field excitation intensity of the embodiment of the present invention;
Fig. 3 is the designed a kind of surface plasma light field excitation intensity design sketch that strengthens surface plasma light field excitation intensity method of the embodiment of the present invention; Excitation intensity is normalized;
In Fig. 1,1 is depicted as transparent substrates; 2 for being depicted as diffraction structure layer; 3 are depicted as resonance enhancement layer; 4 are depicted as the media coating in medium/metal multilayer film; 5 are depicted as the metallic diaphragm in medium/metal multilayer film; 6 are depicted as the enhancement layer that excites that surface plasma intensity excites.
Identical with the attribute of film material shown in Fig. 1 shown in 1-6 in Fig. 2.
The peak valley Curves of Fig. 1 and Fig. 2 is shown the surface plasma light field COMPLEX AMPLITUDE schematic diagram exciting on enhancement layer.
Embodiment
Below in conjunction with the drawings and the specific embodiments, the present invention is described in detail, but protection scope of the present invention is not limited in embodiment below, should comprise the full content in claims.
Strengthen the method for surface plasma light field excitation intensity as depicted in figs. 1 and 2, specifically implement: transparent substrates shown in 1 is quartzy; The layer of diffraction structure shown in 2 is Cr/TiO
2grating, diffraction structure bed thickness 60nm, the cycle 200nm of two-dimensional array, dutycycle is 0.5; The enhancement layer that resonates shown in 3 is TiO
2rete, the thickness 110nm of resonance enhancement layer; The multilayer film of medium/metal shown in 4 is Al/SiO
2in medium SiO
2layer, thickness 15nm; The multilayer film of medium/metal shown in 5 is Al/SiO
2in metal Al layer, thickness 15nm, Al/SiO
2multilayer film logarithm is 4 pairs; Shown in 6, exciting enhancement layer is Ag, thickness 17nm; The one-wavelength laser that in the present embodiment, illumination wavelengths is 365nm, the incident orientation angle θ of four bundle illumination light is 28 °; Polarization angle is respectively 0 °, 90 °, 180 ° and 270 °.
For illumination light wavelength 365nm, substrate SiO
2, Cr, TiO
2, SiO
2, Al and Ag specific inductive capacity be respectively 2.13 ,-8.55+8.96i, 8+0.01i, 2.16+0.06i ,-19.4238+3.6028i and-2.4+0.2488i.Utilize Al/SiO
2the super diffraction spectrum of multilayer film is controlled characteristic, Al/SiO
2the spatial frequency passband window of multilayer film is 1.5k
0～3k
0.For illumination light with 28 ° of incidents (horizontal wave vector
), diffraction structure layer diffraction goes out the horizontal wave vector k of secondary flat ripples at different levels
x=k
x,i± mk
Λ, m=0, ± 1 ..., k wherein
x,iand k
Λbe respectively the grating reciprocal lattice vector of the lateral wave resultant diffraction structure layer of illumination light, therefore secondary flat ripples at different levels see through Al/SiO
2the multilayer film frequency spectrum k that only has living space
x=0.71k
0+ 1.8k
0=2.51k
0(m=1) surface plasma light field, other frequencies are because Al/SiO
2the stopband characteristic of multilayer film spatial frequency spectrum and effectively being suppressed.Therefore, the present embodiment is 2.51k mainly for horizontal wave vector
0(k
0the enhancing of surface plasma light field excitation intensity expression illumination light vacuum wave vector).This method for designing be equally applicable to other frequency band range surface plasma light field excite enhancing.
Figure 3 shows that surface plasma light field excitation intensity design sketch.Obviously, this method for designing is taked to excite and is strengthened the excitation intensity that Ag layer can greatly strengthen surface plasma light field, and contrast does not adopt and excites enhancement layer design to improve nearly 35 times.
The not detailed disclosed part of the present invention belongs to the known technology of this area.
Although above the illustrative embodiment of the present invention is described; so that the technician of this technology neck understands the present invention; but should be clear; the invention is not restricted to the scope of embodiment; to those skilled in the art; as long as various variations appended claim limit and definite the spirit and scope of the present invention in, these variations are apparent, all utilize innovation and creation that the present invention conceives all at the row of protection.
Claims (10)
1. strengthen the device of surface plasma light field excitation intensity, it is characterized in that, described device comprises:
Transparent substrates;
For illumination light diffraction being gone out to the nanostructured layers of secondary flat ripples at different levels;
For being gone out to secondary flat ripples at different levels, illumination light diffraction carries out spatial frequency spectrum scope and the amplitude-modulated medium/metal multilayer film of transmission;
For strengthening the filtering of medium/metal multilayer film, produce the enhancement layer that excites of surface plasma light field excitation intensity.
2. the device of enhancing surface plasma light field excitation intensity according to claim 1, is characterized in that: the material of described transparent substrates can be selected quartz or sapphire.
3. the device of enhancing surface plasma light field excitation intensity according to claim 1, is characterized in that: described nanostructured layers comprises diffraction structure layer and Wave guide resonance layer two parts; First diffraction structure layer goes out illumination light diffraction secondary flat ripples at different levels; Wave guide resonance layer is for the planarization to diffraction structure layer, and enhancing diffraction goes out the inferior launching efficiency of a specific order in secondary flat ripples at different levels;
Described diffraction structure layer can be lighttight metallic diaphragm material, can be also the media coating material of printing opacity, and the planform of diffraction structure layer can be prepared as regular solid or irregular arbitrary face type; Structure distribution on described diffraction structure layer can be uniform or heterogeneous, can be one dimension or two-dimensional structure; Thickness selects to be generally 20nm～100nm;
The media coating material that described Wave guide resonance layer is printing opacity; Film material can be selected high refractive index medium material oxidation titanium, silicon nitride or silit; Thickness selects to be generally 20nm～200nm.
4. the device of enhancing surface plasma light field excitation intensity according to claim 1, is characterized in that: described medium/metal multilayer film is for replacing metal and media coating, and the logarithm scope of medium/metal multilayer film is 2～12; Metallic diaphragm material in medium/metal multilayer film can be selected noble metal gold, silver or aluminium, or selects doping metals; The thickness range of metallic diaphragm is 10nm～40nm, and each metallic diaphragm thickness of preparation can equate, also can gradient thickness; Media coating material can be selected silicon dioxide, alundum (Al2O3) or magnesium fluoride, and the thickness range of media coating is 10nm～80nm, and each media coating thickness of preparation can equate, also can gradient thickness.
5. the device of enhancing surface plasma light field excitation intensity according to claim 1, is characterized in that: described in to excite the thickness range of enhancement layer be 10nm～50nm; Excite the material of enhancement layer can select noble metal gold, silver or aluminium, or select doping metals.
6. a method that strengthens surface plasma light field excitation intensity, it is characterized in that: illumination light is from the transparent substrates bottom incident of device described in claim 1, through nanostructured layers, the diffraction of illumination light and medium/metal multilayer film are gone out to spatial frequency spectrum scope and the transmission Modulation and Amplitude Modulation of secondary flat ripples at different levels to diffraction, finally at the upper surface that excites enhancement layer, form the surface plasma light field suddenly dying within the scope of longitudinal 5nm～50nm; The excitation intensity of surface plasma light field greatly improves.
7. a kind of method that strengthens surface plasma light field excitation intensity according to claim 6, is characterized in that: illumination light can be ultraviolet light, visible ray, infrared band even.
8. a kind of method that strengthens surface plasma light field excitation intensity according to claim 6, is characterized in that: nanostructured layers is diffracted to secondary flat ripples at different levels by illumination light; The structure distribution that changes the diffraction structure layer of nanostructured layers regulates the spatial frequency spectrum of secondary flat ripples at different levels; The resonance excitation layer thickness that changes nanostructured layers regulates the excitation intensity of secondary flats at different levels.
9. a kind of method that strengthens surface plasma light field excitation intensity according to claim 6, is characterized in that: the super diffraction spectrum of medium/metal multilayer film is controlled the transmission that optical characteristics realizes single level secondary flat ripple; The logical scope of band of the geometric parameter implementation space frequency spectrum of material parameter, metal and the media coating material of metal and media coating and the adjusting of transmission amplitude in change medium/metal multilayer film.
10. a kind of method that strengthens surface plasma light field excitation intensity according to claim 6, is characterized in that: excite enhancement layer design can greatly strengthen the excitation intensity of surface plasma light field.
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Cited By (4)
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| CN105679854A (en) * | 2016-03-08 | 2016-06-15 | 中山大学 | Quasi disordered micro-nano photon structure for improving sensitivity of scintillator detector and design and fabrication methods thereof |
| CN105954866A (en) * | 2016-07-15 | 2016-09-21 | 中国科学院光电技术研究所 | Lighting-depth-adjustable broadband light source super-resolution surface microscopic imaging method |
| CN108957839A (en) * | 2018-08-09 | 2018-12-07 | 京东方科技集团股份有限公司 | Display device, display panel, color membrane substrates and color film |
| WO2023070932A1 (en) * | 2021-10-26 | 2023-05-04 | 中国科学院微电子研究所 | Analytic method and device for quantitatively calculating line edge roughness in plasma ultra-diffraction photoetching process |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105679854A (en) * | 2016-03-08 | 2016-06-15 | 中山大学 | Quasi disordered micro-nano photon structure for improving sensitivity of scintillator detector and design and fabrication methods thereof |
| CN105679854B (en) * | 2016-03-08 | 2017-06-20 | 中山大学 | A kind of accurate unordered micro-nano photon structure and its design and preparation method for improving scintillator detector sensitivity |
| CN105954866A (en) * | 2016-07-15 | 2016-09-21 | 中国科学院光电技术研究所 | Lighting-depth-adjustable broadband light source super-resolution surface microscopic imaging method |
| CN108957839A (en) * | 2018-08-09 | 2018-12-07 | 京东方科技集团股份有限公司 | Display device, display panel, color membrane substrates and color film |
| WO2023070932A1 (en) * | 2021-10-26 | 2023-05-04 | 中国科学院微电子研究所 | Analytic method and device for quantitatively calculating line edge roughness in plasma ultra-diffraction photoetching process |
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Application publication date: 20140806 |