CN103902115B - Touch-screen transparent conductive body and its preparation method and application - Google Patents
Touch-screen transparent conductive body and its preparation method and application Download PDFInfo
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- CN103902115B CN103902115B CN201210587392.7A CN201210587392A CN103902115B CN 103902115 B CN103902115 B CN 103902115B CN 201210587392 A CN201210587392 A CN 201210587392A CN 103902115 B CN103902115 B CN 103902115B
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Abstract
The invention provides a kind of touch-screen transparent conductive body and its preparation method and application.The preparation method of the touch-screen transparent conductive body, comprises the following steps：Photoresist is coated on a surface of transparent base；Photoresist is exposed, developed, with the formation pattern area on the surface of transparent base；On the surface of transparent base groove is etched along pattern area；Remove remaining photoresist；By the filled therewith containing conductive material in a groove, and dried, form conductive pattern, obtain the transparent base with conductive pattern；Insulating protective layer is formed on the surface of the transparent base with conductive pattern, obtains touch-screen transparent conductive body.The preparation method of above-mentioned touch-screen transparent conductive body, manufacture craft are easy, it is possible to increase production efficiency；Simultaneously as using " addition " production technology, conductive material is embedded in transparent base, reduces the usage amount of conductive material.
Description
Technical field
The present invention relates to touch-screen field, more particularly to a kind of touch-screen transparent conductive body and preparation method thereof and answers
With.
Background technology
Touch panel device obtains big because its is sturdy and durable, reaction speed is fast, save space, is easy to many advantages, such as exchange
Many approvals, it may be said that it be it is most simple at present, conveniently, a kind of natural man-machine interaction mode.Touchpad device is mechanical, electrical in hand
Become increasingly popular in the electronic products such as brain, common base equipment.
And the transparent conductive body currently used for capacitance touch screen mainly uses in PET (polyethylene terephthalate) or
Last layer ITO is plated on glass baseplate, then unwanted part is removed by etching, finally gives required ITO pattern.This life
Production method needs expensive evaporation/sputtering equipment, and the production time is longer, less efficient, and " subtraction " production greatly causes
The waste of raw material.
The content of the invention
Based on this, it is necessary to provide a kind of preparation of touch-screen transparent conductive body simple for production, improving production efficiency
Method.
A kind of touch-screen transparent conductive body, including transparent base, conductive pattern and insulating protective layer, wherein, it is described
One surface of bright base material is provided with groove, and the conductive pattern is filled in the groove, and the insulating protective layer is formed at institute
State the surface of transparent base and cover the conductive pattern, the material of the conductive pattern is silver, copper, CNT, stone
At least one of black alkene and conducting polymer composite.
In one of the embodiments, the material of the transparent base is glass or plastics；The material of the insulating protective layer
Expect for thermal plastic polymer, thermosetting polymer, UV solidification polymers or silica.
A kind of preparation method of touch-screen transparent conductive body, comprises the following steps：
Photoresist is coated on a surface of transparent base；
The photoresist is exposed, developed, with the formation pattern area on the surface of the transparent base；
On the surface of the transparent base groove is etched along the pattern area；
Remove remaining photoresist；
By the filled therewith containing conductive material in the groove, and dried, form the conductive pattern, obtain
The transparent base with the conductive pattern；Wherein, the conductive material is silver, copper, CNT, graphene and conduction
At least one of high polymer material；And
The insulating protective layer is formed on the surface of the transparent base with the conductive pattern, is touched
Screen transparent conductive body.
In one of the embodiments, using blade coating or the method for spraying, by the filled therewith containing conductive material in institute
State in groove.
In one of the embodiments, using knife coating or spin-coating method, in the transparent base with the conductive pattern
The upper surface of material forms the insulating protective layer.
In one of the embodiments, the groove is the groove of network linear.
In one of the embodiments, the line thickness of the network linear be 0.5 μm ~ 10 μm, between lines away from
From for 50 μm ~ 1000 μm.
In one of the embodiments, the material of the transparent base is glass or plastics；The material of the insulating protective layer
Expect for thermal plastic polymer, thermosetting polymer, UV solidification polymers or silica.
In one of the embodiments, the glass is optical quartz glass or common optical glass；The plastics are poly-
Methyl methacrylate or makrolon；The UV solidification polymers are polymethyl methacrylate.
A kind of touch-screen, including cover plate, glue-line and above-mentioned touch-screen transparent conductive body, the glue-line by the cover plate and
The touch-screen is bonded together with transparent conductive body.
The preparation method of above-mentioned touch-screen transparent conductive body, manufacture craft are easy, it is possible to increase production efficiency；Meanwhile
Due to using " addition " production technology, conductive material is embedded in transparent base, reduces the usage amount of conductive material.
Brief description of the drawings
Fig. 1 is the structure chart of the touch-screen transparent conductive body of an embodiment；
Fig. 2 is the structure chart of the groove of the touch-screen transparent conductive body of an embodiment；
Fig. 3 is the structure chart of the groove of the touch-screen transparent conductive body of another embodiment；
Fig. 4 is the flow chart of the preparation method of the touch-screen transparent conductive body of an embodiment；
Fig. 5 to Figure 10 is the preparation process schematic diagram of an embodiment touch-screen transparent conductive body；
Figure 11 is the structure chart of the touch-screen of an embodiment；
Embodiment
In order to facilitate the understanding of the purposes, features and advantages of the present invention, below to the specific reality of the present invention
The mode of applying is described in detail.Many details are elaborated in the following description in order to fully understand the present invention.But
The invention can be embodied in many other ways as described herein, and those skilled in the art can be without prejudice to this hair
Similar improvement is done in the case of bright intension, therefore the present invention is not limited to the specific embodiments disclosed below.
Referring to Fig. 1, the touch-screen of embodiment transparent conductive body 100, including transparent base 110, conductive pattern
120 and insulating protective layer 130.Wherein, the upper surface of transparent base 110 is provided with groove 112, and conductive pattern 120 is filled in groove
In 112, insulating protective layer 130 is formed at the upper surface of transparent base 110 and covers conductive pattern 120.
Wherein, the material of transparent base 110 is glass or plastics.Glass is optical quartz glass or common optical glass.
Plastics are polymethyl methacrylate（PMMA）Or makrolon（PC）.
Fig. 2 and Fig. 3 is referred to, groove 112 is the groove of network linear.The lines of network linear can be straight
Line or irregular curve, lines can carry out break line treatment according to design requirement.Line thickness is 0.5 μm ~ 10 μm, between lines
Distance be 50 μm ~ 1000 μm.The density and depth of lines can be entered according to the transmitance and square resistance of conductive material demand
Row design.Groove 112 is used to fill conductive pattern 120, conductive pattern 120 is formed network structure as needed.
The material of conductive pattern 120 is at least one of silver, copper, CNT, graphene and conducting polymer composite.
The electric conductivity of conductive pattern 120 is better than ITO electric conductivity, and square resistance is relatively low.
The material of insulating protective layer 130 can be thermal plastic polymer, thermosetting polymer, UV（Ultraviolet light）Solidification polymer
Deng inorganic matters such as organic polymer or silica.In present embodiment, UV solidification polymers are polymethyl methacrylate.
The upper surface of transparency carrier 110 forms insulating protective layer 130, it is possible to increase the anti-scratch performance of transparency carrier 110.
Above-mentioned touch-screen transparent conductive body, due to conductive material is embedded in transparent base, reduce conductive material
Usage amount, cost is reduced, and insulating protective layer is formed on the surface of the transparency carrier with conductive pattern, it is possible to increase transparent base
The anti-scratch performance of plate；Because the electric conductivity of conductive material is better than ITO electric conductivity, square resistance is relatively low, therefore can carry
The touch-responsive speed of high touch-screen.
Referring to Fig. 4, the preparation method of the touch-screen transparent conductive body of an embodiment, comprises the following steps：
Step S100, photoresist is coated on a surface of transparent base.
Referring to Fig. 5, coating photoresist 140 in the upper surface of transparent base 110, and preliminary drying is carried out to photoresist 140.Light
The concretely MRT of photoresist 140（Micro Resist Technology）The ma-P1210 type positive photoresists of company's production, in advance
It is 100 DEG C to dry temperature, preliminary drying time 90s.
The material of transparent base 110 is glass or plastics.Glass can be optical quartz glass or common optical glass.Plastics
For polymethyl methacrylate or makrolon.The thickness of transparent base 110 is 50 μm ~ 300 μm.
Step S200, photoresist be exposed, developed, with the formation pattern area on the surface of transparent base.
Referring to Fig. 6, first with mask plate by photoresist 140 be not required to exposure region protected, after to photoresist 140
It is exposed, develops, to form pattern area 114 on the upper surface of transparent base 110, and is dried after being carried out to photoresist 140.Afterwards
It is 120 DEG C to dry temperature, and the rear baking time is 120s.
Fig. 2 and Fig. 3 is referred to, pattern area 114 can be grid line bar structure.The lines of network linear can be straight
Line or irregular curve, lines can carry out break line treatment according to design requirement.Line thickness is 0.5 μm ~ 10 μm, between lines
Distance be 50 μm ~ 1000 μm.
Step S300, groove is etched along pattern area on the surface of transparent base.
Referring to Fig. 7, using the method for dry etching or wet etching, in the upper surface of transparent base 110 along pattern area
114 etch groove 112.The shape of groove 112 is identical with the shape in pattern area 114.Groove 112 is recessed for network linear
Groove.Lines can be straight line or irregular curve, and lines can carry out break line treatment according to design requirement.Line thickness is
0.5 μm ~ 10 μm, the distance between lines is 50 μm ~ 1000 μm.The density and depth of lines can be according to the transmitances of conductive material demand
It is designed with square resistance.
Dry etching in present embodiment is reactive ion etching（RIE）Method.The glass erosion that wet process is used
Carve the BL-5 type glass etching liquids that liquid is the production of FRIEND companies.
Step S400, remaining photoresist is removed.
Referring to Fig. 8, remaining photoresist 140 is removed using adhesive remover.Adhesive remover can be 4wt% NaOH solution.
Step S500, by the filled therewith containing conductive material in a groove, and dried, form conductive pattern, obtain
To the transparent base with conductive pattern.
Referring to Fig. 9, the method for using blade coating or spraying, by the filled therewith containing conductive material in groove 112, after
Thermally treated method is dried, and is formed conductive pattern 120, is obtained the transparent base 110 with conductive pattern 120.This implementation
In mode, the slurry containing conductive material is conductive silver ink.The solid content of conductive silver ink is 40%, viscosity 40cps.
Hot-air oven can be used to be dried in heat treatment method, it is possible to use IR（It is infrared）Drying system is dried.
Step S600, insulating protective layer is formed on the surface of the transparent base with conductive pattern, obtains touch-screen with thoroughly
Bright electric conductor.
Referring to Fig. 10, using knife coating or spin-coating method, in the upper surface of the transparent base 110 with conductive pattern 120
Form insulating protective layer 130.
The material of insulating protective layer 130 can be that thermal plastic polymer, thermosetting polymer, UV solidification polymers etc. are organic poly-
The inorganic matter such as compound or silica.Insulating protective layer 130 is formed in the upper surface of transparency carrier 110, it is possible to increase transparent base
The anti-scratch performance of plate 110.
The technique of knife coating is：Using doctor blade process, coated in the upper surface of transparent base 110 containing conductive pattern 120
One layer of insulating protective layer 130 is simultaneously solidified.The material of insulating protective layer 130 be thermal plastic polymer, thermosetting polymer or
The organic polymers such as UV solidification polymers.UV solidification polymers can be polymethyl methacrylate.
The technique of spin-coating method is：On the upper surface of transparent base 110 containing conductive pattern 120, spin coating layer of transparent silicon
Cured processing obtains silicon dioxide layer of protection to colloidal sol again.Solidification temperature is 450 DEG C.
The preparation method of above-mentioned touch-screen transparent conductive body, manufacture craft are easy, it is possible to increase production efficiency；Meanwhile
Due to using " addition " production technology, conductive material is embedded in transparent base, reduces the usage amount of conductive material, reduces into
This, and form insulating protective layer on the surface of the transparency carrier with conductive pattern, it is possible to increase the anti-scratch of transparency carrier
Energy.
Refer to Figure 11, the touch-screen 10 of an embodiment, including cover plate（Cover Lens）200th, glue-line（Glue layers）
300 and above-mentioned touch-screen transparent conductive body 100.Cover plate 200 and touch-screen transparent conductive body 100 are bonded with glue-line 300
Together.Touch-screen 10 also includes the portions such as LCD modules, driving chip and the FPC of connection touch-screen and driving chip
Part.
Above-mentioned touch-screen, the touch-screen transparent conductive body prepared using the present invention, due to the electric conductivity of conductive material
Electric conductivity better than ITO, square resistance is relatively low, therefore can improve the touch-responsive speed of touch-screen.
With reference to specific embodiment, the invention will be further elaborated.
Embodiment 1
A kind of preparation method of touch-screen transparent conductive body, comprises the following steps：
1st, photoresist is coated on a surface of transparent base.
Photoresist is coated in the upper surface of transparent base, and preliminary drying is carried out to photoresist.Transparent base is optical quartz glass
Glass, thickness 0.3mm, transmitance 93%.Photoresist is ma-P1210 type positive photoresists, and thickness is 2 μm.Preliminary drying temperature is
100 DEG C, preliminary drying time 90s.
2nd, photoresist be exposed, developed, with the formation pattern area on the surface of transparent base.
After using mask plate, the region that photoresist is not required to expose is protected, ma-P1210 types positive photoresist is carried out
Exposure, develop, to form pattern area as shown in Figure 2 on the upper surface of optical quartz glass, and dried after being carried out to photoresist.
Wherein, the exposure wavelength of ma-P1210 types positive photoresist is 365nm, exposure energy 35mj/cm2, developer solution is 1wt%'s
Na2CO3Solution.It is 120 DEG C to dry temperature afterwards, and the rear baking time is 120s.Pattern area is network linear.Lines are straight line, lines
Width is 2 μm, and the distance between lines is 200 μm.
3rd, groove is etched along pattern area on the surface of transparent base.
Using RIE etch technology, from CF4Gas is etching gas, in the upper surface of optical quartz glass along pattern area
Etch groove.The depth of groove is 2 μm.
4th, remaining photoresist is removed.
Remaining photoresist is removed using adhesive remover.Wherein, adhesive remover is 4wt% NaOH solution.
5th, the filled therewith containing conductive material is entered in groove, and dried, form conductive pattern, obtained having and lead
The transparent base of electrical pattern.
One layer of conductive silver ink is coated with the upper surface of optical quartz glass using knife coating；Afterwards will be recessed using flexible scraper
Excess conductive silver inks water outside groove removes；Finally conductive silver ink is dried using IR drying systems, obtains that there is silver-colored conductive pattern
The optical quartz glass of case.
Wherein, the solid content of conductive silver ink is 40%, viscosity 40cps.The baking temperature of IR drying systems is 130 DEG C,
Baking speed is 1m/min.
6th, insulating protective layer is formed on the surface of the transparent base with conductive pattern, obtains touch-screen electrically conducting transparent
Body.
On the optical quartz glass upper surface containing silver, spin coating layer of transparent Ludox, at solidification at a temperature of 450 DEG C
After reason, the silicon dioxide layer of protection that thickness is 2 μm is obtained.
Embodiment 2
A kind of preparation method of touch-screen transparent conductive body, comprises the following steps：
1st, photoresist is coated on a surface of transparent base.
Photoresist is coated in the upper surface of transparent base, and preliminary drying is carried out to photoresist.Transparent base is soda glass, thick
Spend for 0.2mm, transmitance 90%.Photoresist is ma-P1210 type positive photoresists, and thickness is 2 μm.Preliminary drying temperature is 100 DEG C,
Preliminary drying time is 90s.
2nd, photoresist be exposed, developed, with the formation pattern area on the surface of transparent base.
After using mask plate, the region that photoresist is not required to expose is protected, ma-P1210 types positive photoresist is carried out
Exposure, develop, to form pattern area as shown in Figure 3 on the upper surface of soda glass, and dried after being carried out to photoresist.Its
In, the exposure wavelength of ma-P1210 type positive photoresists is 365nm, exposure energy 35mj/cm2, developer solution is 1wt%'s
Na2CO3Solution.It is 120 DEG C to dry temperature afterwards, and the rear baking time is 120s.Pattern area is network linear.Lines are curve, lines
Width is 6 μm, and the distance between lines is 300 μm.
3rd, groove is etched along pattern area on the surface of transparent base.
Soda glass is placed in BL-5 type glass etching liquids and is etched, is formed in the pattern area of soda glass upper surface
Groove.The depth of groove is 3 μm.
4th, remaining photoresist is removed.
Remaining photoresist is removed using adhesive remover.Wherein, adhesive remover is 4wt% NaOH solution.
5th, the filled therewith containing conductive material is entered in groove, and dried, form conductive pattern, obtained having and lead
The transparent base of electrical pattern.
One layer of conductive silver ink is coated with the upper surface of soda glass using knife coating；Afterwards using flexible scraper by outside groove
Excess conductive silver inks water remove；Finally conductive silver ink is dried using hot-air oven, obtains the Soviet Union with silver-colored conductive pattern
Break glass.
The solid content of conductive silver ink is 40%, viscosity 40cps.Hot-air oven baking temperature is 130 DEG C, and the time is
30min。
6th, insulating protective layer is formed on the surface of the transparent base with conductive pattern, obtains touch-screen electrically conducting transparent
Body.
Using doctor blade process, one layer of PMMA type UV solidified resin is coated on soda glass upper surface and carries out UV solidifications,
Obtain the PMMA protective layers that thickness is 2 μm.Wherein, the viscosity of PMMA types UV solidified resins is 600cps, and solidification wavelength is
365nm, accumulative irradiation energy reach 600mj/cm2It is i.e. curable afterwards.
Embodiment 3
A kind of preparation method of touch-screen transparent conductive body, comprises the following steps：
1st, photoresist is coated on a surface of transparent base.
Photoresist is coated in the upper surface of transparent base, and preliminary drying is carried out to photoresist.Transparent base is moulded for PMMA optics
Material, thickness 0.18mm.Photoresist is ma-P1210 type positive photoresists, and thickness is 2 μm.Preliminary drying temperature is 100 DEG C, during preliminary drying
Between be 90s.
2nd, photoresist be exposed, developed, with the formation pattern area on the surface of transparent base.
After using mask plate, the region that photoresist is not required to expose is protected, ma-P1210 types positive photoresist is carried out
Exposure, develop, to form pattern area as shown in Figure 2 on the upper surface of PMMA optical plastics, and dried after being carried out to photoresist.
Wherein, the exposure wavelength of ma-P1210 types positive photoresist is 365nm, exposure energy 35mj/cm2, developer solution is 1wt%'s
Na2CO3Solution.It is 120 DEG C to dry temperature afterwards, and the rear baking time is 120s.Pattern area is network linear.Lines are straight line, lines
Width is 3 μm, and the distance between lines is 100 μm.
3rd, groove is etched along pattern area on the surface of transparent base.
Using RIE etch technology, from the O that volume content is 60%2With the CHF that volume content is 40%3Mixed gas be
Etching gas, groove is etched along pattern area in the upper surface of PMMA optical plastics.The depth of groove is 2 μm.
4th, remaining photoresist is removed.
Remaining photoresist is removed using adhesive remover.Wherein, adhesive remover is 4wt% NaOH solution.
5th, the filled therewith containing conductive material is entered in groove, and dried, form conductive pattern, obtained having and lead
The transparent base of electrical pattern.
One layer of conductive silver ink is sprayed in the upper surface of PMMA optical plastics using spraying process；Afterwards will be recessed using flexible scraper
Excess conductive silver inks water outside groove removes；Finally conductive silver ink is dried using IR drying systems, obtains that there is silver-colored conductive pattern
The PMMA optical plastics of case.
The solid content of conductive silver ink is 40%, viscosity 40cps.The baking temperature of IR drying systems is 130 DEG C, baking
Speed is 1m/min.
6th, insulating protective layer is formed on the surface of the transparent base with conductive pattern, obtains touch-screen electrically conducting transparent
Body.
Using doctor blade process, one layer of PMMA type UV solidified resin is coated on the upper surface of PMMA optical plastics and carries out UV
Solidification, obtain the PMMA protective layers that thickness is 2 μm.Wherein, the viscosity of PMMA types UV solidified resins is 600cps, and solidification wavelength is
365nm, accumulative irradiation energy reach 600mj/cm2It is i.e. curable afterwards.
Performance test
The touch-screen prepared to embodiment 1 ~ 3 carries out transmitance and square resistance performance test with transparent conductive body.
Using the UV2450 type UV, visible light spectrophotometer test touch screen transparent conductive bodies of SHIMADZU companies
Visible light transmissivity, test wavelength scope are 380nm ~ 780nm.The 280SI produced using Four Dimensions.Inc companies
The square resistance of transparent base of the type FOUR-POINT PROBE METER test with conductive pattern, test result are as shown in table 1.
Table 1
| Embodiment | Visible light transmissivity（%） | Square resistance（Ω/□） |
| 1 | 89.84 | 24.5 |
| 2 | 85.32 | 9.6 |
| 3 | 87.54 | 6.8 |
As shown in Table 1, the visible light transmissivity of touch-screen transparent conductive body is higher, and square resistance is relatively low, therefore can carry
The touch-responsive speed of high touch-screen.
Embodiment described above only expresses the several embodiments of the present invention, and its description is more specific and detailed, but simultaneously
Therefore the limitation to the scope of the claims of the present invention can not be interpreted as.It should be pointed out that for one of ordinary skill in the art
For, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the guarantor of the present invention
Protect scope.Therefore, the protection domain of patent of the present invention should be determined by the appended claims.
Claims (10)
- A kind of 1. touch-screen transparent conductive body, it is characterised in that including transparent base, conductive pattern and insulating protective layer, its In, a surface etch of the transparent base is fluted, and the conductive pattern is filled in described recessed on the transparent base In groove, the insulating protective layer is formed at the surface of the transparent base and covers the conductive pattern, the conductive pattern The material of case is at least one of silver, copper, CNT, graphene and conducting polymer composite.
- 2. touch-screen transparent conductive body according to claim 1, it is characterised in that the material of the transparent base is glass Glass or plastics；The material of the insulating protective layer is thermal plastic polymer, thermosetting polymer, UV solidification polymers or titanium dioxide Silicon.
- 3. a kind of preparation method of touch-screen transparent conductive body, it is characterised in that comprise the following steps：Photoresist is coated on a surface of transparent base；The photoresist is exposed, developed, with the formation pattern area on the surface of the transparent base；On the surface of the transparent base groove is etched along the pattern area；Remove remaining photoresist；By the filled therewith containing conductive material in the groove, and dried, form conductive pattern, obtained with described The transparent base of conductive pattern；Wherein, the conductive material is silver, copper, CNT, graphene and conducting polymer material At least one of material；AndInsulating protective layer is formed on the surface of the transparent base with the conductive pattern, obtains touch-screen with transparent Electric conductor.
- 4. the preparation method of touch-screen transparent conductive body according to claim 3, it is characterised in that using blade coating or spray The method of painting, by the filled therewith containing conductive material in the groove.
- 5. the preparation method of touch-screen transparent conductive body according to claim 3, it is characterised in that using knife coating or Spin-coating method, the insulating protective layer is formed in the upper surface of the transparent base with the conductive pattern.
- 6. the preparation method of touch-screen transparent conductive body according to claim 3, it is characterised in that the groove is net The groove of network linear.
- 7. the preparation method of touch-screen transparent conductive body according to claim 6, it is characterised in that the network lines The line thickness of structure is 0.5 μm~10 μm, and the distance between lines is 50 μm~1000 μm.
- 8. the preparation method of touch-screen transparent conductive body according to claim 3, it is characterised in that the transparent base Material be glass or plastics；The material of the insulating protective layer is thermal plastic polymer, thermosetting polymer, UV solidification polymerizations Thing or silica.
- 9. the preparation method of touch-screen transparent conductive body according to claim 8, it is characterised in that the glass is light Learn quartz glass or common optical glass；The plastics are polymethyl methacrylate or makrolon；The UV solidifications polymerization Thing is polymethyl methacrylate.
- 10. a kind of touch-screen, it is characterised in that led including the touch-screen described in cover plate, glue-line and claim 1 or 2 with transparent The cover plate and the touch-screen are bonded together by electric body, the glue-line with transparent conductive body.
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