CN103901535A - Vertical optical waveguide and manufacturing method thereof - Google Patents
Vertical optical waveguide and manufacturing method thereof Download PDFInfo
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- CN103901535A CN103901535A CN201210589103.7A CN201210589103A CN103901535A CN 103901535 A CN103901535 A CN 103901535A CN 201210589103 A CN201210589103 A CN 201210589103A CN 103901535 A CN103901535 A CN 103901535A
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Abstract
A vertical optical waveguide comprises a base. A first groove and a second groove which are perpendicular to the top face of the base are formed in the top face of the base. The extending direction of the first groove and the extending direction of the second groove are parallel to each other. A protruding part is formed between the first groove and the second groove. Titanium metal is spread on the protruding part. The two sides of the protruding part are perpendicular to the top face and are flatter relative to a ridge-shaped structure, light cannot be scattered easily when meeting the sides, and light using rate is improved. In addition, the invention further relates to a manufacturing method of the vertical optical waveguide.
Description
Technical field
The present invention relates to a kind of rectilinear optical waveguide and manufacture method thereof.
Background technology
Optical waveguide is as effectively communicating optical signals of element comparatively common in photovalve.At present because ridge optical waveguide is compared with being widely used than the light loss of planar optical waveguide is little.If but ridge end face and the both sides out-of-flatness of manufactured ridge optical waveguide out, light runs into also and can be scattered, thereby light loss cannot be dropped to lower.
Summary of the invention
In view of this, be necessary to provide a kind of rectilinear optical waveguide and manufacture method thereof of effective reduction light loss.
A kind of rectilinear optical waveguide, it comprises a substrate, on the end face of this substrate, offer first groove and second groove perpendicular to this end face, the bearing of trend of the bearing of trend of this first groove and this second groove is parallel to each other, between this first groove and this second groove, form a jut, on this jut, diffusion has titanium.
A manufacture method for rectilinear optical waveguide, it comprises the following steps: a substrate is provided; In this substrate, cut out the first groove and the second groove perpendicular to the end face of this substrate, between this first groove and this second groove, form a jut; On the end face of this substrate, be coated with photoresistance and cover whole substrate; Remove the photoresistance covering on this jut; On this jut, plate titanium film; Remove photoresistance; Carry out High temperature diffusion and form rectilinear optical waveguide covering titanium film on jut.
Rectilinear optical waveguide of the present invention and manufacture method thereof, because this first groove and this second groove are for to offer perpendicular to end face, the both sides of this jut are all perpendicular to end face, more smooth with respect to ridge structure both sides, light runs into and is not easy to be scattered, and has improved the utilization factor of light.
Accompanying drawing explanation
Fig. 1 is the structural representation of rectilinear optical waveguide provided by the invention.
Fig. 2 is the processing procedure schematic diagram of the manufacture method of rectilinear optical waveguide provided by the invention.
Fig. 3 is the process flow diagram of the manufacture method of rectilinear optical waveguide provided by the invention.
Main element symbol description
Rectilinear |
100 |
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10 |
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11 |
The |
12 |
The |
13 |
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14 |
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20 |
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30 |
Following embodiment further illustrates the present invention in connection with above-mentioned accompanying drawing.
Embodiment
Below in conjunction with accompanying drawing, embodiment of the present invention is described in further detail.
Referring to Fig. 1, is rectilinear optical waveguide 100 provided by the invention, and it comprises a substrate 10, and the material of this substrate 10 adopts lithium columbate crystal.
On the end face 11 of this substrate 10, offer first groove 12 and second groove 13 perpendicular to this end face 11, the bearing of trend of the bearing of trend of this first groove 12 and this second groove 13 is parallel to each other, between this first groove 12 and this second groove 13, form a jut 14, on this jut 14, diffusion has titanium.
Because this first groove 12 and this second groove 13 are for to offer perpendicular to this end face 11, the both sides of this jut 14 are all perpendicular to this end face 11, more smooth with respect to ridge structure both sides, and light runs into and is not easy to be scattered, and has improved the utilization factor of light.
Wherein, equate to the distance of the bottom of this second groove 13 with the end face 11 from this substrate 10 to the distance of the bottom of this first groove 12 from the end face 11 of this substrate 10.Wherein, the end face 11 of this substrate 10 to the distance of the bottom of this first groove 12 for more deeply better.In addition, distance between this first groove 12 and this second groove 13 can specifically be set according to the variety classes long light of not sharing the same light, in present embodiment, the single-mode optics that adopts light length to be less than 9 microns, the distance between this first groove 12 and this second groove 13 is 9 microns.
See also Fig. 2 and Fig. 3, the manufacture method of the rectilinear optical waveguide 100 that embodiment of the present invention provides, it comprises the following steps:
Step S10 a: substrate 10 is provided;
This substrate 10 is rectangular, and due to lithium niobate (LiNbO
3) crystal (LN) has higher reaction velocity, and lithium niobate diffuse metal titanium (simple substance) can form the loaded lightguide of gradually changed refractive index type, therefore, the material of this substrate 10 adopts lithium columbate crystal.
Step S12: cut out the first groove 12 and the second groove 13 perpendicular to the end face 11 of this substrate 10 in this substrate 10, form a jut 14 between this first groove 12 and this second groove 13.
Wherein, when cutting, adopt dicing saws, and adopt accurate abrasive cut-off wheel.
Step S14: the substrate 10 after cutting is cleaned.
Step S16: be coated with photoresistance 20 and cover whole substrate 10 on the end face 11 of this substrate 10.
Wherein, this step turns above speed with 6000 and is rotated coating.
Step S18: remove the photoresistance 20 covering on this jut 14.
Wherein, this step is to realize by yellow light lithography, the photoresistance 20 in the region of wanting to remove is exposed.
Step S20: plate again titanium film 30 after the photoresistance 20 removing on jut 14 in the above;
Step S22: remove photoresistance 20;
Wherein, the material of this photoresistance adopts polymethylmethacrylate (PMMA), and this photoresistance 20 is immersed in methanol solution and is removed.In reality, because the thickness of this titanium film 30 is much smaller than the thickness of this photoresistance 20, therefore in photoresistance 20 is immersed in to methanol solution time, the side of this photoresistance 20 can contact with methanol solution and slowly dissolve, thereby reach, this photoresistance 20 is separated with substrate 10.
Step S24: carry out High temperature diffusion and form rectilinear optical waveguide 100 covering titanium film 30 on this jut 14.
The temperature of wherein, carrying out titanium diffusion is 1020 degree.
The manufacture method of above-mentioned rectilinear optical waveguide, adopt the method for cutting can the first groove and the verticality of the second groove better, flatness also can be better, in groove forming process, do not adopt yellow light lithography in the past, in whole processing procedure, save once yellow light lithography, in improving light utilization efficiency, realized the object reducing production costs.
Although the present invention discloses as above with preferred embodiments,, it is not in order to limit the present invention, and in addition, those skilled in the art can also do other variation etc. in spirit of the present invention.Certainly, the variation that these do according to spirit of the present invention, within all should being included in the present invention's scope required for protection.
Claims (10)
1. a rectilinear optical waveguide, it comprises a substrate, on the end face of this substrate, offer first groove and second groove perpendicular to this end face, the bearing of trend of the bearing of trend of this first groove and this second groove is parallel to each other, between this first groove and this second groove, form a jut, on this jut, diffusion has titanium.
2. rectilinear optical waveguide as claimed in claim 1, is characterized in that, the material of this substrate adopts lithium columbate crystal.
3. rectilinear optical waveguide as claimed in claim 1, is characterized in that, equates to the distance of the bottom of this first groove from the end face of this substrate with the end face from this substrate to the distance of the bottom of this second groove.
4. rectilinear optical waveguide as claimed in claim 1, is characterized in that, the distance between this first groove and this second groove is 9 microns.
5. a manufacture method for the rectilinear optical waveguide as described in claim 1 ~ 4 any one, it comprises the following steps:
A substrate is provided;
In this substrate, cut out the first groove and the second groove perpendicular to the end face of this substrate, between this first groove and this second groove, form a jut;
On the end face of this substrate, be coated with photoresistance and cover whole substrate;
Remove the photoresistance covering on this jut;
On this jut, plate titanium film;
Remove photoresistance; And
Carry out High temperature diffusion and form rectilinear optical waveguide covering titanium film on jut.
6. the manufacture method of rectilinear optical waveguide as claimed in claim 5, is characterized in that, adopts dicing saws, and adopts accurate abrasive cut-off wheel.
7. the manufacture method of rectilinear optical waveguide as claimed in claim 5, is characterized in that, cleans after cutting out the first groove and the second groove in this substrate perpendicular to the end face of this substrate.
8. the manufacture method of rectilinear optical waveguide as claimed in claim 5, is characterized in that, turns above speed be rotated coating in the time of coating photoresistance with 6000.
9. the manufacture method of rectilinear optical waveguide as claimed in claim 5, is characterized in that, removes the photoresistance covering on this jut by yellow light lithography.
10. the manufacture method of rectilinear optical waveguide as claimed in claim 5, is characterized in that, the material of this photoresistance is polymethylmethacrylate, and this photoresistance is immersed in methanol solution and is removed.
Priority Applications (1)
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CN201210589103.7A CN103901535A (en) | 2012-12-29 | 2012-12-29 | Vertical optical waveguide and manufacturing method thereof |
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CN201210589103.7A CN103901535A (en) | 2012-12-29 | 2012-12-29 | Vertical optical waveguide and manufacturing method thereof |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109425931A (en) * | 2017-08-29 | 2019-03-05 | 瞻博网络公司 | Smooth waveguide structure and manufacturing method |
CN109814203A (en) * | 2019-03-20 | 2019-05-28 | 河北工业大学 | A method of lithium niobate fiber waveguide is prepared using laser direct-writing crystallizing titanium dioxide sol pellicle |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59102203A (en) * | 1982-12-03 | 1984-06-13 | Omron Tateisi Electronics Co | Optical polarizing plane separating element |
US5749132A (en) * | 1995-08-30 | 1998-05-12 | Ramar Corporation | Method of fabrication an optical waveguide |
US20040096138A1 (en) * | 2002-11-19 | 2004-05-20 | Fujitsu Limited | Optical waveguide device and manufacturing method therefor |
EP1607777A1 (en) * | 2004-06-19 | 2005-12-21 | Avanex Corporation | Method of forming a waveguide by diffusing Ti into a LiNbO3 substrate and corresponding structure |
CN101723307A (en) * | 2009-12-25 | 2010-06-09 | 中国科学院光电技术研究所 | Method for preparing semicylindrical minute groove by utilizing secondary film deposition and wet etching |
-
2012
- 2012-12-29 CN CN201210589103.7A patent/CN103901535A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59102203A (en) * | 1982-12-03 | 1984-06-13 | Omron Tateisi Electronics Co | Optical polarizing plane separating element |
US5749132A (en) * | 1995-08-30 | 1998-05-12 | Ramar Corporation | Method of fabrication an optical waveguide |
US20040096138A1 (en) * | 2002-11-19 | 2004-05-20 | Fujitsu Limited | Optical waveguide device and manufacturing method therefor |
EP1607777A1 (en) * | 2004-06-19 | 2005-12-21 | Avanex Corporation | Method of forming a waveguide by diffusing Ti into a LiNbO3 substrate and corresponding structure |
CN101723307A (en) * | 2009-12-25 | 2010-06-09 | 中国科学院光电技术研究所 | Method for preparing semicylindrical minute groove by utilizing secondary film deposition and wet etching |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109425931A (en) * | 2017-08-29 | 2019-03-05 | 瞻博网络公司 | Smooth waveguide structure and manufacturing method |
US10641957B2 (en) | 2017-08-29 | 2020-05-05 | Juniper Networks, Inc. | Smooth waveguide structures and manufacturing methods |
US10908357B2 (en) | 2017-08-29 | 2021-02-02 | Juniper Networks, Inc. | Smooth waveguide structures and manufacturing methods |
US11513288B2 (en) | 2017-08-29 | 2022-11-29 | Openlight Photonics, Inc. | Smooth waveguide structures and manufacturing methods |
CN109814203A (en) * | 2019-03-20 | 2019-05-28 | 河北工业大学 | A method of lithium niobate fiber waveguide is prepared using laser direct-writing crystallizing titanium dioxide sol pellicle |
CN109814203B (en) * | 2019-03-20 | 2021-04-09 | 河北工业大学 | Method for preparing lithium niobate optical waveguide by using laser direct writing crystallized titanium dioxide sol film |
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