CN103885301A - Model matching method for controlled timing sequence of immersion liquid delivery system in immersion lithography machine - Google Patents
Model matching method for controlled timing sequence of immersion liquid delivery system in immersion lithography machine Download PDFInfo
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- CN103885301A CN103885301A CN201410110134.9A CN201410110134A CN103885301A CN 103885301 A CN103885301 A CN 103885301A CN 201410110134 A CN201410110134 A CN 201410110134A CN 103885301 A CN103885301 A CN 103885301A
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Abstract
The invention discloses a model matching method for a controlled timing sequence of an immersion liquid delivery system in an immersion lithography machine. The method comprises constructing an extended finite state machine model which is in accordance with the controlled timing sequence process of the immersion liquid delivery system by taking the controlled timing sequence process of the immersion liquid delivery system as a state machine and achieving the simultaneous positioning of the current state of the immersion liquid delivery system in the immersion lithography machine, the controlled timing sequence and the next control operation corresponding to the current state by matching the received system information input with the extended finite state machine model. According to the invention, a simple and efficient design method is provided with respect to a controlled timing sequence design of a system having a requirement for timing sequence and the design cycle of the controlled timing sequence of the system can be reduced.
Description
Technical field
The present invention relates to a kind of Model Matching method of controlling sequential, particularly relate to the Model Matching method of the control sequential of immersion liquid transfer system in a kind of immersed photoetching machine.
Background technology
Litho machine is one of Core equipment of manufacturing VLSI (very large scale integrated circuit), and modern litho machine is taking optical lithography as main, it utilize optical system the figure on mask plate accurately projection exposure on the silicon chip that was coated with photoresist.It comprises a LASER Light Source, an optical system, the projection mask being made up of graphics chip, alignment system, machine driven system and a control system.
Liquid immersion lithography (Immersion Lithography) equipment is by the end filling the liquid of certain high index of refraction between a slice projection objective and silicon chip, the dry lithography machine that is gas with respect to intermediate medium, improve the numerical aperture (NA) of projection objective, thereby improved resolution and the depth of focus of lithographic equipment.In the litho machine of future generation having proposed, liquid immersion lithography is changed minimum to existing equipment, present dry lithography facility are had to good inheritance.The normal scheme adopting is local immersion method at present, is limited in the regional area between silicon chip top and the lower surface of last a slice projection objective, and keeps the liquid flow of steady and continuous by liquid.
From conventional lithography to liquid immersion lithography, the control system of submersible photoetching apparatus soaking liquid transfer system is to realize a gordian technique of the liquid flow of steady and continuous.In existing immersed photoetching machine, immersion liquid transfer system all needs taking into account system communication architecture and controls sequence problem.Control timing method and can guarantee logicality and the rationality of immersion liquid transfer system operation in immersed photoetching machine, realize the fault handling of immersion liquid transfer system.
Mostly traditional system control time sequence design method processing mode more complicated, be that writing a large amount of repeated routines by developer solves.In the method for designing of existing system control sequential, generally center of gravity is placed in the use amount that how to reduce code, effectively reduces thereby cannot reach the processing complexity of controlling sequential.
Summary of the invention
In order to solve the timing Design problem of immersion liquid transfer system in immersed photoetching machine, the object of the present invention is to provide the Model Matching method of the control sequential of immersion liquid transfer system in a kind of immersed photoetching machine.
The technical solution used in the present invention comprises the following steps:
The sequential control process of immersion liquid transfer system is used as to state machine and builds the extended finite state machine model that meets submergence transfer system sequential control process; By the system information input quantity receiving is mated with extended finite state machine model, current state, control sequential and corresponding next step control operation of current state of realizing submersible photoetching apparatus soaking liquid transfer system are located simultaneously.
The structure of described extended finite state machine model comprises:
1.1) set up corresponding control operation set C under finite state set Q and each state, finite state judgement mark set QF, control operation mark set CF and system sequence mark set T totally five set according to the different conditions in immersion liquid transfer system whole service process:
Finite state set, for the different conditions of descriptive system whole service process;
Control operation set, for the corresponding control operation of descriptive system current state;
The set of finite state judgement mark, for judging the mark of system current state;
The set of control operation mark, for judging whether the corresponding operation of system current state completes;
The set of system sequence mark, for the mark of the current operation sequential of judgement system;
1.2) exhaustive finite state set Q, control operation set C, finite state judgement mark set QF, the set of control operation mark CF, system sequence mark set T;
1.3), under each redirect relation between all states, set up according to the relation between above-mentioned finite state set Q, control operation set C, finite state judgement mark set QF, the set of control operation mark CF, system sequence mark set T each example that meets extended finite state machine model;
1.4) filter out the example of repeated extended finite state machine model, adjust finite state and judge and mark set QF, control operation mark gather CF and system sequence mark set T to make the example of each extended finite state machine model be unique; If cannot adjust three above-mentioned set,, by increasing additional variable mark, the example that makes each extended finite state machine model is unique.
The described system information input quantity by receiving is mated and is comprised with extended finite state machine model:
2.1) the system information input quantity receiving is judged in advance, if system information input quantity need to be mated with extended finite state machine model, carry out next step; If do not need coupling, do not carry out any operation;
2.2) system information input quantity is mated with marking variable or the marking variable set in corresponding extended finite state machine model instance with uniqueness characteristic.
Described Model Matching method is for the one or more subsystems under submersible photoetching apparatus soaking liquid transfer system.
Between the example of described extended finite state machine model, adopt the addressing mode of structure address of variable and enumerated variable address to identify.
The described variable with uniqueness characteristic or variables collection are that to make the example of this extended finite state machine model be unique marking variable or marking variable set.
The beneficial effect that the present invention has is:
1. the state value of the exhaustive sequential control system of extended finite state machine model that this method for designing adopts, and the example of each in model is all unique, can improve to greatest extent the execution efficiency of code, reduce the use amount of repeated code, promote the efficiency of system in operational process, ensured system reliability of operation and validity.
2. because this method for designing has versatility for the control system with sequential requirement, so can effectively reduce the workload in developer's systems development process in whole system design process, in system testing process, also can realize trouble spot, accurate location, in time debug and optimize, having shortened the construction cycle of whole system.
Brief description of the drawings
Fig. 1 is the process flow diagram of the inventive method.
Fig. 2 is the structural principle block diagram of the immersion liquid transfer system of embodiment.
Fig. 3 is the immersion liquid transfer system state transition process schematic diagram of embodiment.
Embodiment
Describe specific embodiment of the invention process in detail below in conjunction with drawings and Examples.
As shown in Figure 1, the present invention includes: the sequential control process of immersion liquid transfer system is used as to state machine and builds the extended finite state machine model that meets submergence transfer system sequential control process; By the system information input quantity receiving is mated with extended finite state machine model, current state, control sequential and corresponding next step control operation of current state of realizing submersible photoetching apparatus soaking liquid transfer system are located simultaneously.
Wherein, the structure of extended finite state machine model comprises:
1.1) set up corresponding control operation set C under finite state set Q and each state, finite state judgement mark set QF, control operation mark set CF and system sequence mark set T totally five set according to the different conditions in immersion liquid transfer system whole service process:
Finite state set, for the different conditions of descriptive system whole service process;
Control operation set, for the corresponding control operation of descriptive system current state;
The set of finite state judgement mark, for judging the mark of system current state;
The set of control operation mark, for judging whether the corresponding operation of system current state completes;
The set of system sequence mark, for the mark of the current operation sequential of judgement system.
1.2) exhaustive finite state set Q, control operation set C, finite state judgement mark set QF, the set of control operation mark CF, system sequence mark set T.
1.3), under each redirect relation between all states, set up according to the relation between above-mentioned finite state set Q, control operation set C, finite state judgement mark set QF, the set of control operation mark CF, system sequence mark set T each example that meets extended finite state machine model;
That is to say that finite state set Q, control operation set C, finite state judgement mark set QF, control operation mark set CF and system sequence mark set T are respectively the state value { Q under system whole service process different conditions
1, Q
2..., Q
n, for the corresponding control operation { C of system current state
1, C
2..., C
n, for judging the mark amount { QF of system current state
1, QF
2..., QF
n, for judging whether performance { CF of the corresponding operation of system current state
1, CF
2..., CF
nand for the mark amount { T of the current operation sequential of judgement system
1, T
2..., T
n.
1.4) filter out the example of repeated extended finite state machine model, adjust finite state and judge and mark set QF, control operation mark gather CF and system sequence mark set T to make the example of each extended finite state machine model be unique; If cannot adjust three above-mentioned set,, by increasing additional variable mark, the example that makes each extended finite state machine model is unique.
Wherein, the system information input quantity receiving is comprised with the process that extended finite state machine model mates:
2.1) the system information input quantity receiving is judged in advance, if system information input quantity need to be mated with extended finite state machine model, carry out next step; If do not need coupling, do not carry out any operation;
2.2) system information input quantity is mated with marking variable or the marking variable set in corresponding extended finite state machine model instance with uniqueness characteristic.
Model Matching method of the present invention is for the one or more subsystems under submersible photoetching apparatus soaking liquid transfer system.
Between the example of extended finite state machine model, adopt the addressing mode of structure address of variable and enumerated variable address to identify.
There is the variable of uniqueness characteristic or variables collection and be that to make the example of this extended finite state machine model be unique marking variable or marking variable set.
The location recognition of the example of extended finite state machine model adopts general addressing mode, for example, can adopt the addressing mode of structure address of variable and enumerated variable address.
System information input quantity can be one or more, but the example of each group system input information amount in must maximum corresponding extended finite state machine models.
The present invention has been applied to the process of the control sequential of immersion liquid transfer system in immersed photoetching machine, its process flow diagram as shown in Figure 1, first the whole service sequential of immersion liquid transfer system in immersed photoetching machine is analyzed, define the quantity of state of limited system operational process, then the redirect relation of system between finite state, for each redirect, add corresponding operation and marking variable, form one and there is system state, the example of the control operation of system and the sequential of system mark, guarantee that by adjusting marking variable each example all has uniqueness, thereby the uniqueness of guarantee system in sequential control process.
The present invention is applied in immersed photoetching machine in immersion liquid transfer system, as shown in Figure 2, immersion liquid transfer system is divided into 4 parts: 1. message recipient, and 2. information generator, 3. central processing unit, 4. time schedule controller, wherein:
The function of message recipient is to receive input information amount, and the input quantity of information is carried out to preliminary analysis and integration, enables to meet the coupling requirement of extended finite state machine model, in time pretreated input information amount is fed back to central processing unit;
The function of information generator is to receive the control operation information that central processing unit sends, and according to control operation information, corresponding control operation is made to by topworks;
The function of central processing unit is by message recipient transmission and the pre-service amount of coming passes to time schedule controller, and receives the matching result of time schedule controller, and then matching result is sent to information generator;
The function of time schedule controller is that the satisfactory input information amount that central processing unit transmission is come is mated one by one with the example in the extended finite state machine model establishing, if there is the example that the match is successful, the control operation information in example sent to central processing unit; If mate all unsuccessfully, do not carry out any operation.
Embodiments of the invention:
Now the sequential control process of immersion liquid transfer system in immersed photoetching machine is divided into 5 states: state 1, state 2, state 3, state 4 and state 5, wherein state 1 is initial state, these 5 states have just formed finite state set.Fig. 3 is the immersion liquid transfer system state transition process schematic diagram of embodiment.The state transition process of the extended finite state machine model building is: the first state Q
1(input C
1) → second state Q
2, the second state Q
2(input C
2) → third state Q
3, third state Q
3(input C
3) → the 4th state Q
4, the 4th state Q
4(input C
2) → third state Q
3, third state Q
3(input C
4) → second state Q
2, the second state Q
2(input C
5) → first state Q
1.The example of the extended finite state machine model building is exactly to form as basis taking each different state transition process, for each jump procedure, all needs to add the state judgement mark QF of an i state
i, i state control operation mark CF
iwith the system sequence mark Ti of i state, finite state judgement mark set QF, control operation mark set CF and system sequence mark set T are formed.
Example in definition extended finite state machine model M is 5 yuan of formulas, M=(Q, C, QF, CF, T).Wherein: state Q and control operation C are match state jump procedure.
Each state transition process can form an example that meets M model, so just have:
{Q
1，C
1、QF
1，CF
1，T
1},
{Q
2，C
2，QF
2，CF
2，T
2},
{Q
3，C
3，QF
3，CF
3，T
3},
{Q
4，C
2，QF
4，CF
2，T
4},
{Q
3，C
4，QF
3，CF
4，T
6},
{Q
2，C
5，QF
2，CF
5，T
7},
……
After having formed the set of above-mentioned extended finite state machine model instance, guarantee the uniqueness of each example.In above-mentioned example, be to guarantee uniqueness if exist two or above example, need to adjust finite state judgement mark set QF, control operation mark set CF and system sequence mark set T to guarantee example uniqueness; Cannot meet if adjust finite state judgement mark set QF, control operation mark set CF and system sequence mark set T, can in each example, increase an extra mark, in order to guarantee the uniqueness of extended finite state machine model instance judgement.
Second and the 6th example in above-mentioned extended finite state machine model, to distinguish this two examples iff identifying with system state amount and state judgement, for ensureing the uniqueness of extended finite state machine model instance, can define a Boolean quantity mark, for distinguishing second example and the 6th example of extended finite state machine model, it is hereby ensured the uniqueness of example in extended finite state machine model.Revised extended finite state machine model instance is stored by structure variable format, made can automatically carry out location recognition between extended finite state machine model instance, realize extended finite state machine model validity and reliability in use.
In above-mentioned extended finite state machine Model Matching, the set that system state amount, state judgement mark and control operation mark amount can be combined to form is as system information input quantity, circulation is mated one by one with the example in extended finite state machine model, the example that the match is successful can be determined current state, control sequential and corresponding next step control operation of current state of system, and by result feedback to central processing unit, to realize the time sort run of system.
Above-mentioned embodiment is used for the present invention that explains, instead of limits the invention, and in the protection domain of spirit of the present invention and claim, any amendment and change that the present invention is made, all fall into protection scope of the present invention.
Claims (6)
1. a Model Matching method for the control sequential of immersion liquid transfer system in immersed photoetching machine, is characterized in that: the sequential control process of immersion liquid transfer system is used as to state machine and builds the extended finite state machine model that meets submergence transfer system sequential control process; By the system information input quantity receiving is mated with extended finite state machine model, current state, control sequential and corresponding next step control operation of current state of realizing submersible photoetching apparatus soaking liquid transfer system are located simultaneously.
2. the Model Matching method of the control sequential of immersion liquid transfer system in a kind of immersed photoetching machine according to claim 1, is characterized in that: the structure of described extended finite state machine model comprises:
1.1) set up corresponding control operation set C under finite state set Q and each state, finite state judgement mark set QF, control operation mark set CF and system sequence mark set T totally five set according to the different conditions in immersion liquid transfer system whole service process:
Finite state set, for the different conditions of descriptive system whole service process;
Control operation set, for the corresponding control operation of descriptive system current state;
The set of finite state judgement mark, for judging the mark of system current state;
The set of control operation mark, for judging whether the corresponding operation of system current state completes;
The set of system sequence mark, for the mark of the current operation sequential of judgement system;
1.2) exhaustive finite state set Q, control operation set C, finite state judgement mark set QF, the set of control operation mark CF, system sequence mark set T;
1.3), under each redirect relation between all states, set up according to the relation between above-mentioned finite state set Q, control operation set C, finite state judgement mark set QF, the set of control operation mark CF, system sequence mark set T each example that meets extended finite state machine model;
1.4) filter out the example of repeated extended finite state machine model, adjust finite state and judge and mark set QF, control operation mark gather CF and system sequence mark set T to make the example of each extended finite state machine model be unique; If cannot adjust three above-mentioned set,, by increasing additional variable mark, the example that makes each extended finite state machine model is unique.
3. the Model Matching method of the control sequential of immersion liquid transfer system in a kind of immersed photoetching machine according to claim 1, is characterized in that: the described system information input quantity by receiving is mated and comprised with extended finite state machine model:
2.1) the system information input quantity receiving is judged in advance, if system information input quantity need to be mated with extended finite state machine model, carry out next step; If do not need coupling, do not carry out any operation;
2.2) system information input quantity is mated with marking variable or the marking variable set in corresponding extended finite state machine model instance with uniqueness characteristic.
4. the Model Matching method of the control sequential of immersion liquid transfer system in a kind of immersed photoetching machine according to claim 1, is characterized in that: described Model Matching method is for the one or more subsystems under submersible photoetching apparatus soaking liquid transfer system.
5. the Model Matching method of the control sequential of immersion liquid transfer system in a kind of immersed photoetching machine according to claim 2, is characterized in that: between the example of described extended finite state machine model, adopt the addressing mode of structure address of variable and enumerated variable address to identify.
6. the Model Matching method of the control sequential of immersion liquid transfer system in a kind of immersed photoetching machine according to claim 3, is characterized in that: the described variable with uniqueness characteristic or variables collection are that to make the example of this extended finite state machine model be unique marking variable or marking variable set.
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Cited By (1)
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