CN103861155A

CN103861155A - Nano-topography chip with capacity of inducing cell proliferation and differentiation

Info

Publication number: CN103861155A
Application number: CN201410086420.6A
Authority: CN
Inventors: 郑欣; 陈一心; 袁翰; 邱旭升; 施鸿飞
Original assignee: Individual
Current assignee: Individual
Priority date: 2014-03-11
Filing date: 2014-03-11
Publication date: 2014-06-18

Abstract

The invention aims at providing a nano-topography chip with capacity of inducing cell proliferation and differentiation, which can guide proliferation direction of stem cells or bone cells and regulate differentiation of the stem cells and the bone cells to quicken bone tissue repair. The nano-topography chip comprises a chromium sheet substrate, wherein a plurality of silicon slice cells are arranged on the chromium sheet substrate; micrographics with nano-scale morphologies engraved on surfaces are arranged on the silicon slice cells. Micro-grain morphologies on the surface of the chip disclosed by the invention guide the stem cells or the bone cells to arrange and propagate along the direction of the micro-grains, so that growth efficiency of the cells is increased by virtue of the directional proliferation, and therefore, bone cells are promoted to concentrate towards a bone defect direction, calluses passing through a fracture line are formed as early as possible, and finally, a repair process of the bone defect is quickened.

Description

A kind of nanotopography chip with inducing cell proliferation and differentiation ability

Technical field

The invention belongs to medical supplies, particularly a kind of nanotopography chip of the quickening bone tissue restoration of using in bone wound clinical treatment.

Background technology

The complication such as bone wound and the work of the damaged normal puzzlement Orthopedic Clinical of the bone causing thereof, can solve some complicated cases although bone is transplanted, and its infection of bone, Qu Gu district bone are damaged are inevitable.Autologous bone transplanting section reduces incidence of rejection, but due to needs Repeated Operation, and gets the bony site problem such as limited of drawing materials and is perplexing the clinical treatment that bone is damaged.

For a long time, large quantity research concentrates on the combination interface of implantation body and osseous tissue, by the mode such as physics, chemistry, material surface is modified to change the biological activity of material surface.From bionics angle, imitate extracellular matrix biophysical properties and carry out finishing, affect the biological behaviour of cell thereby can produce physical stimulation.Multiple physical signalling in cell peripheral environment can be converted into biochemical signals by simple mechanical force.The orientation of growth meeting of cell is sprawled and is moved along groove pattern trend, and this specific character is named as contact induction (contact guidance).By this characteristic, biological behaviour and function that just can regulating cell without chemical modification.

At present existing foreign scholar Hamilton etc. adopt the trench material that 130nm is wide, 500nm is dark, Mus mescenchymal stem cell is cultivated on its surface, observe after cultivation, be orientations, not only there is orientations in the flute surfaces that primary chondrocyte is wide at 750nm, 80-90nm is dark, and cell migration speed significantly increases.

Summary of the invention

The object of this invention is to provide a kind of nanotopography chip with inducing cell proliferation and differentiation ability, can guide stem cell or osteocyte propagation direction and regulate its differentiation, accelerate bone tissue restoration.

For achieving the above object, the present invention is by the following technical solutions:

Have a nanotopography chip for inducing cell proliferation and differentiation ability, comprise the substrate of chromium sheet, the substrate of chromium sheet is provided with some silicon chips unit, is placed with surface and is carved with the micrographics of nanoscale pattern on silicon chip unit.

Between adjacent silicon chip unit, separate by wall.

The post that described micrographics is triangle, circle and three kinds of shapes of square by cross-sectional area is arranged and is formed.

Described triangle is isosceles triangle, and angle is respectively 36 °, 72 ° and 72 °, and the described square length of side is 3 μ m.

The degree of depth of micrographics is 5 μ m.

Spacing between adjacent micrographics is 1 μ m.

The entirety size of described chromium sheet substrate is 2cm × 2cm.

The size of silicon chip unit is 290 μ m × 290 μ m.

The height of wall is 5-20 μ m.

The invention has the beneficial effects as follows:

1. this surface treatment mode does not add extra chemical constituent, biological safety is good, do not rely on biological active component, cost is lower, the course of processing is computer-controlled artistic carving, forming process automaticity is high, output is large, and the microarray that machining obtains is idiosome metal material not yet, and possessing can high-temperature sterilization, firm feature.

2. chip surface pattern can have contact inducing action, each parameter by effects on surface array is carried out in-vitro screening, formally only have the microarray surface of particular design can obtain the desirable effect of stimulation to stem cell, thereby we are by the micrographics processing implantation material surface of optimizing after screening, and strong bonded connective tissue and the effect that stimulates stem cell directional growth can be provided.

3. along with the success rate of the property implanted bone defect repair operation improves constantly, in operation, obtain after good combination, stable support to surrounding tissue in long-term implantation process and osteocyte is migrated to the guiding function of direction is the key factor that affects bone and repair success rate at a specified future date.Micro-lines pattern section guiding stem cell or the osteocyte of chip surface of the present invention are arranged propagation along the direction of micro-lines, this directional proliferation has increased the growth efficiency of cell, thereby promote osteoblast to assemble to the damaged direction of bone, form as early as possible the callus by fracture line, finally accelerate the repair process that bone is damaged.

Brief description of the drawings

Fig. 1 is structural representation of the present invention;

Fig. 2 is scanning electron microscope (SEM) photograph of the present invention;

Fig. 3 is the scanning electron microscope (SEM) photograph of part of the present invention;

Fig. 4 is the arrangement schematic diagram of silicon chip unit.

Detailed description of the invention

Below in conjunction with accompanying drawing, the present invention will be further described.

As shown in drawings, a kind of nanotopography chip with inducing cell proliferation and differentiation ability, comprise chromium sheet substrate 1, size is 2cm × 2cm, chromium sheet substrate 1 is provided with some silicon chips unit 2, size is 290 μ m × 290 μ m, is placed with surface and is carved with the micrographics 4 of nanoscale pattern on silicon chip unit 2, and the wall 3 that is 5-20 μ m by height between adjacent silicon chip unit 2 separates.

Micrographics 4 is that triangle, circle and three kinds of shapes arrangements of square form by cross-sectional area, and triangle is isosceles triangle, and angle is respectively 36 °, 72 ° and 72 °, and the described square length of side is 3 μ m.

The degree of depth of micrographics 4 is 5 μ m, and the spacing between adjacent micrographics 4 is 1 μ m.

The method of making this micro-lines pattern has a variety of, and these preparation methoies can be divided into two classes: a class mode is to etch micro groove at original surface; Another kind of mode is on original surface, to build dimpling ridge.First kind method, by etching method, can comprise by the method for laser-induced thermal etching or the method for chemical etching.Equations of The Second Kind method also has a variety of, can be by plating or by magnetron sputtering plating or by chemical deposition.The present invention preferentially realizes the preparation of micro-lines by the method for laser-induced thermal etching, comprise the following steps specifically:

Step 1 is prepared implant body original paper;

Step 2 laser goes out micro-lines pattern at the surface etching of implant body under the control of computer;

Step 3 is removed the burr of implant surface by polishing or chemical method.

Because the preparation method of this micro-lines is a lot, specifically how to prepare with the chip of the micro-lines in surface and product structure of the present invention is not exerted an influence, do not affect the present invention.

Claims

1. one kind has the nanotopography chip of inducing cell proliferation and differentiation ability, it is characterized in that: comprise chromium sheet substrate (1), chromium sheet substrate (1) is provided with some silicon chips unit (2), is placed with surface and is carved with the micrographics of nanoscale pattern (4) on silicon chip unit (2).

2. the nanotopography chip with inducing cell proliferation and differentiation ability as claimed in claim 1, is characterized in that: between adjacent silicon chip unit (2), separate by wall (3).

3. the nanotopography chip with inducing cell proliferation and differentiation ability as claimed in claim 1, is characterized in that: the post that described micrographics (4) is triangle, circle and three kinds of shapes of square by cross-sectional area is arranged and formed.

4. the nanotopography chip with inducing cell proliferation and differentiation ability as claimed in claim 3, is characterized in that: described triangle is isosceles triangle, angle is respectively 36 °, 72 ° and 72 °, and the described square length of side is 3 μ m.

5. the nanotopography chip with inducing cell proliferation and differentiation ability as described in claim 3 or 4, is characterized in that: the degree of depth of micrographics (4) is 5 μ m.

6. the nanotopography chip with inducing cell proliferation and differentiation ability as claimed in claim 5, is characterized in that: the spacing between adjacent micrographics (4) is 1 μ m.

7. the nanotopography chip with inducing cell proliferation and differentiation ability as claimed in claim 1, is characterized in that: the entirety size of described chromium sheet substrate (1) is 2cm × 2cm.

8. the nanotopography chip with inducing cell proliferation and differentiation ability as claimed in claim 1, is characterized in that: the size of silicon chip unit (2) is 290 μ m × 290 μ m.

9. the nanotopography chip with inducing cell proliferation and differentiation ability as claimed in claim 2, is characterized in that: the height of wall (3) is 5-20 μ m.