CN103849846A - Regulating mechanism for magnet - Google Patents
Regulating mechanism for magnet Download PDFInfo
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- CN103849846A CN103849846A CN201410083058.7A CN201410083058A CN103849846A CN 103849846 A CN103849846 A CN 103849846A CN 201410083058 A CN201410083058 A CN 201410083058A CN 103849846 A CN103849846 A CN 103849846A
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Abstract
The invention discloses a regulating mechanism for a magnet, and the regulating mechanism is applicable to a magnetron sputtering coating machine; the magnetron sputtering coating machine comprises a coating chamber, a heating insulating plate, a target material, a mounting frame and a magnet which is of a plate-like structure, wherein the heating insulating plate and the target material are both arranged inside the coating chamber, and the target material is arranged on one side of the heating insulating plate; the mounting frame is mounted outside the coating chamber; the magnet is movably arranged on the mounting frame and arranged on the other side of the heating insulating plate, and the magnet and the heating insulating plate are arranged at an interval; the regulating mechanism for the magnet is arranged between the magnet and the mounting frame and comprises a moving-magnetism regulating component and a uniform-magnetism regulating component; the moving-magnetism regulating component and the uniform-magnetism regulating component are both arranged between the magnet and the mounting frame; the moving-magnetism regulating component is used for driving the magnet to have translation regulation operation relative to the target material along a direction parallel to the target material, and the uniform-magnetism regulating component is used for driving the magnet to be bended so as to regulate the distance from the two ends of the magnet to the target material, and thus the magnet can be regulated according to actual needs.
Description
Technical field
The present invention relates to magnetron sputtering plating field, relate in particular to a kind of magnet regulating mechanism that is applicable to magnetron sputtering coater.
Background technology
As everyone knows, magnetron sputtering is in order to carry out high-speed sputtering under subatmospheric, must effectively improve the ionization level of gas.By introducing magnetic field on target cathode surface, utilize magnetic field to improve plasma density to increase the method for sputtering raste to the constraint of charged particle; In diode sputtering, increase a magnetic confining field that is parallel to target material surface, by means of the crossed electric and magnetic field forming on target material surface, secondary electron constraint is strengthened to ionization efficiency in target material surface specific region, increase ion density and energy, thereby realize the process of two-forty sputter.
In the prior art, normally provide magnetic field by a magnet that is tabular rectangular structure, although the technology of magnetron sputtering reaches its maturity, but still there is numerous defects in it, on the one hand, because the Distribution of Magnetic Field of the magnet of tabular rectangular structure itself is inhomogeneous, cause the Distribution of Magnetic Field in target region of living in inhomogeneous, make the unstable and skewness of the motion of the secondary electron in diode sputtering, finally cause plated film skewness and the coating film thickness of substrate to be coated inconsistent, thereby coating quality and the qualification rate of substrate are had a strong impact on, on the other hand, because magnet is often and is fixedly installed with respect to target, cannot move, for target area during compared with the less situation in magnetic field large and that magnet produces, make utilization ratio and the sputter scope of target be restricted, cannot make full use of target, the target in the action of a magnetic field region is not caused to waste, and very large restriction the working (machining) efficiency of substrate coating, and also can produce certain detrimentally affect to the coating quality of substrate and qualification rate.
Therefore, be badly in need of wanting a kind of magnet to overcome the problem of above-mentioned existence with regulating mechanism.
Summary of the invention
The object of the present invention is to provide a kind of magnet regulating mechanism that can regulate magnet, this magnet not only can improve plated film qualification rate and coating quality with regulating mechanism, and can also improve target utilization and plated film working (machining) efficiency.
For realizing above-mentioned object, the invention provides a kind of magnet regulating mechanism, be applicable to magnetron sputtering coater, described magnetron sputtering coater comprises coating chamber, heating and thermal insulation plate, target, erecting frame and is the magnet of platy structure, described heating and thermal insulation plate and target are all located in described coating chamber, and described target is positioned at a side of heating and thermal insulation plate, and described erecting frame is installed on the outside of coating chamber, wherein, described magnet is the mobile described erecting frame of being located at, described magnet is positioned at the opposite side of described heating and thermal insulation plate and both are isolated setting, described magnet is located between described magnet and erecting frame with regulating mechanism, described magnet comprises and moves magnetic adjusting part and equal magnetic adjusting part with regulating mechanism, described move magnetic adjusting part and all magnetic adjusting part be all located between described magnet and erecting frame, order about the relatively described target of described magnet and do translational adjustment operation along the direction that is parallel to described target by the described magnetic adjusting part that moves, order about described magnet bending to regulate the distance of described magnet two ends and described target by described equal magnetic adjusting part.
Preferably, the described magnetic adjusting part that moves comprises driving toothed gear and driven bar shaped tooth, described driving toothed gear is articulated in described erecting frame, and the direction that described driven bar shaped tooth does translational adjustment along described magnet is installed on described magnet, and described driving toothed gear and described driven bar shaped tooth engagement fit.
Preferably, described target and magnet all vertically arrange, and the direction that described magnet does translational adjustment arranges in horizontal direction.
Preferably, the described magnetic adjusting part that moves also comprises pivotal axis and operating parts, described pivotal axis is articulated in described erecting frame, and described driving toothed gear is installed on described pivotal axis one end near described magnet, and described operating parts is installed on described pivotal axis one end away from described magnet.
Preferably, described erecting frame is provided with a pin joint seat, and described pivotal axis is articulated in described pin joint seat.
Preferably, the two ends of described magnet are equipped with described equal magnetic adjusting part, described equal magnetic adjusting part comprises Connection Block, push bolt and the bolt of pulling back, described Connection Block is connected in described erecting frame, the described threaded one end that pushes bolt is connected in described Connection Block, the described the other end that pushes bolt contacts at described magnet, the threaded one end of the described bolt of pulling back is connected in described magnet, the other end of the described bolt of pulling back slides and runs through described Connection Block, described Connection Block all described magnet and described in pull back between the nut of bolt, and the nut of the bolt of pulling back described in described Connection Block contacts at, described erecting frame is also connected with pushing part, and described pushing part pushes in described magnet towards the direction near described target, and described pushing part is between the described equal magnetic adjusting part at the two ends of described magnet.
Preferably, described equal magnetic adjusting part also comprises guide, and the direction that described guide does translational adjustment along described magnet is located at described erecting frame, and described Connection Block is and is slidably connected to described guide.
Preferably, described in move magnetic adjusting part between the described equal magnetic adjusting part at the two ends of described magnet, and described pushing part moves magnetic adjusting part described in being formed at.
Preferably, described pushing part is formed at described driving toothed gear and is close to the end of described magnet.
Preferably, described erecting frame offers a storage tank, described in move magnetic adjusting part and all magnetic adjusting part be all positioned at described storage tank.
Compared with prior art, because magnet of the present invention is the mobile erecting frame of being located at the magnet of regulating mechanism, magnet is positioned at the opposite side of heating and thermal insulation plate and both are isolated setting, magnet is located between magnet and erecting frame with regulating mechanism, magnet comprises and moves magnetic adjusting part and equal magnetic adjusting part with regulating mechanism, move magnetic adjusting part and all magnetic adjusting part be all located between magnet and erecting frame, order about the relative target of magnet and do translational adjustment operation along the direction that is parallel to target by moving magnetic adjusting part, order about magnet bending to regulate the distance of magnet two ends and target by equal magnetic adjusting part.Magnet is regulated according to actual user demand thereby realize, on the one hand, order about the relative target of magnet and do translational adjustment along the direction that is parallel to target by moving magnetic adjusting part, the everywhere that makes target is in turn within the scope of the action of a magnetic field in magnet, thereby the utilization ratio and the sputter scope that have greatly increased target, make full use of target, greatly improve the working (machining) efficiency of substrate coating simultaneously, and without the volume that increases magnet, the manufacturing cost of having saved magnetron sputtering coater; On the other hand, order about magnet bending to regulate the distance of magnet two ends and target by equal magnetic adjusting part, thereby make the Distribution of Magnetic Field in target region of living in more even, make the motion of the secondary electron in diode sputtering more stable and distribute more even, and then the plated film that makes substrate to be coated distributes more even and coating film thickness is more consistent, has finally greatly improved coating quality and the qualification rate of substrate.And magnet of the present invention also has advantages of simple in structure, low cost of manufacture and easy care with regulating mechanism.
Brief description of the drawings
Fig. 1 is the combination schematic perspective view that the magnetron sputtering coater of magnet of the present invention regulating mechanism is installed.
Fig. 2 is the two dimensional structure schematic diagram of Fig. 1.
Fig. 3 is the sectional view along A-A line in Fig. 2.
Fig. 4 is the combination schematic perspective view that moves magnetic adjusting part of magnet of the present invention regulating mechanism.
Fig. 5 is the combination schematic perspective view of the equal magnetic adjusting part of magnet of the present invention regulating mechanism.
Embodiment
In order to describe technology contents of the present invention, structural attitude in detail, below in conjunction with embodiment and coordinate accompanying drawing to be described further.
Refer to Fig. 1 to Fig. 5, magnet of the present invention is applicable to magnetron sputtering coater 200 with regulating mechanism 100, magnetron sputtering coater 200 comprises coating chamber (not shown), heating and thermal insulation plate 40, target 50, erecting frame 60 and is the magnet 70 of platy structure, heating and thermal insulation plate 40 and target 50 are all located in coating chamber, and target 50 is positioned at a side of heating and thermal insulation plate 40, and erecting frame 60 is installed on the outside of coating chamber, wherein, magnet 70 is the mobile erecting frame 60 of being located at, magnet 70 is positioned at the opposite side of heating and thermal insulation plate 40 and both are isolated setting, magnet is located between magnet 70 and erecting frame 60 with regulating mechanism 100, magnet comprises and moves magnetic adjusting part 10 and equal magnetic adjusting part 20 with regulating mechanism 100, move magnetic adjusting part 10 and all magnetic adjusting part 20 be all located between magnet 70 and erecting frame 60, order about the relative target of magnet 70 50 and do translational adjustment operation along the direction that is parallel to target 50 by moving magnetic adjusting part 10, order about magnet 70 bendings to regulate the distance of magnet 70 two ends and target 50 by equal magnetic adjusting part 20.Magnet 70 is regulated according to actual user demand thereby realize, on the one hand, order about the relative target of magnet 70 50 and do translational adjustment along the direction that is parallel to target 50 by moving magnetic adjusting part 10, the everywhere that makes target 50 is in turn within the scope of the action of a magnetic field in magnet 70, thereby utilization ratio and the sputter scope of target 50 are greatly increased, make full use of target 50, greatly improve the working (machining) efficiency of substrate coating simultaneously, and without the volume that increases magnet 70, the manufacturing cost of having saved magnetron sputtering coater 200; On the other hand, order about magnet 70 bendings to regulate the distance of magnet 70 two ends and target 50 by equal magnetic adjusting part 20, thereby make the Distribution of Magnetic Field in target 50 regions of living in more even, make the motion of the secondary electron in diode sputtering more stable and distribute more even, and then the plated film that makes substrate to be coated distributes more even and coating film thickness is more consistent, has finally greatly improved coating quality and the qualification rate of substrate.Particularly, as follows:
Wherein, move magnetic adjusting part 10 and comprise driving toothed gear 11 and driven bar shaped tooth 12, driving toothed gear 11 is articulated in erecting frame 60, the direction that driven bar shaped tooth 12 does translational adjustment along magnet 70 is installed on magnet 70, and driving toothed gear 11 and driven bar shaped tooth 12 engagement fit, thereby order about that driven bar shaped tooth 12 moves to drive magnet 70 to move and position adjustments that magnet 70 is carried out to translation by pivotable driving toothed gear 11, to improve the utilising efficiency of target 50, structure is more reasonable compact.More excellent, in the present embodiment, target 50 and magnet 70 all vertically arrange, and the direction that magnet 70 does translational adjustment arranges in horizontal direction, and structure is more reasonable compact, but, not as limit.More excellently be, in the present embodiment, move magnetic adjusting part 10 and also comprise pivotal axis 13 and operating parts 14, pivotal axis 13 is articulated in erecting frame 60, driving toothed gear 11 is installed on pivotal axis 13 one end near magnet 70, operating parts 14 is installed on pivotal axis 13 one end away from magnet 70, makes the pin-jointed structure of driving toothed gear 11 more reasonable compact, and can the more convenient driving toothed gear of pivotable effortlessly 11 by operating parts 14.Particularly, erecting frame 60 is provided with a pin joint seat 15, and pivotal axis 13 is articulated in pin joint seat 15, and structure is more reasonable compact.
Simultaneously, in the present embodiment, the two ends of magnet 70 are equipped with equal magnetic adjusting part 20, particularly, all magnetic adjusting part 20 comprises Connection Block 21, push bolt 22 and the bolt 23 of pulling back, Connection Block 21 is connected in erecting frame 60, the threaded one end that pushes bolt 22 is connected in Connection Block 21, the other end that pushes bolt 22 contacts at magnet 70, the threaded one end of bolt 23 of pulling back is connected in magnet 70, the other end of bolt 23 of pulling back slides and runs through Connection Block 21, Connection Block 21 is all between magnet 70 and the nut of the bolt 23 of pulling back, and Connection Block 21 contacts at the nut of the bolt 23 of pulling back, by push bolt 22 and the bolt 23 1 of pulling back push away one draw cooperatively interact for the distance of positioning magnet 70 two ends and target 50, in the time need to regulating the distance of magnet 70 two ends and target 50, only need pivotable to push bolt 22 and the bolt 23 of pulling back operates, very convenient, and simple and compact for structure, more excellently be, in the present embodiment, all magnetic adjusting part 20 comprises that two pull back bolt 23 and one push bolt 22, two bolts 23 of pulling back are distributed in and push the both sides of bolt 22 and be symmetrical layout about pushing bolt 22, structure is more reasonable compact, certainly, push bolt 22 and the concrete quantity of the bolt 23 of pulling back and arrangement not as limit, in other embodiments, can also be according to actual user demand and Choice and design flexibly, erecting frame 60 is also connected with pushing part 24, pushing part 24 pushes in magnet 70 towards the direction near target 50, and pushing part 24 is between the equal magnetic adjusting part 20 at the two ends of magnet 70, thereby push in the middle part of magnet 70 by pushing part 24, and by being positioned at the adjustment operation of equal magnetic adjusting part 20 at magnet 70 two ends, finally order about magnet 70 bendings to regulate the distance of magnet 70 two ends and target 50, thereby make the Distribution of Magnetic Field in target 50 regions of living in more even.More excellently be, all magnetic adjusting part 20 also comprises guide 25, and the direction that guide 25 does translational adjustment along magnet 70 is located at erecting frame 60, and Connection Block 21 is and is slidably connected to guide 25, thereby the translational adjustment of the magnet making 70 is more smooth and easy stable, and structure is more reasonable.More excellent, in the present embodiment, move magnetic adjusting part 10 between the equal magnetic adjusting part 20 at the two ends of magnet 70, and pushing part 24 is more excellent moves magnetic adjusting part 10 for being formed at, structure is more simple compact, but not as limit.More excellent, the equal magnetic adjusting part 20 that is positioned at the two ends of magnet 70 is symmetrical layout about pushing part 24.Specifically, pushing part 24 is formed at driving toothed gear 11 and is close to the end of magnet 70, and structure is more reasonable compact.
Compared with the superior, erecting frame 60 offers a storage tank 61, move magnetic adjusting part 10 and all magnetic adjusting part 20 be all positioned at storage tank 61, make to move magnetic adjusting part 10 and all magnetic adjusting part 20 arrangement spaces are more reasonable, reduce taking up room of entirety, structure is more reasonable compact, but, and as limit.
By reference to the accompanying drawings, magnet of the present invention is elaborated by the principle of work of regulating mechanism 100: in the time relative magnet 70 target 50 need to being done to translational adjustment operation along the direction that is parallel to target 50, only need to rotate to drive pivotal axis 13 to order about driving toothed gear 11 by pivot action part 14, thereby by pivotable driving toothed gear 11 order about that driven bar shaped tooth 12 moves to drive magnet 70 to move and the position adjustments of magnet 70 being carried out to translation in different positions, and then improve the utilising efficiency of target 50.
In the time need to regulating the distance of magnet 70 two ends and target 50, only need the equal magnetic adjusting part 20 at the two ends by being positioned at magnet 70 to regulate, by push bolt 22 and the bolt 23 1 of pulling back push away one draw cooperatively interact for the distance of positioning magnet 70 two ends and target 50, push bolt 22 by pivotable and the bolt 23 of pulling back carries out adjustment operation, and under the pushing tow of pushing part 24, make the middle part of magnet 70 towards the direction bending near target 50, and the two ends that this takes turns are towards the direction bending away from target 50, so that the distance of magnet 70 two ends and target 50 is adjusted, thereby make the Distribution of Magnetic Field in target 50 regions of living in more even, make the motion of the secondary electron in diode sputtering more stable and distribute more even, and then the plated film that makes substrate to be coated distributes more even and coating film thickness is more consistent.
Compared with prior art, because magnet of the present invention is the mobile erecting frame 60 of being located at the magnet 70 of regulating mechanism 100, magnet 70 is positioned at the opposite side of heating and thermal insulation plate 40 and both are isolated setting, magnet is located between magnet 70 and erecting frame 60 with regulating mechanism 100, magnet comprises and moves magnetic adjusting part 10 and equal magnetic adjusting part 20 with regulating mechanism 100, move magnetic adjusting part 10 and all magnetic adjusting part 20 be all located between magnet 70 and erecting frame 60, order about the relative target of magnet 70 50 and do translational adjustment operation along the direction that is parallel to target 50 by moving magnetic adjusting part 10, order about magnet 70 bendings to regulate the distance of magnet 70 two ends and target 50 by equal magnetic adjusting part 20.Magnet 70 is regulated according to actual user demand thereby realize, on the one hand, order about the relative target of magnet 70 50 and do translational adjustment along the direction that is parallel to target 50 by moving magnetic adjusting part 10, the everywhere that makes target 50 is in turn within the scope of the action of a magnetic field in magnet 70, thereby utilization ratio and the sputter scope of target 50 are greatly increased, make full use of target 50, greatly improve the working (machining) efficiency of substrate coating simultaneously, and without the volume that increases magnet 70, the manufacturing cost of having saved magnetron sputtering coater 200; On the other hand, order about magnet 70 bendings to regulate the distance of magnet 70 two ends and target 50 by equal magnetic adjusting part 20, thereby make the Distribution of Magnetic Field in target 50 regions of living in more even, make the motion of the secondary electron in diode sputtering more stable and distribute more even, and then the plated film that makes substrate to be coated distributes more even and coating film thickness is more consistent, has finally greatly improved coating quality and the qualification rate of substrate.And magnet of the present invention also has advantages of simple in structure, low cost of manufacture and easy care with regulating mechanism 100.
Above disclosed is only preferred embodiment of the present invention, the interest field that certainly can not limit the present invention with this, and the equivalent variations of therefore doing according to the claims in the present invention, still belongs to the scope that the present invention is contained.
Claims (10)
1. a magnet regulating mechanism, be applicable to magnetron sputtering coater, described magnetron sputtering coater comprises coating chamber, heating and thermal insulation plate, target, erecting frame and is the magnet of platy structure, described heating and thermal insulation plate and target are all located in described coating chamber, and described target is positioned at a side of heating and thermal insulation plate, and described erecting frame is installed on the outside of coating chamber, it is characterized in that, described magnet is the mobile described erecting frame of being located at, described magnet is positioned at the opposite side of described heating and thermal insulation plate and both are isolated setting, described magnet is located between described magnet and erecting frame with regulating mechanism, described magnet comprises and moves magnetic adjusting part and equal magnetic adjusting part with regulating mechanism, described move magnetic adjusting part and all magnetic adjusting part be all located between described magnet and erecting frame, order about the relatively described target of described magnet and do translational adjustment operation along the direction that is parallel to described target by the described magnetic adjusting part that moves, order about described magnet bending to regulate the distance of described magnet two ends and described target by described equal magnetic adjusting part.
2. magnet regulating mechanism as claimed in claim 1, it is characterized in that, the described magnetic adjusting part that moves comprises driving toothed gear and driven bar shaped tooth, described driving toothed gear is articulated in described erecting frame, the direction that described driven bar shaped tooth does translational adjustment along described magnet is installed on described magnet, and described driving toothed gear and described driven bar shaped tooth engagement fit.
3. magnet regulating mechanism as claimed in claim 2, is characterized in that, described target and magnet all vertically arrange, and the direction that described magnet does translational adjustment arranges in horizontal direction.
4. magnet regulating mechanism as claimed in claim 2, it is characterized in that, the described magnetic adjusting part that moves also comprises pivotal axis and operating parts, described pivotal axis is articulated in described erecting frame, described driving toothed gear is installed on described pivotal axis one end near described magnet, and described operating parts is installed on described pivotal axis one end away from described magnet.
5. magnet regulating mechanism as claimed in claim 4, is characterized in that, described erecting frame is provided with a pin joint seat, and described pivotal axis is articulated in described pin joint seat.
6. magnet regulating mechanism as claimed in claim 2, it is characterized in that, the two ends of described magnet are equipped with described equal magnetic adjusting part, described equal magnetic adjusting part comprises Connection Block, push bolt and the bolt of pulling back, described Connection Block is connected in described erecting frame, the described threaded one end that pushes bolt is connected in described Connection Block, the described the other end that pushes bolt contacts at described magnet, the threaded one end of the described bolt of pulling back is connected in described magnet, the other end of the described bolt of pulling back slides and runs through described Connection Block, described Connection Block all described magnet and described in pull back between the nut of bolt, and the nut of the bolt of pulling back described in described Connection Block contacts at, described erecting frame is also connected with pushing part, and described pushing part pushes in described magnet towards the direction near described target, and described pushing part is between the described equal magnetic adjusting part at the two ends of described magnet.
7. magnet regulating mechanism as claimed in claim 6, is characterized in that, described equal magnetic adjusting part also comprises guide, and the direction that described guide does translational adjustment along described magnet is located at described erecting frame, and described Connection Block is and is slidably connected to described guide.
8. magnet regulating mechanism as claimed in claim 6, is characterized in that, described in move magnetic adjusting part between the described equal magnetic adjusting part at the two ends of described magnet, and described pushing part moves magnetic adjusting part described in being formed at.
9. magnet regulating mechanism as claimed in claim 8, is characterized in that, described pushing part is formed at described driving toothed gear and is close to the end of described magnet.
10. magnet regulating mechanism as claimed in claim 1, is characterized in that, described erecting frame offers a storage tank, described in move magnetic adjusting part and all magnetic adjusting part be all positioned at described storage tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410083058.7A CN103849846B (en) | 2014-03-07 | 2014-03-07 | Magnet regulating mechanism |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410083058.7A CN103849846B (en) | 2014-03-07 | 2014-03-07 | Magnet regulating mechanism |
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| CN103849846A true CN103849846A (en) | 2014-06-11 |
| CN103849846B CN103849846B (en) | 2015-12-09 |
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| CN201410083058.7A Active CN103849846B (en) | 2014-03-07 | 2014-03-07 | Magnet regulating mechanism |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104372302A (en) * | 2014-11-29 | 2015-02-25 | 洛阳康耀电子有限公司 | Uniform heating device and method of magneto-controlled sputtering maglev vehicle target of ITO (indium tin oxide) film |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW425590B (en) * | 1996-07-19 | 2001-03-11 | Applied Komatsu Technology Inc | Non-planar magnet tracking during magnetron sputtering |
| CN1621559A (en) * | 2003-11-28 | 2005-06-01 | 中国科学院金属研究所 | Magnetron sputtering target capable of improving the availability of target materials |
| CN202157112U (en) * | 2011-06-15 | 2012-03-07 | 星弧涂层科技(苏州工业园区)有限公司 | Magnetic filed adjusting device for cathode arc |
| CN102644056A (en) * | 2012-05-10 | 2012-08-22 | 深圳市创益科技发展有限公司 | Magnetron sputtering device used for thin film solar cell and control system thereof |
| CN203096163U (en) * | 2013-02-27 | 2013-07-31 | 东莞汇海光电科技实业有限公司 | Adjusting device for uniformly coating for magnetic field |
| DE112012001988T5 (en) * | 2011-05-30 | 2014-02-20 | Hitachi Metals Ltd. | Racetrack-shaped magnetic field generating device for magnetron sputtering |
-
2014
- 2014-03-07 CN CN201410083058.7A patent/CN103849846B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW425590B (en) * | 1996-07-19 | 2001-03-11 | Applied Komatsu Technology Inc | Non-planar magnet tracking during magnetron sputtering |
| CN1621559A (en) * | 2003-11-28 | 2005-06-01 | 中国科学院金属研究所 | Magnetron sputtering target capable of improving the availability of target materials |
| DE112012001988T5 (en) * | 2011-05-30 | 2014-02-20 | Hitachi Metals Ltd. | Racetrack-shaped magnetic field generating device for magnetron sputtering |
| CN202157112U (en) * | 2011-06-15 | 2012-03-07 | 星弧涂层科技(苏州工业园区)有限公司 | Magnetic filed adjusting device for cathode arc |
| CN102644056A (en) * | 2012-05-10 | 2012-08-22 | 深圳市创益科技发展有限公司 | Magnetron sputtering device used for thin film solar cell and control system thereof |
| CN203096163U (en) * | 2013-02-27 | 2013-07-31 | 东莞汇海光电科技实业有限公司 | Adjusting device for uniformly coating for magnetic field |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104372302A (en) * | 2014-11-29 | 2015-02-25 | 洛阳康耀电子有限公司 | Uniform heating device and method of magneto-controlled sputtering maglev vehicle target of ITO (indium tin oxide) film |
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Denomination of invention: Regulating mechanism for magnet Effective date of registration: 20161117 Granted publication date: 20151209 Pledgee: Bank of Dongguan Limited by Share Ltd Humen branch Pledgor: Dongguan Xintai Glass Technology Co., Ltd. Registration number: 2016440000027 |
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