CN103842861A - Method of manufacturing mold for nano imprint - Google Patents
Method of manufacturing mold for nano imprint Download PDFInfo
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- CN103842861A CN103842861A CN201280047054.2A CN201280047054A CN103842861A CN 103842861 A CN103842861 A CN 103842861A CN 201280047054 A CN201280047054 A CN 201280047054A CN 103842861 A CN103842861 A CN 103842861A
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- mesh pattern
- comb mesh
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23P—METAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
- B23P15/00—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass
- B23P15/24—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass dies
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
- B29D11/00317—Production of lenses with markings or patterns
- B29D11/00346—Production of lenses with markings or patterns having nanosize structures or features, e.g. fillers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
- B29D11/0048—Moulds for lenses
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00634—Production of filters
- B29D11/00644—Production of filters polarizing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C99/00—Subject matter not provided for in other groups of this subclass
- B81C99/0075—Manufacture of substrate-free structures
- B81C99/009—Manufacturing the stamps or the moulds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/006—Nanostructures, e.g. using aluminium anodic oxidation templates [AAO]
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/10—Moulds; Masks; Masterforms
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/022—Electroplating of selected surface areas using masking means
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
- B29C33/424—Moulding surfaces provided with means for marking or patterning
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Electrochemistry (AREA)
- General Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Ophthalmology & Optometry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Micromachines (AREA)
Abstract
Provided is a method of manufacturing a mold for nano imprint comprising: forming a plurality of grid patterns on a substrate; forming a metal grid pattern on the grid patterns; forming a plated layer on the metal grid pattern; and separating a mold consisting of the metal grid pattern and the plated layer from the grid pattern, which can reduce a production cost, improve the efficiency of a process, and provide the mold for nano having improved durability and reliability.
Description
The cross reference of related application
The application requires to be submitted on July 28th, 2011 right of priority of the korean patent application No.10-2011-0075191 of Department of Intellectual Property of Korea S, and its full content mode is by reference incorporated into this.
Technical field
The present invention relates to manufacture the technical field for the mould of nano impression.
Background technology
Polarizer or polarization device refer to the optical device that pulls out the linearly polarized photon with certain vibration direction in the nonpolarized light of for example natural light.In general, be less than in the situation of half-wavelength of incident electromagnetic wave in the arrangement cycle of metal wire, the polarized component (s ripple) parallel with metal wire is reflected, and the polarized component vertical with metal wire (p ripple) is transmitted.Use this phenomenon, can produce the plane polarizer with outstanding polarization efficiency, high transfer rate and wide visual angle.This equipment is called as wire-grid polarizer or wire grid polarizer.
Propose to manufacture with nano-imprinting method recently the technology of aforementioned wire grid polarizer.Nano-imprinting method is to use mould nano-scale patterns to be molded as to the technology of impression shape.This nano-imprinting method can form comb mesh pattern by the comparatively simple method of the photoetching process than conventional.In addition, form in the situation of comb mesh pattern with the mould with nanoscale width at nano-imprinting method, can form the nanoscale comb mesh pattern that cannot realize by photoetching process.Therefore, its advantage is, has improved throughput rate, and has reduced production cost.
In order to form comb mesh pattern with aforesaid nano-imprinting method, first, should manufacture the mould of the pattern with intended shape.In these moulds, the mould that uses Silicon Wafer or quartz to manufacture has very high damaged frequency in process.Therefore,, in order to improve mechanical property, the disclosed technology for the manufacture of nickel electroforming mould processed in No.10-2007-0072949 as open in Korean Patent has been proposed.Fig. 1 to Fig. 3 illustrates the process of carrying out mfg. moulding die with electroforming, as open in the open No.10-2007-0072949 of Korean Patent.Referring to Fig. 1 to Fig. 3, as shown in Figure 1, first, on substrate 11, form comb mesh pattern 13 and manufacture main mould.Then, in comb mesh pattern 13, be formed for the conductive seed layer 14 of electroforming.After this, use electrocasting method on conductive seed layer 14, to form metal level 15, and then finally produce mould.But, the problem that uses the mould manufacturing method of electroforming to exist is, be difficult to form conductive seed layer 14, and the inside at mould during electroforming process forms hole 16, reduce the permanance of mechanical property and mould, and increased the damaged probability of main mould during the mould that separates manufacturing from comb mesh pattern 13.
Summary of the invention
Technical matters
An aspect of of the present present invention provides a kind of mould for nano impression, described mould can reduce production costs, improve process efficiency, and have durability and the reliability of improvement, these effects are owing to realizing closely spaced mould by producing in such a way: on substrate, form multiple comb mesh pattern; In described comb mesh pattern, form metal grate pattern; On described metal grate pattern, form coating; And the mould being made up of with described coating described metal grate pattern is separated with described comb mesh pattern.
Technical scheme
According to an aspect of the present invention, provide a kind of manufacture method of the mould for nano impression, described method comprises: on substrate, form multiple comb mesh pattern; In described comb mesh pattern, form metal grate pattern; On described metal grate pattern, form coating; And the mould being made up of with described coating described metal grate pattern is separated with described comb mesh pattern.
In the manufacture method of the mould for nano impression according to the present invention, forming described comb mesh pattern can comprise: use ultraviolet curable resin to apply described substrate, thereby form grid base bottom; Use impressing mould to push described grid base bottom; And to described grid base bottom irradiation ultraviolet radiation, thereby described grid base bottom is solidified.
In the manufacture method of the mould for nano impression according to the present invention, forming described comb mesh pattern can comprise: use heat reactive resin to apply described substrate to form grid base bottom; Use through the impressing mould of heating and push described grid base bottom so that described grid base bottom is solidified.
In the manufacture method of the mould for nano impression according to the present invention, the width of described comb mesh pattern can be formed in the scope of 20nm to 200nm.
In the manufacture method of the mould for nano impression according to the present invention, form described metal grate pattern and can comprise metal material is deposited in described comb mesh pattern to form metal grate basalis; And described metal grate basalis is carried out to wet etching.
In the manufacture method of the mould for nano impression according to the present invention, described metal material can be formed by Ni or Ni alloy.
In the manufacture method of the mould for nano impression according to the present invention, can use at least one in sputtering method, chemical vapour deposition technique and vapour deposition method that described metal material is deposited in described comb mesh pattern.
In the manufacture method of the mould for nano impression according to the present invention, forming described metal grate basalis can be by filling or deposits in described comb mesh pattern described metal material to provide predetermined space to complete to the whole space between described comb mesh pattern.
In the manufacture method of the mould for nano impression according to the present invention, described wet-etching technology can etching be formed on the described metal grate basalis between described comb mesh pattern.
In the manufacture method of the mould for nano impression according to the present invention, described wet-etching technology can also etching described in metal grate basalis be formed on the part in described comb mesh pattern.
In the manufacture method of the mould for nano impression according to the present invention, the cross section of described metal grate pattern can have at least one shape in polygon, semicircle and half elliptic.
In the manufacture method of the mould for nano impression according to the present invention, forming described coating can complete by electrocasting.
In the manufacture method of the mould for nano impression according to the present invention, described coating can be to be formed by the material identical with the material of described metal grate pattern, for example, and Ni or Ni alloy.
Beneficial effect
According to exemplary embodiment of the present invention, can manufacture the closely spaced mould that is less than 200nm that has being formed by metal material.Especially, can manufacture the mould being formed by nickel.Therefore, its advantage is, the mould for nano impression of permanance and the reliability with improvement can be provided.
In addition,, according to exemplary embodiment of the present invention, use simple electrocasting to manufacture to have the mould for nano impression of permanance and the reliability of improvement.Therefore, its advantage is, owing to not carrying out independent complex process, thus improve the efficiency of manufacturing process, and reduced the production cost of mould.
Accompanying drawing explanation
Accompanying drawing is used for further understanding the present invention, and is incorporated to and forms the part of this instructions.Accompanying drawing shows exemplary embodiment of the present invention together with the description, and plays the effect of explaining principle of the present invention.In these figure:
Fig. 1 to Fig. 3 is process drawing, shows briefly according to the method for the mfg. moulding die of routine techniques.
Fig. 4 is process flow diagram, shows according to the manufacture method of the mould for nano impression of exemplary embodiment of the present invention.
Fig. 5 to Figure 12 is process drawing, shows according to the manufacture method of the mould for nano impression of another exemplary embodiment of the present invention.
Embodiment
Come more intactly to describe according to exemplary embodiment of the present invention hereinafter with reference to accompanying drawing, make those skilled in the art can easily implement the present invention.In exemplary embodiment described herein and accompanying drawing, illustrated element is only a preferred illustrative embodiment of the present invention.Should be appreciated that existence can be for substituting multiple equivalents and the modification of these embodiment and element in the time submitting the application to.In addition,, in the time relating to the detailed description of the principle of operation to preferred exemplary embodiment, when considering about the detailed description meeting of known function or element is unnecessarily when fuzzy main idea of the present invention, just omit these detailed descriptions.At the undefined term of the situation of having considered function of the present invention below by the term of description.The meaning of each term should be understood according to the content of describing in whole instructions.In whole accompanying drawings, the identical Reference numeral of composed component that completes mutually the same function and operation refers to.
Fig. 4 is process flow diagram, shows according to the manufacture method of the mould for nano impression of exemplary embodiment of the present invention.
Referring to Fig. 4, can comprise according to the manufacture method of the mould for nano impression of of the present invention exemplary embodiment: on substrate, form comb mesh pattern (S1); In described comb mesh pattern, form metal grate pattern (S3); On described metal grate pattern, form coating (S5); And the mould being made up of with described coating described metal grate pattern is separated to (S7) with described comb mesh pattern.
The substrate using in S1 step can be made up of transparency carrier.As for the material of transparency carrier, can use the plastics and the sapphire that are formed by multiple polymers such as such as glass, quartz, acrylic compounds, PC, PET.In addition, can also use multiple material.Meanwhile, comb mesh pattern refers to and comprises raised design and be formed on the concept of the groove between each raised design, and the cycle refers to the distance between a comb mesh pattern and adjacent comb mesh pattern.The process that forms multiple comb mesh pattern below will be described.
Can complete the process that forms described comb mesh pattern by nano-imprinting method.That is to say, on substrate, coated polymer resin is to form grid base bottom.
Here, coated polymer resin can be by using one of spin-coating method, die coating method (die coating method), rolling method, dip coating, casting method, screen painting method, transfer printing method etc. to complete.More preferably, coating can complete by one of (but being not limited to) spin-coating method, die coating method, rolling method.
Meanwhile, about fluoropolymer resin, can use ultraviolet curable resin or heat reactive resin.For example, in the time using ultraviolet curable resin, after forming grid base bottom, the impressing mould with multiple groove parts and bossing is aimed on the top of grid base bottom.Here, multiple groove parts of impressing mould and bossing have the shape by groove part and bossing are formed with fixed intervals shape repeated arrangement separated from one another.And then the groove of impressing mould is corresponding with the position that is used to form comb mesh pattern.
After this, make after they contact with each other, to complete photocuring by irradiation ultraviolet radiation pressing the groove of impressing mould and grid base bottom.Therefore,, on the top of substrate, in the part corresponding with the groove of impressing mould, form multiple comb mesh pattern.Now, the width W of groove can change in the scope of 20nm to 200nm, but described width is not limited to this.Its objective is and in the part corresponding with groove, form the comb mesh pattern that width changes in the scope of 20nm to 200nm.But this is only an example, and can consider that the width of the mould for nano impression that will form subsequently selects the width of groove and the width of comb mesh pattern of impressing mould naturally.
Meanwhile, aforementioned exemplary embodiment has illustrated that the fluoropolymer resin of formation grid base bottom is the situation of ultraviolet curable resin, but also can use heat reactive resin.Therefore, comb mesh pattern of the present invention can form in such a way: complete heat curing by using through the impressing mould extruding grid base bottom of heating.
After forming described comb mesh pattern, in described comb mesh pattern, form metal grate pattern (S3).
Here, metal grate pattern is defined as being included in the general designation of the pattern forming on the top of comb mesh pattern.Forming metal grate pattern of the present invention can complete in such a way.First, by for example using current all deposition processs of having developed also commercialization or can implement according to following technical development, sputtering method, chemical vapour deposition technique, vapour deposition method etc., in described comb mesh pattern, deposit metallic material forms metal grate basalis.Now, the metal material depositing can comprise at least one or their alloy in Ni, Al, Au, Ag, Cr, the Cu with electric conductivity.Preferably use Ni or Ni alloy.Its objective is permanance and the demolding performace of the mould for nano impression that raising will form subsequently.
Metal grate pattern can form in the following manner: form metal grate basalis; Then carry out etching technics and carry out the clearance space between etching comb mesh pattern.Here, the part of etching can be the clearance space between comb mesh pattern, and as required, can also etching be formed on a part for the metal grate basalis in comb mesh pattern.Meanwhile, for aforementioned etching technics, can use wet-etching technology.Now, by regulating the wet etching time can regulate width and the thickness of metal grate pattern.The metal grate pattern of the present invention forming accordingly can have the structure of tiny raised design with the periodic arrangement of fixing.
Meanwhile, the cross sectional shape of metal grate pattern can be formed as various structures, for example, and quadrilateral, triangle, semicircle etc.Described shape can also be formed as triangle, quadrilateral, sinusoidal waveform etc.That is to say, metal grate pattern can be formed as having the shape of fixed cycle in a side direction, with the structure-irrelevant in cross section.
After forming metal grate pattern, on metal grate pattern, form coating (S5).The formation of coating completes with electrocasting.In addition,, for electroforming material, can use the material identical with the material of aforementioned metal comb mesh pattern.Particularly, can use Ni or Ni alloy.
In the situation that carrying out electroforming with nickel, because the distance between each metal grate pattern is very narrow, so nickel growth is in the horizontal direction restricted, thereby nickel is grown in vertical direction.In addition, growth is carried out in radial mode.Therefore,, in the time that nickel is finally grown up to level altitude, the coating being formed on metal grate pattern is connected to each other.Therefore, can finally obtain the mould with following structure: metal grate pattern is formed on the bottom of coating.
After forming coating, separate the mould (S7) with aforementioned coating and metal grate pattern from substrate with comb mesh pattern, thereby can obtain the mould for nano impression.
The mould for nano impression of the present invention of manufacturing by preceding method may be embodied as the little spacing that is less than 200nm.Especially, manufacturing the situation for the mould of nano impression with nickel, its advantage is, can improve permanance and reliability.
In addition,, along with the raising of the demolding performace of the mould for nano impression, can reduce the damaged probability of contingent main mould (substrate and comb mesh pattern) during detachment process.Therefore, the comb mesh pattern forming on the substrate forming in manufacture process can reuse during the manufacture process of the mould for nano impression, thereby additionally realizes economic interests, for example, reduce production costs to a greater degree.
In addition,, according to the present invention, use simple electrocasting to manufacture to have the mould for nano impression of the durability of improvement, so the effect having is, owing to not carrying out independent complicated technology, thus the efficiency of manufacturing process improved, and reduced production cost.
Fig. 5 to Figure 12 is process drawing, shows according to the manufacture method of the mould for nano impression of exemplary embodiment of the present invention.
Referring to Fig. 4 to Figure 12, as shown in Figure 5, substrate 110 is coated with fluoropolymer resin to form grid base bottom 130.
After this, as shown in Figure 6, impressing mould 210 is arranged on the top of grid base bottom 130.Here, as before described in the explanation of Fig. 4, spaced apart multiple bossings 211 that impressing mould 210 has to fix and be formed on the multiple grooves between each bossing.Here, the width of groove can be in the scope of 20nm to 200nm, but described width is not limited to this, as before described in the explanation of Fig. 4.
In addition, comb mesh pattern 131 can form in the following manner: use impressing mould 210 pushes the top of grid base bottom 130, as shown in Figure 7; And separate impressing mould 210 from grid base bottom subsequently, as shown in Figure 8.Now, after use impressing mould 310 pushes grid base bottom 130 and before separating impressing mould from grid base bottom, in the time that the material of formation grid base bottom 130 is heat reactive resin, carry out heat curing process, and in the time that described material is ultraviolet curable resin, carry out ultraviolet curing process by irradiation ultraviolet radiation.
Metal grate basalis 140 forms in the following manner: form comb mesh pattern; And deposit metallic material in comb mesh pattern 131 subsequently, as shown in Figure 9.Now, metal grate basalis 140 can be formed as making, and as shown in Figure 9, the space between each comb mesh pattern 131 is all filled up, or accompanying drawing not shown, but metal grate basalis can have the fixed space being formed between each comb mesh pattern 131.Because this fixed space is arranged between each comb mesh pattern 131, thus during the wet-etching technology that will carry out subsequently etching metal grate basalis 140 reposefully.
Here,, by using all deposition processs of having developed also commercialization at present or can having implemented according to following technical development, for example, sputtering method, chemical vapour deposition technique, vapour deposition method etc., can be deposited on the metal material depositing in comb mesh pattern 131.In addition, this metal material can comprise at least one and their alloy in Ni, Al, Au, Ag, Cr, the Cu with electric conductivity.Described in the explanation of Fig. 4, preferably use Ni or Ni alloy as before.
As shown in figure 10, metal grate pattern 150 can form in the following manner: form metal grate basalis 140; Then carry out the space A between the each comb mesh pattern 131 of etching by dry etch process.Now, described in the explanation of Fig. 4, can regulate width and the thickness of metal grate pattern 150 as before by the time of adjusting dry etching.
After forming metal grate pattern 150, on metal grate pattern 150, form coating 170.Now, for the material that is used to form coating, can use the material identical with the material that forms metal grate pattern 150.Especially, described in the explanation of Fig. 4, can use Ni or Ni alloy as before.Carrying out during electroforming, because the distance between each metal grate pattern 150 is very narrow, so coating growth is in the horizontal direction restricted, thereby coating is grown in vertical direction.In addition, growth is carried out in radial mode.In the time that coating is grown up to level altitude, as shown in figure 11, can form the coating 170 with following shape: wherein coating is connected on metal grate pattern 150.Therefore, can finally obtain the mould 300 with following structure, wherein metal grate pattern 150 is formed on the bottom of coating 170, as before described in the explanation of Fig. 4.
When forming mould 300 and during subsequently from substrate 110 and comb mesh pattern 131 peel of mould, can obtain the mould 300 for nano impression as illustrated in Figure 12 in comb mesh pattern 131.
As previously mentioned, in detailed description of the present invention, owing to having described detailed example embodiment of the present invention, so should be understood that, those skilled in the art can carry out numerous modifications and variations under the premise without departing from the spirit and scope of the present invention.Therefore, be to be understood that, foregoing is for the present invention being described and not being appreciated that the disclosed specific embodiment of restriction, and modification and other embodiment to disclosed embodiment is intended to be included in the scope of appended claims and equivalents thereof.
Claims (14)
1. for a manufacture method for the mould of nano impression, comprising:
On substrate, form multiple comb mesh pattern;
In described comb mesh pattern, form metal grate pattern;
On described metal grate pattern, form coating; And
The mould being made up of with described coating described metal grate pattern is separated with described comb mesh pattern.
2. the method for claim 1, wherein forming described comb mesh pattern comprises: use ultraviolet curable resin to apply described substrate to form grid base bottom; Use impressing mould to push described grid base bottom; And to described grid base bottom irradiation ultraviolet radiation with by described grid base bottom solidify.
3. the method for claim 1, wherein forming described comb mesh pattern comprises: use heat reactive resin to apply described substrate to form described grid base bottom; And use the impressing mould through heating to push described grid base bottom so that described grid base bottom is solidified.
The method of claim 1, wherein the width of described comb mesh pattern in the scope of 20nm to 200nm.
5. the method for claim 1, wherein forming described metal grate pattern comprises: metal material is deposited in described comb mesh pattern to form metal grate basalis; And described metal grate basalis is carried out to wet etching.
6. method as claimed in claim 5, wherein, described metal material is made up of Ni or Ni alloy.
7. method as claimed in claim 5, wherein, is deposited on described metal material in described comb mesh pattern by least one in sputtering method, chemical vapour deposition technique and vapour deposition method.
8. method as claimed in claim 5, wherein, forming described metal grate basalis is by filling the whole space between described comb mesh pattern or described metal material being deposited in described comb mesh pattern and being completed to make providing predetermined space.
9. method as claimed in claim 5, wherein, described wet-etching technology is that the described metal grate basalis by forming between comb mesh pattern described in etching completes.
10. method as claimed in claim 9, wherein, described wet-etching technology is to complete by the part that described in etching, metal grate basalis is formed in described comb mesh pattern.
11. the method for claim 1, wherein the cross section of described metal grate pattern there is at least one shape in polygon, semicircle and half elliptic.
The method of claim 1, wherein 12. form described coating completes by electrocasting.
13. the method for claim 1, wherein described coating be to be formed by the material identical with the material of described metal grate pattern.
14. the method for claim 1, wherein described coating formed by Ni or Ni alloy.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020110075191A KR101775163B1 (en) | 2011-07-28 | 2011-07-28 | Manufacturing method of mold for nano imprint and mold for nano imprint by using the same |
| KR10-2011-0075191 | 2011-07-28 | ||
| PCT/KR2012/006007 WO2013015648A2 (en) | 2011-07-28 | 2012-07-27 | Method of manufacturing mold for nano imprint |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103842861A true CN103842861A (en) | 2014-06-04 |
| CN103842861B CN103842861B (en) | 2017-03-22 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201280047054.2A Expired - Fee Related CN103842861B (en) | 2011-07-28 | 2012-07-27 | Method of manufacturing mold for nano imprint |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR101775163B1 (en) |
| CN (1) | CN103842861B (en) |
| TW (1) | TW201319636A (en) |
| WO (1) | WO2013015648A2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110884246A (en) * | 2018-08-16 | 2020-03-17 | 汉能移动能源控股集团有限公司 | UV transfer printing mold and preparation method thereof, front plate and solar curtain wall |
| US10710350B2 (en) | 2017-05-23 | 2020-07-14 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Nanometer wire grid structure fabrication method |
Families Citing this family (4)
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| US9919553B2 (en) | 2014-09-02 | 2018-03-20 | E Ink California, Llc | Embossing tool and methods of preparation |
| TWI620651B (en) * | 2015-08-31 | 2018-04-11 | 伊英克加利福尼亞有限責任公司 | Embossing tool and method for preparation thereof |
| KR102267128B1 (en) * | 2019-07-19 | 2021-06-23 | 주식회사 제이마이크로 | Manufacturing method of encoder |
| CN111716084B (en) * | 2020-07-01 | 2021-07-27 | 南京工程学院 | Manufacturing method of copper/steel composite injection mold with honeycomb and embedded nail interface structure |
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| CN110884246A (en) * | 2018-08-16 | 2020-03-17 | 汉能移动能源控股集团有限公司 | UV transfer printing mold and preparation method thereof, front plate and solar curtain wall |
Also Published As
| Publication number | Publication date |
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| TW201319636A (en) | 2013-05-16 |
| CN103842861B (en) | 2017-03-22 |
| WO2013015648A2 (en) | 2013-01-31 |
| KR20130013502A (en) | 2013-02-06 |
| WO2013015648A3 (en) | 2013-04-25 |
| KR101775163B1 (en) | 2017-09-05 |
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