CN103834962A - Material surface photocatalytic degreasing device and photocatalytic degreasing method - Google Patents
Material surface photocatalytic degreasing device and photocatalytic degreasing method Download PDFInfo
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- CN103834962A CN103834962A CN201410016361.5A CN201410016361A CN103834962A CN 103834962 A CN103834962 A CN 103834962A CN 201410016361 A CN201410016361 A CN 201410016361A CN 103834962 A CN103834962 A CN 103834962A
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- 238000000034 method Methods 0.000 title claims abstract description 37
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- 239000004065 semiconductor Substances 0.000 claims abstract description 71
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- 230000000694 effects Effects 0.000 claims description 13
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- 238000001035 drying Methods 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
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- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000011787 zinc oxide Substances 0.000 claims description 8
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Abstract
A material surface photocatalytic degreasing device and a photocatalytic degreasing method belong to the technical field of material surface treatment. The invention is characterized in that the material surface photocatalytic degreasing device comprises a material feeder (1), a front pressure roller (2), a water supply mechanism (3), a glass tube (4) with an outer surface deposited with a nanometer semiconductor film, a light source (5), a washer (6), a liquid collecting groove (7), a back pressure roller (8), a dryer (9) and a material recovering device (10). Photocatalytic degreasing of material (11) surface grease is realized by the combination of nanometer photocatalytic green degradation of grease, reaction acceleration by a micro-reactor, and oxidation group increase by circulating water under a photocatalytic condition. The advantages of the invention are that the material (11) surface degreasing process is carried out at room temperature; no degreasing agent is necessary; the process is short, green, environment-friendly, energy-saving, long-acting, convenient to carry out, harmless to human body, low in cost, thorough in degreasing, and nondestructive for product surfaces; the device is simple in structure, convenient to operate, low in investment, easy to realize automation; and the degreased material (11) has high surface smoothness.
Description
Technical field
The invention belongs to surface treatment technology of material field, a kind of material surface photochemical catalysis skimming unit and photochemical catalysis degreasing method are particularly provided.
Technical background
Material must be through surface treatment, to remove lubricating oil for machining and the antirust wet goods grease of material surface before carrying out application, plating and other protective treatments.Particularly, along with fast development and the technical progress of high-technology field, the surface treatment quality of material has also been proposed to more and more higher requirement.Degreasing is exactly in preparation processing and preservation process, to stay its surperficial grease in order to remove material, thereby keeps the smooth finish of material surface, is that material surface carries out the basic pretreatment procedure before such as application, plating.Degreasing has material impact to application and plating etc., and the combination situation of coating and coating etc. and matrix and drying property, ornamental and solidity to corrosion etc. often have direct relation with the degreasing degree of matrix surface.Therefore, the skimming treatment of material surface has been subject to great attention at engineering field, is also one of primary study content of scientific research personnel.
Traditional degreasing is to rely on solvency action and the saponification of grease-removing agent to grease, rely on the physical action such as wetting, infiltration, dispersion of tensio-active agent to grease, make grease become solubilized or dispersible, thereby make grease leave material surface, allow new clean-out system occupy surface, reach clean.Because material surface has metastable liquid film, therefore that the grease after dissolving leaves material surface and upgrades lip-deep clean-out system etc. is often more difficult, generally all need to be stirred, wiping etc.
At present, the main degreasing method of material surface comprises chemical degreasing, organic solvent degreasing, electrolytic degreasing, tensio-active agent degreasing and ultrasonic degreasing.
Chemical degreasing is the most traditional degreasing method, and its principle is mainly saponification, emulsifying effect and the complexing action of performance grease-removing agent, by the mode of wetting, infiltration, rolling off, dispersion and solubilising, the grease of material surface is removed.Chemical degreasing cost is low, easy to operate, is convenient to serialization and produces, and applies very extensive.But the degreasing effect of chemical degreasing is poor, use temperature high (skimming temp is up to 80 DEG C sometimes), the treatment time is long, conventionally also will be by the mechanical effect such as pressure injection or stirring.
Organic solvent degreasing is to utilize the similar principle mixing.Conventional organic solvent has kerosene, gasoline, toluene, trieline and tetracol phenixin etc.Organic solvent degreasing has speed and soon, does not corrode the advantages such as goods; But have, degreasing is not thorough, inflammable, toxicity large, high in cost of production shortcoming, when the steam of organic solvent reaches finite concentration in air, meeting fire can explode, and must do aborning ventilation, fire prevention, the security measures such as explosion-proof well, must in Sealing Arrangement, carry out.
Electrolytic degreasing is that goods are hung on the negative electrode or anode of alkaline electrolyte, the method that while utilizing electrolysis, a large amount of gases of polarization of electrode effect and generation are removed grease.Electrolytic degreasing generally all needs high temperature (skimming temp is up to 80 DEG C sometimes), and not only energy consumption cost is high, and can cause serious pollution to environment.
Tensio-active agent degreasing (also referred to as emulsifying agent degreasing) is to utilize the hydrophilic polar group of tensio-active agent to water and oil loving non-polar group to oily characteristic, make loss of adhesion at material surface of grease, under stirring and heat effect, thereby grease leaves and reaches degreasing effect from material surface.But often price is more expensive for the good tensio-active agent of degreasing effect at present, working concentration is high, and raw material investment is large; General tensio-active agent often easily produces a large amount of foams, affects normal running.
Ultrasonic degreasing is by means of ultra-sonic oscillation, makes to produce small bubbles in grease-removing agent, and growing to break because small bubbles are continuous produces powerful mechanical force impact material surface, grease is removed and float on liquid level.The energy consumption of ultrasonic degreasing is higher, and ultrasonic degreasing is normally combined use with chemical degreasing with electrolytic degreasing.
In existing degreasing method, generally all to adopt the chemical reagent such as grease-removing agent, the more problems of existence.With regard to regard to grease-removing agent, current grease-removing agent used phosphorous aqueous cleaning agent often, can contain a large amount of phosphorus in the waste liquid of discharge, will cause environmental pollution and water pollution, causes the amount reproduction of algae in rivers, affects the growth of fish etc.Although also start to adopt agent of non-phosphate degreasing, but all contain anion surfactant sodium alkyl benzene sulfonate in its formula, although this tensio-active agent has very strong emulsifying power and degreasing power, but in the time of degreasing, be easy to produce the foam that a large amount of stability is very strong, be difficult for rinsing and water wasting is time-consuming, tensio-active agent easily remains in product surface and causes degreasing not thorough simultaneously, can channel on the equipment of later process, affect the processing treatment of later process, harm production safety, causing doing over again even stops production.
The problems such as the high quality that in summary, existing material surface degreasing method exists that technical process is long, required equipment is expensive, environmental pollution is large, energy dissipation is serious, cost is high and degreasing effect is difficult to meet development requires.
The require increasingly stringent of countries in the world to environment protection at present; pursuit to material surface quality improves constantly; therefore develop a kind of without grease-removing agent, short flow process, environmental protection, energy-conservation, long-acting, harmless, low cost, grease remove thoroughly, to product surface not damaged, facility investment is few and implement the new device of material surface degreasing easily and method, has very urgent and important meaning.
Summary of the invention
The present invention accelerates nano-photo catalytic degradation of organic substances and microreactor the new principle introducing material surface defatting technology fields such as chemical reaction and proposes.By light source being placed in the Glass tubing of outside deposition Nanometer Semiconductor Films, ensure light source and organism (as the grease) both sides in Nanometer Semiconductor Films respectively, solve organism under normal circumstances and between light source and Nanometer Semiconductor Films, cannot realize the problem that material surface organism nano-photo catalytic is degraded; Material, by the glass tube exterior surface close contact of Minimal Tension and outside deposition Nanometer Semiconductor Films, is formed to microreactor, improve the efficiency of nano-photo catalytic degradation of organic substances; By input flowing water in the photocatalysis microreactor of nano-photo catalytic and microreactor formation, be conducive to catch hole, play the effect of photocatalyst, increase the oxide group on organism surface, further improve organic photocatalytic degradation efficiency.Develop on this basis a kind of material surface photochemical catalysis skimming unit and method, give full play to the green degraded of nano-photo catalytic grease, microreactor and flowing water acting in conjunction and improve the effects such as nano-photo catalytic degraded grease efficiency, reach without grease-removing agent, short flow process, environmental protection, energy-conservation, long-acting, implement convenient, harmless, low cost, grease remove thoroughly, to product surface not damaged and at room temperature just can complete the objects such as material surface degreasing, solve the foregoing problems of current material surface skimming unit and method existence.
A kind of material surface photochemical catalysis skimming unit, it is characterized in that, formed by Glass tubing (4), light source (5), cleanser (6), hydrops groove (7), rear pressure roller (8), dryer (9), the collecting machine (10) of feeding machine (1), front pressure roller (2), water supply mechanism (3), outside deposition Nanometer Semiconductor Films.Wherein, the Glass tubing (4) of feeding machine (1), front pressure roller (2), water supply mechanism (3), outside deposition Nanometer Semiconductor Films, light source (5), cleanser (6), rear pressure roller (8), dryer (9), collecting machine (10) are arranged on straight line formula production line, hydrops groove (7) be arranged in water supply mechanism (3), outside deposition Nanometer Semiconductor Films Glass tubing (4), light source (5) and cleanser (6) institute correspondence position under.The degreasing unit being made up of Glass tubing (4), light source (5), cleanser (6), hydrops groove (7), the rear pressure roller (8) of front pressure roller (2), water supply mechanism (3), outside deposition Nanometer Semiconductor Films repeats to arrange, quantity is 1 ~ 20, and the layout level height of degreasing unit, interval is consistent, the layout level height of adjacent degreasing unit can be different.Light source (5) is installed on the interior middle part of Glass tubing (4) of outside deposition Nanometer Semiconductor Films, and light source (5) is fixing, and the Glass tubing (4) of outside deposition Nanometer Semiconductor Films can be around axially rotating freely; The Glass tubing (4) of front pressure roller (2), outside deposition Nanometer Semiconductor Films and rear pressure roller (8) are all to drive and passive rotation while being advanced by material (11), the roller footpath of front pressure roller (2) and rear pressure roller (8) is identical and be positioned at same level height, the Glass tubing (4) of outside deposition Nanometer Semiconductor Films with material (11) by Minimal Tension close contact.The linear velocity of feeding machine (1) and collecting machine (10) is consistent, and collecting machine (10) is built and opened rear pressure roller (8), and front pressure roller (2) is built and opened feeding machine (1).
A kind of method that adopts above-mentioned materials surface light catalytic degreasing device material surface to be carried out to photochemical catalysis degreasing, it is characterized in that, surface has the material (11) of grease to send from feeding machine (1), by after front pressure roller (2) and Glass tubing (4) close contact of outside deposition Nanometer Semiconductor Films; The flowing water that simultaneously material (11) provides water supply mechanism (3) is brought the contact area between the Glass tubing (4) of material (11) and outside deposition Nanometer Semiconductor Films into; From light or sunlight and the Nanometer Semiconductor Films effect generation light-catalyzed reaction of Glass tubing (4) internal light source (5) of outside deposition Nanometer Semiconductor Films, produce electronics and hole on Nanometer Semiconductor Films surface, the grease on material in contact area (11) surface is degraded; Material (11) after the grease degraded of surface is and then by cleanser (6), and the scavenging solution that being cleaned device (6) provides is scrubbed, and completes the skimming processes of a degreasing unit; In process, all flowing water, photochemical catalysis degreasing product and scavenging solutions flow directly in hydrops groove (7); Material (11) after the degreasing of a degreasing unit completes will be by rear pressure roller (8); The material (11) that thoroughly completes degreasing through all degreasings unit enters dryer (9) and carries out drying and processing, and bake out temperature is 80 ~ 200 DEG C; Finally arrive collecting machine (10), obtain the material (11) with high surface finish.
The material (11) of described feeding machine (1) for providing surface to have grease; Described front pressure roller (2) applies some tension for the material to from feeding machine (1) (11); Described water supply mechanism (3) is for providing the flowing water of the contact area between the Glass tubing (4) of input material (11) and outside deposition Nanometer Semiconductor Films; The Glass tubing (4) of described outside deposition Nanometer Semiconductor Films is for seeing through light or the sunlight from light source (5), with Nano semiconductor generation light-catalyzed reaction, produce electronics and hole on Nanometer Semiconductor Films surface, described Nanometer Semiconductor Films is nano-titanium dioxide film, Nano zinc oxide film, nano oxidized silicon film or the Nanometer Semiconductor Films through doping vario-property.
The Glass tubing (4) of described outside deposition Nanometer Semiconductor Films is quartz glass tube, the vycor tube of outside deposition Nanometer Semiconductor Films or the conventional clear glass pipe of outside deposition Nanometer Semiconductor Films of outside deposition Nanometer Semiconductor Films.
Described light source (5) is ultraviolet light, high voltage mercury lamp or fluorescent lamp; Also can cancel described light source (5), the inside of a Glass tubing (4) at outside deposition Nanometer Semiconductor Films sees through sunlight.
Described cleanser (6) carries out clean scavenging solution for providing to the material after photochemical catalysis degreasing (11) surface; Described hydrops groove (7) is for collecting flowing water, photochemical catalysis degreasing product and scavenging solution; Described rear pressure roller (8) is for coordinating to material (11) and apply some tension with collecting machine (10); Described dryer (9) for to degreasing thoroughly and the material (11) that completes surface cleaning processing carry out drying and processing; Described collecting machine (10) is for collecting and export the material (11) after oven dry.
Described material (11) is sheet metal, sheet metal strip or metal foil.
Major advantage of the present invention is:
1, material surface photochemical catalysis degreasing mainly utilizes the photocatalysis to degrade organic matter characteristic of Nanometer Semiconductor Films, there is short flow process, consume less, long-acting stable, enforcements is convenient, harmless, cost is low, grease remove thorough, to advantages such as product surface not damaged, degreasing good uniformities, be conducive to acquisition and have the material of high surface finish.
2, in material surface photochemical catalysis skimming processes, input flowing water, not only improved photochemical catalysis degreasing efficiency, and the product being conducive to after decomposition leaves material surface, the further photocatalysis Decomposition of acceleration to bottom grease, the time of shortening photochemical catalysis degreasing fast.
3, when material surface photochemical catalysis degreasing without any grease-removing agent, without other chemical reagent, the product after degreasing is mainly water and carbonic acid gas, environmental protection.
4, material surface photochemical catalysis skimming processes at room temperature just can complete, save energy.
5, material surface photochemical catalysis skimming unit is simple in structure, easy to operate, and less investment, easily is automated, and reduces manually, saves space.
Brief description of the drawings
Fig. 1 is material surface photochemical catalysis degreasing process schematic flow sheet of the present invention.Wherein (1) is feeding machine; (2) be front pressure roller; (3) be water supply mechanism; (4) be the Glass tubing of outside deposition Nanometer Semiconductor Films; (5) be light source; (6) be cleanser; (7) be hydrops groove; (8) be rear pressure roller; (9) be dryer; (10) be collecting machine; (11) be material.
Embodiment
Below in conjunction with embodiment, the present invention is specifically described; be necessary to be pointed out that at this present embodiment is only used to further illustrate the present invention; can not be interpreted as limiting the scope of the invention, the those of skill in the art in this field can make some nonessential improvement and adjustment according to the content of the invention described above.
1 pair of material surface photochemical catalysis skimming unit of the present invention is described as follows by reference to the accompanying drawings:
Material surface photochemical catalysis skimming unit is made up of Glass tubing (4), light source (5), cleanser (6), hydrops groove (7), rear pressure roller (8), dryer (9), the collecting machine (10) of feeding machine (1), front pressure roller (2), water supply mechanism (3), outside deposition Nanometer Semiconductor Films.Wherein, the Glass tubing (4) of feeding machine (1), front pressure roller (2), water supply mechanism (3), outside deposition Nanometer Semiconductor Films, light source (5), cleanser (6), rear pressure roller (8), dryer (9), collecting machine (10) are arranged on straight line formula production line, hydrops groove (7) be arranged in water supply mechanism (3), outside deposition Nanometer Semiconductor Films Glass tubing (4), light source (5) and cleanser (6) institute correspondence position under.The degreasing unit being made up of Glass tubing (4), light source (5), cleanser (6), hydrops groove (7), the rear pressure roller (8) of front pressure roller (2), water supply mechanism (3), outside deposition Nanometer Semiconductor Films repeats to arrange, quantity is 1 ~ 20, and the layout level height of degreasing unit, interval is consistent, the layout level height of adjacent degreasing unit can be different.Light source (5) is installed on the interior middle part of Glass tubing (4) of outside deposition Nanometer Semiconductor Films, and light source (5) is fixing, and the Glass tubing (4) of outside deposition Nanometer Semiconductor Films can be around axially rotating freely; The Glass tubing (4) of front pressure roller (2), outside deposition Nanometer Semiconductor Films and rear pressure roller (8) are all to drive and passive rotation while being advanced by material (11), the roller footpath of front pressure roller (2) and rear pressure roller (8) is identical and be positioned at same level height, the Glass tubing (4) of outside deposition Nanometer Semiconductor Films with material (11) by Minimal Tension close contact.The linear velocity of feeding machine (1) and collecting machine (10) is consistent, and collecting machine (10) is built and opened rear pressure roller (8), and front pressure roller (2) is built and opened feeding machine (1).
The material (11) of described feeding machine (1) for providing surface to have grease; Described front pressure roller (2) applies some tension for the material to from feeding machine (1) (11); Described water supply mechanism (3) is for providing the flowing water of the contact area between the Glass tubing (4) of input material (11) and outside deposition Nanometer Semiconductor Films; The Glass tubing (4) of described outside deposition Nanometer Semiconductor Films is for seeing through light or the sunlight from light source (5), with Nano semiconductor generation light-catalyzed reaction, produce electronics and hole on Nanometer Semiconductor Films surface, described Nanometer Semiconductor Films is nano-titanium dioxide film, Nano zinc oxide film, nano oxidized silicon film or the Nanometer Semiconductor Films through doping vario-property.
The Glass tubing (4) of described outside deposition Nanometer Semiconductor Films is quartz glass tube, the vycor tube of outside deposition Nanometer Semiconductor Films or the conventional clear glass pipe of outside deposition Nanometer Semiconductor Films of outside deposition Nanometer Semiconductor Films.
Described light source (5) is ultraviolet light, high voltage mercury lamp or fluorescent lamp; Also can cancel described light source (5), the inside of a Glass tubing (4) at outside deposition Nanometer Semiconductor Films sees through sunlight.
Described cleanser (6) carries out clean scavenging solution for providing to the material after photochemical catalysis degreasing (11) surface; Described hydrops groove (7) is for collecting flowing water, photochemical catalysis degreasing product and scavenging solution; Described rear pressure roller (8) is for coordinating to material (11) and apply some tension with collecting machine (10); Described dryer (9) for to degreasing thoroughly and the material (11) that completes surface cleaning processing carry out drying and processing; Described collecting machine (10) is for collecting and export the material (11) after oven dry.
Described material (11) is sheet metal, sheet metal strip or metal foil.
Embodiment 1:
Surface has the rolled copper foil (11) of grease to send from feeding machine (1), by after front pressure roller (2) and quartz glass tube (4) close contact of outside deposition nano-titanium dioxide film; The flowing water that simultaneously rolled copper foil (11) provides water supply mechanism (3) is brought the contact area between the quartz glass tube (4) of rolled copper foil (11) and outside deposition nano-titanium dioxide film into; From light and the nano-titanium dioxide film effect generation light-catalyzed reaction of the inner ultraviolet light of quartz glass tube (4) (5) of outside deposition nano-titanium dioxide film, produce electronics and hole on nano-titanium dioxide film surface, the grease on rolled copper foil in contact area (11) surface is degraded; Rolled copper foil (11) after the grease degraded of surface is and then by cleanser (6), and the scavenging solution that being cleaned device (6) provides is scrubbed, and completes the skimming processes of a degreasing unit; In process, all flowing water, photochemical catalysis degreasing product and scavenging solutions flow directly in hydrops groove (7); Rolled copper foil (11) after the degreasing of a degreasing unit completes will be by rear pressure roller (8); The rolled copper foil (11) that thoroughly completes degreasing through all degreasings unit enters dryer (9) and carries out drying and processing, and bake out temperature is 80 DEG C; Finally arrive collecting machine (10), obtain the rolled copper foil (11) with high surface finish.
Embodiment 2:
Surface has the Stainless Steel Band (11) of grease to send from feeding machine (1), by after front pressure roller (2) and conventional clear glass pipe (4) close contact of outside deposition nitrogen-doped nanometer titanium dioxide film; The flowing water that Stainless Steel Band (11) provides water supply mechanism (3) is simultaneously brought the contact area between Stainless Steel Band (11) and the conventional clear glass pipe (4) of outside deposition nitrogen-doped nanometer titanium dioxide film into; From the conventional clear glass pipe (4) of outside deposition nitrogen-doped nanometer titanium dioxide film inner sunlight and nitrogen-doped nanometer titanium dioxide membrane action generation light-catalyzed reaction, produce electronics and hole at nitrogen-doped nanometer titanium dioxide film surface, the grease on Stainless Steel Band in contact area (11) surface is degraded; Stainless Steel Band (11) after the grease degraded of surface is and then by cleanser (6), and the scavenging solution that being cleaned device (6) provides is scrubbed, and completes the skimming processes of a degreasing unit; In process, all flowing water, photochemical catalysis degreasing product and scavenging solutions flow directly in hydrops groove (7); Stainless Steel Band (11) after the degreasing of a degreasing unit completes will be by rear pressure roller (8); The Stainless Steel Band (11) that thoroughly completes degreasing through all degreasings unit enters dryer (9) and carries out drying and processing, and bake out temperature is 200 DEG C; Finally arrive collecting machine (10), obtain the Stainless Steel Band (11) with high surface finish.
Embodiment 3:
Surface has the aluminium alloy plate (11) of grease to send from feeding machine (1), by after front pressure roller (2) and high silica glass/glass pipe (4) close contact of outside deposition Nano zinc oxide film; The flowing water that simultaneously aluminium alloy plate (11) provides water supply mechanism (3) is brought the contact area between the high silica glass/glass pipe (4) of aluminium alloy plate (11) and outside deposition Nano zinc oxide film into; From light and the Nano zinc oxide film effect generation light-catalyzed reaction of high silica glass/glass pipe (4) the internal high pressure mercury lamp (5) of outside deposition Nano zinc oxide film, produce electronics and hole on Nano zinc oxide film surface, the grease on aluminium alloy plate in contact area (11) surface is degraded; Aluminium alloy plate (11) after the grease degraded of surface is and then by cleanser (6), and the scavenging solution that being cleaned device (6) provides is scrubbed, and completes the skimming processes of a degreasing unit; In process, all flowing water, photochemical catalysis degreasing product and scavenging solutions flow directly in hydrops groove (7); Aluminium alloy plate (11) after the degreasing of a degreasing unit completes will be by rear pressure roller (8); The aluminium alloy plate (11) that thoroughly completes degreasing through all degreasings unit enters dryer (9) and carries out drying and processing, and bake out temperature is 150 DEG C; Finally arrive collecting machine (10), obtain the aluminium alloy plate (11) with high surface finish.
Claims (8)
1. a material surface photochemical catalysis skimming unit, it is characterized in that, formed by Glass tubing (4), light source (5), cleanser (6), hydrops groove (7), rear pressure roller (8), dryer (9), the collecting machine (10) of feeding machine (1), front pressure roller (2), water supply mechanism (3), outside deposition Nanometer Semiconductor Films; Wherein, the Glass tubing (4) of feeding machine (1), front pressure roller (2), water supply mechanism (3), outside deposition Nanometer Semiconductor Films, light source (5), cleanser (6), rear pressure roller (8), dryer (9), collecting machine (10) are arranged on straight line formula production line, hydrops groove (7) be arranged in water supply mechanism (3), outside deposition Nanometer Semiconductor Films Glass tubing (4), light source (5) and cleanser (6) institute correspondence position under; The degreasing unit being made up of Glass tubing (4), light source (5), cleanser (6), hydrops groove (7), the rear pressure roller (8) of front pressure roller (2), water supply mechanism (3), outside deposition Nanometer Semiconductor Films repeats to arrange, quantity is 1 ~ 20, and the layout level height of degreasing unit, interval is consistent, the layout level height of adjacent degreasing unit can be different; Light source (5) is installed on the interior middle part of Glass tubing (4) of outside deposition Nanometer Semiconductor Films, and light source (5) is fixing, and the Glass tubing (4) of outside deposition Nanometer Semiconductor Films can be around axially rotating freely; The Glass tubing (4) of front pressure roller (2), outside deposition Nanometer Semiconductor Films and rear pressure roller (8) are all to drive and passive rotation while being advanced by material (11), the roller footpath of front pressure roller (2) and rear pressure roller (8) is identical and be positioned at same level height, the Glass tubing (4) of outside deposition Nanometer Semiconductor Films with material (11) by Minimal Tension close contact; The linear velocity of feeding machine (1) and collecting machine (10) is consistent, and collecting machine (10) is built and opened rear pressure roller (8), and front pressure roller (2) is built and opened feeding machine (1).
2. a kind of material surface photochemical catalysis skimming unit as claimed in claim 1, is characterized in that, described Nanometer Semiconductor Films is nano-titanium dioxide film, Nano zinc oxide film, nano oxidized silicon film or the Nanometer Semiconductor Films through doping vario-property.
3. a kind of material surface photochemical catalysis skimming unit as claimed in claim 1, the material (11) of described feeding machine (1) for providing surface to have grease is provided; Described front pressure roller (2) applies some tension for the material to from feeding machine (1) (11); Described water supply mechanism (3) is for providing the flowing water of the contact area between the Glass tubing (4) of input material (11) and outside deposition Nanometer Semiconductor Films; The Glass tubing (4) of described outside deposition Nanometer Semiconductor Films is quartz glass tube, the vycor tube of outside deposition Nanometer Semiconductor Films or the conventional clear glass pipe of outside deposition Nanometer Semiconductor Films of outside deposition Nanometer Semiconductor Films, for seeing through light or the concurrent third contact of a total solar or lunar eclipse catalyzed reaction of sunlight from light source (5).
4. a kind of material surface photochemical catalysis skimming unit as claimed in claim 1, is characterized in that, described light source (5) is ultraviolet light, high voltage mercury lamp or fluorescent lamp.
5. a kind of material surface photochemical catalysis skimming unit as claimed in claim 1, is characterized in that, cancels described light source (5), only sees through sunlight in the inside of the Glass tubing (4) of outside deposition Nanometer Semiconductor Films.
6. a kind of material surface photochemical catalysis skimming unit as claimed in claim 1, is characterized in that, described cleanser (6) carries out clean scavenging solution for providing to the material after photochemical catalysis degreasing (11) surface; Described hydrops groove (7) is for collecting flowing water, photochemical catalysis degreasing product and scavenging solution; Described rear pressure roller (8) is for coordinating to material (11) and apply some tension with collecting machine (10); Described dryer (9) for to degreasing thoroughly and the material (11) that completes surface cleaning processing carry out drying and processing; Described collecting machine (10) is for collecting and export the material (11) after oven dry.
7. a kind of material surface photochemical catalysis skimming unit as claimed in claim 1, is characterized in that, described material (11) is sheet metal, sheet metal strip or metal foil.
8. one kind adopts the method that material surface photochemical catalysis skimming unit carries out photochemical catalysis degreasing to material surface described in claim 1, it is characterized in that, surface has the material (11) of grease to send from feeding machine (1), by after front pressure roller (2) and Glass tubing (4) close contact of outside deposition Nanometer Semiconductor Films; The flowing water that simultaneously material (11) provides water supply mechanism (3) is brought the contact area between the Glass tubing (4) of material (11) and outside deposition Nanometer Semiconductor Films into; From light or sunlight and the Nanometer Semiconductor Films effect generation light-catalyzed reaction of Glass tubing (4) internal light source (5) of outside deposition Nanometer Semiconductor Films, produce electronics and hole on Nanometer Semiconductor Films surface, the grease on material in contact area (11) surface is degraded; Material (11) after the grease degraded of surface is and then by cleanser (6), and the scavenging solution that being cleaned device (6) provides is scrubbed, and completes the skimming processes of a degreasing unit; In process, all flowing water, photochemical catalysis degreasing product and scavenging solutions flow directly in hydrops groove (7); Material (11) after the degreasing of a degreasing unit completes will be by rear pressure roller (8); The material (11) that thoroughly completes degreasing through all degreasings unit enters dryer (9) and carries out drying and processing, and bake out temperature is 80 ~ 200 DEG C; Finally arrive collecting machine (10), obtain the material (11) with high surface finish.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410016361.5A CN103834962B (en) | 2014-01-14 | 2014-01-14 | A kind of material surface photochemical catalysis skimming unit and photochemical catalysis degreasing method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410016361.5A CN103834962B (en) | 2014-01-14 | 2014-01-14 | A kind of material surface photochemical catalysis skimming unit and photochemical catalysis degreasing method |
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| CN103834962A true CN103834962A (en) | 2014-06-04 |
| CN103834962B CN103834962B (en) | 2016-01-20 |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6123778A (en) * | 1984-07-11 | 1986-02-01 | Nippon Kakoki Kogyo Kk | Method and apparatus for degreasing and cleaning by solvent of band material |
| JPH0892774A (en) * | 1994-09-21 | 1996-04-09 | Kawasaki Steel Corp | Suppression of foaming of metallic strip degreasing tank and device therefor |
| CN202576575U (en) * | 2012-05-11 | 2012-12-05 | 浙江东南金属薄板有限公司 | Degreasing cleaning unit |
| CN203065579U (en) * | 2012-11-23 | 2013-07-17 | 天津市亿博制钢有限公司 | Vertical type degreasing and cleaning device |
-
2014
- 2014-01-14 CN CN201410016361.5A patent/CN103834962B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6123778A (en) * | 1984-07-11 | 1986-02-01 | Nippon Kakoki Kogyo Kk | Method and apparatus for degreasing and cleaning by solvent of band material |
| JPH0892774A (en) * | 1994-09-21 | 1996-04-09 | Kawasaki Steel Corp | Suppression of foaming of metallic strip degreasing tank and device therefor |
| CN202576575U (en) * | 2012-05-11 | 2012-12-05 | 浙江东南金属薄板有限公司 | Degreasing cleaning unit |
| CN203065579U (en) * | 2012-11-23 | 2013-07-17 | 天津市亿博制钢有限公司 | Vertical type degreasing and cleaning device |
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| CN103834962B (en) | 2016-01-20 |
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