CN103809396A - Photoresist stripper composition for preventing stain and preparing method of flat plate panel substrate - Google Patents

Photoresist stripper composition for preventing stain and preparing method of flat plate panel substrate Download PDF

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Publication number
CN103809396A
CN103809396A CN201310530582.XA CN201310530582A CN103809396A CN 103809396 A CN103809396 A CN 103809396A CN 201310530582 A CN201310530582 A CN 201310530582A CN 103809396 A CN103809396 A CN 103809396A
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stripper composition
light carving
rubber stripper
carving rubber
composition
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高京俊
慎蕙蠃
李喻珍
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/02—Etching, surface-brightening or pickling compositions containing an alkali metal hydroxide
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The invention discloses a photoresist stripper composition for preventing a stain and a preparing method of a flat plate panel substrate, wherein the photoresist stripper composition comprises the components of: (a) glycol ether which is represented by a chemical formula 1; (b) alkaline compound; (c) aprotic polar solvent; and (d) corrosion inhibitor: R-(OCH2CH2)n-OH (1), wherein R is methyl or ethyl, and n is an integer selected from 2 and 3, wherein the glycol ether has an octanol/water distribution coefficient (LogP) calculated through an equivation 1: Kow=Co/Cw, wherein Co represents solute concentration in octanol, Cw represents solute concentration in water, and LogP (distribution coefficient)=Log(Kow).

Description

Prevent the method for making of light carving rubber stripper composition and the flat display substrate of spot
The cross reference of related application
The application requires the rights and interests of the korean patent application 10-2012-0127846 submitting on November 13rd, 2012, thereby is incorporated in the application by quoting in full.
Technical field
The present invention relates to a kind of light carving rubber stripper composition, this light carving rubber stripper composition is manufacturing the excellent ability that has excellent cleaning capacity in the process of flat display substrate and have the spot forming in preventing stripping process.
Background technology
Along with the increase to high resolution flat display demand, make the number of pixels of making great efforts to increase per unit area.According to this trend, need to reduce the width of wiring, therefore introduce dry etching process, thereby make process conditions stricter.And, increasing according to the size of flat-panel monitor, the signal speed of wiring also needs to increase, and in fact the copper that therefore resistance coefficient is lower than aluminium be used as the starting material of wiring.Therefore,, in stripping process,, in the process of removing photoresist, must use high performance remover.What need particularly, is the high-level stripping performance of removing the residue forming and prevent the corrosion of metal line after dry ecthing.Especially, need remover to there is the ability of the residue forming after the dry ecthing of removing and the rustless property for copper and aluminium.In addition, remover should be useful economically, makes it can process many plate bases.Existing disclosed new technology meets above-mentioned requirements.
For example, korean patent application 2006-0028523 discloses the light carving rubber stripper that does not cause metal line corrosion.But this light carving rubber stripper is problematic, because it comprises the specific glycol ethers that causes serious spot, after stripping process, it causes the spot being formed on substrate.
Summary of the invention
Therefore, make the present invention to address the above problem, the object of this invention is to provide a kind of light carving rubber stripper composition, this light carving rubber stripper composition has to be removed the excellent ability of the photoresist residue being formed by dry-etching/Wet-type etching and can in stripping process, prevent that spot is formed on substrate in the process of manufacturing flat display substrate.
To achieve these goals, one aspect of the present invention provides the light carving rubber stripper composition that prevents spot, comprises: (a) by the represented glycol ethers of Chemical formula 1 below; (b) alkali compounds; (c) non-proton property polar solvent; And (d) corrosion inhibitor:
R-(OCH 2CH 2)n-OH （1）
Wherein, R is methyl or ethyl, and n is 2 or 3 integer, and wherein, described glycol ethers has the Octanol/water Partition Coefficients (LogP) of the negative value being calculated by equation 1 below:
Kow=Co/Cw
Co: the concentration of solute in octanol
Cw: the concentration of solute in water
LogP(partition factor)=Log (Kow).
Another aspect of the present invention provides the method for manufacturing flat display substrate, comprises the step of carrying out cleaning flat panel display substrate with above-mentioned light carving rubber stripper composition.
Accompanying drawing explanation
In detailed description below in conjunction with accompanying drawing, above-mentioned and other object, the Characteristics and advantages of the present invention will be more clearly understood, wherein:
Fig. 1 illustrates the photo of observing the result of copper (Cu) substrate according to test case 1 use Halogen lamp LED, wherein, (a) light carving rubber stripper composition (content of photoresist: the result of 0.5%) processing copper base that uses embodiment 3 is shown; (b) light carving rubber stripper composition (content of photoresist: the result of 0.3%) processing copper base that uses comparative example 2 is shown; And
Fig. 2 illustrates the photo of observing the result of copper (Cu) substrate according to test case 1 use optical microscope, and wherein (a) illustrates the light carving rubber stripper composition (content of photoresist: the result of 1%) processing copper base that uses embodiment 4; (b) light carving rubber stripper composition (content of photoresist: the result of 0.3%) processing copper base that uses comparative example 5 is shown.
Embodiment
Hereinafter, the invention will now be more particularly described.
The invention provides the light carving rubber stripper composition that prevents spot, comprise: (a) by the represented glycol ethers of Chemical formula 1 below; (b) alkali compounds; (c) non-proton property polar solvent; And (d) corrosion inhibitor:
R-(OCH 2CH 2)n-OH （1）
Wherein, R is methyl or ethyl, and n is 2 or 3 integer,
Wherein, described glycol ethers has the Octanol/water Partition Coefficients (LogP) of the negative value being calculated by equation 1 below:
Kow=Co/Cw
Co: the concentration of solute in octanol
Cw: the concentration of solute in water
LogP(partition factor)=Log (Kow).
Light carving rubber stripper composition of the present invention can also comprise: (e) deionized water.
Hereinafter, the every kind of component that forms above-mentioned light carving rubber stripper composition will be described in detail.
(a) glycol ethers
Can effectively prevent spot by the represented glycol ethers of Chemical formula 1 below.
R-(OCH 2CH 2)n-OH （1）
In this article, R is methyl or ethyl, and n is 2 or 3 integer.
Example by the represented glycol ethers of Chemical formula 1 above can comprise diethylene glycol monomethyl ether, diethylene glycol ether, triethylene glycol monomethyl ether and Triethylene glycol ethyl ether.They can be used alone or use with the potpourri of two or more.
Meanwhile, the remover for TFT the example of normally used conventional glycol ethers can comprise ethylene glycol list isopropyl ether, ethylene glycol monobutyl ether, diethylene glycol list isopropyl ether, diethylene glycol monobutyl ether, polyglycol, poly glycol monomethyl ether, polyglycol monobutyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, Tripropylene glycol monomethyl Ether, propylene glycol methyl ether acetate and tetrahydrofurfuryl alcohol.These conventional glycol ethers can not prevent spot effectively.
For example, but at the remover for dissolving photoresist, the glycol ethers of Chemical formula 1 is served as the detersive of the residue (remover, photoresist and other organic material) of removing on TFT substrate based on its water wettability.And the glycol ethers of Chemical formula 1 can be graded according to Octanol/water Partition Coefficients the anti-spot effect of TFT substrate.
Can be there is the Octanol/water Partition Coefficients (LogP) of the negative value being calculated by equation 1 below by the represented glycol ethers of Chemical formula 1 above:
Kow=Co/Cw
Co: the concentration of solute in octanol
Cw: the concentration of solute in water
LogP(partition factor)=Log (Kow).
Based on the general assembly (TW) of said composition, be 5～50wt% by the amount of the represented glycol ethers of Chemical formula 1 above, and preferred 10～30wt%.In the time that the amount of glycol ethers is less than 5wt%, said composition can not prevent spot effectively.And in the time that the amount of glycol ethers is greater than 50wt%, said composition may decline at the capacity of peeling off aspect the accumulative total sheet number of substrate.
(b) alkali compounds
This alkali compounds penetrates in the polymeric matrix because of photoresists that degenerate or crosslinked such as Wet-type etching or dry-etching, ashing, Implantations, thereby for the key in saboteur or intermolecular key.And, by form vacant space in the region of fragile structure that remains in the photoresist on substrate, photoresist being transformed into unbodied polymer gel bunch, this alkali compounds is for easily removing the photoresist sticking on substrate.
This alkali compounds can be at least one that select in the group of free potassium hydroxide (KOH), NaOH (NaOH), Tetramethylammonium hydroxide (TMAH), tetraethyl ammonium hydroxide (TEAH), carbonate, phosphate, ammonia and amine composition.
The example of this amine can comprise: primary amine, such as methylamine, ethamine, single isopropylamine, n-butylamine, sec-butylamine, isobutyl amine, tert-butylamine, amylamine etc.; Secondary amine, such as dimethylamine, diethylamine, di-n-propylamine, diisopropylamine, dibutylamine, di-iso-butylmanice, methyl ethyl-amine, methyl propylamine, methyl isopropylamine, methylbutylamine, methyl isobutyl amine etc.; Tertiary amine, such as diethyl hydroxylamine, trimethylamine, triethylamine, tripropyl amine (TPA), tri-n-butylamine, triamylamine, dimethyl amine, methyl-diethyl-amine, methyl-di-n-propylamine etc.; Alkanolamine, such as choline, monoethanolamine, diethanolamine, triethanolamine, single Propanolamine, 2-ethylaminoethanol, 2-(ethylamino) ethanol, 2-(methylamino) ethanol, N methyldiethanol amine, N, N-dimethylethanolamine, N, N-diethylaminoethanol, 2-(the amino ethylamino of 2-)-1-ethanol, 1-amino-2-propyl alcohol, 2-amino-1-propyl alcohol, 3-amino-1-propyl alcohol, 4-amino-n-butyl alcohol, two butanolamines etc.; Alkoxyamine, such as (butoxymethyl) diethylamine, (methoxy) diethylamine, (methoxy) dimethylamine, (butoxymethyl) dimethylamine, (isobutoxy methyl) dimethylamine, (methoxy) diethanolamine, (hydroxy ethoxy methyl) diethylamine, methyl (methoxy) aminoethane, methyl (methoxy) ethylaminoethanol, methyl (butoxymethyl) ethylaminoethanol, 2-(2-amino ethoxy) ethanol etc.; And cyclammonium, such as 1-(2-hydroxyethyl) piperazine, 1-(2-amino-ethyl) piperazine, 1-(2-hydroxyethyl) methyl piperazine, N-(3-aminopropyl) morpholine, 2-methyl piperazine, 1-methyl piperazine, 1-amino-4-methyl piperazine, 1-benzyl diethylenediamine, 1-php, N-methylmorpholine, 4-ethyl morpholine, N-formyl morpholine, N-(2-hydroxyethyl) morpholine, N-(3-hydroxypropyl) morpholine etc.
Based on the general assembly (TW) of composition, the amount of alkali compounds can be 5～30wt%.In the time that the amount of alkali compounds is less than 5wt%, the stripping performance of said composition may worsen.And in the time that the amount of alkali compounds is greater than 30wt%, said composition may be damaged metal film.
(c) non-proton property polar solvent
This non-proton property polar solvent demonstrates following advantage: guarantee to remove photoresist polymkeric substance that degenerate or crosslinked in the processes such as etching, and improve the peel off capacity of said composition aspect the sheet number of substrate.Non-proton property polar solvent can have neither too high low boiling point only, and can use with the form of potpourri.
The example of non-proton property polar solvent can comprise pyrrolidone-2 compounds, such as 1-METHYLPYRROLIDONE (NMP), N-ethyl pyrrolidone etc.; Imidazolidinone compound, such as DMI, 1,3-dipropyl-2-imidazolone etc.; Lactone compound, such as gamma-butyrolacton etc.; Sulfoxide compound, such as sulfolane etc.; Phosphate compound, such as triethyl phosphate, tributyl phosphate etc.; Carbonate products, such as dimethyl carbonate, ethylene carbonate etc.; And amide compound, such as formamide, N-METHYLFORMAMIDE, N, dinethylformamide, acetamide, N-methylacetamide, N, N-dimethyl acetamide, N-(2-hydroxyethyl) acetamide, 3-methoxyl-N, N-dimethyl propylene acid amides, 3-(2-ethyl hexyl oxy)-N, N-dimethyl propylene acid amides, 3-butoxy-N, N-dimethyl propylene acid amides etc.They can use separately or use with the potpourri of two or more.
Based on the general assembly (TW) of composition, the amount of non-proton property polar solvent can be 20～70wt%.In the time that the amount of non-proton property polar solvent is less than 20wt%, said composition can not be dissolved photoresist, and therefore said composition may worsen at the capacity of peeling off aspect the sheet number of substrate.And in the time that the amount of non-proton property polar solvent is greater than 70wt%, said composition does not have economic benefit.
(d) corrosion inhibitor
This corrosion inhibitor is for preventing the corrosion of metal line.In order to improve the corrosion resistance of said composition, this corrosion inhibitor can be the represented benzotriazole derivatives of Chemical formula 2 by below:
Figure BDA0000405927490000061
Wherein, R2, R3 and R4 are hydrogen atom, halogen atom, alkyl, naphthenic base, allyl, aryl, amino, alkylamino, nitro, cyano group, sulfydryl, alkane sulfydryl, hydroxyl, hydroxyalkyl, carboxyl, carboxyalkyl, acyl group, alkoxy or the monoradical with heterocycle independently of one another.
The object lesson of this benzotriazole derivatives can comprise: 2, 2'-{[(benzotriazole) methyl] imino group } di-methylcarbinol, 2, 2'-{[(methyl isophthalic acid-hydrogen-benzotriazole-1-yl) methyl] imino group } two methyl alcohol, 2, 2'-{[(ethyl-1-hydrogen-benzotriazole-1-yl) methyl] imino group } di-methylcarbinol, 2, 2'-{[(methyl isophthalic acid-hydrogen-benzotriazole-1-yl) methyl] imino group } di-methylcarbinol, 2, 2'-{[(methyl isophthalic acid-hydrogen-benzotriazole-1-yl) methyl] imino group } two carboxylic acids, 2, 2'-{[(methyl isophthalic acid-hydrogen-benzotriazole-1-yl) methyl] imino group } two methylamines, 2, 2'-{[(amine-1-hydrogen-benzotriazole-1-yl) methyl] imino group } di-methylcarbinol etc.
Based on the general assembly (TW) of composition, the amount of this corrosion inhibitor can be 0.01～5wt%.In the time that the amount of this corrosion inhibitor is less than 0.01wt%, said composition can not prevent corrosion of metal.And in the time that the amount of this corrosion inhibitor is greater than 5wt%, said composition does not have economic benefit.
(e) deionized water
Light carving rubber stripper composition of the present invention also comprises deionized water.Compared with not containing the common remover combination of deionized water, this deionized water has increased the detachment rate of said composition by activated alkaline compound, and has improved said composition and removed the ability because of dry-etching or Wet-type etching photoresist that degenerate or crosslinked.
In the time carrying out flushing process with deionized water, can remove the organic contaminant and the light carving rubber stripper that remain on substrate completely and rapidly.And with regard to reducing costs, the composition that comprises deionized water is favourable.
According to the forming process of the kind of photoresist and metal pattern, can comprise or not comprise deionized water.In the time that composition comprises deionized water, based on the general assembly (TW) of said composition, the amount of deionized water can be 10～40wt%.In the time that the amount of this deionized water is greater than 40wt%, said composition can not be dissolved photoresist, and therefore said composition may worsen at the capacity of peeling off aspect the sheet number of substrate.
Remove the process of photoresist with light carving rubber stripper composition of the present invention and conventionally can be undertaken by dipping, but also can be undertaken by injection.With after compositions-treated substrate of the present invention, can water and not with an organic solvent (alcohol) clean this substrate as clean-out system.
Light carving rubber stripper composition of the present invention can be used effectively in the process of removing semi-conductive photoresist, remove in the process of photoresist of electron device and especially remove in the process of photoresist of flat-panel monitor.
The invention provides a kind of method of manufacturing flat display substrate, comprise the step of carrying out cleaning flat panel display substrate with above-mentioned light carving rubber stripper composition.
Hereinafter, with reference to the following examples, the present invention is described in more detail.But, propose these embodiment to set forth the present invention, and scope of the present invention is not limited to this.Within the scope of the invention, these embodiment can be by suitably modifications and variations of those skilled in the art.
reference example 1: the selection of glycol ethers
Light carving rubber stripper composition of the present invention has the excellent ability that prevents spot in the process of manufacturing flat display substrate.This ability can be passed through Octanol/water Partition Coefficients (LogP) and be predicted, and can be by experimental verification.In this case, Octanol/water Partition Coefficients is calculated by equation 1 below:
Kow=Co/Cw
Co: the concentration of solute in octanol
Cw: the concentration of solute in water
LogP(partition factor)=Log (Kow).
Glycol ethers is represented by Chemical formula 1 below:
R-(OCH 2CH 2)n-OH （1）。
[table 1]
Glycol ethers Octanol/water Partition Coefficients (Log (Kow))
Diethylene glycol monomethyl ether -1.10
Diethylene glycol monoethyl ether -0.54
Triethylene glycol monomethyl ether -0.70
Diethylene glycol monobutyl ether +0.15
Diethylene glycol monohexyl ether +1.70
As given in table 1 above, confirmable: the glycol ethers that shows anti-spot effect has
The Octanol/water Partition Coefficients (LogP) of negative value.
embodiment
embodiment 1～7 and comparative example 1～5: the preparation of light carving rubber stripper composition
Use the recently photoresist lift off of Preparation Example 1～7 and comparative example 1～5 of composition given in following table 2
Agent composition.
[table 2]
Figure BDA0000405927490000081
Figure BDA0000405927490000091
Note) MDG: diethylene glycol monomethyl ether
EDG: diethylene glycol monoethyl ether
MTG: triethylene glycol monomethyl ether
ETG: Triethylene glycol ethyl ether
BDG: diethylene glycol monobutyl ether
BG: butyl glycol ether
IPDG: diethylene glycol list isopropyl ether
MEA: monoethanolamine
NMF:N-NMF
D-1:2,2-{[(ethyl-1-hydrogen-benzotriazole-1-yl) methyl] imino group } di-methylcarbinol
test case 1: the assessment of the formation of spot
In order to assess the anti-spot effect of light carving rubber stripper composition, Cu substrate is provided, on this Cu substrate, form copper (Cu) layer by sputter.And, be provided for test photoresist, this photoresist by under the high temperature at 115 ℃, toast we photoresist (DWG-520) thus 3 days except desolventizing obtained to solidify.
Amount with 0.3%, 0.5% and 1% is added light carving rubber stripper composition by above-mentioned to for the photoresist of testing, and is fully dissolved into and in light carving rubber stripper composition, prepares remover; Then the temperature of remover is remained on to 50 ℃.Subsequently, substrate is immersed in remover to 2 minutes, then from wherein taking out.Then, use the nitrogen of predetermined pressure that the remover and the photoresist that remain on substrate are removed to a certain extent, more then substrate is placed on plane floor.Subsequently, use dropper by deionized water (DIW) with the minim of 5 in the different loci of this substrate, then keep 1 minute.,, rinse this substrate 1 minute with DIW, more then use nitrogen that the DIW remaining on substrate is removed completely thereafter.In this method of testing, in order to reproduce real TFT process, use Halogen lamp LED, digital camera and electron microscope to assess the degree that forms spot on substrate.The results are shown in table 3, Fig. 1 and Fig. 2.In this article, " very good " is to be represented by ◎, and " well " is to be represented by O, and " generally " is to be represented by △, and " bad " is to be represented by X.
[table 3]
Figure BDA0000405927490000101
As shown in table 3 above, confirmablely be, compared with the light carving rubber stripper composition of comparative example 1～5, the light carving rubber stripper composition of embodiment 1～7 has the excellent ability that the spot of preventing forms, even and if still show more excellent anti-spot effect peeling off capacity increase aspect the sheet number of substrate.
As mentioned above, because light carving rubber stripper composition of the present invention comprises by the represented glycol ethers of Chemical formula 1 above, so showing excellent anti-spot ability, have excellent cleaning capacity and allow to peel off capacity with regard to the sheet number of substrate, it increases.
And when light carving rubber stripper composition of the present invention is during for the manufacture of flat-panel monitor, the ratio of defects of flat-panel monitor declines, thereby reduces total manufacturing cost.
Can carry out various modifications, increase and replace and not deviate from as disclosed scope and spirit of the present invention in the appended claims although the preferred embodiment of the present invention, for illustration purpose is disclosed, it will be understood by those skilled in the art that.

Claims (9)

1. a light carving rubber stripper composition that prevents spot, comprises:
(a) by the represented glycol ethers of Chemical formula 1 below;
(b) alkali compounds;
(c) non-proton property polar solvent; And
(d) corrosion inhibitor:
R-(OCH 2CH 2)n-OH （1）
Wherein, R is methyl or ethyl, and n is 2 or 3 integer,
Wherein said glycol ethers has the Octanol/water Partition Coefficients LogP of the negative value being calculated by equation 1 below:
Kow=Co/Cw
Co: the concentration of solute in octanol
Cw: the concentration of solute in water
LogP=Log(Kow)。
2. light carving rubber stripper composition according to claim 1, also comprises: (e) deionized water.
3. light carving rubber stripper composition according to claim 1, wherein, based on the general assembly (TW) of described composition, described composition comprises:
(a) the represented glycol ethers of the Chemical formula 1 by above of 5～50wt%;
(b) alkali compounds of 5～30wt%;
(c) the non-proton property polar solvent of 20～70wt%; And
(d) corrosion inhibitor of 0.01～5wt%.
4. light carving rubber stripper composition according to claim 2, wherein, based on the general assembly (TW) of described composition, the amount of deionized water is 10～40wt%.
5. light carving rubber stripper composition according to claim 1, wherein, described glycol ethers is at least one that select in the group of free diethylene glycol monomethyl ether, diethylene glycol ether, triethylene glycol monomethyl ether and Triethylene glycol ethyl ether composition.
6. light carving rubber stripper composition according to claim 1, wherein, described alkali compounds is at least one that select in the group of free potassium hydroxide, NaOH, Tetramethylammonium hydroxide, tetraethyl ammonium hydroxide, carbonate, phosphate, ammonia and amine composition.
7. light carving rubber stripper composition according to claim 1, wherein, described non-proton property polar solvent is at least one that select in the group of free pyrrolidone-2 compounds, imidazolidinone compound, lactone compound, sulfoxide compound, phosphate compound, carbonate products and amide compound composition.
8. light carving rubber stripper composition according to claim 1, wherein, described corrosion inhibitor is the represented benzotriazole derivatives of Chemical formula 2 by below:
Figure FDA0000405927480000021
Wherein, R2, R3 and R4 are hydrogen atom, halogen atom, alkyl, naphthenic base, allyl, aryl, amino, alkylamino, nitro, cyano group, sulfydryl, alkane sulfydryl, hydroxyl, hydroxyalkyl, carboxyl, carboxyalkyl, acyl group, alkoxy or the monoradical with heterocycle independently of one another.
9. manufacture a method for flat display substrate, comprise and use the step of carrying out cleaning flat panel display substrate according to the light carving rubber stripper composition described in any one in claim 1～8.
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