CN103797531A - Large-size display screen and manufacturing method therefor - Google Patents
Large-size display screen and manufacturing method therefor Download PDFInfo
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- CN103797531A CN103797531A CN201280001478.5A CN201280001478A CN103797531A CN 103797531 A CN103797531 A CN 103797531A CN 201280001478 A CN201280001478 A CN 201280001478A CN 103797531 A CN103797531 A CN 103797531A
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- G—PHYSICS
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/13336—Combining plural substrates to produce large-area displays, e.g. tiled displays
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Abstract
The present invention is suitable for the technical field of display, and provides a large-size display screen and a manufacturing method therefor. The display screen comprises a display front panel and a TFT substrate that overlap each other. A support plate is disposed on a side, opposite the display front panel, of the TFT substrate. The TFT substrate is tiled by multiple TFT substrate units and is borne and fixed by the support plate. The display front paneland the support plate are in a monomer structure. The large-size display panel avoids tiling gaps caused by display screen borders or adhesive and sealant limitations during direct tiled display. The yield of tiled large-size TFT substrates is much higher than one-piece TFT substrates that have the same size and are directly manufactured, thereby greatly improving the production efficiency of large-size display screens and reducing costs. In addition, compared with the structure in which tiling gaps are eliminated by using an optical system, the large-size display panel reduces cost and increases the yield.
Description
The invention belongs to display technology field, more particularly to a kind of large scale display screen and its manufacture method.
At present, in display technology field, the demand for large screen display is growing day by day, in various Display such as thin film transistor liquid crystal display（TFT-LCD）, active driving organic electroluminescence（AMOLED）Etc. in technology, due to being limited to the yield of large scale tft array, so that the size of display screen is difficult to do big, the yield of display screen is on the reduction of size exponentially, in addition, because material caused by the increase of equipment cost, and tft array low-yield and operation cost rise so that manufacturing cost is on the increase of screen size exponentially.Therefore, low cost, the large screen display of rate of good quality rate are still difficult to, so as to have impact on the development and application of high-performance, Large Screen Display Technology in fields such as meeting room, home theater, outdoor advertisings.
In order to solve the dimensional problem of display screen, multi-screen splicing technology being used prior art, it mainly includes two kinds more：The first, the polylith display screen of ultra-narrow frame is directly spliced, be common in display wall, but be due to the presence of display screen frame, it is impossible to which real to realize " seamless " splicing, the minimum splicing gap of current large-sized liquid crystal display is still above 5
mm；Second, the unencapsulated liquid crystal display monomer of direct splicing, then encapsulation foreboard and supporting plate are unified, but the size of this display screen is limited to the limitation of liquid crystal board fluid sealant again, still it can not accomplish seamless spliced, also, this connecting method needs to polish to the Mosaic face of liquid crystal board, its technical difficulty is larger, and production cost is very high.
In order to overcome the splicing gap in the above method, image is amplified to mosaic screen frame region by prior art using optical lens array, to realize seamless display, and a large amount of uses of optical lens and exactitude position increase the manufacturing cost of display screen, also, the contraposition of optical lens certainly exists error, inevitably reduces yields, make the preparation technology of large display device more complicated, production efficiency is low and cost is higher.
It is an object of the invention to provide a kind of large scale display screen, it is intended to which it is big to solve traditional large scale display screen splicing gap, and manufacturing cost is higher, production efficiency and the problem of low yields.
What the present invention was realized in, a kind of large scale display screen, including the display front plate and thin film transistor base plate being superimposed with each other, the thin film transistor base plate dorsad the display front plate side be provided with supporting plate, the thin film transistor base plate is formed by polylith thin film transistor base plate unit spliced, and is carried and fixed by the supporting plate.
Another object of the present invention is to provide a kind of method for manufacturing large scale display screen, comprise the steps：
Comprise the steps：
A substrate is chosen, multi-disc thin film transistor (TFT) array is prepared on the substrate；
The substrate, and the justified margin to be spliced of line of cut and the thin film transistor (TFT) array are cut, the thin film transistor base plate unit that polylith respectively carries a piece of thin film transistor (TFT) array is obtained；
A supporting plate is chosen, mutually splices thin film transistor base plate unit described in polylith along its cut surface in the supporting plate, thin film transistor base plate is formed；
Make display front plate；
The display front plate and the gripper shoe groups with the thin film transistor base plate are dressed up into display screen.
Another object of the present invention is to provide a kind of method for manufacturing large-sized liquid crystal display, comprise the steps：
A substrate is chosen, multi-disc thin film transistor (TFT) array is prepared on the substrate；
The substrate, and the justified margin to be spliced of line of cut and the thin film transistor (TFT) array are cut, the thin film transistor base plate unit that polylith respectively carries a piece of thin film transistor (TFT) array is obtained；
A supporting plate is chosen, mutually splices thin film transistor base plate unit described in polylith along its cut surface in the supporting plate, thin film transistor base plate is formed；
Alignment film under being prepared on the thin film transistor base plate；
A transparent front plate is chosen, and sets gradually on a surface of the transparent front plate optical filter, transparency conducting layer and upper alignment film；
Sept is set on alignment film or lower alignment film on described；
The supporting plate and the transparent front plate are assembled, make the upper alignment film and the relative bonding of lower alignment film, and liquid crystal is irrigated between the upper alignment film and lower alignment film；
One polaroid is respectively set in the outside of the transparent front plate and the supporting plate respectively；
Drive circuit is assembled, LCDs is obtained.
Large scale active driving organic electroluminescence is manufactured it is still another object of the present invention to provide one kind（
AMOLED）The method of display screen, comprises the steps：
A substrate is chosen, multi-disc thin film transistor (TFT) array is prepared on the substrate, and contraposition sets organic electroluminescence cell on the every thin film transistor (TFT) array；
The substrate, and line of cut and the thin film transistor (TFT) array and the justified margin to be spliced of organic electroluminescence cell are cut, the polylith respectively base board unit with a piece of thin film transistor (TFT) array and an organic electroluminescence cell is obtained；
A supporting plate is chosen, mutually splices base board unit described in polylith along its cut surface in the supporting plate, thin film transistor (TFT) and organic electroluminescent substrate is formed；
A transparent front plate is chosen, the supporting plate and the transparent front plate are assembled, makes the thin film transistor (TFT) and the laminating relative with transparent front plate of organic electroluminescent substrate；
Drive circuit is assembled, active driven organic EL display screen is obtained.
It is still another object of the present invention to provide a kind of method for manufacturing large scale active driven organic EL display screen, comprise the steps：
A substrate is chosen, multi-disc thin film transistor (TFT) array is prepared on the substrate；
The substrate, and the justified margin to be spliced of line of cut and the thin film transistor (TFT) array are cut, the thin film transistor base plate unit that polylith respectively carries a piece of thin film transistor (TFT) array is obtained；
A supporting plate is chosen, mutually splices thin film transistor base plate unit described in polylith along its cut surface in the supporting plate, thin film transistor base plate is formed；
The organic electro luminescent layer of single chip architecture is prepared on the thin film transistor base plate；
A transparent front plate is chosen, the thin film transistor base plate with organic electro luminescent layer and the transparent front plate are assembled, makes organic electro luminescent layer laminating relative with transparent front plate；
Drive circuit is assembled, active driven organic EL display screen is obtained.
The thin film transistor base plate that the large scale display screen that the present invention is provided is used is formed by polylith thin film transistor base plate unit spliced, while configuring monomer structure（Non- splicing construction）Display front plate and supporting plate, the display screen not assembled such as conventional method direct splicing, the splicing gap for limiting and producing with fluid sealant due to display screen frame or adhesive glue during direct splicing display screen can be avoided；And, the yields of small size thin film transistor base plate is high, so that the yields of the large scale thin film transistor base plate of direct splicing is far above monolithic is directly manufactured with size thin-film transistor base, so that the present invention can improve the production efficiency of large scale display screen and cost is greatly reduced；In addition, compared with traditional structure that splicing gap is eliminated using various optical systems, saved cost, it is to avoid influence of the lens aligning accuracy to display effect, the yields of large scale mosaic screen is improved.
It likewise, manufacture large-sized display screen using the method that provides of the present invention, on the one hand can really realize seamless spliced, on the other hand can improve production efficiency and yields, at the same it is cost-effective, it is suitable for the batch production of large scale display screen.
Fig. 1 is the sectional view for the large scale display screen that the present invention is provided；
Fig. 2 is the manufacturing flow chart for the large scale display screen that the present invention is provided；
Fig. 3 is the structural representation in the large scale display screen manufacturing process being adapted with Fig. 2；
Fig. 4 is the sectional view for the large-sized liquid crystal display that first embodiment of the invention is provided；
Fig. 5 is the manufacturing flow chart for the large-sized liquid crystal display that first embodiment of the invention is provided；
Fig. 6 is the sectional view for the large scale AMOLED display screens that second embodiment of the invention is provided；
Fig. 7 is the manufacturing flow chart for the large scale AMOLED display screens that second embodiment of the invention is provided；
Fig. 8 is the sectional view for the large scale AMOLED display screens that third embodiment of the invention is provided；
Fig. 9 is the manufacturing flow chart for the large scale AMOLED display screens that third embodiment of the invention is provided.
In order to make the purpose , technical scheme and advantage of the present invention be clearer, below in conjunction with drawings and Examples, the present invention will be described in further detail.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, it is not intended to limit the present invention.
With reference to Fig. 1, the large scale display screen that the present invention is provided mainly includes the display front plate 1 and thin film transistor base plate 2 being superimposed with each other, thin film transistor base plate 2 dorsad display front plate 1 side be provided with supporting plate 3, wherein, thin film transistor base plate 2 is spliced by polylith thin film transistor base plate unit 21, and is carried and fixed by supporting plate 3.
Further, the display front plate 1 in the large scale display screen can have a variety of, such as liquid crystal display, organic electroluminescent（OLED）Display etc..Regardless of whether using what type of display front plate, being both needed to include the transparent front plate 12 of light control unit 11 and one, an optical filter 111 can be included by going out light control unit 11（Liquid crystal display must configure optical filter, and OLED is shown, can according to actual needs configure or not configure optical filter）, for the allotment to going out light progress color and intensity that light control unit 11 is sent, with output image, generally, optical filter 111 is attached to the surface of transparent front plate 12.Optical filter 111 can generally make large scale without splicing, but when necessary, optical filter 111 can also be formed with as thin film transistor base plate 2 by multiple optical filters unit spliced.
In the present invention, thin film transistor base plate 2 is splicing construction, and miscellaneous part such as display front plate 1, supporting plate 3 etc. are non-splicing construction, i.e. monomer structure.The thin film transistor base plate 2 of size needed for being so directly spliced into using the thin film transistor base plate unit 21 of polylith small size, it is reconfigured at the display front plate 1 and supporting plate 3 of monomer structure, and not such as the complete display screen of conventional method direct splicing, due to splicing gap that display screen frame or adhesive glue and fluid sealant are produced when can be prevented effectively from direct splicing display screen；And, the yields of small size thin film transistor base plate is high, so that the yields of the large scale thin film transistor base plate of direct splicing is far above monolithic is directly manufactured with size thin-film transistor base, so that the present invention can improve the production efficiency of large scale display screen and cost is greatly reduced；In addition, compared with traditional structure that splicing gap is eliminated using various optical systems, saved cost, it is to avoid influence of the lens aligning accuracy to display effect, the yields of large scale mosaic screen is improved.
The large scale display screen can be manufactured by following methods, such as Fig. 2,3：
In step S001, a substrate 211 is chosen, multi-disc thin film transistor (TFT) array 212 is prepared on substrate 211；As shown in Fig. 3（A）.
In this step, the thin film transistor (TFT) array 212 of corresponding size is prepared according to the size of pre-splicing thin film transistor base plate unit 21, multi-disc thin film transistor (TFT) array 212 is independent to be attached on substrate 211.
In step S002, cutting substrate 211, and the justified margin to be spliced of line of cut and thin film transistor (TFT) array 212, obtain the thin film transistor base plate unit 21 that polylith respectively carries one sheet of film transistor array 212；As shown in Fig. 3（B）.
In this step, the edge cuts substrate 211 to be spliced by cutting equipment along thin film transistor (TFT) array 212, every piece of thin film transistor base plate unit 21 of acquisition carries one sheet of film transistor array 212.
It is preferred that, laser cutting machine may be selected in cutting equipment, and laser cutting mode can reach the cutting accuracy of micron dimension, and without polishing, high-precision cut surface is by as follow-up Mosaic face.In step S003, a supporting plate 3 is chosen, mutually splices polylith thin film transistor base plate unit 21 along its cut surface in supporting plate 3, form thin film transistor base plate 2；As shown in Fig. 3（C）.
In this step, size that can be according to actual needs splices polylith thin film transistor base plate unit 21, the need for the size of the thin film transistor base plate 2 spliced can meet large scale display screen.
In step S004, display front plate 1 is made；
In step S005, by display front plate 1 and the supporting plate 3 with thin film transistor base plate 2 is assembled into display screen.Such as Fig. 1.
In this step, by display front plate 1 and after the supporting plate 3 with thin film transistor base plate 2 is assemblied together, the display screen of size needed for being obtained by appropriate cutting technique cutting.
It is appreciated that, make display front plate 1 and may not necessarily strictly be limited with making the sequencing of large-sized thin film transistor base plate 2, making for display front plate 1 simultaneously or can also intersect and carry out with the making of thin film transistor base plate 2, as long as the method according to step S001 ~ 003 has made thin film transistor base plate 2, its display front plate 1 acquisition and its need not strictly be limited with the combination of thin film transistor base plate 2.
The above method obtains large-sized thin film transistor base plate 2 by way of splicing thin film transistor base plate unit 21, it is to avoid the display screen of direct splicing small size, and then avoids due to splicing gap caused by display screen frame or adhesive glue and fluid sealant；Also, this method need to only splice thin film transistor base plate unit 21, it is more easy to realize compared with the technique of direct splicing display screen, production efficiency is higher；In addition, with traditional compared with lens are eliminated by the way of splicing gap, its yields is higher, and reduces cost.
It is appreciated that, the display mode of the large scale display screen has a variety of, during using liquid crystal display, its core texture for going out light control unit 11 is liquid crystal layer, when using OLED displays, its core texture for going out light control unit 11 is OLED luminescent layers, and the display screen of above two type is further described in more detail in conjunction with specific embodiments further below：
Embodiment one：
Fig. 4 shows the sectional view for the large scale display screen that first embodiment of the invention is provided, and for convenience of description, illustrate only part related to the present embodiment.
The large scale display screen includes the display front plate 1 and thin film transistor base plate 2 being superimposed with each other, and thin film transistor base plate 2 is spliced by polylith thin film transistor base plate unit 21, and is carried and fixed by a supporting plate 3.Display front plate 1 uses liquid crystal display foreboard, go out light control unit 11 including what is be made up of optical filter 111, lower alignment film 112, liquid crystal layer 113, upper alignment film 114 and transparency conducting layer 115, the light emission side for going out light control unit 11 is provided with transparent front plate 12, optical filter 111 is attached to the incident side of transparent front plate 12.Also, upper polaroid 4 is provided with the light emission side of transparent front plate 12, down polaroid 5 is provided with the back of supporting plate 3.Therefore, the direction that the large scale display screen is exported along image includes successively：Down polaroid-supporting plate-thin film transistor base plate-lower alignment film-liquid crystal layer-upper alignment film-transparency conducting layer-optical filter-transparent front plate-upper polaroid.Same as above, optical filter 111 can also be formed by multiple optical filters unit spliced.
The present embodiment provide large-sized LCDs by the thin film transistor base plate unit spliced of polylith small size into required size thin film transistor base plate, then the liquid crystal display foreboard and gripper shoe groups with monomer structure dress up large-sized display screen, it is to avoid due to splicing gap that the adhesive glue of liquid crystal panel is produced during direct splicing LCDs；Also, the yields for the monomer film transistor base that direct splicing small size thin film transistor base plate unit more directly prepares same size is higher, and then the yields and production efficiency of large-sized liquid crystal display are improved, reduce cost；The problem of yields is low caused by using optical system elimination splicing gap time lens aligning accuracy low is also solved in addition.
A kind of method for manufacturing large-sized liquid crystal display presented below, such as Fig. 5：
In step S101, a substrate is chosen, multi-disc thin film transistor (TFT) array is prepared on substrate；
In step s 102, cutting substrate, and the justified margin to be spliced of line of cut and thin film transistor (TFT) array, obtain the thin film transistor base plate unit that polylith respectively carries one sheet of film transistor array；
In step s 103, a supporting plate is chosen, on the supporting plate mutually splices polylith thin film transistor base plate unit along its cut surface, thin film transistor base plate is formed；
In this step, the edge cuts substrate to be spliced preferably by laser cutting machine along thin film transistor (TFT) array, without polishing, high-precision cut surface is used as follow-up Mosaic face.
In the present embodiment, behind step S101 ~ 103, the supporting plate of the thin film transistor base plate with required size can be prepared, on the one hand the supporting plate is used for the thin film transistor base plate for carrying and fixing splicing, the supporting plate for the display screen being on the other hand used for after assembling.
In step S104, alignment film under being prepared on thin film transistor base plate；
In step S105, a transparent front plate is chosen, and set gradually on a surface of transparent front plate optical filter, transparency conducting layer and upper alignment film；
In step s 106, sept is set on upper alignment film or lower alignment film；
In step s 107, supporting plate and transparent front plate are assembled, makes alignment film and the relative bonding of lower alignment film, and irrigate liquid crystal between alignment film and lower alignment film upwards；
In step S108, one polaroid is respectively set in the outside of transparent front plate and supporting plate respectively；
In step S109, drive circuit is assembled, LCDs is obtained.
Behind step S104 ~ 108, the preparation of liquid crystal display foreboard is completed, step S109 is eventually passed, you can large-sized LCDs is obtained.Wherein, the foreboard of display screen can be used for for fixing the transparent front plate of optical filter, the transparent front plate has protective effect with supporting plate to structure therebetween.
The present embodiment can obtain large-sized LCDs shown in Fig. 3 by the above method, be truly realized it is seamless spliced, while realize high yield, rate of good quality rate and low cost purpose.
Embodiment two：
Fig. 6 shows the large scale display screen that second embodiment of the invention is provided（AMOLED display screens）Sectional view, for convenience of description, illustrate only part related to the present embodiment.
Large scale AMOLED display screens include the display front plate 1 and thin film transistor base plate 2 being superimposed with each other, and thin film transistor base plate 2 is spliced by polylith thin film transistor base plate unit 21, and is carried and fixed by a supporting plate 3.Display front plate 1 uses OLED display front plates, including going out light control unit 11, it contains an OLED luminescent layers 112, and is arranged at the transparent front plate 12 of the light emission side of OLED luminescent layers 112, when the light that OLED luminescent layers are sent is white light, also optical filter 111 need to be set in the incident side of transparent front plate 12.Same as above, optical filter 111 can also be formed by multiple optical filters unit spliced.
Wherein, OLED luminescent layers 112 are spliced by multiple OLED luminescence units 1121, the OLED luminescent layers 112 are formed with thin film transistor base plate 2 in same cutting and splicing process, and OLED luminescence units 1121 align setting one by one with thin film transistor base plate unit 21.Furthermore it is also possible to the light emission side in OLED luminescent layers 112 and the incident side setting diaphragm 113 in transparent front plate 12.The direction that large-sized OLED display screen is exported along image includes successively：113-optical filter of supporting plate 3-thin film transistor base plate, 2-OLED, 112-diaphragms of luminescent layer 111（It is optional）- transparent front plate 12.
The thin film transistor (TFT) and oled substrate of size needed for polylith thin film transistor base plate unit 21 and OLED luminescence units 1121 are spliced into by large-sized AMOLED display screens that the present embodiment is provided, and be combined with the transparent front plate 12 and supporting plate 3 of monomer structure, it is assembled into large-sized display screen, it is to avoid due to splicing gap that display screen frame is produced during direct splicing display screen；Also, splice the thin film transistor (TFT) and oled substrate of small size sets the yields of optical system higher compared with mosaic display screen or in stitching portion, and splicing precision is more easy to control, and then effectively increases production efficiency and yields, reduces cost.
A kind of method for manufacturing large scale AMOLED display screens presented below, such as Fig. 7：
In step s 201, a substrate is chosen, multi-disc thin film transistor (TFT) array is prepared on substrate, and contraposition sets OLED luminescence units on every thin film transistor (TFT) array；
In step S202, cutting substrate, and line of cut and thin film transistor (TFT) array and the justified margin to be spliced of OLED luminescence units, obtain the polylith respectively base board unit with a piece of thin film transistor (TFT) array and an OLED luminescence units；
In step S203, a supporting plate is chosen, on the supporting plate mutually splices polylith base board unit along its cut surface, form thin film transistor (TFT) and oled substrate；
Wherein, thin film transistor (TFT) and oled substrate include above-mentioned thin film transistor base plate 2 and OLED luminescent layers 112.
In this step, preferably by laser cutting machine along thin film transistor (TFT) array and the edge cuts substrate to be spliced of OLED luminescence units, without polishing after cutting, high-precision cut surface is used as follow-up Mosaic face.
In step S204, a transparent front plate is chosen, supporting plate and transparent front plate are assembled, make the laminating relative with transparent front plate of thin film transistor (TFT) and oled substrate；
In this step, it can choose whether to set optical filter on the surface of transparent front plate according to actual needs.
If transparent front plate is provided with optical filter, make thin film transistor (TFT) and oled substrate are relative with optical filter to fit.
In step S205, drive circuit is assembled, AMOLED display screens are obtained.
The present embodiment can obtain large-sized AMOLED display screens shown in Fig. 6 by the above method, it is to avoid due to splicing gap caused by the frame of display screen during direct splicing display screen monomer, while realizing the purpose of high yield, rate of good quality rate and low cost.
Embodiment three：
Fig. 8 shows the large scale display screen that third embodiment of the invention is provided（AMOLED display screens）Sectional view, for convenience of description, illustrate only part related to the present embodiment.
The display screen includes the display front plate 1 and thin film transistor base plate 2 being superimposed with each other, and thin film transistor base plate 2 is spliced by polylith thin film transistor base plate unit 21, and is carried and fixed by a supporting plate 3.Display front plate 1 still uses OLED display front plates, including going out 11-OLED of light control unit luminescent layers 112, and the transparent front plate 12 of the light emission side of OLED luminescent layers 112 is arranged at, when the light that OLED luminescent layers are sent is white light, also optical filter 111 need to be set in the incident side of transparent front plate.
From unlike embodiment two, the OLED luminescent layers are formed at the luminescent layer of the single chip architecture on thin film transistor base plate 2, be not required to same thin film transistor base plate unit 21 excision forming together.Furthermore it is also possible to the light emission side in OLED luminescent layers 112 and the incident side setting diaphragm 113 in transparent front plate 12.The direction that large-sized OLED display screen is exported along image includes successively：113-optical filter of supporting plate 3-thin film transistor base plate, 2-OLED, 112-diaphragms of luminescent layer 111（It is optional）- transparent front plate 13.
The thin film transistor base plate of size needed for polylith thin film transistor base plate unit 21 is spliced into by large-sized AMOLED display screens that the present embodiment is provided, and the OLED luminescent layers 112 with single chip architecture, transparent front plate 12 and supporting plate 3 are combined, it is assembled into large-sized display screen, it is to avoid due to splicing gap that display screen frame is produced during direct splicing display screen；And yields is higher, splicing precision is more easy to control, effectively increases production efficiency and yields, reduces cost.
A kind of method for manufacturing large scale AMOLED display screens presented below, such as Fig. 9：
In step S301, a substrate is chosen, multi-disc thin film transistor (TFT) array is prepared on substrate；
In step s 302, cutting substrate, and the justified margin to be spliced of line of cut and thin film transistor (TFT) array, obtain the thin film transistor base plate unit that polylith respectively carries a piece of thin film transistor (TFT) array；
In step S303, a supporting plate is chosen, on the supporting plate mutually splices polylith thin film transistor base plate unit along its cut surface, form thin film transistor base plate；
In step s 304, the OLED luminescent layers of single chip architecture are prepared on thin film transistor base plate；
In step S305, a transparent front plate is chosen, thin film transistor base plate and transparent front plate with OLED luminescent layers are assembled, make OLED luminescent layers laminating relative with transparent front plate；
In this step, it can choose whether to set optical filter on the surface of transparent front plate according to actual needs.
In step S306, drive circuit is assembled, AMOLED display screens are obtained.
The present embodiment can obtain large-sized AMOLED display screens shown in Fig. 8 by the above method, it is to avoid due to splicing gap caused by the frame of display screen during direct splicing display screen monomer, while realizing the purpose of high yield, rate of good quality rate and low cost.
It is appreciated that; above-described embodiment only discloses the seamless joint method of LCDs and AMOLED display screens; but the present invention is not limited only to liquid crystal display and AMOLED is shown, as long as the large scale display screen that the part of the thin film transistor base plate of splicing and other monomers structure is assembled into belongs to protection scope of the present invention.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, any modifications, equivalent substitutions and improvements made within the spirit and principles of the invention etc., should be included in the scope of the protection.
Claims (14)
- A kind of large scale display screen, it is characterized in that, including the display front plate and thin film transistor base plate being superimposed with each other, the thin film transistor base plate dorsad the display front plate side be provided with supporting plate, the thin film transistor base plate is formed by polylith thin film transistor base plate unit spliced, and is carried and fixed by the supporting plate.
- Large scale display screen as claimed in claim 1, it is characterised in that the display front plate includes what is set gradually from the surface of the thin film transistor base plate：Go out light control unit and transparent front plate.
- Large scale display screen as claimed in claim 2, it is characterised in that it is described go out light control unit and transparent front plate be respectively that monolithic goes out light control unit and monolithic transparent foreboard.
- Large scale display screen as described in Claims 2 or 3, it is characterised in that it is described go out light control unit include liquid crystal display.
- Large scale display screen as claimed in claim 4, it is characterised in that the liquid crystal display includes what is set gradually from the surface of the thin film transistor base plate：Lower alignment film, liquid crystal layer, upper alignment film, transparency conducting layer and optical filter.
- Large scale display screen as claimed in claim 4, it is characterised in that be provided with upper polaroid in the light emission side of the transparent front plate, down polaroid is provided with the back of the supporting plate.
- Large scale display screen as claimed in claim 2, it is characterised in that it is described go out light control unit include organic electroluminescent layer；The organic electro luminescent layer is spliced by multiple organic electroluminescence cells.
- Large scale display screen as claimed in claim 7, it is characterised in that the organic electroluminescence cell aligns setting one by one with the thin film transistor base plate unit.
- Large scale display screen as claimed in claim 2, it is characterised in that it is described go out light control unit include monolithic organic electro luminescent layer.
- Large scale display screen as described in claim 7,8 or 9, it is characterised in that be provided with diaphragm in the organic electro luminescent layer and in the incident side of the transparent front plate.
- A kind of method for manufacturing large scale display screen, it is characterised in that comprise the steps：A substrate is chosen, multi-disc thin film transistor (TFT) array is prepared on the substrate；The substrate, and the justified margin to be spliced of line of cut and the thin film transistor (TFT) array are cut, the thin film transistor base plate unit that polylith respectively carries a piece of thin film transistor (TFT) array is obtained；A supporting plate is chosen, mutually splices thin film transistor base plate unit described in polylith along its cut surface in the supporting plate, thin film transistor base plate is formed；Make display front plate；The display front plate and the gripper shoe groups with the thin film transistor base plate are dressed up into display screen.
- A kind of method for manufacturing large-sized liquid crystal display, it is characterised in that comprise the steps：A substrate is chosen, multi-disc thin film transistor (TFT) array is prepared on the substrate；The substrate, and the justified margin to be spliced of line of cut and the thin film transistor (TFT) array are cut, the thin film transistor base plate unit that polylith respectively carries a piece of thin film transistor (TFT) array is obtained；A supporting plate is chosen, mutually splices thin film transistor base plate unit described in polylith along its cut surface in the supporting plate, thin film transistor base plate is formed；Alignment film under being prepared on the thin film transistor base plate；A transparent front plate is chosen, and sets gradually on a surface of the transparent front plate optical filter, transparency conducting layer and upper alignment film；Sept is set on alignment film or lower alignment film on described；The supporting plate and the transparent front plate are assembled, make the upper alignment film and the relative bonding of lower alignment film, and liquid crystal is irrigated between the upper alignment film and lower alignment film；One polaroid is respectively set in the outside of the transparent front plate and the supporting plate respectively；Drive circuit is assembled, LCDs is obtained.
- A kind of method for manufacturing large scale active driven organic EL display screen, it is characterised in that comprise the steps：A substrate is chosen, multi-disc thin film transistor (TFT) array is prepared on the substrate, and contraposition sets organic electroluminescence cell on the every thin film transistor (TFT) array；The substrate, and line of cut and the thin film transistor (TFT) array and the justified margin to be spliced of organic electroluminescence cell are cut, the polylith respectively base board unit with a piece of thin film transistor (TFT) array and an organic electroluminescence cell is obtained；A supporting plate is chosen, mutually splices base board unit described in polylith along its cut surface in the supporting plate, thin film transistor (TFT) and organic electroluminescent substrate is formed；A transparent front plate is chosen, the supporting plate and the transparent front plate are assembled, makes the thin film transistor (TFT) and the laminating relative with transparent front plate of organic electroluminescent substrate；Drive circuit is assembled, active driven organic EL display screen is obtained.
- A kind of method for manufacturing large scale active driven organic EL display screen, it is characterised in that comprise the steps：A substrate is chosen, multi-disc thin film transistor (TFT) array is prepared on the substrate；The substrate, and the justified margin to be spliced of line of cut and the thin film transistor (TFT) array are cut, the thin film transistor base plate unit that polylith respectively carries a piece of thin film transistor (TFT) array is obtained；A supporting plate is chosen, mutually splices thin film transistor base plate unit described in polylith along its cut surface in the supporting plate, thin film transistor base plate is formed；The organic electro luminescent layer of single chip architecture is prepared on the thin film transistor base plate；A transparent front plate is chosen, the thin film transistor base plate with organic electro luminescent layer and the transparent front plate are assembled, makes organic electro luminescent layer laminating relative with transparent front plate；Drive circuit is assembled, active driven organic EL display screen is obtained.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2012/081186 WO2014036736A1 (en) | 2012-09-10 | 2012-09-10 | Large-size display screen and manufacturing method therefor |
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| Publication Number | Publication Date |
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| CN103797531A true CN103797531A (en) | 2014-05-14 |
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| CN201280001478.5A Pending CN103797531A (en) | 2012-09-10 | 2012-09-10 | Large-size display screen and manufacturing method therefor |
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| CN (1) | CN103797531A (en) |
| WO (1) | WO2014036736A1 (en) |
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| JP7260526B2 (en) * | 2017-09-04 | 2023-04-18 | ソウル セミコンダクター カンパニー リミテッド | Display device and manufacturing method thereof |
| CN107589578A (en) | 2017-10-31 | 2018-01-16 | 武汉华星光电技术有限公司 | Tiled display and its manufacture method |
| CN111968499A (en) * | 2019-05-20 | 2020-11-20 | 元太科技工业股份有限公司 | Tiled display device and method of manufacturing the same |
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| WO2014036736A1 (en) | 2014-03-13 |
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Application publication date: 20140514 |