CN103794466A - Apparatus for maintaining internal cleanliness of interface unit - Google Patents

Apparatus for maintaining internal cleanliness of interface unit Download PDF

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Publication number
CN103794466A
CN103794466A CN201210425780.5A CN201210425780A CN103794466A CN 103794466 A CN103794466 A CN 103794466A CN 201210425780 A CN201210425780 A CN 201210425780A CN 103794466 A CN103794466 A CN 103794466A
Authority
CN
China
Prior art keywords
interface unit
cylinder
track
cleanliness factor
framework
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201210425780.5A
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Chinese (zh)
Inventor
王继周
张爽
胡延兵
门恩国
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenyang Solidtool Co Ltd
Shenyang Xinyuan Microelectronics Equipment Co Ltd
Original Assignee
Shenyang Xinyuan Microelectronics Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenyang Xinyuan Microelectronics Equipment Co Ltd filed Critical Shenyang Xinyuan Microelectronics Equipment Co Ltd
Priority to CN201210425780.5A priority Critical patent/CN103794466A/en
Publication of CN103794466A publication Critical patent/CN103794466A/en
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67196Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention belongs to wafer gluing development production field in semiconductor industry and specifically relates to an apparatus for maintaining internal cleanliness of an interface unit. The apparatus is arranged at opening portions on the two sides of an interface unit connected with a TRACK and a lithography machine, comprises a shielding baffle plate and a driving device connected with the shielding baffle plate. The shielding baffle plate closes or opens the opening portions, connected with the TRACK and the lithography machine, of the interface unit by means of the driving the driving device. The driving device is disposed on the inner wall of a framework of the interface unit. A sealing device is disposed at a joint of the shielding baffle plate and the inner wall of the framework of the opening portions of the interface unit. The apparatus effectively resolves a problem that the opening portions on the two sides of the interface unit are directly exposed to a production environment so as to result in decrease in internal cleanliness of the interface unit, and greatly improves actual production efficiency.

Description

Keep the inner cleanliness factor device of interface unit
Technical field
The invention belongs to semicon industry wafer gluing development production field, specifically a kind of inner cleanliness factor device of interface unit that keeps.
Background technology
In the production process of the front road of semiconductor technique wafer, require all very strict to production environment cleanliness factor and wafer production capacity.Generally Clean room cleanliness factor is 100 grades, and the inner cleanliness factor requirement of TRACK (glue-spreading development equipment) is 1 grade; TRACK production capacity main flow index in 90nm technique is 150WPH (Wafer per Hour) simultaneously.In TRACK and mask aligner actual production, can be often cause equipment downtime because of device interior fault or equipment periodic maintenance.Under this state, the interface unit being connected with mask aligner as TRACK need to be moved out of so that operating personnel's work.Present stage interface unit be connected side with TRACK or mask aligner be designed to openly, in the time being moved out of, interface unit is directly exposed to and in production environment, causes inner cleanliness factor to decline, before resuming production for guaranteeing that cleanliness factor index need carry out inner blower dedusting.Air-supply dust removal operation generally needs 30-40 minute consuming time, and this operation not only consumes the energy but also wasted the production time, and the high-speed high-quality production model of present requirement has been formed to certain obstruction.
Summary of the invention
For the problems referred to above, the object of the present invention is to provide a kind of inner cleanliness factor device of interface unit that keeps, the inner cleanliness factor device of this maintenance interface unit effectively solves interface unit both-side opening portion and is directly exposed in production environment and causes inner cleanliness factor to decline, and significantly promotes the efficiency of actual production.
To achieve these goals, the present invention is by the following technical solutions:
A kind of inner cleanliness factor device of interface unit that keeps, described device is arranged at the interface unit both-side opening portion being connected with TRACK and mask aligner, comprise and cover baffle plate and connected drive unit, described in cover baffle plate and drive and close or open the peristome that interface unit is connected with TRACK and mask aligner by drive unit.
Described drive unit is arranged on the inwall of framework of interface unit.Described peristome frame inner wall junction of covering baffle plate and interface unit arranges sealing device.Described drive unit is connected with TRACK main frame and by its action of TRACK host computer control.
The described device that is arranged at interface unit and mask aligner connection, it covers baffle plate and comprises lower plate, and lower plate is connected with drive unit and is driven and closed or open the peristome that interface unit is connected with mask aligner by drive unit.
The described device that is arranged at interface unit and TRACK junction, it covers baffle plate and comprises upper plate and lower plate I, described upper plate and lower plate I be arranged at respectively the framework panel beating opening of interface unit peristome two ends up and down, and be connected with drive unit independently respectively, described upper plate, is realized and is closed or open the peristome that interface unit is connected with TRACK by the drive unit driving, while move toward one another or the anti-phase motion that are connected separately with lower plate I.
In interface unit framework, be provided with the bracing or strutting arrangement that prevents that upper plate from coming off.Described bracing or strutting arrangement comprises cylinder I II and cylinder frame III, wherein cylinder frame III is arranged on the inwall of interface unit framework, described cylinder I II is arranged at cylinder frame III above and one end is provided with guide rod, and described guide rod stretches out and be arranged at the bottom of upper plate, prevents upper plate accidental.
The inwall both sides of described framework are provided with guide rail, slide on guide rail by slide block in the both sides of described upper plate and lower plate I.Described drive unit comprises cylinder and cylinder frame, and wherein cylinder is arranged on the inwall of interface unit framework by cylinder frame.
Advantage of the present invention and beneficial effect are:
1. the present invention, by automatic shutter interface unit peristome, has realized the requirement of docking port unit inner air cleanliness factor in production maintenance, has saved to a great extent the processing time again, improves production capacity and saves funds.
2. the present invention has simple in structurely, and it is convenient to realize, lower-price characteristic.
3. the present invention can realize interface unit peristome automatic shutter, can real-time implementation automatically switch according to the normal production of actual conditions and maintenance.
Accompanying drawing explanation
Fig. 1 is the apparatus structure schematic diagram of the present invention at interface unit and mask aligner junction peristome;
Fig. 2 is the apparatus structure schematic diagram of the present invention at interface unit and TRACK junction peristome;
Fig. 3 is II place enlarged drawing in Fig. 2;
Fig. 4 is I place enlarged drawing in Fig. 2;
Wherein: 1 is framework, 2 is framework panel beating opening I, and 3 is air inlet pipe I, and 4 is escape pipe I, 5 is cylinder I, and 6 is cylinder frame I, and 7 is lower plate I, and 8 is slide block, 9 is upper plate, and 10 is cylinder frame II, and 11 is cylinder I I, and 12 is air inlet pipe II, 13 is escape pipe II, and 14 is cylinder I I, and 15 is air cylinder fixed plate, and 16 is air inlet pipe III, 17 is escape pipe III, and 18 is framework panel beating opening II, and 19 is air inlet pipe IV, and 20 is escape pipe IV, 21 is cylinder I V, and 22 is cylinder frame IV, and 23 is lower plate II.
Embodiment
Below in conjunction with accompanying drawing, the invention will be further described.
The present invention is arranged at the interface unit both-side opening portion being connected with TRACK and mask aligner, comprise and cover baffle plate and connected drive unit, the described baffle plate that covers is driven and is closed or open the peristome that interface unit is connected with TRACK and mask aligner by drive unit, described in cover baffle plate and interface unit peristome frame inner wall junction sealing device is set.Described drive unit is arranged on the inwall of framework 1 of interface unit, and drive unit is connected with TRACK main frame and by its action of TRACK host computer control.Described drive unit can adopt air cylinder device or motor.TRACK main frame is prior art.
As shown in Figure 1, the present invention is arranged on the device of interface unit and mask aligner connection, and its drive unit adopts air cylinder device, and this air cylinder device comprises cylinder I V21 and cylinder frame IV22, and cylinder I V21 is fixed on the framework 1 of interface unit by cylinder frame IV22.Covering baffle plate is lower plate II 7, and lower plate II 7 is connected with cylinder I V21 and is driven and closed or open the peristome that interface unit is connected with mask aligner by cylinder I V 21.
As shown in Figure 2, the present invention is arranged on the device of interface unit and TRACK junction, it covers baffle plate and comprises upper plate 9 and lower plate 7, upper plate 9 and lower plate 7 be arranged at respectively the framework panel beating opening 2 of interface unit peristome two ends up and down, and be connected with drive unit independently respectively.The drive unit being connected with upper plate 9 comprises cylinder I I11 and cylinder frame II10, and cylinder I I11 is fixed on by cylinder frame II10 on the upper end inwall of framework 1, and upper plate 9 is connected with cylinder I I11 and is driven and moved back and forth up and down by cylinder I I11.The drive unit being connected with lower plate I7 comprises cylinder I 5 and cylinder frame I6, and cylinder I 5 is fixed on the inwall lower end of framework 1 by cylinder frame I6, and lower plate I7 is connected with cylinder I 5 and is driven and moved back and forth up and down by cylinder I 5.The inwall both sides of framework 1 are provided with guide rail, and slide on guide rail by slide block 8 in the both sides of upper plate 9 and lower plate I7, as shown in Figure 4.Upper plate 9, is realized and is closed or open the peristome that interface unit is connected with TRACK respectively by the air cylinder driven, while move toward one another or the anti-phase motion that are connected separately with lower plate 7.
As shown in Figure 3, in interface unit framework 1, be provided with the bracing or strutting arrangement that prevents that upper plate 9 from coming off.Described bracing or strutting arrangement comprises cylinder I II14 and cylinder frame III15, wherein cylinder frame III15 is arranged on the upper end inwall of interface unit framework 1, cylinder I II15 is arranged at cylinder frame III15 above and one end is provided with guide rod, described guide rod along continuous straight runs stretches out and is arranged at the bottom of upper plate 9, prevents upper plate 9 accidental.
The course of work of the present invention is:
Interface unit shifts out processing
1.. interface unit is connected side device action with mask aligner
As shown in Figure 1, before interface unit is moved out of, TRACK host computer system can be sent instruction, convert electric signal to by software, drive the guide rod of cylinder I V21 to move upward by air inlet pipe IV19 and escape pipe IV20, drive the framework panel beating opening II18 of lower plate II23 down interface unit and mask aligner junction.
2.. interface unit is connected side device action with TRACK
As shown in Figure 2, before interface unit is moved out of, TRACK host computer system can be sent instruction, converts electric signal to by software, carries out closing motion.
Because of the relations of production, the framework panel beating opening I2 of interface unit is in normally open, and upper plate 9 must be supported to guarantee to hang up for a long time by cylinder I I11.Cause upper plate 9 to come off for preventing that cylinder I I11 lost efficacy, adopt bracing or strutting arrangement to carry out preventative protection.The present embodiment bracing or strutting arrangement adopts cylinder I II14, when upper plate 9 is during in suspension status, by air inlet pipe III16 and escape pipe III17, the guide rod of cylinder I II14 is stretched out, and is placed in the bottom of upper plate 9, reaches the object that prevents upper plate 9 accidental.In the time that the framework panel beating opening I2 of interface unit need to close, first by air inlet pipe III16 and escape pipe III17, the guide rod of cylinder I II14 is regained.
After above-mentioned action, drive the guide rod of cylinder I 5 to move upward by air inlet pipe I3 and escape pipe I4, thereby drive lower plate I7 to move upward; Meanwhile, drive the guide rod of cylinder I I11 to move downward by air inlet pipe II12 and escape pipe II13, thereby drive upper plate 9 to move downward; Cylinder I 5 and cylinder II9 drive lower plate I7 and upper plate 9 move toward one another simultaneously, the framework panel beating opening I2 of down interface unit.
Interface unit reset processing
1.. interface unit is connected side device action with mask aligner
As shown in Figure 1, after interface unit resets, TRACK host computer system can be sent instruction, convert electric signal to by software, drive the guide rod of cylinder I V21 to move downward by the commutation of air inlet pipe IV19 and escape pipe IV20, drive lower plate II23 to open the framework panel beating opening II18 of interface unit and mask aligner junction.
2.. interface unit is connected side device action with TRACK
As shown in Figure 2, after interface unit resets, TRACK host computer system can be sent instruction, converts electric signal to by software, drives cylinder I 5 and cylinder II11 to carry out counter motion, drives upper plate 9 and lower plate I7 motion, opens the framework panel beating opening I2 of interface unit.After this, need make cylinder I II14 action, its inner guide rod be stretched out, to prevent that upper plate 9 from coming off.

Claims (10)

1. one kind keeps the inner cleanliness factor device of interface unit, it is characterized in that: described device is arranged at the interface unit both-side opening portion being connected with TRACK and mask aligner, comprise and cover baffle plate and connected drive unit, described in cover baffle plate and drive and close or open the peristome that interface unit is connected with TRACK and mask aligner by drive unit.
2. by the inner cleanliness factor device of maintenance interface unit claimed in claim 1, it is characterized in that: described drive unit is arranged on the inwall of framework (1) of interface unit.
3. by the inner cleanliness factor device of maintenance interface unit claimed in claim 1, it is characterized in that: described in cover baffle plate and interface unit peristome frame inner wall junction sealing device is set.
4. by the inner cleanliness factor device of the maintenance interface unit described in claim 1 or 2, it is characterized in that: described drive unit is connected with TRACK main frame and by its action of TRACK host computer control.
5. by the inner cleanliness factor device of the maintenance interface unit described in claim 1-3, it is characterized in that: described in be arranged at the device of interface unit and mask aligner connection, it covers baffle plate and comprises lower plate (7), and lower plate (7) is connected with drive unit and is driven and closed or open the peristome that interface unit is connected with mask aligner by drive unit.
6. by the inner cleanliness factor device of the maintenance interface unit described in claim 1-3, it is characterized in that: described in be arranged at the device of interface unit and TRACK junction, it covers baffle plate and comprises upper plate (9) and lower plate I (7), described upper plate (9) and lower plate I (7) are arranged at respectively the two ends up and down of the framework panel beating opening (2) of interface unit peristome, and be connected with drive unit independently respectively, described upper plate (9) drives by the drive unit being connected separately with lower plate I (7), move toward one another or anti-phase motion simultaneously, the peristome that interface unit is connected with TRACK is closed or is opened in realization.
7. by the inner cleanliness factor device of maintenance interface unit claimed in claim 6, it is characterized in that: in interface unit framework (1), be provided with the bracing or strutting arrangement that prevents that upper plate (9) from coming off.
8. by the inner cleanliness factor device of maintenance interface unit claimed in claim 7, it is characterized in that: described bracing or strutting arrangement comprises cylinder I II (14) and cylinder frame III (15), wherein cylinder frame III (15) is arranged on the inwall of interface unit framework (1), described cylinder I II (15) is arranged at cylinder frame III (15) above and one end is provided with guide rod, described guide rod stretches out and is arranged at the bottom of upper plate (9), prevents upper plate (9) accidental.
9. by the inner cleanliness factor device of maintenance interface unit claimed in claim 6, it is characterized in that: the inwall both sides of described framework (1) are provided with guide rail, slides on guide rail by slide block (8) in the both sides of described upper plate (9) and lower plate I (7).
10. by the inner cleanliness factor device of the maintenance interface unit described in claim 1 or 2, it is characterized in that: described drive unit comprises cylinder and cylinder frame, wherein cylinder is arranged on the inwall of interface unit framework (1) by cylinder frame.
CN201210425780.5A 2012-10-30 2012-10-30 Apparatus for maintaining internal cleanliness of interface unit Pending CN103794466A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201210425780.5A CN103794466A (en) 2012-10-30 2012-10-30 Apparatus for maintaining internal cleanliness of interface unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201210425780.5A CN103794466A (en) 2012-10-30 2012-10-30 Apparatus for maintaining internal cleanliness of interface unit

Publications (1)

Publication Number Publication Date
CN103794466A true CN103794466A (en) 2014-05-14

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106298602A (en) * 2015-06-03 2017-01-04 沈阳芯源微电子设备有限公司 The interface sealing device of quasiconductor interface unit

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1325130A (en) * 2000-05-10 2001-12-05 东京毅力科创株式会社 Coating and developing system
CN1407410A (en) * 2001-08-28 2003-04-02 东京威力科创股份有限公司 Development treating method and developing liquid coating device
CN2625528Y (en) * 2003-06-19 2004-07-14 武汉市江汉医疗制药设备有限公司 Vertically lifting door of pulsant vacuum sterilizer
CN1723537A (en) * 2002-12-10 2006-01-18 株式会社尼康 Exposure apparatus and method for producing device
US20090248192A1 (en) * 2006-06-15 2009-10-01 Tokyo Electron Limited Substrate processing system and substrate conveyance method
CN101881112A (en) * 2009-05-06 2010-11-10 大连北方铁路新技术研究所 Sliding open type machine door
TW201128684A (en) * 2009-11-13 2011-08-16 Tokyo Electron Ltd Photo resist coating/developing apparatus, substrate transfer method and interface apparatus

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1325130A (en) * 2000-05-10 2001-12-05 东京毅力科创株式会社 Coating and developing system
CN1407410A (en) * 2001-08-28 2003-04-02 东京威力科创股份有限公司 Development treating method and developing liquid coating device
CN1723537A (en) * 2002-12-10 2006-01-18 株式会社尼康 Exposure apparatus and method for producing device
CN2625528Y (en) * 2003-06-19 2004-07-14 武汉市江汉医疗制药设备有限公司 Vertically lifting door of pulsant vacuum sterilizer
US20090248192A1 (en) * 2006-06-15 2009-10-01 Tokyo Electron Limited Substrate processing system and substrate conveyance method
CN101881112A (en) * 2009-05-06 2010-11-10 大连北方铁路新技术研究所 Sliding open type machine door
TW201128684A (en) * 2009-11-13 2011-08-16 Tokyo Electron Ltd Photo resist coating/developing apparatus, substrate transfer method and interface apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106298602A (en) * 2015-06-03 2017-01-04 沈阳芯源微电子设备有限公司 The interface sealing device of quasiconductor interface unit
CN106298602B (en) * 2015-06-03 2019-02-15 沈阳芯源微电子设备有限公司 The interface sealing device of semiconductor interface unit

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Application publication date: 20140514