CN103774105A - Arc detection and inhibition method for magnetron sputtering process - Google Patents
Arc detection and inhibition method for magnetron sputtering process Download PDFInfo
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- CN103774105A CN103774105A CN201410012623.0A CN201410012623A CN103774105A CN 103774105 A CN103774105 A CN 103774105A CN 201410012623 A CN201410012623 A CN 201410012623A CN 103774105 A CN103774105 A CN 103774105A
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Abstract
The invention discloses an arc detection and inhibition method for a magnetron sputtering process. The operation of sampling magnetron sputtering power load voltage and load current is implemented by virtue of a voltage Hall sensor and a current Hall sensor, a voltage and current common change threshold detection method serves as an arc detection judgment basis, and if the arc does not exist, the current state is maintained; when the arc is detected, inhibition is immediately performed by reducing the output voltage amplitude; when arcs which exceed a set number are generated through accumulation, a target (namely a cathode) is cleaned in a forced mode. According to the method, the arcs can be reliably, efficiently and comprehensively detected, and losses in process intervals can be reduced as much as possible, so that the efficiency of the magnetron sputtering coating process and the quality of the coating are improved.
Description
Technical field
The invention belongs to field of surface engineering technique, relate to a kind of arc-detection for magnetron sputtering technique and inhibition method.
Background technology
Magnetron sputtering technique, as a kind of deposition plating method, is widely used in industrial production and field of scientific study, as microelectronics, optical thin film and material surface processing etc.In sputter procedure, constantly change because load and environment exist on a large scale, thereby the output performance of power supply is had to very high requirement, can the stability of supply unit and reliability adapt to above variation and good sputtering condition is provided, and have a strong impact on the quality of film.
Especially in sputter procedure due to the accumulation of electric charge on negative electrode, inevitably between target (i.e. " negative electrode ") and anode, form electric arc, if the electric arc after formation can not be inhibited in time, easily cause rete defect, affect membrane uniformity, and occur on surface when serious, being forced to spot pin hole etc. breaks in production and even damaging power supply.Therefore,, for guaranteeing coating quality, just must detect as early as possible and eliminate in time arc light.
There is at present the detection method of many electric arcs, use maximum be electric current or (with) the arc-detection method of discrimination of voltage, the electric current measuring to be checked or (with) voltage exceedes and sets discriminant value, think that electric arc produces, although the method possible in theory, but in practice for the detection of the miniature electric arc of slight electric discharge, because producing, it is often accompanied by larger voltage-drop and less Current rise, therefore adopt electric current detecting method easily to cause undetected survey, cause and be sputtered material surface and occur flaw, often the appearance of miniature electric arc is indicating the generation of large-scale electric arc, for some, equipment and process is endangered to large large-scale electric arc, can be accompanied by the generation that jumps of immediate current, adopt voltage detection method the generation of electric arc can not be detected in time, delay protection action, causes having a strong impact on Processes and apparatus.The weak point of these methods, has directly affected efficiency and the quality of plated film.
In the disclosed method of patent that is CN1987490 at publication number: compare in each set time in cycle point sampling signal (voltage or electric current) and reference value, in the time that sampled signal exceedes reference value, think that electric arc produces, although the method can improve accuracy of detection, but mainly for the arc-detection that exchanges sputter, and need special hardware circuit to coordinate, be not suitable for the detection of the shielding power supply of direct current and the multiple output of pulse.
In the disclosed method of patent that is CN101983255A at publication number: by the monitoring of the electrical characteristic such as magnetron sputtering technique applying plasma loaded impedance or admittance is carried out to arc-detection, although the method can detect electric arc exactly, avoid the impact bringing while using dU/dt and dI/dt to detect, but because the diversity of sputtering technology makes the variation range of plasma impedance or admittance larger, the scope that is difficult to define impedance or admittance value, adaptability is poor.
For the electric arc detecting, class methods are to realize by powered-down simply, until electric arc re-powers after disappearing again.In the disclosed method of patent that is CN102315073A at publication number: power supply is in the time recognizing electric arc, the temporary transient interchange of interrupting arriving target is to suppress from the electric arc of target extension, again apply again afterwards and exchange target, although the method can effectively suppress to continue the electric arc of generation, but also lose between process island when powered-down simply, seriously affected plated film speed.
Another kind of method is by increasing hardware circuit, such as add arc suppressing apparatus circuit at circuit output end, mostly such arc suppressing apparatus is to utilize inductance to produce moment at impulse sources, be equivalent to open circuit and suppress its interference to DC power supply, and electric capacity produces moment at impulse sources and is equivalent to short circuit and absorbs current rush to reach the effect of timely arc extinguishing.In as open in the patent that is CN102315073A at publication number: by as described in pulsing circuit, comprise a reservoir capacitance and an inductance of connecting by switching arrangement, in the time detecting that arc phenomenon occurs, pulsing circuit and plasma load are disconnected and the inductance energy of high-peak power pulse storage is circulated back to reservoir capacitance, thereby the harm that electric arc is caused minimizes, use the method it is emphasized that, for different targets, although circuit theory is consistent with structure, but the inductance mating and electric capacity are different, irrational coupling even can play retroaction, therefore, thereby need means by experiment to obtain matched data and set up arc suppressing apparatus, be not suitable for frequent replacing target or use in the sputter of the target of unknown characteristics.
Summary of the invention
The object of this invention is to provide a kind of arc-detection for magnetron sputtering technique and inhibition method, solved under prior art condition each detection method limitation large, the problem of adaptability deficiency.
The technical solution used in the present invention is, a kind of arc-detection for magnetron sputtering technique and inhibition method are specifically implemented according to following steps:
Step 1: implement the sampling to magnetron sputtering power source loads voltage and load current by voltage hall sensor and current Hall sensor, adopt electric current and voltage co-variation threshold detection method as arc-detection judgment basis, if judge and there is no electric arc, maintain current state; In the time electric arc being detected, enter and in step 2, carry out arc extinguishing processing;
Step 2: detected electric arc in step 1 is suppressed by magnetron sputtering power-supply controller of electric.
The invention has the beneficial effects as follows: using electric current and voltage co-variation threshold value as arc-detection judgment basis, can miniature electric arc and large-scale electric arc be monitored and be detected, more reliably, more efficiently, more fully detect the appearance of electric arc, make up the defect of existing arc method for measuring poor efficiency, easy undetected survey; According to the statistics of the electric arc number to detecting, select by reducing output voltage amplitude or by force target (" negative electrode ") being cleaned to carry out electric arc and suppress to process.
Accompanying drawing explanation
Fig. 1 is the workflow block diagram of arc-detection of the present invention and inhibition method;
Fig. 2 is the waveform schematic diagram that arc-detection of the present invention and inhibition embodiment of the method reduce output voltage amplitude in the time of arc extinguishing;
Fig. 3 is arc-detection of the present invention and suppresses the output voltage waveforms schematic diagram that embodiment of the method is cleaned target (" negative electrode ") at the constant reverse voltage of output.
Embodiment
Below in conjunction with the drawings and specific embodiments, the present invention is described in detail.
As shown in Figure 1, the arc-detection for magnetron sputtering technique of the present invention and inhibition method, comprise detection to electric arc and the large step of inhibition two of electric arc, specifically implements according to following steps:
Step 1: implement the sampling to magnetron sputtering power source loads voltage and load current by voltage hall sensor and current Hall sensor, adopt electric current and voltage co-variation threshold detection method as arc-detection judgment basis, if judge and there is no electric arc, maintain current state; In the time electric arc being detected, enter and in step 2, carry out arc extinguishing processing;
Wherein, electric current and voltage co-variation threshold detection method is specifically implemented according to following steps: by current Hall and voltage hall sensor, magnetron sputtering electric power outputting current and output voltage are sampled respectively and judged in controller, when sampled voltage drops to voltage threshold, sample rate current exceedes while setting current threshold simultaneously, thinks and produces electric arc this moment.Threshold setting in embodiment is: current threshold is set as 1.05 times of power supply instruction outward current in controller, and voltage threshold is set as 200V in controller.
Step 2: by magnetron sputtering power-supply controller of electric, detected electric arc in step 1 is suppressed, specifically implement according to following steps:
Step 2.1, when detected by method described in step 1 electric arc produce time, suppress by reducing output voltage amplitude immediately, specifically implement according to following steps: the output that reduces front stage circuits dutycycle by magnetron sputtering power-supply controller of electric changes the input voltage of late-class circuit, thereby reduction output voltage amplitude, as shown in Fig. 2 embodiment, by counter, arc is occurred to number adds up simultaneously, after time delay for some time, recover the output of front stage circuits dutycycle, then return and in step 1, re-start detection;
Step 2.2, in the time that in step 2.1, the number to electric arc statistics exceedes limit value, magnetron sputtering power supply will clean target (" negative electrode ") by force, specifically implement according to following steps:
Constant reverse voltage (with " anode " in the same way) is exported in step 2.2.1, the order of magnetron sputtering power-supply controller of electric within the regular hour, as shown in Fig. 3 embodiment, and to counter O reset;
Step 2.2.2, magnetron sputtering power-supply controller of electric return to the setting before electric arc occurs, rework;
If step 2.2.3 still detects the existence of electric arc by method described in step 1, carry out stoppage protection; After detecting that electric arc disappears, return in step 1 and proceed to detect.
Method of the present invention, take " arc-detection " as core, " secondary arc extinguishing " is means, more reliably, detect more efficiently the appearance of electric arc, and the electric arc detecting is processed, for the electric arc detecting, process by reducing output voltage amplitude immediately; Accumulation produces while exceeding the electric arc of setting quantity, by force target (" negative electrode ") is cleaned.Miniature electric arc and large-scale electric arc are monitored and detected simultaneously, high efficient and reliable is carried out the judgement of electric arc all sidedly, makes up the defect of existing arc method for measuring poor efficiency, easy undetected survey.The method suppresses electric arc the mechanism of production of electric arc, has reduced as much as possible the loss between process island, has improved the efficiency of magnetron sputtering membrane process and the quality of rete.
Claims (4)
1. for arc-detection and the inhibition method of magnetron sputtering technique, it is characterized in that, specifically implement according to following steps:
Step 1: implement the sampling to magnetron sputtering power source loads voltage and load current by voltage hall sensor and current Hall sensor, adopt electric current and voltage co-variation threshold detection method as arc-detection judgment basis, if judge and there is no electric arc, maintain current state; In the time electric arc being detected, enter and in step 2, carry out arc extinguishing processing;
Step 2: detected electric arc in step 1 is suppressed by magnetron sputtering power-supply controller of electric.
2. the arc-detection for magnetron sputtering technique according to claim 1 and inhibition method, is characterized in that, in described step 1, electric current and voltage co-variation threshold detection method concrete steps are:
By current Hall and voltage hall sensor, magnetron sputtering electric power outputting current and output voltage are sampled respectively and judged in controller, when sampled voltage drops to voltage threshold, sample rate current exceedes while setting current threshold simultaneously, thinks and produces electric arc this moment.
3. the arc-detection for magnetron sputtering technique according to claim 2 and inhibition method, it is characterized in that, described threshold setting is: current threshold is set as 1.05 times of power supply instruction outward current in controller, and voltage threshold is set as 200V in controller.
4. the arc-detection for magnetron sputtering technique according to claim 1 and inhibition method, is characterized in that, the concrete steps of described step 2 are:
Step 2.1, when detected by step 1 electric arc produce time, immediately by reduce output voltage amplitude suppress, concrete steps are:
The output that reduces front stage circuits dutycycle by magnetron sputtering power-supply controller of electric changes the input voltage of late-class circuit, thereby reduction output voltage amplitude, by counter, arc is occurred to number adds up simultaneously, after time delay for some time, recover the output of front stage circuits dutycycle, then return and in step 1, re-start detection;
Step 2.2, in the time that in step 2.1, the number to electric arc statistics exceedes limit value, magnetron sputtering power supply will clean target by force, concrete steps are:
Constant reverse voltage is exported in step 2.2.1, the order of magnetron sputtering power-supply controller of electric within the regular hour, and to counter O reset;
Step 2.2.2, magnetron sputtering power-supply controller of electric return to the setting before electric arc occurs, rework;
If step 2.2.3 still detects the existence of electric arc by method described in step 1, carry out stoppage protection; After detecting that electric arc disappears, return in step 1 and proceed to detect.
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104466940A (en) * | 2014-11-10 | 2015-03-25 | 芜湖真空科技有限公司 | Arc extinguishing method for power source |
| CN105925945A (en) * | 2016-05-25 | 2016-09-07 | 上海华力微电子有限公司 | Detection method for aluminium metallizing layer at edge of target |
| CN111926308A (en) * | 2020-08-24 | 2020-11-13 | 湖南红太阳光电科技有限公司 | Method for processing plasma discharge abnormity |
| CN112363070A (en) * | 2021-01-14 | 2021-02-12 | 江苏固德威电源科技股份有限公司 | Battery arc discharge detection method and device and battery energy storage system |
| CN114446752A (en) * | 2020-11-04 | 2022-05-06 | 中微半导体设备(上海)股份有限公司 | Detection method and detection device for electric arc of plasma processing chamber |
| CN114540774A (en) * | 2022-01-29 | 2022-05-27 | 深圳市瀚强科技股份有限公司 | Power supply and arc processing method |
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| CN103436851A (en) * | 2013-08-13 | 2013-12-11 | 西安理工大学 | Electric arc extinguishing method for magnetron sputtering technology |
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Patent Citations (5)
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| JPS52138074A (en) * | 1976-05-14 | 1977-11-17 | Tokuda Seisakusho | Power source for spattering |
| JPH03240951A (en) * | 1990-02-15 | 1991-10-28 | Kao Corp | Sputtering device |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104466940A (en) * | 2014-11-10 | 2015-03-25 | 芜湖真空科技有限公司 | Arc extinguishing method for power source |
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| CN114446752B (en) * | 2020-11-04 | 2024-04-05 | 中微半导体设备(上海)股份有限公司 | Method and device for detecting electric arc in plasma processing cavity |
| CN112363070A (en) * | 2021-01-14 | 2021-02-12 | 江苏固德威电源科技股份有限公司 | Battery arc discharge detection method and device and battery energy storage system |
| CN112363070B (en) * | 2021-01-14 | 2021-06-22 | 江苏固德威电源科技股份有限公司 | Battery arc discharge detection method and device and battery energy storage system |
| CN114540774A (en) * | 2022-01-29 | 2022-05-27 | 深圳市瀚强科技股份有限公司 | Power supply and arc processing method |
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