CN103746018B - 一种瓦片状型波纹式太阳能电池硅基片及其制造工艺 - Google Patents
一种瓦片状型波纹式太阳能电池硅基片及其制造工艺 Download PDFInfo
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- CN103746018B CN103746018B CN201410028013.XA CN201410028013A CN103746018B CN 103746018 B CN103746018 B CN 103746018B CN 201410028013 A CN201410028013 A CN 201410028013A CN 103746018 B CN103746018 B CN 103746018B
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- solar cell
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- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 20
- 239000010703 silicon Substances 0.000 title claims abstract description 20
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims abstract description 19
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 13
- 230000007797 corrosion Effects 0.000 claims abstract description 12
- 238000005260 corrosion Methods 0.000 claims abstract description 12
- 230000000873 masking effect Effects 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims abstract description 10
- 239000000126 substance Substances 0.000 claims abstract description 10
- 229920005591 polysilicon Polymers 0.000 claims abstract description 8
- 238000000151 deposition Methods 0.000 claims abstract description 6
- 230000008021 deposition Effects 0.000 claims abstract description 6
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 claims abstract description 3
- 239000002253 acid Substances 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 4
- 239000000243 solution Substances 0.000 claims description 3
- 239000011259 mixed solution Substances 0.000 claims description 2
- 238000012876 topography Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201410028013.XA CN103746018B (zh) | 2014-01-21 | 2014-01-21 | 一种瓦片状型波纹式太阳能电池硅基片及其制造工艺 |
Applications Claiming Priority (1)
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CN201410028013.XA CN103746018B (zh) | 2014-01-21 | 2014-01-21 | 一种瓦片状型波纹式太阳能电池硅基片及其制造工艺 |
Publications (2)
Publication Number | Publication Date |
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CN103746018A CN103746018A (zh) | 2014-04-23 |
CN103746018B true CN103746018B (zh) | 2016-04-13 |
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CN201410028013.XA Expired - Fee Related CN103746018B (zh) | 2014-01-21 | 2014-01-21 | 一种瓦片状型波纹式太阳能电池硅基片及其制造工艺 |
Country Status (1)
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CN (1) | CN103746018B (zh) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101861640A (zh) * | 2007-11-16 | 2010-10-13 | 株式会社爱发科 | 基板处理方法以及用该方法进行处理而形成的基板 |
CN102362356A (zh) * | 2009-03-25 | 2012-02-22 | 三菱电机株式会社 | 衬底的表面粗化方法以及光伏装置的制造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4304638B2 (ja) * | 2007-07-13 | 2009-07-29 | オムロン株式会社 | Cis系太陽電池及びその製造方法 |
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2014
- 2014-01-21 CN CN201410028013.XA patent/CN103746018B/zh not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101861640A (zh) * | 2007-11-16 | 2010-10-13 | 株式会社爱发科 | 基板处理方法以及用该方法进行处理而形成的基板 |
CN102362356A (zh) * | 2009-03-25 | 2012-02-22 | 三菱电机株式会社 | 衬底的表面粗化方法以及光伏装置的制造方法 |
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CN103746018A (zh) | 2014-04-23 |
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Effective date of registration: 20190716 Address after: 226019 Jiangsu city of Nantong province sik Road No. 9 Patentee after: Center for technology transfer, Nantong University Address before: 226019 Jiangsu city of Nantong province sik Road No. 9 Patentee before: Nantong University |
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Effective date of registration: 20191204 Address after: No.1, floor 3, No.319, zhanggongshan Road, Yuhui District, Bengbu City, Anhui Province Patentee after: Bengbu guijiu Intellectual Property Service Co.,Ltd. Address before: 3 / F, building 1, No. 400, Fangchun Road, China (Shanghai) pilot Free Trade Zone Patentee before: Shanghai set up Mdt InfoTech Ltd. Effective date of registration: 20191204 Address after: No. 400 Fangchun Road, China (Shanghai) Free Trade Pilot Area, No. 1 Building, 3 Floors, 2013 Patentee after: Shanghai set up Mdt InfoTech Ltd. Address before: 226019 Jiangsu city of Nantong province sik Road No. 9 Patentee before: Center for technology transfer, Nantong University |
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Effective date of registration: 20210524 Address after: 226000 No. 66, Lifa Avenue, Hai'an Development Zone (Chengdong town), Nantong City, Jiangsu Province Patentee after: Jiangsu fox Electric Group Co.,Ltd. Address before: 233000 No.1, third floor, No.319, zhanggongshan Road, Yuhui District, Bengbu City, Anhui Province Patentee before: Bengbu guijiu Intellectual Property Service Co.,Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
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Granted publication date: 20160413 |