CN103695205A - Self-broken decontamination liquid - Google Patents
Self-broken decontamination liquid Download PDFInfo
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- CN103695205A CN103695205A CN201310635422.1A CN201310635422A CN103695205A CN 103695205 A CN103695205 A CN 103695205A CN 201310635422 A CN201310635422 A CN 201310635422A CN 103695205 A CN103695205 A CN 103695205A
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- soiling solution
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Abstract
The invention discloses self-broken decontamination liquid, relating to the field of decontamination materials for removing radioactive contaminants. The decontamination liquid is prepared from the following ingredients in percentage by mass: 40-60% of organosilicon modified resin, 10-20% of silica sol and 3-6% of ethanol. According to the decontamination liquid, the problems of the existing decontamination materials that after film forming, the peeling is difficult, the recovery is difficult, a large volume of waste liquid can be generated and the operating efficiency is low can be solved effectively, so that the decontamination liquid is very applicable to the control and cleanup operations for radioactive contamination dust on walls of structures, such as rooms and passages.
Description
[technical field]
The present invention relates to radioactive pollutant and remove decontamination Material Field, especially relate to a kind of for removing the autoclase formula of the radiocontamination dust soiling solution that disappears.
[background technology]
Known, continually developing and applying along with new forms of energy, also day by day perfect about the applicable technology of core, although the development and utilization of nuclear energy brings huge economic benefit and social benefit to the mankind, its radwaste producing in application process has brought threat also to the mankind's living environment, at present, for removing the alpha-contamination removing material of channel wall, mainly comprise polymer pressed material both at home and abroad, dry remover, decontaminant, peelable film insulating covering agent and chemical gel/foam stain remover etc., wherein, because peelable film insulating covering agent can be applied in pollutent surface by peelable paint, and by simply peelling off film body, take away pollutent after dry formation film, therefore, in large-scale engineering decontamination, especially in the process of the Radioactive decontamination of the equipment to a large amount of and building structure, application peelable film insulating covering agent just becomes a kind of comparatively desirable method, yet, in long-term practical application, find, because the sagging homogeneity of peelable film insulating covering agent is poor, and generally it can reclaim because crossing thin being not easy at the formed film body of vertical walls, therefore, existing peelable film insulating covering agent has certain deficiency when removing vertical walls radiocontamination dust, simultaneously, other several classes remove materials when removing the pollution of vertical walls also in various degree have that task difficulty is large, workmen open-assembly time is long, soil removal efficiency is not high and waste liquid amount is large shortcoming, these are removed materials and are also not suitable for removing operation for the radiocontamination dust to vertical walls.
[summary of the invention]
In order to overcome the deficiency in background technology, the invention discloses a kind of autoclase formula that can effectively remove vertical walls radiocontamination dust soiling solution that disappears.
For achieving the above object, the present invention adopts following technical scheme:
The autoclase formula soiling solution that disappears, the described soiling solution that disappears consists of in mass ratio following component: organic-silicon-modified resin 40～60, silicon sol 10～20, ethanol 3～6; Said components makes the described soiling solution that disappears stir 0.5h after mixing in normal temperature environment after.
Further, the described soiling solution that disappears consists of in mass ratio following component: organic-silicon-modified resin 50, silicon sol 15, ethanol 5; Said components makes the described soiling solution that disappears stir 0.5h after mixing in normal temperature environment after.
Further, described organic-silicon-modified resin is self-drying type solvent-borne type silicone resin or self-drying aqueous silicone resin.
Further, described self-drying type solvent-borne type silicone resin is JF-2033 type.
Further, described self-drying aqueous silicone resin is JF-2061 type.
Further, the described soiling solution that disappears passes through corresponding spray appliance according to 2kg/m when application
2consumption be sprayed at wall, or cover at twice spraying.
Owing to adopting technical scheme as above, the present invention has following beneficial effect:
The autoclase formula of the present invention soiling solution that disappears can synthesize under normal temperature environment, and synthesis technique is simple, and cost is lower, the described soiling solution that disappears not only has quick-drying and the characteristic easy to crack of filming, but also can effectively improve, generate the homogeneity of filming and the stability that improves storage, be that it can be to concrete, glass, the radioactive dust of general wall paint wall carries out efficient adsorption, can also after rapid drying, form cracked solid-state cleavage block simultaneously, and reach the cohesive strength of obvious reduction cleavage block and wall, or even the object of self falling, therefore, after not only efficiently solving existing pollution clean-up material filming, the described soiling solution that disappears is difficult to peel off, be difficult for reclaiming and can producing a large amount of waste liquids and the low difficult problem of operating efficiency, but also be highly suitable for room, operation is controlled and removed to the structure wall radiocontamination dust such as passage.
[embodiment]
By the following examples, can explain in more detail the present invention, disclose object of the present invention and be intended to protect all changes and improvements in the scope of the invention, the present invention is not limited to the following examples:
The described autoclase formula soiling solution that disappears consists of in mass ratio following component: organic-silicon-modified resin 40～60, silicon sol 10～20 and ethanol 3～6; Wherein, organic-silicon-modified resin is filmogen, and it has quick-drying and the characteristic easy to crack of filming, for making the described soiling solution that disappears possess autoclase cracking performance; Silicon sol is performance improvement additives, and it can play and improve the effect that is coated with film uniformity and improves storage stability; And ethanol is used as solvent, for adjusting viscosity and dry, cracked speed, reach the object of thermal adaptability and the rate of drying of the soiling solution that disappears described in raising; As required, described organic-silicon-modified resin can adopt self-drying type solvent-borne type silicone resin, for example JF-2033 type or self-drying aqueous silicone resin, for example JF-2061 type;
Said components after mixing in normal temperature environment, stir just made after 0.5h can be in the temperature range of-30～50 ℃ in liquid, dynamic viscosity lower than 2000mPas, normal temperature sealed storage validity period is greater than the described autoclase formula of the 1 year soiling solution that disappears; The described corresponding spraying equipment of soiling solution utilization that disappears is according to 2kg/m
2consumption in the ventilated environment of-30～50 ℃, once spray, or cover at twice after vertical walls such as being sprayed at the concrete that is stained with radioactive dust and pollutes, glass, general wall paint wall, can also there is caking at 6 hours inner dryings cracked, reach the cohesive strength of obvious reduction fragment and wall or the object that fragment is come off from wall surface automatically simultaneously; The described soiling solution that disappears can will pollute adsorbing powder dust, be embedded in formed solid-state fragment in film forming drying process, thereby effectively controlled, pollute flying away of dust, and in fragment comes off or uses the process that relevant device reclaims by pollution clean-up, according to many experiments, confirm, the described soiling solution surface contamination clearance rate that disappears can reach more than 85%.
Part not in the detailed description of the invention is prior art, therefore the present invention is not described in detail.
Claims (6)
1. the autoclase formula soiling solution that disappears, is characterized in that: the described soiling solution that disappears consists of in mass ratio following component: organic-silicon-modified resin 40～60, silicon sol 10～20, ethanol 3～6; Said components makes the described soiling solution that disappears stir 0.5h after mixing in normal temperature environment after.
2. the autoclase formula according to claim 1 soiling solution that disappears, is characterized in that: the described soiling solution that disappears consists of in mass ratio following component: organic-silicon-modified resin 50, silicon sol 15, ethanol 5; Said components makes the described soiling solution that disappears stir 0.5h after mixing in normal temperature environment after.
3. the autoclase formula according to claim 1 and 2 soiling solution that disappears, is characterized in that: described organic-silicon-modified resin is self-drying type solvent-borne type silicone resin or self-drying aqueous silicone resin.
4. the autoclase formula according to claim 3 soiling solution that disappears, is characterized in that: described self-drying type solvent-borne type silicone resin is JF-2033 type.
5. the autoclase formula according to claim 3 soiling solution that disappears, is characterized in that: described self-drying aqueous silicone resin is JF-2061 type.
6. the autoclase formula according to claim 1 and 2 soiling solution that disappears, is characterized in that: described disappear soiling solution when application by corresponding spray appliance according to 2kg/m
2consumption be sprayed at wall, or cover at twice spraying.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310635422.1A CN103695205B (en) | 2013-12-03 | 2013-12-03 | A kind of Self-broken decontamination liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310635422.1A CN103695205B (en) | 2013-12-03 | 2013-12-03 | A kind of Self-broken decontamination liquid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103695205A true CN103695205A (en) | 2014-04-02 |
| CN103695205B CN103695205B (en) | 2016-01-20 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201310635422.1A Expired - Fee Related CN103695205B (en) | 2013-12-03 | 2013-12-03 | A kind of Self-broken decontamination liquid |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110530695A (en) * | 2019-09-11 | 2019-12-03 | 中国人民解放军军事科学院国防工程研究院工程防护研究所 | A kind of mold for the detection test of Radioactive decontamination rate |
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| CN1202975A (en) * | 1995-11-29 | 1998-12-23 | 英国核燃料公共有限公司 | Method for waste treatment |
| CN1592778A (en) * | 2001-07-17 | 2005-03-09 | 法国原子能委员会 | Method for treating a surface with a treating gel and treating gel |
| CN1644671A (en) * | 2004-02-26 | 2005-07-27 | 苏州大学放射医学研究所 | Anhydrous pollution removing adhesive for skin radiation pollution |
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| CN101394942A (en) * | 2006-02-28 | 2009-03-25 | 细胞生物工程有限公司 | Polymer composition and method for removing contaminates from a substrate |
| CN101605880A (en) * | 2007-02-15 | 2009-12-16 | 法国原子能委员会 | Contain solid particulate decontamination, peel off and/or degreasing foam |
| CN101730727A (en) * | 2007-06-19 | 2010-06-09 | 细胞生物工程有限公司 | Method for protecting substrates and removing contaminants from such substrates |
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2013
- 2013-12-03 CN CN201310635422.1A patent/CN103695205B/en not_active Expired - Fee Related
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1202975A (en) * | 1995-11-29 | 1998-12-23 | 英国核燃料公共有限公司 | Method for waste treatment |
| CN1592778A (en) * | 2001-07-17 | 2005-03-09 | 法国原子能委员会 | Method for treating a surface with a treating gel and treating gel |
| CN1644671A (en) * | 2004-02-26 | 2005-07-27 | 苏州大学放射医学研究所 | Anhydrous pollution removing adhesive for skin radiation pollution |
| CN101394942A (en) * | 2006-02-28 | 2009-03-25 | 细胞生物工程有限公司 | Polymer composition and method for removing contaminates from a substrate |
| CN101605880A (en) * | 2007-02-15 | 2009-12-16 | 法国原子能委员会 | Contain solid particulate decontamination, peel off and/or degreasing foam |
| CN101041123A (en) * | 2007-03-16 | 2007-09-26 | 清华大学 | Method for preparing high-loading iron cyanide complex/silicon dioxide hybrid materials |
| CN101730727A (en) * | 2007-06-19 | 2010-06-09 | 细胞生物工程有限公司 | Method for protecting substrates and removing contaminants from such substrates |
| CN102804284A (en) * | 2009-05-20 | 2012-11-28 | 法国原子能及替代能源委员会 | Solid hexa- and octacyanometallate nanocomposite material, method for preparing same, and method for fixing inorganic pollutants implementing same |
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| Title |
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| 企岷: "硅树脂近况", 《塑料工业》, no. 01, 31 December 1974 (1974-12-31), pages 41 - 53 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110530695A (en) * | 2019-09-11 | 2019-12-03 | 中国人民解放军军事科学院国防工程研究院工程防护研究所 | A kind of mold for the detection test of Radioactive decontamination rate |
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| CN103695205B (en) | 2016-01-20 |
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