CN103668360A - Non-cyanide gold-palladium alloy plating liquid and plating method - Google Patents

Non-cyanide gold-palladium alloy plating liquid and plating method Download PDF

Info

Publication number
CN103668360A
CN103668360A CN201310284709.4A CN201310284709A CN103668360A CN 103668360 A CN103668360 A CN 103668360A CN 201310284709 A CN201310284709 A CN 201310284709A CN 103668360 A CN103668360 A CN 103668360A
Authority
CN
China
Prior art keywords
gold
plating liquid
cyanogen
palldium alloy
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201310284709.4A
Other languages
Chinese (zh)
Other versions
CN103668360B (en
Inventor
渡边新吾
林克纪
曽根孝之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EEJA Ltd
Original Assignee
Electroplating Engineers of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Electroplating Engineers of Japan Ltd filed Critical Electroplating Engineers of Japan Ltd
Publication of CN103668360A publication Critical patent/CN103668360A/en
Application granted granted Critical
Publication of CN103668360B publication Critical patent/CN103668360B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C5/00Alloys based on noble metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

The invention provides non-cyanide gold-palladium alloy plating liquid which enables the appearance of a plating film to be good and definitely inhibits the plating film from generating breakage and other defects. The characteristics are that the non-cyanide gold-palladium alloy plating liquid containing gold salt, palladium salt, and appearance modifying agent contains phosphate as the appearance modifying agent and tellurium and/or selenium. In addition, preferably, the non-cyanide gold-palladium alloy plating liquid further contains allantoin compounds. According to the invention, the gold-palladium alloy plating film having a good appearance and being inhibited from breakage and other defects can be obtained even if the gold-palladium alloy plating liquid is non-cyanide.

Description

Non-cyanogen is gold-palldium alloy plating liquid and solution and coating method
Technical field
The present invention relates to Jin ?palldium alloy plating liquid, particularly non-cyanogen be Jin ?palldium alloy plating liquid.
Background technology
In the past, the gold-palldium alloy in palldium alloy was as the applicable material in the bonding parts such as electric terminal.Therefore, various gold-palladium plating liquids is proposed.
As gold-palldium alloy plating liquid of prior art, consider environmental problem etc., gold-palldium alloy plating liquid (for example, Japanese documentation 1,2) that non-cyanogen is is proposed.Gold-palldium alloy the plating liquid that is for this non-cyanogen, with regard to not using cyanogen, although good on environment, by being difficult to adjust the tendency that plating liquid forms, the outward appearance of the plating epithelium of formation has not good situation.In addition, according to situation difference, have the generation of plating epithelium cracked, cannot be applicable to the situation of the bonding parts such as electric terminal.
[look-ahead technique document]
[patent documentation]
[patent documentation 1] Japanese kokai publication sho 62-139893 communique
[patent documentation 2] TOHKEMY 2010-84178 communique
Summary of the invention
[problem that invention wish solves]
The present invention is based on above-mentioned situation, disclose a kind of plating epithelium outward appearance that makes good, can really suppress gold-palldium alloy plating liquid that plating epithelium produces the non-cyanogen system of the defect such as cracked.
The means of [Xie Decision Ke Questions]
The invention is characterized in that the non-cyanogen that contains golden salt, palladium salt is in gold-palldium alloy plating liquid, contain the phosphoric acid salt as outward appearance adjusting agent, and contain wallantoin (hydantoin) based compound.
Non-cyanogen of the present invention is in gold-palldium alloy plating liquid, and phosphoric acid salt has makes the good effect of plating epithelium outward appearance, specifically effectively suppresses the phenomenon of burning of plating epithelium.And by wallantoin compound, can realize in neutrality and without precipitation, wait the stable plating liquid producing to alkaline region.
In the present invention, phosphoric acid salt can be used tertiary sodium phosphate, Tripotassium phosphate, SODIUM PHOSPHATE, MONOBASIC, potassium primary phosphate, Sodium phosphate dibasic, dipotassium hydrogen phosphate, ammonium phosphate, phosphoric acid, Secondary ammonium phosphate, primary ammonium phosphate etc.
This phosphoric acid salt is preferably scaled 0.1g/L to 150g/L with phosphoric acid.While not reaching 0.1g/L, the outward appearance of plating epithelium has deteriorated tendency, easily produces and burns.While surpassing 150g/L, it is unstable that electroplate liquid becomes.
In addition, in the present invention, as wallantoin compound, can be wallantoin, 1-methyl wallantoin, 1,3-dimethyl wallantoin, 5,5-dimethyl wallantoin, 1-methyl alcohol-5,5-dimethyl wallantoin, 5,5-phenylbenzene wallantoin etc.
In the present invention, while containing wallantoin compound, be preferably 0.1g/L to 150g/L.While reaching 0.1g/L, plating liquid does not become unstable, and while surpassing 150g/L, outward appearance becomes bad.
Non-cyanogen of the present invention is in gold-palldium alloy plating liquid, preferably also contains the more than a kind of tellurium and/or selenium.While containing above-mentioned tellurium, selenium, can effectively suppress plating epithelium and produce cracked.
Tellurium in the present invention, selenium can be tellurium salt, the contained person of selenium salt.As tellurium salt, can use ammonium tellurate, potassium tellurate, sodium tellurate, telluric acid, potassium tellurite, sodium tellurite, tellurium bromide, tellurium chloride, telluronium iodide, tellurium oxide etc.In addition,, as selenium salt, can use potassium selenate, sodium selenate, barium selenate, tin anhydride, potassium selenite, Sodium Selenite, selenous acid, Selenium monobromide, Selenium monochloride, selenium oxide, sodium hydroselenite etc.
It is 0.001g/L to 10g/L that the amount of tellurium, selenium is preferably tellurium, and selenium is 0.001g/L to 10g/L.In addition,, while containing both, the total amount of tellurium and selenium is preferably 0.001g/L to 10g/L.When amount does not reach 0.001g/L, cannot obtain cracked inhibition, while surpassing 10g/L, the plating liquid unsettled tendency that becomes.
Non-cyanogen of the present invention is that the Pd misfit agent in gold-palldium alloy plating liquid is preferably any of amine compound, ammonium salt.As amine compound, can use quadrol etc.As ammonium salt, can use ammonium sulfate, ammonium chloride, ammonium nitrate, ammonium citrate, monoammonium sulfate etc.
Non-cyanogen of the present invention is in gold-palldium alloy plating liquid, as golden salt can use chlorination auric acid, sulfurous acid gold, wallantoin is golden, thio urea is golden, auric hydroxide etc., as palladium salt, can use ammonum chloropalladate, palladium amine vitriol, dinitrobenzene diamines palladium, Palladous chloride, palladous sulfate, urea palladium salt, quadrol palladium etc.In addition, in liquid, the preferred gold concentration of concentration is 0.1g/L to 50g/L, and the liquid that palladium concentration is 0.1g/L to 50g/L forms.When gold concentration does not reach 0.1g/L, it is bad that outward appearance becomes, and while surpassing 50g/L, it is unstable that plating liquid becomes.In addition, when palladium concentration does not reach 0.1g/L, it is bad that outward appearance becomes, and while surpassing 50g/L, it is unstable that electroplate liquid becomes.
Use the solution and coating method of plating liquid of the present invention preferably 25 to 80 ℃ of liquid temperatures, current density 0.1 is to 100A/dm 2condition is carried out plating.This is because the speed of separating out of liquid temperature plating while reaching 25 ℃ reduces, the plating liquid unsettled tendency that becomes while surpassing 80 ℃.In addition, with regard to current density, though the impact of the agitation condition while being significantly subject to plating, yet at 0.1A/dm 2with next, cannot separate out good gold-palldium alloy, 100A/dm 2below there is easy generation outward appearance to burn the tendency cracked with epithelium.Gold-palldium alloy plating liquid of the present invention can contain conducting salt and buffer reagent etc.For example, can use the inorganic salt such as vitriol, phosphoric acid salt, nitrate, muriate, and the organic carboxyl acid such as lactic acid, citric acid, oxysuccinic acid with and salt, the organic phosphoric acids such as HEDP with and the more than a kind of salt.
The present invention also provides a kind of electronic component, and having by above-mentioned non-cyanogen is the plating epithelium of the formed gold-palldium alloy of gold-palldium alloy solution and coating method.
[effect of invention]
According to the present invention, even if be the plating liquid of non-cyanogen system, also can form outward appearance good, can suppress the plating epithelium of the gold-palldium alloy of the defect such as cracked.
Embodiment
Below, with regard to embodiments of the present invention, with reference to embodiment, explain orally in detail.
Table 1 means that the plating of studying in present embodiment forms.
Table 1 is to use chlorination auric acid as solubility gold salt, uses four hydrazine dichloride palladiums as soluble palladium salt.Use ammonium sulfate, ammonium chloride, tertiary sodium phosphate, SODIUM PHOSPHATE, MONOBASIC, Tripotassium phosphate, potassium primary phosphate, ammonium phosphate, dipotassium hydrogen phosphate, Sodium Nitrite, sodium-chlor as conducting salt, buffer reagent, misfit agent and outward appearance adjusting agent, use 5,5-dimethyl wallantoin, as wallantoin compound, is used potassium tellurite, potassium selenite as tellurium, selenium.
[table 1]
Figure BDA00003478487700041
The evaluation of each plating liquid shown in relevant table 1 is to carry out in the following manner.
With regard to plating condition, liquid pH is with potassium hydroxide and sodium hydroxide, sulfuric acid adjustment, makes pH7.0, and the temperature of plating liquid makes 60 ℃.Current density makes 0.1 to 10A/dm 2.Test film is that the Cu test sample plate processed of bottoming plating (strike plating) is carried out in use through Ni and Au, and forming thickness is the plating epithelium of 0.5 μ m to 1.0 μ m.
The assessment item of each plating liquid is separated out ratio for investigating the Pd that separates out outward appearance, plating epithelium of plating epithelium.With regard to separating out outward appearance, be to confirm the plating epithelium after plating by visual and metaloscope, carry out ocular estimate.In addition, to separate out ratio be to use fluorescent X-ray film thickness gauge (SFT-9550) to measure to the Pd of plating epithelium.The evaluation result of each electroplate liquid is in Table 2.
[table 2]
Figure BDA00003478487700051
Figure BDA00003478487700052
Secondly, the result of study of the high speed plating of relevant high current density is described.High speed plating Processing Test is that current density changes to 10 to 60A/dm by the plating liquid of the embodiment 7 of use table 1 2, form the thick plating epithelium of 0.5 μ m and carry out.Condition is that plating liquid measure is 2L, and liquid temperature is 45 ℃, and flow is about 15L/min, and the Cu test sample plate processed of bottoming plating is carried out in use through Ni and Au.In addition, as the assessment item of high speed plating, be the outward appearance of separating out of investigation plating epithelium, the plated thickness of plating epithelium, Pd separates out ratio.It the results are shown in Table 3.60A/dm 2time obtained burning sensation slightly, but the epithelium of no problem in practical.
[table 3]
Electric current (A/dm 2) Thickness (μ m) Pd separates out ratio (%) Outward appearance
10 0.62 30
20 0.68 30
30 0.70 31
40 0.82 33
50 0.72 37
60 0.61 34
Figure BDA00003478487700053
[utilizability in industry]
According to the present invention, even if be gold-palldium alloy plating liquid of non-cyanogen system, also can form outward appearance good, and the plating epithelium of gold-palldium alloy of being suppressed of the defect such as cracked.In addition,, by changing the concentration in plating liquid, the plating that can corresponding carry out with low current density is to the high speed plating of high current density.

Claims (6)

1. non-cyanogen is gold-palldium alloy plating liquid, it is characterized in that, and in the non-cyanogen that contains golden salt, palladium salt, outward appearance adjusting agent, be in gold-palldium alloy plating liquid, contain the phosphoric acid salt as outward appearance adjusting agent, with wallantoin based compound.
2. non-cyanogen according to claim 1 is gold-palldium alloy plating liquid, it is characterized in that, also contains the more than a kind of tellurium and/or selenium.
3. non-cyanogen according to claim 1 and 2 is gold-palldium alloy plating liquid, it is characterized in that, also contains palladium misfit agent, and described palladium misfit agent is any of amine compound, ammonium salt.
4. non-cyanogen according to claim 1 and 2 is gold-palldium alloy plating liquid, it is characterized in that, as the phosphoric acid salt of outward appearance adjusting agent, with phosphoric acid, is scaled 0.1g/L to 150g/L, and tellurium and/or selenium are 0.001g/L to 10g/L.
5. non-cyanogen is gold-palldium alloy solution and coating method, it is characterized in that, using the non-cyanogen as described in any one in claim 1 to 4 is gold-palldium alloy plating liquid, and in 25 ℃ to 80 ℃ of liquid temperatures, current density 0.1 is to 100A/dm 2condition carry out plating.
6. an electronic component, is characterized in that, having by the non-cyanogen described in claim 5 is the plating epithelium of the formed gold-palldium alloy of gold-palldium alloy solution and coating method.
CN201310284709.4A 2012-08-31 2013-07-08 Non-cyanogen system gold-palldium alloy plating liquid and coating method Active CN103668360B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012191178A JP5758361B2 (en) 2012-08-31 2012-08-31 Non-cyanide gold-palladium alloy plating solution and plating method
JP2012-191178 2012-08-31

Publications (2)

Publication Number Publication Date
CN103668360A true CN103668360A (en) 2014-03-26
CN103668360B CN103668360B (en) 2016-08-10

Family

ID=50307114

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310284709.4A Active CN103668360B (en) 2012-08-31 2013-07-08 Non-cyanogen system gold-palldium alloy plating liquid and coating method

Country Status (4)

Country Link
JP (1) JP5758361B2 (en)
KR (1) KR101546009B1 (en)
CN (1) CN103668360B (en)
TW (1) TWI558858B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106283141A (en) * 2016-08-11 2017-01-04 江捷新 Bullion rose golden surface processes plating solution, preparation method and electro-plating method thereof
CN108950617A (en) * 2018-07-11 2018-12-07 广州传福化学技术有限公司 A kind of Zinc-nickel alloy electroplating liquid and its electroplating technology containing tellurium
CN109477233A (en) * 2016-06-06 2019-03-15 联邦科学和工业研究组织 The method of Pd-Au alloy-layer is formed on substrate

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4637865A (en) * 1985-08-16 1987-01-20 Great Lakes Chemical Corporation Process for metal recovery and compositions useful therein
TW379259B (en) * 1994-02-26 2000-01-11 Hanyang Chemical Ind Co Palladium alloy plating compositions
US20030111353A1 (en) * 2001-12-19 2003-06-19 Gold Complex Gold complex
JP2005256072A (en) * 2004-03-11 2005-09-22 Tanaka Kikinzoku Kogyo Kk Gold complex
US20080073218A1 (en) * 2006-09-26 2008-03-27 Tomoko Ishikawa Plating solution of palladium alloy and method for plating using the same
JP2009102672A (en) * 2007-10-20 2009-05-14 Nikko Kinzoku Kk Method for recovering metal from aqueous metal complex solution

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5426247A (en) * 1977-07-30 1979-02-27 Citizen Watch Co Ltd Golddpalladium alloy plating solution
JPS5747891A (en) * 1980-09-03 1982-03-18 Nippon Dento Kogyo Kk Gold-palladium alloy plating bath
EP0225422A1 (en) * 1985-12-12 1987-06-16 LeaRonal, Inc. Alkaline baths and methods for electrodeposition of palladium and palladium alloys
JP5175156B2 (en) * 2008-09-30 2013-04-03 松田産業株式会社 Palladium alloy plating solution and plating method
JP2011122192A (en) * 2009-12-09 2011-06-23 Ne Chemcat Corp Electrolytic hard gold plating liquid and plating method using the same
CN102051647A (en) * 2010-12-29 2011-05-11 东莞市泰赛特汽车用品科技有限公司 Cyanide-free nickel-free water plating process for titanium and titanium alloy

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4637865A (en) * 1985-08-16 1987-01-20 Great Lakes Chemical Corporation Process for metal recovery and compositions useful therein
US4637865B1 (en) * 1985-08-16 1990-07-24 Great Lakes Chemical Corp
TW379259B (en) * 1994-02-26 2000-01-11 Hanyang Chemical Ind Co Palladium alloy plating compositions
US20030111353A1 (en) * 2001-12-19 2003-06-19 Gold Complex Gold complex
JP2005256072A (en) * 2004-03-11 2005-09-22 Tanaka Kikinzoku Kogyo Kk Gold complex
US20080073218A1 (en) * 2006-09-26 2008-03-27 Tomoko Ishikawa Plating solution of palladium alloy and method for plating using the same
JP2009102672A (en) * 2007-10-20 2009-05-14 Nikko Kinzoku Kk Method for recovering metal from aqueous metal complex solution

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109477233A (en) * 2016-06-06 2019-03-15 联邦科学和工业研究组织 The method of Pd-Au alloy-layer is formed on substrate
CN109477233B (en) * 2016-06-06 2022-07-08 联邦科学和工业研究组织 Method for forming Pd-Au alloy layer on substrate
CN106283141A (en) * 2016-08-11 2017-01-04 江捷新 Bullion rose golden surface processes plating solution, preparation method and electro-plating method thereof
CN108950617A (en) * 2018-07-11 2018-12-07 广州传福化学技术有限公司 A kind of Zinc-nickel alloy electroplating liquid and its electroplating technology containing tellurium
CN108950617B (en) * 2018-07-11 2020-11-24 广州传福化学技术有限公司 Tellurium-containing zinc-nickel alloy electroplating solution and electroplating process thereof

Also Published As

Publication number Publication date
JP2014047394A (en) 2014-03-17
TW201408824A (en) 2014-03-01
JP5758361B2 (en) 2015-08-05
CN103668360B (en) 2016-08-10
TWI558858B (en) 2016-11-21
KR101546009B1 (en) 2015-08-20
KR20140029148A (en) 2014-03-10

Similar Documents

Publication Publication Date Title
US9175399B2 (en) Plating bath for electroless deposition of nickel layers
TWI525224B (en) Non-cyanide electrolytic gold plating solution
JP2645701B2 (en) Palladium alloy plating composition and plating method
CN103668360A (en) Non-cyanide gold-palladium alloy plating liquid and plating method
CN103305880A (en) Citrate-tartrate dual-complexing non-cyanide alkaline copper-plating electrolyte on steel substrate
CN104109848A (en) Environmentally-friendly chemical gilding liquid
KR20130124317A (en) Solutions and methods for metal deposition
US6991675B2 (en) Electroless displacement gold plating solution and additive for use in preparing plating solution
KR20170013814A (en) Non-cyanide electroless gold plating bath and electroless gold plating method
EP1272691B1 (en) Electrolytic solution for electrochemical deposit of palladium or its alloys
KR100668169B1 (en) Copper Plating Solid Wire For Good Arc Stability
CN111254424A (en) Chemical plating bath
JP4711435B2 (en) Electroless gold plating solution
TWI415971B (en) Electroless gold plating solution and electroless gold plating method
WO2006051637A1 (en) Electroless gold plating solution
JP2004190093A (en) Displacement electroless gold plating bath
WO2011118537A1 (en) Cyanide based electrolytic gold plating solution and plating method using same
JP5687667B2 (en) Cyanide gold-palladium alloy plating solution and plating method
EP3445582A1 (en) Phosphorous-cobalt-nickel alloy and use thereof in plating processes of non-precious metal objects with precious metals
JP2003268586A (en) Gold plating electrolytic solution and gold plating method
JPH0734258A (en) Substitution type gold electroless plating liquid
JP2004076026A (en) Electrolytic hard gold-plating liquid and plating method using it
TW201925531A (en) Electroless palladium plating solution, and electroless palladium plated coating
CN114318340B (en) Etching solution composition and preparation method thereof
JP2009001886A (en) Palladium-cobalt alloy plating solution, method for forming palladium-cobalt alloy coating film and method for producing palladium-cobalt alloy hard coating film

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CP01 Change in the name or title of a patent holder

Address after: Tokyo, Japan

Patentee after: EEJA Corp.

Address before: Tokyo, Japan

Patentee before: ELECTROPLATING ENGINEERS OF JAPAN Ltd.

CP01 Change in the name or title of a patent holder