CN102051647A - Cyanide-free nickel-free water plating process for titanium and titanium alloy - Google Patents
Cyanide-free nickel-free water plating process for titanium and titanium alloy Download PDFInfo
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- CN102051647A CN102051647A CN 201010612145 CN201010612145A CN102051647A CN 102051647 A CN102051647 A CN 102051647A CN 201010612145 CN201010612145 CN 201010612145 CN 201010612145 A CN201010612145 A CN 201010612145A CN 102051647 A CN102051647 A CN 102051647A
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Abstract
The invention discloses a cyanide-free nickel-free water plating process for titanium and titanium alloy, which comprises the following steps of: (A) primary plating: (1) workpiece de-waxing, (2) workpiece de-oiling, (3) acid salt activation, (4) electrolysis activation, (5) sulfite rhotanium plating, and (6) thermal treatment; and (B) secondary plating: (1) phosphoric acid electrolysis for removing an oxide film, (2) workpiece de-oiling, (3) impregnation acid activation, (4) gold pre-plating, and (5) sulfite cold palladium copper alloy plating. A titanium or titanium alloy plating layer plated by adopting the plating process does not contain nickel or cyanide, and can be well applied in the industries of jewelry, glasses and automobile fittings.
Description
[technical field]
The present invention relates to electroplating technology, relate in particular to the electroplating technology of titanium or titanium alloy.
[background technology]
Titanium or titanium alloy has in light weight and advantage that intensity is high, but it is scratched easily, and lacks the high temperature corrosion-resisting ability, therefore usually at other metal of electroplating surface one deck of titanium and titanium alloy metallic substance to overcome above-mentioned defective.Because titanium or titanium alloy is a kind of very active metal; be easy at metallic surface generation oxide film; therefore must adopt special pre-treatment and plating postheat treatment could electroplate the good coating of one deck sticking power on its metallic surface, these special pre-treatment and plating postheat treatment will use nickel metal and prussiate usually.
Titanium and titanium alloy extensively are used on the jewel case glasses owing to have the characteristics of light weight, but titanium after electroplating and titanium alloy surface are owing to contain nickel or cyanogen, allergic phenomena occurs after making some human consumers wear titanium or titanium alloy glasses or jewellery, reduced human consumer's the desire of choosing.
[summary of the invention]
The present invention is directed to the above-mentioned defective of prior art, a kind of titanium or titanium alloy water power depositing process that need not to use nickel and prussiate is provided.
In order to solve the problems of the technologies described above, the present invention is achieved by the following technical solutions:
The cyanide-free and nickel-free water power depositing process of titanium or titanium alloy comprises the steps:
(1) first pass is electroplated
(1) workpiece removes cured
Remove cured dose: 3-5%, temperature: 50-70 ℃, time: 5-10min;
(2) workpiece oil removing:
Hot dipping degreaser: 30-50 grams per liter, temperature: 50-60 ℃, time: 5-10min;
(3) acid salt activating
Sodium pyrosulfate: 10 grams per liters, hydrogen fluoride ammonia: 30 grams per liters, PH:2-3
Temperature: normal temperature, time: 1-5 second;
(4) electrolytic activation
Sulfonate: 50 grams per liters, fluorochemical: 30 grams per liters, PH:6.6-7.0, temperature: normal temperature
Current density: 1-2 ASD, treatment time: 1-2 min;
(5) the sulphite palau is electroplated
Sulfurous acid gold potassium: 3-5 grams per liter, nitroso-group two ammonium palladiums: 1-2 grams per liter, conducting salt: 50 grams per liters
Complexing agent: the 50-70 milliliter/liter, brightening agent: 2 milliliters/liter, PH:10-10.5, temperature: 45-50 ℃
Current density: 0.1-0.3ASD, electroplating time: 0.5-1min;
(6) thermal treatment:
Temperature: 350-380 ℃, time: 10-30 min;
Electroplate for (two) second times
(1) phosphoric acid electrolysis deoxidation film
Phosphoric acid: temperature 100%: normal temperature
Current density: 1-2ASD, time: 15-60 second;
(2) workpiece oil removing:
Hot dipping degreaser: 30-50 grams per liter, temperature: 50-60 ℃, time: 2-5min;
(3) dipping acid activation:
Sulfuric acid: hydrochloric acid 5%: temperature 2%: normal temperature, time: 10-30 second;
(4) gold-plated in advance
Chloric acid gold: 0.8-1 grams per liter, cobalt chloride: 5-50PPM, lemon potassium: 90 grams per liters
Hydrochloric acid: 50 milliliters/liter, PH:<0.5, temperature: 50-60 ℃, current density: 0.5-1ASD
Electroplating time: 15-30 second;
(5) sulphite gold palladium-copper alloy is electroplated
Sulfurous acid gold potassium: 3-5 grams per liter, nitroso-group two ammonium palladiums: 1-2 grams per liter, copper carbonate: 5-50PPM
Conducting salt: 50 grams per liters, complexing agent: the 50-80 milliliter/liter, brightening agent: 2 milliliters/liter
PH:10-10.5, temperature: 45-50 ℃, current density: 0.3ASD, electroplating time: 0.5-1min.
Advantage of the present invention: the present invention does not adopt nickel and prussiate and can electroplate the good coating of one deck sticking power at titanium or titanium alloy surface in electroplating technology, thereby makes titanium and titanium alloy be applied to bullion and spectacles industry better.
[embodiment]
The present invention is further detailed explanation below in conjunction with embodiment.
Embodiment one: the cyanide-free and nickel-free water power depositing process of titanium or titanium alloy comprises the steps:
(1) first pass is electroplated
(1) workpiece removes cured
To remove cured dose, temperature be that 50 ℃ remove removed cured 10min in the cured liquid containing 3%;
(2) workpiece oil removing:
Containing 30 grams per liter degreasers, temperature is oil removing 5min in 50 ℃ the degreasing fluid;
(3) carry out acid salt activating in following condition
Sodium pyrosulfate: 10 grams per liters, hydrogen fluoride ammonia: 30 grams per liters, PH:2
Temperature: normal temperature, time: 1 second;
(4) carry out electrolytic activation in following condition
Sulfonate: 50 grams per liters, fluorochemical: 30 grams per liters, PH:6.6, temperature: 22 ℃
Current density: 1 ASD, treatment time: 1-min;
(5) carrying out the sulphite palau in following condition electroplates
Sulfurous acid gold potassium: 3-5 grams per liter, nitroso-group two ammonium palladiums: 1-2 grams per liter, conducting salt: 50 grams per liters, complexing agent, brightening agent: 2 milliliters/liter, PH:10-10.5, temperature: 45-50 ℃, electroplate density: 0.1ASD, electroplating time: 0.5min; Above-mentioned complexing agent can adopt 50 milliliters/liter G-011 and the mixture of 30 grams per liter APS-108, and above-mentioned brightening agent can adopt APS-109, and above-mentioned conducting salt can adopt potassium sulfite;
(6) heat-treat in following condition:
Temperature: 350 ℃, time: 10 min;
Electroplate for (two) second times
(1) carries out phosphoric acid electrolysis deoxidation film in following condition
Phosphoric acid: temperature 100%: normal temperature
Current density: 1ASD, time: 15 seconds;
(2) carry out the workpiece oil removing in following condition:
Hot dipping degreaser: 30 grams per liters, temperature: 50 ℃, time: 2min;
(3) carry out the dipping acid activation in following condition:
Sulfuric acid: hydrochloric acid 5%: temperature 2%: normal temperature, time: 10 seconds;
(4) carry out in following condition gold-plated in advance
Chloric acid gold: 0.8-grams per liter, cobalt chloride: 5PPM, Tripotassium Citrate: 90 grams per liters
Hydrochloric acid: 50 milliliters/liter, PH:<0.5, temperature: 50 ℃, current density: 0.5ASD
Electroplating time: 15 seconds;
(5) carrying out sulphite gold palladium-copper alloy in following condition electroplates
Sulfurous acid gold potassium: 3 grams per liters, nitroso-group two ammonium palladiums: 1 grams per liter, copper carbonate: 5PPM
Conducting salt: 50 grams per liters, complexing agent: 50 milliliters/liter, brightening agent: 2 milliliters/liter
PH:10, temperature: 45 ℃, plating density: 0.3ASD, electroplating time: 0.5min; Above-mentioned conducting salt can adopt potassium sulfite, and above-mentioned complexing agent can adopt 50 milliliters/liter G-011 and the mixture of 30 grams per liter APS-108, and above-mentioned brightening agent can adopt APS-109.
Embodiment two: the cyanide-free and nickel-free water power depositing process of titanium or titanium alloy comprises the steps:
(1) first pass is electroplated
(1) workpiece removes cured
Remove cured dose: temperature 5%: 60 ℃, time: 6min;
(2) workpiece oil removing:
Hot dipping degreaser: 50 grams per liters, temperature: 60 ℃, time: 10min;
(3) acid salt activating
Sodium pyrosulfate: 10 grams per liters, hydrogen fluoride ammonia: 30 grams per liters, PH:3
Temperature: normal temperature, time: 5 seconds;
(4) electrolytic activation
Sulfonate: 50 grams per liters, fluorochemical: 30 grams per liters, PH:7.0, temperature: 25 degrees centigrade
Current density: 2 ASD, treatment time: 2 min;
(5) the sulphite palau is electroplated
Sulfurous acid gold potassium: 5 grams per liters, nitroso-group two ammonium palladiums: 2 grams per liters, conducting salt: 50 grams per liters
Complexing agent: 70 milliliters/liter, brightening agent: 2 milliliters/liter, PH:10.5, temperature: 50 ℃
Electroplate density: 0.3ASD, electroplating time: 1min; Above-mentioned complexing agent can adopt 40 milliliters/liter G-011 and the mixture of 40 grams per liter APS-108, and above-mentioned brightening agent can adopt APS-109, and above-mentioned conducting salt can adopt potassium sulfite;
(6) thermal treatment:
Temperature: 380 ℃, time: 30 min;
Electroplate for (two) second times
(1) phosphoric acid electrolysis deoxidation film
Phosphoric acid: temperature 100%: normal temperature
Current density: 2ASD, time: 60 seconds;
(2) workpiece oil removing:
Hot dipping degreaser: 50 grams per liters, temperature: 60 ℃, time: 5min;
(3) dipping acid activation:
Sulfuric acid: hydrochloric acid 5%: temperature 2%: normal temperature, time: 30 seconds;
(4) gold-plated in advance
Chloric acid gold: 1 grams per liter, cobalt chloride: 50PPM, lemon potassium: 90 grams per liters
Hydrochloric acid: 50 milliliters/liter, PH:<0.5, temperature: 60 ℃, current density: 1ASD
Electroplating time: 30 seconds;
(5) sulphite gold palladium-copper alloy is electroplated
Sulfurous acid gold potassium: 5 grams per liters, nitroso-group two ammonium palladiums: 2 grams per liters, copper carbonate: 50PPM
Conducting salt: 50 grams per liters, complexing agent: 80 milliliters/liter, brightening agent: 2 milliliters/liter
PH:10.5, temperature: 50 ℃, plating density: 0.3ASD, electroplating time: 1min, above-mentioned conducting salt can adopt potassium sulfite, above-mentioned complexing agent can adopt 40 milliliters/liter G-011 and the mixture of 40 grams per liter APS-108, and above-mentioned brightening agent can adopt APS-109.
Embodiment three: the cyanide-free and nickel-free water power depositing process of titanium or titanium alloy comprises the steps:
(1) first pass is electroplated
(1) workpiece removes cured
Remove cured dose: temperature 4%: 60 ℃, time: 8min;
(2) workpiece oil removing:
Hot dipping degreaser: 40 grams per liters, temperature: 55 ℃, time: 7min;
(3) acid salt activating
Sodium pyrosulfate: 10 grams per liters, hydrogen fluoride ammonia: 30 grams per liters, PH:2.5
Temperature: 27 ℃, time: 3 seconds;
(4) electrolytic activation
Sulfonate: 50 grams per liters, fluorochemical: 30 grams per liters, PH:6.8, temperature: 28 ℃
Current density: 1.5 ASD, treatment time: 1.5 min;
(5) the sulphite palau is electroplated
Sulfurous acid gold potassium: 4 grams per liters, nitroso-group two ammonium palladiums: 1.5 grams per liters, conducting salt: 50 grams per liters
Complexing agent: 60 milliliters/liter, brightening agent: 2 milliliters/liter, PH:10.2, temperature: 48 ℃
Electroplate density: 0.2ASD, electroplating time: 0.8min; Above-mentioned complexing agent can adopt 30 milliliters/liter G-011 and the mixture of 50 grams per liter APS-108, and above-mentioned brightening agent can adopt APS-109, and above-mentioned conducting salt can adopt potassium sulfite;
(6) thermal treatment:
Temperature: 365 ℃, time: 20 min;
Electroplate for (two) second times
(1) phosphoric acid electrolysis deoxidation film
Phosphoric acid: temperature 100%: normal temperature
Current density: 1.5ASD, time: 38 seconds;
(2) workpiece oil removing:
Hot dipping degreaser: 40 grams per liters, temperature: 55 ℃, time: 3.5min;
(3) dipping acid activation:
Sulfuric acid: hydrochloric acid 5%: temperature 2%: 18 ℃, time: 20 seconds;
(4) gold-plated in advance
Chloric acid gold: 0.9 grams per liter, cobalt chloride: 27.5PPM, lemon potassium: 90 grams per liters
Hydrochloric acid: 50 milliliters/liter, PH:0.4, temperature: 55 ℃, current density: 0.75ASD
Electroplating time: 22.5 seconds;
(5) sulphite gold palladium-copper alloy is electroplated
Sulfurous acid gold potassium: 4 grams per liters, nitroso-group two ammonium palladiums: 1.5 grams per liters, copper carbonate: 35PPM
Conducting salt: 50 grams per liters, complexing agent: 65 milliliters/liter, brightening agent: 2 milliliters/liter
PH:10.2, temperature: 48 ℃, plating density: 0.3ASD, electroplating time: 0.7min, above-mentioned conducting salt can adopt potassium sulfite, above-mentioned complexing agent can adopt 30 milliliters/liter G-011 and the mixture of 50 grams per liter APS-108, and above-mentioned brightening agent can adopt APS-109.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (1)
1. the cyanide-free and nickel-free water power depositing process of titanium or titanium alloy is characterized in that, comprises the steps:
(1) first pass is electroplated
(1) workpiece removes cured
Remove cured dose: 3-5%
Temperature: 50-70 ℃
Time: 5-10min;
(2) workpiece oil removing:
Hot dipping degreaser: 30-50 grams per liter
Temperature: 50-60 ℃
Time: 5-10min;
(3) acid salt activating
Sodium pyrosulfate: 10 grams per liters
Hydrogen fluoride ammonia: 30 grams per liters
PH:2-3
Temperature: normal temperature
Time: 1-5 second;
(4) electrolytic activation
Sulfonate: 50 grams per liters
Fluorochemical: 30 grams per liters
PH:6.6-7.0
Temperature: normal temperature
Current density: 1-2 ASD
Treatment time: 1-2 min;
(5) the sulphite palau is electroplated
Sulfurous acid gold potassium: 3-5 grams per liter
Nitroso-group two ammonium palladiums: 1-2 grams per liter
Conducting salt: 50 grams per liters
Complexing agent: the 50-70 milliliter/liter
Brightening agent: 2 milliliters/liter
PH:10-10.5
Temperature: 45-50 ℃
Current density: 0.1-0.3ASD
Electroplating time: 0.5-1min;
(6) thermal treatment:
Temperature: 350-380 ℃
Time: 10-30 min;
Electroplate for (two) second times
(1) phosphoric acid electrolysis deoxidation film
Phosphoric acid: 100%
Temperature: normal temperature
Current density: 1-2ASD
Time: 15-60 second;
(2) workpiece oil removing:
Hot dipping degreaser: 30-50 grams per liter
Temperature: 50-60 ℃
Time: 2-5min;
(3) dipping acid activation:
Sulfuric acid: 5%
Hydrochloric acid: 2%
Temperature: normal temperature
Time: 10-30 second;
(4) gold-plated in advance
Chloric acid gold: 0.8-1 grams per liter
Cobalt chloride: 5-50PPM
Lemon potassium: 90 grams per liters
Hydrochloric acid: 50 milliliters/liter
PH:<0.5
Temperature: 50-60 ℃
Current density: 0.5-1ASD
Electroplating time: 15-30 second;
(5) sulphite gold palladium-copper alloy is electroplated
Sulfurous acid gold potassium: 3-5 grams per liter
Nitroso-group two ammonium palladiums: 1-2 grams per liter
Copper carbonate: 5-50PPM
Conducting salt: 50 grams per liters
Complexing agent: the 50-80 milliliter/liter
Brightening agent: 2 milliliters/liter
PH:10-10.5
Temperature: 45-50 ℃
Current density: 0.3ASD
Electroplating time: 0.5-1min.
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102703944A (en) * | 2012-06-05 | 2012-10-03 | 安徽华东光电技术研究所 | Method for chemically plating thick chromium on vacuum device |
CN104005059A (en) * | 2014-06-11 | 2014-08-27 | 沈阳飞机工业(集团)有限公司 | Method for electroplating chromium on TC1 titanium alloy and TC2 titanium alloy |
CN105543913A (en) * | 2016-02-25 | 2016-05-04 | 盈昌集团有限公司 | Palladium-cobalt alloy electroplating liquid and technology of electroplating spectacle frame with same |
TWI558858B (en) * | 2012-08-31 | 2016-11-21 | Electroplating Eng | Non-cyanide gold-palladium alloy plating solution and plating method |
US20210156043A1 (en) * | 2019-11-25 | 2021-05-27 | The Boeing Company | Method for plating a metallic material onto a titanium substrate |
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CN1478926A (en) * | 2002-08-30 | 2004-03-03 | 宝山钢铁股份有限公司 | Titanium base material platinum coating method |
CN101421875A (en) * | 2006-04-14 | 2009-04-29 | 丰田自动车株式会社 | Noble-metal plating of member made of titanium |
JP2009114522A (en) * | 2007-11-08 | 2009-05-28 | Toyota Motor Corp | Method for producing gold-plated structure |
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2010
- 2010-12-29 CN CN 201010612145 patent/CN102051647A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1478926A (en) * | 2002-08-30 | 2004-03-03 | 宝山钢铁股份有限公司 | Titanium base material platinum coating method |
CN101421875A (en) * | 2006-04-14 | 2009-04-29 | 丰田自动车株式会社 | Noble-metal plating of member made of titanium |
JP2009114522A (en) * | 2007-11-08 | 2009-05-28 | Toyota Motor Corp | Method for producing gold-plated structure |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102703944A (en) * | 2012-06-05 | 2012-10-03 | 安徽华东光电技术研究所 | Method for chemically plating thick chromium on vacuum device |
CN102703944B (en) * | 2012-06-05 | 2014-12-24 | 安徽华东光电技术研究所 | Method for chemically plating thick chromium on vacuum device |
TWI558858B (en) * | 2012-08-31 | 2016-11-21 | Electroplating Eng | Non-cyanide gold-palladium alloy plating solution and plating method |
CN104005059A (en) * | 2014-06-11 | 2014-08-27 | 沈阳飞机工业(集团)有限公司 | Method for electroplating chromium on TC1 titanium alloy and TC2 titanium alloy |
CN105543913A (en) * | 2016-02-25 | 2016-05-04 | 盈昌集团有限公司 | Palladium-cobalt alloy electroplating liquid and technology of electroplating spectacle frame with same |
US20210156043A1 (en) * | 2019-11-25 | 2021-05-27 | The Boeing Company | Method for plating a metallic material onto a titanium substrate |
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Application publication date: 20110511 |