CN103616757B - A kind of aspheric surface ultraviolet photolithographic object lens - Google Patents
A kind of aspheric surface ultraviolet photolithographic object lens Download PDFInfo
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- CN103616757B CN103616757B CN201310566185.8A CN201310566185A CN103616757B CN 103616757 B CN103616757 B CN 103616757B CN 201310566185 A CN201310566185 A CN 201310566185A CN 103616757 B CN103616757 B CN 103616757B
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Abstract
The present invention proposes a kind of aspheric surface ultraviolet photolithographic object lens, for being imaged onto by the image of object plane in picture plane.These aspheric surface ultraviolet photolithographic object lens, transmission group 1, transmission group 2, transmission group 3, transmission group 4, transmission group 5 and transmission group 6 is comprised along its optical axis direction, from light beam incident direction transmission group 1 of arranging successively, there is negative power, transmission group 2 has positive light coke, transmission group 3 has negative power, transmission group 4 has positive light coke, transmission group 5 has positive light coke, transmission group 6 has positive light coke, aspheric surface ultraviolet photolithographic object lens of the present invention have good imaging quality, compact conformation, the advantages such as higher photoetching efficiency.
Description
Technical field
The present invention relates to a kind of for the aspheric surface ultraviolet photolithographic object lens in lithography process, semiconductor element producing device, belong to projection optics technical field.
Background technology
Optical projection lithography is the principle utilizing optical projection imaging, by IC figure on mask with Step-and-repeat or step-scan exposure mode by high resolution Graphic transitions to the optical exposure process on gluing silicon chip.Optical projection lithography technology grows up in contact and proximity lithography technical foundation.Adopt projection lithography, mask serviceable life can be extended, if adopt the projection objective of reduction magnification, be also convenient to mask manufacture.Optical projection lithography experienced by the evolution of Step-and-repeat photoetching (stepper) and step-scan photoetching (scanner).Along with the continuous progress of science and technology, classes of semiconductors chip is widely used in the civil areas such as Aero-Space military field and computing machine, along with improving constantly of requiring equipment performance, more and more higher to the resolution requirement of semi-conductor chip.The manufacture of litho machine is almost in monopoly position in the world at present, and 3 maximum manufacturers are lotus ASML, Nikon and Canon.Photoetching technique is one of important support type technology of China's chip industry development, and projection lithography device is the key equipment of large scale integrated circuit manufacturing process.High precision projection optical system is the core component of high most advanced and sophisticated litho machine, and its performance directly decides the precision of litho machine.The projection optical system practical research of the domestic wavelength 193nm that just started working at present, design value aperture was also all not bery high in the past, and best result distinguishes that power is 0.35-0.5 micron.Because resolution is low, the figure of high-accuracy high-resolution can not be produced, can not meet the demand of large scale integrated circuit manufacture and research.
The formula that can be obtained litho machine resolving power by Rayleigh Diffraction Theorem is as follows:
R＝k
1λ/NA
In above formula, R is the resolving power of litho machine, k
1for the technological coefficient factor, λ is operation wavelength, and NA is the numerical aperture of light projection photoetching objective lens.
From above formula, in order to obtain higher resolution, can by shortening the wavelength of light source, or the numerical aperture increasing light projection photoetching objective lens realizes, but when optical source wavelength shortens, due to optical glass, to the absorption of light, the material category for light projection photoetching objective lens can be very limited.The present invention proposes the aspheric surface ultraviolet photolithographic object lens that a kind of numerical aperture is 0.93, have certain reference value for the projection exposure optical system in high-end litho machine.
Summary of the invention
The present invention solves the little deficiency of existing lithographic objective numerical aperture, and proposing a kind of operation wavelength is 248nm, and numerical aperture is the aspheric surface ultraviolet photolithographic object lens of 0.93, it is large that this camera lens has numerical aperture, good imaging quality, compact conformation, the advantages such as higher photoetching efficiency.
The technical solution used in the present invention is: a kind of aspheric surface ultraviolet photolithographic object lens, transmission group 1, transmission group 2, transmission group 3, transmission group 4, transmission group 5 and transmission group 6 is comprised successively along its optical axis direction, all transmission groups are all in same optical axis, it is characterized in that, transmission group 1 has negative power, and transmission group 2 has positive light coke, transmission group 3 has negative power, transmission group 4 has positive light coke, and transmission group 5 has positive light coke, and transmission group 6 has positive light coke.
Transmission group 1 comprises the first dull and stereotyped protecting window 1, first positive lens 2, first negative lens 3, second positive lens 4 and the second negative lens 5.
Transmission group 2 comprises the 3rd positive lens 6, the 4th positive lens 7 and the 5th positive lens 8.
Transmission group 3 comprises the 3rd negative lens 9, the 6th positive lens 10 and the 4th negative lens 11.
Transmission group 4 comprises the 5th negative lens 12, the 7th positive lens 13, the 8th positive lens 14 and the 9th positive lens 15.
Transmission group 5 comprises the 6th negative lens 16, the tenth positive lens the 17 and the 11 positive lens 18;
Transmission group 6 comprises the 12 positive lens 19, the dull and stereotyped protecting window 23 of the 7th negative lens the 20, the 13 positive lens the 21, the 14 positive lens 22, second.
Further, the optical material that described a kind of aspheric surface ultraviolet photolithographic object lens diaphotoscope uses is all fused quartz.
Further, the aperture diaphragm of aspheric surface ultraviolet photolithographic object lens is arranged between transmission group 4 and transmission group 5.
Further, (eyeglass that clear aperture is minimum) with a tight waist of aspheric surface ultraviolet photolithographic object lens is arranged in transmission group 3.
The present invention has the following advantages:
1, the numerical aperture of aspheric surface ultraviolet photolithographic object lens of the present invention is 0.93, operation wavelength is 248 nanometers, and image space is 26mm × 10.5mm, because numerical aperture of objective is large, overcome the deficiency that existing light projection photoetching objective lens numerical aperture is little, improve photoetching resolution.
2, aspheric surface ultraviolet photolithographic object lens of the present invention are made up of transmission group 1, transmission group 2, transmission group 3, transmission group 4, transmission group 5 and transmission group 6, and six transmission groups are coaxial, reduce and debug integrated difficulty.
3, in aspheric surface ultraviolet photolithographic object lens of the present invention, transmission group 1 comprises 5 lens, transmission group 2 comprises 3 lens, transmission group 3 comprises 3 lens, transmission group 4 comprises 4 lens, transmission group 5 comprises 3 lens, transmission group 6 comprises 5 lens, and the mirror in all transmission groups is monolithic mirror, and system architecture is simply compact.
4, aspheric surface ultraviolet photolithographic object lens of the present invention have good imaging characteristic.
Aspheric surface ultraviolet photolithographic object lens proposed by the invention, can be applied to lighting source wavelength is in the deep UV projection photoetching device of 248nm.
Accompanying drawing explanation
Fig. 1 is the structural representation of a kind of aspheric surface ultraviolet photolithographic object lens of the present invention;
Label declaration: 1-protecting window, 2-first positive lens, 3-first negative lens, 4-second positive lens, 5-second negative lens, 6-the 3rd positive lens, 7-the 4th positive lens, 8 the 5th positive lenss, 9-the 3rd negative lens, 10-the 6th positive lens, 11-the 4th negative lens, 12-the 5th negative lens, 13-the 7th positive lens, 14-the 8th positive lens, 15-the 9th positive lens, 16-the 6th negative lens, 17-the tenth positive lens, 18-the 11 positive lens, 19-the 12 positive lens, 20-the 7th negative lens, 21-the 13 positive lens, 22-the 14 positive lens, the dull and stereotyped protecting window of 23-second, 24-image planes.
Embodiment
In order to better objects and advantages of the present invention are described, below in conjunction with the drawings and specific embodiments, the invention will be further described.
Fig. 1 is aspheric surface ultraviolet photolithographic object lens schematic layout pattern of the present invention, and 23 optical elements form transmission group 1, transmission group 2, transmission group 3, transmission group 4, transmission group 5, transmission group 6, arrange successively from light beam incident direction.
Transmission group 1, for having the transmission group of negative power, comprises the first dull and stereotyped protecting window 1, first positive lens 2, first negative lens 3, second positive lens 4 and the second negative lens 5.Light is projected by object plane and enter transmission group 2 after transmission group 1 is dispersed.
Transmission group 2, for having the transmission group of positive light coke, comprises the 3rd positive lens 6, the 4th positive lens 7 and the 5th positive lens 8.After light enters transmission group 2 by transmission group 1, after transmission group 2 is assembled, leave transmission group 2.
Transmission group 3, for having the transmission group of negative power, comprises the 3rd negative lens 9, the 6th positive lens 10 and the 4th negative lens 11.Light leaves transmission group 3 after entering transmission group 3 by transmission group 2 after transmission group 3 is dispersed.
Transmission group 4, for having the transmission group of positive light coke, comprises the 5th negative lens 12, the 7th positive lens 13, the 8th positive lens 14 and the 9th positive lens 15.After light enters transmission group 4 by transmission group 3, after transmission group 4 is assembled, leave transmission group 4.
Transmission group 5, for having the transmission group of positive light coke, comprises the 6th negative lens 16, the tenth positive lens the 17 and the 11 positive lens 18.After light enters transmission group 5 by transmission group 4, after transmission group 5 is assembled, leave transmission group 5.Diaphragm face is arranged between the 9th positive lens 15 and the 6th negative lens 16.
Transmission group 6, for having the transmission group of positive light coke, comprises the 12 positive lens 19, the dull and stereotyped protecting window 23 of the 7th negative lens the 20, the 13 positive lens the 21, the 14 positive lens 22, second.After light enters transmission group 6 by transmission group 5, after transmission group 6 is assembled, arrive image planes.
What in these aspheric surface ultraviolet photolithographic object lens, all diaphotoscopes used is all fused quartz material, and when centre wavelength 248nm place, the transmissivity of fused quartz glass is 1.508390.
For improving the picture element of aspheric surface ultraviolet photolithographic object lens, using the radius on each surface of object lens, thickness, interval, asphericity coefficient as variable, Applied Optics Design software Code-v constructs specific majorized function, repeatedly optimizes system, and successive optimization is existing result.
The present embodiment is realized by following technical measures: lighting source operation wavelength 248 nanometer, image space 26mm × 10.5mm, the numerical aperture (NA)=0.93 of optical system, optical system reduction magnification is 4 times, aspheric surface ultraviolet photolithographic object lens first mirror distance object plane 39.85mm, light sends by object plane the picture becoming to reduce four times after transmission group 1, transmission group 2, transmission group 3, transmission group 4, transmission group 5, transmission group 6 and arrives on image planes and silicon chip.
Aspheric surface ultraviolet photolithographic object lens of the present invention from mask face to the distance in silicon chip face be 1368mm, simple and compact for structure.By optimizing the radius-of-curvature of each lens, thickness, asphericity coefficient and the interval changed between each lens reduces the various aberrations of optical system.
Wave aberration is the optical assessment index all will used of the optical system that image quality is very high, and it intuitively can react the situation of low order aberration and higher order aberratons.Table 2 each visual field of aspheric surface ultraviolet photolithographic object lens listed designed by the present embodiment take barycenter as the root mean square wave aberration of each visual field of reference, wherein f1, f2, f3, f4, f5, f6, f7, f8, f9, f10 represent 10 visual fields, λ represents wavelength, known, the maximum wave aberration of this system is 3.85nm.
The wave aberration of table 1 aspheric surface ultraviolet photolithographic object lens
| Visual field | Root mean square wave aberration |
| f1 | 0.0073λ |
| f2 | 0.0087λ |
| f3 | 0.0106λ |
| f4 | 0.0118λ |
| f5 | 0.0096λ |
| f6 | 0.0116λ |
| f7 | 0.0118λ |
| f8 | 0.0129λ |
| f9 | 0.0141λ |
| f10 | 0.0155λ |
The present invention, by optimizing the radius-of-curvature of each mirror, thickness parameter, asphericity coefficient and lens separation, obtains the aspheric surface ultraviolet photolithographic object lens that high resolving power, picture element are excellent, has whole simple and compact for structure, the advantage such as imaging is excellent.Above-described specific descriptions; the object of inventing, technical scheme and beneficial effect are further described; be understood that; the foregoing is only specific embodiments of the invention; for explaining the present invention, the protection domain be not intended to limit the present invention, within the spirit and principles in the present invention all; any amendment of making, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (4)
1. aspheric surface ultraviolet photolithographic object lens, optical axis comprises the first transmission group, the second transmission group, the 3rd transmission group, the 4th transmission group, the 5th transmission group and the 6th transmission group from the object side to the image side successively, all transmission groups are all in same optical axis, it is characterized in that, the first transmission group has negative power, and the second transmission group has positive light coke, 3rd transmission group has negative power, 4th transmission group has positive light coke, and the 5th transmission group has positive light coke, and the 6th transmission group has positive light coke;
First transmission group comprises the first dull and stereotyped protecting window (1), the first positive lens (2), the first negative lens (3), the second positive lens (4) and the second negative lens (5);
Second transmission group comprises the 3rd positive lens (6), the 4th positive lens (7) and the 5th positive lens (8);
3rd transmission group comprises the 3rd negative lens (9), the 6th positive lens (10) and the 4th negative lens (11);
4th transmission group comprises the 5th negative lens (12), the 7th positive lens (13), the 8th positive lens (14) and the 9th positive lens (15);
5th transmission group comprises the 6th negative lens (16), the tenth positive lens (17) and the 11 positive lens (18);
6th transmission group comprises the 12 positive lens (19), the 7th negative lens (20), the 13 positive lens (21), the 14 positive lens (22), the second dull and stereotyped protecting window (23) and image planes (24).
2. a kind of aspheric surface ultraviolet photolithographic object lens according to claim 1, is characterized in that: the optical material that described aspheric surface ultraviolet photolithographic object lens diaphotoscope uses is all fused quartz.
3. a kind of aspheric surface ultraviolet photolithographic object lens according to claim 1, is characterized in that, the aperture diaphragm of aspheric surface ultraviolet photolithographic object lens is arranged between the 4th transmission group and the 5th transmission group.
4. a kind of aspheric surface ultraviolet photolithographic object lens according to claim 1, is characterized in that, the eyeglass that clear aperture is minimum with a tight waist namely of aspheric surface ultraviolet photolithographic object lens is arranged in the 3rd transmission group.
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| CN201310566185.8A CN103616757B (en) | 2013-11-14 | 2013-11-14 | A kind of aspheric surface ultraviolet photolithographic object lens |
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| CN201310566185.8A CN103616757B (en) | 2013-11-14 | 2013-11-14 | A kind of aspheric surface ultraviolet photolithographic object lens |
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| CN103616757A CN103616757A (en) | 2014-03-05 |
| CN103616757B true CN103616757B (en) | 2016-01-20 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104111518B (en) * | 2014-08-04 | 2016-09-28 | 中国科学院光电技术研究所 | A kind of projection objective lens optical system of large-numerical aperture |
| CN111381346B (en) | 2018-12-30 | 2021-05-11 | 上海微电子装备（集团）股份有限公司 | Photoetching projection objective lens |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1928610A (en) * | 2006-09-27 | 2007-03-14 | 上海微电子装备有限公司 | Projection optical system |
| CN101101450A (en) * | 2007-07-17 | 2008-01-09 | 上海微电子装备有限公司 | All-refraction immersion type projection and optical system, device and its uses |
| CN101122673A (en) * | 2006-08-11 | 2008-02-13 | 富士能株式会社 | Projection type zoom lens and projection display device |
| CN101320122A (en) * | 2008-07-08 | 2008-12-10 | 上海微电子装备有限公司 | Projection optical system |
| CN101329443A (en) * | 2007-06-22 | 2008-12-24 | 富士能株式会社 | Projection zoom lens and projection display device |
| CN201876598U (en) * | 2009-11-09 | 2011-06-22 | 富士胶片株式会社 | Zoom lens used for projection and projection-type display device |
| CN102200624A (en) * | 2010-03-23 | 2011-09-28 | 上海微电子装备有限公司 | Photo-etching projection lens |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7551361B2 (en) * | 2003-09-09 | 2009-06-23 | Carl Zeiss Smt Ag | Lithography lens system and projection exposure system provided with at least one lithography lens system of this type |
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Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101122673A (en) * | 2006-08-11 | 2008-02-13 | 富士能株式会社 | Projection type zoom lens and projection display device |
| CN1928610A (en) * | 2006-09-27 | 2007-03-14 | 上海微电子装备有限公司 | Projection optical system |
| CN101329443A (en) * | 2007-06-22 | 2008-12-24 | 富士能株式会社 | Projection zoom lens and projection display device |
| CN101101450A (en) * | 2007-07-17 | 2008-01-09 | 上海微电子装备有限公司 | All-refraction immersion type projection and optical system, device and its uses |
| CN101320122A (en) * | 2008-07-08 | 2008-12-10 | 上海微电子装备有限公司 | Projection optical system |
| CN201876598U (en) * | 2009-11-09 | 2011-06-22 | 富士胶片株式会社 | Zoom lens used for projection and projection-type display device |
| CN102200624A (en) * | 2010-03-23 | 2011-09-28 | 上海微电子装备有限公司 | Photo-etching projection lens |
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