CN103576465A - Rotary exposure carrying equipment - Google Patents
Rotary exposure carrying equipment Download PDFInfo
- Publication number
- CN103576465A CN103576465A CN201210254365.8A CN201210254365A CN103576465A CN 103576465 A CN103576465 A CN 103576465A CN 201210254365 A CN201210254365 A CN 201210254365A CN 103576465 A CN103576465 A CN 103576465A
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- China
- Prior art keywords
- base material
- rotary
- rotating mechanism
- carry equipment
- bogey
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Abstract
The invention provides rotary exposure carrying equipment, which is used for carrying a substrate to carry out exposure; the rotary exposure carrying equipment comprises a bearing device and a rotary shifting device; the bearing device is used for fixing the substrate thereon and carrying the substrate; the rotary shifting device is provided with a rotary mechanism; the rotary mechanism is connected to the bearing device and can move in a rotating state, and therefore, the exposure processing efficiency is improved.
Description
Technical field
The present invention system is about a kind of exposure carry equipment, particularly about a kind of rotary exposure carry equipment.
Background technology
The product that needs electronic loop image-forming at LCD, printed circuit board (PCB) and wireless charger etc., all need through design circuit, smear the steps such as photoresistance, aligning, exposure, development, etching, removing photoresistance and detection, so that designed electronic loop image is transferred on a base material.Exposure manufacture process conventionally uses a light source (for example, short arc mercury lamp) to irradiate base material so that base material exposure.
Yet, in known techniques, when using each surface of exposure sources exposed substrate, need sequentially be exposed in each surface of base material by overturning base material successively.Therefore step of exposure is complicated, and the processing procedure time is increased.
Summary of the invention
Fundamental purpose of the present invention is to provide a kind of rotary exposure carry equipment, to simplify step of exposure and to improve the overall process time.
The technological means that the problem that the present invention is solution known techniques adopts is a kind of rotary exposure carry equipment, be used for carrying a base material to expose, rotary exposure carry equipment comprises a bogey and a rotary type moves device, bogey is fixed thereon base material and supporting substrate, rotary type moves device and has a rotating mechanism, and rotating mechanism connects bogey and under the state rotating, is mobile.
In one embodiment of this invention, the fulcrum that rotating mechanism is axial-rotation.
In one embodiment of this invention, rotating mechanism is the longitudinal surface that is parallel to base material.
In one embodiment of this invention, the rotational axis line of rotating mechanism is by the center of base material.
Half of the length of the lateral surfaces that in one embodiment of this invention, the distance of the rotational axis line of rotating mechanism and the center of base material is base material.
In one embodiment of this invention, the distance of the rotational axis line of rotating mechanism and the center of base material is greater than half of length of the lateral surfaces of base material.
In one embodiment of this invention, also comprise and receive member, be connected between rotating mechanism and bogey.
In one embodiment of this invention, bogey is a plurality of, and receives member and each bogey is connected with rotating mechanism by a plurality of.
In one embodiment of this invention, the bearing of trend of receiving member is the lateral surfaces that is parallel to base material.
In one embodiment of this invention, receive member and take its bearing of trend as axial rotary for being set to.
Via the technology used in the present invention means, by rotary exposure carry equipment of the present invention, a plurality of surfaces of base material can all be exposed in single exposure process, and save successively base material turn-over so that the step of sequentially exposing in each surface of base material, more reduced and operation steps is more simplified the processing procedure time, and improve the efficiency of exposure manufacture process.
In one embodiment, each face exposure that can be to a plurality of base materials and base material by rotary exposure carry equipment, to improve exposure efficiency.
Accompanying drawing explanation
Fig. 1 is the schematic diagram that shows the rotary exposure carry equipment of the first embodiment of the present invention.
Fig. 2 is the schematic diagram that shows the rotary exposure carry equipment of the second embodiment of the present invention.
Fig. 3 is the schematic diagram that shows the rotary exposure carry equipment of the third embodiment of the present invention.
Primary clustering symbol description
100, the rotary exposure carry equipment of 100a, 100b
1,1a, 1b bogey
11 fixed components
2 rotary types move device
21,21a, 21b rotating mechanism
22 driving mechanisms
23 conveying mechanisms
3 receive member
4 base materials
5 exposure devices
A, A', A " rotational axis line
D1, D2 distance
E bearing of trend
O center
The P path of exposing
R1, R2 sense of rotation
S1 is surface longitudinally
S2 lateral surfaces
Embodiment
Specific embodiment of the present invention, by the embodiment by following and be attachedly graphic and be further described.
Consult shown in Fig. 1, it is the schematic diagram that shows the rotary exposure carry equipment of the first embodiment of the present invention.The rotary exposure carry equipment 100 of the first embodiment of the present invention comprises a bogey 1 and a rotary type moves device 2.
Bogey 1 is in order to carry a base material 4.In the present embodiment, bogey 1 comprises that a fixed component 11 is with fixing substrate 4.Bogey 1 is a microscope carrier, and fixed component 11 is a fixture.
Rotary type moves device 2 and comprises a rotating mechanism 21, a driving mechanism 22 and a conveying mechanism 23.Wherein, rotating mechanism 21 is connected in bogey 1.In the present embodiment, the fulcrum 21 that rotating mechanism 21 is axial-rotation, and under the state of rotation, be mobile.Certainly, the present invention is not as limit, and rotating mechanism 21 also can be a rotating disk, can make bogey 1 rotation.
In the present embodiment, rotating mechanism 21 is for being parallel to the longitudinal surperficial S1 of base material 4, and the rotational axis line A of rotating mechanism 21 is by the center O place of base material 4.
And the lateral location place of exposure path P is provided with an exposure device 5, make base material 4 be subject to the exposure of exposure device 5.
By said structure, when conveying mechanism 23 is during along throughput direction T transport driving 22, the related base material 4 that makes rotating mechanism 21, bogey 1 and be fixed on bogey 1 moves along throughput direction T.Base material 4, in the process moving along throughput direction T, can be subject to sending out exposure device 5 and irradiates and be exposed.
Because rotating mechanism 21 be take the bearing of trend of rotational axis line A and is rotated as axial rotary by driving mechanism 22, bogey 1 also can be take along with rotating mechanism 21 bearing of trend of rotational axis line A and rotated as axial rotary by this, thereby the base material 4 being fixed on bogey 1 also can rotate along with rotating mechanism 21.In the present embodiment, the sense of rotation R1 of rotating mechanism 21 is counterclockwise, and certainly, the present invention is not as limit, and sense of rotation R1 also can be clockwise.
When base material 4 rotation, each longitudinal surperficial S1 of base material 4 can be exposed the illumination that device 5 sends and be mapped to.Thereby reach in single exposure process the effect that each longitudinal surperficial S1 of base material 4 is exposed.
Consult shown in Fig. 2, it is the schematic diagram that shows the rotary exposure carry equipment of the second embodiment of the present invention.The composition assembly of the rotary exposure carry equipment 100a of this embodiment is roughly identical with aforementioned the first embodiment, therefore identical assembly is the assembly numbering indicating with identical, as a means of correspondence.Its difference is half of length of the lateral surfaces S2 that the distance D 1 of the rotational axis line A' of rotating mechanism 21a in the present embodiment and the center O of base material 4 is base material 4, therefore be fixed on base material 4 on bogey 1a along with the radius of turn of rotating mechanism 21a rotation is not identical with aforementioned the first embodiment, to tackle the exposure under different situations.Other structure is all identical with the first embodiment, therefore repeat no more.
Consult shown in Fig. 3, it is the schematic diagram that shows the rotary exposure carry equipment of the third embodiment of the present invention.The composition assembly of the rotary exposure carry equipment 100b of this embodiment is roughly identical with the first embodiment, therefore identical assembly is the assembly numbering indicating with identical, as a means of correspondence.Its difference is, in the present embodiment, rotary exposure carry equipment 100b comprises that four bogey 1b(also can one or above bogey), and by four, receive member 3(also can one or the above member of receiving) so that each bogey 1b be connected with rotating mechanism 21b.
In the present embodiment, the rotational axis line A of rotating mechanism 21b " surpasses half of length of base material 4 lateral surfaces S2 with the distance D 2 of the center O of base material 4.
In the present embodiment, receiving member 3 is connected between rotating mechanism 21b and bogey 1b, and the bearing of trend E that respectively receives member 3 is parallel to the lateral surfaces S2 of each base material 4 and perpendicular to rotating mechanism 21b, certainly, the present invention is as limit, bearing of trend E also can with rotating mechanism 21b out of plumb and not parallel with the lateral surfaces S2 of base material 4.
In the present embodiment, receiving member 3 take its bearing of trend E and rotates as axial rotary by rotating mechanism (not shown).In the present embodiment, receive the sense of rotation R2 of member 3 for being rotated counterclockwise, certainly, the present invention is not as limit, and sense of rotation R2 also can be clockwise.
Therefore, each bogey 1b receives the axial rotary of member 3 and rotates according to each respectively, and according to the rotation of rotating mechanism 21b, take the rotational axis line A of rotating mechanism 21b and " as hollow shaft revolves round the sun, so that be fixed on the surface of the base material 4 on bogey 1, can be exposed the illumination that device 5 sends and be mapped to and be exposed.Thereby the effect that the surface that reaches four base materials 4 is all exposed.
By embodiments of the invention, can be learnt, by rotary exposure carry equipment of the present invention, a plurality of surfaces of base material are all exposed, and save the step that successively base material turn-over is made each surface of base material sequentially expose, more reduced and operation steps is more simplified the processing procedure time, and improve the efficiency of exposure manufacture process.
From above embodiment, the value in the true tool industry of rotary exposure carry equipment provided by the present invention.Yet above narration is only preferred embodiment of the present invention explanation, be allly skillful in this skill person when doing according to above-mentioned explanation other all improvement, yet these change in the scope of the claims that still belongs to invention spirit of the present invention and define.
Claims (10)
1. a rotary exposure carry equipment, for carrying a base material to expose, is characterized in that, this rotary exposure carry equipment comprises:
One bogey, is fixed thereon this base material, and carries this base material; And
One rotary type moves device, has a rotating mechanism, and this rotating mechanism connects this bogey and under the state of rotation, is mobile.
2. rotary exposure carry equipment as claimed in claim 1, is characterized in that, the fulcrum that this rotating mechanism is axial-rotation.
3. rotary exposure carry equipment as claimed in claim 1, is characterized in that, this rotating mechanism is the longitudinal surface that is parallel to this base material.
4. rotary exposure carry equipment as claimed in claim 1, is characterized in that, the rotational axis line of this rotating mechanism is by the center of this base material.
5. rotary exposure carry equipment as claimed in claim 1, is characterized in that, half of the length of the lateral surfaces that the distance of the rotational axis line of this rotating mechanism and the center of this base material is this base material.
6. rotary exposure carry equipment as claimed in claim 1, is characterized in that, the distance of the rotational axis line of this rotating mechanism and the center of this base material system is greater than half of length of the lateral surfaces of this base material.
7. rotary exposure carry equipment as claimed in claim 1, is characterized in that, also comprises and receives member, is connected between this rotating mechanism and this bogey.
8. rotary exposure carry equipment as claimed in claim 7, is characterized in that, this bogey is a plurality of, and receives member and each this bogey is connected with this rotating mechanism by a plurality of this.
9. rotary exposure carry equipment as claimed in claim 7, is characterized in that, this bearing of trend system of receiving member is parallel to the lateral surfaces of this base material.
10. rotary exposure carry equipment as claimed in claim 7, is characterized in that, this is received member system and is set to take its bearing of trend as axial rotary.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210254365.8A CN103576465B (en) | 2012-07-23 | 2012-07-23 | Rotary exposure carry equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210254365.8A CN103576465B (en) | 2012-07-23 | 2012-07-23 | Rotary exposure carry equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103576465A true CN103576465A (en) | 2014-02-12 |
| CN103576465B CN103576465B (en) | 2016-02-24 |
Family
ID=50048533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210254365.8A Expired - Fee Related CN103576465B (en) | 2012-07-23 | 2012-07-23 | Rotary exposure carry equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103576465B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1041841A (en) * | 1988-04-15 | 1990-05-02 | 米德公司 | Making is used for the method for the photomask of image projection and device |
| CN1183580A (en) * | 1996-11-21 | 1998-06-03 | 三星电子株式会社 | Developing device for semiconductor device fabrication and its controlling method |
| JP2001322177A (en) * | 2000-05-17 | 2001-11-20 | Minolta Co Ltd | Method and apparatus for three-dimensional modeling |
| US20030127436A1 (en) * | 2001-07-31 | 2003-07-10 | 3D Systems, Inc. | Selective laser sintering with optimized raster scan direction |
| CN102043345A (en) * | 2009-10-20 | 2011-05-04 | 索尼公司 | Exposure device and exposure method |
-
2012
- 2012-07-23 CN CN201210254365.8A patent/CN103576465B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1041841A (en) * | 1988-04-15 | 1990-05-02 | 米德公司 | Making is used for the method for the photomask of image projection and device |
| CN1183580A (en) * | 1996-11-21 | 1998-06-03 | 三星电子株式会社 | Developing device for semiconductor device fabrication and its controlling method |
| JP2001322177A (en) * | 2000-05-17 | 2001-11-20 | Minolta Co Ltd | Method and apparatus for three-dimensional modeling |
| US20030127436A1 (en) * | 2001-07-31 | 2003-07-10 | 3D Systems, Inc. | Selective laser sintering with optimized raster scan direction |
| CN102043345A (en) * | 2009-10-20 | 2011-05-04 | 索尼公司 | Exposure device and exposure method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103576465B (en) | 2016-02-24 |
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| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160224 |