CN103576388B - A kind of method of liquid crystal annealing - Google Patents

A kind of method of liquid crystal annealing Download PDF

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Publication number
CN103576388B
CN103576388B CN201210271138.6A CN201210271138A CN103576388B CN 103576388 B CN103576388 B CN 103576388B CN 201210271138 A CN201210271138 A CN 201210271138A CN 103576388 B CN103576388 B CN 103576388B
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liquid crystal
infrared ray
base material
crystal layer
layer
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CN103576388A (en
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吴昱寯
邱大任
洪维泽
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Far Eastern New Century Corp
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Far Eastern New Century Corp
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Abstract

A kind of method of liquid crystal annealing, first one base material is provided, it has a liquid crystal layer, wherein this base material and this liquid crystal layer contacting surface have a lens arrangement, this liquid crystal layer fills and leads up this lens arrangement, and this liquid crystal layer is the thickest and the thickness difference of thinnest part is between 10~150 μm.On this liquid crystal layer, cover an infrared ray-absorbing layer with the infrared ray penetrance of 5~70%, and on this infrared ray-absorbing layer, irradiate infrared ray, use the purpose reaching liquid crystal short annealing.

Description

A kind of method of liquid crystal annealing
Technical field
The present invention is related to the method for a kind of liquid crystal annealing, is particularly to a kind of method that can quickly the liquid crystal layer with different-thickness be annealed.
Background technology
Liquid crystal, i.e. liquid crystal (LiquidCrystal, LC), be the one of phase, because having special physics and chemistry and photoelectric characteristic, in 20th century, has namely been widely used in the Display Technique of light and thin type.
The purpose of liquid crystal annealing (annealing), is to make liquid crystal molecule to rearrange.In liquid crystal annealing process, use alignment film can control the orientation of liquid crystal molecule, make liquid crystal molecule rearrange according to the preset direction on phase matching film.
Traditional liquid crystal annealing way utilizes storage heater, and liquid crystal molecule is heated.But when being annealed with storage heater, it is necessary to the longer process time, for instance in No. 201100489 publication of TaiWan, China, namely mention and need the liquid crystal up to 1 hour to make annealing treatment the time.Additionally, being annealed liquid crystal processing if only replacing storage heater with infrared heater, though the liquid crystal annealing time can be shortened, but being easily generated liquid crystal and being heated the situation of inequality, particularly when liquid crystal layer is non-uniform thickness, liquid crystal layer is heated uneven situation by even more serious.Therefore develop one and can effectively shorten liquid crystal annealing time, and do not result in liquid crystal layer and be heated the liquid crystal method for annealing of inequality, it is that industry is desired.
Summary of the invention
For solving the problem of aforementioned conventional technology, namely the purpose of the present invention is in that to provide one can make liquid crystal layer thermally equivalent and the method that can effectively shorten liquid crystal annealing time.
The method of a kind of liquid crystal annealing pointed by the present invention, it comprises the following steps: first provide a base material, it has a liquid crystal layer, the one side that wherein this base material contacts with this liquid crystal layer has a lens arrangement, this liquid crystal layer fills and leads up this lens arrangement, and this liquid crystal layer is the thickest and the thickness difference of thinnest part is between 10~150 μm.Then, on this liquid crystal layer, cover an infrared ray-absorbing layer with the infrared ray penetrance of 5~70%.Irradiate infrared ray from this infrared ray-absorbing layer to this base material with infrared heater to be heated, to carry out liquid crystal annealing, and use the purpose reaching the shortening liquid crystal short annealing process time.
Liquid crystal method for annealing of the present invention can effectively shorten the liquid crystal annealing time, and can, while shortening liquid crystal annealing time, remain to make liquid crystal layer heat by uniformly.Liquid crystal method for annealing of the present invention, during for processing the liquid crystal layer with non-uniform thickness, more relatively can show its superiority by conventional art.
Accompanying drawing explanation
For the above and other purpose of the present invention, feature, advantage and embodiment can be become apparent, the detailed description of institute's accompanying drawings is as follows:
Fig. 1 is that the one of liquid crystal method for annealing of the present invention is embodied as aspect schematic diagram.
Fig. 2 is that another of the lens arrangement on base material is embodied as aspect sectional schematic diagram.
Fig. 3 is that another that strengthen substrate support and structural strength in liquid crystal method for annealing of the present invention is embodied as aspect.
Fig. 4 is the schematic diagram that liquid crystal method for annealing of the present invention is carried out with volume to volume processing procedure.
Fig. 5 is that another that add both alignment layers in liquid crystal method for annealing of the present invention is embodied as state schematic diagram.
[main element symbol description]
10: base material 24: infrared lamp
11: lens arrangement 26: direct of travel
12: liquid crystal layer 28: roller
14: infrared ray-absorbing layer 30: both alignment layers
16: infrared ray 32: both alignment layers
18: support base material d1: thickness
20: laminate d2: thickness
22: infrared heater
Detailed description of the invention
For making the those skilled in the art haveing the knack of in the art, it is easier to understand the present invention by the explanation of description of the present invention, below coordinate graphic further illustrating.Traditional technology person ought be apprehensible, and the following description content is only in order to illustrate the technology of the present invention, and preferably implementation condition scope is described, and is not used to restriction the scope of the present invention.
Consulting Fig. 1, for liquid crystal method for annealing of the present invention is embodied as aspect schematic diagram.First, it is provided that a base material 10, this at least one side of base material 10 is provided with at least one lens arrangement 11.On the one side that base material 10 is provided with lens arrangement 11, it is coated with a liquid crystal layer 12.This liquid crystal layer 12 fills and leads up the lens arrangement 11 on base material 10, and in the non-opposite sides contacted with base material 10 be smooth.Thereby liquid crystal layer 12 has non-homogeneous thickness, and its thickest part has a thickness d 1, and the thinnest part has a thickness d 2.In the liquid crystal layer 12 of this non-uniform thickness, the thickness difference Δ d=d1-d2 of the thickest part and most thin section part.For considering optic purposes, thickness difference Δ d is preferably between 10~150 μm, is more preferred between 20~130 μm, and the best is between 35~120 μm.
Then, on liquid crystal layer 12, an infrared ray-absorbing layer 14 is covered, so that infrared ray-absorbing layer 14 and liquid crystal layer 12 substantial contact.Infrared ray-absorbing layer 14 of the present invention is for absorbing a part of infrared ray 16, and the luminous energy of infrared ray 16 is converted into heat energy, and allows the infrared ray 16 of another part penetrate direct irradiation in liquid crystal layer 12, and liquid crystal layer 12 is made directly heating.Therefore, when irradiating infrared ray 16 and heating, liquid crystal layer 12 is (conduction warm) except being subject to infrared ray-absorbing layer 14 and absorbing the thermal source heating that infrared ray 16 changes into, and can be influenced by infrared ray 16 direct irradiation heating (radiant heat) simultaneously.
Aforesaid base material 10, based on considering with being applied in blooming field, it is preferably the substrate of substantially the tool transparency and pliability (flexible), be more preferred from be with etc. side's property (that is, do not have birefringence) person prepared by material, can be applicable to the material category in the present invention, at this example that can enumerate, comprise it is not limited to, acryl resin (acrylateresin), Triafol T, epoxy resin (epoxyresin), polysiloxanes (polysiloxane), pi (polyimide), Polyetherimide (polyetherimide), Freon C318 (perfluorocyclobutane), benzocyclobutane (Benzoyclobutane, BCB), polycarbonate (polycarbonate), plexiglass, polyurethane (polyurethane) or dimethione, wherein again with acryl resin and Triafol T for preferably.The thickness of base material 10 is also without particular limitation in the present invention, and user can be selected on demand.
The shape of the lens arrangement 11 that the present invention is arranged on base material 10, being not particularly limited in the present invention, user can be selected on demand, for instance lens arrangement 11 of the present invention can be as shown in Figure 1, its section can be semicircle, bowl-type or arc, also can be as shown in Figure 2.Such as, the section of lens arrangement 11 can for such as trapezoidal shown in Fig. 2 (a), or square as shown in Fig. 2 (b).Aforesaid shape can individually or be mixed on base material 10.If desired, another opposite flank of base material also can arranging another lens arrangement, it can outwardly or cave inward.Now, it can be identical or different for being positioned at its shape of lens arrangement on base material 10 two relative side.
The thickness d 2 of aforesaid most thin section part of liquid crystal layer 12, is not particularly limited in the present invention, and user can be selected on demand.But for considering the application of blooming, the thickness d 2 of the most thin section part of liquid crystal layer 12 is preferably 1~10 μm, is more preferred from 2~8 μm.It addition, the liquid crystal that can be applicable in liquid crystal layer 12 of the present invention, also without particular limitation in the present invention, as long as the liquid crystal that tradition can be applied to blooming all can be applied in the present invention.Specifically, liquid crystal shape can be bar-shaped (calamitic), discoid (discotic), tabular (smecdic) or its combination.More specifically, aforesaid rod shaped liquid crystal, comprise it is not limited to, nematic phase (nematic) liquid crystal, cholesterol phase (cholesteric) liquid crystal and smectic phase (smectic) liquid crystal.Aforesaid disc-like liquid crystal, comprise it is not limited to, cylinder phase (columnar) liquid crystal and nematic phase (nematic) liquid crystal.
The method that liquid crystal layer 12 of the present invention is formed, is not particularly limited in the present invention, comprise it is not limited to, method of spin coating, Vacuum Pressure be legal and the method such as volume to volume pressing method.
Infrared ray-absorbing layer 14 of the present invention, for coordinating aforementioned substrates 10 and can be applicable to volume to volume processing procedure (rolltorollprocess), it is flexual that it is preferably tool.Infrared ray-absorbing layer 14 of the present invention can pass through to be coated with prepared by one layer of ink on a bendable transparent plastic substrate, also by being mixed in the raw material of bendable transparent plastic substrate by colorant, then this raw material extrusion can be become bendable plastic substrate.Aforesaid ink or colorant, refer to that in the present invention tradition after irradiating infrared ray, can absorb ultrared luminous energy and change into hot able one.It addition, for making liquid crystal layer 12 be heated evenly, invention infrared ray-absorbing layer 14 is preferably the infrared ray penetrance with 5~70%, it is more preferred from the infrared ray penetrance with 10~60%.
The thickness that aforementioned ink is coated with on plastic substrate, it is not particularly limited in the present invention, user is worked as it can be appreciated that the difference that Ink Application thickness can comply with selected ink type be adjusted by describing of description of the present invention, as long as making infrared ray penetration meet aforesaid requirement.Specifically, Ink Application thickness is preferably between 0.1~2.0 μm, is more preferred between 0.2~1.8 μm.Can be applicable to the ink in the present invention, specifically can include two liquid response type ink, heat-curing type ink and ultraviolet curable ink, it is not limited to this.Aforesaid two liquid response type ink refer to that host and firming agent are prepared respectively, remix the ink of use during printing.Link stuff in its host is many to be made up of epoxy resin and carbamate etc., then add after firming agent (aminated compounds) afterwards polycondensation occurs should and solidify.Aforesaid heat-curing type ink refers to be pre-mixed resin and firming agent, reheats and makes resin reaction, form ink epithelium after printing.Its resin used, dust head is single-liquid type epoxy.Aforementioned ultraviolet curable ink refers to and does not use any solvent, does not produce solvent volatilization in printing process, and ink is in dry run, through ultraviolet irradiation, makes resin generation polyreaction, forms ink epithelium.
Can be applicable to the kind of aforesaid colorant, be not particularly limited in the present invention, as long as tradition can be mixed into person in the raw material of bendable transparent plastic substrate, all can be applied in the present invention.The example specifically can enumerated, comprises it is not limited to natural inorganic colorant, artificial inorganic colorant, and natural organic toner, for instance plant organic toner or insecticide organic toner.
The definition of heretofore described infrared ray 16, as haveing the knack of the art person cognition person, more specifically refers to that wavelength is between 750~1500nm person.
Consult Fig. 3, for strengthening supportive and the structural strength of base material 10, also can relative to being provided with on the another side of lens arrangement 11 and arranging a support base material 18 on base material 10.Can be applicable to the material category supporting base material 18 in the present invention, be not particularly limited in the present invention, user demand can select suitable support base material.Specifically, support base material 18 be preferably tool pliability, the example specifically can enumerated, comprise it is not limited to, polyethylene terephthalate, Triafol T and Merlon.
Consult Fig. 4, for the schematic diagram that liquid crystal method for annealing of the present invention is carried out with volume to volume processing procedure.In time carrying out liquid crystal annealing process of the present invention operation, the aforementioned laminate 20 stacked with infrared ray-absorbing layer 14 by support base material 18, base material 10, liquid crystal layer 12 is continually fed in infrared heater 22 according to direct of travel by roller 28.By being arranged at the infrared lamp 24 in infrared heater 22, this laminate 20 is irradiated infrared ray 16 from infrared ray-absorbing layer 14 to liquid crystal layer 12 and is heated, use and carry out liquid crystal annealing operation.After liquid crystal layer 12 completes annealing, infrared ray-absorbing layer 14 can be peeled off in laminate 20.
In liquid crystal method for annealing of the present invention, the heating-up temperature that infrared heater 22 sets, user can comply with the numerical value that selected liquid crystal kind adjustment is suitable.Specifically, heating-up temperature is preferably 70~100 DEG C, is more preferred from 75~90 DEG C.Laminate 20 passes through the overall heat time heating time of infrared heater 22, is not particularly limited in the present invention, and the infrared ray penetration of the visual heating-up temperature of user, thickness of liquid crystal layer and thickness difference, infrared ray-absorbing layer is adjusted.But generally speaking, the heat time heating time of liquid crystal method for annealing of the present invention can foreshorten in 20 minutes, heat in hot blast mode compared to prior art and take more than 1 hour, there is significant superiority.
Liquid crystal layer 12 is without before orientation, and the liquid crystal molecule generally arrangement in non-homogeneous direction, this is generally not favored the application in blooming field.Therefore for making the liquid crystal molecule in liquid crystal layer 12 according to the arrangement of desired predetermined direction, one layer of both alignment layers 30 can be set on the lens arrangement 11 of base material 10, as shown in Fig. 5 (a).Consulting Fig. 5 (b), both alignment layers 32 also may be disposed on the one side of infrared ray-absorbing layer 14.When the thickness of the thickest part of liquid crystal layer 12 is thicker, for making liquid crystal molecule have preferably orientation effect, also simultaneously each respectively on both of the aforesaid position a both alignment layers can be set.
The set-up mode of both alignment layers and material category, user can be complied with its demand and be selected suitable traditional set-up mode and material category to be applied, and is not particularly limited in the present invention.The mode that both alignment layers is arranged, such as brush film orientation method (rubbingalignment), light orientation method (photo-alignment), ion beam orientation method (Ionbeamalignment) and plasma-based Shu Peixiang method (plasmabeamalignment), it is not limited to this.
Embodiment 1
The laminate of preparation tool different-thickness liquid crystal layer
Take one and be of a size of 10cm × 10cm and the polyethylene terephthalate substrate that thickness is 100 μm (model PET4100 twists flax fibers and weave (ToyoboCo, Ltd., Japan) purchased from Japan of Japan), on this base material, be coated with an acryl resin layer.An engraving copper wheel is used imprint on acryl resin layer, and simultaneously irradiating ultraviolet light, with formation plural lenses structure (caving inward into bowl-type from acryl resin layer surface, width is 250 μm, and the degree of depth is 40 μm) on acryl resin layer.
It is provided with on the side of lens arrangement to be coated with photo-alignment layer that a thickness is 100nm (model for ROP103, purchased from Rolic) with method of spin coating in this base material.Afterwards, then with light orientation machine (model for PUVDEEP, purchased from USHIO) this both alignment layers is carried out orientation with a predetermined direction (becoming 45 degree of angles with film direct of travel).Finally, one layer of liquid crystal (ultraviolet hardening liquid crystal it is coated with in photo-alignment layer, model is LC242, purchased from Germany BASF, wherein being mixed with a smooth initiator (model is TPO, purchased from Germany BASF), addition accounts for the 1wt% of total amount), make liquid crystal be fully filled with lens arrangement, and to make the another side of liquid crystal layer be flat condition.Thereby can preparing the liquid crystal layer with different-thickness, the thickness of this liquid crystal layer thinnest part is 1 μm, and the thickness in thickness is 41 μm, and thickness difference is 40 μm.
Prepare infrared ray-absorbing layer
Take PETP substrate (the model PET4100 that a thickness is 100 μm, twist flax fibers and weave (ToyoboCo purchased from Japan of Japan, Ltd., Japan)), on one side with the black ink of R.D.S.Webster8 one layer of heat-curing type of bar even spread (solid content 35wt%, main constituent is carbon black, model A92, purchased from Taiwan paper tinsel science and technology (TaipoloTechnologyCo.Ltd., R.O.C.)).After even spread, by the removal of solvents in ink, (hot plate (hotplate) heats, at 70 DEG C 1 minute), to obtain the ink layer that thickness is for 0.3 μm, through with sub-ray spectrometer, (model is for U4100, purchased from HIT) measurement, record under 750nm~1500nm wavelength, overall infrared ray-absorbing layer has the infrared penetration rate of 57.4%.
Infrared ray-absorbing layer is fitted on aforesaid laminate, makes on infrared ray-absorbing layer the one side without ink layer contact with liquid crystal layer.Afterwards, it is sent in volume to volume infrared heater (assemble voluntarily, heater is provided with the infrared lamp that can send 750~1500nm wavelength, power is 110V/300W), heating-up temperature is set in 80 DEG C (hot coupling distances of temperature sensor be heated about 1 centimeter of thing surface), machine speed is 0.2 meter/minute, and overall heat time heating time is 5 minutes.Finally, after completing heating, stand under room temperature environment and be cooled to room temperature, used liquid crystal cycle of annealing.
After liquid crystal layer completes annealing, detect LCD alignment situation with polarizing microscope (model for XP201, purchased from Qinyou Enterprise Co., Ltd.).Acquired results represents in lower section mode after testing, and result is converged whole in table one:
(1) LCD alignment is good, represents with "○", corresponds in region residing for lens arrangement, without any LCD alignment abnormal area in table liquid crystal layer;
(2) LCD alignment still can, represent with " Δ ", corresponding in region residing for lens arrangement in table liquid crystal layer, LCD alignment abnormal area only has 1st~3 district (representing accounting for overall region ratio, it is possible to can be clearer);
(3) LCD alignment is poor, represents with "×", corresponds in region residing for lens arrangement in table liquid crystal layer, and LCD alignment abnormal area is more than 3rd district.
In test result, with "○" and " Δ " signifier, equal table quality is at tolerance interval, but wherein with "○" signifier, quality is best.
Because sending into the lamination layer structure that rete is a multiple material in infrared heater, when layers of material be heated inequality cause programming rate inequality time, because each layer thermal coefficient of expansion is different, causing integral membrane facial disfigurement, liquid crystal is subjected to this impact when orientation and causes that orientation is abnormal.Producing orientation abnormal wire (disclinationline) that is the region around those abnormal wire time again because of LCD alignment exception, the alignment direction of liquid crystal presents irregular status.Therefore, when light is by this region, the situation of liquid crystal light leak and then the image display quality of the liquid crystal display made by impact can be caused.
Embodiment 2
The preparation of test material and related experiment mode of operation condition are with embodiment 1, but Ink Application thickness is changed to 0.9 μm, through measuring with sub-ray spectrometer, record under 750nm~1500nm wavelength, overall infrared ray-absorbing layer has the infrared penetration rate of 20.3%, and test acquired results converges whole in table one.
Embodiment 3
The preparation of test material and related experiment mode of operation condition are with embodiment 1, but Ink Application thickness is changed to 1.6 μm, through measuring with sub-ray spectrometer, record under 750nm~1500nm wavelength, overall infrared ray-absorbing layer has the infrared penetration rate of 10.6%, and test acquired results converges whole in table one.
Embodiment 4
The preparation of test material and related experiment mode of operation condition are with embodiment 1, but Ink Application thickness is changed to 2.3 μm, through measuring with sub-ray spectrometer, record under 750nm~1500nm wavelength, overall infrared ray-absorbing layer has the infrared penetration rate of 0.4%, and test acquired results converges whole in table one.
Comparative example 1
The preparation of test material and related experiment mode of operation condition are with embodiment 1, but dope-free ink (ink thickness is 0 μm) on PETP substrate, through measuring with sub-ray spectrometer, record under 750nm~1500nm wavelength, overall infrared ray-absorbing layer has the infrared penetration rate of 89%, and test acquired results converges whole in table one.
Table one
Embodiment 5
The preparation of test material and related experiment mode of operation condition are with embodiment 1, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table two.
Embodiment 6
The preparation of test material and related experiment mode of operation condition are with embodiment 2, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table two.
Embodiment 7
The preparation of test material and related experiment mode of operation condition are with embodiment 3, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table two.
Embodiment 8
The preparation of test material and related experiment mode of operation condition are with embodiment 4, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table two.
Comparative example 2
The preparation of test material and related experiment mode of operation condition are with comparative example 1, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table two.
Table two
Embodiment 9
The preparation of test material and related experiment mode of operation condition are with embodiment 1, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table three.
Embodiment 10
The preparation of test material and related experiment mode of operation condition are with embodiment 2, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table three.
Embodiment 11
The preparation of test material and related experiment mode of operation condition are with embodiment 3, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table three.
Embodiment 12
The preparation of test material and related experiment mode of operation condition are with embodiment 4, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table three.
Comparative example 3
The preparation of test material and related experiment mode of operation condition are with comparative example 1, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table three.
Table three
Embodiment 13
The preparation of test material and related experiment mode of operation condition are with embodiment 1, but thickness of liquid crystal difference is changed to 85 μm, and test acquired results converges whole in table four.
Embodiment 14
The preparation of test material and related experiment mode of operation condition are with embodiment 2, but thickness of liquid crystal difference is changed to 85 μm, and test acquired results converges whole in table four.
Embodiment 15
The preparation of test material and related experiment mode of operation condition are with embodiment 3, but thickness of liquid crystal difference is changed to 85 μm, and test acquired results converges whole in table four.
Embodiment 16
The preparation of test material and related experiment mode of operation condition are with embodiment 4, but thickness of liquid crystal difference is changed to 85 μm, and test acquired results converges whole in table four.
Comparative example 4
The preparation of test material and related experiment mode of operation condition are with comparative example 1, but thickness of liquid crystal difference is changed to 85 μm, and test acquired results converges whole in table four.
Table four
Embodiment 17
The preparation of test material and related experiment mode of operation condition are with embodiment 13, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table five.
Embodiment 18
The preparation of test material and related experiment mode of operation condition are with embodiment 14, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table five.
Embodiment 19
The preparation of test material and related experiment mode of operation condition are with embodiment 15, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table five.
Embodiment 20
The preparation of test material and related experiment mode of operation condition are with embodiment 16, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table five.
Comparative example 5
The preparation of test material and related experiment mode of operation condition are with comparative example 4, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table five.
Table five
Embodiment 21
The preparation of test material and related experiment mode of operation condition are with embodiment 13, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table six.
Embodiment 22
The preparation of test material and related experiment mode of operation condition are with embodiment 14, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table six.
Embodiment 23
The preparation of test material and related experiment mode of operation condition are with embodiment 15, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table six.
Embodiment 24
The preparation of test material and related experiment mode of operation condition are with embodiment 16, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table six.
Comparative example 6
The preparation of test material and related experiment mode of operation condition are with comparative example 4, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table six.
Table six
Embodiment 25
The preparation of test material and related experiment mode of operation condition are with embodiment 1, but thickness of liquid crystal difference is changed to 113 μm, and test acquired results converges whole in table seven.
Embodiment 26
The preparation of test material and related experiment mode of operation condition are with embodiment 2, but thickness of liquid crystal difference is changed to 113 μm, and test acquired results converges whole in table seven.
Embodiment 27
The preparation of test material and related experiment mode of operation condition are with embodiment 3, but thickness of liquid crystal difference is changed to 113 μm, and test acquired results converges whole in table seven.
Embodiment 28
The preparation of test material and related experiment mode of operation condition are with embodiment 4, but thickness of liquid crystal difference is changed to 113 μm, and test acquired results converges whole in table seven.
Comparative example 7
The preparation of test material and related experiment mode of operation condition are with comparative example 1, but thickness of liquid crystal difference is changed to 113 μm, and test acquired results converges whole in table seven.
Table seven
Embodiment 29
The preparation of test material and related experiment mode of operation condition are with embodiment 25, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table eight.
Embodiment 30
The preparation of test material and related experiment mode of operation condition are with embodiment 26, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table eight.
Embodiment 31
The preparation of test material and related experiment mode of operation condition are with embodiment 27, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table eight.
Embodiment 32
The preparation of test material and related experiment mode of operation condition are with embodiment 28, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table eight.
Comparative example 8
The preparation of test material and related experiment mode of operation condition are with comparative example 7, but are changed to 10 minutes overall heat time heating time, and test acquired results converges whole in table eight.
Table eight
Embodiment 33
The preparation of test material and related experiment mode of operation condition are with embodiment 25, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table nine.
Embodiment 34
The preparation of test material and related experiment mode of operation condition are with embodiment 26, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table nine.
Embodiment 35
The preparation of test material and related experiment mode of operation condition are with embodiment 27, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table nine.
Embodiment 36
The preparation of test material and related experiment mode of operation condition are with embodiment 28, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table nine.
Comparative example 9
The preparation of test material and related experiment mode of operation condition are with comparative example 7, but are changed to 15 minutes overall heat time heating time, and test acquired results converges whole in table nine.
Table nine
Comparative example 10
Preparation and the related experiment mode of operation condition of test material are with comparative example 1, but mode of heating changes and is heated with hot-air oven, and to change heat time heating time poor with thickness of liquid crystal layer simultaneously, and test acquired results remittance is whole in table ten.
Table ten
Can be learnt by test result, liquid crystal method for annealing of the present invention is compared to hot blast method, can effectively shorten heat time heating time, and compared to only with the method (not covering infrared ray-absorbing layer person of the present invention on liquid crystal layer) of infrared heater heating, liquid crystal layer more can be made to be heated evenly.Directly heat with infrared heater merely, though liquid crystal can quickly be heated, but liquid crystal layer can be made to deform because being heated inequality.But, the inventive method directly heats needs longer heat time heating time (but still shortening many far beyond hot blast method) compared to simple with infrared heater, but the situation of being heated of liquid crystal layer is but able to comparatively uniform, the purpose reaching liquid crystal short annealing being truly effective.
Although the present invention is disclosed above with embodiment; so it is not limited to the present invention, any has the knack of this those skilled in the art, without departing from the spirit and scope of the present invention; when being used for a variety of modifications and variations, therefore protection scope of the present invention is when depending on being as the criterion that appended claims defines.

Claims (18)

1. a method for liquid crystal annealing, it comprises the steps of
One base material is provided, it has a liquid crystal layer and a both alignment layers is positioned at this base material and this liquid crystal interlayer, wherein this base material and this both alignment layers contact surface has a lens arrangement, this liquid crystal layer fills and leads up this lens arrangement, and this liquid crystal layer is the thickest and the thickness difference of thinnest part is between 10~150 microns (μm);
Cover an infrared ray-absorbing layer on this liquid crystal layer;And
Irradiate infrared ray on this infrared ray-absorbing layer,
Wherein, this infrared ray-absorbing layer has the infrared penetration rate of 5~70%.
2. the method for claim 1, it is characterised in that this infrared ray-absorbing layer is a bendable base material, and it is coated with one layer can absorb infrared ray and change into the ink of heat energy.
3. method as claimed in claim 2, it is characterised in that this ink has the thickness of 0.1~2.0 μm.
4. method as claimed in claim 2, it is characterised in that this ink has the thickness of 0.2~1.8 μm.
5. method as claimed in claim 2, it is characterised in that this ink is two liquid response type ink, heat-curing type ink or ultraviolet curable ink.
6. method as claimed in claim 2, it is characterised in that the material of this bendable base material is polyethylene terephthalate, Triafol T or Merlon.
7. the method for claim 1, it is characterised in that this infrared ray-absorbing layer is a bendable base material and wherein contains and can absorb infrared ray and change into the colorant of heat energy.
8. the method for claim 1, it is characterised in that this liquid crystal layer is the thickest and the thickness difference of thinnest part is between 20~130 μm.
9. the method for claim 1, it is characterised in that this liquid crystal layer is the thickest and the thickness difference of thinnest part is between 35~120 μm.
10. the method for claim 1, it is characterised in that this infrared ray-absorbing layer has the infrared penetration rate of 10~60%.
11. the method for claim 1, it is characterised in that the step of this infrared ray radiation performs with an infrared heater.
12. method as claimed in claim 11, it is characterised in that the heating-up temperature of this infrared heater is 70~100 DEG C.
13. method as claimed in claim 11, it is characterised in that the heat time heating time of this infrared heater is no more than 20 minutes.
14. the method for claim 1, it is characterised in that the section of this lens arrangement is square, ladder type, arc, semicircle, bowl-type, or such combination.
15. the method for claim 1, it is characterised in that the material of this base material is acryl resin or Triafol T.
16. the method for claim 1, it is characterised in that this base material lower side is pasted with a support base material further.
17. the method for claim 1, it is characterised in that the material of this support base material is polyethylene terephthalate, Triafol T or Merlon.
18. the method for claim 1, it is characterised in that on this infrared ray-absorbing layer and this liquid crystal layer contacting surface, be further provided with a both alignment layers.
CN201210271138.6A 2012-08-01 2012-08-01 A kind of method of liquid crystal annealing Expired - Fee Related CN103576388B (en)

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Publication number Priority date Publication date Assignee Title
JPH0627468A (en) * 1992-07-10 1994-02-04 Sony Corp Formation of oriented film
WO2003024586A1 (en) * 2001-09-14 2003-03-27 National Institute Of Advanced Industrial Science And Technology Molecular orientation controlling method and molecular orientation controlling device
CN1839329A (en) * 2003-07-01 2006-09-27 光学转变公司 Positioning structure for optical dyes
CN101320108A (en) * 2007-06-05 2008-12-10 索尼株式会社 Optical compensation member, liquid crystal display device, composition for alignment layer, and alignment layer
CN101625484A (en) * 2008-07-11 2010-01-13 北京京东方光电科技有限公司 Liquid crystal display panel and manufacturing method thereof

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0627468A (en) * 1992-07-10 1994-02-04 Sony Corp Formation of oriented film
WO2003024586A1 (en) * 2001-09-14 2003-03-27 National Institute Of Advanced Industrial Science And Technology Molecular orientation controlling method and molecular orientation controlling device
CN1555290A (en) * 2001-09-14 2004-12-15 独立行政法人产业技术综合研究所 Molecular orientation controlling method and molecular orientation controlling device
CN1839329A (en) * 2003-07-01 2006-09-27 光学转变公司 Positioning structure for optical dyes
CN101320108A (en) * 2007-06-05 2008-12-10 索尼株式会社 Optical compensation member, liquid crystal display device, composition for alignment layer, and alignment layer
CN101625484A (en) * 2008-07-11 2010-01-13 北京京东方光电科技有限公司 Liquid crystal display panel and manufacturing method thereof

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