CN103528961B - Graphene number of plies measuring method in a kind of transparent substrates - Google Patents
Graphene number of plies measuring method in a kind of transparent substrates Download PDFInfo
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- CN103528961B CN103528961B CN201310511543.5A CN201310511543A CN103528961B CN 103528961 B CN103528961 B CN 103528961B CN 201310511543 A CN201310511543 A CN 201310511543A CN 103528961 B CN103528961 B CN 103528961B
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Abstract
Graphene number of plies measuring method in a kind of transparent substrates, is belonged to field of material technology, relates to the number of plies being measured Graphene by Graphene polarization independent optical property.First Graphene is transferred in transparent substrates; Then by index-matching fluid, piezoid is attached at prism surface; By light beam focusing illumination to the position being coated with Graphene, emergent light is divided into two probes that s and p polarization is irradiated to balanced detector respectively; Command displacement platform and balanced detector scan Graphene sample, obtain the voltage signal of facula position and balanced detector; Finally signal analysis and processing is carried out to collection result, obtain Graphene number of plies information.Adopt method of the present invention, can flexibly, facilitate the Graphene number of plies in transparent substrates is measured.
Description
Technical field
The present invention relates to a kind of Graphene number of plies measuring method, particularly in a kind of transparent substrates to the number of plies measuring method of mechanical stripping and the standby Graphene of chemical meteorology deposition legal system, belong to field of material technology.
Background technology
Graphene all has a lot of very excellent performance in electricity, light and magnetic etc.: as room-temperature quantum Hall effect, bipolarity field effect, ferromagnetism, superconductivity and high electron mobility etc.; Its mechanical property is excellent simultaneously, and Young modulus reaches 1.0TPa; Thermal conductivity is 5300Wm-1K-1, is more than 10 times of copper thermal conductivity; Almost completely transparent, light is only had to the absorption of 2.3%.At present need by mechanical stripping method and the standby Graphene of chemical meteorology deposition legal system the number of plies determining Graphene before use, and the homogeneity of Graphene sample.Adopt the methods such as Raman spectrum, atomic force microscopy, optical imagery to carry out the measurement of the Graphene number of plies at present more, but these methods scope of application is separately narrow, such as Raman spectrum is relatively applicable to the Graphene of individual layer CVD and the Graphene of mechanical stripping, and atomic force is only applicable to the Graphene of mechanical stripping.Therefore, a kind of application of graphene layer counting method to Graphene applied widely, that precision is high has great significance.In addition, on a transparent substrate many when current Graphene is applied in transparency electrode, touch-screen, photodetection etc., therefore, the mensuration of the Graphene number of plies in transparent substrates is become even more important.
Summary of the invention
For the problems referred to above, the invention provides the measuring method of the Graphene number of plies in a kind of transparent substrates.Utilize Graphene difference to different polarization light absorption under total internal reflection structure, utilize balanced detector, the change of absorptivity under accurate this sample different polarization of mensuration, thus determine the number of plies of Graphene.
For achieving the above object, the present invention takes following technical scheme:
Graphene number of plies measuring method in a kind of transparent substrates, as shown in Figure 1, comprises the following steps:
Step 1: Graphene is shifted or is directly prepared in transparent substrates;
Step 2: transparent substrates note is invested prism surface by index-matching fluid, transparent substrates does not have the one side of Graphene to contact with prism;
Step 3: the prism with Graphene is placed on mobile platform, light beam is by producing circularly polarized light after slide, by prism, index-matching fluid and transparent substrates, be totally reflected in transparent substrates/Graphene/Air Interface, finally the light beam of reflection is utilized polarization beam apparatus beam splitting, the two kinds of polarized lights separated are radiated at two probes of balanced detector respectively;
Step 4: utilize balanced detector to gather voltage signal, parametric controller and balanced detector scan Graphene sample simultaneously, obtain the voltage signal of a series of facula position and balanced detector;
Step 5: difference voltage signal being converted to polarized light absorption rate, according to the design parameter (as prism, piezoid refractive index etc.) of measurement mechanism, utilizes Fresnel formula to calculate the difference of absorptivity corresponding to different number of plies Graphene;
Step 6: finally the difference and theoretical value of testing the absorptivity recorded are carried out contrasting thus obtained the number of plies of Graphene.
In such scheme, described described Graphene sample can obtain for chemical gaseous phase depositing process or be obtained by mechanical stripping method.
In such scheme, the transparent optical spectral limit of transparent substrates is visible waveband or near-infrared band, as rigid materials such as piezoids, or the flexible material such as polyethylene terephthalate (PET).
In such scheme, mobile platform can be the movement of one dimension or two-dimensional directional, thus obtains the topographical information of the Graphene number of plies.
The invention has the beneficial effects as follows:
(1) number of plies of Graphene in transparent substrates is measured accurately, be applicable to CVD and the standby Graphene sample of mechanical stripping legal system simultaneously;
(2) by the sample motion scan of one dimension or two dimension, linear array or the face system of battle formations picture of Graphene sample number of plies distribution can be obtained, to determine the homogeneity of Graphene.
Accompanying drawing explanation
Fig. 1 is schematic diagram of the present invention, light passes through prism, be totally reflected in the face at Graphene place, when light beam does not shine on Graphene (region I), the Change of absorption of emergent light two polarization directions is as broad as long, and the signal of absorbance difference is zero, when light beam irradiation is to Graphene (region III) or partial illumination to (region II) during Graphene, the absorption of different polarization changes, and the signal of absorbance difference strengthens.
The Graphene number of plies optical path figure that Fig. 2 is concrete.
The measurement result figure of Fig. 3 tri-layers and five layers of mechanical stripping Graphene sample.
Embodiment
Be described in detail of the present invention below in conjunction with drawings and Examples.Embodiment gives detailed embodiment and concrete operating process, but the present invention is not limited to following examples.
Embodiment 1
Measure the number of plies of three layers and five layers mechanical stripping Graphene in quartz substrate, comprise the following steps:
1) graphene film to be measured is transferred to piezoid;
2) by index-matching fluid, piezoid note is invested prism surface, piezoid does not have the one side of Graphene to contact with prism, index-matching fluid should with the refractive index close of prism;
3) light path is built as shown in Figure 2, sample is placed on micromotion platform, laser instrument (532nm) light beam is by producing circularly polarized light after slide, light beam (or through focusing on, the selection of condenser lens can be selected according to Graphene size) by prism, index-matching fluid and piezoid, be totally reflected in piezoid/Graphene/Air Interface, finally the light beam of reflection is utilized polarization beam apparatus beam splitting, the two kinds of polarized lights (TE and TM) separated are radiated on two probes of balanced detector respectively;
4) parametric controller and balanced detector scan Graphene sample simultaneously to utilize computing machine, obtain the voltage signal (as shown in Figure 1) of a series of facula position and balanced detector, the power P of the light beam that polarization beam apparatus separates is measured in the position position of I (in as the Fig. 1) not being irradiated to Graphene at hot spot before scanning
0(now P
0=P
tE=P
tM);
5) according to formula
voltage signal is converted to the difference Δ A of polarized light absorption rate by (wherein V and α is respectively voltage and the response of balanced detector);
6) according to the design parameter (as prism, piezoid refractive index etc.) of measurement mechanism, Fresnel formula is utilized to calculate Δ A corresponding to different number of plies Graphene;
7) finally the difference Δ A and theoretical value that test the absorptivity recorded are carried out contrasting thus obtain the number of plies (Fig. 3) of Graphene.
Claims (4)
1. a Graphene number of plies measuring method in transparent substrates, is characterized in that, comprise the following steps:
Step 1: Graphene is shifted or is directly prepared in transparent substrates;
Step 2: transparent substrates note is invested prism surface by index-matching fluid, transparent substrates does not have the one side of Graphene to contact with prism;
Step 3: the prism with Graphene is placed on mobile platform, light beam is by producing circularly polarized light after slide, by prism, index-matching fluid and transparent substrates, be totally reflected in transparent substrates/Graphene/Air Interface, finally the light beam of reflection is utilized polarization beam apparatus beam splitting, the two kinds of polarized lights separated are radiated at two probes of balanced detector respectively;
Step 4: utilize balanced detector to gather voltage signal, parametric controller and balanced detector scan Graphene sample simultaneously, obtain the voltage signal of a series of facula position and balanced detector;
Step 5: difference voltage signal being converted to polarized light absorption rate, according to the design parameter of measurement mechanism, utilizes Fresnel formula to calculate the difference of absorptivity corresponding to different number of plies Graphene;
Step 6: finally the difference and theoretical value of testing the absorptivity recorded are carried out contrasting thus obtained the number of plies of Graphene.
2. method according to claim 1, is characterized in that, described Graphene can obtain for chemical gaseous phase depositing process or be obtained by mechanical stripping method.
3. method according to claim 1, is characterized in that, the transparent optical spectral limit of described transparent substrates is visible waveband or near-infrared band.
4. method according to claim 1, is characterized in that, described mobile platform can be the movement of one dimension or two-dimensional directional, thus obtains the topographical information of the Graphene number of plies.
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| CN104819973B (en) * | 2015-04-01 | 2017-06-30 | 中国科学院半导体研究所 | A kind of method of the multi-layer graphene sample number of plies on test compound silicon substrate |
| CN105226127A (en) * | 2015-10-12 | 2016-01-06 | 南开大学 | A kind of graphene photodetector based on total internal reflection structure and preparation method thereof |
| CN108956547A (en) * | 2018-07-26 | 2018-12-07 | 同天（福建）石墨烯科技有限公司 | A method of graphene number of plies is detected using optical transmittance |
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| US6781692B1 (en) * | 2000-08-28 | 2004-08-24 | Therma-Wave, Inc. | Method of monitoring the fabrication of thin film layers forming a DWDM filter |
| CN102507875A (en) * | 2011-11-09 | 2012-06-20 | 复旦大学 | Method for quickly and nondestructively measuring thickness and band structure of graphene film |
| CN102692393A (en) * | 2012-06-15 | 2012-09-26 | 南开大学 | Graphene polarization effect based method and device for determining refractive index in real time |
| CN102854136A (en) * | 2012-09-07 | 2013-01-02 | 泰州巨纳新能源有限公司 | Method for determining number of layers and thickness of graphene by using optical microscope picture |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6781692B1 (en) * | 2000-08-28 | 2004-08-24 | Therma-Wave, Inc. | Method of monitoring the fabrication of thin film layers forming a DWDM filter |
| CN102507875A (en) * | 2011-11-09 | 2012-06-20 | 复旦大学 | Method for quickly and nondestructively measuring thickness and band structure of graphene film |
| CN102692393A (en) * | 2012-06-15 | 2012-09-26 | 南开大学 | Graphene polarization effect based method and device for determining refractive index in real time |
| CN102854136A (en) * | 2012-09-07 | 2013-01-02 | 泰州巨纳新能源有限公司 | Method for determining number of layers and thickness of graphene by using optical microscope picture |
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| Polarization-dependent optical absorption of graphene under total internal reflection;Ye,Qing等;《APPLIED PHYSICS LETTERS》;20130117;全文 * |
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