CN103465147B - A kind of roughening technique of IPMC material matrix film - Google Patents
A kind of roughening technique of IPMC material matrix film Download PDFInfo
- Publication number
- CN103465147B CN103465147B CN201310385815.1A CN201310385815A CN103465147B CN 103465147 B CN103465147 B CN 103465147B CN 201310385815 A CN201310385815 A CN 201310385815A CN 103465147 B CN103465147 B CN 103465147B
- Authority
- CN
- China
- Prior art keywords
- base film
- roughening
- ipmc
- film
- material matrix
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The invention discloses a kind of roughening technique of IPMC material matrix film, it is characterized in that, comprise: IPMC material is cut into one piece of base film and fits in a substrate by (1), and by the framework that an appearance and size is identical with base plate, base film periphery is fixed, lower portion and base film upper surface surround a cavity; (2) abrasive material is selected evenly to spread out on base film upper surface; (3) polishing is hammered into shape be placed in cavity base film upper surface, make tup lower surface parallel with base film upper surface and and abrasive contact, adopt balanced pressure repeatedly to pull the tup of polishing hammer, make abrasive material scraping base film upper surface, realize the roughening of base film one side; (4) take out base film, soak with the mixed solution of second alcohol and water, and ultrasonic process; (5) the roughening process of base film another side is carried out according to step (1) ~ (4).
Description
Technical field
The present invention relates to the surface roughening approach of ionic polymer metal composite material (Ionic Polymer-Metal Composites, IPMC material) base film.Be specifically related to a kind of diamond dust etc. of adopting as abrasive material, repeatedly polish on the surface to obtain the technique with certain roughness surface at IPMC material matrix film.
Background technology
Ion polymer-metal composite material (IPMC material) is a kind of typical ionic electroactive polymer, has sensing and actuation function simultaneously.Other same type of material relatively, IPMC material has the outstanding advantages such as quality is light, driving voltage is low, pliability is good, be swift in response, and therefore all presents wide application prospect in various fields such as Aero-Space, bionic mechanical, biomedical apparatus and MEMSs.
The processing step of preparation IPMC material mainly comprises base film roughening process, soaking and reducing plating and chemical plating.Base film roughening is the important process link of preparation IPMC material, and it all has remarkable impact to IPMC electrode shape and drive characteristic.Originally, the main purpose of polishing base film increases the adhesion strength between electrode layer and base film, avoids occurring electrode peeling phenomenon in use procedure.Found under study for action afterwards, the roughening of base film is formed with important function to good electrode layer.
At present, main in bibliographical information polishing mode has: sand papering, chemical attack, plasma etching, hot-pressing processing and blasting treatment.Use sand papering mode the earliest, this mode is simple, easy to operate, but grinding homogeneity difficulty controls, and cannot obtain uniform surface electrode, and easily be affected by human factors, and causes the material property difference of different batches comparatively large, affects IPMC material property.Bar-Cohen etc. adopt chemical mordant to carry out surface treatment to Nafion117 film, it improves Nafion membrane surface molecule active, enhance the adhesion strength of electrode, but because operating process is complicated, easily introduce other organic impurities, seldom see in current bibliographical information.Jun Kim etc. adopt plasma etching industrial to carry out roughening process to Nafion film surface, effectively improve the uniformity coefficient of material surface roughening, improve the driveability of IPMC material, but plasma mode etching mechanism is more complicated, processing area is limited, and expensive equipment, condition are harsh, are unfavorable for large-scale production; Noh, Chung and He etc. obtain the Nafion film with certain roughening degree by the mode making etched mold then hot pressing, the required precision of this mode to etched mold is higher, need to provide press device, easily cause Nafion film plastic deformation in Long Time Thermal pressure, and occur peeling with IPMC repetition drive electrode material that this prepares.As for the sandblasting roughening technique of Nafion film, equipment operating is simple, and technical maturity, roughened surface has uniformity statistically.Japan AIST(National Institute of Advanced Industrial Science andTechnology) make to polish in this way base film, the IPMC material electromechanical properties obtained are excellent, but bibliographical information is less, the design parameter of its blasting treatment cannot be known.The people such as domestic gold is peaceful, Chang Longfei, fourth great waves also did correlative study, owing to lacking comprehensively understanding to blasting craft, in sandblasting procedures, set pressure sand mold that is excessive or that select is improper, cause the grains of sand to be injected and remain in base film, thus damage is caused to base film, the IPMC material property of preparation is poor.
Summary of the invention
The object of this invention is to provide a kind of can realize IPMC material matrix film surface roughness quantification and the polishing process that controls of the uniformity, the adhesion strength between electrode layer and base film can be increased by the method, form good electrode layer simultaneously, thus the electromechanical properties of IPMC material are significantly improved.
For reaching above object, the present invention takes following technical scheme to be achieved:
A roughening technique for IPMC material matrix film, is characterized in that, comprise the steps:
(1) IPMC material is cut into one piece of periphery and leaves the base film that 0.5cm fixes surplus, fit in a substrate, and fixed by base film periphery by the framework that an appearance and size is identical with base plate, lower portion and base film upper surface surround a cavity;
(2) select granularity to be 400 ~ 1000 order abrasive materials, base film upper surface evenly spreads out, and the ratio of abrasive material quality and base film area is 3-5:1000(g/cm
2);
(3) polishing is hammered into shape be placed in cavity base film upper surface, make tup lower surface parallel with base film upper surface and and abrasive contact, adopt balanced pressure repeatedly to pull the tup of polishing hammer, make abrasive material scraping base film upper surface, realize the roughening of base film one side;
(4) take out the base film of this one side roughening, press with second alcohol and water the mass ratio of 1:1 mixed solution soak, and under 100% power ultrasonic process 30min;
(5) the roughening process of this base film another side is carried out according to step (1) ~ step (4).
In above-mentioned technique, described abrasive material is the one in diamond dust, Brown Alundum, bead, resin.Granularity is 800 orders.The described pressure adopting equilibrium is that the mass fixing different quality above tup realizes, and its force value is 1-3N/cm
2.The time controling of described one side roughening is in 10min.The profile of described base plate, framework adopts square, circular or polygon, and material adopts float glass, lucite or iron plate.
Compared with prior art, advantage of the present invention is, device is simple, can scale application, also can the use among a small circle in laboratory; The controlled of roughness and the uniformity can be realized in roughening process.
Accompanying drawing explanation
Fig. 1 is the easy device explosive view realizing present invention process.In figure: 1, dormant bolt, 2, polishing hammer, 3, framework, 4, base film, 5, base plate, 6, hex nut.
Fig. 2 is the base film surface topography photo of the abrasive material process of variable grain size.Wherein: (a) is 400 order results; (b) 600 order result; (c) 800 order result; (d) 1000 order result.
Fig. 3 is the displacement performance of prepared IPMC material.Wherein, (a) figure is the displacement performance under 2V direct current, and (b) figure is the displacement performance under 2V exchanges frequency sweep (frequency range: 0.1Hz-1Hz).
Detailed description of the invention
The basic step of roughening technique of the present invention is described, the IPMC material property situation of roughening effect and preparation below with the easy device shown in Fig. 1.
The easy device realizing present invention process comprises base plate 5, framework 3, polishing hammer 2 etc.Material that base plate uses is lucite, is of a size of 14 × 14cm
2square plate, flatness controls within 0.002mm, and ensure that base film 4 and plate upper surface have good laminating degree, standard is that after base film and base plate are fitted, centre does not have bubble.Base plate four angles have the through hole of Φ 6cm.Framework 3 has certain thickness rectangular cavity structure for inside, and material is identical with base plate, and external dimensions is consistent with base plate, and rectangular cavity size is 10 × 10cm
2, in order to fixing base film 4, handled base film cutting is of a size of 10.5 × 10.5cm
2.Again framework 3 is placed on substrate after base film 4 is fitted in substrate to push down the 0.5cm left on base film 4 four limit and fix surplus.By four dormant bolts 1, base plate and framework are fixed, ensure that fastening force is identical.Polishing hammer 2 is 2 × 2cm by size
2square (or circular) tup and connecting lever composition, hammer head material can adopt iron plate, animi resin or lucite.Base film is placed in after between base plate and framework, and base film and framework surround a cavity caved in, as the space of polishing hammer.The shape of base plate is not limited to square, also can be designed to circle, polygon etc., and its material is also not limited to lucite, and the material such as float glass, iron plate also can be adopted to make.
The roughening technique of IPMC material matrix film of the present invention
First, the easy device assembled (Fig. 1) is placed on a horizontal plane, and is fixed; Then, evenly spread out on the surface at base film 4 with the silicon carbide abrasive taking 0.5g, the ratio of abrasive material quality and base film area generally can at (3-5): 1000(g/cm
2), ensure that abrasive material is in the distribution of base film surface uniform, the very few or too much formation being all unfavorable for good roughened surface.Abrasive material is not only confined to diamond dust, also can be Brown Alundum, bead, resin etc.Then be put on the cavity endobasal-body film of depression by polishing hammer 2, guarantee tup lower surface, abrasive material contact completely with base film upper surface, adopt balanced pressure (1-3N/cm
2, 2N/cm
2the best, can adopt the mass fixing different quality above tup to carry out controlled pressure) tup of polishing and hammering into shape is repeatedly pulled by connecting lever, make abrasive material scraping base film upper surface realize the roughening of base film.In order to prevent polishing uneven, be parallel to framework, successively to frame center polishing, and ensure that polishing number of times is consistent, one side polishing time controling is in 10min.
Finally, soak the base film after milled processed with second alcohol and water in the mixed solution of 1:1 ratio, and ultrasonic process 30min under 100% power, through inspection, remain without abrasive material in base film.The present invention can adopt the abrasive material of four kinds of variable grain sizes to process base film, and granular size is respectively 400 orders, 600 orders, 800 orders and 1000 orders.Result as shown in Figure 2.
IPMC preparation and property is tested
IPMC preparation technology adopts patent document " preparation technology of palladium electrode type ion polymer-metal composite material " (application number: 201110085960.9) described method, ensures process consistency in preparation process.Performance test adopts patent document " ion polymer-metal composite material resultant force electric performance testing device ", and (application number: 201110002697.2) described device, the size of test sample, measuring point, retaining part identical length are same.The present embodiment tests direct current under the 2V voltage of prepared IPMC material and AC displacement performance.Behavior pattern as shown in Figure 3.
Composition graphs 2 and Fig. 3, different abrasive grains is different on the degree impact that base film is surface roughening, and particle is larger, and surface is more coarse.Carry out performance test to prepared IPMC material, test result shows, no matter be at direct current or under interchange, IPMC material displacement performance prepared by the base film of 800 order abrasive grain process is best.
Claims (7)
1. a roughening technique for IPMC material matrix film, is characterized in that, comprise the steps:
(1) IPMC material is cut into one piece of periphery and leaves the base film that 0.5cm fixes surplus, fit in a substrate, and fixed by base film periphery by the framework that an appearance and size is identical with base plate, lower portion and base film upper surface surround a cavity;
(2) select granularity to be 400 ~ 1000 object abrasive materials, base film upper surface evenly spreads out, and the ratio of abrasive material quality and base film area is 3-5:1000 (g/cm
2);
(3) polishing is hammered into shape be placed in cavity base film upper surface, make tup lower surface parallel with base film upper surface and and abrasive contact, adopt balanced pressure repeatedly to pull the tup of polishing hammer, make abrasive material scraping base film upper surface, realize the roughening of base film one side;
(4) take out the base film of this one side roughening, with second alcohol and water press 1:1 mass ratio mixed solution soak, and under 100% power ultrasonic process 30min;
(5) the roughening process of this base film another side is carried out according to step (1) ~ step (4).
2. the roughening technique of IPMC material matrix film as claimed in claim 1, it is characterized in that, described abrasive material is the one in diamond dust, Brown Alundum, bead, resin.
3. the roughening technique of IPMC material matrix film as claimed in claim 1, it is characterized in that, the granularity of described abrasive material is 800 orders.
4. the roughening technique of IPMC material matrix film as claimed in claim 1, is characterized in that, the described pressure adopting equilibrium is that the mass fixing different quality above tup realizes.
5. the roughening technique of IPMC material matrix film as claimed in claim 1, it is characterized in that, described pressure is 1-3N/cm
2.
6. the roughening technique of IPMC material matrix film as claimed in claim 1, it is characterized in that, the time controling of described one side roughening is in 10min.
7. the roughening technique of IPMC material matrix film as claimed in claim 1, is characterized in that, the profile of described base plate, framework adopts square or circular, and material adopts float glass, lucite or iron plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310385815.1A CN103465147B (en) | 2013-08-29 | 2013-08-29 | A kind of roughening technique of IPMC material matrix film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310385815.1A CN103465147B (en) | 2013-08-29 | 2013-08-29 | A kind of roughening technique of IPMC material matrix film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103465147A CN103465147A (en) | 2013-12-25 |
| CN103465147B true CN103465147B (en) | 2015-10-28 |
Family
ID=49790309
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310385815.1A Expired - Fee Related CN103465147B (en) | 2013-08-29 | 2013-08-29 | A kind of roughening technique of IPMC material matrix film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103465147B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108527830B (en) * | 2018-04-09 | 2020-03-27 | 合肥工业大学 | Microneedle-based automatic basement membrane roughening device and microneedle-based automatic basement membrane roughening method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005230957A (en) * | 2004-02-18 | 2005-09-02 | Institute Of Physical & Chemical Research | Linear moving artificial muscle actuator |
| CN101381866A (en) * | 2008-09-02 | 2009-03-11 | 西安交通大学 | Method for preparing ion polymer-metal composite material |
| KR20100013811A (en) * | 2008-08-01 | 2010-02-10 | 재단법인서울대학교산학협력재단 | Self-sensing ionic polymer-metal composite actuator |
| CN102116689A (en) * | 2011-01-07 | 2011-07-06 | 西安交通大学 | Device for testing comprehensive mechanical and electrical properties of ionic polymer-metal composite (IPMC) |
| CN102168260A (en) * | 2011-04-07 | 2011-08-31 | 西安交通大学 | Preparation process of palladium electrode ion polymer and metal composite |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050085925A1 (en) * | 2003-10-16 | 2005-04-21 | Mohsen Shahinpoor | Bio-Potential Activation of Artificial Muscles |
| US20100055378A1 (en) * | 2008-08-26 | 2010-03-04 | Snu R&Db Foundation | Encapsulated ionic polymer-metal composite device |
-
2013
- 2013-08-29 CN CN201310385815.1A patent/CN103465147B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005230957A (en) * | 2004-02-18 | 2005-09-02 | Institute Of Physical & Chemical Research | Linear moving artificial muscle actuator |
| KR20100013811A (en) * | 2008-08-01 | 2010-02-10 | 재단법인서울대학교산학협력재단 | Self-sensing ionic polymer-metal composite actuator |
| CN101381866A (en) * | 2008-09-02 | 2009-03-11 | 西安交通大学 | Method for preparing ion polymer-metal composite material |
| CN102116689A (en) * | 2011-01-07 | 2011-07-06 | 西安交通大学 | Device for testing comprehensive mechanical and electrical properties of ionic polymer-metal composite (IPMC) |
| CN102168260A (en) * | 2011-04-07 | 2011-08-31 | 西安交通大学 | Preparation process of palladium electrode ion polymer and metal composite |
Non-Patent Citations (5)
| Title |
|---|
| IPMC人工肌肉制备，改性和建模;江新民;《中国优秀硕士学位论文全文数据库信息科技辑》;20090615(第6期);全文 * |
| IPMC人工肌肉材料的制备、理论模型与分析;丁海涛;《中国优秀硕士学位论文全文数据库工程科技Ⅰ辑》;20110615(第6期);全文 * |
| IPMC柔性仿生驱动器的制备及性能测试;金宁;《中国优秀硕士学位论文全文数据库工程科技Ⅱ辑》;20111215(第s2期);全文 * |
| 人工肌肉(IPMC)的性能研究;沈辉;《中国优秀博硕士学位论文全文数据库(硕士)信息科技辑》;20061015(第10期);全文 * |
| 表面粗化工艺对IPMC的制备及性能的影响;金宁等;《功能材料》;20081130;第39卷(第11期);1933-1936 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103465147A (en) | 2013-12-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103983499B (en) | A kind of observational technique to zirconium-base amorphous alloy internal shear band | |
| Wang et al. | Material removal mechanism of sapphire substrates with four crystal orientations by double-sided planetary grinding | |
| CN104404414B (en) | A kind of 7075 aluminum alloy plate materials creep age forming methods | |
| CN103361601B (en) | A kind of method making surface enhanced Raman scattering substrate | |
| CN111235538B (en) | Preparation method of shape memory alloy-induced composite material capable of regulating flexoelectric effect | |
| CN103465147B (en) | A kind of roughening technique of IPMC material matrix film | |
| Wang et al. | How to determine surface roughness of copper substrate for robust pressureless sintered silver in air | |
| CN102522491B (en) | Polymer device with driving and sensing capability, preparation thereof and application thereof | |
| Wang et al. | Dynamic fracture behavior of piezoelectric ceramics under impact: force-electric response and electrical breakdown | |
| Kaule et al. | Improved mechanical strength and reflectance of diamond wire sawn multi-crystalline silicon wafers by inductively coupled plasma (ICP) etching | |
| CN108020774B (en) | Method for removing layer of small sample | |
| MY159267A (en) | Method for fabricating a three-dimensional thin-film semiconductor substrate from a template | |
| CN110967356A (en) | Method for improving surface quality of plastic metal electron back scattering diffraction sample | |
| Bag et al. | Effects of microcrack evolution on the electrical resistance of Cu thin films on flexible PI substrates during cyclic-bend testing | |
| Ma et al. | Deformation behavior of pure titanium foils in ultrasonic-assisted tensile forming process | |
| CN110055540A (en) | The method and surface of micro-nano structure tungsten material and its application with micro-nano structure are prepared in tungsten material surface | |
| CN111289317A (en) | Method for preparing micro EBSD sample by mechanical and electrolytic polishing | |
| KR101814105B1 (en) | Method for manufacturing highly oriented thermoelectric materials | |
| CN104694894A (en) | High-transmittance magnetic cobalt target and preparation method thereof | |
| Hasegawa et al. | Fabrication of multiferroic composite actuator material by combining superelastic TiNi filler and a magnetostrictive Ni matrix | |
| CN103498127B (en) | A kind of method applied double-ion beam coating technique and prepare W-Cr alloy layer in W surface | |
| CN102607953A (en) | Mechanics performance testing device used under condition of piezoelectric ceramic electromechanical coupling and method | |
| CN108470823A (en) | A kind of high-voltage electricity polar system for macromolecule membrane | |
| CN219245155U (en) | Pressure-controllable ultrahigh vacuum sample holder for in-situ characterization | |
| Martınez-Paneda | Modelling plasticity at the micron scale |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151028 Termination date: 20180829 |