CN103432871A - Elution treatment equipment and process for tail gas generated during production of polycrystalline silicon - Google Patents
Elution treatment equipment and process for tail gas generated during production of polycrystalline silicon Download PDFInfo
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- CN103432871A CN103432871A CN2013104044095A CN201310404409A CN103432871A CN 103432871 A CN103432871 A CN 103432871A CN 2013104044095 A CN2013104044095 A CN 2013104044095A CN 201310404409 A CN201310404409 A CN 201310404409A CN 103432871 A CN103432871 A CN 103432871A
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Abstract
The invention provides elution treatment equipment and process for tail gas generated during production of polycrystalline silicon. The elution treatment equipment comprises a tail gas elution tower for eluting the tail gas, a hydrolyzing tank, a neutralizing tank and a dreg scraping machine, wherein the hydrolyzing tank is connected with the tail gas elution tower and is used for accepting wastewater discharged from the tail gas elution tower; the neutralizing tank is connected with the hydrolyzing tank; the dreg scraping machine is movably arranged above the hydrolyzing tank and is used for automatically scraping dreg floated on the surface of the wastewater in the hydrolyzing tank into the neutralizing tank. Therefore, the dreg floated on the surface of the wastewater and dreg generated by eluting the tail gas generated in the production process of the neutralizing tank can be treated effectively and automatically; a low-efficiency collection manner of manually fishing in a traditional process is changed and the high-strength work of workers is improved.
Description
Technical field
The present invention relates to technical field of polysilicon production, relate to particularly a kind of drip washing treatment facility and treatment process of producing the tail gas of polysilicon generation.
Background technology
The tail gas that utilizes trichlorosilane reduction to generate to produce in the polysilicon process usually need to be after water wash qualified discharge.But, floating a large amount of slag (SiO in the waste water after drip washing
2, be commonly called as Bai Tan ?).The very little genus nanoscale of the particle diameter of slag, the firm drip washing of water gets off to swim in the water surface.A large amount of slags often stops up water pump and pipeline in course of conveying.For this reason, adopt at present artificial mode of salvaging to collect the slag in waste water.Yet adopt artificial the salvaging, artificial conveyance, required workman is more, and labor strength is larger, and work situation is poor, and requisite space is large.
Drip washing treatment facility and the treatment process of the tail gas that thus, the production polysilicon produces have much room for improvement.
Summary of the invention
The present invention is intended to solve at least to a certain extent one of above-mentioned technical problem of the prior art.For this reason, the object of the invention is to propose a kind of drip washing treatment facility and technique of producing the tail gas of polysilicon generation.Utilization is the technique according to the embodiment of the present invention according to the equipment of the embodiment of the present invention, can effectively process the tail gas that production of polysilicon produces, and has improved the efficiency that polysilicon tail gas is processed, and has saved hand labor intensity, has improved work situation.
Proposed a kind of drip washing treatment facility of producing the tail gas of polysilicon generation according to the embodiment of first aspect present invention, having comprised: for the tail gas eluting column of drip washing tail gas; Hydrolytic tank, described hydrolytic tank is connected with described tail gas eluting column, for receiving the waste water of discharging from described tail gas eluting column; Neutralization chamber, described neutralization chamber is connected with described hydrolytic tank; And Slag Scraping Device, described Slag Scraping Device is arranged on described hydrolytic tank top movably, for the slag of the waste water surface flotation by described hydrolytic tank, scrapes in described neutralization chamber.
The drip washing treatment facility of the tail gas produced according to the production polysilicon of the embodiment of the present invention, the slag that swims in the waste water surface that the tail gas automatically produced in process for producing polysilicon process generates through drip washing, not only can effectively collect produced waste residue, improved the efficiency that polysilicon tail gas is processed, and thoroughly changed traditional handicraft and adopted the artificial poor efficiency collection mode of salvaging, improved workman's highly intensive labour.
Preferably, be provided with agitating device in described neutralization chamber.Can improve thus efficiency and the effect of neutralization reaction.
Preferably, described agitating device stretches into described neutralization chamber downwards from the top of described neutralization chamber.
Preferably, the bottom of described neutralization chamber is provided with slag notch, and described slag notch is connected with pulp pump.
Be deposited in the bottom of neutralization chamber through the waste residue of neutralization reaction, by the bottom at described neutralization chamber, be provided with slag notch, and utilize the pulp pump of described slag notch connection can effectively shift the waste residue through neutralization, thereby be conducive to the follow-up further processing to waste residue.
The drip washing treatment facility of the tail gas that preferably, described production polysilicon produces further comprises the filter press be connected with described pulp pump.
Because the waste residue through neutralization reaction contains moisture, utilize the filter press be connected with pulp pump the waste residue through neutralisation treatment can be delivered to filter press through pulp pump and carry out processed, thereby effectively improve the efficiency of processing waste residue.
Preferably, described neutralization chamber and described hydrolytic tank are integrally formed.Thus, in the production polysilicon tail gas of drip washing can directly be transferred to integrally formed neutralization chamber by Slag Scraping Device by the nanoscale waste residue of floating on water after fully being hydrolyzed in hydrolytic tank, avoided retaining and losing of middle waste residue, can as much as possible the waste residue produced through hydrolysis in this device systems be carried out to neutralization reaction, and then improve the treatment effeciency of producing polysilicon tail gas.
Preferably, described neutralization chamber top is provided with for the lime automatic powder adding being added to the nertralizer adding set in neutralization chamber.
In neutralization chamber, be the neutralization reaction of utilizing nertralizer lime and the waste residue generated through hydrolysis to carry out, by the nertralizer adding set arranged, can evenly effectively add in neutralization chamber by nertralizer lime in, thereby improve the efficiency that neutralization reaction is carried out.
Provide a kind of drip washing treatment process of producing the tail gas of polysilicon generation according to the embodiment of second aspect present invention, comprised the following steps: the tail gas of producing the polysilicon generation is carried out to drip washing; The waste water that drip washing is obtained is transported to hydrolytic tank; Utilize Slag Scraping Device that the slag of the waste water surface flotation in hydrolytic tank is scraped in neutralization chamber; Scrape the slag in neutralization chamber with input lime neutralization in neutralization chamber.
The drip washing treatment process of the tail gas produced according to the production polysilicon of the embodiment of the present invention, the slag that swims in the waste water surface that the tail gas effectively automatically produced in process for producing polysilicon process generates through drip washing, not only can effectively collect produced waste residue thus, improved the efficiency that polysilicon tail gas is processed, and thoroughly changed traditional handicraft and adopted the artificial poor efficiency collection mode of salvaging, improved workman's highly intensive labour.
The drip washing treatment process of the tail gas that preferably, described production polysilicon produces further comprises the slag after neutralization is transported to after filter press dewaters to give up to be processed admittedly; Delivering to waste water treatment plant with the waste water by hydrolytic tank is processed.
Thus, the processing and utilizing filter press carries out the waste residue of processed effectively, and because this waste residue has passed through neutralisation treatment, can meet the requirement of environmental protection to its solid processing of giving up; In addition the waste water in hydrolytic tank is delivered to waste water treatment plant and processed the purpose that can reach the Efficient Cycle utilization, saved the energy.
Preferably, in and in the process of slag, stir simultaneously.Improve thus neutralization.
Additional aspect of the present invention and advantage part in the following description provide, and part will become obviously from the following description, or recognize by practice of the present invention.
The accompanying drawing explanation
Above-mentioned and/or additional aspect of the present invention and advantage are from obviously and easily understanding becoming the description of embodiment in conjunction with following accompanying drawing, wherein:
Fig. 1 is the schematic diagram according to the drip washing treatment facility of the tail gas of the production polysilicon generation of the embodiment of the present invention.
Fig. 2 is the schematic flow sheet according to the drip washing treatment process of the tail gas of the production polysilicon generation of the embodiment of the present invention.
Reference numeral: 100: tail gas eluting column; 200: hydrolytic tank; 300: neutralization chamber; 400: Slag Scraping Device; 500: agitating device; 600: slag notch; 700: the nertralizer adding set.
The specific embodiment
Below describe embodiments of the invention in detail, the example of described embodiment is shown in the drawings, and wherein same or similar label means same or similar element or the element with identical or similar functions from start to finish.Be exemplary below by the embodiment be described with reference to the drawings, be intended to for explaining the present invention, and can not be interpreted as limitation of the present invention.
In description of the invention, it will be appreciated that, term " " center ", " vertically ", " laterally ", " length ", " width ", " thickness ", " on ", D score, " front ", " afterwards ", " left side ", " right side ", " vertically ", " level ", " top ", " end ", " interior ", " outward ", " clockwise ", orientation or the position relationship of indications such as " counterclockwise " are based on orientation shown in the drawings or position relationship, only the present invention for convenience of description and simplified characterization, rather than device or the element of indication or hint indication must have specific orientation, with specific orientation structure and operation, therefore can not be interpreted as limitation of the present invention.
In the present invention, unless otherwise clearly defined and limited, broad understanding should be done in the terms such as term " installation ", " being connected ", " connection ", " fixing ", for example, can be to be fixedly connected with, and can be also to removably connect, or be integral; Can be mechanical connection, can be also to be electrically connected to; Can be directly to be connected, also can indirectly be connected by intermediary, can be the connection of two element internals or the interaction relationship of two elements.For the ordinary skill in the art, can understand as the case may be above-mentioned term concrete meaning in the present invention.
In the present invention, unless otherwise clearly defined and limited, First Characteristic Second Characteristic it " on " or D score can comprise that the first and second features directly contact, also can comprise that the first and second features are not directly contacts but by the other feature contact between them.And, First Characteristic Second Characteristic " on ", " top " and " above " comprise First Characteristic directly over Second Characteristic and oblique upper, or only mean that the First Characteristic level height is higher than Second Characteristic.First Characteristic Second Characteristic " under ", " below " and " below " comprise First Characteristic under Second Characteristic and tiltedly, or only mean that the First Characteristic level height is less than Second Characteristic.
At first the drip washing treatment facility of the tail gas that the production polysilicon according to the embodiment of the present invention produces is below described with reference to figure 1.The drip washing treatment facility of the tail gas produced according to the production polysilicon of the embodiment of the present invention comprises: tail gas eluting column 100, hydrolytic tank 200, neutralization chamber 300 and Slag Scraping Device 400.
Tail gas eluting column 100 produces for drip washing the tail gas that polysilicon produces, and for example the tail gas import of tail gas eluting column 100 can be connected with the tail gas outlet of reacting furnace (not shown).
Hydrolytic tank 200 is connected with tail gas eluting column 100, for receiving the waste water of discharging from tail gas eluting column 100.Here, be connected and should make broad understanding, as long as the waste water that tail gas eluting column 100 is discharged can be transported to hydrolytic tank 200, for example the wastewater discharge pipe of tail gas eluting column 100 can directly be inserted in hydrolytic tank 200, or the waste water that tail gas eluting column 100 is discharged flows in hydrolytic tank 200 by raceway groove.
Neutralization chamber 300 is connected with hydrolytic tank 200.Slag Scraping Device 400 is arranged on hydrolytic tank 200 tops movably, with the slag of the waste water surface flotation by hydrolytic tank 200, scrapes in neutralization chamber 300.For example, at the top of hydrolytic tank 200, guide rail is set, Slag Scraping Device 400 is removable along guide rail, and the scum board of Slag Scraping Device 400 extend in hydrolytic tank 200, with the slag by the waste water surface flotation, scrapes in neutralization chamber 300.Preferably, a plurality of Slag Scraping Devices 400 can be set, a plurality of Slag Scraping Devices 400 can move abreast.
The drip washing treatment facility of the tail gas produced according to the production polysilicon of the embodiment of the present invention, effectively automatically, the slag that swims in the waste water surface that the tail gas produced in process for producing polysilicon process generates through drip washing, not only can effectively collect produced waste residue, improved the efficiency that polysilicon tail gas is processed, and thoroughly changed traditional handicraft and adopted the artificial poor efficiency collection mode of salvaging, improved workman's highly intensive labour.
According to embodiments of the invention, the position of neutralization chamber 300 also is not particularly limited, as long as the slag that can receive Slag Scraping Device 400 to collect from hydrolytic tank 200.According to concrete example of the present invention, neutralization chamber 300 is arranged on the downstream of hydrolytic tank 200, and neutralization chamber 300 and hydrolytic tank 200 integrally formed, for example by partition wall, a pond is separated out to neutralization chamber 300 and hydrolytic tank 200.
Thus, production polysilicon tail gas through drip washing can be in directly scraping neutralization chamber by Slag Scraping Device by the nanoscale waste residue of floating on water after fully being hydrolyzed in hydrolytic tank, avoid retaining and losing of middle waste residue, improved the treatment effeciency of producing polysilicon tail gas.
In concrete examples more of the present invention, be provided with agitating device 500 in neutralization chamber 300, agitating device 500 stretches into neutralization chamber 300 downwards from the top of neutralization chamber 300.Can improve efficiency and the effect of neutralization chamber 300 inner neutralization reactions by agitating device.
In another concrete example of the present invention, the bottom of neutralization chamber 300 is provided with slag notch 600, and slag notch 600 is connected with pulp pump.Be deposited in the bottom of neutralization chamber 300 through the waste residue of neutralization reaction, discharge waste residue by pulp pump from slag notch 600, so that waste residue is carried out to subsequent treatment.
According in some embodiments of the present invention, preferably, neutralization chamber 300 tops are provided with for the lime automatic powder adding being added to the nertralizer adding set 700 in neutralization chamber 300, and nertralizer adding set 700 can automatically join lime in neutralization chamber 300.According to embodiments of the invention, can further be provided for controlling the control module that nertralizer adding set 700 adds the flow of nertralizer, with control in the unit interval, add in and dosage, thereby control the degree that neutralization reaction is carried out, thereby not only improve the efficiency of neutralization reaction and guarantee that the safety of neutralization reaction carries out, avoid producing local vigorous reaction and the danger that causes.
According to embodiments of the invention, the waste residue of discharging in neutralization chamber 300 can be delivered to the processing that useless solid treatment plant is met the environmental emission standard.Preferably, at first the waste residue of discharging from the slag notch 600 of neutralization chamber 300 by pulp pump is carried out to processed, so that the moisture of going out in waste residue.For example, can utilize the filter press be connected with described pulp pump to carry out processed.
Below with reference to Fig. 2 and describe the drip washing treatment process of the tail gas that the production polysilicon according to the embodiment of the present invention produces in conjunction with Fig. 1.The drip washing treatment process of the tail gas produced according to the production polysilicon of the embodiment of the present invention comprises the following steps: to producing the tail gas that polysilicon produces, carry out drip washing; The waste water that drip washing is obtained is transported to hydrolytic tank; Utilize Slag Scraping Device automatically to scrape in neutralization chamber by the slag of the waste water surface flotation in hydrolytic tank; With in neutralization chamber, throw in lime with in and slag in neutralization chamber.
The drip washing treatment process of the tail gas produced according to the production polysilicon of the embodiment of the present invention, the slag that swims in the waste water surface that the tail gas effectively automatically produced in process for producing polysilicon process generates through drip washing, not only can effectively collect produced waste residue thus, improved the efficiency that polysilicon tail gas is processed, and thoroughly changed traditional handicraft and adopted the artificial poor efficiency collection mode of salvaging, improved workman's highly intensive labour.
More specifically, the tail gas of producing polysilicon at first in the tail gas eluting column by drip washing, the waste water that drip washing produces is discharged in hydrolytic tank by the tail gas eluting column, the waste water surface flotation has a large amount of slags; Waste water hydrolysis through the sufficient time in hydrolytic tank 200 also can produce a large amount of slags and swim in the hydrolytic tank surface.
The driving Slag Scraping Device moves, thereby the slag that will swim in the waste water surface scrapes and is positioned at the dirty neutralization chamber of hydrolytic tank.The very little nano level slag of genus of particle diameter that utilizes Slag Scraping Device efficiently automatically to collect to swim in the hydrolytic tank surface; and avoided conveyance conduit is set and the water pump that easily causes and the blockage problem of pipeline; also saved the labour that Traditional Man is salvaged collection mode; and then improved the efficiency of process for producing polysilicon tail gas; save manpower, and reached the purpose of protection of the environment.
According to embodiments of the invention, the drip washing treatment process of the tail gas that described production polysilicon produces further comprises the slag after neutralization is transported to after filter press dewaters to give up to be processed admittedly; Delivering to waste water treatment plant with the waste water by hydrolytic tank is processed.Thus, the processing and utilizing filter press carries out the waste residue of processed effectively, and because this waste residue has passed through neutralisation treatment, can meet the requirement of environmental protection to its solid processing of giving up; In addition the waste water in hydrolytic tank is delivered to waste water treatment plant and processed the purpose that can reach the Efficient Cycle utilization, saved the energy.
In some embodiments of the invention, in and in the process of slag, stir simultaneously, to improve efficiency and the effect of neutralization.
In the description of this specification, the description of reference term " embodiment ", " some embodiment ", " example ", " concrete example " or " some examples " etc. means to be contained at least one embodiment of the present invention or example in conjunction with specific features, structure, material or the characteristics of this embodiment or example description.In this manual, to the schematic statement of above-mentioned term not must for be identical embodiment or example.And the specific features of description, structure, material or characteristics can be with suitable mode combinations in any one or more embodiment or example.In addition, those skilled in the art can be engaged different embodiment or the example described in this specification and combined.
Although the above has illustrated and has described embodiments of the invention, be understandable that, above-described embodiment is exemplary, can not be interpreted as limitation of the present invention, and those of ordinary skill in the art can be changed above-described embodiment within the scope of the invention, modification, replacement and modification.
Claims (10)
1. a drip washing treatment facility of producing the tail gas of polysilicon generation, is characterized in that, comprising:
Tail gas eluting column for drip washing tail gas;
Hydrolytic tank, described hydrolytic tank is connected with described tail gas eluting column, for receiving the waste water of discharging from described tail gas eluting column;
Neutralization chamber, described neutralization chamber is connected with described hydrolytic tank; With
Slag Scraping Device, described Slag Scraping Device is arranged on described hydrolytic tank top movably, for the slag of the waste water surface flotation by described hydrolytic tank, automatically scrapes in described neutralization chamber.
2. the drip washing treatment facility of the tail gas that production polysilicon according to claim 1 produces, is characterized in that, in described neutralization chamber, is provided with agitating device.
3. the drip washing treatment facility of the tail gas that production polysilicon according to claim 2 produces is characterized in that described agitating device stretches into described neutralization chamber downwards from the top of described neutralization chamber.
4. the drip washing treatment facility of the tail gas produced according to the described production polysilicon of any one in claim 1-3 is characterized in that the bottom of described neutralization chamber is provided with slag notch, and described slag notch is connected with pulp pump.
5. the drip washing treatment facility of the tail gas that production polysilicon according to claim 4 produces, is characterized in that, also comprises the filter press be connected with described pulp pump.
6. the drip washing treatment facility of the tail gas produced according to the described production polysilicon of any one in claim 1-5 is characterized in that described neutralization chamber and described hydrolytic tank are integrally formed.
7. the drip washing treatment facility of the tail gas produced according to the production polysilicon described in claim 6, is characterized in that, described neutralization chamber top is provided with for the lime automatic powder adding being added to the nertralizer adding set in neutralization chamber.
8. a drip washing treatment process of producing the tail gas of polysilicon generation, is characterized in that, comprises the following steps:
The tail gas of producing the polysilicon generation is carried out to drip washing;
The waste water that drip washing is obtained is transported to hydrolytic tank;
Utilize Slag Scraping Device automatically to scrape in neutralization chamber by the slag of the waste water surface flotation in hydrolytic tank; With
To throw in neutralization chamber lime with in and slag in neutralization chamber.
9. the drip washing treatment process of the tail gas that production polysilicon according to claim 8 produces, is characterized in that, also comprises:
Slag after neutralization is transported to after filter press dewaters to solid processing of giving up; With
Waste water in hydrolytic tank is delivered to waste water treatment plant to be processed.
10. the drip washing treatment facility of the tail gas that production polysilicon according to claim 8 produces, is characterized in that, in and in the process of slag, stir simultaneously.
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| CN2013104044095A CN103432871A (en) | 2013-09-06 | 2013-09-06 | Elution treatment equipment and process for tail gas generated during production of polycrystalline silicon |
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| CN2013104044095A CN103432871A (en) | 2013-09-06 | 2013-09-06 | Elution treatment equipment and process for tail gas generated during production of polycrystalline silicon |
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| CN2013104044095A Pending CN103432871A (en) | 2013-09-06 | 2013-09-06 | Elution treatment equipment and process for tail gas generated during production of polycrystalline silicon |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110734072A (en) * | 2018-07-19 | 2020-01-31 | 新特能源股份有限公司 | Method and device for recycling solid slag waste in polycrystalline silicon production |
| CN111393190A (en) * | 2019-06-28 | 2020-07-10 | 亚洲硅业(青海)股份有限公司 | Method for preparing liquid silicon fertilizer by using waste materials and prepared liquid silicon fertilizer |
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Application publication date: 20131211 |