CN103390691B - A kind of double-deck guipure for chain type diffusion furnace - Google Patents
A kind of double-deck guipure for chain type diffusion furnace Download PDFInfo
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- CN103390691B CN103390691B CN201310280797.0A CN201310280797A CN103390691B CN 103390691 B CN103390691 B CN 103390691B CN 201310280797 A CN201310280797 A CN 201310280797A CN 103390691 B CN103390691 B CN 103390691B
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention discloses a kind of double-deck guipure for chain type diffusion furnace, the described double-deck guipure for chain type diffusion furnace comprise install around successively drive roll, support on sliver, guide pulley, reversing drum and back-up roller can the transporting reticulation belt that rotates of closed loop; Be piece mouth outside one end of described support sliver, this piece mouth is provided with the silicon chip conveyer belt for accepting silicon chip on transporting reticulation belt; The described drive roll rotated is driven to drive described transporting reticulation belt closed loop to rotate by drive unit; Described transporting reticulation belt is the Dual-layer guipure that can transmit two-layer silicon chip.Adopt invention to be used for the diffusing procedure of silicon chip, adopt Dual-layer conveying silicon chip, can farthest play equipment potential, enhance productivity.
Description
Technical field
The present invention relates to the key equipment that solar cell manufactures, specifically refer to the transmission mechanism of the chain type diffusion furnace adopting double-deck guipure.
Background technology
Solar cell is the device that solar energy is converted into electric energy by a kind of photovoltaic effect, and silica-based solar cell becomes the main product in market with the technique of its maturation and high conversion efficiency.Its main operation principle of silica-based solar cell is matrix with silicon, utilizes the impurity of diffusion technology doped with boron, phosphorus in the base, form the core devices P-N junction of solar cell.When illumination is in P-N junction, form new hole, under the electric field action in P-N junction, hole flows to P district by N district, and electronics flows to N district by P district, forms electrical potential difference, connects circuit and forms solar cell.Along with the whole development of photovoltaic industry technology and the maturation of application market, market competition becomes a flash point increasingly, manufacture of solar cells enterprise only try one's best compression production cost could survive in the market competition of fierceness.Diffusion furnace produces the technological equipment of most critical as silica-based solar cell, and maximum excavating equipment potential, enhances productivity.Reduce the production cost of solar cell, become the core competitiveness important channel of improving enterprise.
Summary of the invention
An urgent demand of manufacture of solar cells cost is reduced for current photovoltaic enterprise, the present invention aims to provide a kind of double-deck guipure for chain type diffusion furnace, the drive system that this double-deck guipure matches in conjunction with it, in the production process of solar cell, utilizes double-deck guipure, levels carries processing silicon chip simultaneously, at identical conditions, the input increasing silicon chip is produced, and improves the utilance of equipment, increase substantially production efficiency, reduce the production cost of solar cell.
To achieve these goals, the technical solution adopted in the present invention is: a kind of double-deck guipure for chain type diffusion furnace, its design feature is, comprise install around successively drive roll, support on sliver, guide pulley, reversing drum and back-up roller can the transporting reticulation belt that rotates of closed loop; Be piece mouth outside one end of described support sliver, this piece mouth is provided with the silicon chip conveyer belt for accepting silicon chip on transporting reticulation belt; The described drive roll rotated is driven to drive described transporting reticulation belt closed loop to rotate by drive unit; Described transporting reticulation belt is the Dual-layer guipure that can transmit two-layer silicon chip.
Be below the technical scheme of further improvement of the present invention:
Preferably, in order to ensure that transporting reticulation belt is in tensioned state always, conveniently pass sheet, described transporting reticulation belt side is provided with the strainer of this transporting reticulation belt of tensioning.Further, the described strainer be arranged between drive roll and reversing drum comprises driving cylinder, guide holder and belt tensioning drum; Described driving cylinder can drive belt tensioning drum to move along the guide groove direction of guide holder.
Preferably, as a kind of specific constructive form of Dual-layer guipure, described transporting reticulation belt is provided with multiple support be vertically arranged on transporting reticulation belt; Line space between adjacent two support bottoms is greater than the length of side of silicon chip, and the line space between adjacent two cantilever tip is less than the length of side of silicon chip; Described guide pulley, reversing drum and back-up roller are equipped with the groove be convenient to support and passed through.
Further, the line-spacing between adjacent two cantilever tip is 1/4 ~ 1/3 of the length of side of silicon chip.
Further, support can be arranged to the multiple row be distributed on along transmission length direction on transporting reticulation belt, column pitch between described adjacent two support bottoms is greater than the length of side of silicon chip, column pitch between adjacent two cantilever tip is less than the length of side of silicon chip, can ensure that lower floor's guipure conveniently places silicon chip, and the silicon chip of upper strata guipure does not fall down.
According to embodiments of the invention, described support comprises six row, and outermost two row supports are the end support of inverted L-shaped, and middle four lines support is T-shaped intermediate support.
In order to realize load on transporting reticulation belt rapidly, be CD feeding port outside the other end of described support sliver, this CD feeding port place is provided with the sucker mechanical hand be placed on by silicon chip on transporting reticulation belt.
Below the present invention is explained in detail.
The double-deck guipure of described chain type diffusion furnace of the present invention comprises the transporting reticulation belt installing around respectively and operate in drive roll, support sliver, guide pulley, reversing drum, belt tensioning drum and back-up roller cocycle.Be arranged between drive roll and reversing drum by the strainer tensioning transporting reticulation belt driving cylinder, guide holder and belt tensioning drum to form, drive motors main shaft is connected with drive roll through transmission mechanisms such as reductors, relies on the stiction between drive roll and transporting reticulation belt to provide power for system operates; The path that drive roll, guide pulley and reversing drum controls transfer guipure run; Support sliver and back-up roller support the running of transporting reticulation belt according to predetermined path steady and smooth.
Operation principle of the present invention is that the outer surface of described guipure often arranges an end support in row both sides respectively, and centre arranges four intermediate supports, and the surface of cantilever tip and guipure forms the double-deck guipure simultaneously can carrying silicon chip up and down.According to guipure width and die size set corresponding line-spacing, row apart from and the quantity of every interline support, support as requested evenly the distribution of rule whole piece guipure is set.Install by the strainer driving cylinder, guide holder and belt tensioning drum to form between drive roll and reversing drum, increase the cornerite between foraminous conveyer and drive roll, adjustable pretightning force is provided; Drive motors drives drive roll to rotate by transmission mechanism, and drive roll relies on stiction to drive transporting reticulation belt to do cycle operation along guide pulley, support sliver, drive roll, belt tensioning drum, reversing drum, back-up roller and reversing drum direction.Load adopts sucking disc type mechanical hand load, and when judging that the loading position of transporting reticulation belt rotation direction entrance does not have end support and intermediate support to interfere, sucking disc type mechanical hand carries out lower floor's load along transporting reticulation belt rotation direction rapidly, and guipure upper strata load is unrestricted; Sheet got by the unified silicon chip conveyer belt that adopts of Qu Pian mechanism levels.
Thus, the stiction between drive roll and transporting reticulation belt is relied on to provide power for system operates; The path that drive roll, guide pulley and reversing drum controls transfer guipure run; Support sliver and back-up roller support the running of transporting reticulation belt according to predetermined path steady and smooth.Described transporting reticulation belt is evenly arranging multiple support at its outer surface line-spacing as requested with row distance, and the surface of cantilever tip and guipure forms the double-deck guipure simultaneously can carrying silicon chip up and down; Install by the strainer driving cylinder, guide holder and belt tensioning drum to form between drive roll and reversing drum, increase the cornerite between foraminous conveyer and drive roll, adjustable pretightning force is provided; Load adopts sucking disc type mechanical hand load, and when judging that the loading position of transporting reticulation belt rotation direction entrance does not have end support and intermediate support to interfere, sucking disc type mechanical hand carries out lower floor's load along transporting reticulation belt rotation direction rapidly, and guipure upper strata load is unrestricted; Sheet got by the unified silicon chip conveyer belt that adopts of Qu Pian mechanism levels.Adopt invention to be used for the diffusing procedure of silicon chip, adopt Dual-layer conveying silicon chip, can farthest play equipment potential, enhance productivity.
Compared with prior art, the invention has the beneficial effects as follows: double-deck guipure of the present invention combines suitable transmission mechanism, under equal conditions increased considerably the production quantity of silicon chip, given full play to the potential of equipment, improve production efficiency.
Below in conjunction with drawings and Examples, the present invention is further elaborated.
Accompanying drawing explanation
Fig. 1 is the structure principle chart of one embodiment of the invention;
Fig. 2 is the cross section structure schematic diagram that in Fig. 1 shown device, transporting reticulation belt installs around guide pulley;
Fig. 3 is the structural representation of transporting reticulation belt support in Fig. 2 shown device;
Fig. 4 is the cross section structure schematic diagram that in Fig. 1 shown device, transporting reticulation belt installs around back-up roller;
Fig. 5 is the structural representation of strainer in Fig. 1 shown device.
In the drawings
1-silicon chip conveyer belt; 2-silicon chip; 3-drive roll; 4-transporting reticulation belt;
5-supports sliver; 6-sucking disc type mechanical hand; 7-guide pulley; 8-reversing drum;
9-back-up roller; 10-guide holder; 11-belt tensioning drum; 12-drives cylinder;
13-drive motors; 4-guipure; 15-intermediate support; 16-end support;
17-rolling bearing units; The narrow groove of 18-; 19-sipes.
Embodiment
A kind of double-deck guipure for chain type diffusion furnace, as shown in Figure 1, the transporting reticulation belt 4 installing around at entrance guide pulley 7, support sliver 5, export closed circulation running on drive roll 3, belt tensioning drum 11, reversing drum 8, back-up roller 9 and reversing drum 8 is comprised.Described transporting reticulation belt 4 as shown in Figure 2 by end support 16 and and intermediate support 15 be evenly arranged on guipure 4 outer surface form can respectively guipure 4 outer surface and support 15,16 top transmission silicon chip double-deck guipure; The strainer be arranged between drive roll 3 and reversing drum 8 is made up of driving cylinder 12, guide holder 10 and belt tensioning drum 11 as shown in Figure 5; The surperficial relevant position of back-up roller 9 as shown in Figure 4 and belt tensioning drum 11 as shown in the figure must process and can hold end support 16 and the smooth and easy narrow groove 18 that passes through of intermediate support 15 and sipes 19.
Described transporting reticulation belt 4 a kind of embodiment structural representation as shown in Figure 2, it comprises guipure 4, intermediate support 15 and end support 16, and the structure of support 15,16 is as shown in Figure 3.Along guipure 4 rotation direction, end support 16 and intermediate support 15 in column evenly arrange welding according to specific line-spacing and row apart from embarking on journey.Often row comprises both sides and is oppositely arranged two end supports 16 and four intermediate supports, row between support 15,16 are apart from the length of side that should be greater than silicon chip, the tip edge distance of adjacent two supports is less than the silicon chip length of side, line-spacing between 1/4 of the length of side of silicon chip and 1/3, should ensure normal handling and the transmission of silicon chip.
When in example of the present invention shown in Fig. 1, transporting reticulation belt 4 installs around back-up roller 9 and belt tensioning drum 11 respectively, its outer surface pastes mutually, in order to avoid interfering, for back-up roller 9 as shown in Figure 4 with belt tensioning drum 11 as shown in Figure 5 relevant position processing can hold end support 16 and the smooth and easy narrow groove 18 that passes through of intermediate support 15 and sipes 19.
In example of the present invention shown in Fig. 1, the strainer of transporting reticulation belt is by being made up of driving cylinder 12, guide holder 10 and belt tensioning drum 11 as shown in Figure 5, driving cylinder 12 provides the adjustable actuating force needed for strainer, belt tensioning drum 11 is moved along the guide groove direction of guide holder 10, and belt tensioning drum 11 compresses transporting reticulation belt 4 for itself and drive roll 3 provides enough pretightning forces.
Specific embodiment of the invention process is adjustable actuating force that driving cylinder 12 provides needed for strainer, belt tensioning drum 11 is moved along the guide groove direction of guide holder 10, and belt tensioning drum 11 compresses transporting reticulation belt 4 for itself and drive roll 3 provides enough pretightning forces; Drive motors 13 main shaft is connected with drive roll 3 through transmission mechanisms such as reductors, drives drive roll 3 to operate, and provides power between drive roll 3 and transporting reticulation belt 4 by enough stiction for transporting reticulation belt 4 operates; Transporting reticulation belt 4 does closed circulation running along entrance guide pulley 7, support sliver 5, outlet drive roll 3, belt tensioning drum 11, reversing drum 8, back-up roller 9 and reversing drum 8.All cylinders must support and be arranged in rolling bearing units 17, to reduce the resistance of system running; The direction that drive roll 3, guide pulley 7 and reversing drum 8 controls transfer guipure 4 run; Support sliver 5 and back-up roller 9 support the running of transporting reticulation belt 4 according to predetermined path steady and smooth; Transporting reticulation belt operate most back-up roller 9 and belt tensioning drum 11 time, the narrow groove 18 of its surperficial relevant position processing and sipes 19 ensure to hold end support 16 and intermediate support 15 is smooth and easy passes through.Load adopts sucking disc type mechanical hand 6 load, when judging that the loading position of transporting reticulation belt 4 rotation direction entrance does not have end support 16 and intermediate support 15 to interfere, sucking disc type mechanical hand 6 carries out lower floor's load along transporting reticulation belt 4 rotation direction rapidly, and transporting reticulation belt 4 upper strata load is unrestricted can free load; Sheet got by the unified silicon chip conveyer belt that adopts of Qu Pian mechanism levels.
The content that above-described embodiment is illustrated should be understood to these embodiments only for being illustrated more clearly in the present invention, and be not used in and limit the scope of the invention, after having read the present invention, the amendment of those skilled in the art to the various equivalent form of value of the present invention has all fallen within the application's claims limited range.
Claims (8)
1. the double-deck guipure for chain type diffusion furnace, it is characterized in that, comprise install around successively drive roll (3), support on sliver (5), guide pulley (7), reversing drum (8) and back-up roller (9) can the transporting reticulation belt (4) of closed loop rotation; Be piece mouth outside one end of described support sliver (5), this piece mouth is provided with the silicon chip conveyer belt (1) for accepting the upper silicon chip (2) of transporting reticulation belt (4); The described drive roll (3) rotated is driven to drive described transporting reticulation belt (4) closed loop to rotate by drive unit; Described transporting reticulation belt (4) is the Dual-layer guipure that can transmit two-layer silicon chip (2).
2. the double-deck guipure for chain type diffusion furnace according to claim 1, is characterized in that, described transporting reticulation belt (4) side is provided with the strainer of this transporting reticulation belt of tensioning (4).
3. the double-deck guipure for chain type diffusion furnace according to claim 2, it is characterized in that, the described strainer be arranged between drive roll (3) and reversing drum (8) comprises driving cylinder (12), guide holder (10) and belt tensioning drum (11); Described driving cylinder (12) can drive belt tensioning drum (11) to move along the guide groove direction of guide holder (10).
4. according to the double-deck guipure for chain type diffusion furnace one of claim 1 ~ 3 Suo Shu, it is characterized in that, described transporting reticulation belt (4) is provided with multiple support (15,16) be vertically arranged on transporting reticulation belt (4); Line space between adjacent two supports (15,16) bottom is greater than the length of side of silicon chip (2), and the line space between adjacent two supports (15,16) top is less than the length of side of silicon chip (2); Described guide pulley (7), reversing drum (8) and back-up roller (9) are equipped with the groove (18,19) be convenient to support (15,16) and passed through.
5. the double-deck guipure for chain type diffusion furnace according to claim 4, it is characterized in that, the column pitch between described adjacent two supports (15,16) bottom is greater than the length of side of silicon chip (2), column pitch between adjacent two supports (15,16) top is less than the length of side of silicon chip (2).
6. the double-deck guipure for chain type diffusion furnace according to claim 4, is characterized in that, described support (15,16) comprises six row, and outermost two row supports are the end support (16) of inverted L-shaped, and middle four lines support is T-shaped intermediate support (15).
7. the double-deck guipure for chain type diffusion furnace according to claim 4, it is characterized in that, be CD feeding port outside the other end of described support sliver (5), this CD feeding port place is provided with the sucker mechanical hand (6) be placed on by silicon chip (2) on transporting reticulation belt (4).
8. the double-deck guipure for chain type diffusion furnace according to claim 4, is characterized in that, the line-spacing between adjacent two supports (15,16) top is 1/4 ~ 1/3 of the length of side of silicon chip (2).
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310280797.0A CN103390691B (en) | 2013-07-05 | 2013-07-05 | A kind of double-deck guipure for chain type diffusion furnace |
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| CN201310280797.0A CN103390691B (en) | 2013-07-05 | 2013-07-05 | A kind of double-deck guipure for chain type diffusion furnace |
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| CN103390691A CN103390691A (en) | 2013-11-13 |
| CN103390691B true CN103390691B (en) | 2015-09-02 |
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| CN106247794B (en) * | 2016-07-29 | 2019-04-05 | 中国电子科技集团公司第四十八研究所 | A kind of chain-type sintering furnace conveying device |
| CN109237938B (en) * | 2018-11-02 | 2024-02-09 | 黄翔鸥 | Double-layer chain rod type mesh belt sintering furnace |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202066338U (en) * | 2011-01-31 | 2011-12-07 | 金保利(泉州)科技实业有限公司 | High-temperature sintering furnace for solar silicon wafer |
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| TWI398014B (en) * | 2009-04-16 | 2013-06-01 | Tp Solar Inc | Diffusion furnaces employing ultra low mass transport systems and methods of wafer rapid diffusion processing |
| US8816253B2 (en) * | 2011-01-21 | 2014-08-26 | Tp Solar, Inc. | Dual independent transport systems for IR conveyor furnaces and methods of firing thin work pieces |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN202066338U (en) * | 2011-01-31 | 2011-12-07 | 金保利(泉州)科技实业有限公司 | High-temperature sintering furnace for solar silicon wafer |
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