CN103390552B - Annealing system - Google Patents
Annealing system Download PDFInfo
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- CN103390552B CN103390552B CN201210141445.2A CN201210141445A CN103390552B CN 103390552 B CN103390552 B CN 103390552B CN 201210141445 A CN201210141445 A CN 201210141445A CN 103390552 B CN103390552 B CN 103390552B
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- annealing
- valve
- gas source
- nitrogen
- annealing system
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- 238000000137 annealing Methods 0.000 title claims abstract description 132
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 86
- 239000007789 gas Substances 0.000 claims abstract description 62
- 239000001257 hydrogen Substances 0.000 claims abstract description 37
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 37
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 35
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 34
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 18
- 238000000034 method Methods 0.000 abstract description 14
- 239000004065 semiconductor Substances 0.000 description 11
- 238000002485 combustion reaction Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000008246 gaseous mixture Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
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Abstract
The embodiment of the invention provides an annealing system, which comprises a mixed gas source and an annealing furnace, wherein the mixed gas source is connected with the rear end of the annealing furnace through an external gas inlet pipe; the annealing furnace comprises a furnace body and a furnace cover, wherein the furnace body is of a cylindrical structure, and the furnace cover is arranged at the front end of the annealing furnace; the mixed gas source is used for providing mixed gas of nitrogen and hydrogen to the annealing system, wherein the ratio of the nitrogen to the hydrogen is in a range of 90%: 10% -95%: and 5% of the total weight of the composition. The mixed gas source for providing the nitrogen and the hydrogen for the annealing system is adopted, and the mixed gas of the nitrogen and the hydrogen in a certain proportion is introduced into the annealing furnace in the annealing process, so that the danger of overhigh hydrogen content in the annealing furnace caused by the failure of the annealing system is avoided, and the safety of the annealing system can be greatly improved.
Description
Technical field
The present invention relates to technical field of semiconductors, and in particular to a kind of annealing system.
Background technology
A large amount of dangling bonds, the presence of these dangling bonds generally be present in semiconductor substrate surface and semiconductor components and devices surface
Substrate greatly can be influenceed and then influence the performance of semiconductor devices.In traditional semiconductor fabrication process, generally use hydrogen
Atom neutralizes these dangling bonds, the defects of to reduce substrate surface and component surface, improves the performance of semiconductor devices.It is logical
Often, the step for completing in the following ways：Semiconductor substrate or semiconductor components and devices are placed in annealing furnace, to annealing furnace
In be passed through the gaseous mixture of a certain proportion of hydrogen and nitrogen, and Semiconductor substrate or semiconductor components and devices are made by mode of heating
Certain time is kept at a certain temperature, to complete in hydrogen atom and the step of dangling bonds, the purpose for being passed through nitrogen mainly carries
The effect of gas.
In the prior art, completed as the step 1 using annealing system, the system includes annealing furnace, hydrogen source, nitrogen
Source, filter, valve, flowmeter etc..But hydrogen is flammable explosive gas, if be connected in annealing process with source nitrogen
Valve can not be opened, and nitrogen is inputted in no normal direction annealing furnace, or, the flowmeter failure being connected with hydrogen source, cause hydrogen source
Source constantly inputs annealing furnace and causes the hydrogen content in annealing furnace too high, can all cause very big potential safety hazard.So this is
Danger of the system in annealing process is very high.
The content of the invention
In view of this, it is an object of the invention to provide a kind of higher annealing system of security, to solve prior art
The problem of dangerous high in annealing process of middle annealing system.
To achieve the above object, one embodiment of the present of invention provides a kind of annealing system, including hybrid gas source is with moving back
Stove, the hybrid gas source are connected by the first stove external admission pipe with the rear end of the annealing furnace, the hybrid gas source with
The first valve is provided between the first stove external admission pipe；
Wherein, the annealing furnace includes body of heater and bell, and the body of heater is cylinder type structure, and the bell is arranged on institute
State the front end of annealing furnace；The hybrid gas source is used for the mixed gas that nitrogen and hydrogen are provided to the annealing system, wherein,
The ratio of nitrogen and hydrogen is 90% in the mixed gas：10%~95%：Between 5%.
Preferably, the system also includes nitrogen gas source, and the nitrogen gas source passes through the second stove external admission pipe and institute
The rear end for stating annealing furnace is connected；The second valve is provided between the nitrogen gas source and the second stove external admission pipe；Wherein,
The nitrogen gas source is used to provide nitrogen to the annealing system.
Preferably, it is provided with first flowmeter between first valve and the first stove external admission pipe.
Preferably, it is provided with first filter between the hybrid gas source and first valve.
Preferably, it is provided with second flowmeter between second valve and the second stove external admission pipe.
Preferably, it is provided with the second filter between the nitrogen gas source and second valve.
Preferably, first valve is pneumatic operated valve, motor-driven valve or magnetic valve.
Preferably, second valve is pneumatic operated valve, motor-driven valve or magnetic valve.
Preferably, the bell is non-tight door.
Preferably, the ratio of nitrogen and hydrogen is 95% in the mixed gas：5%.
The annealing system provided according to embodiments of the present invention, using the mixing for providing nitrogen and hydrogen to annealing system
The hybrid gas source of gas, in annealing process, the mixed gas of a certain proportion of nitrogen and hydrogen is passed through into annealing furnace, is kept away
Exempt to cause the danger that hydrogen content is too high in annealing furnace because annealing system breaks down, with annealing system of the prior art
Compare, the security of annealing system can be greatly enhanced.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are the present invention
Some embodiments, for those of ordinary skill in the art, on the premise of not paying creative work, can also basis
These accompanying drawings obtain other accompanying drawings.
Fig. 1 is the structural representation of annealing system provided in an embodiment of the present invention；
Fig. 2 is the structural representation for the annealing system that the embodiment of the present invention one provides；
Fig. 3 is the structural representation for the annealing system that the embodiment of the present invention two provides；
Fig. 4 is the structural representation for the annealing system that the embodiment of the present invention three provides.
Embodiment
To make the purpose, technical scheme and advantage of the embodiment of the present invention clearer, below in conjunction with the embodiment of the present invention
In accompanying drawing, the technical scheme in the embodiment of the present invention is clearly and completely described, it is clear that described embodiment is
Part of the embodiment of the present invention, rather than whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art
The every other embodiment obtained under the premise of creative work is not made, belongs to the scope of protection of the invention.
The embodiment of the present invention provides a kind of annealing system, as shown in figure 1, the annealing system include hybrid gas source 101 with
Annealing furnace 102, wherein, the hybrid gas source 101 is connected by the first stove external admission pipe 103 with the rear end of annealing furnace 102, mixing
The first valve 104 is provided between the stove external admission pipe 103 of gas source 101 and first；Wherein, annealing furnace 102 includes body of heater and stove
Lid, body of heater is cylinder type structure, and bell is arranged on the front end of annealing furnace 102；Hybrid gas source 101 is used to carry to annealing system
For the mixed gas of nitrogen and hydrogen, wherein, the ratio of nitrogen and hydrogen is 90% in mixed gas：10%~95%：Between 5%.
Specifically, the ratio of nitrogen and hydrogen can be 95%：5% or 90%：10%, and other ratios, nitrogen and hydrogen
The specific ratio of gas can be depending on specific production technology.
The annealing system provided according to embodiments of the present invention, using the mixing for providing nitrogen and hydrogen to annealing system
The hybrid gas source of gas, in annealing process, the mixed gas of a certain proportion of nitrogen and hydrogen is passed through into annealing furnace, is kept away
Exempted from due to annealing system break down cause in annealing furnace hydrogen content too high and caused by it is dangerous, moved back with of the prior art
Fiery system is compared, and can be greatly enhanced the security of annealing system.
Specifically, the annealing system in the embodiment of the present invention can also include miscellaneous part, and annealing system is improved with further
The performance of system, illustrated below by taking some instantiations as an example.
Embodiment one
The embodiment of the present invention one provides a kind of annealing system, and its structural representation is as shown in Fig. 2 the annealing system includes mixing
Gas source 101 and annealing furnace 102 are closed, wherein, the hybrid gas source 101 passes through the first stove external admission pipe 103 and annealing furnace 102
Rear end is connected, and the first valve 104 is provided between the stove external admission pipe 103 of hybrid gas source 101 and first；Specifically, the first valve
Door 104 can be pneumatic operated valve, motor-driven valve or magnetic valve, can preferably use pneumatic operated valve.
Annealing system in the embodiment of the present invention one, the bell of annealing furnace 102 can use non-tight door, due to annealing
Mixed gas is passed through in stove 102, the danger that hydrogen content is too high in annealing furnace 102 will not be produced, therefore, even if using non-tight
Door, there will not be because in annealing furnace 102 hydrogen content it is too high and caused by it is dangerous.It must be used with annealing furnace in the prior art close
Closure door is compared, and the embodiment of the present invention one can greatly save production cost using non-tight door.
In addition, in the annealing system of the embodiment of the present invention one, can be in the first valve 104 and the first stove external admission pipe 103
Between first flowmeter 105 is set, first flowmeter 105 can be used for the wink that monitoring is passed through mixed gas in annealing furnace 102
Shi Liuliang or integrated flow, to facilitate the content of mixed gas in control annealing furnace 102；
In addition, in the embodiment of the present invention one, first can also be set between the valve 104 of hybrid gas source 101 and first
Filter 106, for removing the impurity in the mixed gas being passed through in annealing furnace 102, to ensure the gaseous mixture in annealing furnace 102
The purity of body.
It should be noted that the annealing system of the embodiment of the present invention one can also include miscellaneous part, such as it is arranged on and moves back
Combustion chamber near the front end of stove 102, the combustion chamber can terminate annealing process to retreat remaining combustion of hydrogen in stove 102
Fall, reduce the pollution to air.
Embodiment two
The embodiment of the present invention two provides a kind of annealing system, and its structural representation is as shown in Fig. 2 the annealing system includes mixing
Gas source 101 and annealing furnace 102 are closed, wherein, the hybrid gas source 101 passes through the first stove external admission pipe 103 and annealing furnace 102
Rear end is connected, and the first valve 104 is provided between the stove external admission pipe 103 of hybrid gas source 101 and first；
In addition, the annealing system that the embodiment of the present invention two provides can also include nitrogen gas source 201, as shown in figure 3, nitrogen
Gas gas source 201 is connected by the second stove external admission pipe 202 with the rear end of annealing furnace 102, nitrogen gas source 201 and stove external admission
The second valve 203 is provided between pipe 202；Wherein, nitrogen gas source 201 is used to provide nitrogen to annealing system.Specifically,
One stove external admission pipe 103 can use phase same material with the second stove external admission pipe 202, can also use unlike material.
The embodiment of the present invention adds nitrogen gas source in annealing system, can be in annealing process or in annealing process
Terminate backward annealing furnace and be passed through pure nitrogen.Pure nitrogen is passed through in annealing process can further adjust nitrogen in annealing furnace
Ratio between hydrogen, what the ratio between nitrogen and hydrogen that improvement hybrid gas source provides to annealing furnace can not be adjusted lacks
Point；Pure nitrogen is passed through into annealing furnace after annealing process terminates, can be used for removing in annealing furnace the hydrogen that remains or
Other residual gas, ensure the security of annealing furnace.
Embodiment three
Fig. 4 shows the structural representation for the annealing system that the embodiment of the present invention three provides, and the annealing system includes mixing
Gas source 101 and annealing furnace 102, wherein, after the hybrid gas source 101 is by the first stove external admission pipe 103 and annealing furnace 102
End is connected, and the first valve 104 is provided between the stove external admission pipe 103 of hybrid gas source 101 and first；Nitrogen gas source 201 is logical
Cross the second stove external admission pipe 202 with the rear end of annealing furnace 102 to be connected, set between nitrogen gas source 201 and stove external admission pipe 202
There is the second valve 203.
In addition, in the annealing system of the embodiment of the present invention three, can be in the first valve 104 and the first stove external admission pipe 103
Between first flowmeter 105 is set, first flowmeter 105 can be used for the wink that monitoring is passed through mixed gas in annealing furnace 102
Shi Liuliang or integrated flow, to facilitate the content of mixed gas in control annealing furnace 102；
In addition, in the embodiment of the present invention three, first can also be set between the valve 104 of hybrid gas source 101 and first
Filter 106, for removing the impurity in the mixed gas being passed through in annealing furnace 102, to ensure the gaseous mixture in annealing furnace 102
The purity of body.
Similarly, second flowmeter 204 can be provided between the second valve 203 and the second stove external admission pipe 202, the
Two flowmeters 204 can be used for the instantaneous delivery or integrated flow for the nitrogen that monitoring is passed through in annealing furnace 102；
In addition, in the embodiment of the present invention three, can also be provided between the valve 203 of nitrogen gas source 201 and second
Tow filtrator 205, for removing the impurity in the nitrogen being passed through in annealing furnace 102, to ensure the pure of the gas in annealing furnace 102
Degree.
Specifically, first flowmeter 105 and second flowmeter 204 can be identical structure, or different structure；The
Two valves 203 can be pneumatic operated valve, motor-driven valve or magnetic valve, can be preferably pneumatic operated valve；In addition, the first valve 104 and
Two valves 203 can be identical structure, or different structure.
In addition, the annealing system in the embodiment of the present invention three can also include combustion chamber, the combustion chamber is connected with annealing furnace,
The front end or centre position of annealing furnace can be connected to.After annealing process terminates, the combustion chamber can be used for annealing furnace
The combustion of hydrogen of middle residual falls, further avoid certain content hydrogen presence caused by it is dangerous.
In addition, nitrogen and the ratio of hydrogen that the hybrid gas source in the embodiment of the present invention provides can be 95%：5%.This
Sample can meet the requirement of most of semiconductor fabrication process.
Described above is only the preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, under the premise without departing from the principles of the invention, some improvements and modifications can also be made, these improvements and modifications also should
It is considered as protection scope of the present invention.
Claims (9)
1. a kind of annealing system, including hybrid gas source and annealing furnace, it is characterised in that
The hybrid gas source is connected by the first stove external admission pipe with the rear end of the annealing furnace, the hybrid gas source and institute
State and be provided with the first valve between the first stove external admission pipe；
Wherein, the annealing furnace includes body of heater and bell, and the body of heater is cylinder type structure, and the bell is arranged on described move back
The front end of stove；The bell is non-tight door；The hybrid gas source is used to provide nitrogen and hydrogen to the annealing system
Mixed gas, with avoid due to annealing system break down cause in annealing furnace hydrogen content too high and caused by it is dangerous, its
In, the ratio of nitrogen and hydrogen is between 90%: 10%~95%: 5% in the mixed gas.
2. annealing system according to claim 1, it is characterised in that the system also includes nitrogen gas source, the nitrogen
Gas gas source is connected by the second stove external admission pipe with the rear end of the annealing furnace；Outside the nitrogen gas source and second stove
The second valve is provided between air inlet pipe；Wherein, the nitrogen gas source is used to provide nitrogen to the annealing system.
3. annealing system according to claim 1 or 2, it is characterised in that first valve outside first stove with entering
First flowmeter is provided between tracheae.
4. annealing system according to claim 1 or 2, it is characterised in that the hybrid gas source and first valve
Between be provided with first filter.
5. annealing system according to claim 2, it is characterised in that second valve and the second stove external admission pipe
Between be provided with second flowmeter.
6. annealing system according to claim 2, it is characterised in that between the nitrogen gas source and second valve
It is provided with the second filter.
7. annealing system according to claim 1 or 2, it is characterised in that first valve be pneumatic operated valve, motor-driven valve or
Person's magnetic valve.
8. annealing system according to claim 2, it is characterised in that second valve be pneumatic operated valve, motor-driven valve or
Magnetic valve.
9. annealing system according to claim 1 or 2, it is characterised in that the ratio of nitrogen and hydrogen in the mixed gas
Example is 95%: 5%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210141445.2A CN103390552B (en) | 2012-05-08 | 2012-05-08 | Annealing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210141445.2A CN103390552B (en) | 2012-05-08 | 2012-05-08 | Annealing system |
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| Publication Number | Publication Date |
|---|---|
| CN103390552A CN103390552A (en) | 2013-11-13 |
| CN103390552B true CN103390552B (en) | 2017-11-14 |
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| CN201210141445.2A Active CN103390552B (en) | 2012-05-08 | 2012-05-08 | Annealing system |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105448769A (en) * | 2014-06-27 | 2016-03-30 | 北大方正集团有限公司 | Horizontal-type furnace tube protection device, and silicon wafer processing system and method |
| CN106012026A (en) * | 2016-08-04 | 2016-10-12 | 汪锐 | Annealing apparatus used for making LED wafers |
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|---|---|---|---|---|
| CN1779928A (en) * | 2004-11-23 | 2006-05-31 | 敦南科技股份有限公司 | Semiconductor vacuum metal sintering device and manufacture flow |
| CN101892367A (en) * | 2010-07-23 | 2010-11-24 | 中冶南方(武汉)威仕工业炉有限公司 | Air supplying method for protective atmospheres of different hydrogen concentration sections |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS5857903B2 (en) * | 1978-01-20 | 1983-12-22 | 松下電子工業株式会社 | Transistor surface stabilization treatment method |
| JP2002334848A (en) * | 2001-05-09 | 2002-11-22 | Sumitomo Mitsubishi Silicon Corp | Thermal treatment equipment for silicon wafer |
| CN1670244B (en) * | 2004-03-20 | 2010-05-05 | 鸿富锦精密工业（深圳）有限公司 | Gas preparing system and gas preparing method |
| JP4451811B2 (en) * | 2005-05-09 | 2010-04-14 | ローム株式会社 | Manufacturing method of nitride semiconductor device |
| US20070167029A1 (en) * | 2005-11-11 | 2007-07-19 | Kowalski Jeffrey M | Thermal processing system, components, and methods |
| CN201292250Y (en) * | 2008-08-21 | 2009-08-19 | 顿力集团有限公司 | Air feed system composed of multiple ammonia decomposition furnaces |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1779928A (en) * | 2004-11-23 | 2006-05-31 | 敦南科技股份有限公司 | Semiconductor vacuum metal sintering device and manufacture flow |
| CN101892367A (en) * | 2010-07-23 | 2010-11-24 | 中冶南方(武汉)威仕工业炉有限公司 | Air supplying method for protective atmospheres of different hydrogen concentration sections |
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Effective date of registration: 20191204 Address after: 221000 1f-2f, workshop A-2, No.26 Chuangye Road, Xuzhou Economic and Technological Development Zone, Xuzhou City, Jiangsu Province Patentee after: Jiangsu zhongkehanyun Semiconductor Co.,Ltd. Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee before: Institute of Microelectronics of the Chinese Academy of Sciences |