CN103390552A - Annealing system - Google Patents
Annealing system Download PDFInfo
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- CN103390552A CN103390552A CN2012101414452A CN201210141445A CN103390552A CN 103390552 A CN103390552 A CN 103390552A CN 2012101414452 A CN2012101414452 A CN 2012101414452A CN 201210141445 A CN201210141445 A CN 201210141445A CN 103390552 A CN103390552 A CN 103390552A
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Abstract
The invention provides an annealing system. The annealing system comprises a mixed gas source and an annealing furnace, wherein the mixed gas source is connected with the rear end of the annealing furnace through a furnace outside gas inlet pipe, a valve is arranged between the mixed gas source and the furnace outside gas inlet pipe, and a flow meter is arranged between the valve and the furnace outside gas inlet pipe. The annealing furnace comprises a furnace body and a furnace cover, wherein the furnace body is of a cylindrical structure, and the furnace cover is arranged at the front end of the annealing furnace. The mixed gas source is used for supplying mixed gas of nitrogen and hydrogen to the annealing system, wherein the ratio between the nitrogen and the hydrogen ranges from 90%:10% to 95%:5%. The mixed gas source used for supplying the nitrogen and the hydrogen to the annealing system is adopted, the mixed gas of the nitrogen and the hydrogen in a certain ratio is supplied to the annealing furnace in an annealing process, the risk that the annealing system breaks down to lead to the overhigh content of the hydrogen in the annealing furnace is avoided, and safety of the annealing system can be greatly enhanced.
Description
Technical field
The present invention relates to technical field of semiconductors, be specifically related to a kind of annealing system.
Background technology
Usually have a large amount of dangling bonds at semiconductor substrate surface and semiconductor components and devices surface, the existence of these dangling bonds can greatly affect substrate and then affect the performance of semiconductor device.In traditional semiconductor fabrication process, usually adopt hydrogen atom these dangling bonds that neutralize,, to reduce the defect on substrate surface and components and parts surface, improve the performance of semiconductor device.Usually, complete in the following ways this step: Semiconductor substrate or semiconductor components and devices are placed in annealing furnace, to the gaseous mixture that passes into a certain proportion of hydrogen and nitrogen in annealing furnace, and by mode of heating, make Semiconductor substrate or semiconductor components and devices keep at a certain temperature certain hour, to complete in hydrogen atom and the step of dangling bonds, the purpose that passes into nitrogen is mainly the effect of carrier gas.
In prior art, adopt as this step 1 annealing system to complete, this system comprises annealing furnace, sources of hydrogen, source nitrogen, filter, valve, flowmeter etc.But, hydrogen is flammable explosive gas, if the valve that is connected with source nitrogen in annealing process can't be opened, can't input nitrogen in annealing furnace, perhaps, the flowmeter fault that is connected with sources of hydrogen, cause hydrogen to input continuously annealing furnace and cause the hydrogen content in annealing furnace too high, all can cause very large potential safety hazard.So the danger of this system in annealing process is very high.
Summary of the invention
In view of this, the object of the present invention is to provide the higher annealing system of a kind of fail safe, to solve the dangerous high problem of annealing system in annealing process in prior art.
For achieving the above object, one embodiment of the present of invention provide a kind of annealing system, comprise hybrid gas source and annealing furnace, described hybrid gas source is connected with the rear end of described annealing furnace by the first stove external admission pipe, is provided with the first valve between described hybrid gas source and described the first stove external admission pipe;
Wherein, described annealing furnace comprises body of heater and bell, and described body of heater is the cylinder type structure, and described bell is arranged on the front end of described annealing furnace; Described hybrid gas source is used for providing to described annealing system the mist of nitrogen and hydrogen, and wherein, in described mist, the ratio of nitrogen and hydrogen is between 90%:10% ~ 95%:5%.
Preferably, described system also comprises the nitrogen gas source, and described nitrogen gas source is connected with the rear end of described annealing furnace by the second stove external admission pipe; Be provided with the second valve between described nitrogen gas source and described the second stove external admission pipe; Wherein, described nitrogen gas source is used for providing nitrogen to described annealing system.
Preferably, be provided with the first flow meter between described the first valve and described the first stove external admission pipe.
Preferably, be provided with the first filter between described hybrid gas source and described the first valve.
Preferably, be provided with the second flowmeter between described the second valve and described the second stove external admission pipe.
Preferably, be provided with the second filter between described nitrogen gas source and described the second valve.
Preferably, described the first valve is pneumatic operated valve, valve with electrically motorized operation or electromagnetically operated valve.
Preferably, described the second valve is pneumatic operated valve, valve with electrically motorized operation or electromagnetically operated valve.
Preferably, described bell is the non-tight door.
Preferably, in described mist, the ratio of nitrogen and hydrogen is 95%:5%.
The annealing system that provides according to the embodiment of the present invention, adopt the hybrid gas source that is used for providing to annealing system the mist of nitrogen and hydrogen, in annealing process, to the mist that passes into a certain proportion of nitrogen and hydrogen in annealing furnace, avoided causing the too high danger of hydrogen content in annealing furnace because annealing system breaks down, compare with annealing system of the prior art, can greatly improve the fail safe of annealing system.
Description of drawings
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, below will the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described, apparently, accompanying drawing in the following describes is some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the structural representation of the annealing system that provides of the embodiment of the present invention;
Fig. 2 is the structural representation of the annealing system that provides of the embodiment of the present invention one;
Fig. 3 is the structural representation of the annealing system that provides of the embodiment of the present invention two;
Fig. 4 is the structural representation of the annealing system that provides of the embodiment of the present invention three.
Embodiment
For the purpose, technical scheme and the advantage that make the embodiment of the present invention clearer, below in conjunction with the accompanying drawing in the embodiment of the present invention, technical scheme in the embodiment of the present invention is clearly and completely described, obviously, described embodiment is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment in the present invention, those of ordinary skills, not making under the creative work prerequisite the every other embodiment that obtains, belong to the scope of protection of the invention.
The embodiment of the present invention provides a kind of annealing system, as shown in Figure 1, this annealing system comprises hybrid gas source 101 and annealing furnace 102, wherein, this hybrid gas source 101 is connected with the rear end of annealing furnace 102 by the first stove external admission pipe 103, is provided with the first valve 104 between hybrid gas source 101 and the first stove external admission pipe 103; Wherein, annealing furnace 102 comprises body of heater and bell, and body of heater is the cylinder type structure, and bell is arranged on the front end of annealing furnace 102; Hybrid gas source 101 is used for providing to annealing system the mist of nitrogen and hydrogen, and wherein, in mist, the ratio of nitrogen and hydrogen is between 90%:10% ~ 95%:5%.
Particularly, the ratio of nitrogen and hydrogen can be 95%:5% or 90%:10%, and other ratios, and the concrete ratio of nitrogen and hydrogen can be determined according to concrete production technology.
The annealing system that provides according to the embodiment of the present invention, adopt the hybrid gas source that is used for providing to annealing system the mist of nitrogen and hydrogen, in annealing process, to the mist that passes into a certain proportion of nitrogen and hydrogen in annealing furnace, avoided causing the too high danger that causes of hydrogen content in annealing furnace because annealing system breaks down, compare with annealing system of the prior art, can greatly improve the fail safe of annealing system.
Particularly, the annealing system in the embodiment of the present invention can also comprise miscellaneous part,, further to improve the performance of annealing system, below as an example of some instantiations example, describes.
Embodiment one
The embodiment of the present invention one provides a kind of annealing system, its structural representation as shown in Figure 2, this annealing system comprises hybrid gas source 101 and annealing furnace 102, wherein, this hybrid gas source 101 is connected with the rear end of annealing furnace 102 by the first stove external admission pipe 103, is provided with the first valve 104 between hybrid gas source 101 and the first stove external admission pipe 103; Particularly, the first valve 104 can be pneumatic operated valve, valve with electrically motorized operation or electromagnetically operated valve, can preferably adopt pneumatic operated valve.
Annealing system in the embodiment of the present invention one, the bell of annealing furnace 102 can adopt the non-tight door, owing to passing into mist in annealing furnace 102, can not produce the too high danger of hydrogen content in annealing furnace 102, therefore, even adopt the non-tight door, also do not have because of the too high danger that causes of hydrogen content in annealing furnace 102.Must adopt hermatic door to compare with annealing furnace in prior art, the embodiment of the present invention one adopts the non-tight door greatly to save production cost.
In addition, in the annealing system of the embodiment of the present invention one, can between the first valve 104 and the first stove external admission pipe 103, first flow meter 105 be set, first flow meter 105 can be used for monitoring and pass into instantaneous delivery or the integrated flow of the mist of annealing furnace 102, to facilitate the content of controlling mist in annealing furnace 102;
In addition, in the embodiment of the present invention one, can also between hybrid gas source 101 and the first valve 104, the first filter 106 be set, be used for removing the impurity in the mist that passes into annealing furnace 102, to guarantee the purity of the mist in annealing furnace 102.
Need to prove, the annealing system of the embodiment of the present invention one can also comprise miscellaneous part, for example be arranged near the combustion chamber of annealing furnace 102 front ends, this combustion chamber can retreat the interior remaining combustion of hydrogen of stove 102 with the annealing process end to be fallen, and reduces the pollution to air.
Embodiment two
The embodiment of the present invention two provides a kind of annealing system, its structural representation as shown in Figure 2, this annealing system comprises hybrid gas source 101 and annealing furnace 102, wherein, this hybrid gas source 101 is connected with the rear end of annealing furnace 102 by the first stove external admission pipe 103, is provided with the first valve 104 between hybrid gas source 101 and the first stove external admission pipe 103;
In addition, the annealing system that the embodiment of the present invention two provides can also comprise nitrogen gas source 201, as shown in Figure 3, nitrogen gas source 201 is connected with the rear end of annealing furnace 102 by the second stove external admission pipe 202, is provided with the second valve 203 between nitrogen gas source 201 and stove external admission pipe 202; Wherein, nitrogen gas source 201 is used for providing nitrogen to annealing system.Particularly, the first stove external admission pipe 103 can adopt identical material with the second stove external admission pipe 202, also can adopt unlike material.
The embodiment of the present invention adds the nitrogen gas source in annealing system, can pass into pure nitrogen to annealing furnace in annealing process or after annealing process finishes.Pass into pure nitrogen and can further regulate the ratio between nitrogen and hydrogen in annealing furnace in annealing process, improve the shortcoming that nitrogen that hybrid gas source provides to annealing furnace and the ratio between hydrogen can't be regulated; Pass into pure nitrogen in annealing furnace after annealing process finishes, can be used for removing the residual hydrogen of annealing furnace or other residual gass, guarantee the fail safe of annealing furnace.
Embodiment three
Fig. 4 shows the structural representation of the annealing system that the embodiment of the present invention three provides, this annealing system comprises hybrid gas source 101 and annealing furnace 102, wherein, this hybrid gas source 101 is connected with the rear end of annealing furnace 102 by the first stove external admission pipe 103, is provided with the first valve 104 between hybrid gas source 101 and the first stove external admission pipe 103; Nitrogen gas source 201 is connected with the rear end of annealing furnace 102 by the second stove external admission pipe 202, is provided with the second valve 203 between nitrogen gas source 201 and stove external admission pipe 202.
In addition, in the annealing system of the embodiment of the present invention three, can between the first valve 104 and the first stove external admission pipe 103, first flow meter 105 be set, first flow meter 105 can be used for monitoring and pass into instantaneous delivery or the integrated flow of the mist of annealing furnace 102, to facilitate the content of controlling mist in annealing furnace 102;
In addition, in the embodiment of the present invention three, can also between hybrid gas source 101 and the first valve 104, the first filter 106 be set, be used for removing the impurity in the mist that passes into annealing furnace 102, to guarantee the purity of the mist in annealing furnace 102.
Similarly, the second flowmeter 204, the second flowmeters 204 can be provided with between the second valve 203 and the second stove external admission pipe 202 and instantaneous delivery or the integrated flow of the nitrogen that passes into annealing furnace 102 can be used for monitoring;
In addition, in the embodiment of the present invention three, can also be provided with the second filter 205 between nitrogen gas source 201 and the second valve 203, be used for removing the impurity in the nitrogen that passes into annealing furnace 102, to guarantee the purity of the gas in annealing furnace 102.
Particularly, first flow meter 105 and the second flowmeter 204 can be same structure, also can be different structure; The second valve 203 can be pneumatic operated valve, valve with electrically motorized operation or electromagnetically operated valve, can be preferably pneumatic operated valve; In addition, the first valve 104 and the second valve 203 can be same structure, also can be different structure.
In addition, the annealing system in the embodiment of the present invention three can also comprise combustion chamber, and this combustion chamber is connected with annealing furnace, can be connected to front end or the centre position of annealing furnace.After annealing process finished, this combustion chamber can be used for the combustion of hydrogen that annealing furnace is residual be fallen, the danger of further avoiding the existence of the hydrogen of certain content to cause.
In addition, the nitrogen that provides of the hybrid gas source in the embodiment of the present invention and the ratio of hydrogen can be 95%:5%.Can meet the requirement of most of semiconductor fabrication process like this.
The above is only the preferred embodiment of the present invention; should be pointed out that for those skilled in the art, under the premise without departing from the principles of the invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (10)
1. an annealing system, comprise hybrid gas source and annealing furnace, it is characterized in that,
Described hybrid gas source is connected with the rear end of described annealing furnace by the first stove external admission pipe, is provided with the first valve between described hybrid gas source and described the first stove external admission pipe;
Wherein, described annealing furnace comprises body of heater and bell, and described body of heater is the cylinder type structure, and described bell is arranged on the front end of described annealing furnace; Described hybrid gas source is used for providing to described annealing system the mist of nitrogen and hydrogen, and wherein, in described mist, the ratio of nitrogen and hydrogen is between 90%:10% ~ 95%:5%.
2. annealing system according to claim 1, is characterized in that, described system also comprises the nitrogen gas source, and described nitrogen gas source is connected with the rear end of described annealing furnace by the second stove external admission pipe; Be provided with the second valve between described nitrogen gas source and described the second stove external admission pipe; Wherein, described nitrogen gas source is used for providing nitrogen to described annealing system.
3. annealing system according to claim 1 and 2, is characterized in that, is provided with the first flow meter between described the first valve and described the first stove external admission pipe.
4. annealing system according to claim 1 and 2, is characterized in that, is provided with the first filter between described hybrid gas source and described the first valve.
5. annealing system according to claim 2, is characterized in that, is provided with the second flowmeter between described the second valve and described the second stove external admission pipe.
6. annealing system according to claim 2, is characterized in that, is provided with the second filter between described nitrogen gas source and described the second valve.
7. annealing system according to claim 1 and 2, is characterized in that, described the first valve is pneumatic operated valve, valve with electrically motorized operation or electromagnetically operated valve.
8. annealing system according to claim 2, is characterized in that, described the second valve is pneumatic operated valve, valve with electrically motorized operation or electromagnetically operated valve.
9. annealing system according to claim 1 and 2, is characterized in that, described bell is the non-tight door.
10. annealing system according to claim 1 and 2, is characterized in that, in described mist, the ratio of nitrogen and hydrogen is 95%:5%.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201210141445.2A CN103390552B (en) | 2012-05-08 | 2012-05-08 | A kind of annealing system |
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| CN201210141445.2A CN103390552B (en) | 2012-05-08 | 2012-05-08 | A kind of annealing system |
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| CN103390552A true CN103390552A (en) | 2013-11-13 |
| CN103390552B CN103390552B (en) | 2017-11-14 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105448769A (en) * | 2014-06-27 | 2016-03-30 | 北大方正集团有限公司 | Horizontal-type furnace tube protection device, and silicon wafer processing system and method |
| CN106012026A (en) * | 2016-08-04 | 2016-10-12 | 汪锐 | Annealing apparatus used for making LED wafers |
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| JP2002334848A (en) * | 2001-05-09 | 2002-11-22 | Sumitomo Mitsubishi Silicon Corp | Thermal treatment equipment for silicon wafer |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105448769A (en) * | 2014-06-27 | 2016-03-30 | 北大方正集团有限公司 | Horizontal-type furnace tube protection device, and silicon wafer processing system and method |
| CN106012026A (en) * | 2016-08-04 | 2016-10-12 | 汪锐 | Annealing apparatus used for making LED wafers |
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| Publication number | Publication date |
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| CN103390552B (en) | 2017-11-14 |
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Effective date of registration: 20191204 Address after: 221000 1f-2f, workshop A-2, No.26 Chuangye Road, Xuzhou Economic and Technological Development Zone, Xuzhou City, Jiangsu Province Patentee after: Jiangsu zhongkehanyun Semiconductor Co., Ltd Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee before: Institute of Microelectronics, Chinese Academy of Sciences |