CN103384451A - Manufacturing method for touch panel edge wire routing, touch panel and touch display device - Google Patents
Manufacturing method for touch panel edge wire routing, touch panel and touch display device Download PDFInfo
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- CN103384451A CN103384451A CN2012101371442A CN201210137144A CN103384451A CN 103384451 A CN103384451 A CN 103384451A CN 2012101371442 A CN2012101371442 A CN 2012101371442A CN 201210137144 A CN201210137144 A CN 201210137144A CN 103384451 A CN103384451 A CN 103384451A
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Abstract
The invention provides a manufacturing method for touch panel edge wire routing, a control panel with the edge wire routing and a touch display device. The manufacturing method comprises the following steps of (a) forming a photosensitive conductive paste layer on an edge area of a substrate with a transparent conductive layer, enabling the photosensitive conductive paste layer to be at least in partial overlapping with the transparent conductive layer, (b) exposing the photosensitive conductive paste layer by using a mask, and (c) carrying out developing on the exposed photosensitive conductive paste layer to form a patterning edge wire routing unit on the edge area of the substrate. The manufacturing method is beneficial to improving the precision of a wire route under the situation that the wire width of the edge wire routing is narrowed, and can enable the wire route to have good surface smoothness.
Description
Technical field
The present invention relates to the manufacture method of a kind of contact panel edge cabling, particularly relate to a kind of manufacture method, the contact panel with this edge cabling and touch control display apparatus of the contact panel edge cabling that can promote the circuit precision.
Background technology
Along with popularizing of Smartphone, make 3C device and correlation technique thereof take touch-control as operation interface flourish, and the slim light and handyization trend of 3C device also allow contact panel more and more high to the requirement of slimming.Wherein, projected capacitive touch panel (Projceted Capacitive Touch Panel, referred to as PCTP) light owing to having, thin, jamming-proof characteristic, and the result of use that can realize true multi-point touch, become the main flow that has contact panel now.Because capacitance type touch-control panel must arrange the edge cabling in very thin marginal zone when making, and the existing mode that the circuit of edge cabling is set is in the wire mark mode, silver-colored pulp material to be printed onto the circuit setting position that a marginal zone of contact panel is planned.Yet the production method of the circuit of this kind edge cabling is easy to affect because of the physical property of silver-colored pulp material itself uniformity of printing, and may not cause the planarization of circuit good and affect the signal Output rusults.In addition, web plate tension force and print pass also can impact the precision that silver is starched circuit.Therefore, existing mode of making the circuit of edge cabling with screen printing processing easily is subject to character, web plate tension force and the print pass of printing material and can't effectively promotes the precision of circuit, in order to keep contact panel edge cabling good reliability and to avoid adjacent lines to contact and be short-circuited and produce that signal disturbs or the situation of signal error when causing using, in the situation that be devoted to shorten the live width of circuit, need to develop the low not good circuit manufacturing technology of surface smoothness that reaches of the precision that can overcome the edge cabling.
Summary of the invention
The object of the present invention is to provide and a kind ofly make circuit in the situation that the reduction live width still has the manufacture method of the contact panel edge cabling of better relative position precision and surface smoothness.
The manufacture method of contact panel of the present invention edge cabling comprises the following step:
(a) form one deck photaesthesia conductive paste layer on a marginal zone of a base material with layer of transparent conductive layer, and this photaesthesia conductive paste layer is overlapped with this transparency conducting layer at least;
(b) utilize this photaesthesia conductive paste layer of a mask exposure; And
(c) form an edge wiring unit of patterning on developing with the marginal zone at this base material to this photaesthesia conductive paste layer through exposure.
Manufacture method of the present invention, the base material of step (a) also comprise one be subjected to this marginal zone around viewfinder area, this transparency conducting layer is to be formed at this marginal zone and this viewfinder area, and this photaesthesia conductive paste layer is to be formed on fully overlappingly on the transparency conducting layer of marginal zone of this base material.
Manufacture method of the present invention, in step (a), after forming this photaesthesia conductive paste layer, also form one deck and cover the transparency conducting layer of this base material and the photoresist layer of this photaesthesia conductive paste layer, and be with expose simultaneously this photaesthesia conductive paste layer of this photoresist layer and this photoresist layer below of this mask in step (b), in step (c), first this photoresist layer to be developed, again this photaesthesia conductive paste layer below this photoresist layer is developed, with a photoresistance capping unit at this viewfinder area and this marginal zone formation patterning.
Manufacture method of the present invention, also comprise one in step (c) step (d) afterwards, step (d) is that the transparency conducting layer that is not covered by this photoresistance capping unit is carried out etching, and remove this photoresistance capping unit after completing etching, to form a patterned transparent electrode unit that is positioned at this viewfinder area, reach a transparent line unit of patterned edge that is positioned at this marginal zone and is combined in this wiring unit below, edge.
Manufacture method of the present invention is heat curing-type at the photaesthesia conductive paste layer of step (a), and this manufacture method also is included in step (d) afterwards, and this edge wiring unit is carried out heated baking.
Manufacture method of the present invention, the base material of step (a) also comprise one be subjected to this marginal zone around viewfinder area, this transparency conducting layer is arranged on this viewfinder area, and make a side of this transparency conducting layer contiguous this marginal zone stretch out again to contact with this photaesthesia conductive paste layer, and then formed this edge wiring unit of step (c) is electrically connected to this transparency conducting layer.
Manufacture method of the present invention, the transparency conducting layer in step (a) are the transparency electrode unit of patterning.
Manufacture method of the present invention, this photaesthesia conductive paste layer in step (a) are to be that the photaesthesia electrocondution slurry of 15000 ~ 25000mPaS is made by a viscosity.
Manufacture method of the present invention, this photaesthesia conductive paste layer in step (a) is to be 1.5 * 10 by a volume impedance
-6~ 2.5 * 10
-6The photaesthesia electrocondution slurry of Ω cm is made.
Manufacture method of the present invention, this photaesthesia conductive paste layer in step (a) is made by a photaesthesia electrocondution slurry, this photaesthesia electrocondution slurry contains a light sensitive material and a plurality of conducting particles, and the part by weight of the described conducting particles in this photaesthesia electrocondution slurry and this light sensitive material is 80 ~ 90:10 ~ 20.
Manufacture method of the present invention, the photaesthesia conductive paste layer used in step (a) is heat curing-type, and this manufacture method also is included in step (c) afterwards, and this edge wiring unit is carried out heated baking.
Manufacture method of the present invention, the thickness of the photaesthesia conductive paste layer of step (a) is 3 ~ 10 μ m.
Manufacture method of the present invention, the exposure that step (b) is exposed is 50 ~ 200mJ/cm
2
The beneficial effect of manufacture method of the present invention is: the photaesthesia electrocondution slurry is applied to be distributed in the making of the edge wiring unit of contact panel narrow marginal zone, arrange in pairs or groups again exposure and the developing technique of gold-tinted processing procedure, make the edge wiring unit of making in the situation that reduction live width and line-spacing, still keep better wiring precision and circuit table surface evenness, thereby can avoid the bad situation of adjacent lines contact.In addition, this manufacture method can also be dwindled the distributed areas of this edge wiring unit the viewfinder area with relative expansion contact panel.
Further, the present invention also provides a kind of contact panel with aforesaid edge cabling.
So the present invention has the contact panel of this edge cabling, comprise a base material, and an edge wiring unit that is arranged on this base material.
This base material comprises a viewfinder area, the marginal zone around this viewfinder area, and one made and be formed on the patterned transparent electrode unit of this viewfinder area by transparent electrode material.
This edge wiring unit is made through lithographic process by the photaesthesia electrocondution slurry, and is laid in the marginal zone of this base material and is electrically connected to this transparency electrode unit.
Contact panel of the present invention, this base material also comprises a transparent line unit of patterned edge that is combined in overlappingly this wiring unit below, edge from this past this marginal zone extension in transparency electrode unit, and the transparent line unit in this edge is made by transparent electrode material.
Contact panel of the present invention, this edge wiring unit comprise that many width are the edge cabling of 20 ~ 70 μ m, and the spacing between described edge cabling is 20 ~ 70 μ m.
Contact panel of the present invention is used to form in the photaesthesia electrocondution slurry of this edge wiring unit and contains the conducting particles that a plurality of particle diameters are 1 ~ 10 μ m.
Contact panel of the present invention, described conducting particles are the combination of gold particle, silver particles, copper particle, aluminum particulate, nickel particles or aforementioned metal particle.
Contact panel of the present invention, the photaesthesia electrocondution slurry that is used to form this edge wiring unit contains a light sensitive material and a plurality of conducting particles, and the part by weight of the described conducting particles in this photaesthesia electrocondution slurry and this light sensitive material is 80 ~ 90:10 ~ 20.
The beneficial effect of contact panel of the present invention is: by using photaesthesia electrocondution slurry and exposure imaging technology in the marginal zone of base material, the edge wiring unit to be set, make the circuit of the edge wiring unit of making have better precision and surface smoothness, make this contact panel be difficult in the use because of the live width of circuit or the line-spacing reduction occurs bad or rub-out signal is still possessed better reliability, and can reduce whereby the area of marginal zone, viewfinder area is further improved in whole base material area occupied ratio again.
In addition, the present invention also provides a kind of application to have the touch control display apparatus of the contact panel of aforementioned edge cabling.
Touch control display apparatus of the present invention comprises a foregoing contact panel, and a display floater that is oppositely arranged with this contact panel.This display floater is positioned at the inboard in the same way, transparency electrode unit with this contact panel.
The beneficial effect of touch control display apparatus of the present invention is: by the edge cabling that uses photaesthesia electrocondution slurry and exposure imaging fabrication techniques contact panel, make this contact panel keep the area ratio raising that makes viewfinder area shared under the condition of good serviceability, and then make touch control display apparatus of the present invention can provide larger touch-control area and display area compared to the product of same size specification.
Description of drawings
For above-mentioned purpose of the present invention, feature and advantage can be become apparent, below in conjunction with accompanying drawing, the specific embodiment of the present invention is elaborated, wherein:
Fig. 1 is a schematic perspective view, illustrates that first preferred embodiment of the manufacture method of contact panel of the present invention edge cabling arranges the situation of one deck photaesthesia conductive paste layer on a base material;
Fig. 2 looks over a schematic side view of getting from base material the place ahead of Fig. 1, and the integrated structure of this base material and this photaesthesia conductive paste layer is described;
Fig. 3 is in a schematic side view of watching visual angle get identical with Fig. 2, illustrates that the first preferred embodiment of this manufacture method arranges the situation of Ceng Guang's resistance layer on this base material and this photaesthesia conductive paste layer;
Fig. 4 is a schematic perspective view, illustrates that the situation that mask exposes is used in the first preferred embodiment of this manufacture method;
Fig. 5 is a cross-sectional schematic of getting along the line V-V in Fig. 4, and the situation of exposing with this mask is described;
Fig. 6 is a cross-sectional schematic, and it is the situation of a photoresistance capping unit that the first preferred embodiment that this manufacture method is described is developed this photoresist layer;
Fig. 7 is a cross-sectional schematic, and it is the situation of an edge wiring unit that the first preferred embodiment that this manufacture method is described is developed this photaesthesia conductive paste layer;
Fig. 8 is a cross-sectional schematic, and the part that the first preferred embodiment that this manufacture method is described is not covered by this photoresistance capping unit the layer of transparent conductive layer is carried out the situation after etching;
Fig. 9 is a cross-sectional schematic, and the first preferred embodiment that this manufacture method is described removes the situation after this photoresistance capping unit;
Figure 10 is a schematic diagram, and the prepared contact panel of the first preferred embodiment of this manufacture method is described;
Figure 11 is a schematic perspective view, and the base material that second preferred embodiment of the manufacture method of contact panel of the present invention edge cabling is used is described;
Figure 12 is a schematic perspective view, illustrates that the second preferred embodiment of this manufacture method forms the situation of one deck photaesthesia conductive paste layer on this base material;
Figure 13 is a schematic perspective view, illustrates that the situation that mask exposes is used in the second preferred embodiment of this manufacture method;
Figure 14 is one along the cross-sectional schematic that the line X IV in Figure 13-the X IV is got, and the situation of exposing with this mask is described;
Figure 15 is a cross-sectional schematic, and it is the situation of an edge wiring unit that the second preferred embodiment that this manufacture method is described is developed this photaesthesia conductive paste layer;
Figure 16 is a schematic diagram, and the structure of a preferred embodiment of touch control display apparatus of the present invention is described;
Figure 17 one adopts the enlarged drawing of the photo of the edge Wiring structure that existing screen printing processing procedure makes;
And
Figure 18 one adopts the enlarged drawing of the photo of the edge Wiring structure that manufacture method of the present invention makes.
Embodiment
The present invention is described in detail below in conjunction with drawings and Examples:
Before the present invention is described in detail, be noted that in the following description content, similarly element is to represent with identical numbering.
Consult Fig. 1 to Figure 10, the consecutive steps of first preferred embodiment of the manufacture method of contact panel of the present invention edge cabling is described, wherein, Fig. 2 and Fig. 3 look over the schematic side view of getting from the place ahead of Fig. 1.This manufacture method comprises the following step:
Consult Fig. 1, Fig. 2 and Fig. 3, step (a) is to form one deck photaesthesia conductive paste layer 3 on a marginal zone 221 of a base material 2 with layer of transparent conductive layer 21, and this photaesthesia conductive paste layer 3 is overlapped with this transparency conducting layer 21 at least.The thickness of this photaesthesia conductive paste layer 3 is preferably 3 ~ 10 μ m.Base material 2 used also comprises a transparency carrier 23 in the present embodiment, and this transparency conducting layer 21 is to be combined on this transparency carrier 23, and 3, this photaesthesia conductive paste layer oppositely arranges and is formed on the transparency conducting layer 21 of this base material 2 with this transparency carrier 23.
The photaesthesia conductive paste layer 3 of the present embodiment is made by a photaesthesia electrocondution slurry.This photaesthesia electrocondution slurry contains a heat curing-type light sensitive material and a plurality of conducting particles, and the part by weight of the described conducting particles in this photaesthesia electrocondution slurry and this light sensitive material is 80 ~ 90:10 ~ 20.And being preferably the viscosity that makes this photaesthesia electrocondution slurry is 15000 ~ 25000mPaS, and to make the volume impedance of this photaesthesia electrocondution slurry be 1.5 * 10
-6~ 2.5 * 10
-6Ω Cm.Wherein, described conducting particles is the combination of gold particle, silver particles, copper particle, aluminum particulate, nickel particles or aforementioned metal particle.To select silver particles as described conducting particles at the present embodiment.
Wherein, this base material 2 also comprise one be subjected to this marginal zone 221 around viewfinder area 222, this transparency conducting layer 21 is made by transparent electrode material, and be formed at this marginal zone 221 and this viewfinder area 222, and this photaesthesia conductive paste layer 3 is to be formed on fully overlappingly on the transparency conducting layer 21 of marginal zone 221 of this base material 2.This transparent electrode material can be tin indium oxide (ITO) or indium zinc oxide (IZO).
In addition, after forming this photaesthesia conductive paste layer 3, also form one deck and cover the transparency conducting layer 21 of this base material 2 and the photoresist layer 4 of this photaesthesia conductive paste layer 3.
Consult Fig. 4 and Fig. 5, step (b) is to make mask 5 of light transmission with expose the simultaneously photaesthesia conductive paste layer 3 of this photoresist layer 4 and this photoresist layer 4 belows of patterning ground.The light source that the present embodiment is used for exposure is ultraviolet light, as the Lamp:High Pressure Mercury Lamp that uses, Luminance:17-35mW/cm
2, but not as limit, and the exposure of exposing is 20 ~ 200mJ/cm
2
This mask 5 has one respectively to marginal zone 221 that should the base material 2 patterning vacancy section 50 with viewfinder area 222, the ultraviolet light that passes the vacancy section 50 of this mask 5 can act on the photaesthesia conductive paste layer 3 of this photoresist layer 4 and this photoresist layer 4 belows, and the part that is subject to action of ultraviolet light is solidified.
Consult Fig. 5, Fig. 6 and Fig. 7, step (c) is respectively to developing through this photoresist layer 4 of exposure photaesthesia conductive paste layer 3 with this photoresist layer 4 belows.Wherein, be first this photoresist layer 4 to be developed, and use a reagent that is selected from following group to remove the part that this photoresist layer 4 is not subjected to light action: potassium hydroxide, NaOH, sodium carbonate and sodium acid carbonate.Whereby, make this photoresist layer 4 at the viewfinder area 222 of this base material 2 and a photoresistance capping unit 41 of marginal zone 221 formation patternings.
Then, again this photaesthesia conductive paste layer 3 of this photoresistance capping unit 41 belows developed, and use a reagent that is selected from following group to remove the part that this photaesthesia conductive paste layer 3 is not subject to light action: potassium hydroxide, NaOH, sodium carbonate and sodium acid carbonate.Whereby, form an edge wiring unit 31 of patterning on the marginal zone 21 of this base material 2.The pattern of this edge wiring unit 31 is consistent at the pattern of this marginal zone 221 with this photoresistance capping unit 41, and is equitant state.
Consult Fig. 7, Fig. 8 and Fig. 9, step (d) is that this transparency conducting layer 21 that is not covered by this photoresistance capping unit 41 is carried out etching, and remove this photoresistance capping unit 41 after completing etching, forming a patterned transparent electrode unit 211 that is positioned at this viewfinder area 222, and one be positioned at this marginal zone and be combined in the transparent line unit 212 of patterned edge of this edge wiring unit 31 belows.The pattern of formed this transparency electrode of this transparency conducting layer 21 of etching unit 211 and the transparent line unit 212 in this edge will be consistent with the pattern of the vacancy section 50 (seeing Fig. 4) of step (b) mask 5 used, and this edge wiring unit 31 is overlapped on the transparent line unit 212 in this edge.
After removing this photoresistance capping unit 41, just can obtain one as Fig. 9 and contact panel 20 shown in Figure 10, because this photaesthesia electrocondution slurry is thermoset material, in order to promote the stability of these edge wiring unit 31 structures, be preferably again this edge wiring unit 31 is carried out the heat baking to promote its state of cure.It is a display unit product that this contact panel 20 after solidify processing can arrange in pairs or groups in successive process that other electronic components assemble.
As shown in figure 17, configuration scenario for existing prepared many edge cablings of screen painting processing procedure, the live width minimum of described edge cabling is about 100 μ m, the line-spacing minimum also can only reach 100 μ m, and described cabling obviously has printing slurry to the outdiffusion situation, makes the live width of each edge cabling can't keep consistent and easily occur to contact with adjacent traces and cause the problem of short circuit.As shown in figure 18, configuration scenario for many edge cablings using manufacture method manufacturing of the present invention, result shows that the collocation of use photaesthesia guide slurry exposes and the live width of each edge cabling that developing technique is made is nearly all kept wide straightened condition, and the spacing between described cabling also can keep identical spacing, shows that manufacture method of the present invention helps to improve the circuit precision of contact panel edge cabling really.In addition, because described edge cabling is made from the full wafer layer structure of the photaesthesia conductive paste layer 3 of step (a), the thickness of layer structure and profile pattern are easier to control, and can make the thickness of all edge cablings of making at last also can keep consistent and make described cabling also have better profile pattern.Wherein, the live width of the described edge cabling that the present invention makes can taper to 20 ~ 70 μ m, and line-spacing also can taper to 20 ~ 70 μ m.
What deserves to be explained is, because this manufacture method only need carry out single exposure and develop just forming this transparency electrode unit 211 and this edge wiring unit 31, compared to existing manufacturing technology, can also simplify fabrication steps promoting processing procedure efficient, and have easy, characteristic fast.
Consult Figure 11 to Figure 15, the consecutive steps of second preferred embodiment of the manufacture method of contact panel of the present invention edge cabling is described.This manufacture method comprises the following step:
Consult Figure 11 and Figure 12, step (a) ' be to form one deck photaesthesia conductive paste layer 3 ' a marginal zone 221 ' with base material 2 ' of layer of transparent conductive layer 21 ', this base material 2 ' also comprise one be subjected to this marginal zone 221 ' around viewfinder area 222 ', this transparency conducting layer 21 ' is mainly to be formed at this viewfinder area 222 '.Wherein, the transparency conducting layer 21 ' of this base material 2 ' is the transparency electrode unit of patterning, and is made by electrically conducting transparent base material of photoetching.When forming this transparency conducting layer 21 ', that a side that makes this transparency conducting layer 21 ' be close to this marginal zone 221 ' stretches out to contact with this photaesthesia conductive paste layer 3 ' overlaid again, that is to say, some keeps contacting with this photaesthesia conductive paste layer 3 ' respectively in the outside of each list structure of this patterned transparency conducting layer 21 '.Wherein, this photaesthesia conductive paste layer 3 ' is identical with the first preferred embodiment, is not described in detail in this.Base material 2 ' used also comprises a transparency carrier 23 ' in the present embodiment, and this transparency conducting layer 21 ' all is formed on an inner surface 231 ' of this transparency carrier 23 ' with this photaesthesia conductive paste layer 3 '.
consult Figure 13 and Figure 14, step (b) ' be to make light transmission one mask 5 ' with this photaesthesia conductive paste layer 3 ' of patterning ground exposure, due to this transparency conducting layer 21 ' of the present embodiment transparency electrode pattern that is patterning, therefore, the design of one patterning vacancy section 50 ' of this mask 5 ' is different from the first embodiment, and only be formed on the position to the photaesthesia conductive paste layer 3 ' of marginal zone 221 ' that should base material 2 ', the ultraviolet light that passes this vacancy section 50 ' can directly act on this photaesthesia conductive paste layer 3 ', and the part that is subject to action of ultraviolet light in this photaesthesia conductive paste layer 3 ' is solidified.
Consult Figure 14 and Figure 15, step (c) ' be that this photaesthesia conductive paste layer 3 through exposure is developed.Whereby, the upper edge wiring unit 31 ' that forms patterning in the marginal zone 221 ' of this base material 2 ' (seeing Figure 12).Wherein, development reagent used is identical with the first preferred embodiment, does not repeat them here.
Then, then this edge wiring unit 31 ' is carried out heated baking, just can strengthen the state of cure of this edge wiring unit 31 ', and obtain a constitutionally stable contact panel 20 '.This contact panel 20 ' can be a display unit product in successive process other electronic components assembling of arranging in pairs or groups equally.
Preferably, consult Figure 12, Figure 14 and Figure 15, due at step (a) ' in this transparency conducting layer 21 ' is overlapped with this photaesthesia conductive layer 3 ', thereby this edge wiring unit 31 ' that this step is made can be electrically connected to this transparency conducting layer 21 '.
The manufacture method of this second preferred embodiment equally can be by using photaesthesia guide slurry and adopting the process design of exposing with developing technique, make live width and the line-spacing of this edge wiring unit 31 ' all taper to 20 ~ 70 μ m, the more important thing is, in the situation that reduction live width and line-spacing, still can keep better wiring precision and circuit table surface evenness, thereby bad situation occurs in contact panel 20 in use that can avoid making.
Consult Fig. 9 and Figure 10, be first preferred embodiment of contact panel 20 of the present invention, and comprise a base material 2, and an edge wiring unit 31 that is arranged on this base material 2.
This base material 2 comprises that a viewfinder area 222, marginal zone 221 around this viewfinder area 222, one are made and be formed on the patterned transparent electrode unit 211 of this viewfinder area 222 by transparent electrode material, and the transparent line units 212 of patterned edge that extend toward these marginal zones 221 from this transparency electrode unit 211.The transparent line unit 212 in this edge is also made by transparent electrode material.
This edge wiring unit 31 is made through exposure imaging by the photaesthesia electrocondution slurry, and is the marginal zone 221 that is laid in this base material 2.This edge line unit 31 also comprises that many width are the edge cabling 311 of 20 ~ 70 μ m, and the spacing between described edge cabling 311 is 20 ~ 70 μ m.
Wherein, this photaesthesia electrocondution slurry contains a light sensitive material and a plurality of particle diameter is the conducting particles of 1 ~ 10 μ m, and described conducting particles can be the combination of gold particle, silver particles, copper particle, aluminum particulate, nickel particles or aforementioned metal particle.In addition, the described conducting particles in this this photaesthesia electrocondution slurry and the part by weight of this light sensitive material are 80 ~ 90:10 ~ 20.
Preferably, the transparent line unit 212 in the edge of this base material 2 is to be combined in overlappingly this edge wiring unit 31 belows, whereby, the transparency electrode unit 211 of this edge wiring unit 31 and this viewfinder area 222 is formed be electrically connected to.
Consult Figure 15 and Figure 10, be second preferred embodiment of contact panel 20 ' of the present invention, and comprise a base material 2 ', and an edge wiring unit 31 ' that is arranged on this base material 2 '.This base material 2 ' also has a transparency electrode unit that is formed on a viewfinder area 222 ' 211 ', and this edge wiring unit 31 ' is also made through exposure imaging by the photaesthesia electrocondution slurry.The main difference of this second preferred embodiment and this first preferred embodiment only is that a marginal zone 221 ' of this base material 2 ' does not arrange the edge transparent thread line structure fully overlapping with this edge wiring unit 31 ', but when making this transparency electrode unit 211 ', the specific ora terminalis place that makes this transparency electrode unit 211 ' respectively with the specific ora terminalis place overlaid of this edge wiring unit 31 ', be electrically connected to so that this transparency electrode unit 211 ' is formed with this edge wiring unit 31 '.
Because the contact panel 20 of this first preferred embodiment and this second preferred embodiment, 20 ' edge wiring unit 30,31 ' are all made through exposure imaging by the photaesthesia electrocondution slurry, make this edge wiring unit 30,31 ' live width and line-spacing in the situation that reduction, still can keep the precision of wire sizes and allocation position, and keep the planarization on circuit surface, whereby, the area of marginal zone is reduced, and then viewfinder area is improved in whole base material area occupied ratio.
Consult Figure 16, a preferred embodiment of touch control display apparatus 10 of the present invention comprises a contact panel 20 as described in this first preferred embodiment, and a display floater 101 that is oppositely arranged with this contact panel 20.Wherein, this display floater 101 is positioned at 211 (the seeing Fig. 9) inboard in the same way, transparency electrode unit with this contact panel 20.
This touch control display apparatus 10 can be mobile phone, digital camera, personal digital assistant (PDA), notebook computer, desktop computer, TV, vehicle display or Portable DVD player.
The contact panel 20 that has aforementioned edge Wiring structure by collocation, make this contact panel 20 can be under the condition of keeping good serviceability and normal operation, the shared area ratio of this viewfinder area 222 (seeing Figure 10) is improved, and then make this touch control display apparatus 10 can provide larger touch-control area and display area compared to the product of same size specification.
Wherein, this touch control display apparatus 10 also can adopt the contact panel 20 ' of this second preferred embodiment this display floater 101 of arranging in pairs or groups to form, and can produce equally the operating characteristic of increase touch-control area and display area.
Although the present invention discloses as above with embodiment; so it is not to limit the present invention; those of ordinary skill under any in technical field; without departing from the spirit and scope of the present invention; when can do a little modification and replacement, so protection scope of the present invention is when being as the criterion with defining of claims.In addition, any embodiment of the present invention or claim must not reached the disclosed whole purposes of the present invention or advantage or characteristics.In addition, summary part and title are only auxiliary patent document search use, are not to limit protection scope of the present invention.
Claims (20)
1. the manufacture method of a contact panel edge cabling; It is characterized in that: the method comprises:
(a) form one deck photaesthesia conductive paste layer on a marginal zone of a base material with layer of transparent conductive layer, and this photaesthesia conductive paste layer is overlapped with this transparency conducting layer at least;
(b) utilize this photaesthesia conductive paste layer of a mask exposure; And
(c) form an edge wiring unit of patterning on developing with the marginal zone at this base material to the photaesthesia conductive paste layer through exposure.
2. the manufacture method of contact panel as claimed in claim 1 edge cabling, it is characterized in that: the base material of step (a) also comprise one be subjected to this marginal zone around viewfinder area, this transparency conducting layer is to be formed at this marginal zone and this viewfinder area, and this photaesthesia conductive paste layer is to be formed on fully overlappingly on the transparency conducting layer of marginal zone of this base material.
3. the manufacture method of contact panel as claimed in claim 2 edge cabling, it is characterized in that: in step (a), after forming this photaesthesia conductive paste layer, also form one deck and cover the transparency conducting layer of this base material and the photoresist layer of this photaesthesia conductive paste layer, and be with expose simultaneously this photaesthesia conductive paste layer of this photoresist layer and this photoresist layer below of this mask in step (b), in step (c), first this photoresist layer to be developed, again this photaesthesia conductive paste layer below this photoresist layer is developed, with a photoresistance capping unit at this viewfinder area and this marginal zone formation patterning.
4. the manufacture method of contact panel as claimed in claim 3 edge cabling, it is characterized in that: this manufacture method also comprises one in step (c) step (d) afterwards, step (d) is that the transparency conducting layer that is not covered by this photoresistance capping unit is carried out etching, and remove this photoresistance capping unit after completing etching, to form a patterned transparent electrode unit that is positioned at this viewfinder area, reach a transparent line unit of patterned edge that is positioned at this marginal zone and is combined in this wiring unit below, edge.
5. the manufacture method of contact panel as claimed in claim 4 edge cabling, it is characterized in that: the photaesthesia conductive paste layer in step (a) is heat curing-type, and this manufacture method also is included in step (d) afterwards, and this edge wiring unit is carried out heated baking.
6. the manufacture method of contact panel as claimed in claim 1 edge cabling, it is characterized in that: the base material of step (a) also comprise one be subjected to this marginal zone around viewfinder area, this transparency conducting layer is arranged on this viewfinder area, and make a side of this transparency conducting layer contiguous this marginal zone stretch out again to contact with this photaesthesia conductive paste layer, and then formed this edge wiring unit of step (c) is electrically connected to this transparency conducting layer.
7. the manufacture method of contact panel as claimed in claim 6 edge cabling, it is characterized in that: the transparency conducting layer in step (a) is the transparency electrode unit of patterning.
8. the manufacture method of contact panel as claimed in claim 1 edge cabling is characterized in that: this photaesthesia conductive paste layer in step (a) is to be that the photaesthesia electrocondution slurry of 15000 ~ 25000mPaS is made by a viscosity.
9. the manufacture method of contact panel as claimed in claim 1 edge cabling, it is characterized in that: this photaesthesia conductive paste layer in step (a) is to be 1.5 * 10 by a volume impedance
-6~ 2.5 * 10
-6The photaesthesia electrocondution slurry of Ω cm is made.
10. the manufacture method of contact panel as claimed in claim 1 edge cabling, it is characterized in that: this photaesthesia conductive paste layer in step (a) is made by a photaesthesia electrocondution slurry, this photaesthesia electrocondution slurry contains a light sensitive material and a plurality of conducting particles, and the part by weight of the described conducting particles in this photaesthesia electrocondution slurry and this light sensitive material is 80 ~ 90:10 ~ 20.
11. the manufacture method of contact panel as claimed in claim 1 edge cabling, it is characterized in that: the photaesthesia conductive paste layer used in step (a) is heat curing-type, and this manufacture method also is included in step (c) afterwards, and this edge wiring unit is carried out heated baking.
12. the manufacture method of contact panel as claimed in claim 1 edge cabling is characterized in that: the thickness of the photaesthesia conductive paste layer of step (a) is 3 ~ 10 μ m.
13. the manufacture method of contact panel as claimed in claim 1 edge cabling is characterized in that: the exposure that step (b) is exposed is 50 ~ 200mJ/cm
2
14. a contact panel comprises a base material, and an edge wiring unit that is arranged on this base material, it is characterized in that:
(a) this base material comprises a viewfinder area, the marginal zone around this viewfinder area, and one made and be formed on the patterned transparent electrode unit of this viewfinder area by transparent electrode material; And
(b) this edge wiring unit is made through lithographic process by the photaesthesia electrocondution slurry, and is laid in the marginal zone of this base material and is electrically connected to this transparency electrode unit.
15. contact panel as claimed in claim 14, it is characterized in that: this base material also comprises a transparent line unit of patterned edge that is combined in overlappingly this wiring unit below, edge from this past this marginal zone extension in transparency electrode unit, and the transparent line unit in this edge is made by transparent electrode material.
16. contact panel as claimed in claim 14 is characterized in that: this edge wiring unit comprises that many width are the edge cabling of 20 ~ 70 μ m, and the spacing between described edge cabling is 20 ~ 70 μ m.
17. contact panel as claimed in claim 14 is characterized in that: be used to form in the photaesthesia electrocondution slurry of this edge wiring unit and contain the conducting particles that a plurality of particle diameters are 1 ~ 10 μ m.
18. contact panel as claimed in claim 17 is characterized in that: described conducting particles is the combination of gold particle, silver particles, copper particle, aluminum particulate, nickel particles or aforementioned metal particle.
19. contact panel as claimed in claim 14, it is characterized in that: the photaesthesia electrocondution slurry that is used to form this edge wiring unit contains a light sensitive material and a plurality of conducting particles, and the part by weight of the described conducting particles in this photaesthesia electrocondution slurry and this light sensitive material is 80 ~ 90:10 ~ 20.
20. a touch control display apparatus comprises a contact panel, and a display floater that is oppositely arranged with this contact panel, it is characterized in that:
(a) this contact panel is contact panel as claimed in claim 14; And
(b) this display floater is positioned at the inboard in the same way, transparency electrode unit with this contact panel.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2012101371442A CN103384451A (en) | 2012-05-04 | 2012-05-04 | Manufacturing method for touch panel edge wire routing, touch panel and touch display device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN2012101371442A CN103384451A (en) | 2012-05-04 | 2012-05-04 | Manufacturing method for touch panel edge wire routing, touch panel and touch display device |
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| CN103384451A true CN103384451A (en) | 2013-11-06 |
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| CN2012101371442A Pending CN103384451A (en) | 2012-05-04 | 2012-05-04 | Manufacturing method for touch panel edge wire routing, touch panel and touch display device |
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